CN102212877A - MOCVD (Metal-organic Chemical Vapor Deposition) system with multiple extensional reaction cavities and operation method thereof - Google Patents
MOCVD (Metal-organic Chemical Vapor Deposition) system with multiple extensional reaction cavities and operation method thereof Download PDFInfo
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- CN102212877A CN102212877A CN 201010231273 CN201010231273A CN102212877A CN 102212877 A CN102212877 A CN 102212877A CN 201010231273 CN201010231273 CN 201010231273 CN 201010231273 A CN201010231273 A CN 201010231273A CN 102212877 A CN102212877 A CN 102212877A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
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Abstract
The invention discloses an MOCVD (Metal-organic Chemical Vapor Deposition) system with multiple extensional reaction cavities, and the system provided by the invention is used for carrying out extensional reaction on a plurality of substrates arranged on a tray. The MOCVD system comprises a transmission cavity provided with a mechanical arm, a plurality of transit stations and at least two extensional reaction cavities, wherein the plurality of transit stations are connected with the transmission cavity; the substrates can be simultaneously subjected to extensional reaction in the extensional reaction cavities; and according to mechanical automation operation, the trays in the extensional reaction cavities can be taken out and put in without opening extensional reaction cavity covers, thereby improving the system capacity, saving the time for cooling the extensional reaction cavities and changing trays, and improving the production use ratio of equipment. Because the plurality of extensional reaction cavities share one set of transmission cavity, mechanical arm and the like, one and several other sets of corresponding equipment are saved, the setup cost and operation cost are lowered, and installing sites of the equipment are saved. Because the transit stations have the function of a pre-processing cavity, the tray can be precooled and preheated according to the production requirement so as to further improve the production efficiency.
Description
Technical field
The present invention relates to a kind of MOCVD (metal organic chemical vapor deposition) system and working method thereof that is used for production compound semiconductor photoelectric device, particularly a kind of MOCVD system and working method thereof with a plurality of epitaxial reaction chambers.
Background technology
Metal organic chemical vapor deposition system (hereinafter to be referred as the MOCVD system) is a most crucial equipment that is used to produce semiconductor photoelectric device, substrate base passes through the epitaxy technique structural growth in the chamber of MOCVD, form special optoelectronic device structure, MOCVD is widely used in the production of LED epitaxial wafer, high power laser and high-level efficiency solar cell etc. at present.
Owing to market and technical reason, less demanding for the output of epitaxial wafer, MOCVD equipment all designed for small-scale production in the past.As shown in Figure 1, be the MOCVD system that pallet or substrate are changed in the manual operation seen at most in the market, its by one independently 100 pairs of substrate bases of vacuum reaction chamber 610 carry out epitaxial process.Need to open the chamber lid after extension is finished each time, on the pallet 600 of reaction chamber 100 the insides, get rebush bottom substrate 610 by operator, and the settling on the cleaning cavity, to guarantee that reaction chamber 100 can continue works better, accounted for time of many equipment operation of these preparation works, make the production efficiency of MOCVD system low.
Also have a kind of spray and high-speed rotary MOCVD system, every stove is got by mechanical manipulator and is changed pallet, finishes or pending substrate base and place extension in holder.As shown in Figure 2, this kind MOCVD system comprises transmission cavity 200, with the reaction chamber 100 that is connected with transmission cavity 200 respectively, transhipment station 300 and platform 400; Also be provided with mechanical manipulator 210 in the transmission cavity 200, be used for pallet 600 is picked and placeed at above-mentioned each chamber.When reaction chamber 100 carries out epitaxial process to substrate base 610 under setting processing condition, separate by a vacuum separation valve 500 and transmission cavity 200.Transhipment station 300 is used for temporary will putting into pallet after the processing of platform 400 and the pending pallet 600 that will put into reaction chamber 100 from platform 400 from reaction chamber 100; This transhipment station 300 is generally worked under vacuum environment with transmission cavity 200, but just is operated under the barometric point when the vacuum separation valve of opening between transmission cavity 200 and the platform 400 500.
Compare manual operation, the mechanized operation of this kind MOCVD system can be carried out under higher temperature, has reduced the apparatus cools time thus; Mechanized operation has also improved the speed of changing sheet, has improved the production utilization ratio of equipment.
Yet above-mentioned existing two production all only is provided with one epitaxial reaction chamber with the MOCVD system, yields poorly, and can not adapt to the production needs of extensive epitaxial substrate substrate; The MOCVD system of mechanical automation operation has increased cost and running cost that unit makes especially owing to be provided with equipment such as transmission cavity, transhipment station and platform.
Summary of the invention
The purpose of this invention is to provide a kind of MOCVD system and working method thereof with a plurality of epitaxial reaction chambers, make the shared same group of equipment such as transmission cavity, transhipment station and platform of a plurality of epitaxial reaction chambers, both can increase the output of every MOCVD system exponentially, to adapt to the needs of scale operation, can effectively reduce simultaneously the unit manufacturing cost and the running cost of system again, save the floor space of system.
In order to achieve the above object, technical scheme of the present invention provides a kind of MOCVD system with a plurality of epitaxial reaction chambers, be used for the some substrate bases that are placed on the pallet are carried out the extension reaction, it is characterized in that, comprise one be provided with the transmission cavity of mechanical manipulator, be connected with transmission cavity respectively be equal to or greater than two epitaxial reaction chamber; Above-mentioned pallet is placed on respectively in above-mentioned a plurality of epitaxial reaction chamber, makes some substrate bases carry out the extension reaction simultaneously at these a plurality of epitaxial reaction chambers.
The above-mentioned MOCVD system with a plurality of epitaxial reaction chambers also comprises at least one transhipment station that is connected with above-mentioned transmission cavity respectively, and the platform that is connected with above-mentioned transhipment station.
The above-mentioned MOCVD system with a plurality of epitaxial reaction chambers also comprises some vacuum separation valves;
Above-mentioned vacuum separation valve is arranged between above-mentioned transmission cavity and each epitaxial reaction chamber;
Above-mentioned vacuum separation valve is arranged between transhipment station and the platform;
Above-mentionedly between transmission cavity and transhipment station, can select to be provided with vacuum separation valve;
The only pressure equilibrium or open when being in setting range in the chamber on its both sides of above-mentioned some vacuum separation valves.
Above-mentioned mechanical manipulator is cooperated by radial extension, axial rotation, the three-dimensional motion that moves up and down, and above-mentioned pallet is picked and placeed between above-mentioned epitaxial reaction chamber and transhipment station, picks and places between epitaxial reaction chamber, picks and places between transhipment station.
Be connected with at least one group of transhipment station and platform with above-mentioned transmission cavity, as the input aperture and the delivery port of pallet.
Be connected with two groups of transhipment stations and platform with above-mentioned transmission cavity, place the pallet that the new substrate base of waiting for epitaxial process is housed for one group therein, and in another group, place the pallet of having finished extension reaction substrate base from being equipped with of a plurality of epitaxial reaction chambers taking-ups.
Be provided with some grooves position in the above-mentioned transhipment station, make each epitaxial reaction chamber correspondence be assigned input slot position and output magazine position;
Place the pallet of having finished extension reaction substrate base from being equipped with of above-mentioned epitaxial reaction chamber taking-up in the above-mentioned output magazine position;
Place from above-mentioned platform in the above-mentioned input slot position and put into the pallet that the substrate base of waiting for epitaxial process is housed.
Can be provided with heating unit or refrigerating unit in some groove positions of above-mentioned transhipment station; Some groove positions of above-mentioned transhipment station can be moved at vertical direction or horizontal direction.
A kind of working method with MOCVD system of a plurality of epitaxial reaction chambers and a transhipment station is characterized in that, changes the flow process of pallet in the output magazine position A1 that moves horizontally of described transhipment station, comprises following steps:
(b) open vacuum separation valve;
(c) pallet is moved to platform;
(d) pallet that renews or change substrate base on the pallet;
(e) new pallet sends back to the output magazine position A1 of transhipment station;
(f) shut vacuum separation valve;
(g) by mechanical manipulator (21) new pallet is moved to input slot position A2 from output magazine position A1.
In the output magazine position that can not move horizontally of described transhipment station, as B1, the flow process of middle replacing pallet is not carried out when having pallet on the described output magazine position A1 that moves horizontally, and comprises following steps:
(a) by mechanical manipulator pallet is removed to output magazine position A1 from output magazine position B1;
(b) open vacuum separation valve;
(c) pallet is moved to platform;
(d) pallet that renews or change substrate base on the pallet;
(e) new pallet sends back to the output magazine position A1 of transhipment station;
(f) shut vacuum separation valve;
(h) by mechanical manipulator new pallet is moved to input slot position B2 from output magazine position A1.
The working method of the above-mentioned MOCVD system with a plurality of epitaxial reaction chambers also is included in the step that epitaxial reaction chamber is changed pallet:
Open vacuum separation valve under the equilibrium conditions that keep-ups pressure, mechanical manipulator takes out pallet in the epitaxial reaction chamber and puts into the output magazine position of transhipment station, then the new pallet on the input slot position is put into epitaxial reaction chamber.
Compared with prior art, the MOCVD system with a plurality of epitaxial reaction chambers of the present invention has the following advantages:
The present invention can carry out the extension reaction to substrate base simultaneously in a plurality of epitaxial reaction chambers, increase the output of every MOCVD system exponentially, need not open epitaxial reaction chamber, it is remained under vacuum state and the higher working temperature, and can realize the operation that the epitaxial reaction chamber inner pallet picks and places, not only saved the epitaxial reaction chamber refrigerative time and changed and coiled the time of operating, also make the settling on the wall of chamber be not easy to come off, prolong the cycle of carrying out the cavity clean and maintenance, improved the production utilization ratio of equipment.
The present invention also changes the system architecture that existing platform is connected with transmission cavity, multi-position connects more epitaxial reaction chamber to make transmission cavity can have more, with shared same set of transmission cavity, mechanical manipulator, transhipment station and platform, saved an other cover or an a few cover corresponding apparatus, reduce it cost and working cost have been set, saved the fabricating yard of this part equipment.
The present invention has designed transhipment station and the platform that is used for many epitaxial reaction chambers, has designed the order of a plurality of pallet-changings, can vertically reaching under the cooperation of groove position that horizontal direction moves and mechanical manipulator, has realized getting fast the operation of changing pallet.
The present invention is placed on the pallet of new pallet and taking-up respectively on the input slot position and output magazine position corresponding with epitaxial reaction chamber in the transhipment station, and can be respectively heating or refrigerating function by groove position setup time of shortening subsequent operations, further improved the production utilization ratio of equipment.
The present invention can also be by being provided with two groups of transhipment stations and platform, removes respectively as the input aperture and the delivery port of pallet, or vacuum separation valve 52, realized the further simplification of operation steps.
Description of drawings
Fig. 1 is existing manually-operated structural representation with MOCVD system of single epitaxial reaction chamber;
Fig. 2 is the structural representation of the MOCVD system with single epitaxial reaction chamber of existing machinery automated operation;
Fig. 3 is the present invention has the MOCVD system of two epitaxial reaction chambers in embodiment 1 a structural representation;
Fig. 4 is the present invention has the MOCVD system of three epitaxial reaction chambers in embodiment 1 a structural representation;
Fig. 5 is the present invention has the MOCVD system of two epitaxial reaction chambers in embodiment 2 a structural representation;
Fig. 6 is the present invention has the MOCVD system of three epitaxial reaction chambers in embodiment 3 a structural representation;
Fig. 7 is a kind of side-view of preferred structure that has the MOCVD system of two epitaxial reaction chambers among the present invention.
Embodiment
Below in conjunction with description of drawings multiple concrete system configuration of the present invention.
Embodiment 1
Please cooperate referring to Fig. 3, shown in Figure 4, the MOCVD system that present embodiment relates to a plurality of epitaxial reaction chambers, comprise a transmission cavity 20 that is provided with mechanical manipulator 21, and be connected with transmission cavity 20 be equal to or greater than two epitaxial reaction chamber 10, also comprise a transhipment station 30 that is connected with transmission cavity 20, and the platform 40 that is connected with transhipment station 30.Be provided with a vacuum separation valve 51 between transmission cavity 20 and each epitaxial reaction chamber 10; Be provided with a vacuum separation valve 52 between transmission cavity 20 and the transhipment station 30, be provided with a vacuum separation valve 53 between transhipment station 30 and the platform 40.
Be MOCVD system as shown in Figure 3 with two epitaxial reaction chambers; Shown in Figure 4 is the MOCVD system with three epitaxial reaction chambers.Transmission cavity 20 attachable maximum epitaxial reaction chamber 10 quantity are by the designing institute decision of transmission cavity 20.
Wherein, epitaxial reaction chamber 10 is the cores that are used for epitaxial growth structure film on substrate base 61 in the MOCVD system.Be placed with a pallet 60 in the epitaxial reaction chamber 10, a plurality of epitaxial wafer substrates 61 be placed on this pallet 60 carry out epitaxy, simultaneously treated substrate base 61 quantity are by the design decision of epitaxial reaction chamber 10.Epitaxial reaction chamber 10 is generally operational in vacuum and pyritous state, the present invention adorning/when unloading pallet 60, epitaxial reaction chamber 10 is remained under the vacuum state, can prevent that outside contamination from entering, and the state of vacuum high-temperature can also prevent that the settling on epitaxial reaction chamber 10 inwalls from coming off, thereby can keep clean in the epitaxial reaction chamber 10, effectively prolong the cycle of cleaning epitaxial reaction chamber 10.
The central position of transmission cavity 20 is provided with mechanical manipulator 21, and it has rotation, radial translation, moves up and down 3 motor functions.This mechanical manipulator 21 need not be opened epitaxial reaction chamber 10 by the combination of these motions, just can take out, put into transhipment station 30 to pallet 60 from epitaxial reaction chamber 10, or take out, put into epitaxial reaction chamber 10 from transhipment station 30.In transmission cavity 20 and epitaxial reaction chamber 10 pressure equilibriums or when reaching certain preset range, generally be under the vacuum state, can open two vacuum separation valves 51 between the cavity, fetch and deliver pallet 60 by mechanical manipulator 21.
In another kind of equipment configuration, vacuum separation valve 52 (promptly removing dotted portion among Fig. 3, Fig. 4) is not set between transhipment station 30 and the transmission cavity 20.Such configuration makes transmission cavity 20 always work in identical pressure state with transhipment station 30.When transmission cavity 20 and transhipment station 30 are in vacuum state, just can open vacuum separation valve 51, carry out pallet 60 and change getting of epitaxial reaction chamber 10; When opening vacuum separation valve 53, transmission cavity 20 can be along with transhipment station 30 enters atmosphere pressure state together.This kind is not provided with the equipment configuration of vacuum separation valve 52, need simultaneously for transmission cavity 20 and 30 two cavitys of transhipment station vacuumize, though time lengthening, can on structure and operation steps, realize further simplifying.
Be provided with the groove position 31 of some placement pallets 60 in the transhipment station 30, the quantity of this groove position 31 is by the quantity decision of epitaxial reaction chamber 10, for each epitaxial reaction chamber 10 is assigned two groove positions 31, is respectively applied for pallet 60 that extension reaction that placement takes out from epitaxial reaction chamber 10 finishes and pending pallet 60 such as puts into from platform 40.The groove position 31 of wherein placing new pallet 60 can have heating unit, and pallet 60 temperature are reached as more than 100 degrees centigrade, shortens the warm up time of pallet 60; The groove position 31 of the pallet 60 that the placement extension is finished can have refrigerating unit, can be cooled to for example working temperature below 100 degrees centigrade of subsequent operations to pallet 60 within a certain period of time.Above-mentioned a kind of collocation method that heating unit and refrigerating unit only are provided, it can be configured according to different production requirements.
Some grooves position 31 in the above-mentioned transhipment station 30, has the function that moves under the in the vertical direction, after opening vacuum separation valve 51,52, cooperate the mechanical manipulator 21 in the transmission cavity 20, between different groove positions 31 and epitaxial reaction chamber 10, carry out the operation that pallet 60 picks and places; On at least one groove position 31, the function that horizontal direction moves is set, when opening vacuum separation valve 53, can makes this groove position 31 move to platform 40, pallet 60 is moved on the platform 40, carry out subsequent operations.
The operation that operator can change pallet 60 or change substrate base 61 on the pallet 60 at platform 40.As shown in Figure 7, this platform 40 can be placed on glove box 70 the insides that are full of nitrogen, keeps clean operating environment.Platform 40 also can be placed in the dustless laminar flow hood 70 that high efficiency particle air filter is housed, so that operating environment satisfies the requirement of dust Control
Embodiment 2
As shown in Figure 5, the MOCVD system that present embodiment relates to is an example to dispose two epitaxial reaction chambers 10, and structure similar in itself and the foregoing description comprises a transmission cavity 20 that is provided with mechanical manipulator 21, and two epitaxial reaction chambers 10 that are connected with transmission cavity 20.Its difference is, also comprises two transhipment stations 30 that are connected with transmission cavity 20, and each transhipment station 30 also is connected with a platform 40.
Similar to the above embodiments, be provided with vacuum separation valve 51 between transmission cavity 20 and each epitaxial reaction chamber 10; Be provided with vacuum separation valve 53 between transhipment station 30 and the platform 40.Vacuum separation valve 52 (dotted line is represented among Fig. 5) between transmission cavity 20 and the transhipment station 30 can be selected to be provided with or to remove as requested.Above-mentioned vacuum separation valve 51,52,53 all just can be opened in the pressure equilibrium of its both sides cavity or when reaching in the certain limit.
With above-mentioned different, present embodiment is provided with two groups of transhipment stations 30 and platform 40, therefore can make wherein one group of new pallet 60 of placing the wait epitaxial process specially, and place the pallet of finishing from the extension reaction of two epitaxial reaction chambers, 10 taking-ups 60 in another group; Or make every group of transhipment station 30 and platform 40 corresponding epitaxial reaction chambers 10, only the replacement of carrying out pallet for this epitaxial reaction chamber 10 picks and places work.
Similar to the above embodiments, be provided with in each transhipment station 30 some can be in groove position 31 vertical or that horizontal direction moves, the carrying of utility tray 60; This some grooves position 31 also can dispose heating unit or refrigerating unit arbitrarily according to different production needs, and pallet 60 is carried out preheating or cooling, to save the time of subsequent disposal.
Embodiment 3
As shown in Figure 6, present embodiment relates to the MOCVD system with a plurality of epitaxial reaction chambers, with structure similar in the foregoing description, comprise a transmission cavity 20 that is provided with mechanical manipulator 21, and the some transhipment stations 30 that are connected with transmission cavity 20 and a plurality of epitaxial reaction chamber 10.
Its difference is that transmission cavity 20 is polygonal in the present embodiment, and it can be connected with more epitaxial reaction chamber 10 or transhipment station 30.To be example among Fig. 6, transmission cavity 20 is hexagonal, its respectively with two transhipment stations 30, and three epitaxial reaction chambers 10 connect; Each transhipment station 30 also is connected with a platform 40.
Similar to the above embodiments, be provided with vacuum separation valve 51 between transmission cavity 20 and each epitaxial reaction chamber 10; Be provided with vacuum separation valve 53 between transhipment station 30 and the platform 40.Vacuum separation valve 52 (dotted line is represented among Fig. 6) between transmission cavity 20 and the transhipment station 30 can be selected to be provided with or to remove as requested.Above-mentioned vacuum separation valve 51,52,53 all just can be opened in the pressure equilibrium of its both sides cavity or when reaching in the certain limit.
Similar with the foregoing description 2, two groups of transhipment stations 30 that are provided with in the present embodiment and platform 40 are respectively as the input aperture and the delivery port of pallet 60, place the new pallet 60 of waiting for epitaxial process specially for one group therein, and in another group, place the pallet of finishing from the extension reaction of three epitaxial reaction chambers, 10 taking-ups 60.
Similar to the above embodiments, be provided with in each transhipment station 30 some can be in groove position 31 vertical or that horizontal direction moves, the carrying of utility tray 60; This some grooves position 31 also can dispose heating unit or refrigerating unit arbitrarily according to different production needs, and pallet 60 is carried out preheating or cooling, to save the time of subsequent disposal.
Below in conjunction with a kind of MOCVD system with two epitaxial reaction chambers shown in Figure 7 is example, cooperates referring to embodiment 1 described explanation workflow of the present invention.
In this system, two epitaxial reaction chambers 10 that are connected with transmission cavity 20, shared same group of transhipment station 30 and platform 40.Need to prove that Fig. 7 is only as a kind of embodiment of the present invention, the transhipment station 30 that the present invention relates to and vertically, the groove position 31 that moves horizontally etc., be not limited to the structure of the following stated.
Two epitaxial reaction chamber 10A that are provided with in the corresponding system and 10B, transhipment station 30 is provided with 4 groove positions 31, is respectively output magazine position A1, B1 and input slot position A2, B2, wherein input slot position A2 and B2 are used to place new pending pallet 60, can be provided with heating unit; Output magazine position A1 and B1 place the pallet 60 of having finished the extension reaction, can be provided with refrigerating unit.
In this example, the vacuum separation valve 52 between transhipment station 30 and the transmission cavity 20 is arranged on the top of transhipment station 30 chambers one sidewall, and transhipment station 30 and the vacuum separation valve 53 between the platform 40 are arranged on the bottom of the corresponding sidewall of chamber.The groove position 31 of transhipment station 30 is by vertically moving, and at the Link Port place of transhipment station 30 with transmission cavity 20, cooperative mechanical hand 21 carries out the operation (shown in input slot position B2 among Fig. 7) that pallet 60 picks and places; Similarly, have only the Link Port place that vertically moves to transhipment station 30 and platform 40 in this example, groove position 31 just can be moved horizontally to platform 40 (shown in output magazine position A1 among Fig. 7), picks and places substrate base 61 on pallet 60 or the pallet 60 by operator.Below get in the operating process of changing pallet 60, omit groove position 31 in description vertical or that horizontal direction moves.
Epitaxial reaction chamber changes the step of pallet:
(1) the A epitaxial reaction chamber changes pallet: open vacuum separation valve 51 and 52 under the equilibrium conditions that keep-ups pressure, mechanical manipulator 21 takes out pallet 60 and puts into the output magazine position A1 of transhipment station 30 from 10 li of A epitaxial reaction chambers, then the new pallet 60 on the A2 of input slot position is put into A epitaxial reaction chamber 10.
(2) the B epitaxial reaction chamber changes pallet: open vacuum separation valve 51 and 52 under the equilibrium conditions that keep-ups pressure, mechanical manipulator 21 is from the pallet 60 of 10 li taking-ups of B epitaxial reaction chamber and put into the output magazine position B1 of transhipment station, then the new pallet 60 on the B2 of input slot position is put into B epitaxial reaction chamber 10.
Prepare the step of new pallet:
(1) if only on the A1 of output magazine position the pallet of having finished epitaxially grown substrate base 61 is arranged, operation steps is
(b) open vacuum separation valve (53);
(c) pallet (60) is moved to platform (40);
(d) pallet that renews (60) or change substrate base 61 on the pallet (60);
(e) new pallet (60) sends back to the output magazine position A1 of transhipment station (30);
(f) shut vacuum separation valve (53);
(g) by mechanical manipulator (21) new pallet (60) is moved to input slot position A2 from output magazine position A1.
So just finish the extension reaction of preparing next round for the A epitaxial reaction chamber, changed the operation of pallet.
(2) if only on the B1 of output magazine position the pallet of having finished epitaxially grown substrate base 61 is arranged, operation steps is
(a) by mechanical manipulator pallet (60) is removed to output magazine position A1 from output magazine position B1;
(b) open vacuum separation valve (53);
(c) pallet (60) is moved to platform (40);
(d) pallet that renews (60) or change substrate base 61 on the pallet (60);
(e) new pallet (60) sends back to the output magazine position A1 of transhipment station (30);
(f) shut vacuum separation valve (53);
(h) by mechanical manipulator new pallet (60) is moved to input slot position B2 from output magazine position A1.
So just finish the extension reaction of preparing next round for the B epitaxial reaction chamber, changed the operation of pallet.
(3) if the pallet of having finished epitaxially grown substrate base 61 is all arranged at output magazine position A1 and output magazine position B1, must finish the renewal of output magazine position A1 upper tray 60 earlier, promptly the institute of (1) in steps, finish the renewal of output magazine position B1 upper tray after output magazine position A1 vacated again, promptly the institute of (2) in steps.
Above step can be realized by auto-control software and hardware.
For transmission cavity 20 described in the embodiment 1 and 30 of transhipment stations the system configuration (promptly removing dotted portion among Fig. 7) of vacuum separation valve 52 is not set, the step of above-mentioned " epitaxial reaction chamber changes pallet " and " preparing new pallet " can be suitable equally.
The step of above-mentioned " epitaxial reaction chamber changes pallet " and " preparing new pallet ", can be suitable for equally described in embodiment 2,3, the transmission cavity 20 that is connected with a plurality of epitaxial reaction chambers 10 also connects the system configuration as the two groups of transhipment stations 30 and the platform 40 of the input aperture of pallet 60 and delivery port respectively.This kind system is substituted in the operation of pallet 60, only need the input aperture end with platform 40 in all new pallets 60 be transported to successively in the transhipment station 30; And the pallet of the extension reaction being finished at the delivery port end 60 is transported to platform 40 from transhipment station 30 successively, and the operation of mechanical manipulator 21 and the complexity of each transhipment station 30 controls are further simplified.
In sum, MOCVD system with a plurality of epitaxial reaction chambers of the present invention, can in a plurality of epitaxial reaction chambers, carry out the extension reaction simultaneously to substrate base, increase the output of every MOCVD system exponentially, need not open epitaxial reaction chamber, it is remained under vacuum state and the higher working temperature, and can realize the operation that the epitaxial reaction chamber inner pallet picks and places, not only saved the epitaxial reaction chamber refrigerative time and changed and coiled the time of operating, also make the settling on the wall of chamber be not easy to come off, prolong the cycle of carrying out the cavity clean and maintenance, improved the production utilization ratio of equipment.
The present invention also changes the system architecture that existing platform is connected with transmission cavity, multi-position connects more epitaxial reaction chamber to make transmission cavity can have more, with shared same set of transmission cavity, mechanical manipulator, transhipment station and platform, saved an other cover or an a few cover corresponding apparatus, reduce it cost and working cost have been set, saved the fabricating yard of this part equipment.
The present invention has designed transhipment station and the platform that is used for many epitaxial reaction chambers, has designed the order of a plurality of pallet-changings, can vertically reaching under the cooperation of groove position that horizontal direction moves and mechanical manipulator, has realized getting fast the operation of changing pallet.
The present invention is placed on the pallet of new pallet and taking-up respectively on the input slot position and output magazine position corresponding with epitaxial reaction chamber in the transhipment station, and can be respectively heating or refrigerating function by groove position setup time of shortening subsequent operations, further improved the production utilization ratio of equipment.
The present invention can also be by being provided with two groups of transhipment stations and platform, removes respectively as the input aperture and the delivery port of pallet, or vacuum separation valve 52, realized the further simplification of operation steps.
Although content of the present invention has been done detailed introduction by above preferred embodiment, will be appreciated that above-mentioned description should not be considered to limitation of the present invention.After those skilled in the art have read foregoing, for multiple modification of the present invention with to substitute all will be conspicuous.Therefore, protection scope of the present invention should be limited to the appended claims.
Claims (10)
1. MOCVD system with a plurality of epitaxial reaction chambers, be used for the some substrate bases (61) that are placed on the pallet (60) are carried out the extension reaction, it is characterized in that, comprise one be provided with the transmission cavity (20) of mechanical manipulator (21), be connected with transmission cavity (20) respectively be equal to or greater than two epitaxial reaction chamber (10); Described pallet (60) is placed on respectively in described a plurality of epitaxial reaction chamber (10), makes some substrate bases (61) carry out the extension reaction simultaneously at these a plurality of epitaxial reaction chambers (10).
2. the MOCVD system with a plurality of epitaxial reaction chambers as claimed in claim 1 is characterized in that, also comprises at least one transhipment station (30) that is connected with described transmission cavity (20) respectively, and the platform (40) that is connected with described transhipment station (30).
3. the MOCVD system with a plurality of epitaxial reaction chambers as claimed in claim 2 is characterized in that, also comprises some vacuum separation valves (51,52,53);
Described vacuum separation valve (51) is arranged between described transmission cavity (20) and each epitaxial reaction chamber (10);
Described vacuum separation valve (53) is arranged between transhipment station (30) and the platform (40);
Between transmission cavity (20) and transhipment station (30), described vacuum separation valve (52) can be set;
Only pressure equilibrium or open when being in setting range in the chamber on its both sides of described some vacuum separation valves (51,52,53).
4. the MOCVD system with a plurality of epitaxial reaction chambers as claimed in claim 2, it is characterized in that, described mechanical manipulator (21) is cooperated by radial extension, axial rotation, the three-dimensional motion that moves up and down, described pallet (60) is picked and placeed between described epitaxial reaction chamber (10) and transhipment station (30) or between epitaxial reaction chamber (10), pick and place, perhaps between transhipment station (30), pick and place.
5. the MOCVD system with a plurality of epitaxial reaction chambers as claimed in claim 2, it is characterized in that, be connected with at least one group of transhipment station (30) and platform (40) with described transmission cavity (20), input aperture and delivery port as pallet (60), perhaps two groups of transhipment stations (30) and platform (40), wherein place the pallet (60) that the new substrate base (61) of waiting for epitaxial process is housed for one group, and in another group, place the pallet (60) of having finished extension reaction substrate base (61) from being equipped with of a plurality of epitaxial reaction chambers (10) taking-up.
6. as claim 2 or 5 described MOCVD systems, it is characterized in that, be provided with some grooves position (31) in the described transhipment station (30), make each epitaxial reaction chamber (10) correspondence be assigned input slot position and output magazine position with a plurality of epitaxial reaction chambers;
Place the pallet of finishing from the extension reaction of described epitaxial reaction chamber (10) taking-up (60) in the described output magazine position;
Place from described platform (40) in the described input slot position and put into the pallet (60) of waiting for epitaxial process.
7. the MOCVD system with a plurality of epitaxial reaction chambers as claimed in claim 6 is characterized in that, can be provided with heating unit or refrigerating unit in some groove positions (31) of described transhipment station (30); Some groove positions (31) of described transhipment station (30) can be moved at vertical direction or horizontal direction.
8. the working method with MOCVD system of a plurality of epitaxial reaction chambers and a transhipment station is characterized in that, changes the flow process of pallet (60) in the output magazine position A1 that moves horizontally of described transhipment station (30), comprises following steps:
(b) open vacuum separation valve (53);
(c) pallet (60) is moved to platform (40);
(d) pallet that renews (60) or change substrate base (61) on the pallet (60);
(e) new pallet (60) sends back to the output magazine position A1 of transhipment station (30);
(f) shut vacuum separation valve (53);
(g) by mechanical manipulator (21) new pallet (60) is moved to input slot position A2 from output magazine position A1.
9. the working method with MOCVD system of a plurality of epitaxial reaction chambers and a transhipment station as claimed in claim 8, it is characterized in that, in the output magazine position B1 that can not move horizontally of described transhipment station (30), change the flow process of pallet (60), do not carry out when on the described output magazine position A1 that moves horizontally, having pallet (60), comprise following steps:
(a) by mechanical manipulator pallet (60) is removed to output magazine position A1 from output magazine position B1;
(b) open vacuum separation valve (53);
(c) pallet (60) is moved to platform (40);
(d) pallet that renews (60) or change substrate base (61) on the pallet (60);
(e) new pallet (60) sends back to the output magazine position A1 of transhipment station (30);
(f) shut vacuum separation valve (53);
(h) by mechanical manipulator new pallet (60) is moved to input slot position B2 from output magazine position A1.
10. the working method with MOCVD system of a plurality of epitaxial reaction chambers as claimed in claim 9 is characterized in that, also is included in the step that epitaxial reaction chamber (10) is changed pallet (60):
Under the equilibrium conditions that keep-ups pressure, open vacuum separation valve (51) and (52), mechanical manipulator (21) takes out pallet (60) from epitaxial reaction chamber (10) lining and puts into the output magazine position of transhipment station (30), then the new pallet (60) on the input slot position is put into epitaxial reaction chamber (10).
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010102312739A CN102212877B (en) | 2010-07-09 | 2010-07-09 | MOCVD (Metal-organic Chemical Vapor Deposition) system with multiple extensional reaction cavities and operation method thereof |
| PCT/CN2011/001124 WO2012003715A1 (en) | 2010-07-09 | 2011-07-08 | Mocvd system having multiple epitaxial reactor chambers and operation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010102312739A CN102212877B (en) | 2010-07-09 | 2010-07-09 | MOCVD (Metal-organic Chemical Vapor Deposition) system with multiple extensional reaction cavities and operation method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102212877A true CN102212877A (en) | 2011-10-12 |
| CN102212877B CN102212877B (en) | 2012-08-22 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010102312739A Active CN102212877B (en) | 2010-07-09 | 2010-07-09 | MOCVD (Metal-organic Chemical Vapor Deposition) system with multiple extensional reaction cavities and operation method thereof |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN102212877B (en) |
| WO (1) | WO2012003715A1 (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN105986251A (en) * | 2015-02-11 | 2016-10-05 | 上海理想万里晖薄膜设备有限公司 | PECVD system |
| WO2020062541A1 (en) * | 2018-09-26 | 2020-04-02 | 深圳市永盛隆科技有限公司 | Shelf, carrying plate, tray, buffer cavity, loading cavity and substrate transmission system |
| CN112391608A (en) * | 2020-11-13 | 2021-02-23 | 宁波沁圆科技有限公司 | CVD processing system and processing method |
| WO2021043754A1 (en) | 2019-09-03 | 2021-03-11 | Aixtron Se | Loading module for a cvd reactor system |
| CN113463190A (en) * | 2021-05-13 | 2021-10-01 | 顾赢速科技(合肥)有限公司 | Epitaxial growth device |
| CN113881931A (en) * | 2021-10-11 | 2022-01-04 | 湘潭大学 | CVD device and dispersed air intake method thereof |
| CN114411247A (en) * | 2022-01-21 | 2022-04-29 | 深圳市纳设智能装备有限公司 | Epitaxial reaction equipment |
| CN114540946A (en) * | 2021-12-29 | 2022-05-27 | 华灿光电（浙江）有限公司 | MOCVD epitaxial equipment for improving preparation efficiency and use method thereof |
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| EP2215282B1 (en) | 2007-10-11 | 2016-11-30 | Valence Process Equipment, Inc. | Chemical vapor deposition reactor |
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| WO2021043754A1 (en) | 2019-09-03 | 2021-03-11 | Aixtron Se | Loading module for a cvd reactor system |
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| CN113463190A (en) * | 2021-05-13 | 2021-10-01 | 顾赢速科技(合肥)有限公司 | Epitaxial growth device |
| CN113881931A (en) * | 2021-10-11 | 2022-01-04 | 湘潭大学 | CVD device and dispersed air intake method thereof |
| CN114540946A (en) * | 2021-12-29 | 2022-05-27 | 华灿光电（浙江）有限公司 | MOCVD epitaxial equipment for improving preparation efficiency and use method thereof |
| CN114540946B (en) * | 2021-12-29 | 2023-11-14 | 华灿光电（浙江）有限公司 | MOCVD epitaxial equipment for improving preparation efficiency and application method thereof |
| CN114411247A (en) * | 2022-01-21 | 2022-04-29 | 深圳市纳设智能装备有限公司 | Epitaxial reaction equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2012003715A1 (en) | 2012-01-12 |
| CN102212877B (en) | 2012-08-22 |
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