CN116848467A - 感光性树脂组合物、固化膜和半导体装置 - Google Patents
感光性树脂组合物、固化膜和半导体装置 Download PDFInfo
- Publication number
- CN116848467A CN116848467A CN202280015064.1A CN202280015064A CN116848467A CN 116848467 A CN116848467 A CN 116848467A CN 202280015064 A CN202280015064 A CN 202280015064A CN 116848467 A CN116848467 A CN 116848467A
- Authority
- CN
- China
- Prior art keywords
- group
- carbon atoms
- general formula
- resin composition
- photosensitive resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/16—Polyester-imides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021-021545 | 2021-02-15 | ||
| JP2021105687 | 2021-06-25 | ||
| JP2021-105687 | 2021-06-25 | ||
| PCT/JP2022/005338 WO2022172988A1 (ja) | 2021-02-15 | 2022-02-10 | 感光性樹脂組成物、硬化膜および半導体装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN116848467A true CN116848467A (zh) | 2023-10-03 |
Family
ID=84545731
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202280015064.1A Pending CN116848467A (zh) | 2021-02-15 | 2022-02-10 | 感光性树脂组合物、固化膜和半导体装置 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2022270527A1 (https=) |
| CN (1) | CN116848467A (https=) |
| WO (1) | WO2022270527A1 (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN120456798A (zh) * | 2025-07-11 | 2025-08-08 | 昆山协鑫光电材料有限公司 | 一种钙钛矿太阳能电池、电子传输层的制备方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3537907B2 (ja) * | 1994-03-29 | 2004-06-14 | 株式会社東芝 | ポリイミド前駆体、ポリイミド前駆体組成物、ポリイミド樹脂および電子部品 |
| JP2017125210A (ja) * | 2017-04-05 | 2017-07-20 | 住友ベークライト株式会社 | ポリアミド樹脂、ポジ型感光性樹脂組成物、硬化膜、保護膜、絶縁膜、半導体装置、および表示体装置 |
| US11535709B2 (en) * | 2019-03-05 | 2022-12-27 | Promerus, Llc | Reactive end group containing polyimides and polyamic acids and photosensitive compositions thereof |
| WO2020196764A1 (ja) * | 2019-03-27 | 2020-10-01 | 株式会社カネカ | アルカリ可溶性ポリイミドおよびその製造方法、ネガ型感光性樹脂組成物、硬化膜、ならびにパターン硬化膜の製造方法 |
-
2022
- 2022-02-10 CN CN202280015064.1A patent/CN116848467A/zh active Pending
- 2022-06-22 WO PCT/JP2022/024837 patent/WO2022270527A1/ja not_active Ceased
- 2022-06-22 JP JP2023530080A patent/JPWO2022270527A1/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN120456798A (zh) * | 2025-07-11 | 2025-08-08 | 昆山协鑫光电材料有限公司 | 一种钙钛矿太阳能电池、电子传输层的制备方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW202311368A (zh) | 2023-03-16 |
| WO2022270527A1 (ja) | 2022-12-29 |
| JPWO2022270527A1 (https=) | 2022-12-29 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |