JPWO2022270527A1 - - Google Patents

Info

Publication number
JPWO2022270527A1
JPWO2022270527A1 JP2023530080A JP2023530080A JPWO2022270527A1 JP WO2022270527 A1 JPWO2022270527 A1 JP WO2022270527A1 JP 2023530080 A JP2023530080 A JP 2023530080A JP 2023530080 A JP2023530080 A JP 2023530080A JP WO2022270527 A1 JPWO2022270527 A1 JP WO2022270527A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023530080A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022270527A1 publication Critical patent/JPWO2022270527A1/ja
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/16Polyester-imides
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2023530080A 2021-06-25 2022-06-22 Pending JPWO2022270527A1 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021105687 2021-06-25
PCT/JP2022/024837 WO2022270527A1 (ja) 2021-06-25 2022-06-22 ネガ型感光性樹脂組成物、ネガ型感光性ポリマー、硬化膜および半導体装置

Publications (1)

Publication Number Publication Date
JPWO2022270527A1 true JPWO2022270527A1 (https=) 2022-12-29

Family

ID=84545731

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023530080A Pending JPWO2022270527A1 (https=) 2021-06-25 2022-06-22

Country Status (3)

Country Link
JP (1) JPWO2022270527A1 (https=)
CN (1) CN116848467A (https=)
WO (1) WO2022270527A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN120456798B (zh) * 2025-07-11 2025-10-21 昆山协鑫光电材料有限公司 一种钙钛矿太阳能电池、电子传输层的制备方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3537907B2 (ja) * 1994-03-29 2004-06-14 株式会社東芝 ポリイミド前駆体、ポリイミド前駆体組成物、ポリイミド樹脂および電子部品
JP2017125210A (ja) * 2017-04-05 2017-07-20 住友ベークライト株式会社 ポリアミド樹脂、ポジ型感光性樹脂組成物、硬化膜、保護膜、絶縁膜、半導体装置、および表示体装置
US11535709B2 (en) * 2019-03-05 2022-12-27 Promerus, Llc Reactive end group containing polyimides and polyamic acids and photosensitive compositions thereof
WO2020196764A1 (ja) * 2019-03-27 2020-10-01 株式会社カネカ アルカリ可溶性ポリイミドおよびその製造方法、ネガ型感光性樹脂組成物、硬化膜、ならびにパターン硬化膜の製造方法

Also Published As

Publication number Publication date
TW202311368A (zh) 2023-03-16
WO2022270527A1 (ja) 2022-12-29
CN116848467A (zh) 2023-10-03

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