CN115572948A - 一种高综合性能pvd合金靶材及其制备和应用 - Google Patents
一种高综合性能pvd合金靶材及其制备和应用 Download PDFInfo
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- 229910045601 alloy Inorganic materials 0.000 title claims abstract description 47
- 239000000956 alloy Substances 0.000 title claims abstract description 47
- 238000002360 preparation method Methods 0.000 title abstract description 10
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 61
- 239000010949 copper Substances 0.000 claims abstract description 42
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 41
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 40
- 229910052802 copper Inorganic materials 0.000 claims abstract description 37
- 239000013077 target material Substances 0.000 claims abstract description 33
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 30
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 claims abstract description 21
- 229910052742 iron Inorganic materials 0.000 claims abstract description 20
- 229910052748 manganese Inorganic materials 0.000 claims abstract description 20
- 239000011572 manganese Substances 0.000 claims abstract description 20
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims abstract description 19
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 18
- 239000011651 chromium Substances 0.000 claims abstract description 18
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 16
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 15
- 229910003470 tongbaite Inorganic materials 0.000 claims abstract description 13
- 229910001567 cementite Inorganic materials 0.000 claims abstract description 12
- 239000012535 impurity Substances 0.000 claims abstract description 5
- UFGZSIPAQKLCGR-UHFFFAOYSA-N chromium carbide Chemical compound [Cr]#C[Cr]C#[Cr] UFGZSIPAQKLCGR-UHFFFAOYSA-N 0.000 claims abstract 4
- 238000005240 physical vapour deposition Methods 0.000 claims description 23
- 238000000034 method Methods 0.000 claims description 19
- 239000011159 matrix material Substances 0.000 claims description 18
- 239000002994 raw material Substances 0.000 claims description 12
- QYCVHILLJSYYBD-UHFFFAOYSA-L copper;oxalate Chemical compound [Cu+2].[O-]C(=O)C([O-])=O QYCVHILLJSYYBD-UHFFFAOYSA-L 0.000 claims description 11
- 229910000831 Steel Inorganic materials 0.000 claims description 10
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 claims description 10
- 239000010959 steel Substances 0.000 claims description 10
- 238000010438 heat treatment Methods 0.000 claims description 8
- 239000006104 solid solution Substances 0.000 claims description 8
- 238000005245 sintering Methods 0.000 claims description 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 5
- 239000001257 hydrogen Substances 0.000 claims description 5
- 229910052739 hydrogen Inorganic materials 0.000 claims description 5
- 238000011534 incubation Methods 0.000 claims description 4
- 239000007789 gas Substances 0.000 claims description 3
- 239000004519 grease Substances 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 3
- 230000000845 anti-microbial effect Effects 0.000 claims description 2
- 239000004599 antimicrobial Substances 0.000 claims description 2
- 238000009792 diffusion process Methods 0.000 claims description 2
- 239000011261 inert gas Substances 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
- 230000000844 anti-bacterial effect Effects 0.000 abstract description 16
- 230000008021 deposition Effects 0.000 abstract 1
- 230000000052 comparative effect Effects 0.000 description 22
- 238000012360 testing method Methods 0.000 description 16
- 238000000576 coating method Methods 0.000 description 10
- GVEHJMMRQRRJPM-UHFFFAOYSA-N chromium(2+);methanidylidynechromium Chemical compound [Cr+2].[Cr]#[C-].[Cr]#[C-] GVEHJMMRQRRJPM-UHFFFAOYSA-N 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 8
- 238000005260 corrosion Methods 0.000 description 8
- 230000007797 corrosion Effects 0.000 description 8
- 238000009826 distribution Methods 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 6
- 238000013507 mapping Methods 0.000 description 6
- 239000000843 powder Substances 0.000 description 6
- 239000004332 silver Substances 0.000 description 6
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 5
- 239000010410 layer Substances 0.000 description 5
- 229910052709 silver Inorganic materials 0.000 description 5
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 239000010935 stainless steel Substances 0.000 description 4
- 229910001220 stainless steel Inorganic materials 0.000 description 4
- 239000011701 zinc Substances 0.000 description 4
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 150000001247 metal acetylides Chemical class 0.000 description 3
- 239000007769 metal material Substances 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 229910000431 copper oxide Inorganic materials 0.000 description 2
- NTKHLGAMTDSVMO-UHFFFAOYSA-N copper;oxalic acid Chemical compound [Cu].OC(=O)C(O)=O NTKHLGAMTDSVMO-UHFFFAOYSA-N 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000005979 thermal decomposition reaction Methods 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- 239000010963 304 stainless steel Substances 0.000 description 1
- 239000005751 Copper oxide Substances 0.000 description 1
- 241000588724 Escherichia coli Species 0.000 description 1
- 229910000589 SAE 304 stainless steel Inorganic materials 0.000 description 1
- 238000003723 Smelting Methods 0.000 description 1
- 241000191967 Staphylococcus aureus Species 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 159000000021 acetate salts Chemical class 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 229960004643 cupric oxide Drugs 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 238000011056 performance test Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- -1 preferably Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 238000011946 reduction process Methods 0.000 description 1
- 238000001878 scanning electron micrograph Methods 0.000 description 1
- 229910001923 silver oxide Inorganic materials 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 230000001954 sterilising effect Effects 0.000 description 1
- 238000004659 sterilization and disinfection Methods 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000012795 verification Methods 0.000 description 1
- XLOMVQKBTHCTTD-UHFFFAOYSA-N zinc oxide Inorganic materials [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 1
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Abstract
本申请提供了一种高综合性能PVD合金靶材及其制备和应用，所述靶材为烧结合金，元素按重量计包括：铬3.0wt.％至15.8wt.％、锰0.5wt.％至3.0wt.％、镍0.5wt.％至9.5wt.％、铜14.0wt.％至36.0wt.％、碳5.0wt.％至14.0wt.％，余量为铁，以及总量不大于0.5wt％的杂质；所述烧结合金中的至少部分铜元素以非晶态铜存在，所述烧结合金中包含碳化锰0.2wt.％至1.4wt.％、碳化镍0.2wt.％至4.5wt.％、碳化铬1.3wt.％至8.0wt.％和碳化铁7.5wt.％至27.0wt.％。使用所述靶材通过PVD沉积制备的膜的抗菌寿命可以达到8年至10年，并且在同等厚度下，产品耐磨性更高，在同样的耐磨性情况下基于所述靶材的膜的厚度可以更薄。
Description
技术领域
本文涉及但不限于金属材料领域，涉及但不限于一种合金靶材及其制备和应用，尤其涉及但不限于一种高综合性能PVD合金靶材及其制备和应用。
背景技术
现有的抗菌材料主要包括银、铜、锌和氧化钛，其中银、铜、锌本身有杀菌作用，氧化钛可以通过光照来杀菌。以上材料应用于物理气相沉积靶材(PVD)中制备相关抗菌产品。
用于PVD靶材的制备方法通常包括以下方法：1)通过熔炼法，将银融入锆金属或者其他金属中(例如97％锆+3％银)；2)通过熔炼法，将常规铜融入不锈钢等金属中(例如97％不锈钢+3％铜)；3)通过烧结法，将常规铜掺杂入不锈钢中(例如80％不锈钢+20％铜)；4)通过熔炼法，将锌融入其他金属材料中；5)通过掺杂法(烧结)，将氧化钛掺入他金属材料中。
但包含银、铜或锌的抗菌材料作为PVD用靶材用于制备卫浴五金件时，产品寿命差，成本高，容易氧化腐蚀变色。氧化钛类物质导电性差，无法应用在离子镀膜等有导电性需求的PVD镀膜工艺中。且其中氧化钛膜层的杀菌效果只能在足够高的紫外线强度下才能发挥出来，厨卫环境中的光照条件很难达到。
发明内容
以下是对本文详细描述的主题的概述。本概述并非是为了限制权利要求的保护范围。
本申请提供了一种靶材，其特征在于，所述靶材为烧结合金，元素按重量计包括：铬3.0wt.％至15.8wt.％、锰0.5wt.％至3.0wt.％、镍0.5wt.％至9.5wt.％、铜14.0wt.％至36.0wt.％、碳5.0wt.％至14.0wt.％，余量为铁，以及总量不大于0.5wt％的杂质；
所述烧结合金中的至少部分铜元素以非晶态铜存在，所述烧结合金中包含碳化锰0.2wt.％至1.4wt.％、碳化镍0.2wt.％至4.5wt.％、碳化铬1.3wt.％至8.0wt.％和碳化铁7.5wt.％至27.0wt.％。
在本申请提供的一种实施方式中，所述合金的基体相为铁、锰、镍、铬的固溶体，所述合金的基体相中弥散分布有包括：碳化锰、碳化铬、碳化镍和碳化铁中的任意一种或更多种。
在本申请提供的一种实施方式中，所述非晶态铜分布在晶界、相界和扩散进入晶粒内中的任意一处或更多处。
在本申请提供的一种实施方式中，铁和锰、镍、铬构成了合金的主相基材，非晶态草酸铜在烧结过程中产生的纳米级非晶态铜均匀的分布在基材中。
又一方面，本申请提供了上述的靶材的制备方法，所述制备方法包括将铬、锰、镍、铜、铁以及非晶态草酸铜烧结制得。
在本申请提供的一种实施方式中，所述草酸铜为非晶态草酸铜。
在本申请提供的一种实施方式中，所述原料中的铁选自45号钢、20号钢、40号钢和50号钢中的任意一种或更多种。
在本申请提供的一种实施方式中，所述制备方法包括，
1)升温所述原料，去除其中的气体和水分；
2)继续升温至去除所述原料中的油脂物质；
3)继续升温形成合金，所述合金的基体相为铁、锰、镍、铬的固溶体，所述合金的基体相中弥散分布有包括：碳化锰、碳化铬、碳化镍和碳化铁中的任意一种或更多种；
在本申请提供的一种实施方式中，步骤1)中所述升温为升温至200℃至250℃，之后保温0.5h至2h；
在本申请提供的一种实施方式中，步骤2)中所述升温为升温至400℃至450℃，之后保温0.5h至2h；
在本申请提供的一种实施方式中，步骤3)中的升温为升温至800℃至1100℃，之后保温4h至8h；
在本申请提供的一种实施方式中，步骤3)所述保温的至少部分时间通入了氢气，之后在惰性气体下保温，优选地，通入氢气的时间为0.5h至1.5h。
又一方面，本申请提供了上述的靶材在物理气相沉中的应用。
在本申请提供的一种实施方式中，所述靶材在抗菌产品中的应用。
又一方面，本申请提供了一种使用物理气相沉积方法制备得到的表面沉积有靶材的装置，其特征在于，所述物理气相沉积方法使用的靶材为上述的靶材。制备得到的装置例如可以是卫浴产品以及汽车零部件等。
在本申请提供的高综合性能PVD合金靶材，非晶态草酸铜的作用是在烧结过程中分解成纳米级非晶态铜和二氧化碳。非晶态草酸铜的热分解是阳离子的逐步还原过程(Cu2+→Cu1+→Cu0)，非晶态草酸铜在800℃至1100℃时反应2变得非常快，生成的铜原子没有机会按照最密堆积原理排列，从而保留原来的分布状态形成非晶态铜，分解过程化学反应式如下：
反应1：CuC2O4→COOCu+CO2↑
反应2：COOCu→Cu(非晶态)+CO2↑(800℃至1100℃)
本申请提供的高综合性能PVD合金靶材通过将混合均匀的锰粉、镍粉、铬粉、非晶态草酸铜粉和钢粉烧结而制成，使得合金靶材和PVD膜层的主要基体相为铁、铬的固溶体，基体相中弥散分布着碳化锰、碳化镍、碳化铬的细小强化相，非晶态草酸铜分解产生的纳米级非晶态铜主要分布在晶界、相界上，小部分非晶态铜扩散进入晶粒表层。本申请提供的高综合性能PVD合金靶材和所镀的膜层由于存在多种弥散分布的碳化物和无晶界非晶态铜从而具有优异的耐蚀性、耐磨性、抗菌性，适用于厨卫产品的表面处理。
本申请的其它特征和优点将在随后的说明书中阐述，并且，部分地从说明书中变得显而易见，或者通过实施本申请而了解。本申请的其他优点可通过在说明书中所描述的方案来发明实现和获得。
附图说明
附图用来提供对本申请技术方案的理解，并且构成说明书的一部分，与本申请的实施例一起用于解释本申请的技术方案，并不构成对本申请技术方案的限制。
图1为本申请实施例10制得的合金靶材所镀膜的样品ASS盐雾测试前的照片；
图2为本申请实施例10制得的合金靶材所镀膜的样品ASS盐雾测试256小时的照片。
图3本申请实施例10制得的合金靶材扫描电镜图片，从图中可以看出铜为非晶态铜。
图4本申请实施例10制得的合金靶材的非晶铜分布，从图4中可以看出，非晶铜主要分布在在晶界和相界，少量扩散至晶粒内
图5本申请实施例10制得的合金靶材的晶界上铜呈现出无晶型、均匀的非晶态微观形貌SEM图。
图6本申请实施例10制得的合金靶材的铬分布的元素mapping图，从图6可以看出，铬溶在基体中，分布有铬的微区同时分布有碳。
图7本申请实施例10制得的合金靶材的镍分布的元素mapping图，从图7可以看出，镍溶在基体中，分布有镍的微区同时分布有碳。
图8本申请实施例10制得的合金靶材的锰分布的元素mapping图，从图8可以看出，锰溶在基体中，分布有锰的微区同时分布有碳。
图9本申请实施例10制得的合金靶材的铁分布的元素mapping图，从图9可以看出，铁溶在基体中，分布有铁的微区同时分布有碳。
图10本申请实施例10制得的合金靶材的碳分布的元素mapping图。
具体实施方式
为使本申请的目的、技术方案和优点更加清楚明白，下文对本申请的实施例进行详细说明。需要说明的是，在不冲突的情况下，本申请中的实施例及实施例中的特征可以相互任意组合。
原料金属粉末为清河县拓普金属材料有限公司购买，原料铁为45号钢，非晶草酸铜粉根据《2001年全国大学化学实验绿色化教学研讨会》第227页中的《草酸铜的合成与热分解》第1节实验部分所记载的方法制备得到。
在本申请实施例中靶材的制备方法，包括：
1)升温原料金属粉末至235℃，之后保温1.5h，去除其中的气体和水分；
2)继续升温至420℃，之后保温1.5h去除所述原料中的油脂物质；
3)继续升温至1000℃，之后保温7.5h形成合金；保温的至少部分时间(1h)通入了氢气以去除合金中的氧元素，并在氩气下保温。
采用上述方法制得13种(实施例1至10以及对比例1至2)的不同配比的PVD合金靶材，其烧结体中各元素及碳化物占比如表1所示。
对比例3的制备工艺为通过低温400℃长时间加热使非晶态草酸铜分解转化成晶态铜的合金靶材，
将实施例1至实施例10、对比例1至对比例5(对比例1为Cr、Ni、Mn中的一种或多种元素或非晶铜超出下限，对比例2为Cr、Ni、Mn中的一种或多种元素或非晶铜超出上限，对比例4为采用购自漳州合琦靶材科技有限公司的2％Ag-98％Zr和5％Ag-95％Ti的抗菌靶材，对比例5为采用购自漳州合琦靶材科技有限公司的5％Ag-95％Ti的抗菌靶材)进行多弧离子镀(使用的反应气体为C2H2，参数：镀膜本底真空0.005Pa，镀膜真空0.6Pa，氩气流量300sccm，偏压设置80V，50％占空比)在抛光的304不锈钢片上制得相应的膜层，膜层厚度均为0.5μm。
表1中，其中，铬、锰、镍、非晶铜、碳和铁以及总量不大于0.5wt％的杂质为100wt.％，总量不大于0.5wt％的杂质未在表1中示出。表1中铬、锰、镍、碳和铁元素占比包括了其元素的碳化物中的相应元素。表1中的碳化锰为部分碳元素和部分锰元素形成的碳化锰占制得的靶材的总重量百分比；表1中的碳化镍为部分碳元素和部分镍元素形成的碳化镍占制得的靶材的总重量百分比；表1中的碳化铬为部分碳元素和部分铬元素形成的碳化铬占制得的靶材的总重量百分比；表1中的碳化铁为部分碳元素和部分铁元素形成的碳化铁占制得的靶材的总重量百分比。
靶材的XRD分析结果显示实施例1至10以及对比例1至3都含有碳化铬、碳化锰、碳化铁和碳化镍。通过mapping图中铬、锰、铁、镍与碳的重叠面积占比计算得到碳化铬、碳化锰、碳化铁和碳化镍的含量。
表1：高综合性能PVD合金靶材各元素及碳化物占比(wt.％)
从本申请图4至图10可以看出，本申请实施例10制得的合金的基体相为铁、锰、镍、铬的固溶体，所述合金的基体相中弥散分布有包括：碳化锰、碳化铬、碳化镍和碳化铁。非晶铜分布，从图4中可以看出，非晶铜主要分布在在晶界和相界，少量扩散至晶粒内。从图5可以看出，晶界上铜呈现出无晶型、均匀的非晶态微观形貌。
实施例1至10的镀膜样品及对比例1至5靶材镀膜样品的性能测试结果如下：
1、耐蚀性测试
耐蚀性能测试根据国标GB/T 10125-2021《人造气氛腐蚀试验盐雾试验》和GB/T6461-2002《金属基体上金属和其他无机覆盖层经腐蚀试验后的试样和试件的评级》执行测试和评级，按ASS乙酸盐雾试验进行测试直至外观评级达不到10级，耐蚀性能见表2；
表2：实施例和对比例的耐蚀性能
| 序号 | ASS盐雾测试开始至评级低于10级的时间/h |
| 实施例1 | 123 |
| 实施例2 | 144 |
| 实施例3 | 158 |
| 实施例4 | 167 |
| 实施例5 | 182 |
| 实施例6 | 195 |
| 实施例7 | 207 |
| 实施例8 | 218 |
| 实施例9 | 237 |
| 实施例10 | 256 |
| 对比例1 | 98 |
| 对比例2 | 靶材硬脆加工过程中开裂，无法用于镀膜 |
| 对比例3 | 71 |
| 对比例4 | 105 |
| 对比例5 | 118 |
2、耐磨性测试
耐磨性测试根据中国国家标准GB/T 5419-2019《厨卫五金涂、镀层技术要求》中附录D的规定进行，耐磨性能见表3；
表3：实施例和对比例的耐磨性
3、抗菌性测试
抗菌性测试根据中国国家标准GB/T 21510-2008《纳米无机材料抗菌性能检测方法》进行，检测大肠杆菌、金黄色葡萄球菌两个菌种，抗菌性能见表4；
表4：实施例和对比例的抗菌性
可见相对于市售对比例4 2％Ag-98％Zr和对比例5 5％Ag-95％Ti的抗菌靶材所镀的膜层，通过使用本申请的高综合性能PVD合金靶材所镀的膜层耐蚀性和耐磨性得到了大幅度的提升，抗菌性已能达到添加5％银的钛、锆基的膜层同等水平。通过厨卫产品实际验证，上述实施例的膜层有效抗菌寿命可以达到8年至10年。
相同PVD沉积的面积下，本申请实施例所提供的靶材的成本比对比例4和对比例5低约50％至60％。并且在同等厚度下，使用实施例提供的靶材镀膜后相较对比例，产品耐磨性更高，在同样的耐磨性情况下基于实施例制得的膜的厚度可以更薄。
Claims (10)
1.一种靶材，其特征在于，所述靶材为烧结合金，元素按重量计包括：铬3.0wt.％至15.8wt.％、锰0.5wt.％至3.0wt.％、镍0.5wt.％至9.5wt.％、铜14.0wt.％至36.0wt.％、碳5.0wt.％至14.0wt.％，余量为铁，以及总量不大于0.5wt％的杂质；
所述烧结合金中的至少部分铜元素以非晶态铜存在，所述烧结合金中包含碳化锰0.2wt.％至1.4wt.％、碳化镍0.2wt.％至4.5wt.％、碳化铬1.3wt.％至8.0wt.％和碳化铁7.5wt.％至27.0wt.％。
2.根据权利要求1所述的靶材，其特征在于，所述合金的基体相为铁、锰、镍、铬的固溶体，所述合金的基体相中弥散分布包括：碳化锰、碳化铬、碳化镍和碳化铁中的任意一种或更多种。
3.根据权利要求1或2所述的靶材，其特征在于，所述非晶态铜分布在晶界、相界和扩散进入晶粒内中的任意一处或更多处。
4.根据权利要求1至3中任一项所述的靶材的制备方法，其特征在于，所述制备方法包括将铬、锰、镍、铜、铁以及非晶态草酸铜烧结制得。
5.根据权利要求4所述的靶材的制备方法，其特征在于，原料中的铁选自45号钢、20号钢、40号钢和50号钢中的任意一种或更多种。
6.根据权利要求4至5中任一项所述的靶材的制备方法，其特征在于，包括：
1)原料升温，去除其中的气体和水分；
2)继续升温至去除所述原料中的油脂物质；
3)继续升温形成合金，所述合金的基体相为铁、锰、镍、铬的固溶体，所述合金的基体相中弥散分布有包括：碳化锰、碳化铬、碳化镍和碳化铁中的任意一种或更多种。
7.根据权利要求6所述的靶材的制备方法，其特征在于，步骤1)中所述升温为升温至200℃至250℃，之后保温0.5h至2h；
可选地，步骤2)中所述升温为升温至400℃至450℃，之后保温0.5h至2h；
可选地，步骤3)中的升温为升温至800℃至1100℃，之后保温4h至8h；
可选地，步骤3)所述保温的至少部分时间通入了氢气，之后在惰性气体下保温，优选地，通入氢气的时间为0.5h至1.5h。
8.一种权利要求1至3中任一项所述的靶材在物理气相沉中的应用。
9.根据权利要求8所述的应用，其特征在于，所述靶材在抗菌产品中的应用。
10.一种使用物理气相沉积方法制备得到的表面沉积有靶材的装置，其特征在于，所述物理气相沉积方法使用的靶材为权利要求1至3中任一项所述的靶材。
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