CN115540549B - Drying device is used in crystal silicon wafer processing - Google Patents
Drying device is used in crystal silicon wafer processing Download PDFInfo
- Publication number
- CN115540549B CN115540549B CN202211199458.5A CN202211199458A CN115540549B CN 115540549 B CN115540549 B CN 115540549B CN 202211199458 A CN202211199458 A CN 202211199458A CN 115540549 B CN115540549 B CN 115540549B
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- plate
- sliding
- workbench
- rotating
- rod
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- 238000001035 drying Methods 0.000 title claims abstract description 35
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 27
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 27
- 239000010703 silicon Substances 0.000 title claims abstract description 27
- 239000013078 crystal Substances 0.000 title claims abstract description 20
- 230000007246 mechanism Effects 0.000 claims abstract description 31
- 230000000670 limiting effect Effects 0.000 claims description 16
- 239000000725 suspension Substances 0.000 claims description 16
- 238000010438 heat treatment Methods 0.000 claims description 10
- 230000000694 effects Effects 0.000 claims description 3
- 230000005484 gravity Effects 0.000 claims description 3
- 235000012431 wafers Nutrition 0.000 abstract description 31
- 230000009471 action Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000007667 floating Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 230000001174 ascending effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
Classifications
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B11/00—Machines or apparatus for drying solid materials or objects with movement which is non-progressive
- F26B11/18—Machines or apparatus for drying solid materials or objects with movement which is non-progressive on or in moving dishes, trays, pans, or other mainly-open receptacles
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
- F26B21/001—Drying-air generating units, e.g. movable, independent of drying enclosure
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B25/00—Details of general application not covered by group F26B21/00 or F26B23/00
- F26B25/001—Handling, e.g. loading or unloading arrangements
- F26B25/003—Handling, e.g. loading or unloading arrangements for articles
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B25/00—Details of general application not covered by group F26B21/00 or F26B23/00
- F26B25/06—Chambers, containers, or receptacles
- F26B25/14—Chambers, containers, receptacles of simple construction
- F26B25/18—Chambers, containers, receptacles of simple construction mainly open, e.g. dish, tray, pan, rack
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
The invention relates to the technical field of drying, and discloses a drying device for processing a crystal silicon wafer, which comprises a workbench, a clamping mechanism and a loading and unloading mechanism, wherein a heat source is arranged on the workbench, and a backboard is arranged on one side of the workbench; the clamping mechanism comprises a plurality of rotating shafts which are rotatably connected to the middle part of the back plate, and a reciprocating driving assembly for driving the rotating shafts to reciprocally rotate is arranged on one side of the back plate away from the workbench; the loading and unloading mechanism comprises a sliding rod, one end of the sliding rod is rotationally connected with the back plate, the middle part of the sliding rod is slidably connected with a sliding seat, the side face of the sliding seat is slidably connected with a sliding ring, a height adjusting assembly is arranged between the sliding ring and the sliding seat, a hanging plate is arranged on one side, close to the workbench, of the sliding ring, a hanging beam corresponding to the clamping plate is slidably connected on the hanging plate, and one end, far away from the back plate, of the hanging beam is provided with a second rotating seat. The invention is suitable for a drying device for processing the crystal silicon wafers, and the clamping mechanism is arranged to enable a plurality of crystal silicon wafers to swing left and right above the heat source, so that dead angles of drying are avoided.
Description
Technical Field
The invention relates to the technical field of drying, in particular to a drying device for processing a crystal silicon wafer.
Background
The solar cell is generally classified into monocrystalline silicon, polycrystalline silicon and amorphous silicon, and monocrystalline silicon solar cell is currently the fastest developing solar cell, its construction and production process are shaped, and the product is widely used in space and ground.
With the development of the photovoltaic industry, some early photovoltaic devices need to be updated, and the removed battery pieces can be used for a second time after being cleaned and repaired, wherein the wafer pieces are cleaned, but the wafer pieces after being cleaned need to be dried, so that short circuits of internal components are avoided, and the existing drying devices can only be used for drying one surface singly, so that the efficiency is low, and therefore, the improvement is needed.
Disclosure of Invention
The invention provides a drying device for processing a crystal silicon wafer, which solves the problems in the background technology.
In order to achieve the above purpose, the present invention provides the following technical solutions:
the drying device for processing the crystal silicon wafer comprises a workbench, a clamping mechanism and a loading and unloading mechanism, wherein a heat source is arranged on the workbench, and a backboard is arranged on one side of the workbench;
the clamping mechanism comprises a plurality of rotating shafts which are rotationally connected to the middle part of the back plate, a reciprocating driving assembly which drives the rotating shafts to reciprocally rotate is arranged on one side of the back plate away from the workbench, one end of the rotating shaft, which is close to the workbench, is fixedly connected with the middle part of a rotating rod, one end of the rotating rod is fixedly connected with the end part of a placing plate, the other end of the rotating rod is provided with a first limiting plate, and a clamping plate matched with the placing plate is slidingly connected to one side of the rotating rod, which is away from the placing plate;
the loading and unloading mechanism comprises a sliding rod, one end of the sliding rod is rotationally connected with the backboard, the middle of the sliding rod is slidably connected with a sliding seat, the side face of the sliding seat is slidably connected with a sliding ring, a height adjusting assembly is arranged between the sliding ring and the sliding seat, a hanging plate is arranged on one side, close to the workbench, of the sliding ring, a hanging beam corresponding to the clamping plate is slidably connected onto the hanging plate, one end, far away from the backboard, of the hanging beam is provided with a second rotating seat, a hook is rotationally connected onto the second rotating seat, and the end portion of the clamping plate is slidably connected with a hanging ring matched with the hook.
As a preferable technical scheme of the invention, a reset device for driving the hook to be in a vertical state is arranged in the second rotating seat.
As a preferable technical scheme of the invention, a stop block matched with the hanging plate is arranged in the middle of the hanging beam, and a second limiting plate is arranged at one end of the hanging beam far away from the hook.
As a preferable technical scheme of the invention, a hanging hole which is in sliding connection with the clamping plate is arranged in the hanging ring, the hanging beam is in penetrating connection with the hanging hole, and a limiting block is arranged in the middle of the hanging hole.
As a preferable technical scheme of the invention, the height adjusting assembly comprises a sliding groove arranged in the middle of the sliding ring, the sliding groove is connected with a sliding seat in a sliding way, one end of the sliding groove far away from the workbench and the sliding seat are respectively and rotatably connected with a top plate, and the end parts of the two top plates are mutually and rotatably connected.
As a preferable technical scheme of the invention, the back plate is provided with a supporting seat, the middle part of one side of the supporting seat far away from the workbench is provided with a first rotating seat, and the first rotating seat is rotationally connected with the end part of the sliding rod.
As a preferable technical scheme of the invention, the reciprocating driving assembly comprises a fixed plate arranged on the back plate, the fixed plate is fixedly connected with the end part of the guide rod, the guide rod is connected with a sliding block in a sliding way, one end of the sliding block, which is close to the rotating shaft, is provided with a rack, and the rotating shaft is provided with a driven gear matched with the rack.
As a preferable technical scheme of the invention, the reciprocating driving assembly further comprises a supporting plate arranged on the workbench, a driving motor is arranged on the supporting plate, an output shaft of the driving motor is fixedly connected with a rotating disc, the outer edge of the rotating disc is rotationally connected with one end of a supporting rod, the other end of the supporting rod is rotationally connected with the end part of a supporting plate, and the middle part of the supporting plate is fixedly connected with a sliding block.
As a preferable technical scheme of the invention, the heat source comprises a heating pipe arranged on a workbench, and a fan matched with the heating pipe is arranged at the bottom of the workbench.
The invention has the following advantages:
the invention is suitable for a drying device for processing the crystal silicon wafers, a plurality of crystal silicon wafers can swing left and right above a heat source through the clamping mechanism, dead angles of drying are avoided, the crystal silicon wafers can be more rapidly assembled and disassembled through the loading and unloading mechanism, and the service efficiency of the device is improved.
Drawings
In order to more clearly illustrate the embodiments of the invention or the technical solutions in the prior art, the drawings that are required in the embodiments or the description of the prior art will be briefly described, it being obvious that the drawings in the following description are only some embodiments of the invention, and that other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
Fig. 1 is a schematic structural diagram of a drying device for processing a wafer.
Fig. 2 is a schematic perspective view of a clamping mechanism in a drying device for processing a wafer.
Fig. 3 is a right side view of a clamping mechanism in a drying device for processing a wafer.
Fig. 4 is a schematic perspective view of the rear side of the clamping mechanism in the drying device for wafer processing.
Fig. 5 is an enlarged partial schematic view of fig. 4 a.
Fig. 6 is a schematic structural diagram of the cooperation of the clamping plate and the hanging ring in the drying device for processing the wafer.
Fig. 7 is a schematic structural view of a loading and unloading mechanism of a drying device for processing a wafer.
FIG. 8 is a right side view of a loading and unloading mechanism of a drying device for processing a wafer.
In the figure: 1. a work table; 2. a back plate; 3. heating pipes; 4. a fan; 5. a clamping mechanism; 6. a loading and unloading mechanism; 7. a rotating shaft; 8. a reciprocating drive assembly; 9. a rotating lever; 10. placing a plate; 11. a clamping plate; 12. hanging rings; 13. a limiting block; 14. a hanging hole; 15. a spring; 16. a first limiting plate; 17. a driven gear; 18. a rack; 19. a slide block; 20. a guide rod; 21. a supporting plate; 22. a fixing plate; 23. a support plate; 24. a rotating disc; 25. a support rod; 26. a driving motor; 27. a suspension beam; 28. a second rotating seat; 29. a hook; 30. a stop block; 31. a hanging plate; 32. a slip ring; 33. a chute; 34. a handle; 35. a push plate; 36. a top plate; 37. a sliding seat; 38. a slide bar; 39. a support base; 40. a first rotating seat; 41. a second limiting plate; 42. and a height adjustment assembly.
Detailed Description
The following description of the embodiments of the present invention will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
In one embodiment, referring to fig. 1-8, a drying device for processing a wafer includes a workbench 1, a heat source is arranged on the workbench 1, a backboard 2 is arranged on one side of the workbench 1, the backboard 2 is vertically arranged on the rear side of the upper surface of the workbench 1, and the drying device further includes a clamping mechanism 5 and a loading and unloading mechanism 6;
the clamping mechanism 5 comprises a plurality of rotating shafts 7 which are rotationally connected to the middle part of the back plate 2, one side of the back plate 2, far away from the workbench 1, is provided with a reciprocating driving component 8 which drives the rotating shafts 7 to reciprocate, one end of each rotating shaft 7, close to the workbench 1, is fixedly connected with the middle part of each rotating rod 9, one end of each rotating rod 9 is fixedly connected with the end part of each placing plate 10, the other end of each rotating rod 9 is provided with a first limiting plate 16, one side, far away from each placing plate 10, of each rotating rod 9 is slidably connected with a clamping plate 11 matched with each placing plate 10, the plurality of rotating shafts 7 are uniformly distributed in sequence from left to right in the middle part of the back plate 2, the reciprocating driving component 8 arranged at the rear side of the back plate 2 can drive the rotating shafts 7 to swing left and right, the front ends of the rotating shafts 7 are fixedly connected with the middle parts of the rotating rods 9, as shown in fig. 6, the lower ends of the rotating rods 9 are fixedly connected with the rear ends of the placing plates 10, placing grooves are arranged on the placing plates 10, the upper sides of the rotating rods 9 are provided with clamping plates 11 which can slide up and down, springs 15 are arranged between the clamping plates 11 and the first limiting plates 16, the clamping plates 11 can slide towards the placing plates 10, and the silicon wafers 10 can be fixedly processed through the clamping plates 11;
the loading and unloading mechanism 6 comprises a sliding rod 38, one end of the sliding rod 38 is rotationally connected with the backboard 2, the middle part of the sliding rod 38 is in sliding connection with a sliding seat 37, the side face of the sliding seat 37 is in sliding connection with a sliding ring 32, a height adjusting component 42 is arranged between the sliding ring 32 and the sliding seat 37, one side, close to the workbench 1, of the sliding ring 32 is provided with a hanging plate 31, the hanging plate 31 is in sliding connection with a hanging beam 27 corresponding to the clamping plate 11, one end, far away from the backboard 2, of the hanging beam 27 is provided with a second rotating seat 28, the second rotating seat 28 is rotationally connected with a hanging hook 29, the end part of the clamping plate 11 is in sliding connection with a hanging ring 12 matched with the hanging hook 29, the sliding seat 37 can slide back and forth along the sliding rod 38, the sliding ring 32 can slide up and down along the sliding seat 37, accordingly the hanging plate 31 can move back and forth or up and down, a plurality of hanging beams 27 are sequentially distributed on the hanging plate 31 from left to right, and the hanging beam 27 can be inserted into hanging holes 14 of the hanging hook 29.
In one case of this embodiment, a reset device for driving the hook 29 to be in a vertical state is disposed inside the second rotating seat 28. The resetting means may be a torsion spring, when the hanging beam 27 moves forward, the hook 29 will contact with the rear side of the hanging ring 12, the hook 29 will rotate to the rear side, at this time, the hanging beam 27 may continue to move forward, when the hook 29 breaks away from the hanging ring 12, the hook 29 will rotate to a vertical state, at this time, when the hanging beam 27 moves backward, the lower part of the hook 29 will be attached to the hanging beam 27 and cannot rotate, and the hook 29 will drive the hanging ring 12 to move backward, thereby realizing the effect of single-side passing.
In one case of this embodiment, a stop 30 that cooperates with a hanging plate 31 is provided at the middle of the hanging beam 27, and a second limiting plate 41 is provided at the end of the hanging beam 27 away from the hanger 29. The stop block 30 is disposed on the upper surface of the middle portion of the suspension beam 27, that is, when the suspension plate 31 moves forward, the suspension plate 31 pushes the suspension beam 27 to move forward through the stop block 30, and when the suspension plate 31 moves backward, the suspension plate 31 drives the suspension beam 27 to move backward through the second limiting plate 41, that is, a certain floating space exists between the suspension beam 27 and the suspension plate 31, so that subsequent operations are facilitated.
In one case of this embodiment, a suspension hole 14 slidably connected to the clamping plate 11 is provided in the suspension ring 12, and a suspension beam 27 is connected to the suspension hole 14 in a penetrating manner, and a stopper 13 is provided in the middle of the suspension hole 14. The hanging ring 12 can slide up and down relative to the clamping plate 11 by arranging the hanging hole 14, and the limiting block 13 is arranged in the middle of the hanging hole 14, so that enough space is reserved above the hanging hole 14 to facilitate the insertion of the hanging beam 27 after the hanging ring 12 moves downwards under the action of gravity.
In one case of this embodiment, the height adjusting assembly 42 includes a sliding groove 33 disposed in the middle of the sliding ring 32, the sliding groove 33 is slidably connected with a sliding seat 37, an end of the sliding groove 33 away from the working table 1 and the sliding seat 37 are rotatably connected with a top plate 36, and ends of the two top plates 36 are rotatably connected with each other. The front ends of the two top plates 36 are rotatably connected to the push plate 35, and the front side of the push plate 35 is provided with a handle 34, and when the push plate 35 moves backward, the two top plates 36 push the slip ring 32 and the slide rod 38, so that the slip ring 32 moves upward relative to the slide rod 38, and when the two top plates 36 rotate to a state parallel to each other, the two top plates 36 are caught, i.e., the slip ring 32 is held in that position.
In one case of this embodiment, the back plate 2 is provided with a support seat 39, and a first rotating seat 40 is disposed in the middle of the side of the support seat 39 away from the workbench 1, where the first rotating seat 40 is rotatably connected with the end of the sliding rod 38. The sliding rod 38 is rotatably connected to the upper surface of the first rotating seat 40, so that when the sliding rod 38 rotates to the front horizontal state, the sliding rod 38 is attached to the upper surface of the second rotating seat 28, thereby achieving a limiting effect, and after the sliding rod 38 rotates backwards, the sliding rod 38 falls above the backboard 2, and at this time, the loading and unloading mechanism 6 is disengaged from the clamping mechanism 5, and at this time, the clamping mechanism 5 can rotate freely.
In one case of this embodiment, the reciprocating driving assembly 8 includes a fixing plate 22 disposed on the back plate 2, the fixing plate 22 is fixedly connected to an end of the guide rod 20, a slider 19 is slidably connected to the guide rod 20, a rack 18 is disposed at an end of the slider 19 near the rotating shaft 7, and a driven gear 17 matched with the rack 18 is disposed on the rotating shaft 7. The left and right ends of the back plate 2 are provided with fixing plates 22, the two fixing plates 22 are fixedly connected with the end parts of the horizontally arranged guide rods 20, and the sliding blocks 19 move left and right on the guide rods 20, so that the racks 18 can drive the driven gears 17 to swing left and right, and the front rotating shafts 7 swing left and right. The reciprocating driving assembly 8 further comprises a supporting plate 23 arranged on the workbench 1, a driving motor 26 is arranged on the supporting plate 23, an output shaft of the driving motor 26 is fixedly connected with a rotating disc 24, the outer edge of the rotating disc 24 is connected with one end of a supporting rod 25 in a rotating mode, the other end of the supporting rod 25 is connected with the end portion of the supporting plate 21 in a rotating mode, and the middle portion of the supporting plate 21 is fixedly connected with a sliding block 19. The backup pad 23 sets up in the upper surface right-hand member of workstation 1, and driving motor 26 drives the rotation dish 24 and rotates, and the rotation dish 24 can make the layer board 21 move about through bracing piece 25 to make rack 18 move about.
In one case of the present embodiment, the heat source includes a heating pipe 3 disposed on the table 1, and a fan 4 matched with the heating pipe 3 is disposed at the bottom of the table 1. The middle part of workstation 1 is the fretwork, and the position of fretwork has set up heating pipe 3 to set up fan 4 at the lower surface of workstation 1, fan 4 can produce ascending air current, thereby make the air current become the hot air current after the heating of heating pipe 3, carry out the processing of stoving to the brilliant silicon chip through the hot air current.
In the implementation process of the embodiment, the driving motor 26 is started first, the driving motor 26 drives the rack 18 to move left and right through the rotating disc 24 and the supporting rod 25, the meshing transmission of the rack 18 and the driven gear 17 enables the rotating shaft 7 to swing left and right, so that the rotating rod 9 swings left and right along with the rotation, and when the rotating rod 9 rotates to a vertical state and the clamping plate 11 is located above, the driving motor 26 is stopped. The sliding rod 38 is rotated to the front side, the sliding rod 38 falls on the second rotating seat 28, the sliding seat 37 is pulled by the handle 34 to move forward with the sliding ring 32, so that the hanging plate 31 is inserted into the hanging hole 14 of the hanging hook 29 with the hanging beam 27, the hanging hook 29 is adaptively deflected in the inserting process, when the hanging hook 29 is positioned at the front side of the hanging ring 12, the handle 34 is pushed to the rear side at this time, the sliding ring 32 moves backward, the sliding ring 32 stops moving backward after the hanging hook 29 contacts with the hanging ring 12, at this time, the two top plates 36 are separated from each other, the sliding ring 32 moves upward, the hanging ring 31 drives the hanging ring 12 to move upward through the hanging beam 27, the hanging ring 12 drives the clamping plate 11 to move upward, the distance between the clamping plate 11 and the placing plate 10 is increased, a crystal silicon wafer to be dried is placed between the clamping plate 11 and the placing plate 10, the handle 34 is pulled to the front side, the dead angle of the two top plates 36 changes, the included angle of the two top plates 36 becomes smaller, at this moment, the hanging ring 12 moves downwards under the action of gravity, the clamping plate 11 tightly presses the crystal silicon wafer on the placing plate 10 under the action of the spring 15, at this moment, the crystal silicon wafer is clamped, the hanging ring 12 can be manually pulled to move upwards, the hanging beam 27 is pushed backwards to be separated from the hanging ring 12 due to the floating space between the hanging beam 27 and the hanging plate 31, at this moment, the sliding rod 38 is rotated backwards again, the sliding rod 38 leans against the upper edge of the backboard 2, the loading and unloading mechanism 6 is separated from the clamping mechanism 5, at this moment, the driving motor 26 is started again, the rotating rod 9 drives the crystal silicon wafer to swing left and right, and the hot air flow below carries out effective drying treatment on two faces of the crystal silicon wafer. After the drying is completed, the above steps may be repeated so that the holding plate 11 and the placing plate 10 are separated, and the dried wafer is taken down and a new wafer is put in for the drying process.
The invention is suitable for a drying device for processing the crystal silicon wafers, a plurality of crystal silicon wafers can swing left and right above a heat source through the clamping mechanism 5, dead angles of drying are avoided, the crystal silicon wafers can be rapidly assembled and disassembled through the loading and unloading mechanism 6, and the service efficiency of the device is improved.
It will be evident to those skilled in the art that the invention is not limited to the details of the foregoing illustrative embodiments, and that the present invention may be embodied in other specific forms without departing from the spirit or essential characteristics thereof. The present embodiments are, therefore, to be considered in all respects as illustrative and not restrictive, the scope of the invention being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein. Any reference sign in a claim should not be construed as limiting the claim concerned.
Claims (7)
1. The drying device for processing the crystal silicon wafer comprises a workbench, wherein a heat source is arranged on the workbench, and a backboard is arranged on one side of the workbench;
the clamping mechanism comprises a plurality of rotating shafts which are rotationally connected to the middle part of the back plate, a reciprocating driving assembly which drives the rotating shafts to reciprocally rotate is arranged on one side of the back plate away from the workbench, one end of the rotating shaft, which is close to the workbench, is fixedly connected with the middle part of a rotating rod, one end of the rotating rod is fixedly connected with the end part of a placing plate, the other end of the rotating rod is provided with a first limiting plate, and a clamping plate matched with the placing plate is slidingly connected to one side of the rotating rod, which is away from the placing plate;
the loading and unloading mechanism comprises a sliding rod, one end of the sliding rod is rotationally connected with the backboard, the middle part of the sliding rod is in sliding connection with a sliding seat, the side surface of the sliding seat is in sliding connection with a sliding ring, a height adjusting component is arranged between the sliding ring and the sliding seat, a hanging plate is arranged on one side of the sliding ring, which is close to the workbench, and is in sliding connection with a hanging beam corresponding to the clamping plate;
the upper portion of dwang is provided with the grip block that can reciprocate, be equipped with the spring between grip block and the first limiting plate, make the grip block to place the board slip through the spring, the front end of two roof is rotated each other and is connected in the push pedal, the front side of push pedal has set up the handle, promote the handle to the rear side and make the push pedal reciprocate, two roof can promote sliding ring and slide bar for the sliding ring upwards moves for the slide bar, make the suspension plate pass through the hanging beam and drive link upwards move, the link drives the grip block upwards move, place the brilliant silicon chip that will dry between the grip block and place the board, forward side pulling handle, two roof contained angles diminish, link downwardly moving under the effect of gravity, the grip block sticiss the brilliant silicon chip on placing the board under the effect of spring, the clamping is accomplished to the brilliant silicon chip.
2. The drying device for wafer processing according to claim 1, wherein a reset device for driving the hook to be in a vertical state is arranged in the second rotating seat.
3. The drying device for processing a silicon wafer according to claim 1, wherein a stop block matched with the hanging plate is arranged in the middle of the hanging beam, and a second limiting plate is arranged at one end of the hanging beam away from the hook.
4. The drying device for wafer processing according to claim 1, wherein a supporting seat is provided on the back plate, a first rotating seat is provided in the middle of the side of the supporting seat away from the working table, and the first rotating seat is rotatably connected with the end of the sliding rod.
5. The drying device for processing a silicon wafer according to claim 1, wherein the reciprocating driving assembly comprises a fixing plate arranged on the back plate, the fixing plate is fixedly connected with the end part of the guide rod, the guide rod is slidably connected with a sliding block, a rack is arranged at one end, close to the rotating shaft, of the sliding block, and a driven gear matched with the rack is arranged on the rotating shaft.
6. The drying device for wafer processing according to claim 5, wherein the reciprocating driving assembly further comprises a supporting plate arranged on the workbench, a driving motor is arranged on the supporting plate, an output shaft of the driving motor is fixedly connected with a rotating disc, an outer edge of the rotating disc is rotationally connected with one end of the supporting rod, the other end of the supporting rod is rotationally connected with an end part of the supporting plate, and the middle part of the supporting plate is fixedly connected with the sliding block.
7. The drying device for wafer processing according to claim 1, wherein the heat source comprises a heating pipe arranged on a workbench, and a fan matched with the heating pipe is arranged at the bottom of the workbench.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211199458.5A CN115540549B (en) | 2022-09-29 | 2022-09-29 | Drying device is used in crystal silicon wafer processing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211199458.5A CN115540549B (en) | 2022-09-29 | 2022-09-29 | Drying device is used in crystal silicon wafer processing |
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| Publication Number | Publication Date |
|---|---|
| CN115540549A CN115540549A (en) | 2022-12-30 |
| CN115540549B true CN115540549B (en) | 2023-11-28 |
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| CN202211199458.5A Active CN115540549B (en) | 2022-09-29 | 2022-09-29 | Drying device is used in crystal silicon wafer processing |
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| CN213984327U (en) * | 2021-01-04 | 2021-08-17 | 苏州科顺医用净化工程有限公司 | Galvanized plate drying equipment for galvanizing process |
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| CN115488466A (en) * | 2022-11-17 | 2022-12-20 | 深圳市火牛科技有限公司 | Welding machine is arranged to power adapter electric capacity |
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