CN116056305A

CN116056305A - Beam loss control device and injection static deflection plate

Info

Publication number: CN116056305A
Application number: CN202310049167.6A
Authority: CN
Inventors: 申国栋; 杨建成; 柴伟平; 原有进; 刘杰; 卢佳琪; 张京京; 阮爽; 张帅帅; 王儒亮
Original assignee: Institute of Modern Physics of CAS
Current assignee: Institute of Modern Physics of CAS
Priority date: 2023-02-01
Filing date: 2023-02-01
Publication date: 2023-05-02
Anticipated expiration: 2043-02-01
Also published as: CN116056305B

Abstract

The invention relates to a beam loss control device and an injection static deflection plate, wherein the beam loss control device comprises: the beam absorber is of a tubular structure, and the end face of the beam absorber, which is connected with the beam, is perpendicular to the direction of the beam; the number of the moving brackets is two, and the two moving brackets are respectively connected with the two ends of the beam absorber through first corrugated pipes; a vacuum sealing flange for mounting the moving mount on a vacuum pumping chamber of an electrostatic deflection plate, with a portion of the moving mount being disposed outside the vacuum pumping chamber; the second corrugated pipe is sleeved on a part of the moving support, which is positioned outside the vacuum pump chamber; and the power output end of the driving mechanism is connected with the moving bracket and used for driving the moving bracket to move so as to drive the beam absorber to move.

Description

Beam loss control device and injection static deflection plate

Technical Field

The invention relates to a beam loss control device and an injection static deflection plate, and belongs to the technical field of accelerators.

Background

The heavy ion accelerator is a device for generating high-speed ion beam current by using an artificial method, and a large scientific device based on the heavy ion accelerator is an important basic tool for researching the nuclear physical front scientific problem and has important application in the aspects of aerospace, nuclear energy, materials, medicine, population health, environmental pollution control, national security and the like. Modern nuclear physics research is increasingly dependent on the support of heavy ion accelerator large science devices. With the deep scientific research, nuclear physics related research puts higher and higher demands on the intensity of heavy ion beams.

For a low-energy strong-current heavy ion synchrotron, the limiting effect of the dynamic vacuum effect on the strong current is far more than the space charge effect, and the method becomes a primary difficult problem of obtaining the strong-current heavy ion beam current. The dynamic vacuum effect is a special phenomenon of medium-charge heavy ion beam current, the beam current can be continuously collided with residual gas in the process of running in a vacuum pipeline of the synchronous accelerator, out-of-core electrons can be lost or obtained in the collision process, namely, the charge state of heavy ions is changed, when the ions pass through a downstream magnet, the ions are greatly different from normal ions under the deflection effect of a magnetic field, and the movement track deviates from an ideal track and is lost on a vacuum wall. Typically, there are multiple layers of gas molecules on the vacuum wall, and collisions between ions and gas molecules cause these gases to break loose from the adsorption of the vacuum wall, becoming free, resulting in an increase in the density of gas molecules on the ion path and a decrease in vacuum. The increased molecular density of the gas in turn increases the probability of collisions with heavy ions, more ion charge states change and are lost to the vacuum walls, and the vacuum is further reduced. These two processes strengthen each other, eventually leading to an avalanche-like drop in vacuum and a rapid loss of beam current. After years of research by European accelerator specialists, a series of measures for inhibiting dynamic vacuum effect are developed, including a collimator of arc section An Zhuangshu, plating NEG getter films in a full-ring vacuum pipeline, installing NEG strips with high pumping speed at the position of an injection electrostatic deflection plate, improving the rising speed of a magnetic field and the like, so that good effects are obtained, but the accumulated current intensity of SIS18 on a synchrotron is still only 1/7 of the space charge limit, and the requirement of FAIR project on current intensity is far from being met, wherein one of the reasons is that the current loss at the position of the electrostatic deflection plate is too large, and the dynamic vacuum effect is difficult to inhibit.

The dynamic vacuum effect is mainly determined by the beam loss, desorption rate and static vacuum degree. Beam loss at the electrostatic deflector is the most dominant loss mode in the synchrotron beam injection phase, the loss amount can reach 10-50% of the total injection beam, and the loss process usually occurs in hundreds of microseconds, which is determined by the multi-turn injection principle. Beam loss at electrostatic deflection plates is largely divided into two types: 1. the injection beam is lost, the lateral direction of the injection beam is approximately Gaussian, in order to obtain higher injection gain and injection efficiency, the center of the injection beam is close to the silk plate at the outlet of the electrostatic deflection plate, and part of the beam collides with the silk plate to be lost, as shown in fig. 1. The high-voltage electric field is arranged between the filament plate and the high-voltage electrode and used for deflecting the injected beam, ion fragments generated by the collision bombard the high-voltage electrode under the action of the high-voltage electric field, so that the electric field between the high-voltage electrode and the filament plate is rapidly reduced, the deflection effect of the beam after entering the deflection plate is weakened, the injection angle is deviated, more beam loss is caused, and the phenomenon is proved on an SIS18 device; 2. returning to the loss of beam current, the injected beam current returns to the vicinity of the filament plate again after 2-4 circles of betatron oscillation, and ions outside the filament plate in horizontal or vertical positions collide with the filament plate to be lost.

According to the design of multi-circle injection, the injected beam and the returned beam are approximately parallel to the filament plate, the collision parameters of the beam and tungsten filaments in the filament plate are very small and are all in small-angle grazing incidence, and when the lost beam collides with a gas molecular layer on the wall of a vacuum tube, more than 5 times of gas molecules can be desorbed by single ions compared with the normal incidence; in addition, as the section of the tungsten wire is small, for example, the diameter of the tungsten wire of a common electrostatic deflection plate is only 0.1mm, partial ions cannot be completely prevented after entering the tungsten wire, and the ions escape from the tungsten wire again and scatter into a downstream vacuum chamber to cause more gas desorption.

The static deflection plate comprises a large-aperture vacuum pump chamber (aperture is generally more than 400 mm), about 1000 tungsten wires, about 2000 tungsten wire tensioning springs, a porous anode frame, corrugated high-voltage ceramic columns, high-voltage electrodes and a plurality of bolt connections, wherein the vacuum surface area is large, the air load is high, the static vacuum degree is 2-5 times higher than other positions in the synchronous ring, and after a period of operation, the suction rate of the titanium sublimation pump at the static deflection plate is reduced, and the difference between the static vacuum degree and other positions in the synchronous ring can reach more than 10 times.

In summary, the dynamic vacuum effect at the electrostatic deflection plate has the characteristics of large beam loss, short time, high desorption rate and poor static vacuum, and can cause serious dynamic vacuum effect, for example, the loss of the beam on the electrostatic deflection plate can be fundamentally controlled, and the method has important significance in inhibiting the dynamic vacuum effect and improving the flow intensity of the heavy ion accelerator with strong flow.

Disclosure of Invention

The invention provides a beam loss control device and an injection static deflection plate, which can greatly reduce the dynamic vacuum effect of the injection static plate of a heavy ion synchrotron, prolong the service life of the static deflection plate and further help to improve the accumulated beam intensity of the heavy ion synchrotron.

In order to achieve the above purpose, the present invention adopts the following technical scheme:

a beam loss control apparatus, the beam loss control apparatus comprising:

the beam absorber is of a tubular structure, and the end face of the beam absorber, which is connected with the beam, is perpendicular to the direction of the beam;

the number of the moving brackets is two, and the two moving brackets are respectively connected with the two ends of the beam absorber through first corrugated pipes;

a vacuum sealing flange for mounting the moving mount on a vacuum pumping chamber of an electrostatic deflection plate, with a portion of the moving mount being disposed outside the vacuum pumping chamber;

the second corrugated pipe is sleeved on a part of the moving support, which is positioned outside the vacuum pump chamber;

and the power output end of the driving mechanism is connected with the moving bracket and used for driving the moving bracket to move so as to drive the beam absorber to move.

In the beam loss control device, preferably, the beam absorber has a hollow tubular structure, and the moving bracket is provided with a cooling water pipe, and the cooling water pipe is in fluid conduction connection with the cavity of the beam absorber through the first corrugated pipe.

In the beam loss control device, preferably, in a cross section of the beam absorber, an end face width of the incident beam is larger than an end face opposite to the end face of the incident beam.

In the beam loss control device, preferably, the width of the end face of the head-on beam is 3-20 mm.

In the beam loss control device, preferably, each moving bracket is independently driven by a driving mechanism, and the driving mechanism is a driving motor.

A second aspect of the present invention provides an injection electrostatic deflector comprising the beam loss control apparatus of any one of the preceding claims, further comprising a vacuum pumping chamber in which an anode holder and an electrode are mounted, the beam loss control apparatus being mounted on a chamber wall of the vacuum pumping chamber by the vacuum sealing flange.

The electrostatic charge deflector preferably includes the beam absorber, the first bellows, and a portion of the moving support within the vacuum pump chamber, and a further portion of the moving support and the drive mechanism outside the vacuum pump chamber.

Preferably, the anode frame is wound with a tightly-stretched tungsten wire, and the tungsten wire forms a plane wire plate or an arc wire plate.

The injection static deflection plate is preferably arranged in parallel with a plane wire plate formed by the tungsten wires or at an angle with the anode frame.

Preferably, the distance between the beam absorber and the tungsten filament forming a plane filament plate or an arc filament plate is 10-200 mm.

Due to the adoption of the technical scheme, the invention has the following advantages:

1. the dynamic vacuum effect is greatly reduced. The electrostatic deflection plate is used as the last element of the acceptance of the injection beam into the synchrotron, 10-50% of the total injection beam is lost due to the limitation of the position by the multi-circle injection principle, and the quantity of lost ions exceeds the losses of other parts of the synchrotron; the loss forms of the injection beam and the return beam on the filament plate in the injection process are mainly grazing incidence, the number of gas molecules generated by single ions is greatly increased, namely the desorption rate is high, and the ions which are incident at the edge cannot be completely prevented due to the small size of the tungsten filament, can escape from the tungsten filament and are scattered at other parts of the electrostatic deflection plate, so that more gas molecules are additionally generated at the emergent position and the final prevention position of the tungsten filament; again, the beam loss occurs in a very short time (< 1 ms), the gas molecule moving distance is equivalent to the diameter of the vacuum chamber, and the gas molecule is not absorbed by the vacuum pump; finally, the structure of the element injected into the static deflection plate is complex, the surface area is large, the vacuum air outlet rate is high, and the threshold value for generating dynamic vacuum is low. Therefore, the static deflection plate has large gas generation quantity and short time, and is extremely easy to form dynamic vacuum effect, thereby causing avalanche type loss of ion beam current. The beam loss at the static deflection plate is reduced by more than 90% through the beam loss control device, so that the quantity of residual gas is greatly reduced, and the dynamic vacuum effect is reduced.

2. The cumulative flow strength limit of the synchrotron is raised. The device greatly reduces the beam loss caused by the dynamic vacuum effect by reducing the injection beam loss and the dynamic vacuum effect at the static deflection plate; the electric field between the silk plate and the high-voltage electrode is weakened under the action of spark discharge, the beam current can enter the acceptance degree at a more accurate angle, and the return beam loss is reduced; the alleviation of the dynamic vacuum effect is beneficial to injecting more beam current, and the accumulated current intensity is improved to the space charge limit.

3. The service life of the static deflection plate is prolonged. The existing electrostatic deflection cannot be used for controlling the thickness of a filament plate, the filament plate is formed by stretching a tungsten wire or a tungsten-rhenium alloy belt with the thickness of less than 0.1mm, cooling water cannot be used for cooling, and the length of the tungsten wire is far greater than the diameter, heat conduction through a filament frame is negligible, and the main form of cooling in extremely high vacuum is blackbody radiation, so that the heat dissipation capacity of the tungsten wire is poor. By adding the beam loss control device on the injection beam track and the return beam track before the injection of the static deflection plate, the beam which is originally lost on the static deflection plate is absorbed, so that the energy deposition of the beam in the static deflection plate is reduced by more than 90%, the risks of thermal deformation, crystallization embrittlement and even fusing of tungsten wires are effectively relieved, and the service life of the static deflection plate is prolonged.

4. Novel and compact structure. The invention utilizes the characteristic that the boundary between the part to be lost and the part not to be lost in the injection beam and the return beam at the static deflection plate is obvious, and creatively provides that the part to be lost is scraped in advance at the position, so that the scraping efficiency is high. Since the separation amount of the injected beam and the circulating beam is small at the upstream position of the electrostatic deflection plate, generally only 5-20 mm, the beam loss control device has a difficulty in that the space is too small. The beam absorber with the trapezoid cross section has the advantages that the width is only 3-20 mm, the occupied space is small, the position and the angle of the beam absorber can be flexibly adjusted through independent adjustment of the positions of the two ends of the absorber, and the best loss beam absorption rate can be obtained on the premise that the accumulated flow intensity is not influenced according to different loss conditions of beams in the beam adjustment process.

Drawings

FIG. 1 is a schematic diagram of the loss of an injected beam, a return beam, and a filament plate in a conventional electrostatic deflector plate;

FIG. 2 is a schematic diagram of a beam loss control device added before the injected beam and the return beam collide with the filament plate according to an embodiment of the present invention;

FIG. 3 is a schematic view of the overall apparatus for controlling beam loss in an electrostatic deflector according to the embodiment of the present invention;

fig. 4 is an overall schematic diagram of a beam loss control device according to the embodiment of the present invention;

fig. 5 is a schematic diagram of a beam absorber in the beam loss control apparatus according to the embodiment of the present invention;

the figures are marked as follows:

1-a vacuum pump chamber; 2-an anode frame; 3-high voltage electrode; the device comprises a 4-beam loss control device, a 4-1-beam absorber, a 4-2-first corrugated pipe, a 4-3-moving bracket, a 4-4-vacuum sealing flange, a 4-5-second corrugated pipe, a 4-6-driving motor, a 4-7-water pipe joint and a 4-8-cavity; 5-injection beam, 5-1-loss injection beam; 6-return beam, 6-1-loss return beam.

Detailed Description

For the purpose of making the objects, technical solutions and advantages of the present invention more apparent, the technical solutions in the present invention will be clearly and completely described below, and it is apparent that the described embodiments are some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by one of ordinary skill in the art without undue burden from the present disclosure, are intended to be within the scope of the present disclosure.

Unless defined otherwise, technical or scientific terms used herein should be given the ordinary meaning as understood by one of ordinary skill in the art to which this invention belongs. The terms "first," "second," "third," "fourth," and the like as used herein do not denote any order, quantity, or importance, but rather are used to distinguish one element from another. The word "comprising" or "comprises", and the like, means that elements or items preceding the word are included in the element or item listed after the word and equivalents thereof, but does not exclude other elements or items. The terms "connected" or "connected," and the like, are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect.

The strong dynamic vacuum effect exists in the strong current heavy ion synchrotron, and the beam interacts with residual gas in a vacuum pipeline, so that the vacuum degree and the service life of the beam are reduced in an avalanche mode, and the increase of the accumulated current intensity is severely limited. The dynamic vacuum effect is mainly determined by the beam loss, desorption rate and static vacuum degree. The dynamic vacuum effect at the injection electrostatic deflection plate is severe for two main reasons: 1. the injection static deflection plate is the position where the injection beam and the circulating beam meet, and the beam loss is most serious; 2. the beam loss at the static deflection plate is in the form of small-angle grazing incidence of the beam and the silk plate, and the dynamic vacuum desorption rate is far higher than that of other positions of the synchronous accelerator; 3. the static deflection plate has complex internal structure, large surface area and poor static vacuum degree. The static deflection plate is the weakest link of the dynamic vacuum effect, and the traditional mode is mainly focused on increasing the pumping direction of the vacuum pump at the static deflection plate, so that the problem is not solved fundamentally.

According to the invention, two groups of beam loss control devices are innovatively introduced at the inlet of the electrostatic deflection plate, one group is used for scraping the beam to be lost on the filament plate in advance during the injection of the beam, and the other group is used for scraping the beam to be lost on the filament plate in advance during the return of the beam, so that the beam loss on the electrostatic deflection plate is greatly reduced. The beam absorber in the beam loss control device is perpendicular to the beam direction, so that the beam loss form is ensured to be vertical incidence, and the dynamic vacuum desorption rate is greatly reduced. In addition, the reduction of beam loss on the static deflection plate is beneficial to relieving the thermal effect of the beam loss led out on the static deflection plate, preventing the tungsten wire from being deformed by heat, crystallized and embrittled and even fused, and prolonging the service life of the static deflection plate. The beam loss control device can greatly reduce the dynamic vacuum effect of the heavy ion synchrotron with strong current, and is also beneficial to further improving the accumulated beam intensity of the heavy ion synchrotron.

As shown in fig. 1, the electrostatic deflector is a core component of a synchrotron beam-injection system, and includes: the vacuum pump chamber 1, the anode frame 2 and the high-voltage electrode 3, wherein the vacuum pump chamber 1 is used for installing the internal components of the electrostatic deflection plate and providing a vacuum environment required by the synchrotron; a plane wire plate or an arc wire plate formed by tightening tungsten wires is wound on the anode frame 2 and used for generating an electric field with the high-voltage electrode 3, the electric field deflects the passing injection beam, the diameter of the tungsten wires directly influences the injection efficiency of the electrostatic deflection plate, and the diameter of the tungsten wires is generally 0.1mm; the high-voltage electrode 3 is used for loading negative high voltage (the voltage is usually-20 to-200 kV) and generating an electric field with the anode frame 2; beam loss control means 4 for absorbing the injection beam and returning the portion of the beam to be lost to the anode frame 2.

As shown in fig. 2, the beam loss control device 4 according to the present invention includes: the beam absorber 4-1 is of a tubular structure, and the end face of the beam absorber 4-1, which is connected with the beam, is perpendicular to the direction of the beam, so that the beam is ensured to collide with the beam absorber 4-1 vertically, and the desorption rate of residual gas during beam bombardment is greatly reduced; the number of the moving brackets 4-3 is two, and the two moving brackets 4-3 are respectively connected with two ends of the beam absorber 4-1 through first corrugated pipes 4-2; a vacuum sealing flange 4-4 for fitting the moving bracket 4-3 on the vacuum pump chamber 1 of the electrostatic deflector plate, and a part of the moving bracket 4-3 is disposed outside the vacuum pump chamber 1; the second corrugated pipe 4-5 is sleeved on a part of the moving support 4-3, which is positioned outside the vacuum pump chamber 1; and the power output end of the driving mechanism is connected with the moving support 4-3 and is used for driving the moving support 4-3 to move (the moving support 4-3 stretches and contracts along the rod direction), so as to drive the beam absorber 4-1 to move.

In some preferred embodiments of the present invention, as shown in fig. 3, the beam absorber 4-1 has a hollow tubular structure, and the moving support 4-3 is provided with a cooling water pipe, and the cooling water pipe is connected with the cavity 4-8 of the beam absorber 4-1 in a fluid conduction manner through the first corrugated pipe 4-2. The cavity 4-8 is arranged in the beam absorber 4-1, cooling water is introduced in the running process, heat generated by beam energy deposition is taken away, the beam loss control device 4 is prevented from being deformed or damaged by heating, and meanwhile, the beam absorber 4-1 can be prevented from being heated to desorb more gas molecules.

Further, the beam absorber 4-1 is made of non-magnetic metal, preferably oxygen-free copper, and in the cross section of the beam absorber 4-1, the width of the end face of the head-on beam is larger than that of the end face opposite to the end face of the head-on beam, so that the beam loss on the side edge of the beam absorber 4-1 is avoided, and a large amount of gas is prevented from being desorbed due to incidence at a small angle. In one embodiment, the cross section of the beam absorber 4-1 is trapezoid, and the width of the end face facing the beam is 3-20 mm.

Further, the beam absorber 4-1 is parallel to the plane filament plate formed by the tungsten filament, or the beam absorber 4-1 is at a certain angle with the anode frame 2. For a common horizontal multi-turn injection design, since the beam is symmetrical about the vertical direction, the beam loss control device 4 is parallel to the planar filament plate, and for a bidirectional smearing injection inclined electrostatic deflection plate, the placement angle of the beam loss control device 4 is related to the inclination angle of the anode frame 2 and the ratio of the beam horizontal envelope and the vertical envelope at the beam loss control device 4, and the beam absorber 4-1 can form an angle with the anode frame 2. The distance between the beam absorber 4-1 and the filament plate is 10-200 mm, and the closer the distance is, the higher the accuracy of beam loss control is, but too close the distance may affect the electric field distribution, and the spark discharge occurs with the high-voltage electrode 3.

Further, the upper end and the lower end of the beam absorber 4-1 can be independently driven and controlled by motors respectively, so that the angle and the position of the beam absorber 4-1 can be independently adjusted, the beam absorber 4-1 is connected with a cooling water pipe in the moving support 4-3 through a first corrugated pipe 4-2, and the first corrugated pipe 4-2 is used for absorbing the deformation of an upper connecting point and a lower connecting point in the angle adjusting process of the beam absorber 4-1 and preventing the connecting point from being damaged in the adjusting process so as to damage the vacuum environment; the moving support 4-3 is used for supporting the beam absorber 4-1 and the bellows 4-2.

The vacuum sealing flange 4-4 is used for assembling the beam loss control device 4 with the vacuum pump chamber 1, and the second corrugated pipe 4-5 is used for isolating vacuum and atmosphere during the position adjustment of the moving bracket 4-3 relative to the vacuum pump chamber 1; the moving motor 4-6 is used for adjusting the position of the moving bracket 4-3, and the cavity 4-8 is connected with a cooling water pipe in the moving bracket 4-3 and an external cooling water system, so that cooling water flows into the beam loss control device 4 from one end of the cavity 4-8 and flows out from the other end.

Further, the number of the beam loss control devices 4 may be 1 or more, and the number may be adjusted according to the area of blocking the beam.

As shown in fig. 4, the losses on the electrostatic deflector plate mainly include both injection beam losses and return beam losses. The existing filament plate (wound on the anode frame 2) and the high-voltage electrode 3 are provided with a high-voltage electric field for deflecting the injection beam 5, the injection beam is approximately gaussian in transverse direction, and in order to obtain higher injection gain and injection efficiency, the center of the injection beam must be close to the filament plate at the outlet of the electrostatic deflection plate, so that part of the beam collides with the filament plate and is lost. The lost injection beam 5-1 collides with the filament plate, ion fragments generated by collision bombard the high-voltage electrode 3 under the action of the high-voltage electric field, so that the electric field between the high-voltage electrode 3 and the filament plate is rapidly reduced, the deflection effect received by the injected beam 5-1 after entering the electrostatic deflection plate is weakened, the injection angle is deviated, and more beam loss is caused; on the other hand, the return beam 6 is lost, and the injection beam 5 is returned to the vicinity of the filament plate again after 2 to 4 times of betatron oscillation, and collides with the filament plate to be lost. Because the injection beam 5 and the return beam 6 are approximately parallel to the filament plate, the collision parameters of the injection beam 5 and the return beam 6 with tungsten filaments in the filament plate are small and are small-angle glancing incidence, more than 5 times of gas molecules are desorbed due to single lost ions, in addition, because the section of the tungsten filaments is small, as the diameter of a common electrostatic deflection plate tungsten filament is only 0.1mm, partial ions cannot be completely prevented after entering the tungsten filaments, escape from the tungsten filaments again and scatter into a downstream vacuum chamber, and more gas desorption is caused.

As shown in fig. 5, the characteristic that the boundary between the part to be lost and the part not to be lost in the injection beam 5 and the return beam 6 at the electrostatic deflection plate is obvious is utilized, and the innovative proposal is that the part to be lost is scraped off in advance at the position. The beam loss control device 4 adopts a design perpendicular to the beam, so that the beam is ensured to vertically enter the beam loss control device, the dynamic vacuum desorption rate is greatly reduced, and meanwhile, the width of the end face of the beam which is connected in the cross section of the beam absorber 4-1 is larger than the end face opposite to the end face of the beam which is connected, so that a great amount of gas is prevented from being desorbed due to the small-angle collision between the lost beam and the side edge of the beam absorber 4-1. The invention can greatly reduce the dynamic vacuum effect of the high-current heavy ion synchrotron and is also beneficial to further improving the accumulated beam intensity of the synchrotron. In addition, the reduction of the beam loss on the static deflection plate is also beneficial to relieving the thermal effect of the beam loss led out on the static deflection plate, preventing the tungsten wire from being deformed by heat, crystallized and embrittled and even fused, and prolonging the service life of the static deflection plate.

Finally, it should be noted that: the above embodiments are only for illustrating the technical solution of the present invention, and are not limiting; although the invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical scheme described in the foregoing embodiments can be modified or some technical features thereof can be replaced by equivalents; such modifications and substitutions do not depart from the spirit and scope of the technical solutions of the embodiments of the present invention.

Claims

1. A beam loss control device, characterized in that the beam loss control device (4) includes:

the beam absorber (4-1) is of a tubular structure, and the end face of the beam absorber (4-1) which is connected with the beam is perpendicular to the direction of the beam;

the number of the moving brackets (4-3) is two, and the two moving brackets (4-3) are respectively connected with two ends of the beam absorber (4-1) through first corrugated pipes (4-2);

a vacuum sealing flange (4-4) for fitting the moving bracket (4-3) on a vacuum pump chamber (1) of an electrostatic deflector plate, and a part of the moving bracket (4-3) being disposed outside the vacuum pump chamber (1);

the second corrugated pipe (4-5) is sleeved on a part of the moving bracket (4-3) positioned outside the vacuum pump chamber (1);

the power output end of the driving mechanism is connected with the moving support (4-3) and is used for driving the moving support (4-3) to move so as to drive the beam absorber (4-1) to move.

2. The beam loss control device according to claim 1, wherein the beam absorber (4-1) has a hollow tubular structure, and the moving bracket (4-3) is provided with a cooling water pipe, and the cooling water pipe is in fluid conduction connection with the cavity (4-8) of the beam absorber (4-1) through the first corrugated pipe (4-2).

3. Beam loss control device according to claim 1, characterized in that in the cross section of the beam absorber (4-1) the width of the end face of the oncoming beam is larger than the end face opposite to the end face of the oncoming beam.

4. The beam loss control device according to claim 1, wherein the width of the end face of the oncoming beam is 3 to 20mm.

5. Beam loss control device according to claim 1, characterized in that each of the moving carriages (4-3) is independently driven by a drive mechanism, which is a drive motor (4-6).

6. An electrostatic deflector for implantation, characterized by comprising a beam loss control device (4) according to any one of claims 1-5, further comprising a vacuum pump chamber (1), wherein the anode holder (2) and the electrode are assembled in the vacuum pump chamber (1), and wherein the beam loss control device (4) is assembled on the chamber wall of the vacuum pump chamber (1) through the vacuum sealing flange (4-4).

7. The plate according to claim 6, wherein the beam absorber (4-1), the first bellows (4-2) and a portion of the moving support (4-3) are located inside the vacuum pumping chamber (1), and the other portion of the moving support (4-3) and the driving mechanism are located outside the vacuum pumping chamber (1).

8. An injection electrostatic deflector according to claim 6, characterized in that the anode frame (2) is wound with a tensioned tungsten wire forming a planar wire plate or a cambered wire plate.

9. The plate according to claim 8, characterized in that the beam absorber (4-1) is parallel to the planar filament plate formed by the tungsten filaments or the beam absorber (4-1) is at an angle to the anode frame (2).

10. An injection electrostatic deflector according to claim 8, characterized in that the beam absorber (4-1) is at a distance of 10-200 mm from the tungsten wire forming a planar wire plate or cambered wire plate.