CN115354298A - PECVD equipment graphite boat cleaning system - Google Patents
PECVD equipment graphite boat cleaning system Download PDFInfo
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- CN115354298A CN115354298A CN202210783572.6A CN202210783572A CN115354298A CN 115354298 A CN115354298 A CN 115354298A CN 202210783572 A CN202210783572 A CN 202210783572A CN 115354298 A CN115354298 A CN 115354298A
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims abstract description 59
- 229910002804 graphite Inorganic materials 0.000 title claims abstract description 59
- 239000010439 graphite Substances 0.000 title claims abstract description 59
- 238000004140 cleaning Methods 0.000 title claims abstract description 33
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 title claims abstract description 25
- 238000000034 method Methods 0.000 claims abstract description 27
- 230000008569 process Effects 0.000 claims abstract description 19
- 238000005429 filling process Methods 0.000 claims abstract 2
- 230000008878 coupling Effects 0.000 claims description 18
- 238000010168 coupling process Methods 0.000 claims description 18
- 238000005859 coupling reaction Methods 0.000 claims description 18
- 239000000919 ceramic Substances 0.000 claims description 14
- 230000001939 inductive effect Effects 0.000 claims description 8
- 239000012212 insulator Substances 0.000 claims description 2
- 230000007613 environmental effect Effects 0.000 abstract description 3
- 230000002035 prolonged effect Effects 0.000 abstract description 3
- 239000007789 gas Substances 0.000 description 28
- 238000000576 coating method Methods 0.000 description 10
- 230000007246 mechanism Effects 0.000 description 9
- 239000000463 material Substances 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 238000005086 pumping Methods 0.000 description 7
- 239000000243 solution Substances 0.000 description 6
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- 229910052731 fluorine Inorganic materials 0.000 description 5
- 239000011737 fluorine Substances 0.000 description 5
- 238000007747 plating Methods 0.000 description 5
- 238000001039 wet etching Methods 0.000 description 5
- 229910021419 crystalline silicon Inorganic materials 0.000 description 4
- 238000001312 dry etching Methods 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 238000011068 loading method Methods 0.000 description 3
- 238000012423 maintenance Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000010842 industrial wastewater Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 101100409194 Rattus norvegicus Ppargc1b gene Proteins 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 230000036470 plasma concentration Effects 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- -1 polytetrafluoroethylene Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 238000012549 training Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000004065 wastewater treatment Methods 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4405—Cleaning of reactor or parts inside the reactor by using reactive gases
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
The invention discloses a graphite boat cleaning system of PECVD (plasma enhanced chemical vapor deposition) equipment, which comprises a vacuum chamber, a discharge unit and a gas introduction unit, wherein the gas introduction unit is communicated with the vacuum chamber and is used for filling process gas into the vacuum chamber, and the discharge unit is arranged on the vacuum chamber and is used for ionizing the process gas to generate plasma. The invention has the advantages of low cost, small occupied area, environmental protection, prolonged service life of the graphite boat and the like.
Description
Technical Field
The invention mainly relates to the technical field of graphite boat cleaning, in particular to a graphite boat cleaning system of PECVD equipment.
Background
The development of the existing crystalline silicon solar cell products goes through the process of a conventional cell-perc cell-topcon, hit cell. Conventional batteries have been replaced by perc batteries, the production process thereof has been solidified, and a new generation of topcon and hit high-efficiency batteries is currently being industrialized. The pecvd equipment and graphite boat loading tool were not left in the manufacturing process for either generation of battery. The Pecvd equipment is key equipment in the production process of the crystalline silicon solar cell and is mainly used for plating a passivation film, an antireflection film, an amorphous silicon film and the like. It is a process of ionizing process gas by utilizing discharge between electrodes to form new compounds to be deposited on the surface of a silicon wafer. The graphite boat is a tool for loading silicon wafers and is also an electrode for discharging. The graphite boat is used as a silicon wafer loading tool of the pecvd equipment, the consumption is large, once the surface of the graphite boat is blocked by an insulating film, the surface conductivity of the graphite boat is reduced, even the graphite boat is not conductive, and therefore, the discharge cannot be carried out, so that the graphite boat needs to be cleaned regularly.
At present, the graphite boat for PECVD equipment in the solar cell adopts a wet etching method to remove surface coatings, including SiN, amorphous silicon and the like. The adopted process comprises the following steps: decomposing a graphite boat, soaking graphite boat parts in acid liquor to remove a surface coating, rinsing with deionized water, drying, assembling, and plating a protective film on the surface.
This process has the following problems:
1. because the boat parts need to be soaked in the aqueous solution every time, the liquid such as acid, water and the like can permeate into the material, the performance of the material is changed, the service life is reduced, and the graphite boat is scrapped after being cleaned for about 5 times;
2. the solution for cleaning the boat is strong acid or fluorine-containing solution, so that the wastewater treatment cost is high;
3. after each cleaning, a layer of protective film needs to be plated on the surface of the boat before film plating, namely saturation is carried out, so that the effective service time of the pecvd equipment is reduced;
4. water, electricity and special gas are needed when saturation is performed each time, so that the use cost is increased;
5. the cleaning equipment needs special equipment, has low matching degree with the host equipment and has high operation and use requirements;
6. the cleaning equipment adopts a groove type structure, so that the occupied area is large, and the cost of the purification room is increased.
Disclosure of Invention
The technical problem to be solved by the invention is as follows: aiming at the problems in the prior art, the invention provides a PECVD equipment graphite boat cleaning system which is low in cost, environment-friendly and capable of prolonging the service life of a graphite boat.
In order to solve the technical problems, the technical scheme provided by the invention is as follows:
the utility model provides a PECVD equipment graphite boat cleaning system, includes vacuum chamber, discharge unit and gas introduction unit, gas introduction unit is linked together with the vacuum chamber for to fill in process gas in the vacuum chamber, the discharge unit install in on the vacuum chamber for carry out the ionization to process gas and produce plasma.
As a further improvement of the above technical solution:
the discharge unit adopts a capacitive coupling structure form and comprises a first discharge polar plate, a second discharge polar plate and a radio frequency power supply, wherein the first discharge polar plate and the second discharge polar plate are positioned above the vacuum cavity and mutually enclose to form an air chamber, the first discharge polar plate is provided with an air inlet, the air inlet is connected with the gas leading-in unit, the second discharge polar plate is positioned in the vacuum cavity and is provided with a plurality of air holes, and the radio frequency power supply is electrically connected with the first discharge polar plate and the second discharge polar plate.
And an air inlet baffle is arranged at the air inlet of the air chamber.
And insulation pieces are arranged between the first discharge polar plate and the vacuum chamber and between the second discharge polar plate and the chamber cover of the vacuum chamber.
The air chambers are sequentially arranged along the length direction of the vacuum chamber to form an array structure.
The discharge unit adopts the inductive coupling structural style, including ceramic plate, coil and radio frequency power supply, the ceramic plate is located the top of vacuum chamber, the coil distributes the top of ceramic plate, radio frequency power supply links to each other with the coil.
The gas introduction unit comprises a plurality of capillaries, the capillaries are arranged along the length direction of the vacuum chamber, and small holes are distributed on each capillary.
The vacuum chamber is a horizontal square cavity or a horizontal round cavity.
The vacuum chambers are distributed in the frame and are consistent with the structural form of the PECVD equipment.
The graphite boat is characterized by further comprising a bias power supply, wherein the bias power supply is electrically connected with the graphite boat through a bias electrode.
Compared with the prior art, the invention has the advantages that:
the invention adopts a dry etching method to remove the plating on the surface of the graphite boat, takes fluorine-based gas as process gas, and utilizes plasma generated by the discharge of a radio frequency power supply to clean the plating on the surface of the graphite boat, and compared with the wet etching method, the method has the following advantages:
1) The graphite boat is not placed in the aqueous solution, so that the boat body material is not damaged, the service life of the graphite boat is greatly prolonged, and the production process cost of the crystalline silicon solar cell is reduced;
2) Strong acid or fluorine-containing solution is not needed, so that the environmental discharge requirement of industrial wastewater is reduced;
3) The etching depth is controllable, a part can be etched according to the thickness of the coating, a certain thickness is reserved, a saturated coating process after wet etching is omitted, and the auxiliary time of pecvd equipment is saved;
4) The structural form of the apparatus is similar to that of the existing pecvd apparatus, and the apparatus is compatible with a sheet feeding mechanism and a vacuum system of the pecvd apparatus.
Drawings
Fig. 1 is a sectional structural view of a cleaning system of the present invention in an embodiment.
FIG. 2 is a side view structural diagram of the capacitively coupled vacuum chamber of the present invention; wherein (a) is a rectangular chamber; and (b) is a circular chamber.
FIG. 3 is a side view structural diagram of an inductively coupled vacuum chamber of the present invention; wherein (a) is a rectangular chamber; and (b) is a circular chamber.
FIG. 4 is a front view of the cleaning system of the present invention in a particular application.
FIG. 5 is a side view of the cleaning system of the present invention in a particular application.
Fig. 6 is a schematic diagram of the capacitive coupling of the present invention.
Fig. 7 is an inductive coupling schematic of the present invention.
Illustration of the drawings: 1. a vacuum chamber; 101. a chamber cover; 2. a discharge unit; 201. a first discharge electrode plate; 202. a second discharge electrode plate; 2021. air holes; 203. a radio frequency power supply; 204. an insulating member; 205. a ceramic plate; 206. a coil; 3. a gas introduction unit; 301. an air inlet; 302. an intake baffle; 303. a capillary tube; 304. an air chamber; 4. a vacuum pumping unit; 401. a vacuum pump; 402. an air exhaust port; 5. a bias power supply; 501. a bias electrode; 6. a graphite boat; 7. a boat taking and delivering mechanism; 8. and a frame.
Detailed Description
The invention is further described below with reference to the figures and the specific embodiments of the description.
As shown in fig. 1, the PECVD equipment graphite boat cleaning system of the embodiment of the invention adopts a dry etching method to remove the surface coating of the graphite boat 6, and the specific structure comprises a vacuum chamber 1, a discharge unit 2, a gas introduction unit 3 and a vacuum pumping unit 4, wherein the vacuum pumping unit 4 is communicated with the vacuum chamber 1 and is used for performing vacuum pumping operation on the vacuum chamber 1; the gas introduction unit 3 communicates with the vacuum chamber 1 to introduce a process gas into the vacuum chamber 1, and the discharge unit 2 is mounted on the vacuum chamber 1 to ionize the process gas to generate plasma.
The invention adopts a dry etching method to remove the surface coating of the graphite boat 6, takes fluorine-based gas as process gas, and utilizes the discharge of the radio frequency power supply 203 to generate plasma to clean the surface coating of the graphite boat 6, and compared with a wet etching method, the method has the following advantages:
1) The graphite boat 6 is not placed in the aqueous solution, so that the boat body material is not damaged, the service life of the graphite boat 6 is greatly prolonged, and the production process cost of the crystalline silicon solar cell is reduced;
2) Strong acid or fluorine-containing solution is not needed, so that the environmental discharge requirement of industrial wastewater is reduced;
3) The etching depth is controllable, a part can be etched according to the thickness of the coating, a certain thickness is reserved, a saturated coating process after wet etching is omitted, and the auxiliary time of pecvd equipment is saved;
4) The structural form of the apparatus is similar to that of the existing pecvd apparatus, and the apparatus is compatible with a sheet feeding mechanism and a vacuum system of the pecvd apparatus.
The current dry etching technology is mainly used in the semiconductor manufacturing process and is mainly used for pattern transfer in the semiconductor device production process. The plasma is generated by ionizing reaction gas, ions in the active plasma react with the surface material of the workpiece to generate gaseous compounds which are blown away, so that the purpose of cleaning the surface of the workpiece is achieved.
In a specific embodiment, the discharge unit 2 adopts a capacitive coupling structure form, and includes a first discharge electrode plate 201, a second discharge electrode plate 202, and a radio frequency power supply 203, the first discharge electrode plate 201 and the second discharge electrode plate 202 are located above the vacuum chamber 1 and mutually enclose to form an air chamber 304, the first discharge electrode plate 201 is provided with an air inlet 301, the air inlet 301 is connected with the gas introducing unit 3, the second discharge electrode plate 202 is located in the vacuum chamber 1 and is distributed with a plurality of air holes 2021, and the radio frequency power supply 203 is electrically connected with the first discharge electrode plate 201 and the second discharge electrode plate 202. Wherein an intake baffle 302 is provided at the air inlet 301 of the plenum 304.
The process gas is conveyed into the gas chamber 304 from the gas inlet 301, enters the gas chamber 304 after being blocked by the gas inlet baffle 302, is sprayed out of the gas holes 2021 uniformly distributed on the second polar plate, enters the vacuum chamber 1 for discharge ionization, and forms active ions to corrode and remove the surface of the material; wherein each discharge plate is connected with a radio frequency power supply 203, thereby realizing the ionization of the process gas. The blocking of the air inlet baffle 302 is matched with the atmosphere chamber 304, so that the air pressure in the atmosphere chamber 304 is balanced, and the air ejected from the air holes 2021 is ensured to be uniform as much as possible.
In one embodiment, the insulators 204 are disposed between the first and second discharge plates 201 and 202 and the chamber cover 101 of the vacuum chamber 1, so as to electrically isolate each discharge plate from the chamber cover 101, prevent electrical short circuit, and prevent the discharge sparking of each discharge plate from the side wall of the vacuum chamber 1, which results in unstable plasma concentration and thus non-uniform corrosion. The discharge electrode plate is made of aluminum alloy material, the insulating piece 204 is made of materials with good insulating property and small thermal expansion coefficient, including but not limited to polytetrafluoroethylene, epoxy resin and the like, and because the insulating piece 204 is an elastic piece, the thermal expansion space of each material can be reserved.
In another embodiment, as shown in FIG. 3, the discharge unit 2 is in the form of an inductively coupled structure including a ceramic board 205, a coil 206, and a radio frequency power source 203, the ceramic board 205 is positioned above the vacuum chamber 1, the inductive coil 206 is distributed above the ceramic board 205, and the radio frequency power source 203 is connected to the coil 206. Inductive coupling uses ceramic board 205 as the coupling window and inductor coil 206 is placed outside the vacuum chamber cavity. The ceramic plate 205 has two functions, the first function is to cooperate with the vacuum chamber 1 to form a vacuum seal; secondly, radio frequency energy is not blocked, and energy penetration is facilitated.
For the inductively coupled configuration, the gas introduction unit 3 includes a plurality of capillary tubes 303 drilled with a plurality of small holes, which are distributed on both sides of the ceramic coupling window, corresponding to the length of the vacuum chamber 1, as shown in fig. 3.
In one embodiment, since the graphite has a large size and a long strip structure, a plurality of air chambers 304 are adopted for reducing the cost and preventing the standing wave effect, and the air chambers 304 are sequentially arranged along the axial direction of the vacuum chamber 1 to form an array structure. The corresponding discharge unit 2 adopts a plurality of coupling window array arrangement structures, and the area of a capacitive coupling discharge plate or the size of the ceramic plate 205 in inductive coupling is reduced. Wherein the coupling window array is shown in fig. 1, 6 and 7, i.e. one large capacitive coupling or inductive coupling is changed into a combination of a plurality of small capacitive couplings or inductive couplings.
In a specific embodiment, bias voltage is independently applied to the graphite boat 6 through the bias power supply 5, so that the plasma has polarity on the surface of the graphite boat 6, and the plasma with opposite polarity is attracted, so that the plasma is accelerated to bombard the surface of the graphite boat 6, the corrosion rate is improved, and the process time is saved. As shown in fig. 1, a bias electrode 501 of a bias power supply 5 is inserted into the vacuum chamber 1 through an inlet at the lower part of the vacuum chamber 1 to bias the graphite boat 6 alone.
As shown in fig. 2 and 3, in an embodiment, the vacuum chamber 1 is a horizontal square chamber or a horizontal circular chamber for accommodating the graphite boat 6, and is configured according to the size of the largest existing graphite boat 6 and compatible with the small-sized graphite boat 6. Wherein the vacuum chamber 1 is made of aluminum alloy material, and the surface of the vacuum chamber is anodized to increase the corrosion resistance. The graphite boat 6 is sent into the vacuum chamber 1 from one end of the vacuum chamber 1 through the boat taking and placing mechanism 7, the vacuumizing unit 4 (such as a vacuum pump) is arranged at the other end of the vacuum chamber 1 or at the bottom of the vacuum chamber 1, specifically, the bottom of the vacuum chamber 1 is provided with an air pumping channel, and the bottom and the end of the air pumping channel are provided with an air pumping hole 402.
As shown in FIG. 4, the structure of the current PECVD apparatus is a multi-layer structure, and the vacuum chambers 1 can be arranged in multiple layers in the rack 8, in accordance with the structure of the current PECVD apparatus. The boat conveying mechanism can use pecvd equipment, so that the operation and maintenance are easy to master; the boat is placed into the vacuum chamber 1 for coating by utilizing the boat taking and feeding mechanism 7, the vacuum chamber 1 can be compatible with the existing PECVD equipment, and when the graphite boat 6 needs to be cleaned, the graphite boat 6 does not need to be taken down, and the graphite boat 6 can be directly placed into the etching chamber for cleaning by utilizing the boat taking and feeding mechanism 7. Of course, the vacuum unit 4 can also be used with existing pecvd equipment, reducing equipment maintenance costs. The cleaning system is highly compatible with pecvd equipment, and the cost of personnel operation training and equipment maintenance is reduced; and overall structure's area is little, practices thrift and produces the line cost.
The graphite boat 6 cleaning process is as follows: 1. the graphite boat 6 enters the vacuum chamber 1 by using the boat taking and placing mechanism 7, the chamber cover 101 is closed at the moment, and the vacuum pump 501 is vacuumized; 2. introducing cleaning gas and introducing radio frequency energy; 3. after a certain time, the radio frequency power supply 203 and the cleaning gas are closed, the process is completed, and the vacuum chamber 1 is filled with atmosphere to break vacuum; 4. the taking and placing boat mechanism 7 enters the vacuum chamber 1 to take out the graphite boat 6, and the cleaning process is completed. Of course, the above can also be applied to the cleaning of the quartz boat in the diffusion furnace.
As used in this disclosure and in the claims, the terms "a," "an," "the," and/or "the" are not intended to be inclusive in the singular, but rather are inclusive in the plural unless the context clearly dictates otherwise. The use of "first," "second," and the like in this disclosure is not intended to indicate any order, quantity, or importance, but rather is used to distinguish one element from another. Likewise, the word "comprising" or "comprises", and the like, means that the element or item listed before the word covers the element or item listed after the word and its equivalents, but does not exclude other elements or items. The terms "connected" or "coupled" and the like are not restricted to physical or mechanical connections, but may include electrical connections, whether direct or indirect.
The above is only a preferred embodiment of the present invention, and the protection scope of the present invention is not limited to the above-mentioned embodiments, and all technical solutions belonging to the idea of the present invention belong to the protection scope of the present invention. It should be noted that modifications and embellishments within the scope of the invention may be made by those skilled in the art without departing from the principle of the invention.
Claims (10)
1. The cleaning system for the graphite boat of the PECVD equipment is characterized by comprising a vacuum chamber (1), a discharge unit (2) and a gas introduction unit (3), wherein the gas introduction unit (3) is communicated with the vacuum chamber (1) and is used for filling process gas into the vacuum chamber (1), and the discharge unit (2) is installed on the vacuum chamber (1) and is used for ionizing the process gas to generate plasma.
2. The PECVD equipment graphite boat cleaning system as claimed in claim 1, wherein the discharge unit (2) adopts a capacitive coupling structure form and comprises a first discharge electrode plate (201), a second discharge electrode plate (202) and a radio frequency power supply (203), the first discharge electrode plate (201) and the second discharge electrode plate (202) are positioned above the vacuum chamber (1) and mutually enclose to form a gas chamber (304), the first discharge electrode plate (201) is provided with a gas inlet (301), the gas inlet (301) is connected with the gas introducing unit (3), the second discharge electrode plate (202) is positioned in the vacuum chamber (1) and distributed with a plurality of gas holes (2021), and the radio frequency power supply (203) is electrically connected with the first discharge electrode plate (201) and the second discharge electrode plate (202).
3. The PECVD apparatus graphite boat cleaning system as claimed in claim 2, wherein the gas chamber (304) is provided with a gas inlet baffle (302) at a gas inlet (301).
4. A PECVD equipment graphite boat cleaning system according to the claim 2 or 3, characterized in that an insulator (204) is arranged between the first discharge electrode plate (201) and the second discharge electrode plate (202) and the chamber cover (101) of the vacuum chamber (1).
5. A PECVD apparatus graphite boat cleaning system according to claim 2 or 3, characterized in that a plurality of the gas chambers (304) are arranged in sequence along the length direction of the vacuum chamber (1) to form an array structure.
6. A PECVD apparatus graphite boat cleaning system according to claim 2 or 3, characterized in that the discharge unit (2) adopts an inductive coupling structure form, comprising a ceramic plate (205), a coil (206) and a radio frequency power supply (203), wherein the ceramic plate (205) is positioned above the vacuum chamber (1), the coil (206) is distributed above the ceramic plate (205), and the radio frequency power supply (203) is connected with the coil (206).
7. The PECVD apparatus graphite boat cleaning system as claimed in claim 6, wherein the gas introducing unit (3) comprises a plurality of capillaries (303), the plurality of capillaries (303) are arranged along the length direction of the vacuum chamber (1), and small holes are distributed on each capillary (303).
8. A PECVD apparatus graphite boat cleaning system according to claim 1, 2 or 3, characterized in that the vacuum chamber (1) is a horizontal square chamber or a horizontal circular chamber.
9. A PECVD apparatus graphite boat cleaning system as in claim 8, wherein the vacuum chambers (1) are distributed in a rack (8) and are consistent with the structure of the PECVD apparatus.
10. A PECVD apparatus graphite boat cleaning system according to claim 1, 2 or 3, characterized by further comprising a bias power supply (5), wherein the bias power supply (5) is electrically connected with the graphite boat (6) through a bias electrode (501).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210783572.6A CN115354298A (en) | 2022-07-05 | 2022-07-05 | PECVD equipment graphite boat cleaning system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210783572.6A CN115354298A (en) | 2022-07-05 | 2022-07-05 | PECVD equipment graphite boat cleaning system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN115354298A true CN115354298A (en) | 2022-11-18 |
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Family Applications (1)
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| CN202210783572.6A Pending CN115354298A (en) | 2022-07-05 | 2022-07-05 | PECVD equipment graphite boat cleaning system |
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| CN116197184A (en) * | 2023-03-29 | 2023-06-02 | 通威太阳能(眉山)有限公司 | Cleaning method of Poly boat |
| CN116251803A (en) * | 2023-04-12 | 2023-06-13 | 东莞市晟鼎精密仪器有限公司 | Graphite boat cleaning equipment for cleaning silicon nitride coating based on microwave plasma dry method |
| CN116550689A (en) * | 2023-04-27 | 2023-08-08 | 东莞市晟鼎精密仪器有限公司 | Process for removing silicon nitride coating of graphite boat by dry method |
| CN116623154A (en) * | 2023-05-23 | 2023-08-22 | 东莞嘉拓日晟智能科技有限公司 | Novel tubular PECVD (plasma enhanced chemical vapor deposition) equipment and coating process thereof |
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116197184A (en) * | 2023-03-29 | 2023-06-02 | 通威太阳能(眉山)有限公司 | Cleaning method of Poly boat |
| CN116251803A (en) * | 2023-04-12 | 2023-06-13 | 东莞市晟鼎精密仪器有限公司 | Graphite boat cleaning equipment for cleaning silicon nitride coating based on microwave plasma dry method |
| CN116251803B (en) * | 2023-04-12 | 2023-09-22 | 东莞市晟鼎精密仪器有限公司 | Graphite boat cleaning equipment for cleaning silicon nitride coating based on microwave plasma dry method |
| CN116550689A (en) * | 2023-04-27 | 2023-08-08 | 东莞市晟鼎精密仪器有限公司 | Process for removing silicon nitride coating of graphite boat by dry method |
| CN116550689B (en) * | 2023-04-27 | 2024-02-09 | 东莞市晟鼎精密仪器有限公司 | Process for removing silicon nitride coating of graphite boat by dry method |
| CN116623154A (en) * | 2023-05-23 | 2023-08-22 | 东莞嘉拓日晟智能科技有限公司 | Novel tubular PECVD (plasma enhanced chemical vapor deposition) equipment and coating process thereof |
| CN116623154B (en) * | 2023-05-23 | 2024-01-02 | 东莞嘉拓日晟智能科技有限公司 | Tubular PECVD equipment and coating process thereof |
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