CN116246998B - 一种晶圆夹持机构和晶圆后处理装置 - Google Patents

一种晶圆夹持机构和晶圆后处理装置 Download PDF

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CN116246998B
CN116246998B CN202310209042.5A CN202310209042A CN116246998B CN 116246998 B CN116246998 B CN 116246998B CN 202310209042 A CN202310209042 A CN 202310209042A CN 116246998 B CN116246998 B CN 116246998B
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wafer
clamping mechanism
sliding piece
turntable
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CN116246998A (zh
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张珂
张国铭
许振杰
李长坤
王剑
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Huahaiqingke Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
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    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68792Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the construction of the shaft
    • HELECTRICITY
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    • H01ELECTRIC ELEMENTS
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    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
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    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
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    • HELECTRICITY
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    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68785Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support
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Abstract

本发明公开了一种晶圆夹持机构,其包括:转盘;卡爪组件,其沿所述转盘的周向设置,所述卡爪组件包括:固定座,其连接于转盘且配置有贯通孔,所述贯通孔的内侧壁设置有螺旋的导向槽;滑动件,其同轴设置于所述贯通孔且周向配置有限位部,所述限位部卡接于所述导向槽;顶升组件,其设置于卡爪组件下方,以带动所述滑动件沿竖向移动;移动的滑动件能够沿轴线旋转,使得其上的凸起部与晶圆边缘抵接或分离,以实现晶圆的夹紧或释放。

Description

一种晶圆夹持机构和晶圆后处理装置
技术领域
本发明属于晶圆后处理技术领域,具体而言,涉及一种晶圆夹持机构和晶圆后处理装置。
背景技术
集成电路产业是信息技术产业的核心,而芯片是集成电路的载体,芯片制造涉及集成电路设计、晶圆制造、晶圆加工、电性测量、切割封装和测试等工艺流程。
为保持晶圆表面的清洁度,消除工艺制程中留存在晶圆表面的颗粒物,必须对每道工艺制程后的晶圆进行清洗处理,也称为后处理。其中,水平清洗技术因不受重力的干扰而得到广泛应用。具体地,将晶圆放置在夹持机构上,并按照一定的速度旋转;同时向晶圆喷淋一定流量的清洗液,以对晶圆表面进行清洗和/或干燥处理。
在晶圆后处理过程中,晶圆夹持机构需要高速旋转,同时还需与机械手顺畅交互,因而,这对晶圆夹持机构提出更高的要求。
现有技术中,通过磁吸驱动轴件旋转,以改变轴件顶部的凸起结构的位置,实现晶圆的夹持与分离。但该方案存在以下不足:
(1)磁块为小型部件,通常使用胶液粘合,长期使用会存在磁块脱落、掉胶的风险;
(2)磁块旋转形成的磁感应线会切割晶圆上的器件,致使器件成品率降低。
发明内容
本发明实施例提供了一种晶圆夹持机构和晶圆后处理装置,旨在至少解决现有技术中存在的技术问题之一。
本发明实施例的第一方面提供了一种晶圆夹持机构,包括:
转盘;
卡爪组件,其沿所述转盘的周向设置,所述卡爪组件包括:固定座,其连接于转盘且配置有贯通孔,所述贯通孔的内侧壁设置有螺旋的导向槽;滑动件,其同轴设置于所述贯通孔且周向配置有限位部,所述限位部卡接于所述导向槽;
顶升组件,其设置于卡爪组件下方,以带动所述滑动件沿竖向移动;移动的滑动件能够沿轴线旋转,使得其上的凸起部与晶圆边缘抵接或分离,以实现晶圆的夹紧或释放。
在一个实施例中,所述卡爪组件还包括弹性件和支撑件,所述支撑件设置于滑动件的下部,所述弹性件套设于所述滑动件的外周侧并位于所述固定座与支撑件之间。
在一个实施例中,所述滑动件包括主体结构,所述限位部自所述主体结构的周壁向外延伸而成。
在一个实施例中,所述限位部向外延伸的长度与所述导向槽的深度相匹配。
在一个实施例中,所述限位部的数量至少为一个,限位部的数量与所述导向槽的数量相匹配。
在一个实施例中,所述导向槽包括端口段和螺旋段,所述端口段自固定座的下端面竖向延伸,所述螺旋段自所述端口段向上螺旋盘绕设置。
在一个实施例中,所述限位部的数量为一对,其沿所述滑动件的周向均匀分布。
在一个实施例中,所述卡爪组件的数量为多个,其沿所述转盘均匀设置。
在一个实施例中,所述滑动件还包括卡爪结构,其可拆卸地连接于所述主体结构的上端,所述凸起部设置于所述卡爪结构的上端面。
本发明实施例的第二方面提供了一种晶圆后处理装置,其包括旋转机构、后处理机构和上面所述的晶圆夹持机构,所述旋转机构与所述晶圆夹持机构连接,以带动夹持的晶圆旋转,所述后处理机构设置于晶圆夹持机构的上侧,以对旋转的晶圆执行后处理工艺。
本发明的有益效果包括:
a.卡爪组件配置的限位部与螺旋的导向槽组合,使得滑动件上下移动的同时绕轴线转动,以改变滑动件顶面的凸起部的周向位置,使得卡爪结构能够抵接或分离晶圆的边缘,以实现晶圆的夹持或释放;
b.卡爪组件的结构简单,有利于保证晶圆夹持机构运行的稳定性;
c.摒弃了传统的磁力驱动,避免磁性部件产生的感应电磁场切割晶圆上的器件,以保证晶圆制程的加工质量;
d.无需使用胶液粘接磁性部件,有效避免磁性部件及其粘接胶液的脱落,维持晶圆后处理的加工环境。
附图说明
通过结合以下附图所作的详细描述,本发明的优点将变得更清楚和更容易理解,这些附图只是示意性的,并不限制本发明的保护范围,其中:
图1是本发明一实施例提供的晶圆夹持机构的示意图;
图2是本发明一实施例提供的卡爪组件与转盘的连接示意图;
图3是本发明一实施例提供的卡爪组件的结构示意图;
图4是图3对应的卡爪组件的剖视图;
图5是图3对应的卡爪组件的部件拆解图;
图6是本发明一实施例提供的固定座的纵向剖视图;
图7是本发明一实施例提供的固定座的局部剖视图;
图8是本发明一实施例提供的滑动件的结构示意图;
图9是图8对应的滑动件的部件拆解图;
图10是本发明一实施例提供的滑动件的主体结构的示意图;
图11是本发明一实施例提供的滑动件的卡爪结构的示意图;
图12是本发明一实施例提供的晶圆后处理装置的示意图。
具体实施方式
下面结合具体实施例及其附图,对本发明所述技术方案进行详细说明。在此记载的实施例为本发明的特定的具体实施方式,用于说明本发明的构思;这些说明均是解释性和示例性的,不应理解为对本发明实施方式及本发明保护范围的限制。除在此记载的实施例外,本领域技术人员还能够基于本申请权利要求书及其说明书所公开的内容采用显而易见的其它技术方案,这些技术方案包括采用对在此记载的实施例的做出任何显而易见的替换和修改的技术方案。
本说明书的附图为示意图,辅助说明本发明的构思,示意性地表示各部分的形状及其相互关系。应当理解的是,为了便于清楚地表现出本发明实施例的各部件的结构,各附图之间并未按照相同的比例绘制,相同的参考标记用于表示附图中相同的部分。
在本发明中,晶圆(Wafer,W)也称基板(Substrate),其含义和实际作用等同。
本发明公开的实施例总体涉及晶圆夹持机构和晶圆后处理装置,晶圆后处理过程中,尤其是晶圆干燥处理时,晶圆需要高速旋转,使得晶圆表面的流体形成较大的离心力。因此,需要稳定的晶圆夹持机构,保证晶圆的可靠夹持。
图1是本发明一实施例提供的晶圆夹持机构100的示意图,晶圆夹持机构100包括:
转盘10;
卡爪组件20,其沿转盘10的周向设置,以水平夹持待清洗和/或干燥的晶圆;
顶升组件30,其设置于卡爪组件20的下方,顶升组件30能够带动卡爪组件20中的部件上下移动,以调节卡爪组件20的开合,实现晶圆的夹持或分离。
图2是卡爪组件20固定于转盘10的结构示意图,卡爪组件20数量为4件,并沿转盘10的周向均匀设置,以便夹持待处理的晶圆。需要说明的是,卡爪组件20的数量也可为其他数量,如3件、5件等,以便稳定夹持晶圆边缘,保证晶圆高速旋转的可靠性。
图3是本发明一实施例提供的卡爪组件20的示意图,卡爪组件20包括:
固定座21,其连接于图1示出的转盘10,固定座21配置有图6及图7示出的竖向的贯通孔21a;
滑动件22,其同轴设置于固定座21的贯通孔21a。
进一步地,滑动件22的外径略小于贯通孔21a的内径,以便滑动件22相对于固定座21上下移动。
图2中,卡爪组件20的固定座21垂直固定于转盘10的周向,图6示出的贯通孔21a的内侧壁配置有导向槽21b。具体地,导向槽21b沿贯通孔21a的内侧壁螺旋盘绕设置。
图8及图9是本发明一实施例提供的滑动件22的结构示意图,滑动件22包括:
主体结构22a,其为轴杆结构,主体结构22a的周向配置有图10示出的限位部22a-1;
卡爪结构22b,其设置于主体结构22a的上端,卡爪结构22b的上端面配置有图11示出的凸起部22b-1。
图4是本发明一实施例提供的卡爪组件20的剖视图,滑动件22的限位部22a-1卡接于固定座21的导向槽21b中。在图1示出的顶升组件30推动滑动件22竖向移动的过程中,导向槽21b引导滑动件22的限位部22a-1螺旋、向上移动,滑动件22沿竖向移动的同时绕轴线旋转,使得滑动件22上的凸起部22b-1与晶圆边缘抵接或分离,以实现晶圆的夹紧或释放。
图5是图4对应的卡爪组件20的部件拆解图,卡爪组件20还包括弹性件23和支撑件24。
进一步地,支撑件24为圆筒状结构,其设置于滑动件22的下部,支撑件24的内部配置有环状凹部,支撑件24的环状凹部朝上固定于滑动件22的主体结构22a的下部;弹性件23套设于滑动件22的外周侧,并且,弹性件23的一端抵接于固定座21的下表面,弹性件23的另一端抵接于支撑件24的环状凹部。
下面结合图1至图4,简要说明晶圆夹持机构100的作业步骤:
当顶升组件30推动卡爪组件20的滑动件22向上移动时,弹性件23因受到推力而压缩变短;同时,滑动件22在向上移动的同时绕轴线旋转,使得滑动件22上的凸起部22b-1与晶圆边缘分离,即卡爪组件20处于晶圆分离状态;如此操作,以方便机械手或其他晶圆传输机构将晶圆夹持并传输至下一处理工序。
接着,机械手将下一片待处理的晶圆放置于晶圆夹持机构100的转盘10上方。由于卡爪组件20未与晶圆边缘抵接,即晶圆边缘远离图8示出的滑动件22的凸起部22b-1。
接着,顶升组件30向下移动,弹性件23逐渐由压缩状态恢复至正常伸长状态。在这一过程中,弹性件23的弹力作用于支撑件24,使得滑动件22的限位部22a-1沿固定座21的导向槽21b移动,滑动件22在向下移动的同时沿轴线反向旋转,滑动件22上端的凸起部22b-1朝向晶圆边缘移动,以实现晶圆的夹持。
图6是本发明一实施例提供的固定座21的结构示意图,图7是图6中固定座21的局部剖视图,以便更好的体现位于贯通孔21a内侧壁的导向槽21b的结构。
图6中,导向槽21b包括端口段21b-1和螺旋段21b-2,两者一体加工成型。其中,端口段21b-1自固定座21的下端面向上竖向延伸,螺旋段21b-2自端口段21b-1向上螺旋盘绕设置。配置的端口段21b-1位于固定座21的下端面,以方便滑动件22的限位部22a-1快捷卡接于固定座21的端口段21b-1。
需要说明的是,在晶圆夹持机构处于夹持或分离状态时,滑动件2的限位部22a-1始终处于导向槽21b的内部,以防止卡爪结构22b在夹持状态时,限位部22a-1自导向槽21b的下端脱离,而无法可靠限定卡爪结构22b上的凸起部22b-1的相位,致使晶圆自卡爪组件20无法正常夹持晶圆而碎片。
图10中,限位部22a-1自主体结构22a的周壁向外水平延伸而成,限位部22a-1向外水平延伸的长度与图6示出的导向槽21b的深度相匹配,限位部22a-1的截面尺寸与导向槽21b的宽度相匹配。具体地,限位部22a-1的各项尺寸要略小于导向槽21b的对应尺寸,以方便滑动件22的限位部22a-1能够顺畅的沿固定座21的导向槽21b移动,以改变凸起部22b-1的周向位置,实现晶圆的夹持或分离。
作为本发明的一个实施例,固定座21和滑动件22由耐酸和/或碱性的材料制成,以适用于晶圆后处理的作业环境。具体地,固定座21和滑动件22可以由聚苯硫醚(PPS)、聚丙烯(PP)、聚醚醚酮(PEEK)或聚对苯二甲酸乙二醇酯(PET)制成。需要注意的是,固定座21与滑动件22适宜选择不同种类的材料,以防止同种材料长时间相互抵接而黏连,致使滑动件22无法顺畅移动。
本发明中,滑动件22的限位部22a-1的数量与固定座21的导向槽21b的数量相匹配,限位部22a-1的数量等于导向槽21b的数量。可以理解的是,限位部22a-1的数量也可以小于导向槽21b的数量,如导向槽21b的数量为3件,而限位部22a-1的数量为2件,两者的设置位置相互匹配,也可以实现滑动件22相对于固定座21移动的同时绕轴线旋转,以改变凸起部22b-1的周向位置。
图4及图5所示的实施例中,滑动件22配置的限位部22a-1的数量为2件,相应地,固定座21配置的导向槽21b的数量也为2件。需要说明的是,滑动件22的主体结构22a的周向至少配置1件限位部22a-1,固定座21至少配置1件螺旋的导向槽21b,以实现滑动件22在移动的同时绕轴线旋转。
图10是图8中主体结构22a的示意图,主体结构22a的上端配置有偏置孔22a-2,偏置孔22a-2沿中轴线方向设置并朝向主体结构22a的一侧偏置。图11示出了卡爪结构22b的示意图,卡爪结构22b设置于偏置孔22a-2的内部。主体结构22a的周向配置有一对限位部22a-1,限位部22a-1沿主体结构22a的周向均匀分布,以保证滑动件22受到的来自导向槽21b的作用力是均匀的,以提升滑动件22转动的灵活性。
图8所示的实施例中,卡爪结构22b与主体结构22a采用分体结构,以方便调整卡爪结构22b的周向位置,提高晶圆夹持机构100安装调试的效率。可以理解的是,主体结构22a和卡爪结构22b也可以一体加工成型,以避免可拆卸连接的卡爪结构22b相对于主体结构22a发生位置改变而影响晶圆夹持或分离的效果。
图1所示的实施例中,顶升组件30包括直线模组和顶盘,顶盘固定于直线模组的移动端,以带动顶盘整体移动。顶盘的上表面设置有凸台,凸台与卡爪组件20的滑动件22的底部相对应。当顶盘抵接于卡爪组件20的滑动件22时,滑动件22沿竖向移动并绕轴线旋转,以改变滑动件22上的限位部22a-1的周向位置,使得凸起部22b-1抵接或远离晶圆边缘,实现晶圆的夹持或分离。
其中,直线模组为气缸、电缸或其他能够实现直线驱动的模块。顶盘为盘状部件,其设置于卡爪组件20的滑动件22的下方。
当晶圆夹持机构100释放夹持的晶圆时,顶升组件30需要向上移动,顶升组件30的顶盘抵接于滑动件22的下方,以推动滑动件22向上移动,在限位部22a-1和导向槽21b的作用下,滑动件22绕中轴线旋转一定角度,使得滑动件22上端面的凸起部22b-1与晶圆边缘分离。
当晶圆夹持机构100夹持晶圆时,顶升组件30向下移动,在弹性件23的作用下,滑动件22向下移动,滑动件22的限位部22a-1抵接于晶圆边缘,以实现晶圆的夹持;此外,顶升组件30的转盘与滑动件22的底面分离,以便为晶圆夹持机构100配置旋转驱动机构,从而带动晶圆夹持机构100及其夹持的晶圆快速旋转。
本发明还提供了一种晶圆后处理装置1000,其示意图,如图12所示。晶圆后处理装置1000包括旋转机构200、后处理机构300和上面所述的晶圆夹持机构100,其中,旋转机构200与晶圆夹持机构100连接,以带动夹持的晶圆旋转,后处理机构300设置于晶圆夹持机构的上侧,以对旋转的晶圆执行后处理,实现晶圆表面的清洁和干燥。
进一步地,旋转机构200可以为直驱电机或采用其他驱动形式,如带传动、齿轮传动等。后处理机构300可以为滚刷清洗模块、预清洗模块或干燥模块;其中,预清洗模块可以为双流体和擦洗垫的组合,干燥模块可以为基于马兰戈尼效应的干燥模块,以完成晶圆的清洗和/或干燥处理。
在本说明书的描述中,参考术语“一个实施例”、“一些实施例”、“示意性实施例”、“示例”、“具体示例”、或“一些示例”等的描述意指结合该实施例或示例描述的具体特征、结构、材料或者特点包含于本发明的至少一个实施例或示例中。在本说明书中,对上述术语的示意性表述不一定指的是相同的实施例或示例。而且,描述的具体特征、结构、材料或者特点可以在任何的一个或多个实施例或示例中以合适的方式结合。
尽管已经示出和描述了本发明的实施例,本领域的普通技术人员可以理解:在不脱离本发明的原理和宗旨的情况下可以对这些实施例进行多种变化、修改、替换和变型,本发明的范围由权利要求及其等同物限定。

Claims (8)

1.一种晶圆夹持机构,其特征在于,包括:
转盘;
卡爪组件,其沿所述转盘的周向设置,所述卡爪组件包括:固定座,其连接于转盘且配置有贯通孔,所述贯通孔的内侧壁设置有螺旋的导向槽;滑动件,其同轴设置于所述贯通孔且周向配置有限位部,所述限位部卡接于所述导向槽;所述导向槽包括端口段和螺旋段,所述端口段自固定座的下端面竖向延伸,所述螺旋段自端口段向上螺旋盘绕设置;
顶升组件,其设置于卡爪组件下方,以带动所述滑动件沿竖向移动;移动的滑动件能够沿轴线旋转,使得其上的凸起部与晶圆边缘抵接或分离,以实现晶圆的夹紧或释放;
所述滑动件包括主体结构和卡爪结构,所述卡爪结构可拆卸地连接于主体结构的上端,所述凸起部设置于卡爪结构的上端面;所述主体结构的上端配置有偏置孔,所述卡爪结构设置于偏置孔的内部;
晶圆夹紧或释放时,所述滑动件相对于固定座上下移动,两者之间的间隙远离晶圆边缘与凸起部的抵接位置。
2.如权利要求1所述的晶圆夹持机构,其特征在于,所述卡爪组件还包括弹性件和支撑件,所述支撑件设置于滑动件的下部,所述弹性件套设于所述滑动件的外周侧并位于所述固定座与支撑件之间。
3.如权利要求1所述的晶圆夹持机构,其特征在于,所述限位部自所述主体结构的周壁向外延伸而成。
4.如权利要求3所述的晶圆夹持机构,其特征在于,所述限位部向外延伸的长度与所述导向槽的深度相匹配。
5.如权利要求1所述的晶圆夹持机构,其特征在于,所述限位部的数量至少为一个,限位部的数量与所述导向槽的数量相匹配。
6.如权利要求5所述的晶圆夹持机构,其特征在于,所述限位部的数量为一对,其沿所述滑动件的周向均匀分布。
7.如权利要求1所述的晶圆夹持机构,其特征在于,所述卡爪组件的数量为多个,其沿所述转盘均匀设置。
8.一种晶圆后处理装置,其特征在于,包括旋转机构、后处理机构和权利要求1至7任一项所述的晶圆夹持机构,所述旋转机构与所述晶圆夹持机构连接,以带动夹持的晶圆旋转,所述后处理机构设置于晶圆夹持机构的上侧,以对旋转的晶圆执行后处理工艺。
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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002134594A (ja) * 2000-10-24 2002-05-10 Nippon Telegr & Teleph Corp <Ntt> 基板ホルダー及び薄膜形成装置
JP2004088034A (ja) * 2002-08-29 2004-03-18 Sumitomo Precision Prod Co Ltd 回転式基板処理装置における基板チャック方法およびそれに用いられるチャック装置
JP2008130948A (ja) * 2006-11-24 2008-06-05 Dainippon Screen Mfg Co Ltd 基板保持装置およびそれを備える基板処理装置
CN113990798A (zh) * 2021-11-02 2022-01-28 华海清科股份有限公司 晶圆夹持装置和晶圆后处理设备

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002134594A (ja) * 2000-10-24 2002-05-10 Nippon Telegr & Teleph Corp <Ntt> 基板ホルダー及び薄膜形成装置
JP2004088034A (ja) * 2002-08-29 2004-03-18 Sumitomo Precision Prod Co Ltd 回転式基板処理装置における基板チャック方法およびそれに用いられるチャック装置
JP2008130948A (ja) * 2006-11-24 2008-06-05 Dainippon Screen Mfg Co Ltd 基板保持装置およびそれを備える基板処理装置
CN113990798A (zh) * 2021-11-02 2022-01-28 华海清科股份有限公司 晶圆夹持装置和晶圆后处理设备

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