CN216323687U - Continuous belt cleaning device of silicon chip after diffusion - Google Patents

Abstract

The utility model discloses a diffused silicon wafer continuous cleaning device which comprises a cleaning table, wherein a cleaning structure is arranged on one side of the upper surface of the cleaning table and comprises a cleaning cover, a second servo motor, two spray heads and two pump bodies, and a first servo motor is fixed in the middle of the lower surface of the cleaning table. According to the utility model, the cleaning table, the cleaning structure, the first servo motor, the rotating plate and the two driving structures are arranged, and the cleaning structure comprises the second servo motor, the rotating rod, the spray head and the pump body, so that the two driving structures can be driven by the first servo motor to rotate back and forth on the surface of the cleaning table, when a silicon wafer on one driving structure is cleaned in the cleaning cover, the next silicon wafer can be fixedly arranged on the driving structure outside the cleaning cover, and the silicon wafers on the two driving structures alternately enter the cleaning cover of the cleaning structure to complete the cleaning operation, so that the cleaning can be continuously carried out, and the cleaning efficiency is improved.

Description

Continuous belt cleaning device of silicon chip after diffusion

Technical Field

The utility model relates to the technical field of silicon wafer cleaning, in particular to a device for continuously cleaning a diffused silicon wafer.

Background

The current silicon wafer production and manufacturing process comprises texturing, diffusion, cleaning (PSG removal), antireflection film deposition, screen printing, sintering, sorting and assembling. The cleaning process after diffusion is to remove a layer of phosphorosilicate glass formed by diffusion, and the cleaning step is an important step in silicon wafer production.

The cleaning method commonly used at present is to immerse the whole box of silicon wafers in a pool-shaped cleaning device for cleaning, the batch cleaning device is easy to cause cross contamination, so a spraying cleaning device appears on the market and can be used for cleaning one silicon wafer independently, but the cleaning device cannot realize seamless connection continuous cleaning in the cleaning process, so the cleaning efficiency is low, and therefore the utility model provides the diffused silicon wafer continuous cleaning device.

SUMMERY OF THE UTILITY MODEL

The utility model aims to solve the defects in the prior art and provides a device for continuously cleaning a silicon wafer after diffusion.

In order to achieve the purpose, the utility model adopts the following technical scheme: the utility model provides a continuous belt cleaning device of diffusion back silicon chip, includes the clean bench, clean bench upper surface one side is equipped with washs the structure, wash the structure including wasing cover, second servo motor, two shower nozzles and two pump bodies, clean bench lower surface middle part is fixed with first servo motor, first servo motor drive shaft passes clean bench and fixedly connected with rotor plate, rotor plate upper surface both sides are equipped with two drive structure, two the drive structure is located the inside and outside of wasing the cover respectively, wash one side that the cover is close to first servo motor and seted up first opening.

Furthermore, one side that the cleaning table bottom is close to the washing cover is equipped with the stock solution chamber, the weeping mouth has been seted up on stock solution chamber top, and stock solution chamber bottom is equipped with the fluid-discharge tube for the waste liquid after the washing can be collected at the stock solution intracavity, and in time arrange away through the fluid-discharge tube.

Further, the drive structure includes the seal box, the inside driving motor that is equipped with of seal box, the driving motor drive shaft passes the seal box roof and is connected with and places the dish, it is equipped with a plurality of rotatable spring leafs to place a set upper surface, and the accessible spring leaf is fixed the silicon chip and is placed a set surface to drive through driving motor and place dish and silicon chip and rotate, make the cleaning process, silicon chip surface energy is by even washing.

Further, place a set bottom middle part and be fixed with the cutting ferrule, the card hole has all been seted up to the cutting ferrule both sides, driving motor drive shaft top fixedly connected with fixture block, the fixture block both sides are all seted up flutedly, recess inside wall fixedly connected with spring, spring other end fixedly connected with kelly through the mode of kelly with card hole block for place the dish and can fix on the driving motor top fast, be convenient for dismantle placing the dish equally, be convenient for change different placing the dish according to wasing not unidimensional silicon chip.

Furthermore, two the pump body all is fixed in and washs and covers the upper surface, and two pump body liquid outlets are linked together with two shower nozzles respectively through the hose, two the pump body inlet inserts hydrofluoric acid and clear water respectively to can carry out the washing of hydrofluoric acid and clear water to the silicon chip respectively through two shower nozzles.

Further, second servo motor is fixed in and washs roof in the cover, and second servo motor drive shaft fixedly connected with dwang, two the shower nozzle is fixed in the dwang both sides respectively to the shower nozzle is located places directly over the dish, drives two shower nozzles through second servo motor and rotates in turn to place a set top, can carry out the washing of hydrofluoric acid and clear water successively.

Further, it is equipped with the baffle to wash the cover inside wall and be close to first opening part, and the second opening has been seted up to the baffle bottom, one side that the cleaning cover top is close to the baffle is fixed with the cylinder, the flexible end of cylinder passes and washs a roof and baffle top fixed connection, and when wasing to go on, the cylinder drives the baffle and descends and plug up first opening, and hydrofluoric acid and clear water spill from first opening part when can preventing to wash.

The utility model has the beneficial effects that:

1. when the silicon wafer cleaning device is used, the cleaning platform, the cleaning structure, the first servo motor, the rotating plate and the two driving structures are arranged, the cleaning structure comprises the second servo motor, the rotating rod, the spray head and the pump body, so that the two driving structures can be driven by the first servo motor to rotate back and forth on the surface of the cleaning platform, when a silicon wafer on one driving structure is cleaned in the cleaning cover, the next silicon wafer can be fixedly arranged on the driving structure outside the cleaning cover, the silicon wafers on the two driving structures alternately enter the cleaning cover of the cleaning structure to complete the cleaning operation, the cleaning can be continuously carried out, and the cleaning efficiency is improved.

2. When the silicon wafer cleaning device is used, the driving motor is arranged, the driving mechanism comprises the driving motor and the placing disc, the clamping sleeve is arranged at the bottom end of the placing plate, the clamping block is connected to the driving shaft of the driving motor, the placing disc is fixed to the driving shaft of the motor in a mode that the clamping block is connected with the clamping sleeve, the placing disc can be rapidly detached from the driving motor, the placing disc with the corresponding size can be replaced when silicon wafers with different sizes are cleaned, and the device is more flexible to use.

Drawings

FIG. 1 is a perspective view of the present invention;

FIG. 2 is a side cross-sectional view of the present invention;

fig. 3 is an enlarged view of the utility model at a.

Illustration of the drawings:

1. a cleaning table; 101. a liquid storage cavity; 102. a liquid leakage port; 2. cleaning the structure; 21. cleaning the cover; 211. a first opening; 3. a first servo motor; 4. a rotating plate; 5. a drive structure; 51. a sealing box; 52. a drive motor; 53. placing a tray; 54. a spring plate; 55. a card sleeve; 551. a clamping hole; 56. a clamping block; 561. a groove; 562. a spring; 563. a clamping rod; 6. a baffle plate; 61. a second opening; 7. a cylinder; 8. a second servo motor; 9. rotating the rod; 10. a spray head; 11. and a pump body.

Detailed Description

As shown in fig. 1 and 2, relate to a continuous belt cleaning device of diffusion back silicon chip, including wash platform 1, wash platform 1 upper surface one side is equipped with washs structure 2, wash structure 2 including wasing cover 21, second servo motor 8, two shower nozzles 10 and two pump bodies 11, wash platform 1 lower surface middle part is fixed with first servo motor 3, wash platform 1 and fixedly connected with rotor plate 4 are passed to first servo motor 3 drive shaft, rotor plate 4 upper surface both sides are equipped with two drive structure 5, two drive structure 5 are located wash cover 21 inside and outside respectively, wash cover 21 and be close to one side of first servo motor 3 and seted up first opening 211. One side that the cleaning table 1 bottom is close to the washing cover 21 is equipped with stock solution chamber 101, and stock solution chamber 101 top has seted up the weeping mouth 102, and stock solution chamber 101 bottom is equipped with the fluid-discharge tube. The driving structure 5 comprises a sealing box 51, a driving motor 52 is arranged in the sealing box 51, a driving shaft of the driving motor 52 penetrates through the top wall of the sealing box 51 to be connected with a placing disc 53, and the upper surface of the placing disc 53 is provided with a plurality of rotatable spring pieces 54. Two pump bodies 11 are all fixed in and wash the cover 21 upper surface, and two pump body 11 liquid outlets are linked together with two shower nozzles 10 respectively through the hose, and hydrofluoric acid and clear water are inserted respectively to two pump body 11 liquid inlets. Second servo motor 8 is fixed in and washs the interior roof of cover 21, and 8 drive shaft fixedly connected with dwang 9 of second servo motor, and two shower nozzles 10 are fixed in dwang 9 both sides respectively. Wash the cover 21 inside wall and be equipped with baffle 6 near first opening 211 department, and the second opening 61 has been seted up to 6 bottoms of baffle, and the one side that washs the cover 21 top and be close to baffle 6 is fixed with cylinder 7, and the flexible end of cylinder 7 passes and washs cover 21 roof and 6 top fixed connection of baffle.

As shown in fig. 2 and 3, a cutting sleeve 55 is fixed in the middle of the bottom end of the placing disc 53, clamping holes 551 are formed in two sides of the cutting sleeve 55, a clamping block 56 is fixedly connected to the top end of a driving shaft of the driving motor 52, grooves 561 are formed in two sides of the clamping block 56, springs 562 are fixedly connected to the inner side walls of the grooves 561, and clamping rods 563 are fixedly connected to the other ends of the springs 562.

When in use: firstly, selecting a proper placing disc 53 according to the size of the silicon wafer to be cleaned, then pressing the clamping rods 563 at two sides of the clamping block 56 at the top end of the driving motor 52 to retract the silicon wafer into the groove 561, then sleeving the clamping sleeve 55 at the bottom end of the placing disc 53 on the clamping block 56, clamping the clamping rods 563 with the clamping holes 551 under the action of the elastic force of the spring 562, thereby completing the installation and fixation of the placing disc 53, after the placing discs 53 at the top ends of the two driving motors 52 are all installed, firstly clamping a silicon wafer on the surface of the placing disc 53 positioned outside the cleaning cover 21 through the spring leaf 54, then starting a cleaning program through the control panel at one side of the surface of the cleaning table 1, at this time, the first servo motor 3 drives the rotating plate 4 to rotate, so that the placing disc 53 with the silicon wafer is transferred into the cleaning cover 21 from the first opening 211, then the cylinder 7 drives the baffle 6 to descend, and the second opening 61 at the bottom end of the baffle 6 is just clamped on the rotating plate 4, then the pump body 11 connected with hydrofluoric acid pumps hydrofluoric acid into the spray head 10 positioned above the silicon wafer, and sprays hydrofluoric acid on the surface of the silicon wafer, meanwhile, the driving motor 52 starts to rotate and drives the placing disc 53 and the silicon wafer to rotate, so that the surface of the silicon wafer is cleaned more uniformly, after the cleaning is finished, the second servo motor 8 rotates forwards, the other spray head 10 rotates to the position above the silicon wafer, clean water is pumped into the spray head 10 through the pump body 11 connected with clean water and is sprayed on the surface of the silicon wafer, after the cleaning is finished, the two pump bodies 11 stop working, at the moment, the second servo motor 8 rotates backwards to drive the two spray heads 10 to reset, and the driving motor 52 continues to rotate for a period of time to spin-dry water on the surface of the silicon wafer. When the cleaning cover 21 is used for cleaning, a new silicon wafer to be cleaned can be replaced on the placing disc 53 positioned outside the cleaning cover 21, so that the first servo motor 3 drives the two placing discs 53 to rotate and alternately enter the cleaning cover 21 for cleaning, and the cleaning can be continuously carried out in a seamless connection mode.

The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the utility model, and any modifications, equivalents, improvements and the like that fall within the spirit and principle of the present invention are intended to be included therein.

Claims (7)

1. The utility model provides a silicon chip continuous cleaning device after diffusion which characterized in that: including wash platform (1), wash platform (1) upper surface one side is equipped with and washs structure (2), wash structure (2) including wasing cover (21), second servo motor (8), two shower nozzles (10) and two pump bodies (11), wash platform (1) lower surface middle part is fixed with first servo motor (3), wash platform (1) and fixedly connected with rotor plate (4) are passed to first servo motor (3) drive shaft, rotor plate (4) upper surface both sides are equipped with two drive structure (5), two drive structure (5) are located respectively and wash cover (21) inside and outside, wash one side that cover (21) are close to first servo motor (3) and seted up first opening (211).

2. The apparatus of claim 1, wherein: one side that the cleaning table (1) bottom is close to washing cover (21) is equipped with stock solution chamber (101), stock solution chamber (101) top has seted up weeping mouth (102), and stock solution chamber (101) bottom is equipped with the fluid-discharge tube.

3. The apparatus of claim 1, wherein: the driving structure (5) comprises a sealing box (51), a driving motor (52) is arranged inside the sealing box (51), a driving shaft of the driving motor (52) penetrates through the top wall of the sealing box (51) to be connected with a placing disc (53), and a plurality of rotatable spring pieces (54) are arranged on the upper surface of the placing disc (53).

4. The apparatus according to claim 3, wherein: the clamping sleeve (55) is fixed in the middle of the bottom end of the placing disc (53), clamping holes (551) are formed in two sides of the clamping sleeve (55), a clamping block (56) is fixedly connected to the top end of a driving shaft of the driving motor (52), grooves (561) are formed in two sides of the clamping block (56), springs (562) are fixedly connected to the inner side walls of the grooves (561), and clamping rods (563) are fixedly connected to the other ends of the springs (562).

5. The apparatus of claim 1, wherein: two pump body (11) all are fixed in and wash cover (21) upper surface, and two pump body (11) liquid outlets are linked together with two shower nozzles (10) respectively through the hose, two hydrofluoric acid and clear water are inserted respectively to pump body (11) liquid inlet.

6. The apparatus of claim 1, wherein: second servo motor (8) are fixed in and wash roof in cover (21), and second servo motor (8) drive shaft fixedly connected with dwang (9), two dwang (9) both sides are fixed in respectively in shower nozzle (10).

7. The apparatus of claim 1, wherein: wash cover (21) inside wall and be close to first opening (211) department and be equipped with baffle (6), and second opening (61) have been seted up to baffle (6) bottom, the one side that washs cover (21) top and be close to baffle (6) is fixed with cylinder (7), the flexible end of cylinder (7) passes and washs cover (21) roof and baffle (6) top fixed connection.

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