CN116623154A - Novel tubular PECVD (plasma enhanced chemical vapor deposition) equipment and coating process thereof - Google Patents
Novel tubular PECVD (plasma enhanced chemical vapor deposition) equipment and coating process thereof Download PDFInfo
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- CN116623154A CN116623154A CN202310586090.6A CN202310586090A CN116623154A CN 116623154 A CN116623154 A CN 116623154A CN 202310586090 A CN202310586090 A CN 202310586090A CN 116623154 A CN116623154 A CN 116623154A
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- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 title claims abstract description 36
- 238000000576 coating method Methods 0.000 title claims abstract description 29
- 238000000034 method Methods 0.000 claims abstract description 84
- 230000008569 process Effects 0.000 claims abstract description 81
- 238000004321 preservation Methods 0.000 claims abstract description 58
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 56
- 229910002804 graphite Inorganic materials 0.000 claims abstract description 56
- 239000010439 graphite Substances 0.000 claims abstract description 56
- 238000010438 heat treatment Methods 0.000 claims abstract description 27
- 238000009413 insulation Methods 0.000 claims abstract description 4
- 239000007789 gas Substances 0.000 claims description 104
- 239000000758 substrate Substances 0.000 claims description 28
- 229910001220 stainless steel Inorganic materials 0.000 claims description 22
- 239000010935 stainless steel Substances 0.000 claims description 22
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 18
- 238000007789 sealing Methods 0.000 claims description 16
- 239000011248 coating agent Substances 0.000 claims description 13
- 229910052757 nitrogen Inorganic materials 0.000 claims description 9
- 239000000919 ceramic Substances 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 3
- 230000004888 barrier function Effects 0.000 claims 3
- 239000007888 film coating Substances 0.000 abstract description 8
- 238000009501 film coating Methods 0.000 abstract description 8
- 238000005265 energy consumption Methods 0.000 abstract description 5
- 230000002035 prolonged effect Effects 0.000 abstract description 3
- 239000002699 waste material Substances 0.000 abstract description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 12
- 235000012239 silicon dioxide Nutrition 0.000 description 11
- 239000010453 quartz Substances 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000002161 passivation Methods 0.000 description 5
- 230000009471 action Effects 0.000 description 3
- 229910021419 crystalline silicon Inorganic materials 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000026058 directional locomotion Effects 0.000 description 2
- 150000002500 ions Chemical group 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 238000005086 pumping Methods 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 231100000956 nontoxicity Toxicity 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000012797 qualification Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45587—Mechanical means for changing the gas flow
- C23C16/45591—Fixed means, e.g. wings, baffles
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
- C23C16/5093—Coaxial electrodes
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
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Abstract
The application discloses a novel tubular PECVD device and a coating process. The tubular PECVD equipment comprises a heat-preserving outer shell, a main air supply unit, an air homogenizing unit, an inner heat-preserving cavity, a heating unit, a counter electrode and a control unit. The double-layer shell structure adopts a non-circular cross section, so that the space waste during placement of the graphite boats is reduced, and the placement quantity of the graphite boats can be increased by increasing the width of the cross section; the heating unit is arranged in the inner heat preservation cavity, so that the volume of the heating area is reduced, and the required heating power is reduced; by arranging the gas baffle, the flow path of the process gas between the graphite boat and the inner heat preservation cavity is prolonged, so that the flow rate of the process gas passing through the graphite boat is increased and more uniform, and the exhaust gas is reduced; the inner heat-insulating cavity made of graphite not only plays a role in heat insulation, but also prolongs the service life of the inner heat-insulating cavity and avoids pollution to products during film coating; the yield is improved by at least 15% and the energy consumption is reduced by at least 25% under the same process time.
Description
Technical Field
The application relates to the technical field of tubular PECVD equipment, in particular to novel tubular PECVD equipment and a coating process thereof.
Background
Since the 80 s of the 20 th century, the photovoltaic industry has been rapidly developing, crystalline silicon solar cells have been dominant, and in order to make clean solar energy a more common energy source, there have been three major efforts in (1) increasing the energy conversion efficiency of solar cells, (2) improving long-term stability (minimizing degradation), and (3) reducing manufacturing costs. In order to further improve the power conversion efficiency and reduce the production cost of solar cells produced on an industrial scale, a large number of different manufacturing process methods and cell structures are internationally emerging. In order to better utilize solar energy, it is necessary to develop solar cells having higher conversion efficiency. Crystalline silicon solar cells are always the main stream of commercial solar cells among a plurality of solar cells due to the advantages of mature manufacturing technology, material cost, stable product performance, long service life, higher photoelectric conversion efficiency, environmental protection, no toxicity and the like. In order to produce efficient cells, it is desirable to minimize the loss of reflected and transmitted light, and therefore one or more layers of silicon oxynitride or silicon dioxide or silicon nitride anti-reflective films are often deposited on the crystalline silicon surface. The passivation film deposited by utilizing the Plasma Enhanced Chemical Vapor Deposition (PECVD) technology can play a role in not only an antireflection film, but also surface passivation and bulk passivation; the PECVD is in a quartz tube type, a graphite boat is arranged in the center of the quartz tube, a large space is reserved at the periphery of the quartz tube, most of the gas used for the process flows away from the peripheral space, and the gas does not participate in the process to cause loss. And if the yield of a single unit is increased, only the diameter of the quartz tube can be increased, the increase of the diameter of the quartz tube has technical problems, meanwhile, the yield is increased by increasing the diameter of the quartz tube and the width of the graphite boat, the space loss of the quartz tube is larger, and meanwhile, the corresponding heating power and more process gas are required to be increased to meet the production requirements.
Disclosure of Invention
The application discloses a novel tubular PECVD device and a coating process thereof, which are used for solving the technical problems and other technical problems in the prior art.
In order to solve the technical problems, the technical scheme of the application is as follows: a novel tubular PECVD apparatus, the tubular PECVD apparatus comprising:
the heat-insulating outer shell is used for installing the inner heat-insulating cavity, forming a closed double-layer shell structure and realizing the pressure when the coating film is borne;
the main gas supply unit is arranged outside the heat-insulating outer shell and is used for providing process gas;
the air homogenizing unit is arranged between the heat preservation outer shell and the end part of the air inlet end of the inner heat preservation cavity and is used for receiving the process air provided by the main air supply unit and uniformly guiding the process air into the inner heat preservation cavity;
the heating unit is arranged on the inner side wall of the inner heat preservation cavity and is used for heating the process gas, the graphite boat and the substrate in the inner heat preservation cavity;
the inner heat preservation cavity is used for placing a graphite boat for loading a substrate and has the heat preservation and heat insulation functions;
and the counter electrodes are arranged on two sides of the heat-insulating outer shell, the end parts of the counter electrodes are inserted into the inner bottom of the inner heat-insulating cavity and are used for introducing a high-frequency power supply to ionize the heated process gas in the inner heat-insulating cavity, and the ionized gas is used for coating the substrate in the graphite boat.
Further, the tubular PECVD device further comprises a gas baffle plate for prolonging the flow path of the process gas in the inner heat preservation cavity, and a plurality of rectangular gas baffle plates are fixedly arranged in the inner heat preservation cavity.
Further, the tubular PECVD device further comprises an auxiliary air-filling unit, and a plurality of auxiliary air-filling units are arranged on the side wall of the heat-preserving outer shell and are communicated with the inner heat-preserving cavity.
Further, the gas separator is made of graphite.
Further, the heat-insulating outer shell is a stainless steel shell, the end parts of the two ends of the stainless steel shell are respectively provided with a sealing door and an exhaust flange, the sealing door is provided with a main air inlet, and the exhaust flange is provided with an exhaust outlet;
a front baffle is arranged in the stainless steel shell positioned at the inner side of the sealing door,
a rear baffle is arranged in the stainless steel shell positioned on the inner side of the exhaust flange.
Further, the air homogenizing unit comprises uniform air outlet holes, uniform air outlet holes and an air homogenizing chamber;
wherein, a plurality of the uniform exhaust holes are uniformly arranged at the center of the rear baffle plate, and a plurality of the uniform air inlet holes are uniformly arranged at the center of the front baffle plate;
the air homogenizing chamber is formed between the front end of the heat preservation outer shell, the front baffle and the sealing door.
Further, the counter electrode is a vacuum electrode and a graphite electrode.
Further, the heating unit is one of an infrared heater, a ceramic heater or a resistance armor heater.
Further, the section of the heat-insulating outer shell is rectangular, rectangular or elliptical; the material of interior heat preservation cavity is graphite, just interior heat preservation cavity's cross-section is class rectangle, rectangle or oval.
Another object of the present application is to provide a coating process using the above-mentioned tubular PECVD apparatus, which specifically includes the following steps:
s1) placing a plurality of graphite boats with substrates in an inner heat preservation cavity, and vacuumizing to set background vacuum;
s2) starting a heating unit to heat and keeping the temperature at the process temperature, and simultaneously introducing process gas through a main gas supply unit or the main gas supply unit and an auxiliary gas supply unit together to enable the process gas to flow in an inner heat preservation cavity and be heated to the process temperature;
s3) starting a counter electrode to introduce current, exciting heated process gas to form plasma, enabling the plasma to accelerate impact gas between polar plates through alternating current, enabling the plasma to move to the surface of a substrate, and coating the substrate;
s4) after the film coating process is finished, repeatedly filling nitrogen and vacuumizing, and taking out the substrate carrying the film coating finished, thereby finishing the whole process, namely the passivation film or the antireflection film.
The beneficial effects of the application are as follows: by adopting the technical proposal, the application adopts a double-layer shell structure, the inner heat-preservation cavity with similar shape is arranged in the heat-preservation outer shell to form a sealed space and also plays the roles of preserving heat and protecting the inner heat-preservation cavity,
the double-layer shell structure adopts a non-circular cross section, so that space control waste during placement of the graphite boat is reduced, and meanwhile, the number of the graphite boats placed can be increased by increasing the width of the cross section, so that the consumption of process gas is reduced;
the heating unit is arranged in the inner heat preservation cavity, so that the volume of the heating area is reduced, and the required heating power is reduced;
the inner side wall of the inner heat preservation cavity is provided with the gas baffle, so that a process gas flow path between the graphite boat and the inner heat preservation cavity is prolonged, the flow rate of the process gas passing through the graphite boat is increased, the process gas is heated and heated faster by matching with the double-layer shell, the process gas can fully contact with the substrate in the graphite boat, the coating on the substrate is more uniform, the product qualification rate is higher, and meanwhile, the exhaust gas is greatly reduced;
the inner heat-insulating cavity made of graphite is adopted, so that the service life of the inner heat-insulating cavity is prolonged, and pollution to products during film coating is avoided;
the device of the application improves the yield by at least 15% and reduces the energy consumption by at least 25% under the same process conditions.
Drawings
FIG. 1 is a schematic diagram of the overall structure of a chamber structure of a novel tube PECVD apparatus according to the present application.
FIG. 2 is a schematic diagram of a cross-sectional structure of the furnace tail of a chamber structure of a novel tube PECVD apparatus of the present application.
FIG. 3 is a schematic axial sectional view of a chamber structure of a novel tube PECVD apparatus according to the application.
In the figure:
1. the heat-insulating shell comprises a heat-insulating shell body, a main gas supply unit, a gas homogenizing exhaust hole, a gas homogenizing chamber, a heat-insulating cavity, a heating unit, a counter electrode, a control unit, a gas baffle plate, an auxiliary gas adding pipe, a supporting seat, a rear baffle plate, a front baffle plate, a sealing door, a graphite boat, a gas exhausting flange, a gas exhausting hole, a gas exhausting opening, a supporting column, a graphite electrode seat and an electrode insulating support.
Detailed Description
The technical scheme of the application is further described below with reference to the specific drawings and the specific embodiments.
As shown in fig. 1, the novel tubular PECVD apparatus of the present application comprises:
the heat-insulating outer shell 1 is used for installing the inner heat-insulating cavity 4, forming a closed double-layer shell structure and realizing the temperature and pressure when carrying the coating film;
a main gas supply unit 2, which is arranged outside the heat-preserving outer casing 1 and is used for supplying process gas;
the air homogenizing unit 3 is arranged between the air inlet end of the front end of the heat-insulating outer shell 1 and the front end part of the inner heat-insulating cavity 4, and is used for receiving the process air provided by the main air supply unit 2 and uniformly guiding the process air into the inner heat-insulating cavity 4;
the heating unit 5 is arranged on the inner side wall of the inner heat preservation cavity 2 and is used for heating the process gas in the inner heat preservation cavity 2;
the inner heat preservation cavity 4 is used for placing a graphite boat 14 for loading the substrate and has the heat preservation and heat insulation functions;
the counter electrode 6 comprises two pairs of counter electrodes, namely a positive electrode and a negative electrode, and comprises a vacuum electrode and a graphite electrode, the counter electrodes are arranged on two sides of the heat-insulating outer shell 4, the ends of the counter electrodes are inserted into the interior of the inner heat-insulating cavity 4 and are respectively connected with the two pairs of graphite electrode seats 18, boat feet at two ends of the graphite boat 14 are placed on the graphite electrode seats 18, one end of each of the counter electrodes is the positive electrode, the other end of each of the counter electrodes is the negative electrode, the boat feet at two ends of the graphite boat 14 are respectively connected with boat sheets of two groups of the graphite boat, the two groups of the boat sheets are mutually arranged in parallel at intervals and are not conducted, thus, after high-frequency power supply is introduced, a high-frequency changing electric field is generated between the adjacent graphite boat sheets of the graphite boat 14, an isopipe body is formed between the graphite boat sheets, process gas heated in the inner heat-insulating cavity 4 is ionized, directional movement is generated, and a film coating is carried out on a substrate placed in the graphite boat 14.
The tubular PECVD device further comprises a gas baffle plate 8 for prolonging the flow path of the process gas in the inner heat preservation cavity 4, wherein the gas baffle plate 8 with a plurality of rectangles is arranged in the inner heat preservation cavity 4, and one end of the gas baffle plate is fixedly connected with the inner side wall of the inner heat preservation cavity 4. When the process gas flows in the inner heat preservation cavity 4, the gas baffle 8 is used for blocking, the gas does not flow forwards, but turns to generate vortex, the process gas is uniformly coated around the graphite boat 14, and the process gas is uniformly heated.
The tubular PECVD device further comprises an auxiliary air adding unit 9, wherein a plurality of auxiliary air adding units 9 are arranged on the side wall of the heat-preserving outer shell 4 and are communicated with the inner heat-preserving cavity 4 arranged inside the heat-preserving outer shell 1. In the film plating process, the concentration of the process gas at the tail end is reduced due to consumption, and the gas is supplemented into the inner heat preservation cavity 2 through the auxiliary gas adding unit 9, so that the concentration of the process gas at the front end and the rear end is consistent, and the film plating is more uniform.
The heat-insulating outer shell 1 is a stainless steel shell, the end parts of the two ends of the stainless steel shell are respectively provided with a sealing door 13 and an exhaust flange, the sealing door is provided with a main air inlet, and the exhaust flange is provided with an exhaust outlet;
a front baffle 12 is arranged in the stainless steel shell positioned at the inner side of the sealing door 13,
a rear baffle plate 11 is arranged in the stainless steel shell positioned on the inner side of the exhaust flange.
The air homogenizing unit 3 comprises uniform air outlet holes 3-1, uniform air outlet holes 3-2 and an air homogenizing chamber 3-3;
wherein, a plurality of the uniform exhaust holes 3-1 are uniformly arranged at the center of the rear baffle plate 11, and a plurality of the uniform exhaust holes 3-2 are uniformly arranged at the center of the front baffle plate 12;
the space formed inside the heat-insulating outer shell 4 and between the front baffle plate 12 and the sealing door 13 forms the air homogenizing chamber 3-3, and the number of air holes on the rear baffle plate 11 and the front baffle plate 12 is equal.
The counter electrode 6 includes a vacuum electrode and a graphite electrode.
The heating unit 5 is one of an infrared heater, a ceramic heater or a resistance armor heater.
The section of the heat-insulating outer shell 1 is rectangular, rectangular or elliptical; the inner heat preservation cavity 4 is made of graphite, and the section of the inner heat preservation cavity 4 is rectangular, rectangular or elliptical
Another object of the present application is to provide a coating process using the above-mentioned tubular PECVD apparatus, which specifically includes the following steps:
the coating process specifically comprises the following steps:
s1) placing a plurality of graphite boats 14 with substrates in an inner heat preservation cavity 4, and vacuumizing to set background vacuum;
s2) starting the heating unit 5 through the control unit 7 to heat and keep at the process temperature, and simultaneously introducing process gas through the main gas supply unit 9 or the main gas supply unit 2 and the auxiliary gas supply unit 9 together to enable the process gas to flow in the inner heat preservation cavity 4 and heat to the process temperature;
s3) starting the counter electrode 6 to introduce current, exciting the heated process gas to form plasma, enabling the plasma to accelerate the impact gas between the polar plates through alternating current, enabling the plasma to move to the surface of the substrate, and coating the substrate;
s4) after the coating process is completed, repeatedly filling nitrogen and vacuumizing, and taking out the substrate carrying the coated film to complete the whole process.
Example 1:
the cross sections of the stainless steel heat-insulating outer shell 1 and the graphite inner heat-insulating cavity 4 are rectangular, and the cross section size of the inner heat-insulating cavity 4 is 3/4 of the cross section size of the stainless steel heat-insulating outer shell 1; an infrared lamp tube is adopted as a heating unit, a plurality of infrared lamp tubes are equidistantly arranged on the inner side wall of the inner heat preservation cavity 4, a plurality of gas baffles 8 are equidistantly arranged on the inner side wall of the inner heat preservation cavity 4, and when coating film, a plurality of graphite boats 14 with substrates are placed in the inner heat preservation cavity 4, and the heat preservation outer shell 1 is vacuumized to a set background vacuum; starting a heating unit 5 to heat for 5 minutes, namely, the process temperature can be reached and kept at the process temperature, simultaneously, introducing process gas through a main gas supply unit 2, forming vortex by the process gas through a gas homogenizing unit 3 under the action of a gas baffle plate 8, and uniformly coating the surface of a product; the pulse radio frequency power supply is introduced through the counter electrode 6, and the high-frequency voltage with opposite polarity is applied to the two adjacent graphite boat sheets, so that the pulse radio frequency excites the heated thin process gas to carry out glow discharge to form plasma, ions form directional movement between the polar plates, and the ions move to the surface of the substrate to finish the coating process.
S4) after the film coating process is finished, the pulse radio frequency power supply is turned off, the air supply is stopped, the residual process gas is pumped, nitrogen is repeatedly filled in and pumped out, the vacuum is broken by the nitrogen, the sealing door 13 of the stainless steel is opened, the graphite boat 14 is taken out, and the whole process is finished, so that the passivation film is obtained. Compared with the quartz tube used as the reaction chamber, the yield is improved by 18 percent and the energy consumption is reduced by 25 percent in the same time.
Example 2:
the cross sections of the stainless steel heat-insulating outer shell 1 and the graphite inner heat-insulating cavity 4 are elliptical, and the cross section size of the inner heat-insulating cavity 4 is 4/5 of the cross section size of the stainless steel heat-insulating outer shell 1; ceramic heaters are adopted as heating units 5, a plurality of ceramic heaters are equidistantly arranged on the inner side wall of the inner heat preservation cavity 2, a plurality of gas baffles 8 are equidistantly arranged on the inner side wall of the inner heat preservation cavity 4, and when coating films, a plurality of graphite boats with substrates are placed in the inner heat preservation cavity 4, and vacuum pumping is carried out on the stainless steel cavity until the background vacuum is set; the heating unit is started to heat for 10 minutes to reach the process temperature, and the process temperature is kept, meanwhile, the main gas supply unit 2 is used for supplying process gas, the process gas forms vortex under the action of the gas baffle 8 through the gas homogenizing unit 3, and the product surface is uniformly coated; pulse radio frequency power is introduced through the counter electrode, the pulse radio frequency excites heated thin process gas to carry out glow discharge to form plasma, and the plasma is accelerated between the polar plates to strike the gas and move to the surface of the substrate to finish the coating process by applying opposite alternating voltage to the two corresponding graphite sheets. After the film coating process is finished, a pulse radio frequency power supply is turned off, air supply is stopped, residual process gas is pumped, nitrogen is repeatedly filled in and vacuumized, the vacuum is broken by the nitrogen, a sealing door 13 of stainless steel is opened, a graphite boat is taken out, and the whole process is finished, so that the antireflection film is obtained; compared with the quartz tube used as the reaction chamber, the yield is improved by 20 percent and the energy consumption is reduced by 29 percent in the same time.
Example 3:
the cross sections of the stainless steel heat-insulating outer shell 1 and the graphite inner heat-insulating cavity 4 are rectangular, and the cross section size of the inner heat-insulating cavity 4 is 2/3 of the cross section size of the stainless steel heat-insulating outer shell 1; the method comprises the steps that a resistance type armoured heater is adopted as a heating unit 5, a plurality of resistance type armoured heaters are equidistantly arranged on the inner side wall of an inner heat preservation cavity 4, a plurality of gas baffles 8 are equidistantly arranged on the inner side wall of the inner heat preservation cavity 4, and when coating films, a plurality of graphite boats 14 with substrates are placed in the inner heat preservation cavity 4, and vacuum pumping is carried out on a heat preservation outer shell 1 until the background vacuum is set; the heating unit 5 is started to heat for 25 minutes to reach the process temperature, and the process temperature is kept, meanwhile, the main gas supply unit 2 is used for supplying process gas, the process gas forms vortex under the action of the gas baffle 8 through the gas homogenizing unit 3, and the product surface is uniformly coated with the process gas; the pulse radio frequency power supply is introduced through the counter electrode 6, the pulse radio frequency excites the heated thin process gas to carry out glow discharge to form plasma, and the plasma accelerates the impact gas between the polar plates through the two corresponding graphite sheets and the opposite alternating voltage, and moves to the surface of the substrate to finish the coating process. After the film coating process is finished, a pulse radio frequency power supply is turned off, air supply is stopped, residual process gas is pumped, nitrogen is repeatedly filled and vacuumized, nitrogen is filled in to break vacuum, a stainless steel sealing door 13 is opened to take out a graphite boat, the whole process is finished, the anti-reflection film is obtained, the yield is improved by 20% compared with the process that a quartz tube is used as a reaction chamber, and the energy consumption is reduced by 30%.
The novel tubular PECVD equipment and the coating process thereof provided by the embodiment of the application are described in detail. The above description of embodiments is only for aiding in the understanding of the method of the present application and its core ideas; meanwhile, as those skilled in the art will have variations in the specific embodiments and application scope in accordance with the ideas of the present application, the present description should not be construed as limiting the present application in view of the above.
Certain terms are used throughout the description and claims to refer to particular components. Those of skill in the art will appreciate that a hardware manufacturer may refer to the same component by different names. The description and claims do not take the form of an element differentiated by name, but rather by functionality. As referred to throughout the specification and claims, the terms "comprising," including, "and" includes "are intended to be interpreted as" including/comprising, but not limited to. By "substantially" is meant that within an acceptable error range, a person skilled in the art is able to solve the technical problem within a certain error range, substantially achieving the technical effect. The description hereinafter sets forth a preferred embodiment for practicing the application, but is not intended to limit the scope of the application, as the description is given for the purpose of illustrating the general principles of the application. The scope of the application is defined by the appended claims.
It should also be noted that the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a product or system that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such product or system. Without further limitation, an element defined by the phrase "comprising one … …" does not exclude the presence of other like elements in a commodity or system comprising such elements.
It should be understood that the term "and/or" as used herein is merely one relationship describing the association of the associated objects, meaning that there may be three relationships, e.g., a and/or B, may represent: a exists alone, A and B exist together, and B exists alone. In addition, the character "/" herein generally indicates that the front and rear associated objects are an "or" relationship.
While the foregoing description illustrates and describes the preferred embodiments of the present application, it is to be understood that the application is not limited to the forms disclosed herein, but is not to be construed as limited to other embodiments, and is capable of numerous other combinations, modifications and environments and is capable of changes or modifications within the scope of the inventive concept as expressed herein, either as a result of the foregoing teachings or as a result of the knowledge or technology of the relevant art. And that modifications and variations which do not depart from the spirit and scope of the application are intended to be within the scope of the appended claims.
Claims (10)
1. A novel tubular PECVD apparatus, characterized in that the tubular PECVD apparatus comprises:
the heat-insulating outer shell is used for installing the inner heat-insulating cavity, forming a closed double-layer shell structure and realizing the pressure when the coating film is borne;
the main gas supply unit is arranged outside the heat-insulating outer shell and is used for providing process gas;
the air homogenizing unit is arranged between the heat preservation outer shell and the end part of the air inlet end of the inner heat preservation cavity and is used for receiving the process air provided by the main air supply unit and uniformly guiding the process air into the inner heat preservation cavity;
the heating unit is arranged on the inner side wall of the inner heat preservation cavity and is used for heating the process gas, the graphite boat and the substrate in the inner heat preservation cavity;
the inner heat preservation cavity is used for placing a graphite boat for loading a substrate and has the heat preservation and heat insulation functions;
and the counter electrodes are arranged on two sides of the heat-insulating outer shell, the end parts of the counter electrodes are inserted into the inner bottom of the inner heat-insulating cavity and are used for introducing a high-frequency power supply to ionize the heated process gas in the inner heat-insulating cavity, and the ionized gas is used for coating the substrate in the graphite boat.
2. The tube PECVD apparatus of claim 1, further comprising a gas barrier for extending a flow path of process gases in the inner insulating chamber, a plurality of rectangular gas barriers secured inside the inner insulating chamber.
3. The tubular PECVD apparatus of claim 1 or 2, further comprising an auxiliary air entrainment unit, a plurality of the auxiliary air entrainment units being disposed on a side wall of the insulating outer shell and in communication with the inner insulating cavity.
4. The tube PECVD apparatus of claim 2, wherein the gas barrier is graphite.
5. The tubular PECVD apparatus of claim 1, wherein the heat-insulating outer shell is a stainless steel shell, the ends of the two ends of the stainless steel shell are respectively provided with a sealing door and an exhaust flange, the sealing door is provided with a main air inlet, and the exhaust flange is provided with an exhaust outlet;
a front baffle is arranged in the stainless steel shell positioned at the inner side of the sealing door,
a rear baffle is arranged in the stainless steel shell positioned on the inner side of the exhaust flange.
6. The tube PECVD apparatus of claim 5, wherein the gas homogenizing unit comprises a uniform gas outlet aperture, and a gas homogenizing chamber;
wherein, a plurality of the uniform exhaust holes are uniformly arranged at the center of the rear baffle plate, and a plurality of the uniform air inlet holes are uniformly arranged at the center of the front baffle plate;
the air homogenizing chamber is formed between the front end of the heat preservation outer shell, the front baffle and the sealing door.
7. The tube PECVD apparatus of claim 1, wherein the counter electrode comprises a vacuum electrode and a graphite electrode.
8. The tube PECVD apparatus of claim 1, wherein the heating unit is one of an infrared heater, a ceramic heater, or a resistive sheathed heater.
9. The tube PECVD apparatus of claim 1, wherein the insulating outer shell has a rectangular-like, rectangular-like or oval-like cross-section; the material of interior heat preservation cavity is graphite, just interior heat preservation cavity's cross-section is class rectangle, rectangle or oval.
10. A coating process using the tubular PECVD apparatus according to any one of claims 1-9, characterized in that the coating process comprises the following steps:
s1) placing a plurality of graphite boats with substrates in an inner heat preservation cavity, and vacuumizing to set background vacuum;
s2) starting a heating unit to heat and keeping the temperature at the process temperature, and simultaneously introducing process gas through a main gas supply unit or the main gas supply unit and an auxiliary gas supply unit together to enable the process gas to flow in an inner heat preservation cavity and be heated to the process temperature;
s3) starting a counter electrode to introduce current, exciting heated process gas to form plasma, enabling the plasma to accelerate impact gas between polar plates through alternating current, enabling the plasma to move to the surface of a substrate, and coating the substrate;
s4) after the coating process is completed, repeatedly filling nitrogen and vacuumizing, and taking out the substrate carrying the coated film to complete the whole process.
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