CN116000033A - Single crystal furnace auxiliary chamber cleaning device and method - Google Patents
Single crystal furnace auxiliary chamber cleaning device and method Download PDFInfo
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- CN116000033A CN116000033A CN202211612844.2A CN202211612844A CN116000033A CN 116000033 A CN116000033 A CN 116000033A CN 202211612844 A CN202211612844 A CN 202211612844A CN 116000033 A CN116000033 A CN 116000033A
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- 238000004140 cleaning Methods 0.000 title claims abstract description 71
- 239000013078 crystal Substances 0.000 title claims abstract description 49
- 238000000034 method Methods 0.000 title claims abstract description 19
- 230000008602 contraction Effects 0.000 claims description 9
- 229920000742 Cotton Polymers 0.000 claims description 7
- 239000004744 fabric Substances 0.000 claims description 5
- 238000004378 air conditioning Methods 0.000 claims description 3
- 230000003749 cleanliness Effects 0.000 abstract description 4
- 230000033001 locomotion Effects 0.000 description 13
- 239000000428 dust Substances 0.000 description 10
- 230000000694 effects Effects 0.000 description 8
- 238000007790 scraping Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000003139 buffering effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
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Abstract
The present disclosure provides a single crystal furnace sub-chamber cleaning device and method, the single crystal furnace sub-chamber cleaning device comprising: a base; the telescopic rod capable of axially stretching comprises a top end and a bottom end which are axially opposite, and the bottom end is fixed on the base; a telescopic driving component for driving the telescopic rod to axially stretch and retract, wherein the telescopic driving component is connected to the bottom end of the telescopic rod; the base is connected to the rotary driving assembly; the cleaning platform assembly comprises a platform disc and a plurality of top block units, wherein the platform disc is coaxially connected to the top end of the telescopic rod, the plurality of top block units are circumferentially distributed on the platform disc, each top block unit is telescopic along the radial direction of the platform disc, and a wiping part is arranged on each top block unit; and the controller is connected with the telescopic driving component, the rotary driving component and the top block unit and used for controlling the working states of the telescopic driving component, the rotary driving component and the top block unit. The cleaning device and the cleaning method for the auxiliary chamber of the single crystal furnace can improve the cleanliness and reduce the labor intensity.
Description
Technical Field
The invention relates to the technical field of semiconductor manufacturing, in particular to a cleaning device and method for a secondary chamber of a single crystal furnace.
Background
The growth environment of the crystal bar needs a clean dust-free environment, but a certain amount of oxide dust is generated in the growth process of the crystal bar, and the oxide dust is attached to the cavity walls of the main furnace chamber and the auxiliary furnace chamber of the single crystal furnace. After the growth of the crystal rod is finished, oxide dust attached to the cavity wall is cleaned, so that the influence on the next crystal growth environment is prevented. Specifically, if oxide dust falls onto the liquid surface, the dust enters the crystal as the crystal grows, and the arrangement of crystal lattices is changed, so that the crystal rod breaks. This can result in unnecessary ingot product losses such as broken wire hanging, lost product yield, etc. If the crystal is grown by remelting again, the power and material cost consumption used in the crystal growth process increases. In addition, dust can cause some fine crystal defects after entering crystals, resulting in product rejection.
For the barrel type crystal pulling furnace, the height of the auxiliary chamber is generally between 2 and 4 meters, the inner diameter is about 300 to 500mm, and the specific condition of dust in the cavity is difficult to observe by operators. In general, the cleaning industry of the auxiliary chamber is mainly to hold a long rod by an operator, wrap the head of the long rod with dust-free cloth, and make the head of the long rod do circular motion in the inner cavity of the auxiliary chamber and gradually descend to scrape the inner cavity wall so as to wipe all areas of the chamber as much as possible. In the mode, an operator needs to lift the long rod for a long time, the length of the long rod is overlong, the head of the long rod is heavy, two persons need to lift the long rod by two hands and support arms, the two persons are matched with the operation at the same time, and the coordination of the actions is ensured, so that the labor intensity is extremely high. Moreover, the operator can hardly control the scraping range to fully cover all cavity walls and wipe the cavity walls in descending order from top to bottom, so that the cleanliness of the wiping surface can not be ensured, and multiple operations are required. Therefore, manual scraping with a long rod is very difficult, and it is difficult to control the cleanliness of the cleaning, and labor intensity is also high.
Disclosure of Invention
The embodiment of the disclosure provides a cleaning device and a cleaning method for a secondary chamber of a single crystal furnace, which can improve the cleanliness and reduce the labor intensity.
The technical scheme provided by the embodiment of the disclosure is as follows:
in a first aspect, an embodiment of the present disclosure provides a cleaning device for a sub-chamber of a single crystal furnace, including:
a base;
the telescopic rod can axially stretch out and draw back, the telescopic rod includes top and bottom that the axial is opposite, the said bottom is fixed on said base;
the telescopic driving component is used for driving the telescopic rod to axially stretch and retract, and is connected to the bottom end of the telescopic rod;
a rotary drive assembly for driving the telescopic rod to rotate, the base being connected to the rotary drive assembly;
the cleaning platform assembly comprises a platform disc and a plurality of top block units, wherein the platform disc is coaxially connected to the top end of the telescopic rod, the top block units are circumferentially distributed on the platform disc, each top block unit is telescopic along the radial direction of the platform disc, and the top block units are provided with wiping parts;
and the controller is connected with the telescopic driving component, the rotary driving component and the top block unit and used for controlling the working states of the telescopic driving component, the rotary driving component and the top block unit.
Illustratively, the top block unit includes:
the wiping part is arranged on the top block head;
the cylinder push rod is telescopic along the radial direction of the platform disc, and the ejector block head is connected to one end of the cylinder push rod;
a cylinder capable of driving the cylinder push rod to stretch and retract by compressed air, the cylinder being connected to the other end of the cylinder push rod; a kind of electronic device with high-pressure air-conditioning system
And the contraction spring is propped between the top block head and the cylinder.
Illustratively, the cleaning platform assembly further includes an air supply assembly for supplying compressed air to the air cylinder, the air supply assembly comprising:
the spiral air pipe is communicated to the air cylinder and is circumferentially arranged on the outer side of the platform round table along the platform round disc;
the first end of the air duct is communicated with the spiral air duct, and the second end of the air duct axially extends to the base along the telescopic rod;
a compressed air machine;
the second end of the air duct is connected with the compressed air compressor through the air duct rotary joint.
Illustratively, the telescoping drive assembly includes a servo motor or cylinder disposed on the base.
Illustratively, the rotary drive assembly includes:
the base is arranged on the rotary gear disc, and the rotary gear disc is coaxial with the telescopic rod;
and the output shaft of the rotary driving motor is axially parallel to the telescopic rod, and is meshed with the rotary gear disc.
Illustratively, the single crystal furnace sub-chamber cleaning apparatus further comprises a movable cart, wherein the base, the rotary drive assembly, and the controller are all disposed on the movable cart.
Illustratively, the platform disc has an internal cavity with an open top and a closed bottom, and the periphery of the open top of the cavity is provided with a flange, and the top block unit is disposed on the flange.
Illustratively, the wiping part comprises a water-absorbing cotton layer arranged on the top block unit and a dust-free cloth layer wrapped outside the water-absorbing cotton layer.
In a second aspect, an embodiment of the present disclosure provides a method for cleaning a sub-chamber of a single crystal furnace, the method including the steps of:
moving the auxiliary chamber cleaning device of the single crystal furnace until the telescopic rod is opposite to the auxiliary chamber;
controlling the top block unit to be in a radial shrinkage state so as to keep a gap between the top block unit and the cavity wall of the auxiliary chamber, and extending the telescopic rod from the bottom of the inner cavity of the auxiliary chamber to the top of the auxiliary chamber;
when the top end of the telescopic rod extends out of the top of the auxiliary chamber, controlling the top block unit to radially extend out so as to be clung to the cavity wall of the auxiliary chamber;
the telescopic rod is controlled by the controller to descend from the top of the auxiliary chamber to the bottom of the auxiliary chamber along the axial direction, and simultaneously the telescopic rod is controlled to rotate so as to clean the cavity wall of the auxiliary chamber.
The beneficial effects brought by the embodiment of the disclosure are as follows:
in the scheme, the auxiliary chamber cleaning device of the single crystal furnace can push the telescopic rod to axially stretch through the telescopic driving component, the telescopic rod is driven to rotate through the rotary driving component, the cleaning platform component is arranged at the top end of the telescopic rod, a plurality of radially-stretchable ejector block units are circumferentially distributed on the cleaning platform component, the ejector block units are provided with the wiping component, when the single crystal furnace is cleaned, the telescopic rod can be radially contracted in the process of stretching the telescopic rod into the top from the bottom of the auxiliary chamber, a certain gap amount exists between the ejector block units and the wall of the auxiliary chamber, dust and the like contacted with the bottom of the wall of the auxiliary chamber can be prevented from being carried by the wiping component to reach the top of the auxiliary chamber, after the top end of the telescopic rod reaches the top of the chamber, the ejector block units can radially stretch out to enable the wiping component to be clung to the wall of the auxiliary chamber, further, the aim of cleaning the wall of the auxiliary chamber is achieved through the rotary circumferential motion of the telescopic rod and the up-down gradual axial contraction, the cleaning effect is improved, the clean degree of the wall of the auxiliary chamber after the cleaning is ensured, the operation is convenient, and the labor intensity is reduced.
Drawings
FIG. 1 shows a schematic structural view of a single crystal furnace sub-chamber cleaning apparatus provided in an embodiment of the present disclosure;
fig. 2 is a schematic structural diagram of a top block unit in a cleaning device for a sub-chamber of a single crystal furnace according to an embodiment of the disclosure.
Detailed Description
For the purpose of making the objects, technical solutions and advantages of the embodiments of the present disclosure more apparent, the technical solutions of the embodiments of the present disclosure will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present disclosure. It will be apparent that the described embodiments are some, but not all, of the embodiments of the present disclosure. All other embodiments, which can be made by one of ordinary skill in the art without the need for inventive faculty, are within the scope of the present disclosure, based on the described embodiments of the present disclosure.
Unless defined otherwise, technical or scientific terms used in this disclosure should be given the ordinary meaning as understood by one of ordinary skill in the art to which this disclosure belongs. The terms "first," "second," and the like, as used in this disclosure, do not denote any order, quantity, or importance, but rather are used to distinguish one element from another. Likewise, the terms "a," "an," or "the" and similar terms do not denote a limitation of quantity, but rather denote the presence of at least one. The word "comprising" or "comprises", and the like, means that elements or items preceding the word are included in the element or item listed after the word and equivalents thereof, but does not exclude other elements or items. The terms "connected" or "connected," and the like, are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. "upper", "lower", "left", "right", etc. are used merely to indicate relative positional relationships, which may also be changed when the absolute position of the object to be described is changed.
In the related art, there are some technical schemes for cleaning the sub-chamber by using an electric driving method in addition to manually cleaning the sub-chamber, but there is still a problem of poor cleaning effect.
In order to solve the problems, the embodiment of the invention provides a device and a method for cleaning a secondary chamber of a single crystal furnace, which can improve the cleaning effect and reduce the labor intensity.
As shown in fig. 1 and 2, a cleaning device for a secondary chamber of a single crystal furnace provided in an embodiment of the disclosure includes:
a base 10;
an axially telescoping rod 20, said rod 20 comprising axially opposed top and bottom ends, said bottom ends being secured to said base 10;
a telescopic driving part 30 for driving the telescopic rod 20 to axially extend and retract, the telescopic driving part 30 being connected to the bottom end of the telescopic rod 20;
a rotation driving assembly 40 for driving the telescopic rod 20 to rotate, the base 10 being connected to the rotation driving assembly 40;
the cleaning platform assembly 50, wherein the cleaning platform assembly 50 comprises a platform disc 51 and a plurality of top block units 52, the platform disc 51 is coaxially connected to the top end of the telescopic rod 20, the plurality of top block units 52 are circumferentially distributed on the platform disc 51, each top block unit 52 is telescopic along the radial direction of the platform disc 51, and the top block units 52 are provided with wiping components 53;
and a controller 60 connected to the telescopic driving unit 30, the rotary driving assembly 40 and the top block unit 52, for controlling the working states of the telescopic driving unit 30, the rotary driving assembly 40 and the top block unit 52.
In the above-mentioned scheme, the telescopic rod 20 can axially extend and retract, and is used for extending into the auxiliary chamber; the cleaning platform assembly 50 is arranged at the top end of the telescopic rod 20 and is used for cleaning the surface of the cavity wall of the auxiliary chamber along with the movement of the telescopic rod 20; the telescopic driving part 30 is used for driving the telescopic rod 20 to axially telescopic, so that the telescopic rod can gradually move from top to bottom when cleaning the cavity wall, and the cleaning platform assembly 50 is driven to gradually clean the cavity wall of the auxiliary chamber from top to bottom; the rotary driving assembly 40 is configured to drive the telescopic rod 20 to rotate for performing a circular motion, so as to drive the cleaning platform assembly 50 to perform a circular motion along with the rotation of the telescopic rod 20, so as to achieve a better cleaning effect. The cleaning platform assembly 50 is provided with a plurality of radially telescopic top block units 52 along the circumferential direction, the plurality of top block units 52 can radially shrink or expand, and each top block unit 52 is provided with a wiping part 53. Therefore, when the single crystal furnace is cleaned, the plurality of top block units 52 can be radially contracted in the process that the telescopic rod 20 stretches into the top from the bottom of the auxiliary chamber, so that a certain gap amount exists between the top block units 52 and the wall of the auxiliary chamber, dust and the like contacted with the bottom of the cavity wall of the auxiliary chamber can be prevented from being carried by the wiping part 53 to the top of the auxiliary chamber, after the top end of the telescopic rod 20 reaches the top of the chamber, the top block units 52 can radially stretch out to enable the wiping part 53 to be tightly attached to the cavity wall of the auxiliary chamber, and then the aim of cleaning the cavity wall of the auxiliary chamber is fulfilled along with the rotary circular movement of the telescopic rod 20 and the gradual descending movement from top to bottom, the cleaning effect is improved, the clean degree of the cavity wall of the auxiliary chamber after the final cleaning is ensured to be high, the operation is convenient, and the labor intensity is reduced.
In some exemplary embodiments, as shown in fig. 2, the top block unit 52 includes:
a top block 521, the wiping member 53 being provided on the top block 521;
a cylinder push rod 522 which is retractable radially along the platform disc 51, and the top 521 is connected to one end of the cylinder push rod 522;
a cylinder 523 capable of driving the cylinder push rod 522 to expand and contract by compressed air, the cylinder 523 being connected to the other end of the cylinder push rod 522; a kind of electronic device with high-pressure air-conditioning system
And a contraction spring 524, wherein the contraction spring 524 is propped against between the top block head 521 and the cylinder 523.
With the above scheme, the cylinder 523 may drive the cylinder push rod 522 to radially expand and contract, so that the cylinder push rod 522 pushes and pulls the top block 521, and the contraction spring 524 may provide a restoring elastic force and a buffering force for the top block 521. In this structure, the expansion and contraction of the top head 521 may be controlled by supplying compressed air into the cylinder 523.
The contact force between the top block 521 and the wall of the sub-chamber can be controlled by selecting the proper stroke of the cylinder push rod 522, the contraction spring 524, and the cylinder 523, and the amount of the gap between the top block unit 52 and the wall of the sub-chamber when the expansion link 20 extends into the sub-chamber. It will be understood, of course, that the specific structure of the top block unit 52 is not limited thereto, and may be implemented in other manners.
As some exemplary embodiments, as shown in fig. 1, the cleaning platform assembly 50 further includes an air supply assembly for supplying compressed air to the air cylinder 523, the air supply assembly including:
the spiral air pipe 541 is communicated with the air cylinder 523 and is arranged on the outer side of the platform round table along the circumferential direction of the platform round table 51;
an air duct 542, a first end of the air duct 542 is communicated with the spiral air duct 541, and a second end of the air duct 542 extends to the base 10 along the axial direction of the telescopic rod 20;
a compressed air machine which can be provided on the base 10;
the second end of the air duct 542 is connected to the compressed air pump through the air path rotary joint 533.
In the above-described scheme, the spiral pipe 541 is easily stretched with a certain contractive capacity, and, by way of example,
the spiral air pipe 541 can be a double-layer spiral air pipe 541; because the top block unit 52 performs circular motion along with the 5 telescopic rod 20, the air cylinder 523 and the compressed air machine can be conducted by adopting the air path rotary joint 533, and the circular motion requirement of the top block unit 52 is met.
Further, the telescopic driving means includes a servo motor provided on the base 10, by way of example. The telescopic rod 20 is driven to move up and down by a servo motor, so that the optional setting of the speed can be controlled,
and further, the telescopic rod 20 can gradually descend from top to bottom, so that the telescopic rod can move up and down at an ideal speed to clean 0 auxiliary chambers, and a better cleaning effect is achieved. It will be appreciated that the telescopic driving means may be any suitable driving means, such as a pneumatic cylinder 523 or a hydraulic cylinder.
In addition, the telescopic rod 20 can be formed by combining a plurality of telescopic rods 20, so that the purpose of moving up and down in the cavity of the auxiliary chamber is realized, and the extension height of the telescopic rod 20 or the number of the telescopic rods 20 can be reasonably selected and adjusted according to the height of the auxiliary chamber.
5 as an exemplary embodiment, as shown in fig. 1, the rotary driving assembly 40 includes:
a rotary gear plate 41, wherein the base 10 is arranged on the rotary gear plate 41, and the rotary gear plate 41 is coaxial with the telescopic rod 20;
and a rotary driving motor 42, wherein an output shaft of the rotary driving motor 42 is axially parallel to the telescopic rod 20, and an output shaft of the rotary driving motor 42 is meshed with the rotary gear plate 41.
0, the rotary gear plate 41 is meshed with the rotary driving motor 42 to drive the telescopic rod 20 to perform circular motion, wherein the rotary driving motor 42 can be a servo motor to control the circular motion rate of the telescopic rod 20, so that a better cleaning effect is achieved. It will be understood, of course, that other power sources may be used for the rotary drive motor 42.
Further, as illustrated in fig. 1, the single crystal furnace sub-chamber cleaning apparatus further includes a movable cart 70, and the base 10, the rotation driving assembly 40, and the controller 60 are all disposed on the movable cart 70. In this way, it is easier to operate the entire cleaning device. As shown, the controller 60 may be directly fixed to the mobile cart.
Further, as shown in fig. 1, for example, the platform disc 51 has an inner cavity with an open top and a closed bottom, and the outer circumference of the open top of the cavity is provided with a flange 511, and the top block unit 52 is disposed on the flange 511. By adopting the scheme, the platform disc 51 is designed into a hollow structure, so that the space interference occupied by the seed chuck at the height of the platform disc 51 extending to the top of the auxiliary chamber cavity is avoided, and the cleaning range is ensured to completely cover the inner wall of the whole auxiliary chamber.
Further, as shown in fig. 2, the wiping part 53 includes a water absorbent cotton layer 531 provided on the top block unit 52 and a dust-free cloth layer 532 wrapped outside the water absorbent cotton layer, for example. The dust-free cloth layer 532 is moistened by the alcohol-contaminated water-absorbing cotton layer 531 to wipe the cavity wall of the auxiliary chamber, so that the wiping uniformity and the positioning accuracy are ensured, and finally, the clean degree of the cavity wall of the auxiliary chamber after cleaning is ensured to be higher.
In a second aspect, an embodiment of the present disclosure provides a method for cleaning a sub-chamber of a single crystal furnace, the method including the steps of:
step S01, moving the cleaning device of the auxiliary chamber of the single crystal furnace until the telescopic rod 20 is opposite to the auxiliary chamber;
step S02, controlling the top block unit 52 to be in a radially contracted state, so that a gap is kept between the top block unit 52 and the cavity wall of the auxiliary chamber, and the telescopic rod 20 extends from the bottom of the inner cavity of the auxiliary chamber to the top of the auxiliary chamber;
step S03, when the top end of the telescopic rod 20 extends out of the top of the auxiliary chamber, controlling the top block unit 52 to radially extend out to be closely attached to the cavity wall of the auxiliary chamber;
step S04, controlling the telescopic rod 20 to descend from the top of the auxiliary chamber to the bottom of the auxiliary chamber along the axial direction by the controller 60, and simultaneously controlling the telescopic rod 20 to rotate so as to clean the cavity wall of the auxiliary chamber.
In the above scheme, when cleaning the single crystal furnace, the plurality of top block units 52 can be radially contracted in the process of stretching the telescopic rod 20 from the bottom of the auxiliary chamber to the top, so that a certain gap amount exists between the top block units 52 and the wall of the auxiliary chamber, dust and the like contacting from the bottom of the wall of the auxiliary chamber can be prevented from being carried by the wiping part 53 to the top of the auxiliary chamber, and after the top end of the telescopic rod 20 reaches the top of the chamber, the top block units 52 can radially stretch out to enable the wiping part 53 to be tightly attached to the wall of the auxiliary chamber, and then the aim of cleaning the wall of the auxiliary chamber is fulfilled through the rotary circular movement of the telescopic rod 20 and the up-down movement of gradual axial contraction from top to bottom, the cleaning effect is improved, the clean degree of the wall of the auxiliary chamber after the final cleaning is ensured to be high, the operation is convenient, and the labor intensity is reduced.
The following points need to be described:
(1) The drawings of the embodiments of the present disclosure relate only to the structures related to the embodiments of the present disclosure, and other structures may refer to the general design.
(2) In the drawings for describing embodiments of the present disclosure, the thickness of layers or regions is exaggerated or reduced for clarity, i.e., the drawings are not drawn to actual scale. It will be understood that when an element such as a layer, film, region or substrate is referred to as being "on" or "under" another element, it can be "directly on" or "under" the other element or intervening elements may be present.
(3) The embodiments of the present disclosure and features in the embodiments may be combined with each other to arrive at a new embodiment without conflict.
The above is merely a specific embodiment of the disclosure, but the protection scope of the disclosure should not be limited thereto, and the protection scope of the disclosure should be subject to the claims.
Claims (9)
1. A single crystal furnace sub-chamber cleaning device, comprising:
a base;
the telescopic rod can axially stretch out and draw back, the telescopic rod includes top and bottom that the axial is opposite, the said bottom is fixed on said base;
the telescopic driving component is used for driving the telescopic rod to axially stretch and retract, and is connected to the bottom end of the telescopic rod;
a rotary drive assembly for driving the telescopic rod to rotate, the base being connected to the rotary drive assembly;
the cleaning platform assembly comprises a platform disc and a plurality of top block units, wherein the platform disc is coaxially connected to the top end of the telescopic rod, the top block units are circumferentially distributed on the platform disc, each top block unit is telescopic along the radial direction of the platform disc, and the top block units are provided with wiping parts;
and the controller is connected with the telescopic driving component, the rotary driving component and the top block unit and used for controlling the working states of the telescopic driving component, the rotary driving component and the top block unit.
2. The cleaning device for auxiliary chamber of single crystal furnace according to claim 1, wherein,
the top block unit includes:
the wiping part is arranged on the top block head;
the cylinder push rod is telescopic along the radial direction of the platform disc, and the ejector block head is connected to one end of the cylinder push rod;
a cylinder capable of driving the cylinder push rod to stretch and retract by compressed air, the cylinder being connected to the other end of the cylinder push rod; a kind of electronic device with high-pressure air-conditioning system
And the contraction spring is propped between the top block head and the cylinder.
3. The cleaning device for auxiliary chamber of single crystal furnace according to claim 2, wherein,
the cleaning platform assembly further includes an air supply assembly for supplying compressed air to the air cylinder, the air supply assembly comprising:
the spiral air pipe is communicated to the air cylinder and is circumferentially arranged on the outer side of the platform round table along the platform round disc;
the first end of the air duct is communicated with the spiral air duct, and the second end of the air duct axially extends to the base along the telescopic rod;
a compressed air machine;
the second end of the air duct is connected with the compressed air compressor through the air duct rotary joint.
4. The cleaning device for auxiliary chamber of single crystal furnace according to claim 1, wherein,
the telescopic driving component comprises a servo motor or an air cylinder arranged on the base.
5. The cleaning device for auxiliary chamber of single crystal furnace according to claim 1, wherein,
the rotary drive assembly includes:
the base is arranged on the rotary gear disc, and the rotary gear disc is coaxial with the telescopic rod;
and the output shaft of the rotary driving motor is axially parallel to the telescopic rod, and is meshed with the rotary gear disc.
6. The cleaning device for auxiliary chamber of single crystal furnace according to claim 1, wherein,
the cleaning device for the auxiliary chamber of the single crystal furnace further comprises a movable trolley, and the base, the rotary driving assembly and the controller are all arranged on the movable trolley.
7. The cleaning device for auxiliary chamber of single crystal furnace according to claim 1, wherein,
the platform disc is provided with an inner cavity, the top opening and the bottom of the cavity are closed, the periphery of the top opening of the cavity is provided with a convex edge, and the top block unit is arranged on the convex edge.
8. The cleaning device for auxiliary chamber of single crystal furnace according to claim 1, wherein,
the wiping part comprises a water-absorbing cotton layer arranged on the top block unit and a dust-free cloth layer wrapped outside the water-absorbing cotton layer.
9. A method for cleaning a secondary chamber of a single crystal furnace, characterized in that the secondary chamber of the single crystal furnace is cleaned by adopting the cleaning device for the secondary chamber of the single crystal furnace according to any one of claims 1 to 8; the method comprises the following steps:
moving the auxiliary chamber cleaning device of the single crystal furnace until the telescopic rod is opposite to the auxiliary chamber;
controlling the top block unit to be in a radial shrinkage state so as to keep a gap between the top block unit and the cavity wall of the auxiliary chamber, and extending the telescopic rod from the bottom of the inner cavity of the auxiliary chamber to the top of the auxiliary chamber;
when the top end of the telescopic rod extends out of the top of the auxiliary chamber, controlling the top block unit to radially extend out so as to be clung to the cavity wall of the auxiliary chamber;
the telescopic rod is controlled by the controller to descend from the top of the auxiliary chamber to the bottom of the auxiliary chamber along the axial direction, and simultaneously the telescopic rod is controlled to rotate so as to clean the cavity wall of the auxiliary chamber.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211612844.2A CN116000033A (en) | 2022-12-15 | 2022-12-15 | Single crystal furnace auxiliary chamber cleaning device and method |
| TW112104919A TW202325421A (en) | 2022-12-15 | 2023-02-13 | Device and method for cleaning auxiliary chamber of single crystal growing furnace comprising a base, an axially retractable telescopic rod, a telescopic driving part, a rotating drive assembly, a cleaning platform assembly and a controller |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211612844.2A CN116000033A (en) | 2022-12-15 | 2022-12-15 | Single crystal furnace auxiliary chamber cleaning device and method |
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| CN116000033A true CN116000033A (en) | 2023-04-25 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202211612844.2A Pending CN116000033A (en) | 2022-12-15 | 2022-12-15 | Single crystal furnace auxiliary chamber cleaning device and method |
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| CN (1) | CN116000033A (en) |
| TW (1) | TW202325421A (en) |
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- 2022-12-15 CN CN202211612844.2A patent/CN116000033A/en active Pending
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2023
- 2023-02-13 TW TW112104919A patent/TW202325421A/en unknown
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| TW202325421A (en) | 2023-07-01 |
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Address after: 710000 room 1-3-029, No. 1888, Xifeng South Road, high tech Zone, Xi'an, Shaanxi Province Applicant after: Xi'an Yisiwei Material Technology Co.,Ltd. Applicant after: XI'AN ESWIN SILICON WAFER TECHNOLOGY Co.,Ltd. Address before: 710000 room 1-3-029, No. 1888, Xifeng South Road, high tech Zone, Xi'an, Shaanxi Province Applicant before: Xi'an yisiwei Material Technology Co.,Ltd. Applicant before: XI'AN ESWIN SILICON WAFER TECHNOLOGY Co.,Ltd. |