CN116880132A - 一种柔性印版均匀曝光设备 - Google Patents
一种柔性印版均匀曝光设备 Download PDFInfo
- Publication number
- CN116880132A CN116880132A CN202310843549.6A CN202310843549A CN116880132A CN 116880132 A CN116880132 A CN 116880132A CN 202310843549 A CN202310843549 A CN 202310843549A CN 116880132 A CN116880132 A CN 116880132A
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- China
- Prior art keywords
- exposure
- roller
- plate
- printing plate
- flexible printing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
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- 238000009434 installation Methods 0.000 claims description 7
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/24—Curved surfaces
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Description
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202310843549.6A CN116880132A (zh) | 2023-07-11 | 2023-07-11 | 一种柔性印版均匀曝光设备 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202310843549.6A CN116880132A (zh) | 2023-07-11 | 2023-07-11 | 一种柔性印版均匀曝光设备 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN116880132A true CN116880132A (zh) | 2023-10-13 |
Family
ID=88265646
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202310843549.6A Pending CN116880132A (zh) | 2023-07-11 | 2023-07-11 | 一种柔性印版均匀曝光设备 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN116880132A (zh) |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3578862A (en) * | 1968-10-07 | 1971-05-18 | Time Inc | Photographic exposing apparatus |
KR20020063095A (ko) * | 2001-01-26 | 2002-08-01 | 아이티에스테크놀러지 주식회사 | 플렉시블 회로기판용 노광장치 |
CN1689803A (zh) * | 2004-04-28 | 2005-11-02 | 海德堡印刷机械股份公司 | 用于在曝光滚筒上夹紧和固定印版的装置 |
CN1886262A (zh) * | 2003-11-27 | 2006-12-27 | Xsys印刷解决方案德国有限公司 | 通过激光雕刻制造柔性版印版的方法 |
CN1922030A (zh) * | 2004-04-30 | 2007-02-28 | 麦克德米德印刷方案股份有限公司 | 用于柔性版印版的热显影的系统 |
CN101446763A (zh) * | 2008-12-22 | 2009-06-03 | 深圳市大族激光科技股份有限公司 | 曝光滚筒动平衡的自动调节装置 |
CN101500817A (zh) * | 2006-08-09 | 2009-08-05 | 旭化成电子材料株式会社 | 圆筒状印刷基材的制造方法以及制造装置 |
KR101863946B1 (ko) * | 2017-09-22 | 2018-06-01 | 주식회사 넥서스원 | Rtr 노광 제어방법 |
CN216610537U (zh) * | 2022-01-13 | 2022-05-27 | 潍坊职业学院 | 一种印刷干燥装置 |
CN216804931U (zh) * | 2021-10-25 | 2022-06-24 | 高斯图文印刷系统(中国)有限公司 | 一种柔印印版 |
-
2023
- 2023-07-11 CN CN202310843549.6A patent/CN116880132A/zh active Pending
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3578862A (en) * | 1968-10-07 | 1971-05-18 | Time Inc | Photographic exposing apparatus |
KR20020063095A (ko) * | 2001-01-26 | 2002-08-01 | 아이티에스테크놀러지 주식회사 | 플렉시블 회로기판용 노광장치 |
CN1886262A (zh) * | 2003-11-27 | 2006-12-27 | Xsys印刷解决方案德国有限公司 | 通过激光雕刻制造柔性版印版的方法 |
CN1689803A (zh) * | 2004-04-28 | 2005-11-02 | 海德堡印刷机械股份公司 | 用于在曝光滚筒上夹紧和固定印版的装置 |
CN1922030A (zh) * | 2004-04-30 | 2007-02-28 | 麦克德米德印刷方案股份有限公司 | 用于柔性版印版的热显影的系统 |
CN101500817A (zh) * | 2006-08-09 | 2009-08-05 | 旭化成电子材料株式会社 | 圆筒状印刷基材的制造方法以及制造装置 |
CN101446763A (zh) * | 2008-12-22 | 2009-06-03 | 深圳市大族激光科技股份有限公司 | 曝光滚筒动平衡的自动调节装置 |
KR101863946B1 (ko) * | 2017-09-22 | 2018-06-01 | 주식회사 넥서스원 | Rtr 노광 제어방법 |
CN216804931U (zh) * | 2021-10-25 | 2022-06-24 | 高斯图文印刷系统(中国)有限公司 | 一种柔印印版 |
CN216610537U (zh) * | 2022-01-13 | 2022-05-27 | 潍坊职业学院 | 一种印刷干燥装置 |
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PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
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TA01 | Transfer of patent application right |
Effective date of registration: 20240130 Address after: Room A1, 3rd Floor, Phase 6, Hong Kong Cotton Mill Industrial Building, 483 Castle Peak Road, Lai Chi Kok, Kowloon, Hong Kong, China Applicant after: Ding Suyong Country or region after: Hongkong, China Applicant after: Rongguanda Technology (Shenzhen) Co.,Ltd. Country or region after: China Address before: 518100 2F-3, No.1 Xinmu Dongdu Road, Xinmu Community, Pinghu Street, Longgang District, Shenzhen City, Guangdong Province Applicant before: Rongguanda Technology (Shenzhen) Co.,Ltd. Country or region before: China |
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TA01 | Transfer of patent application right |