CN219435827U

CN219435827U - Silicon wafer flat washing device

Info

Publication number: CN219435827U
Application number: CN202320713315.5U
Authority: CN
Inventors: 梁鹤镪
Original assignee: Dongming Shanxi Photovoltaic Technology Co ltd
Current assignee: Dongming Shanxi Photovoltaic Technology Co ltd
Priority date: 2023-04-04
Filing date: 2023-04-04
Publication date: 2023-07-28
Anticipated expiration: 2033-04-04

Abstract

The utility model discloses a silicon wafer flat washing device which comprises a transfer device for driving a wafer to uniformly move back and forth, wherein the bottom of the transfer device is provided with a lifting device for holding the wafer and driving the wafer to move up and down, the silicon wafer flat washing device also comprises a water bath device for increasing the temperature of cleaning liquid and driving the liquid to vibrate, and the top of the water bath device is provided with a vibration device for cleaning the wafer and removing residual cleaning liquid. According to the silicon wafer flat washing device, through the design that the cam and the spring drive the washing box to vibrate, liquid in the liquid storage tank is conveniently driven to flow back and forth, and the wafer washing speed is improved; through the design of respectively containing water and cleaning liquid in the double liquid storage tanks, residual cleaning liquid is conveniently washed away by water after the first cleaning, so that the wafer is cleaned more thoroughly and has no residues; through the design of setting up the heating pipe in the storage water tank bottom, the water bath heating washing liquid of being convenient for makes it maintain suitable cleaning temperature, improves the cleaning performance.

Description

Silicon wafer flat washing device

Technical Field

The utility model belongs to the field of semiconductor material production, and particularly relates to a silicon wafer flat washing device.

Background

Semiconductor is a material between conductor and non-conductor, semiconductor material is generally used to make various chips, the wafer is extracted by silicon material, after the wafer is divided, the transistor is etched on the wafer by using equipment such as photoetching machine, so that it can be used as electronic element chip, in the course of manufacturing one chip, it needs to be cleaned several times to ensure that there is no residual glue, etc.

The Chinese patent with the reference to the application number CN202220173353.1 discloses a silicon wafer flat washing device for semiconductor production, which comprises a bottom bracket, a tabletop, a moving mechanism, a cleaning mechanism and a grabbing mechanism, wherein the bottom bracket is arranged below the tabletop, the moving mechanism is arranged above the tabletop, the cleaning mechanism is arranged on one side of the moving mechanism, and the grabbing mechanism is arranged above the moving mechanism and the cleaning mechanism; the cleaning mechanism comprises a cleaning frame, a placing frame, a positioning bracket, a liquid discharge pipe, a ball valve, a gear box, a driving motor, a stirring frame and a placing frame.

The disadvantages of the above patents are: after the wafer is cleaned, part of cleaning liquid remains on the surface, the links of the cleaning liquid are not eliminated, and the cleaning is not thorough.

Disclosure of Invention

The utility model aims to provide a silicon wafer flat washing device which solves the problems in the prior art.

In order to achieve the above purpose, the present utility model provides the following technical solutions:

the silicon wafer flat washing device comprises a transfer device for driving a wafer to uniformly move back and forth, wherein the bottom of the transfer device is provided with a lifting device for holding the wafer and driving the wafer to move up and down, the silicon wafer flat washing device also comprises a water bath device for increasing the temperature of a cleaning solution and driving the liquid to vibrate, and the top of the water bath device is provided with a vibration device for cleaning the wafer and removing residual cleaning solution; the water bath device comprises a water storage tank, a heating pipe is arranged at the bottom of the water storage tank, two guide rails are symmetrically and fixedly arranged at the top of the water storage tank, a cam is rotatably arranged in front of the water storage tank, and a second motor is arranged on the cam; the vibrating device comprises a cleaning box, two liquid storage tanks are symmetrically arranged on the front and back of the top of the cleaning box, and two springs are symmetrically and fixedly arranged behind the cleaning box.

Further: the transfer device comprises a support, a screw is rotatably arranged at the bottom of the support, a feed beam is arranged above the screw, and a first motor is arranged at the front end of the screw.

Further: the lifting device comprises a moving block, an electric push rod is arranged at the bottom of the moving block, a hook is arranged at the output end of the electric push rod, and a containing frame is arranged at the bottom of the hook.

Further: the support is made of Q235 steel, and the lead screw is connected with the support bearing.

Further: the section of the guide rail is circular, and the cleaning box is in sliding connection with the guide rail.

Further: the spring is connected with the water storage tank through bolts.

Compared with the prior art, the utility model has the beneficial effects that:

1. the design that the cam and the spring drive the cleaning box to vibrate is convenient for driving the liquid in the liquid storage tank to flow back and forth, so that the wafer flushing speed is improved;

2. through the design of respectively containing water and cleaning liquid in the double liquid storage tanks, residual cleaning liquid is conveniently washed away by water after the first cleaning, so that the wafer is cleaned more thoroughly and has no residues;

3. through the design of setting up the heating pipe in the storage water tank bottom, the water bath heating washing liquid of being convenient for makes it maintain suitable cleaning temperature, improves the cleaning performance.

Drawings

FIG. 1 is a schematic view of a silicon wafer flat washing apparatus according to the present utility model;

FIG. 2 is a schematic view showing a transfer device of a silicon wafer flat washing apparatus according to the present utility model;

FIG. 3 is a schematic view showing a structure of a lifting device of a silicon wafer flat washing apparatus according to the present utility model;

FIG. 4 is a schematic view of a water bath apparatus of a silicon wafer flat washing apparatus according to the present utility model;

fig. 5 is a schematic structural view of a vibration device of a silicon wafer flat washing apparatus according to the present utility model.

In the reference numerals: 1. a transfer device; 101. a bracket; 102. a screw rod; 103. a light bar; 104. a first motor; 2. a lifting device; 201. a moving block; 202. an electric push rod; 203. a hook; 204. a holding rack; 3. a water bath device; 301. a water storage tank; 302. heating pipes; 303. a guide rail; 304. a cam; 305. a second motor; 4. a vibration device; 401. a cleaning box; 402. a liquid storage tank; 403. and (3) a spring.

Detailed Description

The following description of the embodiments of the present utility model will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present utility model, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.

Referring to fig. 1-5, a silicon wafer flat washing device comprises a transfer device 1 for driving a wafer to move back and forth uniformly, a lifting device 2 for holding the wafer and driving the wafer to move up and down is arranged at the bottom of the transfer device 1, a water bath device 3 for raising the temperature of a cleaning solution and driving the liquid to vibrate is also arranged at the top of the water bath device 3, and a vibration device 4 for cleaning the wafer and removing residual cleaning solution is arranged at the top of the water bath device 3.

In this embodiment: the transfer device 1 comprises a bracket 101, a screw rod 102 is rotatably arranged at the bottom of the bracket 101, a feed rod 103 is arranged above the screw rod 102, a first motor 104 is arranged at the front end of the screw rod 102, the bracket 101 is made of Q235 steel, the screw rod 102 is in bearing connection with the bracket 101, the bracket 101 is fixed on a ceiling, the bracket 101 supports the first motor 104 to drive the screw rod 102 to rotate, and a moving block 201 is driven to move along the feed rod 103;

in this embodiment: the lifting device 2 comprises a moving block 201, an electric push rod 202 is arranged at the bottom of the moving block 201, a hook 203 is arranged at the output end of the electric push rod 202, a containing frame 204 is arranged at the bottom of the hook 203, a silicon wafer is inserted on the containing frame 204, the hook 203 contacts the containing frame 204, meanwhile, the moving block 201 supports the electric push rod 202 to shrink, the hook 203 is driven to move upwards to lift the containing frame 204, the screw 102 is driven to continuously rotate, the containing frame 204 is driven to move above a liquid storage tank 402 for storing cleaning liquid, and the containing frame 204 descends to enable the wafer to be immersed in the cleaning liquid;

in this embodiment: the water bath device 3 comprises a water storage tank 301, a heating pipe 302 is arranged at the bottom of the water storage tank 301, two guide rails 303 are symmetrically and fixedly arranged at the top of the water storage tank 301, a cam 304 is rotatably arranged in front of the water storage tank 301, a second motor 305 is arranged on the cam 304, the cross section of the guide rails 303 is circular, a cleaning tank 401 is in sliding connection with the guide rails 303, water is poured into the water storage tank 301, the water storage tank 301 supports the heating pipe 302 to release heat, the water in the water storage tank 301 is heated, the temperature of cleaning liquid is maintained in a water bath mode, so that the wafer is better cleaned, meanwhile, the water storage tank 301 supports the second motor 305 to drive the cam 304 to rotate, the cam 304 intermittently drives the cleaning tank 401 backwards, so that the cleaning tank 401 slides backwards along the guide rails 303 and compresses a spring 403, when the cam 304 idles, the spring 403 reversely pushes the cleaning tank 401 through elasticity to reset, the cleaning tank 401 is completed to vibrate forwards and backwards, and liquid in the liquid storage tank 402 is driven to flow back and forth, and the wafer flushing speed is improved;

in this embodiment: the vibration device 4 comprises a cleaning box 401, two liquid storage tanks 402 are symmetrically arranged in front of and behind the top of the cleaning box 401, two springs 403 are symmetrically and fixedly arranged behind the cleaning box 401, the springs 403 are connected with the water storage tank 301 through bolts, the two liquid storage tanks 402 respectively contain purified water and cleaning liquid, wafers enter the other liquid storage tank 402 after being washed in the cleaning liquid, and clean water in the liquid storage tank 402 washes residual cleaning liquid on the wafers according to the steps, so that the wafer is washed cleanly and thoroughly.

Working principle: the support 101 is fixed on a ceiling, a silicon wafer is placed on the containing frame 204, water is poured into the water storage tank 301, the two liquid storage tanks 402 respectively contain purified water and cleaning liquid, the support 101 supports the first motor 104 to drive the screw rod 102 to rotate, the moving block 201 is driven to move along the feed rod 103, the hooks 203 are driven to contact the containing frame 204, meanwhile, the moving block 201 supports the electric push rod 202 to shrink, the hooks 203 are driven to move upwards to lift the containing frame 204, the screw rod 102 continues to rotate, the containing frame 204 is driven to move above the liquid storage tank 402 for storing the cleaning liquid, the containing frame 204 descends to enable the wafer to be immersed in the cleaning liquid, the water storage tank 301 supports the heating pipe 302 to release heat, the water in the water storage tank 301 is heated, the cleaning liquid temperature is maintained in a water bath mode, the wafer is better cleaned, meanwhile, the water storage tank 301 supports the second motor 305 to drive the cam 304 to rotate, the cam 304 intermittently drives the cleaning tank 401 backwards, the cleaning tank 401 slides backwards along the guide rail 303 and compresses the spring 403, the spring 403 is pushed back by the back and forth 401 when the cam 304 idles, the spring 403 resets, the cleaning tank 401 is completed, the cleaning tank 401 is vibrated forwards and back and forth, the liquid in the liquid storage tank 402 is driven to flow, the wafer is washed and the wafer is completely washed, the wafer is completely and the wafer is completely washed, and the wafer is completely washed after the wafer is washed.

Although embodiments of the present utility model have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made therein without departing from the principles and spirit of the utility model, the scope of which is defined in the appended claims and their equivalents.

Claims

1. The utility model provides a silicon wafer flat washing device, includes transfer device (1) that are used for driving the even back and forth movement of wafer, transfer device (1) bottom is provided with elevating gear (2) that are used for holding the wafer and drive its reciprocates, its characterized in that: the device also comprises a water bath device (3) for improving the temperature of the cleaning liquid and driving the liquid to vibrate, wherein a vibration device (4) for cleaning the wafer and removing residual cleaning liquid is arranged at the top of the water bath device (3);

the water bath device (3) comprises a water storage tank (301), a heating pipe (302) is arranged at the bottom of the water storage tank (301), two guide rails (303) are symmetrically and fixedly arranged at the top of the water storage tank (301), a cam (304) is rotatably arranged in front of the water storage tank (301), and a second motor (305) is arranged on the cam (304);

the vibrating device (4) comprises a cleaning box (401), two liquid storage tanks (402) are symmetrically arranged on the front and back of the top of the cleaning box (401), and two springs (403) are symmetrically and fixedly arranged behind the cleaning box (401).

2. A silicon wafer flat washing apparatus according to claim 1, wherein: the transfer device (1) comprises a support (101), a screw (102) is rotatably arranged at the bottom of the support (101), a feed beam (103) is arranged above the screw (102), and a first motor (104) is arranged at the front end of the screw (102).

3. A silicon wafer flat washing apparatus according to claim 1, wherein: the lifting device (2) comprises a moving block (201), an electric push rod (202) is installed at the bottom of the moving block (201), a hook (203) is arranged at the output end of the electric push rod (202), and a containing frame (204) is arranged at the bottom of the hook (203).

4. A silicon wafer flat washing apparatus according to claim 2, wherein: the support (101) is made of Q235 steel, and the lead screw (102) is connected with the support (101) through a bearing.

5. A silicon wafer flat washing apparatus according to claim 1, wherein: the cross section of the guide rail (303) is circular, and the cleaning box (401) is in sliding connection with the guide rail (303).

6. A silicon wafer flat washing apparatus according to claim 1, wherein: the spring (403) is connected with the water storage tank (301) through bolts.