CN116261927A - 用于调整被指定用于产生涂层的干燥过程的方法和系统 - Google Patents

用于调整被指定用于产生涂层的干燥过程的方法和系统 Download PDF

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Publication number
CN116261927A
CN116261927A CN202180066463.6A CN202180066463A CN116261927A CN 116261927 A CN116261927 A CN 116261927A CN 202180066463 A CN202180066463 A CN 202180066463A CN 116261927 A CN116261927 A CN 116261927A
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China
Prior art keywords
drying
coating
substrate
setting parameter
formulation
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Pending
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CN202180066463.6A
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English (en)
Chinese (zh)
Inventor
B·施密特-汉斯贝格
C·T·陈-布朗
M·施密特
F·塞蒂纳
F·埃伯勒
U·韦尔夫
S·谢弗
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BASF SE
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BASF SE
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Publication of CN116261927A publication Critical patent/CN116261927A/zh
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
    • B05D3/0254—After-treatment
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00—Program-control systems
    • G05B19/02—Program-control systems electric
    • G05B19/18—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of program data in numerical form
    • G05B19/4155—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of program data in numerical form characterised by program execution, i.e. part program or machine function execution, e.g. selection of a program
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00—Electrodes
    • H01M4/02—Electrodes composed of, or comprising, active material
    • H01M4/04—Processes of manufacture in general
    • H01M4/0471—Processes of manufacture in general involving thermal treatment, e.g. firing, sintering, backing particulate active material, thermal decomposition, pyrolysis
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/70—Testing, e.g. accelerated lifetime tests
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/49—Nc machine tool, till multiple
    • G05B2219/49051—Heat treatment of workpiece, tempering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00—Electrodes
    • H01M4/02—Electrodes composed of, or comprising, active material
    • H01M4/04—Processes of manufacture in general
    • H01M4/0402—Methods of deposition of the material
    • H01M4/0404—Methods of deposition of the material by coating on electrode collectors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30—Devices specially adapted for multicolour light emission
    • H10K59/35—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels
    • H10K59/353—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels characterised by the geometrical arrangement of the RGB subpixels
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0408—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10—Energy storage using batteries

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Human Computer Interaction (AREA)
  • Drying Of Solid Materials (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Battery Electrode And Active Subsutance (AREA)
CN202180066463.6A 2020-09-29 2021-09-29 用于调整被指定用于产生涂层的干燥过程的方法和系统 Pending CN116261927A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP20198988 2020-09-29
EP20198988.6 2020-09-29
PCT/EP2021/076839 WO2022069572A1 (en) 2020-09-29 2021-09-29 Method and system for adjusting a drying process designated for producing a coating

Publications (1)

Publication Number Publication Date
CN116261927A true CN116261927A (zh) 2023-06-13

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CN202180066463.6A Pending CN116261927A (zh) 2020-09-29 2021-09-29 用于调整被指定用于产生涂层的干燥过程的方法和系统

Country Status (6)

Country Link
US (1) US20230350385A1 (https=)
EP (1) EP4222791A1 (https=)
JP (1) JP2023544567A (https=)
KR (1) KR20230078734A (https=)
CN (1) CN116261927A (https=)
WO (1) WO2022069572A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102637891B1 (ko) * 2023-05-02 2024-02-19 주식회사 씨코어 활성탄소섬유 기능성 연속코팅장치
KR102929735B1 (ko) * 2024-08-06 2026-02-24 한화솔루션 주식회사 열처리 프로세스 시스템 및 이를 이용한 페로브스카이트 박막의 열처리 방법

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4224814B2 (ja) * 2003-05-20 2009-02-18 富士フイルム株式会社 逐次塗布方法及び装置
JP5273591B2 (ja) * 2008-03-06 2013-08-28 日立化成株式会社 塗工乾燥シミュレーション方法
JP5910188B2 (ja) * 2012-03-09 2016-04-27 トヨタ自動車株式会社 電池用電極の製造方法及び製造装置
US9337470B2 (en) * 2012-10-19 2016-05-10 Ut-Battelle, Llc Method and apparatus for in-situ drying investigation and optimization of slurry drying methodology
JP6080297B2 (ja) * 2013-02-25 2017-02-15 東レエンジニアリング株式会社 塗工乾燥シミュレーション装置および塗工乾燥装置
KR102075098B1 (ko) * 2017-01-03 2020-02-07 주식회사 엘지화학 스크레치 테스터를 구비하는 이차전지용 전극 제조 시스템
CN108987577B (zh) * 2017-06-02 2024-02-02 杭州纤纳光电科技有限公司 一种钙钛矿薄膜后处理设备及使用方法和应用
US20190081317A1 (en) * 2017-09-11 2019-03-14 Andreas Keil Web coating and calendering system and method

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Publication number Publication date
EP4222791A1 (en) 2023-08-09
KR20230078734A (ko) 2023-06-02
JP2023544567A (ja) 2023-10-24
US20230350385A1 (en) 2023-11-02
WO2022069572A1 (en) 2022-04-07

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