CN115722467A - Mask plate side edge cleaning device - Google Patents

Mask plate side edge cleaning device Download PDF

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Publication number
CN115722467A
CN115722467A CN202211526771.5A CN202211526771A CN115722467A CN 115722467 A CN115722467 A CN 115722467A CN 202211526771 A CN202211526771 A CN 202211526771A CN 115722467 A CN115722467 A CN 115722467A
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CN
China
Prior art keywords
mask
supporting
cleaning
driving mechanism
side edge
Prior art date
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Pending
Application number
CN202211526771.5A
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Chinese (zh)
Inventor
徐飞
王玲
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Changzhou Ruize Microelectronics Co ltd
Original Assignee
Changzhou Ruize Microelectronics Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Changzhou Ruize Microelectronics Co ltd filed Critical Changzhou Ruize Microelectronics Co ltd
Priority to CN202211526771.5A priority Critical patent/CN115722467A/en
Publication of CN115722467A publication Critical patent/CN115722467A/en
Pending legal-status Critical Current

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  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

The invention relates to a mask plate side edge cleaning device which comprises a supporting rotating mechanism, a clamping mechanism and a cleaning mechanism, wherein the supporting rotating mechanism is used for supporting a mask plate and driving the mask plate to rotate by a corresponding angle; the clamping mechanism is used for clamping a pair of side edges of the mask plate; the cleaning mechanism is used for cleaning the other pair of side edges of the mask plate after the clamping mechanism clamps one group of side edges of the mask plate. The invention can efficiently clean the side edge of the mask plate.

Description

Mask plate side edge cleaning device
Technical Field
The invention relates to the field of mask cleaning, in particular to a mask side cleaning device.
Background
The Mask plate (also called Mask), referred to as Mask Reticle for short, is a graphic master plate used in the lithography process commonly used in the micro-nano processing technology. A mask pattern structure is formed on a transparent substrate by an opaque light-shielding film, and pattern information is transferred to a product substrate through an exposure process.
The mask plates are numerous in production process, impurity particles, photoresist and the like can be retained on the side edges of the mask plates in the production and transfer processes, but most of the existing mask plate cleaning devices are designed for the upper surface and the lower surface of the mask plates and cannot clean the side edges of the mask plates, so that the mask plates have cleaning dead angles. It is therefore desirable to develop an apparatus that can clean the sides of a reticle.
Disclosure of Invention
The invention aims to overcome the defects of the prior art and provides a mask side cleaning device which can efficiently clean the side of a mask.
In order to solve the technical problems, the technical scheme of the invention is as follows: a reticle side edge cleaning device comprising:
the supporting and rotating mechanism is used for supporting the mask plate and driving the mask plate to rotate by a corresponding angle;
a clamping mechanism for clamping a pair of sides of the reticle;
and the cleaning mechanism is used for cleaning the other pair of side edges of the mask plate after the clamping mechanism clamps one group of side edges of the mask plate.
Further provides a concrete structure of a cleaning mechanism, the cleaning mechanism comprises:
the cleaning device comprises two cleaning assemblies which are arranged oppositely, wherein each cleaning assembly comprises a brush plate roller, a brush plate roller rotation driving mechanism and a brush plate roller movement driving mechanism, the brush plate roller rotation driving mechanism is connected with the brush plate roller to drive the brush plate roller to rotate, and the brush plate roller movement driving mechanism is connected with the brush plate roller rotation driving mechanism and is used for driving the brush plate roller rotation driving mechanism and the brush plate roller to move towards or away from a mask plate;
the liquid spraying assembly comprises a spray head telescopic driving mechanism and a spray head, the spray head telescopic driving mechanism is connected with the spray head and used for driving the spray head to extend out or retract, and the spray head is used for spraying cleaning liquid towards opposite roller surfaces of the two brushing plate rollers under the condition of extending out.
There is further provided a specific structure of a clamping mechanism including two clamping assemblies opposed to each other, the clamping assemblies including:
the clamping piece is provided with a V-shaped groove for abutting against the mask plate at the side close to the mask plate;
and the clamping piece moving driving mechanism is connected with the clamping piece and is used for driving the clamping piece to move towards or away from the mask.
There is further provided a concrete structure of a supporting rotation mechanism, the supporting rotation mechanism including:
the chuck is provided with a through hole;
the supporting mechanism is rotatably arranged in the through hole and used for supporting the mask;
and the mask plate rotation driving mechanism is connected with the supporting mechanism and is used for driving the supporting mechanism to rotate.
Further in order to conveniently support the rotating mechanism to receive the mask, the device for cleaning the side edge of the mask further comprises a lifting mechanism, and the lifting mechanism is connected with the supporting rotating mechanism and used for driving the supporting rotating mechanism to lift.
Further in order to prevent cleaning liquid from entering the mask plate rotation driving mechanism and the lifting mechanism, the mask plate side cleaning device further comprises a table plate and a corrugated pipe, the upper end portion of the corrugated pipe is in sealing connection with the circumferential portion of the chuck, the lower end portion of the corrugated pipe is in sealing connection with the table plate and is configured to provide lifting freedom degrees for the chuck, and the mask plate rotation driving mechanism and the lifting mechanism are both located in a space covered by the corrugated pipe.
Further, in order to reduce the contact area with the mask plate on the premise of ensuring the supporting strength, the supporting mechanism is provided with at least three supporting rods which are uniformly distributed along the circumferential direction and are used for supporting the mask plate together, the supporting rods are hook-shaped and bent downwards, and the highest point of the hook-shaped is in smooth transition and is used for contacting the mask plate.
Further in order to prevent liquid from splashing, the device for cleaning the side edge of the mask plate further comprises a liquid blocking cover, the supporting and rotating mechanism is positioned in the liquid blocking cover, and at least one part of the clamping mechanism and the cleaning mechanism penetrates through the peripheral wall of the liquid blocking cover to extend into the liquid blocking cover.
Further in order to ensure the liquid blocking effect on the premise of not interfering taking and placing of the mask, the device for cleaning the side edge of the mask further comprises a liquid blocking cover telescopic driving mechanism, the upper end part of the liquid blocking cover is a telescopic section, and the liquid blocking cover telescopic driving mechanism is connected with the telescopic section and used for driving the telescopic section to stretch up and down.
After the technical scheme is adopted, the invention has the following beneficial effects:
1. the mask is placed on the supporting and rotating mechanism, the clamping mechanism acts to clamp one pair of side edges of the mask, then the cleaning mechanism cleans the other pair of side edges of the mask, after cleaning is finished, the supporting and rotating mechanism 1 drives the mask to rotate for 90 degrees, the clamping mechanism clamps the mask again, and the cleaning mechanism cleans the remaining pair of side edges of the mask;
2. the cleaning mechanism adopts a mode that the brush plate roller is matched with the spray head to clean the side edge, the spray head sprays corresponding cleaning liquid to the brush plate roller, and the brush plate roller rotates to scrub the side edge of the mask plate, so that the cleaning mechanism and the cleaning mode have high cleaning power, can clean stubborn particle impurities and photoresist, and have high cleaning speed and good cleaning effect;
3. the clamping piece in the embodiment tightly supports the mask plate through the V-shaped groove, the V-shaped groove is in line contact with the edge of the mask plate, the contact area is small, the upper surface and the lower surface of the mask plate can be avoided, the upper surface and the lower surface of the mask plate are prevented from being damaged, and the clamping assembly of the mechanism is clamped stably;
4. the invention can effectively prevent the cleaning liquid from entering the lifting mechanism and the supporting and rotating mechanism and can well prevent the cleaning liquid from splashing.
Drawings
FIG. 1 is a schematic structural view of a mask side cleaning apparatus according to the present invention;
FIG. 2 is a cross-sectional view of a reticle side cleaning mechanism of the present invention;
FIG. 3 is a schematic view of the cleaning assembly of the present invention;
FIG. 4 is a schematic structural view of a brush plate roller and a brush plate roller rotation driving mechanism of the cleaning assembly of the present invention;
fig. 5 is a schematic view of the structure of the clamping assembly of the present invention.
Detailed Description
In order that the manner in which the present invention is attained and can be understood in detail, a more particular description of the invention briefly summarized above may be had by reference to the embodiments thereof which are illustrated in the appended drawings.
As shown in fig. 1, 2, 3, 4, and 5, a reticle side cleaning apparatus includes:
the supporting and rotating mechanism 1 is used for supporting the mask 2 and driving the mask 2 to rotate by a corresponding angle;
a clamping mechanism 3 for clamping a pair of side edges of the mask 2;
and the cleaning mechanism 4 is used for cleaning the other pair of side edges of the mask 2 after the clamping mechanism 3 clamps one group of side edges of the mask 2.
Specifically, a mask 2 is placed on a supporting rotating mechanism 1, a clamping mechanism 3 acts to clamp one pair of side edges of the mask 2, then a cleaning mechanism 4 cleans the other pair of side edges of the mask 2, after cleaning is finished, the supporting rotating mechanism 1 drives the mask 2 to rotate for 90 degrees, the clamping mechanism 3 clamps the mask 2 again, and the cleaning mechanism 4 cleans the remaining pair of side edges of the mask 2.
As shown in fig. 1, 2, 3, 4 and 5, the cleaning mechanism 4 includes:
two opposite cleaning assemblies, each cleaning assembly comprises a brush plate roller 41, a brush plate roller rotation driving mechanism 42 and a brush plate roller movement driving mechanism 43, the brush plate roller rotation driving mechanism 42 is connected with the brush plate roller 41 to drive the brush plate roller 41 to rotate, and the brush plate roller movement driving mechanism 43 is connected with the brush plate roller rotation driving mechanism 42 to drive the brush plate roller rotation driving mechanism 42 and the brush plate roller 41 to move towards or away from the mask 2;
and the liquid spraying assembly comprises a spray head telescopic driving mechanism 44 and a spray head 45, wherein the spray head telescopic driving mechanism 44 is connected with the spray head 45 and is used for driving the spray head 45 to extend or retract, and the spray head 45 is used for spraying cleaning liquid towards the opposite roller surfaces of the two brushing plate rollers 41 under the condition of extension.
Specifically, the brush plate roller 41 is driven by the brush plate roller movement driving mechanism 43 to move to the position of the side edge of the mask 2, the spray head 45 is driven by the spray head telescopic driving mechanism 44 to extend to the position where the cleaning liquid can cover the whole roller surface part of the brush plate roller 41 facing the mask 2, the cleaning mechanism 4 of the embodiment adopts the mode that the brush plate roller 41 and the spray head 45 are matched to clean the side edge, the spray head 45 sprays corresponding cleaning liquid to the brush plate roller 41, and the brush plate roller 41 brushes the side edge of the mask 2 in a rotating mode, so that the cleaning mechanism 4 and the cleaning mode have high cleaning power, can clean stubborn particle impurities and photoresist, and have high cleaning speed and good cleaning effect.
In this embodiment, the liquid ejection assembly has 2, and the extending and contracting directions of the two heads 45 are perpendicular to the moving direction of the brush roller 41. Each spray head component corresponds to one brush plate roller 41, and the spray head 45 is a fan-shaped spray head. The head 45 sprays liquid uniformly. The brush roller movement driving mechanism 43 may be an electric cylinder, an air cylinder, or the like. The brushing roller 41 is rotatably supported on a mounting plate, the brushing roller rotation driving mechanism 42 can adopt a motor, the body of the motor is mounted on the mounting plate, the output shaft is in transmission connection with the brushing roller 41 through a transmission mechanism, and the transmission mechanism comprises a transmission belt and a plurality of transmission wheels. The brush plate roller 41 is provided with a plurality of flexible brush heads on the roller surface.
As shown in fig. 1, 2 and 5, the clamping mechanism 3 includes two clamping assemblies disposed opposite to each other, and the clamping assemblies include:
the clamping piece 31, the side of the clamping piece 31 close to the mask 2 is provided with a V-shaped groove for abutting against the mask 2;
and a clamp moving driving mechanism 32, wherein the clamp moving driving mechanism 32 is connected with the clamp 31 and is used for driving the clamp 31 to move towards or away from the mask 2.
Specifically, the clamping member 31 in this embodiment is in line contact with the edge of the reticle 2 by pressing the V-shaped groove against the reticle 2,V, has a small contact area, and can avoid the upper and lower surfaces of the reticle 2 to prevent the upper and lower surfaces of the reticle 2 from being damaged. The clamping assembly of the mechanism is clamped firmly.
In this embodiment, two clamping components opposition, two wash the subassembly opposition also, two clamping components place straight lines perpendicular to two washing component place straight lines, whole mask version side belt cleaning device structural arrangement is reasonable. The clamp moving drive mechanism 32 may employ an air cylinder, an electric cylinder, or the like.
As shown in fig. 2, the supporting and rotating mechanism 1 includes:
a chuck 11 provided with a through hole;
the supporting mechanism 12 is rotatably arranged in the through hole and used for supporting the mask 2;
and the mask plate rotation driving mechanism 13 is connected with the supporting mechanism 12 and is used for driving the supporting mechanism 12 to rotate.
As shown in fig. 2, the mask plate side cleaning device further includes a lifting mechanism 5, and the lifting mechanism 5 is connected to the supporting and rotating mechanism 1 and is used for driving the supporting and rotating mechanism 1 to lift. The lifting mechanism 5 drives the supporting and rotating mechanism 1 to ascend so as to conveniently receive the mask 2 sent by the manipulator, and then the lifting mechanism 5 drives the supporting and rotating mechanism 1 to descend so as to enable the mask 2 to descend to a position flush with the clamping mechanism 3, and further enable the clamping mechanism 3 to well clamp the mask 2.
As shown in fig. 1 and 2, the reticle side cleaning device further includes a table plate 6 and a bellows 7, the support mechanism 12 is installed in the through hole in a sealing and rotating manner, an upper end portion of the bellows 7 is connected with a circumferential portion of the chuck 11 in a sealing manner, a lower end portion of the bellows is connected with the table plate 6 in a sealing manner, the bellows is configured to provide a lifting degree of freedom to the chuck 11, and the reticle rotation driving mechanism 13 and the lifting mechanism 5 are both located in a space covered by the bellows 7. The cleaning liquid is corrosive, so that the cleaning liquid can be effectively prevented from entering the supporting and rotating mechanism 1 and the lifting mechanism 5, and the supporting and rotating mechanism 1 and the lifting mechanism 5 are prevented from being corroded.
In the implementation, in order to reduce the height of the whole mask plate side cleaning device exceeding the table top plate 6, the table top plate 6 is provided with a mounting hole, the lifting mechanism 5 is installed below the table top plate 6, and the corrugated pipe 7 surrounds the periphery of the mounting hole. The mask plate rotation driving mechanism 13 is installed on an installation plate, the installation plate penetrates through the installation hole, and the lifting mechanism 5 is connected with the installation plate to drive lifting.
In this embodiment, the cleaning mechanism 4 and the clamping mechanism 3 are respectively mounted on the table top 6 through support columns.
As shown in fig. 2, the supporting mechanism 12 has at least three supporting rods 121 uniformly distributed along the circumferential direction and used for supporting the mask 2 together, the supporting rods 121 are in a downward bent hook shape, and the highest point of the hook shape is in smooth transition and used for contacting the mask 2. With such an arrangement, on one hand, the contact area between the support mechanism 12 and the mask 2 can be reduced as much as possible, so as to prevent the mask 2 from being damaged or contaminated, and on the other hand, the support strength of the support rod 121 can be ensured. The highest point of the hook shape is in smooth transition, and the mask 2 is further prevented from being damaged.
As shown in fig. 1 and 2, the mask plate side cleaning device further comprises a liquid blocking cover 8, the supporting and rotating mechanism 1 is located in the liquid blocking cover 8, and at least a part of the clamping mechanism 3 and the cleaning mechanism 4 penetrates through the peripheral wall of the liquid blocking cover 8 and extends into the liquid blocking cover 8. The liquid blocking cover 8 is arranged, so that the cleaning liquid can be effectively prevented from splashing outwards, the workshop environment can be ensured, and part of power elements of the clamping mechanism 3 and the cleaning mechanism 4 can be prevented from being corroded.
As shown in fig. 1 and 2, the mask plate side cleaning device further comprises a liquid blocking cover telescopic driving mechanism 9, the upper end of the liquid blocking cover 8 is a telescopic section, and the liquid blocking cover telescopic driving mechanism 9 is connected with the telescopic section and used for driving the telescopic section to stretch up and down.
Specifically, in the process of taking and placing the mask 2 through the manipulator, the liquid blocking cover telescopic driving mechanism 9 drives the telescopic section to retract, so that interference to the manipulator is avoided, in the process of cleaning the mask 2, the liquid blocking cover telescopic driving mechanism 9 drives the telescopic section to extend out, so that cleaning liquid is prevented from splashing from an opening in the upper end of the liquid blocking cover 8, and the anti-splashing effect is good.
In this embodiment, the liquid blocking cover telescopic driving mechanism 9 may be an air cylinder, a hydraulic rod, or the like.
In light of the foregoing description of the preferred embodiment of the present invention, many modifications and variations will be apparent to those skilled in the art without departing from the spirit and scope of the invention. The technical scope of the present invention is not limited to the content of the specification, and must be determined according to the scope of the claims.

Claims (9)

1. A device for cleaning the side edge of a mask is characterized in that,
the method comprises the following steps:
the supporting and rotating mechanism (1) is used for supporting the mask (2) and driving the mask (2) to rotate by a corresponding angle;
the clamping mechanism (3) is used for clamping a pair of side edges of the mask (2);
and the cleaning mechanism (4) is used for cleaning the other pair of side edges of the mask (2) after the clamping mechanism (3) clamps one group of side edges of the mask (2).
2. The reticle side edge cleaning apparatus of claim 1,
the cleaning mechanism (4) comprises:
the cleaning device comprises two opposite cleaning assemblies, wherein each cleaning assembly comprises a brush plate roller (41), a brush plate roller rotation driving mechanism (42) and a brush plate roller movement driving mechanism (43), the brush plate roller rotation driving mechanism (42) is connected with the brush plate roller (41) to drive the brush plate roller (41) to rotate, and the brush plate roller movement driving mechanism (43) is connected with the brush plate roller rotation driving mechanism (42) and is used for driving the brush plate roller rotation driving mechanism (42) and the brush plate roller (41) to move towards or away from the mask plate (2);
the liquid spraying assembly comprises a spray head telescopic driving mechanism (44) and a spray head (45), wherein the spray head telescopic driving mechanism (44) is connected with the spray head (45) and used for driving the spray head (45) to extend or retract, and the spray head (45) is used for spraying cleaning liquid towards opposite roller surfaces of the two brushing plate rollers (41) under the condition of extension.
3. The reticle side edge cleaning apparatus of claim 1,
the clamping mechanism (3) comprises two opposed clamping assemblies comprising:
the clamping piece (31), the side of the clamping piece (31) close to the mask (2) is provided with a V-shaped groove for abutting against the mask (2);
and the clamping piece moving driving mechanism (32) is connected with the clamping piece (31) and used for driving the clamping piece (31) to move towards or away from the mask plate (2).
4. The reticle side edge cleaning apparatus of claim 1,
the supporting and rotating mechanism (1) comprises:
a chuck (11) provided with a through hole;
the supporting mechanism (12) is rotatably arranged in the through hole and is used for supporting the mask (2);
and the mask plate rotation driving mechanism (13) is connected with the supporting mechanism (12) and is used for driving the supporting mechanism (12) to rotate.
5. The reticle side edge cleaning apparatus of claim 4,
the lifting mechanism (5) is connected with the supporting and rotating mechanism (1) and used for driving the supporting and rotating mechanism (1) to lift.
6. The reticle side edge cleaning apparatus of claim 5,
the mask plate rotating mechanism comprises a chuck (11), and is characterized by further comprising a table plate (6) and a corrugated pipe (7), wherein the upper end of the corrugated pipe (7) is in sealing connection with the circumferential part of the chuck (11), the lower end of the corrugated pipe is in sealing connection with the table plate (6) and is configured to provide a lifting degree of freedom for the chuck (11), and the mask plate rotating driving mechanism (13) and the lifting mechanism (5) are both located in a space covered by the corrugated pipe (7).
7. The reticle side edge cleaning apparatus of claim 4,
the supporting mechanism (12) is provided with at least three supporting rods (121) which are uniformly distributed along the circumferential direction and are used for supporting the mask (2) together, the supporting rods (121) are hook-shaped and bent downwards, and the highest points of the hook-shaped are in smooth transition and are used for contacting the mask (2).
8. The reticle side edge cleaning apparatus of claim 1,
the cleaning device is characterized by further comprising a liquid blocking cover (8), the supporting rotating mechanism (1) is located in the liquid blocking cover (8), and at least one part of the clamping mechanism (3) and the cleaning mechanism (4) penetrates through the peripheral wall of the liquid blocking cover (8) to extend into the liquid blocking cover (8).
9. The reticle side edge cleaning apparatus of claim 8,
the liquid blocking cover telescopic driving mechanism (9) is further included, the upper end portion of the liquid blocking cover (8) is a telescopic section, and the liquid blocking cover telescopic driving mechanism (9) is connected with the telescopic section and used for driving the telescopic section to stretch up and down.
CN202211526771.5A 2022-12-01 2022-12-01 Mask plate side edge cleaning device Pending CN115722467A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202211526771.5A CN115722467A (en) 2022-12-01 2022-12-01 Mask plate side edge cleaning device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202211526771.5A CN115722467A (en) 2022-12-01 2022-12-01 Mask plate side edge cleaning device

Publications (1)

Publication Number Publication Date
CN115722467A true CN115722467A (en) 2023-03-03

Family

ID=85299649

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202211526771.5A Pending CN115722467A (en) 2022-12-01 2022-12-01 Mask plate side edge cleaning device

Country Status (1)

Country Link
CN (1) CN115722467A (en)

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000223460A (en) * 1999-01-28 2000-08-11 Dainippon Screen Mfg Co Ltd Wafer cleaning apparatus
JP2001209166A (en) * 2000-01-26 2001-08-03 Dainippon Printing Co Ltd Spin processing device for manufacturing photomask
JP2007052300A (en) * 2005-08-19 2007-03-01 Pre-Tech Co Ltd Cleaning device for mask substrate, and cleaning method for mask substrate using the same
CN102226867A (en) * 2011-05-26 2011-10-26 常州瑞择微电子科技有限公司 Clamping apparatus for flushing photomask
CN107952711A (en) * 2017-11-09 2018-04-24 大连理工大学 A kind of large and medium-sized bearing inside/outside circle part automatic cleaning equipment
CN109013220A (en) * 2018-08-13 2018-12-18 常州瑞择微电子科技有限公司 Rotation expansion chuck for semiconductor mask plate gluing
KR20190046122A (en) * 2017-10-25 2019-05-07 세메스 주식회사 Reticle cleaning apparatus and reticle cleaning method using the same
CN110026372A (en) * 2019-03-29 2019-07-19 云谷(固安)科技有限公司 A kind of mask cleaning device
CN111871939A (en) * 2020-07-21 2020-11-03 福建华佳彩有限公司 Metal mask plate cleaning device
CN112756364A (en) * 2020-11-28 2021-05-07 芜湖东光大华机械制造有限公司 Cleaning, processing and clamping device for flexible flywheel
CN217017838U (en) * 2021-12-10 2022-07-22 天津市长龙宏业燃气设备有限公司 Steel bottle cleaning machine

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000223460A (en) * 1999-01-28 2000-08-11 Dainippon Screen Mfg Co Ltd Wafer cleaning apparatus
JP2001209166A (en) * 2000-01-26 2001-08-03 Dainippon Printing Co Ltd Spin processing device for manufacturing photomask
JP2007052300A (en) * 2005-08-19 2007-03-01 Pre-Tech Co Ltd Cleaning device for mask substrate, and cleaning method for mask substrate using the same
CN102226867A (en) * 2011-05-26 2011-10-26 常州瑞择微电子科技有限公司 Clamping apparatus for flushing photomask
KR20190046122A (en) * 2017-10-25 2019-05-07 세메스 주식회사 Reticle cleaning apparatus and reticle cleaning method using the same
CN107952711A (en) * 2017-11-09 2018-04-24 大连理工大学 A kind of large and medium-sized bearing inside/outside circle part automatic cleaning equipment
CN109013220A (en) * 2018-08-13 2018-12-18 常州瑞择微电子科技有限公司 Rotation expansion chuck for semiconductor mask plate gluing
CN110026372A (en) * 2019-03-29 2019-07-19 云谷(固安)科技有限公司 A kind of mask cleaning device
CN111871939A (en) * 2020-07-21 2020-11-03 福建华佳彩有限公司 Metal mask plate cleaning device
CN112756364A (en) * 2020-11-28 2021-05-07 芜湖东光大华机械制造有限公司 Cleaning, processing and clamping device for flexible flywheel
CN217017838U (en) * 2021-12-10 2022-07-22 天津市长龙宏业燃气设备有限公司 Steel bottle cleaning machine

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