CN116174389A - Pickling device for monocrystalline silicon ring and cleaning method - Google Patents
Pickling device for monocrystalline silicon ring and cleaning method Download PDFInfo
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- CN116174389A CN116174389A CN202211392875.1A CN202211392875A CN116174389A CN 116174389 A CN116174389 A CN 116174389A CN 202211392875 A CN202211392875 A CN 202211392875A CN 116174389 A CN116174389 A CN 116174389A
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- pickling
- monocrystalline silicon
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- driving
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- 238000005554 pickling Methods 0.000 title claims abstract description 140
- 229910021421 monocrystalline silicon Inorganic materials 0.000 title claims abstract description 94
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 90
- 238000004140 cleaning Methods 0.000 title claims abstract description 29
- 238000000034 method Methods 0.000 title claims abstract description 14
- 239000007788 liquid Substances 0.000 claims abstract description 73
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 54
- 230000007246 mechanism Effects 0.000 claims abstract description 36
- 238000005406 washing Methods 0.000 claims abstract description 34
- 238000003756 stirring Methods 0.000 claims abstract description 23
- 230000000903 blocking effect Effects 0.000 claims description 36
- 239000002253 acid Substances 0.000 claims description 34
- 238000009434 installation Methods 0.000 claims description 30
- 238000003825 pressing Methods 0.000 claims description 29
- 239000000243 solution Substances 0.000 claims description 22
- 238000007599 discharging Methods 0.000 claims description 19
- 238000002347 injection Methods 0.000 claims description 11
- 239000007924 injection Substances 0.000 claims description 11
- 238000004506 ultrasonic cleaning Methods 0.000 claims description 6
- 239000003513 alkali Substances 0.000 claims description 5
- 238000001035 drying Methods 0.000 claims description 4
- 238000000227 grinding Methods 0.000 claims description 4
- 230000000149 penetrating effect Effects 0.000 claims description 3
- 235000012431 wafers Nutrition 0.000 description 6
- 238000005530 etching Methods 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 241000519995 Stachys sylvatica Species 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 238000007605 air drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 241000883990 Flabellum Species 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000012797 qualification Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000011863 silicon-based powder Substances 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/102—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration with means for agitating the liquid
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Abstract
The application relates to the related technical field of monocrystalline silicon, in particular to a pickling device and a cleaning method for monocrystalline silicon rings, wherein the pickling device comprises a pickling tank, a pickling cavity is arranged in the pickling tank, and a cover plate is arranged at an opening of the pickling cavity; the middle part of the pickling cavity is provided with a stirring mechanism for driving pickling liquid to flow, and a plurality of pickling mechanisms uniformly distributed on the periphery of the stirring mechanism are arranged in the pickling cavity; the pickling mechanism comprises a fixed cylinder and a piston cylinder which is arranged in the fixed cylinder in a lifting manner, outer leakage holes are arranged on the outer wall of the fixed cylinder at intervals, and inner leakage holes are arranged on the outer wall of the piston cylinder corresponding to the outer leakage holes; a rack which can extend out of the pickling tank and is used for placing the monocrystalline silicon ring is arranged in the piston cylinder; the lower end part of the pickling tank is provided with a liquid draining component which is used for draining pickling liquid in the fixed cylinder corresponding to the fixed cylinder, and through the structure, continuous pickling and water washing treatment of the monocrystalline silicon ring is preferably realized.
Description
Technical Field
The application relates to the technical field related to monocrystalline silicon, in particular to an acid cleaning device and a cleaning method for monocrystalline silicon rings.
Background
When a silicon wafer is etched by plasma, a silicon ring carrying the silicon wafer is also subjected to the etching action of the plasma, various impurities are generated in the etching process, the silicon wafer to be etched is polluted, the yield of a final product is affected, and white spots and marks on the surface of the monocrystalline silicon ring are particularly obvious, so that the cleanliness of the surface of the monocrystalline silicon ring is generally required to be strictly controlled.
The prior China published patent grant bulletin number: the acid pickling device for producing the semiconductor monocrystalline silicon piece, which is mentioned in CN217251113U, can realize that the telescopic end of the second electric push rod is controlled to be shortened, the placement component is driven to descend, the placement component is immersed into an acid pickling tank to wash away impurities on the surface of the monocrystalline silicon piece, then the placement component is lifted, high-pressure water is sprayed out through a spray head to flush the surface of the monocrystalline silicon piece, and residual acid pickling solution on the monocrystalline silicon piece is washed away, so that acid pickling and water washing treatment of the monocrystalline silicon piece are completed; however, the pickling equipment is of a single-batch soaking pickling type, so that the pickling mode is single, and when the number of monocrystalline silicon wafers is large, the monocrystalline silicon wafers need to be pickled in batches in sequence, and the problems that the pickling equipment efficiency is low because pickling and water washing operations cannot be continuously performed exist.
Disclosure of Invention
In order to solve the technical problems in the background art, the invention provides an acid cleaning device and a cleaning method for a monocrystalline silicon ring.
The application specifically adopts the following technical scheme for realizing the purposes:
the acid cleaning device for the monocrystalline silicon ring comprises an acid cleaning tank, wherein an acid cleaning cavity with an opening at the upper end and used for containing acid cleaning solution is arranged in the acid cleaning tank, and a cover plate is arranged at the opening of the acid cleaning cavity;
the middle part of the pickling cavity is provided with a stirring mechanism for driving pickling liquid to flow, and a plurality of pickling mechanisms uniformly distributed on the periphery of the stirring mechanism are arranged in the pickling cavity;
the pickling mechanism comprises a fixed cylinder and a piston cylinder which is arranged in the fixed cylinder in a lifting manner, outer leakage holes are arranged on the outer wall of the fixed cylinder at intervals, and inner leakage holes are arranged on the outer wall of the piston cylinder corresponding to the outer leakage holes; a rack which can extend out of the pickling tank and is used for placing the monocrystalline silicon ring is arranged in the piston cylinder;
the lower end part of the pickling tank is provided with a liquid discharging component which is used for discharging pickling liquid in the fixed cylinder and is used for driving the piston cylinder to lift and drive the outer leakage hole and the inner leakage hole to be opposite or staggered to realize the opening and closing of the outer leakage hole.
Preferably, the liquid discharging assembly comprises a mounting pipe, wherein a liquid inlet cavity, a plugging core mounting cavity and a driving piece mounting cavity with gradually increased diameters are sequentially arranged in the mounting pipe from top to bottom;
the liquid inlet cavity is used for communicating the acid washing cavity, and liquid outlet holes are uniformly distributed on the side wall of the liquid inlet cavity; a lifting core blocking piece is arranged in the core blocking installation cavity, and comprises a core blocking part which is positioned in the liquid inlet cavity and used for blocking the liquid outlet hole) and a ring blocking part which is positioned in the core blocking installation cavity; the driving piece installation cavity is internally provided with a driving piece for driving the core blocking piece to lift and realize opening and closing of the liquid outlet.
Preferably, the driving piece comprises a rotatable turntable, a first driving column extending into the plug core installation cavity is arranged at the upper end surface and the middle part of the turntable, a first sliding groove is arranged on the outer side wall of the first driving column along the axial direction of the first driving column, and a first spring for driving the plug core piece to move upwards to close the liquid outlet is sleeved on the first driving column; the core blocking piece is provided with a movable cavity into which the first driving column extends, and the side wall of the movable cavity is provided with a first sliding block which is positioned in the corresponding first sliding groove and slides; the upper side wall of the plugging core installation cavity is uniformly provided with first grooves, and first guide inclined planes are arranged in the first grooves;
the first ejector rods extending into the corresponding first grooves are uniformly distributed on the plugging ring part, and the plugging core piece rotates to drive the first ejector rods to slide out of the first grooves along the first guide inclined planes so as to realize that the plugging core piece moves downwards to open the liquid outlet holes.
Preferably, a convex ring is arranged on the lower end surface of the rotary table along the axial direction of the rotary table, and first ratchet grooves are uniformly distributed on the lower end surface of the convex ring;
the driving piece is still including locating driving piece installation cavity below department and pressing the post, corresponds the bulge loop on the pressing post and is equipped with the spring installation cavity, and the opening part in spring installation cavity is equipped with and is used for driving bulge loop pivoted second ratchet tooth groove with first ratchet groove cooperatees, installs the reset spring who is used for driving the pressing post to reset in the spring installation cavity.
Preferably, the inner wall of the fixed cylinder is provided with a limiting chute along the axial direction of the fixed cylinder, and the outer wall of the piston cylinder is provided with a limiting slide block which is positioned in the corresponding limiting chute and slides;
a second spring for pushing the piston cylinder to move downwards to realize dislocation of the outer leak hole and the inner leak hole is arranged in the fixed cylinder and positioned at the upper end, second grooves are uniformly distributed at the lower end of the piston cylinder along the circumferential direction of the piston cylinder, and second guide inclined planes are arranged in the second grooves; the fixed cylinder is internally provided with a rotatable swivel below the piston cylinder, second ejector rods extending into corresponding second grooves are arranged on the swivel at intervals, the second ejector rods extend into the second grooves to realize downward movement of the piston cylinder, and the swivel rotates to drive the second ejector rods to slide out of the second grooves along the second guide inclined planes to realize upward movement of the piston cylinder.
Preferably, the second driving column extending into the fixed cylinder is arranged on the core blocking piece, a clamping groove is formed in the outer side wall of the second driving column along the axial direction of the second driving column, and a clamping plate extending into the corresponding clamping groove to slide is arranged in the rotating ring.
Preferably, the middle part of the cover plate is provided with an exhaust pipe, and the exhaust pipe is provided with a one-way exhaust valve; the stirring mechanism comprises a mounting pipe corresponding to the exhaust pipe, a rotatable mounting shaft extending into the pickling cavity is arranged in the mounting pipe, stirring plates are uniformly arranged on the mounting shaft, and fan blades positioned in the mounting pipe are arranged at the upper end part of the mounting shaft.
Preferably, the mounting frame through which the mounting shaft penetrates is arranged at the opening of the lower end of the mounting tube, and the mounting shaft is rotatably mounted on the mounting frame through a nut.
Preferably, a water injection pipe is sleeved outside the fixed cylinder, and a water inlet pipe penetrating through the pickling tank is communicated with the water injection pipe; the outer wall of the fixed cylinder is provided with water inlet holes communicated with the water injection pipe at intervals, and the lifting of the piston cylinder is used for realizing the opening and closing of the water inlet holes.
The application also provides a monocrystalline silicon ring cleaning method, which uses the acid cleaning device for monocrystalline silicon rings, and specifically comprises the following steps:
step one, performing pure water ultrasonic cleaning treatment on the single crystal silicon ring after preliminary processing;
step two, grinding the monocrystalline silicon ring treated in the step one;
step three, alkali washing treatment is carried out on the monocrystalline silicon ring treated in the step two;
step four, carrying out pure water ultrasonic cleaning treatment on the monocrystalline silicon ring treated in the step three;
step five, carrying out acid washing and water washing treatment on the monocrystalline silicon ring treated in the step four by utilizing an acid washing device for the monocrystalline silicon ring;
and step six, drying the monocrystalline silicon ring treated in the step five.
In summary, the present application includes at least one of the following beneficial effects:
1. according to the device, through the arrangement of the acid washing mechanism and the stirring mechanism, the acid washing mechanism can be used for carrying out acid washing and water washing treatment on the monocrystalline silicon ring, so that the subsequent air drying treatment is facilitated; meanwhile, by arranging a plurality of groups of pickling mechanisms around the stirring mechanism, the pickling device can be preferably used for continuously pickling and water washing.
2. The setting of flabellum for the gas that produces in the pickling process can drive the installation axle and rotate and make the stirring board stir the pickling solution, makes it flow, thereby makes the contact of pickling solution and monocrystalline silicon ring more abundant, improves the pickling effect.
3. In this application can drive the flowing back subassembly and open and shut through last pressing the post, can drive outer leak hole and open and shut, and then make pickling mechanism can carry out pickling, washing treatment to monocrystalline silicon ring in it in proper order, easy operation is convenient.
4. The cleaning method can effectively remove white spots, marks and residual substances on the surface of the monocrystalline silicon ring, and eliminate poor appearance of the monocrystalline silicon ring before etching, so that the appearance qualification rate of the monocrystalline silicon ring after etching is improved.
Drawings
FIG. 1 is a schematic view showing a first perspective structure of an acid cleaning apparatus for a silicon single crystal ring in the present application.
FIG. 2 is a schematic cross-sectional view of an acid cleaning apparatus for monocrystalline silicon ring in the present application.
Fig. 3 is a schematic structural view of the fixing barrel in the present application.
Fig. 4 is a schematic structural view of the piston cylinder in the present application.
Fig. 5 is an enlarged schematic view of the portion a in fig. 2.
FIG. 6 is a schematic view in semi-section of the mounting tube of the present application.
FIG. 7 is a schematic explosion diagram of the space between the core and the driver in the present application;
fig. 8 is a schematic view of an agitation mechanism in the present application.
Reference numerals illustrate:
100. a pickling tank; 110. a cover plate; 111. an exhaust pipe; 112. a one-way exhaust valve; 120. a placing rack; 130. a liquid discharge assembly; 201. a pickling cavity; 202. a mounting hole; 203. placing the hole; 210. a fixed cylinder; 220. a piston cylinder; 230. installing a pipe; 240. a mounting shaft; 241. a stirring plate; 311. an outer leak; 312. limiting sliding grooves; 313. a water inlet hole; 320. a water injection pipe; 321. a water inlet pipe; 411. an inner leak; 412. a limit sliding block; 413. a second groove; 414. a second guiding inclined surface; 420. a second spring; 430. a swivel; 431. a second ejector rod; 432. a clamping plate; 510. installing a pipe; 511. a liquid inlet cavity; 512. a plug mounting cavity; 513. a driving member mounting cavity; 520. a core blocking piece; 530. a driving member; 531. a turntable; 532. a first drive column; 533. a first spring; 540. pressing the column; 541. a spring mounting cavity; 542. a return spring; 550. a first stop collar; 560. a second limiting ring; 611. a liquid outlet hole; 612. a first groove; 613. a first guiding inclined surface; 614. a mounting groove; 615. a collection pipe; 616. a catheter; 711. plugging the core part; 712. a blocking ring part; 713. a movable cavity; 714. a first slider; 715. a first ejector rod; 716. a second drive column; 717. a clamping groove; 721. a first chute; 722. a convex ring; 723. a first ratchet slot; 731. a second ratchet slot; 732. a limit part; 733. a vertical slot; 734. an inclined groove; 811. a fan blade; 821. a mounting frame; 831. and (3) a nut.
Detailed Description
The present application is described in further detail below in conjunction with fig. 1-8.
The embodiment of the application discloses an acid cleaning device and a cleaning method for a monocrystalline silicon ring.
As shown in fig. 1 and 2, the pickling device for monocrystalline silicon ring in the embodiment comprises a pickling tank 100, wherein a pickling cavity 201 with an opening at the upper end and used for containing pickling solution is arranged in the pickling tank 100, and a cover plate 110 used for sealing the pickling cavity 201 is arranged at the opening of the pickling cavity 201;
the middle part department of pickling chamber 201 is equipped with the stirring mechanism that is used for driving the pickling liquid to flow, is equipped with a plurality of evenly distributed's pickling mechanism in the pickling chamber 201 in stirring mechanism periphery.
In the embodiment, the pickling mechanism is arranged to be soaked in pickling solution in the pickling cavity 201, so that the monocrystalline silicon ring placed in the pickling mechanism is subjected to pickling treatment; the stirring mechanism is arranged, so that the stirring mechanism can enable the pickling solution in the pickling cavity 201 to flow, and the flowing pickling solution can be fully contacted with the monocrystalline silicon ring in the pickling mechanism, so that the pickling efficiency of the monocrystalline silicon wafer is improved; in the actual use process, the pickling solution is preferably hydrofluoric acid solution;
in the embodiment, the plurality of pickling mechanisms are arranged on the periphery of the stirring mechanism, so that each pickling mechanism can independently perform pickling treatment, and the whole pickling device can continuously perform pickling treatment on the monocrystalline silicon ring;
in this embodiment, in order to facilitate replacement of the pickling solution in the pickling tank 100, a liquid feeding pipe (not shown) for feeding the pickling solution into the pickling tank 100 and a liquid discharging pipe (not shown) for discharging the pickling solution out of the pickling tank 100 are provided in the pickling tank 100.
Referring to fig. 3 and 4, in this embodiment, the pickling mechanism includes a fixed cylinder 210 and a piston cylinder 220 that is disposed in the fixed cylinder 210 in a liftable manner, outer leakage holes 311 are disposed on an outer wall of the fixed cylinder 210 at intervals, and inner leakage holes 411 are disposed on an outer wall of the piston cylinder 220 corresponding to the outer leakage holes 311; a rack 120 which can extend out of the pickling tank 100 and is used for placing monocrystalline silicon rings is arranged in the piston cylinder 220;
the lower end of the pickling tank 100 is provided with a liquid discharging assembly 130 corresponding to the fixed cylinder 210 for discharging pickling liquid in the fixed cylinder 210, and the liquid discharging assembly 130 is used for driving the piston cylinder 220 to lift and drive the outer leakage hole 311 and the inner leakage hole 411 to be opposite or staggered so as to realize the opening and closing of the outer leakage hole 311.
In practical use, the fixing cylinder 210 is arranged in the pickling cavity 201 along the vertical direction, the lower end of the fixing cylinder 210 is fixed on the bottom wall of the pickling cavity 201, the upper end of the fixing cylinder is matched with the cover plate 110 to realize the sealing of the upper end part of the fixing cylinder 210, the cover plate 110 is provided with the placing holes 203 corresponding to the fixing cylinder 210, and the placing rack 120 for carrying the monocrystalline silicon rings can be taken and placed in the pickling tank 100 from the placing holes 203; by the configuration in this embodiment, when the outer leak 311 and the inner leak 411 are opposite, the outer leak 311 is in an open state, the pickling solution in the pickling chamber 201 can flow into the fixed cylinder 210 from the outer leak 311, at this time, the drain assembly 130 is in a closed state, so that the pickling solution can perform pickling treatment on the monocrystalline silicon ring on the placement frame 120, when the pickling treatment is completed, the outer leak 311 and the inner leak 411 are dislocated by the lowering of the piston cylinder 220, the outer leak 311 is in a closed state, the pickling solution in the pickling chamber 201 cannot flow into the fixed cylinder 210 from the outer leak 311, at this time, the pickling solution left in the fixed cylinder 210 can be drained through the drain assembly 130 by opening the drain assembly 130, at this time, the clean water is injected into the fixed cylinder 210, so that the rinsing treatment on the monocrystalline silicon ring on the placement frame 120 can be performed, and the subsequent air drying treatment is avoided;
referring to fig. 3, in this embodiment, a water injection pipe 320 is sleeved outside the fixing cylinder 210, and a water inlet pipe 321 penetrating through the pickling tank 100 is connected to the water injection pipe 320; the outer wall of the fixed cylinder 210 is provided with water inlet holes 313 communicated with the water injection pipe 320 at intervals, and the lifting of the piston cylinder 220 is used for opening and closing the water inlet holes 313.
Through the structure in this embodiment, when the piston cylinder 220 is lowered to realize that the outer leak hole 311 is in a closed state, the water inlet hole 313 is opened, at this time, clean water is injected into the water injection pipe 320 through the water inlet pipe 321, and the clean water can enter the fixed cylinder 210 through the water inlet hole 313, so that the monocrystalline silicon ring subjected to acid washing is subjected to water washing treatment.
Referring to fig. 5, in this embodiment, the drain assembly 130 includes a mounting tube 510, and a liquid inlet chamber 511, a core blocking mounting chamber 512 and a driving member mounting chamber 513 with gradually increasing diameters are sequentially disposed in the mounting tube 510 from top to bottom;
the liquid inlet cavity 511 is used for communicating the pickling cavity 201, and liquid outlet holes 611 are uniformly distributed on the side wall of the liquid inlet cavity 511; the core plugging installation cavity 512 is internally provided with a liftable core plugging piece 520, and the core plugging piece 520 comprises a core plugging part 711 positioned in the liquid inlet cavity 511 and used for plugging the liquid outlet hole 611 and a ring plugging part 712 positioned in the core plugging installation cavity 512; a driving piece 530 for driving the core blocking piece 520 to lift and lower to open and close the liquid outlet 611 is arranged in the driving piece installation cavity 513.
In actual use, the bottom wall of the pickling cavity 201 is provided with the mounting hole 202, and the upper end part of the mounting pipe 510 is in threaded connection with the mounting hole 202, so that the drain assembly 130 is mounted at the bottom of the pickling tank 100; wherein, by the configuration in this embodiment, when the driving member 530 drives the core blocking member 520 to move down so that the core blocking member 711 located in the liquid inlet cavity 511 moves down, and then the liquid outlet hole 611 is opened, so that the pickling solution or clean water in the fixing cylinder 210 can be discharged from the liquid inlet cavity 511 through the liquid outlet hole 611, when the driving member 530 drives the core blocking member 520 to move up so that the core blocking member 711 located in the liquid inlet cavity 511 moves up, the core blocking member 711 seals the liquid outlet hole 611, and thus the liquid discharging assembly 130 is in a closed state.
Referring to fig. 6, in this embodiment, a mounting groove 614 is formed on the outer side wall of the mounting tube 510 and above the liquid outlet hole 611, so that after the mounting tube 510 is mounted, the liquid outlet hole 611 is located outside the pickling tank 100, so as to facilitate liquid draining; wherein, the mounting tube 510 is provided with a collection tube 615 covering the liquid outlet hole 611, and the collection tube 615 is provided with a liquid guide tube 616, so that the liquid discharged by the liquid discharge assembly 130 is preferably collected.
Referring to fig. 7, in this embodiment, the driving member 530 includes a rotatable turntable 531, a first driving column 532 extending into the plugging core mounting cavity 512 is disposed on the upper end surface and in the middle of the turntable 531, a first sliding slot 721 is disposed on the outer side wall of the first driving column 532 along the axial direction of the first driving column 532, and a first spring 533 for driving the plugging core member 520 to move upwards to close the liquid outlet 611 is sleeved on the first driving column 532; the core blocking piece 520 is provided with a movable cavity 713 into which the first driving column 532 extends, and the side wall of the movable cavity 713 is provided with a first sliding block 714 which is positioned in the corresponding first sliding groove 721 and slides; the upper side wall of the plugging core installation cavity 512 is uniformly provided with first grooves 612, and first guide inclined planes 613 are respectively arranged in the first grooves 612;
the first ejector rods 715 extending into the corresponding first grooves 612 are uniformly distributed on the plugging ring part 712, and the plugging core member 520 rotates to drive the first ejector rods 715 to slide out of the first grooves 612 along the first guide inclined planes 613 so as to realize that the plugging core member 520 moves downwards to open the liquid outlet holes 611.
In practical use, the driving piece mounting cavity 513 is internally and threadedly connected with a first limiting ring 550 for limiting the turntable 531, so that the turntable 531 is preferably rotatably mounted in the driving piece mounting cavity 513; wherein, through the cooperation of the first chute 721 and the first slider 714, the rotation of the turntable 531 can drive the core blocking member 520 to rotate; through the arrangement of the first groove 612, the first guiding inclined plane 613, the first ejector rod 715 and the first spring 533, when the first ejector rod 715 is positioned in the first groove 612, the first spring 533 pushes the core blocking piece 520 to move upwards at this time, so that the liquid outlet 611 is blocked, the liquid discharging assembly 130 is closed, when the turntable 531 rotates to drive the core blocking piece 520 to rotate, the first ejector rod 715 slides out of the first groove 612 along the first guiding inclined plane 613, so that the core blocking piece 520 moves downwards, the blocking of the liquid outlet 611 is removed, and the opening of the liquid discharging assembly 130 is realized; the first grooves 612 are uniformly distributed along the circumference of the plugging core installation cavity 512, so that the turntable 531 drives the plugging core member 520 to rotate, and the first ejector rod 715 can slide out of or into the first grooves 612, thereby preferably realizing opening and closing of the liquid discharge assembly 130.
In this embodiment, a convex ring 722 is disposed on the lower end surface of the turntable 531 along the axial direction thereof, and first ratchet grooves 723 are uniformly disposed on the lower end surface of the convex ring 722;
the driving member 530 further comprises a pressing column 540 arranged below the driving member installation cavity 513, a spring installation cavity 541 is arranged on the pressing column 540 corresponding to the convex ring 722, a second ratchet tooth slot 731 which is used for being matched with the first ratchet tooth slot 723 to drive the convex ring 722 to rotate is arranged at the opening of the spring installation cavity 541, and a reset spring 542 which is used for driving the pressing column 540 to reset is arranged in the spring installation cavity 541.
In practical use, the pressing post 540 is located on the side wall of the driving piece installation cavity 513 and extends outwards to form the limiting part 732, and the second limiting ring 560 for limiting the limiting part 732 is arranged in the driving piece installation cavity 513, so that the installation of the pressing post 540 in the driving piece installation cavity 513 can be preferably realized through the reset spring 542; wherein, through the matching arrangement of the first ratchet teeth slots 723 and the second ratchet teeth slots 731, the second ratchet teeth slots 731 are made to squeeze the first ratchet teeth slots 723 by driving the pressing column 540 to move upwards, so as to drive the turntable 531 to rotate unidirectionally, thereby realizing the opening and closing of the liquid discharging assembly 130; wherein, the pressing column 540 is reset under the action of the reset spring 542, so that the opening and closing of the liquid discharging assembly 130 can be realized preferably through the pressing column 540;
it should be noted that the pressing post 540 passes through the second limiting ring 560 and extends out from the lower end of the mounting tube 510, so as to facilitate the user to press the pressing post 540 upwards; the outer wall of the pressing column 540 is provided with a guide groove, the inner wall of the second limiting ring 560 is provided with a guide column sliding in the guide groove, the guide groove comprises a vertical groove 733 and an inclined groove 734 which are axially arranged along the pressing column 540, the inclined groove 734 is opposite to the inclined direction of the upper surface of the first ratchet tooth groove 723, through the structure, the guide column is enabled to move along the vertical groove 733 when the pressing column 540 is pressed, the second ratchet tooth groove 731 and the first ratchet tooth groove 723 are matched to drive the turntable 531 to rotate, when the guide column moves to the connection point of the vertical groove 733 and the inclined groove 734, the pressing column 540 is enabled to slide into the inclined groove 734 when the turntable 531 rotates in the same direction, when the guide column slides into the outermost end of the inclined groove 734 (the bottom end of the second ratchet tooth groove 731 does not reach the bottommost end of the inclined groove 723), the pressing column 540 is loosened at the moment, the pressing column 540 is enabled to reversely rotate and reset under the combined action of the reset spring 542 and the guide groove, and the second ratchet tooth groove 731 is enabled to be located on the bottommost inclined surface 723 next to be pressed conveniently.
Referring to fig. 3-7, in this embodiment, the inner wall of the fixed cylinder 210 is provided with a limiting chute 312 along the axial direction thereof, and the outer wall of the piston cylinder 220 is provided with a limiting slider 412 sliding in the corresponding limiting chute 312;
a second spring 420 for pushing the piston cylinder 220 to move downwards to realize dislocation of the outer leakage hole 311 and the inner leakage hole 411 is arranged in the fixed cylinder 210 and at the upper end, second grooves 413 are uniformly distributed at the lower end part of the piston cylinder 220 along the circumferential direction of the second grooves 413, and second guide inclined planes 414 are arranged in the second grooves 413; a rotatable swivel 430 is arranged in the fixed cylinder 210 below the piston cylinder 220, second ejector rods 431 extending into corresponding second grooves 413 are arranged on the swivel 430 at intervals, the second ejector rods 431 extend into the second grooves 413 to realize downward movement of the piston cylinder 220, and the swivel 430 rotates to drive the second ejector rods 431 to slide out of the second grooves 413 along the second guide inclined planes 414 to realize upward movement of the piston cylinder 220.
In this embodiment, the piston cylinder 220 is limited by the limiting chute 312 and the limiting slide block 412, so that the piston cylinder cannot rotate along the circumferential direction of the fixed cylinder 210; wherein, by the construction in the present embodiment, when the second ejector rod 431 extends into the second groove 413, the piston cylinder 220 moves downward under the action of the second spring 420, so that the outer drain 311 and the inner drain 411 are dislocated, and the outer drain 311 is closed; when the swivel 430 rotates to drive the second ejector rod 431 to slide out of the second groove 413 along the second guiding slope 414, the piston cylinder 220 moves upwards, so that the outer leak hole 311 is opposite to the inner leak hole 411, and the outer leak hole 311 is opened.
In this embodiment, the core blocking member 520 is provided with a second driving column 716 extending into the fixed cylinder 210, a clamping groove 717 is provided on an outer sidewall of the second driving column 716 along an axial direction thereof, and a clamping plate 432 extending into the corresponding clamping groove 717 for sliding is provided in the swivel 430.
Through the cooperation setting of cardboard 432 and draw-in groove 717 in this embodiment for carousel 531 rotates and can drive swivel 430 and rotate, thereby can drive the opening and shutting of outer leak hole 311 when making the user open and shut through pressing down the drive of post 540 liquid discharging component 130, makes pickling mechanism's use more convenient.
Referring to fig. 8, in the present embodiment, an exhaust pipe 111 is provided at the middle of a cover plate 110, and a one-way exhaust valve 112 is provided on the exhaust pipe 111; the stirring mechanism comprises a mounting tube seat 230 corresponding to the exhaust pipe 111, a rotatable mounting shaft 240 extending into the pickling cavity 201 is arranged in the mounting tube seat 230, stirring plates 241 are uniformly arranged on the mounting shaft 240, and fan blades 811 positioned in the mounting tube seat 230 are arranged at the upper end part of the mounting shaft 240.
In the actual operation process of the embodiment, oxide on the surface of the monocrystalline silicon ring is pickled to generate gas in the pickling process, which can preferably increase the gas pressure in the pickling tank 100, so that the gas in the monocrystalline silicon ring can be discharged from the exhaust pipe 111; by the structure in the embodiment, the airflow flowing during the exhaust of the exhaust pipe 111 can drive the fan blades 811 to rotate, and then the mounting shaft 240 is driven to drive the stirring plate 241 to rotate, so that the pickling solution in the pickling cavity 201 flows, preferably contacts with the monocrystalline silicon ring in the pickling mechanism, and the pickling effect is improved.
In this embodiment, the mounting bracket 821 through which the mounting shaft 240 passes is provided at the lower end opening of the mounting tube holder 230, and the mounting shaft 240 is rotatably mounted on the mounting bracket 821 by the nut 831, so that the rotational mounting of the mounting shaft 240 in the mounting tube holder 230 is preferably realized.
The embodiment also provides a cleaning mode of the monocrystalline silicon ring, which uses the acid cleaning device for the monocrystalline silicon ring to carry out acid cleaning and water cleaning treatment, and comprises the following steps:
step one, performing pure water ultrasonic cleaning treatment on the single crystal silicon ring after preliminary processing;
placing the preliminarily processed monocrystalline silicon ring in an ultrasonic machine, adding pure water with the water temperature of 75 ℃ and cleaning for 15 minutes, so that the monocrystalline silicon ring is timely cleaned, silicon powder is prevented from caking on the outer surface of the monocrystalline silicon ring, and the outer surface of the monocrystalline silicon ring is clean;
step two, grinding the monocrystalline silicon ring treated in the step one;
the white spots and marks on the outer surface of the monocrystalline silicon ring are effectively removed by grinding the surface of the monocrystalline silicon ring treated in the first step;
step three, alkali washing treatment is carried out on the monocrystalline silicon ring treated in the step two;
alkali washing is carried out on the monocrystalline silicon ring treated in the second step through alkali washing liquid, so that organic matters on the outer surface of the monocrystalline silicon ring are effectively removed;
step four, carrying out pure water ultrasonic cleaning treatment on the monocrystalline silicon ring treated in the step three;
placing the monocrystalline silicon ring treated in the third step into an ultrasonic machine for cleaning, so as to effectively remove alkaline cleaning solution attached to the surface of the monocrystalline silicon ring;
step five, carrying out acid washing and water washing treatment on the monocrystalline silicon ring treated in the step four by utilizing an acid washing device for the monocrystalline silicon ring;
placing the monocrystalline silicon ring treated in the fourth step into a pickling device for pickling and water washing;
and step six, drying the monocrystalline silicon ring treated in the step five.
And (3) drying the monocrystalline silicon ring treated in the fifth step by using nitrogen, so that the monocrystalline silicon ring and oxygen in the air are effectively prevented from undergoing oxidation reaction.
In this embodiment, the fifth step specifically includes the following steps:
s1, placing a monocrystalline silicon ring on a placing frame 120, and then placing the placing frame 120 into an acid washing cavity 201 through a placing hole 203;
s2, by pressing the pressing column 540 upwards, the liquid discharging assembly 130 is driven to be closed, the piston cylinder 220 is driven to move upwards to open the outer leakage hole 311, pickling solution enters from the outer leakage hole 311, and the monocrystalline silicon ring on the placing frame is subjected to pickling treatment;
s3, after the pickling treatment is finished, the liquid discharging assembly 130 is driven to be opened by pressing the pressing column 540 upwards, the piston cylinder 220 is driven to move downwards to enable the outer leakage hole 311 to be closed, and at the moment, clean water is injected into the fixed cylinder 210 through the water inlet pipe 321, so that the monocrystalline silicon ring on the placing frame 120 is subjected to water washing treatment;
s4, after the water washing treatment is completed, the placing frame 120 is taken out from the placing hole 203, and the steps are repeatedly operated, so that continuous acid washing and water washing treatment operation of the acid washing device is realized.
Claims (10)
1. An acid cleaning device for a monocrystalline silicon ring is characterized in that: the pickling tank comprises a pickling tank (100), wherein a pickling cavity (201) with an opening at the upper end and used for containing pickling solution is arranged in the pickling tank (100), and a cover plate (110) is arranged at the opening of the pickling cavity (201);
the middle part of the pickling cavity (201) is provided with a stirring mechanism for driving pickling liquid to flow, and a plurality of pickling mechanisms uniformly distributed on the periphery of the stirring mechanism are arranged in the pickling cavity (201);
the pickling mechanism comprises a fixed cylinder (210) and a piston cylinder (220) which is arranged in the fixed cylinder (210) in a lifting manner, outer leakage holes (311) are formed in the outer wall of the fixed cylinder (210) at intervals, and inner leakage holes (411) are formed in the outer wall of the piston cylinder (220) corresponding to the outer leakage holes (311); a placing frame (120) which can extend out of the pickling tank (100) and is used for placing a monocrystalline silicon ring is arranged in the piston cylinder (220);
the lower end part of the pickling tank (100) is provided with a liquid discharging assembly (130) corresponding to the fixed cylinder (210) for discharging pickling liquid in the fixed cylinder (210), and the liquid discharging assembly (130) is used for driving the piston cylinder (220) to lift and drive the outer leakage hole (311) and the inner leakage hole (411) to be opposite or staggered so as to realize the opening and closing of the outer leakage hole (311).
2. The pickling device for monocrystalline silicon rings as claimed in claim 1, wherein: the liquid draining assembly (130) comprises a mounting pipe (510), wherein a liquid inlet cavity (511), a core blocking mounting cavity (512) and a driving piece mounting cavity (513) with gradually increased diameters are sequentially arranged in the mounting pipe (510) from top to bottom;
the liquid inlet cavity (511) is used for communicating the acid washing cavity (201), and liquid outlet holes (611) are uniformly distributed on the side wall of the liquid inlet cavity (511); a lifting core blocking piece (520) is arranged in the core blocking installation cavity (512), and the core blocking piece (520) comprises a core blocking part ((711)) which is positioned in the liquid inlet cavity (511) and used for blocking the liquid outlet hole (611) and a ring blocking part (712) which is positioned in the core blocking installation cavity (512); a driving piece (530) for driving the core blocking piece (520) to lift and realize opening and closing of the liquid outlet hole (611) is arranged in the driving piece mounting cavity (513).
3. The pickling device for monocrystalline silicon rings as claimed in claim 2, wherein: the driving piece (530) comprises a rotatable turntable (531), a first driving column (532) extending into the plugging core installation cavity (512) is arranged at the upper end surface and the middle part of the turntable (531), a first sliding groove (721) is arranged on the outer side wall of the first driving column (532) along the axial direction of the first driving column, and a first spring (533) for driving the plugging core piece (520) to move upwards to close the liquid outlet hole (611) is sleeved on the first driving column (532); a movable cavity (713) into which the first driving column (532) extends is arranged on the core blocking piece (520), and a first sliding block (714) which is positioned in the corresponding first sliding groove (721) and slides is arranged on the side wall of the movable cavity (713); the upper side wall of the plugging core mounting cavity (512) is uniformly provided with first grooves (612), and first guide inclined planes (613) are respectively arranged in the first grooves (612);
first ejector rods (715) extending into the corresponding first grooves (612) are uniformly distributed on the plugging ring part (712), and the plugging core piece (520) rotates to drive the first ejector rods (715) to slide out of the first grooves (612) along the first guide inclined planes (613) so as to realize that the plugging core piece (520) moves downwards to open the liquid outlet holes (611).
4. A pickling apparatus for monocrystalline silicon rings as defined in claim 3, wherein: a convex ring (722) is arranged on the lower end surface of the turntable (531) along the axial direction of the turntable, and first ratchet grooves (723) are uniformly distributed on the lower end surface of the convex ring (722);
the driving piece (530) further comprises a pressing column (540) arranged below the driving piece installation cavity (513), a spring installation cavity (541) is arranged on the pressing column (540) corresponding to the convex ring (722), a second ratchet tooth groove (731) which is used for being matched with the first ratchet tooth groove (723) to drive the convex ring (722) to rotate is arranged at the opening of the spring installation cavity (541), and a reset spring (542) used for driving the pressing column (540) to reset is arranged in the spring installation cavity (541).
5. A pickling apparatus for monocrystalline silicon rings as defined in claim 3, wherein: the inner wall of the fixed cylinder (210) is axially provided with a limit chute (312), and the outer wall of the piston cylinder (220) is provided with a limit slide block (412) which is positioned in the corresponding limit chute (312) and slides;
a second spring (420) for pushing the piston cylinder (220) to move downwards to realize dislocation of the outer leakage hole (311) and the inner leakage hole (411) is arranged in the fixed cylinder (210), second grooves (413) are uniformly distributed at the lower end part of the piston cylinder (220) along the circumferential direction of the piston cylinder, and second guide inclined planes (414) are arranged in the second grooves (413); a rotary ring (430) which is arranged below the piston cylinder (220) and is rotatable is arranged in the fixed cylinder (210), second ejector rods (431) which extend into corresponding second grooves (413) are arranged on the rotary ring (430) at intervals, the second ejector rods (431) extend into the second grooves (413) to realize downward movement of the piston cylinder (220), and the rotary ring (430) rotates to drive the second ejector rods (431) to slide out of the second grooves (413) along the second guide inclined planes (414) to realize upward movement of the piston cylinder (220).
6. The pickling device for monocrystalline silicon rings as described in claim 5, wherein: the core blocking piece (520) is provided with a second driving column (716) extending into the fixed barrel (210), the outer side wall of the second driving column (716) is provided with a clamping groove (717) along the axial direction of the second driving column, and the rotating ring (430) is internally provided with a clamping plate (432) extending into the corresponding clamping groove (717) to slide.
7. The pickling device for monocrystalline silicon rings as claimed in claim 1, wherein: an exhaust pipe (111) is arranged in the middle of the cover plate (110), and a one-way exhaust valve (112) is arranged on the exhaust pipe (111); the stirring mechanism comprises a mounting tube seat (230) corresponding to the exhaust tube (111), a rotatable mounting shaft (240) extending into the pickling cavity (201) is arranged in the mounting tube seat (230), stirring plates (241) are uniformly arranged on the mounting shaft (240), and fan blades (811) positioned in the mounting tube seat (230) are arranged at the upper end part of the mounting shaft (240).
8. The pickling device for monocrystalline silicon rings as recited in claim 7, further comprising: the lower end opening of the mounting tube seat (230) is provided with a mounting frame (821) for the mounting shaft (240) to penetrate, and the mounting shaft (240) is rotatably mounted on the mounting frame (821) through a nut (831).
9. The pickling device for monocrystalline silicon rings as claimed in claim 1, wherein: a water injection pipe (320) is sleeved outside the fixed cylinder (210), and a water inlet pipe (321) penetrating through the pickling tank (100) is communicated with the water injection pipe (320); the outer wall of the fixed cylinder (210) is provided with water inlet holes (313) communicated with the water injection pipe (320) at intervals, and the lifting of the piston cylinder (220) is used for realizing the opening and closing of the water inlet holes (313).
10. A method for cleaning a monocrystalline silicon ring, a pickling apparatus for monocrystalline silicon ring according to any one of claims 1-9, comprising the steps of:
step one, performing pure water ultrasonic cleaning treatment on the single crystal silicon ring after preliminary processing;
step two, grinding the monocrystalline silicon ring treated in the step one;
step three, alkali washing treatment is carried out on the monocrystalline silicon ring treated in the step two;
step four, carrying out pure water ultrasonic cleaning treatment on the monocrystalline silicon ring treated in the step three;
step five, carrying out acid washing and water washing treatment on the monocrystalline silicon ring treated in the step four by utilizing an acid washing device for the monocrystalline silicon ring;
and step six, drying the monocrystalline silicon ring treated in the step five.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311164724.5A CN117282708A (en) | 2022-11-08 | 2022-11-08 | Pickling mechanism for monocrystalline silicon ring |
| CN202211392875.1A CN116174389B (en) | 2022-11-08 | 2022-11-08 | Pickling device for monocrystalline silicon ring and cleaning method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211392875.1A CN116174389B (en) | 2022-11-08 | 2022-11-08 | Pickling device for monocrystalline silicon ring and cleaning method |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202311164724.5A Division CN117282708A (en) | 2022-11-08 | 2022-11-08 | Pickling mechanism for monocrystalline silicon ring |
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| CN116174389A true CN116174389A (en) | 2023-05-30 |
| CN116174389B CN116174389B (en) | 2023-10-17 |
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| CN202211392875.1A Active CN116174389B (en) | 2022-11-08 | 2022-11-08 | Pickling device for monocrystalline silicon ring and cleaning method |
| CN202311164724.5A Pending CN117282708A (en) | 2022-11-08 | 2022-11-08 | Pickling mechanism for monocrystalline silicon ring |
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| JP2002037388A (en) * | 2000-07-27 | 2002-02-06 | Nippon Top Nozzle Kk | Automatic liquid injecting nozzle |
| CN102172584A (en) * | 2011-02-14 | 2011-09-07 | 常州亿晶光电科技有限公司 | Loading device specially for silicon material square section pickling |
| CN205096158U (en) * | 2015-11-20 | 2016-03-23 | 乐山新天源太阳能科技有限公司 | Silicon material cleaning device |
| CN215040536U (en) * | 2021-06-03 | 2021-12-07 | 安徽山清水秀农业科技发展服务有限公司 | Crushing structure of fruit for mulberry wine brewing |
| CN113857127A (en) * | 2021-10-20 | 2021-12-31 | 安徽信息工程学院 | Machine part belt cleaning device |
| CN114960079A (en) * | 2022-04-11 | 2022-08-30 | 浙江金兆纺织有限公司 | Preparation device and method of dustproof denim fabric |
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2022
- 2022-11-08 CN CN202211392875.1A patent/CN116174389B/en active Active
- 2022-11-08 CN CN202311164724.5A patent/CN117282708A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002037388A (en) * | 2000-07-27 | 2002-02-06 | Nippon Top Nozzle Kk | Automatic liquid injecting nozzle |
| CN102172584A (en) * | 2011-02-14 | 2011-09-07 | 常州亿晶光电科技有限公司 | Loading device specially for silicon material square section pickling |
| CN205096158U (en) * | 2015-11-20 | 2016-03-23 | 乐山新天源太阳能科技有限公司 | Silicon material cleaning device |
| CN215040536U (en) * | 2021-06-03 | 2021-12-07 | 安徽山清水秀农业科技发展服务有限公司 | Crushing structure of fruit for mulberry wine brewing |
| CN113857127A (en) * | 2021-10-20 | 2021-12-31 | 安徽信息工程学院 | Machine part belt cleaning device |
| CN114960079A (en) * | 2022-04-11 | 2022-08-30 | 浙江金兆纺织有限公司 | Preparation device and method of dustproof denim fabric |
Also Published As
| Publication number | Publication date |
|---|---|
| CN116174389B (en) | 2023-10-17 |
| CN117282708A (en) | 2023-12-26 |
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Effective date of registration: 20231120 Address after: Room 101, No. 25, Hengsheng Road, Jinchuan Street, Changshan County, Quzhou City, Zhejiang Province, 324200 Patentee after: Zhejiang Dunyuan Juxin Semiconductor Technology Co.,Ltd. Address before: Building C, no.668 BINKANG Road, Binjiang District, Hangzhou City, Zhejiang Province Patentee before: Hangzhou dunyuan poly core semiconductor technology Co.,Ltd. |