CN115369369A - Workpiece inner curved surface coating mechanism of magnetron sputtering coating machine - Google Patents
Workpiece inner curved surface coating mechanism of magnetron sputtering coating machine Download PDFInfo
- Publication number
- CN115369369A CN115369369A CN202211188693.2A CN202211188693A CN115369369A CN 115369369 A CN115369369 A CN 115369369A CN 202211188693 A CN202211188693 A CN 202211188693A CN 115369369 A CN115369369 A CN 115369369A
- Authority
- CN
- China
- Prior art keywords
- workpiece
- curved surface
- magnetron sputtering
- inner curved
- coating machine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 43
- 239000011248 coating agent Substances 0.000 title claims abstract description 42
- 238000001755 magnetron sputter deposition Methods 0.000 title claims abstract description 22
- 230000007246 mechanism Effects 0.000 title claims abstract description 21
- 230000008878 coupling Effects 0.000 claims description 7
- 238000010168 coupling process Methods 0.000 claims description 7
- 238000005859 coupling reaction Methods 0.000 claims description 7
- 230000000694 effects Effects 0.000 abstract description 9
- 238000000151 deposition Methods 0.000 abstract description 5
- 230000008021 deposition Effects 0.000 abstract description 5
- 238000000034 method Methods 0.000 abstract description 5
- 238000001771 vacuum deposition Methods 0.000 abstract description 5
- 230000008569 process Effects 0.000 abstract description 3
- 238000005265 energy consumption Methods 0.000 abstract description 2
- 239000007888 film coating Substances 0.000 abstract 1
- 238000009501 film coating Methods 0.000 abstract 1
- 239000010408 film Substances 0.000 description 10
- 238000005516 engineering process Methods 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical group [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 3
- 230000009471 action Effects 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 2
- -1 argon ions Chemical class 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention provides a novel film coating mechanism, namely, the target distance of each position of the inner curved surface of a workpiece is uniformly changed when the inner curved surface rotates around a rotating axis, so that the deposition rate of each position inside the curved surface tends to be the same, the coating is uniform, and the effect is good. Meanwhile, the method has the advantages of simple principle, strong operability, wide workpiece application range, convenient realization, controllable process, good stability and low cost. Practice proves that the invention obviously improves the coating uniformity of the inner curved surface workpiece, improves the coating effect, is convenient to reform the existing magnetron sputtering vacuum coating machine, has low cost, can reduce the energy consumption of the original vacuum coating machine, and has better market application prospect.
Description
Technical Field
The invention relates to the field of magnetron sputtering coating, in particular to a workpiece with a curved surface, and provides a workpiece inner curved surface mechanism of a magnetron sputtering coating machine, which can improve the coating uniformity of the inner curved surface and ensure the coating quality.
Background
The magnetron sputtering technology is widely applied in the field of film manufacturing, various films required by industry can be manufactured, such as a superhard film, a corrosion-resistant and friction-resistant film, a superconducting film, a magnetic film, an optical film, a heat insulation film, various films with special electrical properties and the like, workpieces in different shapes in many industries are also coated by the technology in a large amount, and the working principle of the technology is that electrons collide with argon atoms in the process of accelerating the electrons to fly to a substrate under the action of an electric field to ionize a large amount of argon ions and electrons, and the electrons fly to the substrate. The argon ions accelerate to bombard the target under the action of an electric field, so that a large number of target atoms are sputtered, and neutral target atoms (or molecules) are deposited on the substrate to form a film. However, in the actual coating process, workpieces in different shapes have different effects, and workpieces with complex shapes are coated with uneven films, so that the coating quality of the workpieces is directly influenced. The magnetron sputtering technology is mainly planar, the coating effect of the inner curved surface of a workpiece is general, when the coating of the inner curved surface of the workpiece is prepared, the coating is influenced by the action of gravity and collides with working gas to generate energy loss, the farther away from a target surface (target distance), the less deposition atoms can be reached, the lower the deposition rate of the coating is, the larger difference exists in the thickness of the coating at different parts of the inner curved surface of the workpiece, the extremely uneven coating thickness is caused, and the coating effect is seriously influenced. The inner curved surfaces of workpieces coated by magnetron sputtering are more and more at present, the workpieces are arranged on a moving mechanism of a traditional workpiece rotating stand in a magnetron sputtering vacuum coating machine, the positions of each part of the inner curved surfaces of the workpieces and a target surface are relatively fixed, namely the target distance is unchanged, but the target distance of each position is different, so that the deposition of the workpieces is easily uneven when the coating is carried out, and the good coating effect cannot be ensured. At present, related organizations have explored solutions for solving the problems in China, but the large-scale popularization is difficult due to the cost problem, the application range problem and the like. Therefore, those skilled in the art have provided a workpiece inner curved surface coating mechanism of a magnetron sputtering coating machine to solve the problems in the background art.
Disclosure of Invention
The invention aims to provide a workpiece inner curved surface coating mechanism of a magnetron sputtering coating machine, which aims to solve the problems in the background art.
In order to achieve the purpose, the invention adopts the following technical scheme: a workpiece inner curved surface coating mechanism of a magnetron sputtering coating machine comprises a revolution plate and a workpiece autorotation mechanism of the magnetron sputtering coating machine; the workpiece autorotation mechanism comprises a autorotation disc fixed on a revolution disc of the magnetron sputtering coating machine, the autorotation disc is connected with one end of a double-head universal coupling, the other end of the double-head universal coupling is connected with a rotating shaft, the rotating shaft is fixed on a mounting plate through a bearing, the other end of the rotating shaft is provided with an adjusting nut to be connected with a workpiece, and the mounting plate is fixed on the revolution disc.
Preferably, an arc bolt groove is formed in a bearing seat of the bearing for fixing the rotating shaft, and is used for adjusting the inclination angle and the target distance of the rotating shaft.
Preferably, the adjusting nut arranged at the other end of the rotating shaft can be replaced according to the requirement of a machined part, so that the target distance of the workpiece can be conveniently adjusted.
Preferably, when the revolution plate revolves, the rotation plate connected with the workpiece rotates simultaneously.
Preferably, when the self-rotation disc rotates, the workpiece only rotates around the center of the rotating shaft for fixing the workpiece, and does not move in the horizontal direction.
The invention has the advantages that: the coating mechanism is innovative, namely the target distance of each position of the inner curved surface of the workpiece is uniformly changed when the position rotates around the rotation axis, the deposition rate of each position inside the curved surface tends to be the same, the coating is uniform, and the effect is good. Meanwhile, the method has the advantages of simple principle, strong operability, wide workpiece application range, convenient realization, controllable process, good stability and low cost. Practice proves that the invention obviously improves the coating uniformity of the inner curved surface workpiece, improves the coating effect, is convenient to transform the existing magnetron sputtering vacuum coating machine, has low cost, can reduce the energy consumption of the original vacuum coating machine, and has better market application prospect.
Drawings
FIG. 1 is a schematic structural diagram of the present invention.
In the attached figure 1: 1 double-ended universal coupling, 2 pivot, 3 mounting panel 4 bearing frames, 5 bearing frame set screw, 6 adjusting nut, 7 work pieces, 8 screws, 9 revolution dish, 10 self-rotating dish.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is further described in detail below with reference to the accompanying drawings and embodiments.
As shown in the attached drawing 1, a mounting plate 3 is fixed on a revolution plate 9 by a screw 8, a self-rotating plate 10 is fixed on the revolution plate 9, one end of a double-ended universal coupling 1 is connected with the self-rotating plate 10, the other end of the double-ended universal coupling is connected with a rotating shaft 2, the rotating shaft 2 is mounted on a bearing seat 4, the bearing seat 4 is fixed on the mounting plate 3 by a bearing seat fixing screw 5, an adjusting nut 6 is mounted on the rotating shaft 2, and a workpiece 7 is fixed by the adjusting nut 6.
During the use, with work piece 7 with adjusting nut 6 fixed connection, loosen bearing frame set screw 5, the position of adjustment bearing frame 4 for the inner curved surface innermost position and the highest position horizontal distance H of inner curved surface of work piece 7 are minimum, and the target distance of this position can not be greater than the target distance of inner curved surface outside position, then screw up bearing frame set screw 5, and starting equipment begins work, can reach more ideal effect.
It is to be understood that the inventions are not to be limited to the forms disclosed herein but are to be accorded the widest scope consistent with the principles and novel features disclosed herein. And that modifications and variations may be effected by those skilled in the art without departing from the spirit and scope of the invention as defined by the appended claims.
Claims (5)
1. A workpiece inner curved surface coating mechanism of a magnetron sputtering coating machine is characterized in that: the device comprises a revolution disc and a workpiece rotation mechanism of a magnetron sputtering coating machine; the workpiece autorotation mechanism comprises a autorotation disc fixed on a revolution disc of the magnetron sputtering coating machine, the autorotation disc is connected with one end of a double-end universal coupling, the other end of the double-end universal coupling is connected with a rotating shaft, the rotating shaft is fixed on a mounting plate through a bearing, the other end of the rotating shaft is provided with an adjusting nut to be connected with a workpiece, and the mounting plate is fixed on the revolution disc.
2. The mechanism of claim 1, wherein the inner curved surface of the workpiece is coated by a magnetron sputtering coating machine, and the mechanism comprises: and an arc-shaped bolt groove is formed in a bearing seat of the bearing for fixing the rotating shaft and is used for adjusting the inclination angle and the target distance of the rotating shaft.
3. The inner curved surface coating mechanism of a workpiece of a magnetron sputtering coating machine as claimed in claim 1, characterized in that: and the adjusting nut arranged at the other end of the rotating shaft can be replaced according to the requirements of parts to be machined.
4. The mechanism of claim 1, wherein the inner curved surface of the workpiece is coated by a magnetron sputtering coating machine, and the mechanism comprises: and when the revolution plate revolves, the rotation plate connected with the workpiece rotates simultaneously.
5. The mechanism of claim 1, wherein the inner curved surface of the workpiece is coated by a magnetron sputtering coating machine, and the mechanism comprises: when the self-rotation disc rotates, the workpiece only rotates around the center of the rotating shaft for fixing the workpiece, and does not move in the horizontal direction.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211188693.2A CN115369369A (en) | 2022-09-28 | 2022-09-28 | Workpiece inner curved surface coating mechanism of magnetron sputtering coating machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211188693.2A CN115369369A (en) | 2022-09-28 | 2022-09-28 | Workpiece inner curved surface coating mechanism of magnetron sputtering coating machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN115369369A true CN115369369A (en) | 2022-11-22 |
Family
ID=84073170
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202211188693.2A Pending CN115369369A (en) | 2022-09-28 | 2022-09-28 | Workpiece inner curved surface coating mechanism of magnetron sputtering coating machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN115369369A (en) |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1614078A (en) * | 2003-11-04 | 2005-05-11 | 电子科技大学 | Planar magnetic sputtering-multi-station film coating apparatus |
| JP2008138276A (en) * | 2006-12-05 | 2008-06-19 | Tsukishima Kikai Co Ltd | Vacuum film deposition system |
| CN101634011A (en) * | 2008-07-21 | 2010-01-27 | 中国科学院宁波材料技术与工程研究所 | Magnetic control sputtering device and method for uniformly coating film on outer surface of workpiece |
| JP2012140648A (en) * | 2010-12-28 | 2012-07-26 | Canon Anelva Corp | Sputtering apparatus and sputtering method thereof |
| CN203487225U (en) * | 2013-10-21 | 2014-03-19 | 中国航空工业第六一八研究所 | Planetary mechanism for improving coating uniformity |
| CN104988464A (en) * | 2015-06-30 | 2015-10-21 | 中国工程物理研究院材料研究所 | Method and device for uniform magnetron sputtering deposition on inner surface of axisymmetric curved member |
| CN206502858U (en) * | 2017-01-23 | 2017-09-19 | 福建省诺希科技园发展有限公司 | A kind of circular flat target magnetic control sputtering substrate motion device |
| CN107299329A (en) * | 2017-07-14 | 2017-10-27 | 信利光电股份有限公司 | A kind of coating apparatus and film plating process of curved surface cover plate |
| CN110158037A (en) * | 2019-06-27 | 2019-08-23 | Oppo广东移动通信有限公司 | Integral housing and preparation method thereof, electronic equipment and vacuum evaporation equipment |
| CN110607509A (en) * | 2019-09-19 | 2019-12-24 | 金陵科技学院 | Device and method for coating film on curved surface material |
-
2022
- 2022-09-28 CN CN202211188693.2A patent/CN115369369A/en active Pending
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1614078A (en) * | 2003-11-04 | 2005-05-11 | 电子科技大学 | Planar magnetic sputtering-multi-station film coating apparatus |
| JP2008138276A (en) * | 2006-12-05 | 2008-06-19 | Tsukishima Kikai Co Ltd | Vacuum film deposition system |
| CN101634011A (en) * | 2008-07-21 | 2010-01-27 | 中国科学院宁波材料技术与工程研究所 | Magnetic control sputtering device and method for uniformly coating film on outer surface of workpiece |
| JP2012140648A (en) * | 2010-12-28 | 2012-07-26 | Canon Anelva Corp | Sputtering apparatus and sputtering method thereof |
| CN203487225U (en) * | 2013-10-21 | 2014-03-19 | 中国航空工业第六一八研究所 | Planetary mechanism for improving coating uniformity |
| CN104988464A (en) * | 2015-06-30 | 2015-10-21 | 中国工程物理研究院材料研究所 | Method and device for uniform magnetron sputtering deposition on inner surface of axisymmetric curved member |
| CN206502858U (en) * | 2017-01-23 | 2017-09-19 | 福建省诺希科技园发展有限公司 | A kind of circular flat target magnetic control sputtering substrate motion device |
| CN107299329A (en) * | 2017-07-14 | 2017-10-27 | 信利光电股份有限公司 | A kind of coating apparatus and film plating process of curved surface cover plate |
| CN110158037A (en) * | 2019-06-27 | 2019-08-23 | Oppo广东移动通信有限公司 | Integral housing and preparation method thereof, electronic equipment and vacuum evaporation equipment |
| CN110607509A (en) * | 2019-09-19 | 2019-12-24 | 金陵科技学院 | Device and method for coating film on curved surface material |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP6385487B2 (en) | Method and coater for coating a substrate | |
| CN100392147C (en) | Pair target twin magnetic controlled sputtering ion plating deposition device | |
| CN104711527A (en) | Method for magnetron sputtering low-temperature preparation of TiN film | |
| CN209816265U (en) | Sputtering target base with adjustable target position | |
| CN1793416A (en) | Apparatus and tech., for composite preparing metal film | |
| CN101634012B (en) | Ion beam assisting magnetic control sputtering deposition method for surface protection | |
| CN105714256A (en) | Method for low-temperature preparation of DLC film through magnetron sputtering | |
| CN210065893U (en) | Self-cleaning etching anode device | |
| CN103436837A (en) | Improved rotary target spraying system | |
| CN112481595A (en) | Ion beam sputtering coating equipment | |
| CN101376964A (en) | Sputtering type film coating apparatus and film coating method | |
| CN115369369A (en) | Workpiece inner curved surface coating mechanism of magnetron sputtering coating machine | |
| CN101403101A (en) | Quick solid-ceramic coating ion plating apparatus | |
| CN102330057A (en) | Method for preparing metal ruthenium film for hard semiconductor component | |
| CN214655217U (en) | Magnetron sputtering target follows workpiece and moves device | |
| CN2399400Y (en) | Ion beam sputtering film coating machine | |
| CN111139439B (en) | Method for preparing film on large-area substrate through magnetron sputtering | |
| CN201890924U (en) | Plasma vacuum ceramic coating device | |
| CN210215522U (en) | Equipment for evaporating and plating terbium or dysprosium on surface of magnetic material | |
| CN211848127U (en) | Precise adjusting device for film thickness uniformity of vacuum coating machine | |
| CN209307480U (en) | A kind of hobboing cutter surface recombination coating apparatus that ionization level is high | |
| CN109841468B (en) | Magnetron assembly, magnetron sputtering chamber and semiconductor processing equipment | |
| CN214142516U (en) | Adjustable magnetic control coil device of physical vapor deposition cavity | |
| CN217628596U (en) | Coating equipment with adjustable baffle | |
| CN117430348B (en) | Coated glass and production equipment thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |