CN116354717A - 一种超薄陶瓷基片的加工方法 - Google Patents
一种超薄陶瓷基片的加工方法 Download PDFInfo
- Publication number
- CN116354717A CN116354717A CN202310398300.9A CN202310398300A CN116354717A CN 116354717 A CN116354717 A CN 116354717A CN 202310398300 A CN202310398300 A CN 202310398300A CN 116354717 A CN116354717 A CN 116354717A
- Authority
- CN
- China
- Prior art keywords
- ceramic substrate
- finished product
- semi
- grinding
- ultrathin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000919 ceramic Substances 0.000 title claims abstract description 110
- 239000000758 substrate Substances 0.000 title claims abstract description 71
- 238000003672 processing method Methods 0.000 title claims abstract description 11
- 238000000227 grinding Methods 0.000 claims abstract description 47
- 239000011265 semifinished product Substances 0.000 claims abstract description 45
- 238000005245 sintering Methods 0.000 claims abstract description 26
- 238000005520 cutting process Methods 0.000 claims abstract description 25
- 239000000843 powder Substances 0.000 claims abstract description 23
- 238000005498 polishing Methods 0.000 claims abstract description 12
- 239000000047 product Substances 0.000 claims abstract description 11
- 238000002156 mixing Methods 0.000 claims abstract description 10
- 238000003825 pressing Methods 0.000 claims abstract description 4
- 238000000034 method Methods 0.000 claims description 20
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 12
- 238000004321 preservation Methods 0.000 claims description 12
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 10
- 229910052802 copper Inorganic materials 0.000 claims description 10
- 239000010949 copper Substances 0.000 claims description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 9
- 239000002994 raw material Substances 0.000 claims description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 7
- 239000007788 liquid Substances 0.000 claims description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 6
- 239000012530 fluid Substances 0.000 claims description 6
- 235000012239 silicon dioxide Nutrition 0.000 claims description 6
- 239000000377 silicon dioxide Substances 0.000 claims description 6
- 229910003460 diamond Inorganic materials 0.000 claims description 4
- 239000010432 diamond Substances 0.000 claims description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 3
- 238000004140 cleaning Methods 0.000 claims description 3
- 239000008367 deionised water Substances 0.000 claims description 3
- 229910021641 deionized water Inorganic materials 0.000 claims description 3
- 239000008213 purified water Substances 0.000 claims description 3
- 230000003068 static effect Effects 0.000 claims description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 2
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 2
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 abstract description 7
- 238000000462 isostatic pressing Methods 0.000 abstract 1
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 6
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 5
- 238000005452 bending Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 241001391944 Commicarpus scandens Species 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000010345 tape casting Methods 0.000 description 3
- 229910001868 water Inorganic materials 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000003139 buffering effect Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000001050 lubricating effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 239000011435 rock Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28B—SHAPING CLAY OR OTHER CERAMIC COMPOSITIONS; SHAPING SLAG; SHAPING MIXTURES CONTAINING CEMENTITIOUS MATERIAL, e.g. PLASTER
- B28B3/00—Producing shaped articles from the material by using presses; Presses specially adapted therefor
- B28B3/02—Producing shaped articles from the material by using presses; Presses specially adapted therefor wherein a ram exerts pressure on the material in a moulding space; Ram heads of special form
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B29/00—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
- B24B29/02—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents designed for particular workpieces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/04—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools
- B28D5/045—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools by cutting with wires or closed-loop blades
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/48—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zirconium or hafnium oxides, zirconates, zircon or hafnates
- C04B35/481—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zirconium or hafnium oxides, zirconates, zircon or hafnates containing silicon, e.g. zircon
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/64—Burning or sintering processes
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3201—Alkali metal oxides or oxide-forming salts thereof
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3217—Aluminum oxide or oxide forming salts thereof, e.g. bauxite, alpha-alumina
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3231—Refractory metal oxides, their mixed metal oxides, or oxide-forming salts thereof
- C04B2235/3232—Titanium oxides or titanates, e.g. rutile or anatase
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/327—Iron group oxides, their mixed metal oxides, or oxide-forming salts thereof
- C04B2235/3272—Iron oxides or oxide forming salts thereof, e.g. hematite, magnetite
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/34—Non-metal oxides, non-metal mixed oxides, or salts thereof that form the non-metal oxides upon heating, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3418—Silicon oxide, silicic acids, or oxide forming salts thereof, e.g. silica sol, fused silica, silica fume, cristobalite, quartz or flint
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/44—Metal salt constituents or additives chosen for the nature of the anions, e.g. hydrides or acetylacetonate
- C04B2235/444—Halide containing anions, e.g. bromide, iodate, chlorite
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/65—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes
- C04B2235/656—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes characterised by specific heating conditions during heat treatment
- C04B2235/6567—Treatment time
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/65—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes
- C04B2235/66—Specific sintering techniques, e.g. centrifugal sintering
- C04B2235/661—Multi-step sintering
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Structural Engineering (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Composite Materials (AREA)
- Compositions Of Oxide Ceramics (AREA)
Abstract
本发明公开一种超薄陶瓷基片的加工方法，首先将陶瓷粉料按照一定重量比混合，置于模具内；后通过等静压设备，压制出高密度的胚料；接着将得到的胚料进行烧结，得到结构陶瓷半成品；然后将结构陶瓷半成品磨平后通过陶瓷基片切割机进行线切，得到超薄陶瓷基片半成品；再将超薄陶瓷基片半成品置于工装中通过研磨机进行研磨；最后将研磨后的超薄陶瓷基片通过抛光机进行抛光，得到成品。本发明在保证成品率不下降的情况下，优化生产工艺，一次研磨成型极薄的超薄陶瓷基片。
Description
技术领域
本发明涉及陶瓷基片加工技术领域，尤其涉及一种超薄陶瓷基片的加工方法。
背景技术
结构陶瓷属于一种缝隙均匀的陶瓷，具有优越的强度、硬度、绝缘性、热传导、耐高温、耐氧化、耐腐蚀、耐磨耗、高温强度等特点。陶瓷的其中一项重要的加工工艺是进行切割，往往借助切割工具进行切割处理，但是对于大部分陶瓷来说，自身的质地较脆，随着锯片或者激光的伸入，极易由于受力的偏差导致破碎，从而提高加工成本，现有的切割机为了满足成品率的要求，通常仅能加工几十毫米的陶瓷基片，难以满足超薄基片陶瓷的切割需求，且操作时控制精度低，加工效率低，加工效果难以保持均匀。
现有的超薄陶瓷基片加工工艺中，常规采取流延工艺为主。首先将陶瓷粉料按照一定比例混合后形成浆料，通过刮刀将基带上的料浆刮到固定厚度，一般是0.5mm左右后，进行干燥和固化，得到毛胚料。将毛胚料进行烧结后得到半成品基片，将半成品基片通过粗磨，中磨，精模后得到0.2-0.3mm的超薄陶瓷基片，但是因为基料的原因，通过流岩工艺得到的毛坯料密度较低，强度较差，在后续打磨过程中很容易发生碎裂，产品成品率太低，加工工序复杂。
发明内容
本发明的目的在于提供一种超薄陶瓷基片的加工方法，在保证成品率不下降的情况下，优化生产工艺，一次研磨成型极薄的超薄陶瓷基片。
为达成上述目的，本发明提供一种超薄基片陶瓷的加工方法，组成所述陶瓷基片的组分及其按质量百分比的含量为：Zr(Hf)O2：≥94％，Y2O3：5.25±0.25％，Al2O3：0.25±0.02％，Fe2O3：<0.005％，SiO2：<0.02％，TiO2：<0.005％，Na2O：<0.005％，Cl-：<0.05％，H2O：<1％；
所述加工方法以下包括步骤：
步骤1：首先将上述原料组分按照重量比混合成陶瓷粉料，将陶瓷粉料置于模具内，接着通过静压设备，压制出高密度的胚料；
步骤2：将步骤1得到的胚料进行烧结，得到结构陶瓷半成品；
步骤3：采用磨床设备将步骤2得到的结构陶瓷半成品的表面磨平；
步骤4：将步骤3磨平后得到的结构陶瓷半成品通过陶瓷基片切割机进行线切，得到厚度在0.08～0.3mm之间的超薄陶瓷基片半成品；
步骤5：将步骤4得到的超薄陶瓷基片半成品置于工装中通过研磨机进行研磨，得到厚度在0.05～0.15mm之间的超薄陶瓷基片；
步骤6：将步骤5研磨后得到的超薄陶瓷基片通过抛光机进行抛光，抛光至表面无划痕，得到成品。
进一步，所述步骤2中，具有三个烧结阶段：第一阶段的烧结温度为140～150℃，保温时间为5min；第二阶段的烧结温度为1100～1200℃，保温时间为1h；第三阶段的烧结温度为1400～1450℃，保温时间为3h。
进一步，所述步骤5中的研磨机的底盘为铜盘，所述铜盘中铜和金刚石粉的质量比为1：0.002～0.003；所述研磨机在研磨时需持续滴入研磨液，同时在研磨过程中对超薄陶瓷基片半成品施加2～3kg的配重。
进一步，所述研磨液为以二氧化硅配纯净水按1:180～220的重量比混合作为基础磨液，再添加铝粉和砖石粉的二氧化硅研磨液，所述铝粉和砖石粉按3～5g/公斤磨液的配比加入。
进一步，还包括步骤7：将去离子水、酒精、丙酮中的一种或几种溶液混合均匀，对抛光后的成品进行超声波清洗。
采用上述方案后，本发明的有益效果在于：
本发明采用氧化锆(Zr(Hf)O2)为主要原料来加工陶瓷基片，烧结成的结构陶瓷半成品硬度高、密度大、结构紧凑，具有良好的抗弯曲性和耐磨性，不容易损坏和变形，以至于在线切时不容易断裂，所以可采用陶瓷基片切割机来线切结构陶瓷半成品，采用线切的方式可将结构陶瓷半成品切割至厚度0.08～0.3mm为超薄陶瓷基片半成品，线切后的超薄陶瓷基片半成品的厚度极薄，后续进行一次研磨就可得到超薄的陶瓷基片，简化了生产工艺，并且线切后得到的超薄陶瓷基片半成品的硬度也高，在研磨成型为超薄陶瓷基片时不容易碎裂，进一步保证成品率，而且研磨后制成的超薄陶瓷基片厚度可达到0.05mm，相较于现有技术来说更加轻薄；此外，本发明的原料中还含有三氧化二钇(Y2O3)，三氧化二钇可作为烧结助剂，可降低烧结温度和缩短保温时间，进一步简化生产工艺。综上，本发明加工时间短，成品率高，优化了生产工艺。
附图说明
图1为本发明的工艺流程图；
图2为本发明制成超薄陶瓷基片的结构示意图。
标号说明：
1、结构陶瓷半成品；2、超薄陶瓷基片半成品；3、超薄陶瓷基片。
具体实施方式
以下结合附图及具体实施例对本发明做详细的说明。
如图1-2所示，本发明提供一种超薄陶瓷基片的加工方法，组成所述陶瓷基片的组分及其按质量百分比的含量为：Zr(Hf)O2：≥94％，Y2O3：5.25±0.25％，Al2O3：0.25±0.02％，Fe2O3：<0.005％，SiO2：<0.02％，TiO2：<0.005％，Na2O：<0.005％，Cl-：<0.05％，H2O：<1％；
所述加工方法以下包括步骤：
步骤1：首先将上述原料组分按照重量比混合成陶瓷粉料，将陶瓷粉料置于模具内，接着通过静压设备，压制出高密度的胚料；
步骤2：将步骤1得到的胚料进行烧结，得到结构陶瓷半成品1；
步骤3：采用磨床设备将步骤2得到的结构陶瓷半成品1的表面磨平；
步骤4：将步骤3磨平后得到的结构陶瓷半成品1通过陶瓷基片切割机进行线切，得到厚度在0.08～0.3mm之间的超薄陶瓷基片半成品2；
步骤5：将步骤4得到的超薄陶瓷基片半成品2置于工装中通过研磨机进行研磨，得到厚度在0.05～0.15mm之间的超薄陶瓷基片3；
步骤6：将步骤5研磨后得到的超薄陶瓷基片3通过抛光机进行抛光，抛光至表面无划痕，得到成品；
步骤7：将去离子水、酒精、丙酮中的一种或几种溶液混合均匀，对抛光后的成品进行超声波清洗。
本发明采用氧化锆(Zr(Hf)O2)为主要原料来加工陶瓷基片，使烧结成的结构陶瓷半成品1硬度高、密度大、结构紧凑，具有良好的抗弯曲性和耐磨性，不容易损坏和变形，以至于在线切时不容易断裂，所以可采用线切的方式来切割结构陶瓷半成品1，具体可采用陶瓷基片切割机来切割结构陶瓷半成品1，所述陶瓷基片切割机优选公开号为CN107650281B的专利公开的一种可实现摇摆切割的多线切割机，切割效率和切割稳定性高、断线率低，安全性和可靠性高。如图2所示，采用线切的方式可将结构陶瓷半成品1切割至厚度为0.08～0.3mm的多个超薄陶瓷基片半成品2，线切后的超薄陶瓷基片半成品2的厚度极薄，已经达到现有技术流延工艺最终制成的陶瓷基片的厚度，甚至更薄，后续进行一次研磨就最终的超薄陶瓷基片3，研磨后制成的超薄陶瓷基片3厚度最薄可达到0.05mm，是流延工艺达不到的，并且线切后得到的超薄陶瓷基片半成品2的硬度也高，在研磨成型为超薄陶瓷基片3时不容易碎裂，进一步保证成品率，综上，本发明不仅缩短了加工时间和提高了成品率，还制成了比现有技术更加薄的超薄陶瓷基片3，因此，本发明优化了生产工艺。
在步骤2中，共有三个烧结阶段：第一阶段的烧结温度为140～150℃，优选150℃，保温时间为5min，该阶段的烧结温度较低、保温时间较短，主要起到预热的作用，且压制出的坯料内存在一定量的水分(H2O)，该阶段可将坯料内的水分蒸发，避免在后续的烧结过程中，水分渗入原料组分内，使烧结完成的结构陶瓷半成品1产生裂纹或表面出现气泡；第二阶段的烧结温度为1100～1200℃，优选1100℃，保温时间为1h，该阶段将坯料初步烧结成型；第三阶段的烧结温度为1400～1450℃，优选1440℃，保温时间为3h，该阶段为主要烧结阶段，通过1440℃的高温将坯料完全烧结成型为结构陶瓷半成品1，在该阶段中，烧结密度可达到5.8～6.2g/cm3之间，烧结密度大，得到的结构陶瓷半成品1的机械强度和耐高温性高，抗弯强度达到1200～1300MPa，抗弯强度高，在后续的线切和研磨步骤中，结构陶瓷半成品1不容易被切割断裂或被研磨碎裂，保证了成品率。此外，本发明的原料组分中还含有三氧化二钇(Y2O3)，三氧化二钇的含量仅次于氧化锆，可作为烧结助剂使用，从而降低烧结温度和缩短保温时间，无需将烧结温度达到1500℃以上，进一步简化了生产工艺。
在步骤3中，烧结完成的结构陶瓷半成品1并非规整的立方体结构，如图2所示，所以需要将进行磨平，可采用全自动平面磨床将结构陶瓷半成品1的表面磨平。
在步骤5中，所述研磨机的底盘优选为为铜盘，所述铜盘中铜和金刚石粉的质量比为1：0.002～0.003，所述铜和金刚石粉具有辅助研磨的作用；所述研磨机在研磨时需持续滴入研磨液，所述研磨在研磨过程中具有缓冲和润滑的作用，所述研磨液可为以二氧化硅配纯净水按1:180～220的重量比混合作为基础磨液，再添加铝粉和砖石粉的二氧化硅研磨液，所述铝粉和砖石粉按3～5g/公斤磨液的配比加入，所述铝粉和砖石粉同样具有辅助研磨的作用。此外，在研磨过程中需要对超薄陶瓷基片半成品2施加2～3kg的配重，由于超薄陶瓷基片半成品2的厚度较薄，所以配重不能太中，以防止超薄陶瓷基片半成品2被压裂。
以上所述仅为本发明的较佳实施例，并非对本案设计的限制，凡依本案的设计关键所做的等同变化，均落入本案的保护范围。
Claims (5)
1.一种超薄陶瓷基片的加工方法，其特征在于：组成所述陶瓷基片的组分及其按质量百分比的含量为：Zr(Hf)O2：≥94％，Y2O3：5.25±0.25％，Al2O3：0.25±0.02％，Fe2O3：<0.005％，SiO2：<0.02％，TiO2：<0.005％，Na2O：<0.005％，Cl-：<0.05％，H2O：<1％；
所述加工方法以下包括步骤：
步骤1：首先将上述原料组分按照重量比混合成陶瓷粉料，将陶瓷粉料置于模具内，接着通过静压设备，压制出高密度的胚料；
步骤2：将步骤1得到的胚料进行烧结，得到结构陶瓷半成品；
步骤3：采用磨床设备将步骤2得到的结构陶瓷半成品的表面磨平；
步骤4：将步骤3磨平后得到的结构陶瓷半成品通过陶瓷基片切割机进行线切，得到厚度在0.08～0.3mm之间的超薄陶瓷基片半成品；
步骤5：将步骤4得到的超薄陶瓷基片半成品置于工装中通过研磨机进行研磨，得到厚度在0.05～0.15mm之间的超薄陶瓷基片；
步骤6：将步骤5研磨后得到的超薄陶瓷基片通过抛光机进行抛光，抛光至表面无划痕，得到成品。
2.如权利要求1所述的一种超薄陶瓷基片的加工方法，其特征在于：所述步骤2中，具有三个烧结阶段：第一阶段的烧结温度为140～150℃，保温时间为5min；第二阶段的烧结温度为1100～1200℃，保温时间为1h；第三阶段的烧结温度为1400～1450℃，保温时间为3h。
3.如权利要求1所述的一种超薄陶瓷基片的加工方法，其特征在于：所述步骤5中的研磨机的底盘为铜盘，所述铜盘中铜和金刚石粉的质量比为1：0.002～0.003；所述研磨机在研磨时需持续滴入研磨液，同时在研磨过程中对超薄陶瓷基片半成品施加2～3kg的配重。
4.如权利要求3所述的一种超薄陶瓷基片的加工方法，其特征在于：所述研磨液为以二氧化硅配纯净水按1:180～220的重量比混合作为基础磨液，再添加铝粉和砖石粉的二氧化硅研磨液，所述铝粉和砖石粉按3～5g/公斤磨液的配比加入。
5.如权利要求1所述的一种超薄陶瓷基片的加工方法，其特征在于：还包括步骤7：将去离子水、酒精、丙酮中的一种或几种溶液混合均匀，对抛光后的成品进行超声波清洗。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310398300.9A CN116354717A (zh) | 2023-04-14 | 2023-04-14 | 一种超薄陶瓷基片的加工方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310398300.9A CN116354717A (zh) | 2023-04-14 | 2023-04-14 | 一种超薄陶瓷基片的加工方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN116354717A true CN116354717A (zh) | 2023-06-30 |
Family
ID=86909279
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202310398300.9A Pending CN116354717A (zh) | 2023-04-14 | 2023-04-14 | 一种超薄陶瓷基片的加工方法 |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN116354717A (zh) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103265293A (zh) * | 2013-05-14 | 2013-08-28 | 广东风华高新科技股份有限公司 | 陶瓷基片的制备方法 |
| CN106187170A (zh) * | 2016-07-07 | 2016-12-07 | 横店集团浙江英洛华电子有限公司 | 一种氧化锆陶瓷手机后盖的制备方法及其产品 |
| CN106778553A (zh) * | 2016-11-30 | 2017-05-31 | 深圳市商德先进陶瓷有限公司 | 感应识别模组的盖片及其制备方法和应用 |
| CN108237442A (zh) * | 2016-12-23 | 2018-07-03 | 蓝思科技（长沙）有限公司 | 一种超薄陶瓷指纹识别片的加工工艺 |
| CN109824358A (zh) * | 2019-03-26 | 2019-05-31 | 山东虎力机械有限公司 | 一种用于5g手机的高韧性盖板的加工方法 |
| CN110948711A (zh) * | 2019-08-01 | 2020-04-03 | 常熟华融太阳能新型材料有限公司 | 一种igbt陶瓷基片的制备方法 |
-
2023
- 2023-04-14 CN CN202310398300.9A patent/CN116354717A/zh active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103265293A (zh) * | 2013-05-14 | 2013-08-28 | 广东风华高新科技股份有限公司 | 陶瓷基片的制备方法 |
| CN106187170A (zh) * | 2016-07-07 | 2016-12-07 | 横店集团浙江英洛华电子有限公司 | 一种氧化锆陶瓷手机后盖的制备方法及其产品 |
| CN106778553A (zh) * | 2016-11-30 | 2017-05-31 | 深圳市商德先进陶瓷有限公司 | 感应识别模组的盖片及其制备方法和应用 |
| CN108237442A (zh) * | 2016-12-23 | 2018-07-03 | 蓝思科技（长沙）有限公司 | 一种超薄陶瓷指纹识别片的加工工艺 |
| CN109824358A (zh) * | 2019-03-26 | 2019-05-31 | 山东虎力机械有限公司 | 一种用于5g手机的高韧性盖板的加工方法 |
| CN110948711A (zh) * | 2019-08-01 | 2020-04-03 | 常熟华融太阳能新型材料有限公司 | 一种igbt陶瓷基片的制备方法 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TW393384B (en) | Abrasive tool | |
| CN110539209B (zh) | 一种薄型板状蓝宝石晶片的加工方法 | |
| CN101602111A (zh) | 超强超韧陶瓷刀具及其制作方法 | |
| CN108972373B (zh) | 一种五轴数控硬质合金刀具用段差磨削金属陶瓷复合结合剂金刚石砂轮及其制备方法 | |
| CN104128892A (zh) | 一种金属陶瓷复合结合剂以及复合结合剂金刚石砂轮 | |
| CN111716258A (zh) | 一种钎料合金包覆陶瓷结合剂超硬磨料的制备方法 | |
| CN114670128B (zh) | 一种纳米级高温烧结陶瓷磨料及其制备方法 | |
| CN111333431B (zh) | 一种陶瓷微裂纹修复方法 | |
| CN112521165A (zh) | 一种陶瓷结合剂及其制备方法、磨具 | |
| US20010014573A1 (en) | Method for preparing glass substrates for magnetic recording mediums | |
| CN116354717A (zh) | 一种超薄陶瓷基片的加工方法 | |
| CN112264941A (zh) | 一种新型超硬磨料群及其制备方法 | |
| CN108098569B (zh) | 一种抛光蓝宝石晶片的内含钕化物软质磨料固着磨具及其制作方法 | |
| JP4976973B2 (ja) | 複合セラミックスの製造方法 | |
| CN113732964B (zh) | 一种树脂金属陶瓷三元复合结合剂超硬砂轮及其制备方法 | |
| CN111018529B (zh) | 一种耐高温冲刷的b4c陶瓷喷嘴及其制备方法 | |
| CN110405641B (zh) | 一种氧化铝陶瓷基板切割用树脂砂轮及其制备方法 | |
| CN111843817A (zh) | 一种陶瓷研磨盘的研磨体及陶瓷研磨盘 | |
| CN112621579B (zh) | 一种磨削砂轮及其制造方法 | |
| CN112552044A (zh) | 一种陶瓷刀具的加工工艺 | |
| CN112279518A (zh) | 一种用于金刚石砂轮的低温烧结微晶玻璃结合剂及其制备方法和应用 | |
| CN112025565B (zh) | 压缩机滑片精磨专用陶瓷结合剂端面砂轮及制备方法 | |
| CN110181418A (zh) | 具有渐变化槽口的c型磨轮及其制作方法 | |
| CN103880419A (zh) | 二氧化锆陶瓷在热压烧结金刚石锯切片生产中的应用 | |
| CN217668276U (zh) | 一种组合磨头结构 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |