CN116249939A - 感光性转印材料、树脂图案的制造方法、电路配线的制造方法及电子设备的制造方法 - Google Patents

感光性转印材料、树脂图案的制造方法、电路配线的制造方法及电子设备的制造方法 Download PDF

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Publication number
CN116249939A
CN116249939A CN202180062322.7A CN202180062322A CN116249939A CN 116249939 A CN116249939 A CN 116249939A CN 202180062322 A CN202180062322 A CN 202180062322A CN 116249939 A CN116249939 A CN 116249939A
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China
Prior art keywords
resin layer
photosensitive resin
meth
compound
mass
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Pending
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CN202180062322.7A
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English (en)
Chinese (zh)
Inventor
海鉾洋行
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Fujifilm Corp
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Fujifilm Corp
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Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of CN116249939A publication Critical patent/CN116249939A/zh
Pending legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/02—Physical, chemical or physicochemical properties
    • B32B7/023—Optical properties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Human Computer Interaction (AREA)
  • Materials For Photolithography (AREA)
CN202180062322.7A 2020-09-14 2021-06-25 感光性转印材料、树脂图案的制造方法、电路配线的制造方法及电子设备的制造方法 Pending CN116249939A (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2020153896 2020-09-14
JP2020-153896 2020-09-14
JP2020-207814 2020-12-15
JP2020207814 2020-12-15
PCT/JP2021/024174 WO2022054374A1 (ja) 2020-09-14 2021-06-25 感光性転写材料、樹脂パターンの製造方法、回路配線の製造方法及び電子機器の製造方法

Publications (1)

Publication Number Publication Date
CN116249939A true CN116249939A (zh) 2023-06-09

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN202180062322.7A Pending CN116249939A (zh) 2020-09-14 2021-06-25 感光性转印材料、树脂图案的制造方法、电路配线的制造方法及电子设备的制造方法

Country Status (3)

Country Link
JP (1) JPWO2022054374A1 (https=)
CN (1) CN116249939A (https=)
WO (1) WO2022054374A1 (https=)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006003435A (ja) * 2004-06-15 2006-01-05 Fuji Photo Film Co Ltd パターン形成材料、並びにパターン形成装置及びパターン形成方法
JP2008239743A (ja) * 2007-03-27 2008-10-09 Toray Ind Inc ドライフィルムレジスト支持体用ポリエステルフィルム
JP2009073022A (ja) * 2007-09-20 2009-04-09 Fujifilm Corp 転写用積層材料及び画像形成方法
WO2017169257A1 (ja) * 2016-03-30 2017-10-05 富士フイルム株式会社 転写フィルム、静電容量型入力装置の電極保護膜、積層体および静電容量型入力装置
WO2020054660A1 (ja) * 2018-09-12 2020-03-19 富士フイルム株式会社 感光性転写材料、回路配線の製造方法、タッチパネルの製造方法、樹脂パターンの製造方法、及びフィルム

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007264483A (ja) * 2006-03-29 2007-10-11 Fujifilm Corp パターン形成材料及びパターン形成方法
JP2009083482A (ja) * 2007-09-13 2009-04-23 Asahi Kasei Electronics Co Ltd 感光性樹脂積層体
JP2010032609A (ja) * 2008-07-25 2010-02-12 Teijin Dupont Films Japan Ltd ドライフィルムフォトレジスト用ポリエステルフィルム
WO2021033451A1 (ja) * 2019-08-22 2021-02-25 富士フイルム株式会社 感光性転写部材、回路配線の製造方法、タッチパネルの製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006003435A (ja) * 2004-06-15 2006-01-05 Fuji Photo Film Co Ltd パターン形成材料、並びにパターン形成装置及びパターン形成方法
JP2008239743A (ja) * 2007-03-27 2008-10-09 Toray Ind Inc ドライフィルムレジスト支持体用ポリエステルフィルム
JP2009073022A (ja) * 2007-09-20 2009-04-09 Fujifilm Corp 転写用積層材料及び画像形成方法
WO2017169257A1 (ja) * 2016-03-30 2017-10-05 富士フイルム株式会社 転写フィルム、静電容量型入力装置の電極保護膜、積層体および静電容量型入力装置
WO2020054660A1 (ja) * 2018-09-12 2020-03-19 富士フイルム株式会社 感光性転写材料、回路配線の製造方法、タッチパネルの製造方法、樹脂パターンの製造方法、及びフィルム

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