CN110158037A - Integral housing and preparation method thereof, electronic equipment and vacuum evaporation equipment - Google Patents

Integral housing and preparation method thereof, electronic equipment and vacuum evaporation equipment Download PDF

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Publication number
CN110158037A
CN110158037A CN201910568125.7A CN201910568125A CN110158037A CN 110158037 A CN110158037 A CN 110158037A CN 201910568125 A CN201910568125 A CN 201910568125A CN 110158037 A CN110158037 A CN 110158037A
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CN
China
Prior art keywords
bracket
carrier
integral housing
central axis
cambered surface
Prior art date
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Granted
Application number
CN201910568125.7A
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Chinese (zh)
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CN110158037B (en
Inventor
晏刚
杨光明
毕四鹏
侯体波
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Guangdong Oppo Mobile Telecommunications Corp Ltd
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Guangdong Oppo Mobile Telecommunications Corp Ltd
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Priority to CN201910568125.7A priority Critical patent/CN110158037B/en
Publication of CN110158037A publication Critical patent/CN110158037A/en
Application granted granted Critical
Publication of CN110158037B publication Critical patent/CN110158037B/en
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0015Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50Substrate holders
    • C23C14/505Substrate holders for rotation of the substrates
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04MTELEPHONIC COMMUNICATION
    • H04M1/00Substation equipment, e.g. for use by subscribers
    • H04M1/02Constructional features of telephone sets
    • H04M1/0202Portable telephone sets, e.g. cordless phones, mobile phones or bar type handsets
    • H04M1/0279Improving the user comfort or ergonomics
    • H04M1/0283Improving the user comfort or ergonomics for providing a decorative aspect, e.g. customization of casings, exchangeable faceplate

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Signal Processing (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

This application provides integral housing and preparation method thereof, electronic equipment and vacuum evaporation equipments.Vacuum evaporation equipment includes: bracket, and bracket can be rotated around the central axis of bracket;Evaporation source, evaporation source is located at the side in the central axial direction of bracket, and is oppositely arranged with bracket;And at least one carrier, at least one carrier is arranged on bracket, central axis around bracket is arranged, and it is located at bracket close to the side of evaporation source, for fixing part to be deposited, there is predetermined angle, carrier can carry out revolution around the central axis of bracket and the central axis on carrier length direction carries out rotation between the length direction of carrier and the central axis of bracket.When carrying out plated film to part to be deposited using the vacuum evaporation equipment as a result, it can be deposited to obtain the substantially uniform consistent film plating layer of thickness, reduce or avoid the color color difference of part appearance to be deposited.

Description

Integral housing and preparation method thereof, electronic equipment and vacuum evaporation equipment
Technical field
This application involves housing technologies fields, specifically, being related to integral housing and preparation method thereof, electronic equipment and true Empty evaporated device.
Background technique
The form of mobile phone glass shell is divided into 2D, 2.5D and 3D at present, wherein 3D glass shell (integral housing) is with it Mellow and full curved surface radian, is bonded the form of ergonomics, has more comfortable grip feeling;Meanwhile the curved surface of 3D glass shell Refraction and reflecting effect superposition because of light, can more show more gorgeous sensory effects compared to 2.5D and 2D.But due to The edge curved surface of 3D glass shell has certain radian, will lead to the planar section and curved face part of 3D glass shell in plated film The coating film thickness divided differs greatly, and then causes the color difference of 3D glass shell obvious, seriously affects the appearance of 3D glass shell.
It is needed to be studied accordingly, with respect to vacuum evaporation equipment.
Summary of the invention
The application is intended to solve at least some of the technical problems in related technologies.For this purpose, the application One purpose is to propose that thickness can be deposited in a kind of vacuum evaporation equipment, the vacuum evaporation equipment on integral housing ontology Consistent film plating layer is spent, the integral housing of no color differnece is obtained.
One aspect in this application, this application provides a kind of vacuum evaporation equipments.According to an embodiment of the present application, The vacuum evaporation equipment includes: bracket, and the bracket can be rotated around the central axis of the bracket;Evaporation source, institute The side that evaporation source is located in the central axial direction of the bracket is stated, and is oppositely arranged with the bracket;And at least one holds Loading, on the bracket, the central axis around the bracket is arranged, and is located at described at least one described carrier setting Bracket is close to the side of the evaporation source, for fixing part to be deposited, in the length direction of the carrier and the bracket There is predetermined angle, the carrier around the central axis of the bracket can revolve and hold around described between mandrel line Central axis on loading length direction carries out rotation.When carrying out plated film to part to be deposited using the vacuum evaporation equipment as a result, It can be deposited to obtain the uniform film plating layer of thickness, be that (curved surface bends towards the to be deposited of part to be deposited to curved surface particularly with edge Face) part to be deposited, in the process of revolution of carrier, part to be deposited also with carrier around bracket central axis Z1 into Row revolution can make the deposition rate of the plating membrane substance of the planar section (such as plane 10 of integral housing) of part to be deposited Keep almost the same;In the process of the rotation of carrier, part to be deposited is also with carrier from then around in carrier Mandrel line Z2 revolves, it is ensured that part to be deposited is in a rotational direction on the inside of the edge and curved surface of the curved surface of the left and right sides Plating membrane substance deposition rate and in the plane of part to be deposited plate membrane substance deposition rate be consistent substantially so that The thickness formed at any two points of film plating layer on part to be deposited is almost the same, and then reduces or avoid the face of part appearance to be deposited Color color difference;Moreover, above-mentioned vacuum evaporation equipment structure is simple, uncomplicated, easy to operate and automation control.
In further aspect of the application, it is made into one the side of sandwich type element this application provides a kind of using vacuum vapour deposition Method.According to an embodiment of the present application, which comprises integral housing ontology is fixed on carrier, makes the one The face to be deposited of sandwich type element ontology makes the integral housing ontology with the carrier while surrounding branch towards evaporation source The central axis of frame carries out revolution and the central axis on the carrier length direction revolves;To the integral type Enclosure body is deposited, and to form film plating layer in the face to be deposited, obtains the integral housing;Wherein, the branch Frame can be rotated around the central axis of the bracket;The evaporation source is located at one in the central axial direction of the bracket Side, and be oppositely arranged with the bracket;The carrier setting on the bracket, and is set around the central axis of the bracket It sets, and is located at the bracket close to the side of the evaporation source;The central axis of the length direction of the carrier and the bracket There is predetermined angle, the carrier can revolve and around the carrier around the central axis of bracket simultaneously between line Central axis on length direction carries out rotation.Plated film in the above-mentioned integral housing using vacuum vapour deposition production as a result, Thickness degree uniformity, in the process of revolution of carrier, integral housing ontology surrounds the center of bracket also with carrier Axis is rotated, in the process of revolution, it is ensured that the curved surface of the integral housing ontology left and right sides in a rotational direction Particle deposition rate on the inside of edge and curved surface is consistent, so that the film plating layer formed on integral housing ontology is any Consistency of thickness at two o'clock, and then reduce or avoid the color color difference of integral housing appearance, and then promote integral housing The market competitiveness.
In the another aspect of the application, this application provides a kind of integral housings.According to an embodiment of the present application, institute Stating integral housing is prepared by mentioned-above method.As a result, the color of the appearance of the integral housing without Color difference guarantees the homogeneity of integral housing appearance, makes it have the stronger market competitiveness.
In the another aspect of the application, this application provides a kind of integral housings.According to an embodiment of the present application, institute Stating integral housing includes: integral housing ontology;And the integral housing ontology is arranged in film plating layer, the film plating layer On first surface, and the difference between the thickness on the film plating layer at any two points is not more than the average thickness of the film plating layer 5%.The color no color differnece of the appearance of the integral housing as a result, guarantees the homogeneity of integral housing appearance, makes It is with the stronger market competitiveness.
In the another aspect of the application, this application provides a kind of electronic equipment.According to an embodiment of the present application, described Electronic equipment includes: mentioned-above integral housing;Display screen component, the display screen component and the integral housing phase Even, installation space is limited between the display screen component and the integral housing;And mainboard, the mainboard are arranged in institute It states in installation space and is electrically connected with the display screen component.The face of the appearance of the integral housing of the electronic equipment as a result, Color no color differnece guarantees the homogeneity of integral housing appearance, and then promotes the market competitiveness of electronic equipment.This field skill Art personnel are appreciated that the electronic equipment has all features and effect of integral housing noted earlier, herein no longer one by one It repeats.
Detailed description of the invention
Fig. 1 is the schematic perspective view of integral housing ontology in the application one embodiment.
Fig. 2 is the sectional view in Fig. 1 along AA '.
Fig. 3 is the sectional view in Fig. 1 along BB '.
Fig. 4 is the pictorial diagram of the integral housing obtained in the prior art by vacuum evaporation.
Fig. 5 is the structural schematic diagram of vacuum evaporation equipment in the application one embodiment.
Fig. 6 is the structural schematic diagram of vacuum evaporation equipment in another embodiment of the application.
Fig. 7 is that integral housing ontology is fixed on the structural schematic diagram on carrier in another embodiment of the application.
Fig. 8 is the structural schematic diagram that the second end of carrier in another embodiment of the application is swung.
Fig. 9 is that integral housing ontology is fixed on carrier by unplated piece jig in another embodiment of the application Sectional view.
Figure 10 is that the expansion of carrier when on carrier is arranged in multiple unplated piece jigs in another embodiment of the application Figure.
Figure 11 is the pictorial diagram of the integral housing obtained in another embodiment of the application by vacuum evaporation.
Figure 12 is the cross section structure schematic diagram of integral housing in the longitudinal direction in another embodiment of the application.
Figure 13 is the cross section structure schematic diagram of integral housing in the longitudinal direction in another embodiment of the application.
Figure 14 is the structural schematic diagram of mobile phone in another embodiment of the application.
Specific embodiment
Embodiments herein is described below in detail.The embodiments described below is exemplary, and is only used for explaining this Shen Please, it should not be understood as the limitation to the application.Particular technique or condition are not specified in embodiment, according to text in the art It offers described technology or conditions or is carried out according to product description.
The application is inventor based on the recognition that obtaining with discovery:
When carrying out vacuum evaporation to part to be deposited, if part to be deposited is slab construction, all points on part surface to be deposited The deposition rate that membrane substance is plated within the unit time is consistent, i.e., the consistency of thickness for the film plating layer that deposition obtains in the unit time, can So that part appearance color to be deposited is consistent, but for the part to be deposited with curved surface radian, plated film in the unit time of difference The rate of electrodeposition substance may not be identical, i.e., the thickness for the film plating layer that deposition obtains in the unit time is different, and then causes wait steam The difference of plating piece appearance color, by taking the integral housing ontology 100 of mobile phone as an example, (Fig. 2 is the edge Fig. 1 referring to FIG. 1, FIG. 2 and FIG. 3 The sectional view of AA ', Fig. 3 are the sectional view of the BB ' along Fig. 1), when the curved surface bending angle of integral housing ontology 100 is larger, if directly Connect and vacuum coating carried out to integral housing ontology 100, because there are on the inside of the difference in height and arc of arc side 30 and plane 10 20 because Arc side 30 blocks the difference for depositing and causing plated film film thickness, to generate color difference, seriously affects appearance, such as Fig. 4 institute Show.In order to reduce arc side 30, on the inside of arc between 20 and 10 three of plane film plating layer difference in thickness, inventor sets vacuum coating It is standby to improve, solve the problems, such as that the deposition rate of the plating membrane substance of each point on part to be deposited is inconsistent, so as to be deposited The thickness uniformity of the film plating layer formed on part.
In view of this, one aspect in this application, this application provides a kind of vacuum evaporation equipments.According to the application Embodiment, referring to figure 5 and figure 6, the vacuum evaporation equipment includes: bracket 200, and bracket 200 can surround the center of bracket 200 Axis Z1 is rotated;Evaporation source 300, evaporation source 300 are located at the side on the direction central axis Z1 of bracket 200, and with branch Frame 200 is oppositely arranged;And at least one carrier 400 (in figure by taking a carrier as an example), the setting of at least one carrier 400 On bracket 200, the central axis Z1 around bracket 200 is arranged, and is located at bracket 200 close to the side of evaporation source 300, is used for Fixed part (in figure by taking integral housing ontology 100 as an example) to be deposited, the length direction of carrier 400 and the center of bracket 200 There is predetermined angle α, carrier 400 can carry out revolving and around carrier around the central axis Z1 of bracket between axis Z1 Central axis Z2 on 400 length directions carries out rotation.Plated film is carried out to part to be deposited using the vacuum evaporation equipment as a result, When, can be deposited to obtain the uniform film plating layer of thickness, particularly with edge be curved surface (curved surface bend towards part to be deposited wait steam Surfacing) part to be deposited, in the process of revolution of carrier, part to be deposited also with carrier surround bracket central axis Z1 It revolves, the deposition speed of the plating membrane substance of the planar section (such as plane 10 of integral housing) of part to be deposited can be made Rate keeps almost the same;In the process of the rotation of carrier, part to be deposited is also with carrier certainly then around carrier Central axis Z2 revolves, it is ensured that part to be deposited is in a rotational direction in the edge and curved surface of the curved surface of the left and right sides The deposition rate of the plating membrane substance of side is consistent substantially with the deposition rate for plating membrane substance in the plane of part to be deposited, and then is made The thickness obtained at any two points for forming film plating layer on part to be deposited is almost the same, and then reduces or avoid part appearance to be deposited Color color difference;Moreover, above-mentioned vacuum evaporation equipment structure is simple, uncomplicated, easy to operate and automation control.
According to an embodiment of the present application, when part to be deposited is integral housing ontology 100 of the Fig. 1 into Fig. 3, integral type Enclosure body revolves with the revolution of carrier 400 and around the central axis Z1 of bracket, during the revolution, steams Rise the distance between 300 and every bit in the plane 10 of integral housing ontology 100 are almost the same (due to evaporation source and branch The distance between frame or carrier are more much larger than the size of part to be deposited, i.e., part to be deposited is only comparable on bracket or carrier A zonule, so the distance between the every bit in the plane 10 of evaporation source 300 and integral housing ontology 100 is base This is consistent), and then the deposition rate for plating membrane substance of the every bit in the plane 10 of integral housing ontology 100 can be kept It is almost the same, the final consistency of thickness for guaranteeing the film plating layer of every bit in plane 10, moreover, comparing evaporation source 300 and carrier The distance between 400, the difference in height between arc side 30 and plane 10 can be ignored, i.e., relative to evaporation source, in plane 10 The distance of point to evaporation source be substantially equal at a distance from the point to evaporation source in arc side 30, so, in above-mentioned carrier During being revolved around the central axis of bracket, it is believed that the deposition of the plating membrane substance of the point in plane 10 and arc side 30 Rate is almost the same, and then guarantees that the thickness of film plating layer in plane 10 and arc side 30 is almost the same;With carrier 400 During central axis progress rotation on its length direction, integral housing ontology surrounds the central axis Z2 of carrier It revolves, integral housing ontology can avoid arc side 30 on the inside of arc 20 in the central axis Z2 revolution around carrier Block, guarantee that the deposition rate of the plating membrane substance of every bit on 20 on the inside of arc can keep almost the same, so, it is ensured that one On the inside of arc in the plane 10 of body sandwich type element ontology, arc side 30 and carrier sense of rotation at left and right sides of integral housing ontology The deposition rate of the plating membrane substance of every bit on 20 is almost the same, so that plane 10, the arc side of integral housing ontology 30 and carrier sense of rotation on 20 on the inside of arc at left and right sides of integral housing ontology on every bit film plating layer thickness It spends almost the same.
It should be noted that the description such as " rate is almost the same ", " thickness is almost the same " herein, is since vacuum is steamed The inevitable influence factor such as coating apparatus oneself factor, outside environmental elements, be extremely difficult to it is completely the same, so herein It is described as " almost the same ", for example, above-mentioned " in the plane 10 of integral housing ontology, arc side 30 and carrier sense of rotation The thickness of the film plating layer on every bit on 20 on the inside of arc at left and right sides of integral housing ontology is almost the same ", refer to one 20 on the inside of arc in the plane 10 of sandwich type element ontology, arc side 30 and carrier sense of rotation at left and right sides of integral housing ontology On every bit on film plating layer due to some uncontrollable influence factors, be unable to reach completely the same, but the thickness of three It is very close, it is sufficient to weaken or solve the problems, such as to cause integral housing appearance colour inconsistent due to color difference.
In addition, revolution is an object centered on another object, the shuttling movement made by certain track, rotation refers to object The movement of body autorotation, the axis that object can pass through object itself along one is rotated, so herein, bracket surrounds The central axis of bracket carries out the rotation that rotation belongs to bracket, and carrier is around the rotation that the central axis Z1 of bracket is carried out The revolution of carrier, central axis Z2 of the carrier on carrier length direction are rotated the rotation as carrier, The rotation that part to be deposited is carried out with the revolution of carrier is that part to be deposited revolves around the central axis Z1 of bracket, Part to be deposited as revolves around the central axis Z2 of carrier with carrier from the rotation for transferring to carry out.
Wherein, there is no limit requirement, those skilled in the art can be according to the actual situation for the concrete shape of bracket and structure Flexible design, as long as can keep stablizing in rotation.In some embodiments of the present application, bracket can be Fig. 5 In umbrella stull shape, or the flat bracket in Fig. 6.It should be noted that carrier is arranged on bracket, wherein There is no limit requirement, carrier can be arranged directly on bracket, can also be set indirectly by connecting component specific set-up mode It sets on bracket, the set-up mode between bracket and carrier is not shown in the drawings in the descriptive section of the present application.
Wherein, evaporation source is located at the side in the central axial direction of bracket, and bracket is oppositely arranged with evaporation source, one In a little embodiments, evaporation source is located on the central axis Z1 of bracket, and is oppositely arranged with bracket;In further embodiments, it is The better uniformity for guaranteeing film plating layer thickness, evaporation source are not on the central axis Z1 of bracket, but are deviateing branch The side of the central axis Z1 of frame, on the direction of the central axis Z1 of bracket, evaporation source 400 is correspondingly arranged with part to be deposited, That is, fixed one of carrier is motionless (part i.e. to be deposited is motionless) before vacuum evaporation, and make it as object of reference, steams Rise 400 on the direction of the central axis Z1 of bracket orthographic projection and part to be deposited on the direction of the central axis Z1 of bracket Orthographic projection it is least partially overlapped, specifically, a fixation in evaporation source and part to be deposited can be adjusted another later Specific location, keep evaporation source 400 corresponding on the direction of the central axis Z1 of bracket with part to be deposited so that plating membrane substance It is preferably deposited on part to be deposited.
In addition, carrier is fixed on the specific fixed form on bracket, there is no limit requirements, as long as in the mistake of vacuum coating The stability of bracket and carrier is kept in journey, and meets the rotation requirement of bracket and carrier.
It is appreciated that there is no limit requirements for the direction of rotation of revolution and the rotation of carrier, and the two is mutually indepedent, i.e., The revolution of carrier and the rotation of carrier are two mutually independent movements, between the two without mutual restraining function, such as If the revolution of carrier be counterclockwise, the rotation of carrier can be it is counterclockwise, be also possible to clockwise.In addition, this Field technical staff is appreciated that during vacuum coating, the circle number of revolution and the rotation of carrier is at least a circle, such as This, can more preferably guarantee the thickness uniformity of film plating layer.
Further, carrier is 40~60 revs/min around the rate that the central axis Z1 of bracket revolves, such as 40 revs/min, 42 revs/min, 44 revs/min, 46 revs/min, 48 revs/min, 50 revs/min, 52 revs/min, 54 revs/min Clock, 56 revs/min, 58 revs/min, 60 revs/min.As a result, in the above-mentioned range of speeds, part plane to be deposited can be both guaranteed The plating film uniformity of part and arc side part, but also stabilization of the vacuum coating equipment in coating process can be effectively ensured Property;If revolving speed is lower than 40 revs/min, the thickness uniformity of film plating layer is relatively poor on part to be deposited;If revolving speed be greater than 60 turns/ Minute, then since bracket rotation is very fast, causes the stability of bracket relatively poor, be relatively easy to happen accident.
Further, the rate that central axis Z2 of the carrier on carrier length direction carries out rotation is greater than or waits In 10 revs/min, for example, 10 revs/min, 15 revs/min, 20 revs/min, 25 revs/min, 30 revs/min, 35 revs/min, 40 revs/min, 45 revs/min, 50 revs/min, 55 revs/min, 60 revs/min, 65 revs/min, 70 revs/min, 75 revs/min Clock, 80 revs/min, 85 revs/min, 90 revs/min, 95 revs/min, 100 revs/min.As a result, in the rotary course of high speed In, it is possible to prevente effectively from arc side to blocking on the inside of arc, guarantee part to be deposited in a rotational direction on the inside of the arc of two sides with it is flat The consistency of thickness of the film plating layer in face;If revolving speed is lower than 10 revs/min, since revolving speed is slower, it will lead to part to be deposited and revolving Turn larger with the deposition rate difference of the plating membrane substance in plane on the inside of the arc of the two sides on direction, leads to the thickness one of film plating layer Cause property is relatively poor, seriously affects part appearance to be deposited;Inventors have found that revolving speed is faster, be more conducive to avoid arc side pair Blocking on the inside of arc guarantees the consistency of film plating layer thickness on part to be deposited, it is contemplated that the rotational stabilization of carrier, this Field technical staff can set the upper limit of carrier rotation revolving speed according to actual needs, such as less than or equal to 100 revs/min Clock.
Furthermore as it can be seen in figures 5 and 6, carrier 400 is inclined on bracket 200, the length direction of carrier (is held The central axis of loading length direction) and the central axis of bracket between have predetermined angle α, in some embodiments of the present application In, referring to Fig. 6, on the direction close to the central axis of bracket, carrier is gradually tilted to evaporation source;In the another of the application In a little embodiments, referring to Fig. 5, for the ease of more preferable, the further stability for promoting carrier and bracket, far from bracket Central axis direction on, carrier is gradually tilted to evaporation source, other opposite angled manners, the set-up mode can make Stability between bracket, carrier is more preferable.
Further, the arc inside and plated film in plane that inclined set-up mode can reduce the first cambered surface of part to be deposited The difference of thickness degree, as shown in Fig. 3, Figures 5 and 6, if part to be deposited is integrated sandwich type element ontology, it can weaken integral type shell Film plating layer (in Fig. 3 20 on the inside of corresponding arc) and in plane 10 20 on the inside of first cambered surface 50 of body ontology and the arc of the second cambered surface 40 The difference of thickness, wherein the first cambered surface 50 and the second cambered surface 40 refer to integral housing ontology (or part to be deposited) in carrier Length direction on both ends cambered surface.In some embodiments, the bending angle γ 1 of the first cambered surface 50 is greater than the folding of the second cambered surface 40 Bent angle γ 2 (i.e. curvature of the curvature of the first cambered surface greater than the second cambered surface), wherein in the direction of the central axis of bracket On, it is the first cambered surface 50 close to the side of bracket, is the second cambered surface 40 close to the side of evaporation source.It should be noted that first The bending angle γ 1 of cambered surface refers to maximum angle between the plane 10 of integral housing and the tangent line of the first cambered surface, the second cambered surface Bending angle γ 2 refer to maximum angle between the plane 10 of integral housing and the tangent line of the second cambered surface.
Further, referring to Fig. 7 (bracket 200 is not shown in the figure), when part to be deposited is integrated sandwich type element ontology, in order to Guarantee the anti-dropping capability of mobile phone, the bending between the second cambered surface 40 of integral housing ontology and the plane 10 of integral housing Angle is smaller or even the bending angle of the second cambered surface can be 0 °, i.e. the second cambered surface is planar structure, and arc inboard portion is not vulnerable to arc side Block, and the bending angle between the first cambered surface 50 of integral housing ontology and the plane 10 of integral housing ontology is larger, 20 parts blocking vulnerable to arc side on the inside of its arc, so the thickness of the film plating layer in order to guarantee integral housing ontology is consistent Property, on the direction of the central axis Z1 of bracket, the first cambered surface 50 of integral housing ontology is arranged close to bracket, and in order to Guarantee the film plating layer of the arc inside 20 of the first cambered surface 50 of integral housing ontology and 10 part of plane of integral housing ontology The uniformity of thickness, predetermined angle α between the central axis Z1 and carrier 400 of bracket are 45 °~60 °, such as 45 °, 48 °, 50 °, 52 °, 54 °, 56 °, 58 ° or 60 °, that is to say, that carrier in the longitudinal direction with the horizontal plane (center with bracket The plane of axis perpendicular) between angle β be 30 °~45 ° (the sum of α and β are 90 °).As a result, in the range of above-mentioned angle It is interior, it is ensured that plate membrane substance between the plane of integral housing ontology on the inside of the arc of the first cambered surface of integral housing ontology Deposition rate it is almost the same, and then reduce integral housing ontology the first cambered surface arc on the inside of with integral housing ontology The difference in thickness of film plating layer in plane.
Further, referring to Fig. 8 (bracket 200 and integral housing 100 is not shown in the figure), carrier 400 has phase Pair first end 410 and second end 420, first end 410 is fixed on bracket 200, and second end 420 is free end, and described On the direction of the central axis of bracket, the vertical range H1 between second end 420 and evaporation source 300 is greater than first end 410 and steams The vertical range H2 to rise between 300, i.e. the first cambered surface 50 of integral housing are arranged close to second end, and second end 420 can be The side of the central axis Z1 of bracket is swung up.As a result, with the swing of second end, integral housing ontology is also in bracket The side of mandrel line Z1 is swung up, and plating membrane substance can be further improved during swing in the arc of the first cambered surface The consistency of deposition rate in the plane of side and integral housing ontology preferably reduces the first arc of integral housing ontology The arc inside in face and the difference of film plating layer thickness in the plane of integral housing ontology.It should be noted that the swing of second end Revolution and rotation with mentioned-above carrier are three mutually independent sports systems.
Wherein, referring to Fig. 8, the angle that second end is swung is 3 °~5 °, such as 3 °, 4 ° or 5 °, wherein the angle of swing is Refer to that the full swing range of carrier, that is, the angle swung are equal to the angle between the length direction and horizontal plane of carrier most Big value β 1 subtracts the minimum value β 3 of the angle between the length direction of carrier and horizontal plane, for example the angle swung is 3 °, then The maximum value β 1 of angle between the length direction and horizontal plane of carrier is (+1.5 ° of β), the length direction and level of carrier The minimum value β 3 of angle between face is (β -1.5 °).As a result, in the hunting range, plated film object not only can be preferably improved The consistency of deposition rate of the matter on the inside of the arc of the first cambered surface and in the plane of integral housing ontology;If the angle swung is small In 3 °, then the difference in thickness on the inside of the arc of the first cambered surface and in the plane of integral housing ontology between film plating layer is relatively large; If the angle swung is greater than 5 °, it is likely that cause on more plated film electrodeposition substance to carrier, and then reduce plating membrane substance Utilization rate.
In addition, the angular speed that second end is swung is greater than or equal to 10 radian per seconds, such as 10 radian per seconds, 15 radian per seconds, 20 Radian per second, 25 radian per seconds, 30 radian per seconds, 35 radian per seconds, 40 radian per seconds, 45 radian per seconds, 50 radian per seconds, 55 radians/ Second, 60 radian per seconds, 65 radian per seconds, 70 radian per seconds.Wherein, the angular speed that second end is swung is bigger, is more conducive to weaken one The difference of thickness between film plating layer on the inside of the arc of first cambered surface of sandwich type element ontology and in the plane of integral housing ontology, and In the range of above-mentioned angular speed, so that it may the arc inside of preferable the first cambered surface for weakening integral housing ontology and integral type The difference of thickness between film plating layer in the plane of enclosure body, but when angular speed is larger, may result in carrier shakiness Fixed and energy waste, so, in some embodiments of the present application, the angular speed that second end is swung is 20~60 radian per seconds.
According to an embodiment of the present application, for the ease of fixing part to be deposited, and prevent the particle deposition of evaporation source to The back side (one side opposite with the face to be deposited of part to be deposited) of part is deposited, (is with integral housing 100 in figure referring to Fig. 9 Example), vacuum evaporation equipment further include: at least one unplated piece jig 500, unplated piece jig 500 are arranged on carrier 400. Part to be deposited can be stably fixed on carrier as a result, moreover, unplated piece jig is matched with the shape of part to be deposited, into And it can prevent plated film electrodeposition substance from influencing the appearance of part to be deposited at the back side of part to be deposited.
According to an embodiment of the present application, referring to Fig.1 0, the shape of carrier 400 be it is cylindric, be arranged on carrier 400 more A unplated piece jig 500, unplated piece jig 500 are arranged on the outer peripheral surface of carrier 400.Thus, it is possible to be completed at the same time multiple The vacuum evaporation process of part to be deposited is conducive to industrial volume production;Moreover, columned carrier can make multiple parts to be deposited On plating membrane substance deposition rate it is consistent, and then weaken the difference in thickness between the film plating layer on multiple parts to be deposited.
According to an embodiment of the present application, using above-mentioned vacuum evaporation equipment to preparing film plating layer, film plating layer on part to be deposited On each point between consistency of thickness, the color difference problem of part appearance color to be deposited can be weakened.It should be noted that due to setting Standby itself error and inevitable factor, the thickness of film plating layer are extremely difficult to complete uniformity, and institute in the application " consistency of thickness " stated refers to that the difference between the thickness on film plating layer at any two points is not more than the average thickness of film plating layer 5%, in such disparity range, the color difference on part apparent visual to be deposited can be weakened significantly, and then promote part to be deposited The homogeneity of appearance color, referring to Fig.1 1, by with the integral housing comparison in Fig. 4 as it can be seen that using the application Vacuum Deposition The color uniformity of the appearance of the integral housing of film device preparation, no color differnece.
In further aspect of the application, it is made into one the side of sandwich type element this application provides a kind of using vacuum vapour deposition Method.According to an embodiment of the present application, referring to Fig. 5, Fig. 6 and Figure 12, which comprises integral housing ontology 100 is fixed On carrier 400, making the face face to be deposited of integral housing ontology 100, (referring to figs. 1 to Fig. 3, face to be deposited includes integral type Plane 10, arc inside 20 and the arc side 30 of enclosure body) to evaporation source 300, and make integral housing ontology 100 with carrier 400 simultaneously around bracket 200 central axis Z1 carry out revolution and the central axis Z2 on 400 length direction of carrier into Row revolution;Integral housing ontology 100 is deposited, to form film plating layer 110 in face to be deposited, obtains integral housing 1000;Wherein, bracket 200 can be rotated around the central axis Z1 of bracket;Evaporation source 300 is located at the central axis of bracket 200 Side on line direction, and be oppositely arranged with bracket 200;Carrier 400 is arranged on bracket 200, and in bracket 200 Mandrel line Z1 setting, and it is located at bracket 200 close to the side of evaporation source 300;The length direction of carrier 400 and the center of bracket There is predetermined angle α, carrier 400 can revolve and around carrying around the central axis Z1 of bracket simultaneously between axis Z1 Central axis Z2 on object length direction carries out rotation.As a result, in the above-mentioned integral housing using vacuum vapour deposition production Film plating layer thickness uniformity, in the process of revolution of carrier, integral housing ontology is also with carrier around bracket Central axis revolves, and the deposition rate of the plating membrane substance of the planar section of integral housing can be made to keep basic one It causes;In the process of the revolution of carrier, integral housing is also with carrier certainly then around the central axis Z2 of carrier It revolves, it is ensured that integral housing ontology is in a rotational direction on the inside of the edge and curved surface of the curved surface of the left and right sides The deposition rate for plating membrane substance is almost the same, so that at any two points of the film plating layer formed on integral housing ontology Thickness is almost the same, and then reduces or avoid the color color difference of integral housing appearance, and then promotes the market of integral housing Competitiveness.
According to an embodiment of the present application, referring to figs. 1 to Fig. 3, Fig. 5 to Fig. 7, integral housing ontology 100 is with carrier 400 revolution and revolve around the central axis Z1 of bracket, during the revolution, evaporation source 300 and integral type shell The distance between every bit in the plane 10 of body ontology 100 is almost the same, and then can keep integral housing ontology 100 The deposition rate of the plating membrane substance of every bit in plane 10 is almost the same, final to guarantee the film plating layer of every bit in plane 10 Consistency of thickness, moreover, comparing the distance between evaporation source 300 and carrier 400, the difference in height between arc side 30 and plane 10 can To ignore, i.e., relative to evaporation source, the point on point to the distance and arc side 30 of evaporation source in plane 10 to evaporation source Distance is equal, so, during above-mentioned carrier is revolved around the central axis of bracket, it is believed that plane 10 and the deposition rate of plating membrane substance of the point in arc side 30 be almost the same, and then guarantee plated film in plane 10 and arc side 30 The thickness of layer is almost the same;During carrying out rotation around central axis on its length direction with carrier 400, one Sandwich type element ontology revolves around the central axis Z2 of carrier, and integral housing 100 is in the central axis for surrounding carrier When Z2 revolves, the blocking to arc inside 20 of arc side 30 can avoid, guarantee the deposition speed of the plating membrane substance of every bit on 20 on the inside of arc Rate can be consistent substantially, so, it is ensured that plane 10, arc side 30 and the carrier sense of rotation of integral housing ontology The deposition rate of the plating membrane substance of every bit on 20 on the inside of arc at left and right sides of upper integral housing ontology is almost the same, in turn So that in the plane 10 of integral housing ontology, arc side 30 and carrier sense of rotation at left and right sides of integral housing ontology The thickness of the film plating layer of every bit on 20 on the inside of arc is almost the same.
Wherein, carrier is 40~60 revs/min around the rate that revolves of central axis Z1 of bracket, such as 40 Rev/min, 42 revs/min, 44 revs/min, 46 revs/min, 48 revs/min, 50 revs/min, 52 revs/min, 54 revs/min Clock, 56 revs/min, 58 revs/min, 60 revs/min.As a result, under above-mentioned revolving speed, it can both guarantee integral housing ontology The uniformity of planar section and the coating film thickness of arc side part, but also vacuum coating equipment can be effectively ensured in plated film mistake Stability in journey;If revolving speed is lower than 40 revs/min, on integral housing ontology, the thickness uniformity of film plating layer is relatively Difference;If revolving speed is greater than 60 revs/min, since bracket rotation is very fast, causes the stability of bracket relatively poor, relatively hold Accident easily occurs.
Furthermore carrier is greater than or equal to 10 revs/min around the rate that the central axis Z2 of carrier carries out rotation, than As 10 revs/min, 15 revs/min, 20 revs/min, 25 revs/min, 30 revs/min, 35 revs/min, 40 revs/min, 45 turns/ Minute, 50 revs/min, 55 revs/min, 60 revs/min, 65 revs/min, 70 revs/min, 75 revs/min, 80 revs/min, 85 Rev/min, 90 revs/min, 95 revs/min, 100 revs/min.As a result, in the rotary course of high speed, it is possible to prevente effectively from arc While guaranteeing integral housing ontology the arc inside of two sides and the film plating layer of plane in a rotational direction to blocking on the inside of arc Consistency of thickness;If revolving speed is lower than 10 revs/min, since revolving speed is slower, integral housing ontology will lead in direction of rotation On two sides arc on the inside of it is relatively poor with the consistency of thickness of the film plating layer in plane, seriously affect integral housing ontology Appearance;Inventors have found that revolving speed is faster, is more conducive to avoid arc side to blocking on the inside of arc, guarantees integral housing sheet The consistency of film plating layer thickness on body, it is contemplated that the rotational stabilization of carrier, those skilled in the art can be according to reality Border demand sets the upper limit of carrier rotation revolving speed, such as less than or is equal to 100 revs/min.
As it can be seen in figures 5 and 6, as previously mentioned, 400 tiltable of carrier be arranged on bracket 200, the length direction of carrier There is predetermined angle α, in some of the application between (i.e. the central axis of carrier length direction) and the central axis of bracket In embodiment, referring to Fig. 6, on the direction close to the central axis of bracket, carrier is gradually tilted to evaporation source;In the application Other embodiments in, referring to Fig. 5, for the ease of more preferable, the further stability for promoting carrier and bracket, remote On direction from the central axis of bracket, carrier is gradually tilted to evaporation source, other opposite angled manners, which can So that the stability between bracket, carrier is more preferable.
Wherein, as shown in Fig. 3, Figures 5 and 6, inclined set-up mode can reduce the first cambered surface of integral housing ontology Arc on the inside of with plane on film plating layer thickness difference, it can weaken integral housing ontology the first cambered surface 50 and the second arc Difference 20 on the inside of the arc in face 40 (in Fig. 3 20 on the inside of corresponding arc) with film plating layer thickness in plane 10, wherein the first cambered surface 50 Refer to the cambered surface at integral housing ontology both ends on the length direction of carrier with the second cambered surface 40.In some embodiments, The bending angle γ 1 of first cambered surface 50 be greater than the second cambered surface 40 bending angle γ 2 (i.e. the curvature of the first cambered surface be greater than the second cambered surface Curvature), wherein on the direction of the central axis of bracket, close to bracket 200 side be the first cambered surface 50, close to steam Rise 300 side be the second cambered surface 40.It should be noted that the bending angle γ 1 of the first cambered surface refers to the flat of integral housing Maximum angle between face 10 and the tangent line of the first cambered surface, the bending angle γ 2 of the second cambered surface refer to the plane 10 of integral housing The maximum angle between the tangent line of the second cambered surface.
Further, referring to Fig. 7 (bracket 200 is not shown in the figure), in order to guarantee the anti-dropping capability of mobile phone, integral type shell Bending angle between second cambered surface 40 of body ontology and the plane 10 of integral housing is smaller or even the bending angle of the second cambered surface can It is 0 °, i.e. the second cambered surface is planar structure, arc inboard portion not blocking vulnerable to arc side, and the first of integral housing ontology Bending angle between cambered surface 50 and the plane of integral housing ontology 10 is larger, 20 parts blocking vulnerable to arc side on the inside of arc, So the consistency of the thickness of the film plating layer in order to guarantee integral housing ontology, on the direction of the central axis Z1 of bracket, First cambered surface 50 of integral housing ontology is arranged close to bracket, and the first cambered surface 50 in order to guarantee integral housing ontology Arc on the inside of 20 and integral housing ontology 10 part of plane film plating layer thickness uniformity, the central axis Z1 of bracket with Predetermined angle α between carrier 400 is 45 °~60 °, such as 45 °, 48 °, 50 °, 52 °, 54 °, 56 °, 58 ° or 60 °, also It is to say, the angle β between horizontal plane (the perpendicular plane with the central axis of bracket) is 30 ° to carrier in the longitudinal direction ~45 ° (the sum of α and β are 90 °).As a result, in the range of above-mentioned angle, it is ensured that the first cambered surface of integral housing ontology Arc on the inside of and the plane of integral housing ontology between plate membrane substance deposition rate it is almost the same, and then reduce integral type shell The arc inside of first cambered surface of body ontology and the difference in thickness of film plating layer in the plane of integral housing ontology.
Further, referring to Fig. 8 (bracket 200 and integral housing 100 is not shown in the figure), carrier 400 has phase Pair first end 410 and second end 420, first end 410 is fixed on bracket 200, and second end 420 is free end, and in bracket Central axis direction on, vertical range H1 between second end 420 and evaporation source 300 is greater than first end 410 and evaporation source Vertical range H2 between 300, at this point, the first cambered surface 50 of integral housing is arranged close to second end, second end 420 can propped up The side of the central axis Z1 of frame 200 is swung up, and makes integral housing ontology 100 as the swing of second end 420 is in bracket The side of central axis Z1 is swung up.As a result, with the swing of second end, integral housing ontology is also in the central axis of bracket The side of Z1 is swung up, and plating membrane substance can be further improved during swing on the inside of the arc of the first cambered surface and one The consistency of deposition rate in the plane of body sandwich type element ontology preferably reduces the arc of the first cambered surface of integral housing ontology The difference of film plating layer thickness in the plane of inside and integral housing ontology.It should be noted that swing and the front of second end The revolution and rotation of the carrier are three mutually independent sports systems.
Wherein, referring to Fig. 8, the angle that second end is swung is 3 °~5 °, such as 3 °, 4 ° or 5 °, wherein the angle of swing is Refer to that the full swing range of carrier, that is, the angle swung are equal to the angle between the length direction and horizontal plane of carrier most Big value β 1 subtracts the minimum value β 3 of the angle between the length direction of carrier and horizontal plane, for example the angle swung is 3 °, then The maximum value β 1 of angle between the length direction and horizontal plane of carrier is (+1.5 ° of β), the length direction and level of carrier The minimum value β 3 of angle between face is (β -1.5 °).As a result, in the hunting range, plated film object not only can be preferably improved The consistency of deposition rate of the matter on the inside of the arc of the first cambered surface and in the plane of integral housing ontology;If the angle swung is small In 3 °, then the difference in thickness on the inside of the arc of the first cambered surface and in the plane of integral housing ontology between film plating layer is relatively large; If the angle swung is greater than 5 °, it is likely that cause on more plated film electrodeposition substance to carrier, and then reduce plating membrane substance Utilization rate.
Further, the angular speed that second end is swung is greater than or equal to 10 radian per seconds, such as 10 radian per seconds, 15 radians/ Second, 20 radian per seconds, 25 radian per seconds, 30 radian per seconds, 35 radian per seconds, 40 radian per seconds, 45 radian per seconds, 50 radian per seconds, 55 arcs Degrees second, 60 radian per seconds, 65 radian per seconds, 70 radian per seconds.Wherein, the angular speed that second end is swung is bigger, is more conducive to weaken The difference of thickness between film plating layer on the inside of the arc of first cambered surface of integral housing ontology and in the plane of integral housing ontology It is different, and in the range of above-mentioned angular speed, so that it may on the inside of the arc of preferable the first cambered surface for weakening integral housing ontology and The difference of thickness between film plating layer in the plane of integral housing ontology, but when angular speed is larger, may result in carrying Object is unstable and the waste of energy, so, in some embodiments of the present application, the angular speed that second end is swung is 20~60 arcs Degrees second.
According to an embodiment of the present application, for the ease of fixing integral housing ontology, and prevent the particle of evaporation source heavy Product is at the back side (one side opposite with the face to be deposited of integral housing ontology) of integral housing ontology, and referring to Fig. 9, vacuum is steamed Coating apparatus further include: at least one unplated piece jig 500, unplated piece jig 500 are arranged on carrier 400.Integral type as a result, Enclosure body can be stably fixed on carrier, moreover, unplated piece jig is matched with the shape of integral housing ontology, into And it can prevent plated film electrodeposition substance from influencing the appearance of integral housing ontology at the back side of integral housing ontology.
According to an embodiment of the present application, referring to Fig.1 0, the shape of carrier 400 be it is cylindric, be arranged on carrier 400 more A unplated piece jig 500, unplated piece jig 500 are arranged on the outer peripheral surface of carrier 400.Thus, it is possible to be completed at the same time multiple The vacuum evaporation process of integral housing ontology is conducive to industrial volume production;Moreover, columned carrier can make multiple one The deposition rate of plating membrane substance on body sandwich type element ontology is consistent, so weaken the film plating layer on multiple integral housing ontologies it Between difference in thickness.
According to an embodiment of the present application, using above-mentioned vacuum evaporation equipment to preparing film plating layer, film plating layer on part to be deposited On each point between consistency of thickness, the color difference problem of integral housing ontology appearance color can be weakened.It should be noted that Due to equipment itself error and inevitable factor, the thickness of film plating layer is extremely difficult to complete uniformity, and this Shen Please described in " consistency of thickness " refer to that difference between the thickness on film plating layer at any two points being averaged no more than film plating layer The 5% of thickness can weaken the color difference on part apparent visual to be deposited in such disparity range significantly, so promoted to It is deposited the homogeneity of part appearance color, referring to Fig.1 1, by comparing with the integral housing in Fig. 4 as it can be seen that using the application's The color uniformity of the appearance of the integral housing of vacuum coating equipment preparation, no color differnece.
According to an embodiment of the present application, specific process parameter (such as temperature, vacuum degree when the application is to vacuum evaporation Deng) and the thickness of film plating layer there is no a particular/special requirement, those skilled in the art's flexible choice according to actual needs, herein not It is restricted requirement.Certainly, it will be understood by those skilled in the art that in the production method of the integral housing, in addition to noted earlier On integral housing ontology carry out vacuum coating formed film plating layer the step of, can also according to actual needs include production figure The isostructural step of pattern layer, ink layer, the appearance of integral housing is enriched with this.
In the another aspect of the application, this application provides a kind of integral housings.According to an embodiment of the present application, one Body sandwich type element is prepared by the method for the mentioned-above sandwich type element that is made into one.The integral housing as a result, The color no color differnece of appearance guarantees the homogeneity of integral housing appearance, makes it have the stronger market competitiveness.Ability Field technique personnel are appreciated that the integral housing has all features of method of the sandwich type element noted earlier that is made into one and excellent Point, this is no longer going to repeat them.
According to an embodiment of the present application, which is the method system by the mentioned-above sandwich type element that is made into one For what is obtained, wherein require and the formula noted earlier that is made into one bracket, carrier, the evaporation source etc. in vacuum evaporation equipment Requirement in shell is consistent, also no longer repeats one by one herein.
According to an embodiment of the present application, above-mentioned integral housing can be the rear cover of mobile phone, thus, it is possible to have mobile phone There is the appearance of mellow and full feel and uniform in color.
In the another aspect of the application, this application provides a kind of integral housings.According to an embodiment of the present application, join According to Figure 12, integral housing 1000 includes: integral housing ontology 100;And film plating layer 110, film plating layer 110 are arranged in integral type On the first surface of enclosure body 100, and the difference between the thickness on film plating layer 110 at any two points is not more than film plating layer The 5% of 110 average thickness.The color uniformity of the appearance of the integral housing as a result, no color differnece guarantee integral type The homogeneity of shell appearance makes it have the stronger market competitiveness.It should be noted that above-mentioned " first surface " is Refer to, is formed before film plating layer on integral housing ontology, the face to be deposited of integral housing ontology.
In some embodiments, referring to Fig.1 2, on the length direction of integral housing ontology 100, integral housing sheet Body 100 has the first cambered surface 50 and the second cambered surface 40 that are oppositely arranged, the bending angle γ 1 of the first cambered surface 50 and the second cambered surface 40 Bending angle γ 2 is equal and is all larger than 70 °, for example, for 71 °, 75 °, 80 °, 85 °, 90 °, 95 °, 100 °, 105 °, 110 °, 115 °, 120°,130°,140°,150°.Film plating layer thickness as a result, on integral housing ontology is more uniform, so that integral housing Appearance color uniformity, no color differnece guarantees the homogeneity of integral housing appearance, and integral housing length The first cambered surface and the second cambered surface on direction is symmetrical, and then promotes the apparent aesthetic feeling of integral housing.
In further embodiments, referring to Fig.1 3, on the length direction of integral housing ontology, integral housing ontology 100 have the first cambered surface 50 and the second cambered surface 40 that are oppositely arranged, the bending angle γ 1 of the first cambered surface 50 be greater than 70 ° (such as 71 °, 75 °, 80 °, 85 °, 90 °, 95 °, 100 °, 105 °, 110 °, 115 °, 120 °, 130 °, 140 °, 150 °), the bending of the second cambered surface 40 Angle γ 2 is less than or equal to 60 ° (such as 60 °, 50 °, 40 °, 30 °, 20 °, 10 °, 5 ° or 0 °).Vacuum before use as a result, Evaporated device is made into one sandwich type element or when production method noted earlier prepares integral housing, can preferably reduce second The difference in thickness of the film plating layer of film plating layer and other regions on the inside of the arc of cambered surface, and then it is whole thick preferably to promote film plating layer The homogeneity of degree, thus the homogeneity of the appearance color of stronger guarantee integral housing;Moreover, above-mentioned integral housing system When making mobile phone, the lower end that the second cambered surface can be arranged on mobile phone length direction (i.e. user's normal use mobile phone when mobile phone under End, integral housing do not constitute the midframe part of mobile phone lower end), so the second cambered surface of integral housing is not when mobile phone falls Ground can be contacted earliest, and then promotes the anti-dropping capability of mobile phone.It, can be with when especially the material of integral housing ontology is glass Preferably promote the anti-dropping capability of mobile phone.
It will be understood by those skilled in the art that film plating layer is formed on the first surface of integral housing ontology, so one Body sandwich type element and the shape of integral housing ontology are consistent, and the first cambered surface and the second cambered surface also constitute integral type shell simultaneously The first cambered surface and the second cambered surface of body.
According to an embodiment of the present application, which can pass through the method for the mentioned-above sandwich type element that is made into one It is prepared, wherein bracket, carrier, the evaporation source etc. in vacuum evaporation equipment are required to be made into one with noted earlier Requirement in sandwich type element is consistent, also no longer repeats one by one herein.
It should be noted that " integral housing " and " integral housing ontology " herein refers at least side at edge For the shell and enclosure body of curved surface (with certain curvature), as shown in Fig. 1, Fig. 4 and Figure 11.
In the another aspect of the application, this application provides a kind of electronic equipment.According to an embodiment of the present application, reference Figure 14, electronic equipment include: mentioned-above integral housing 1000;Display screen component 2000, display screen component 2000 and one Body sandwich type element 1000 is connected, and limits installation space between display screen component 2000 and integral housing 1000;And mainboard, institute Mainboard is stated to be arranged in installation space and be electrically connected with display screen component.The integral housing of the electronic equipment is outer as a result, The color no color differnece of sight guarantees integral housing appearance color homogeneity, and then promotes the market competitiveness of electronic equipment.Ability Field technique personnel are appreciated that the electronic equipment has all features and effect of integral housing noted earlier, herein no longer It repeats one by one.
According to an embodiment of the present application, there is no limit requirements, such as above-mentioned electronics to set for the specific type of above-mentioned electronic equipment The standby including but not limited to electronic equipments such as mobile phone, notebook, iPad, kindle.In some embodiments of the present application, referring to figure 12, above-mentioned electronic equipment is mobile phone, rear cover of the integral housing 1000 as mobile phone.
It will be understood by those skilled in the art that electronic equipment further includes conventional electrical in addition to mentioned-above housing unit Structure or component essential to equipment, take the mobile phone as an example, and in addition to above-mentioned integral housing, mobile phone further includes glass cover-plate, display Structure or component essential to the conventional cell phones such as panel, audio processing mould group, photograph mould group, touch screen.
In the description of the present application, it is to be understood that term " center ", " longitudinal direction ", " transverse direction ", " length ", " width ", " thickness ", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom" "inner", "outside", " up time The orientation or positional relationship of the instructions such as needle ", " counterclockwise ", " axial direction ", " radial direction ", " circumferential direction " be orientation based on the figure or Positional relationship is merely for convenience of description the application and simplifies description, rather than the device or element of indication or suggestion meaning must There must be specific orientation, be constructed and operated in a specific orientation, therefore should not be understood as the limitation to the application.
In this application unless specifically defined or limited otherwise, term " installation ", " connected ", " connection ", " fixation " etc. Term shall be understood in a broad sense, for example, it may be being fixedly connected, may be a detachable connection, or integral;It can be mechanical connect It connects, is also possible to be electrically connected;It can be directly connected, can also can be in two elements indirectly connected through an intermediary The interaction relationship of the connection in portion or two elements.It for the ordinary skill in the art, can be according to specific feelings Condition understands the concrete meaning of above-mentioned term in this application.
In the description of this specification, reference term " one embodiment ", " some embodiments ", " example ", " specifically show The description of example " or " some examples " etc. means specific features, structure, material or spy described in conjunction with this embodiment or example Point is contained at least one embodiment or example of the application.In the present specification, schematic expression of the above terms are not It must be directed to identical embodiment or example.Moreover, particular features, structures, materials, or characteristics described can be in office It can be combined in any suitable manner in one or more embodiment or examples.In addition, without conflicting with each other, the skill of this field Art personnel can tie the feature of different embodiments or examples described in this specification and different embodiments or examples It closes and combines.
Although embodiments herein has been shown and described above, it is to be understood that above-described embodiment is example Property, it should not be understood as the limitation to the application, those skilled in the art within the scope of application can be to above-mentioned Embodiment is changed, modifies, replacement and variant.

Claims (19)

1. a kind of vacuum evaporation equipment characterized by comprising
Bracket, the bracket can be rotated around the central axis of the bracket;
Evaporation source, the evaporation source is located at the side in the central axial direction of the bracket, and is oppositely arranged with the bracket; And
At least one carrier, at least one described carrier are arranged on the bracket, around the central axis of the bracket Setting, and it is located at the bracket close to the side of the evaporation source, for fixing part to be deposited, the length direction of the carrier There is predetermined angle between the central axis of the bracket, the carrier can carry out public around the central axis of the bracket Turn and the central axis on the carrier length direction carries out rotation.
2. vacuum evaporation equipment according to claim 1, which is characterized in that in the side of the central axis far from the bracket Upwards, the carrier is gradually tilted to the evaporation source.
3. vacuum evaporation equipment according to claim 1 or 2, which is characterized in that the carrier has opposite first End and second end, the first end is fixed on the bracket, and the second end is free end, and in the central axis of the bracket On the direction of line, the vertical range between the second end and the evaporation source is greater than between the first end and the evaporation source Vertical range, the second end can be swung up in the side of the central axis of the bracket.
4. vacuum evaporation equipment according to claim 1, which is characterized in that the predetermined angle is 45 °~60 °.
5. vacuum evaporation equipment according to claim 1, which is characterized in that the carrier surrounds the center of the bracket The rate that axis revolves is 40~60 revs/min.
6. vacuum evaporation equipment according to claim 1, which is characterized in that the carrier surrounds the carrier length The rate that central axis on direction carries out rotation is greater than or equal to 10 revs/min.
7. vacuum evaporation equipment according to claim 3, which is characterized in that the angle that the second end is swung is 3 °~ 5°。
8. vacuum evaporation equipment according to claim 3, which is characterized in that the angular speed that the second end is swung be greater than or Equal to 10 radian per seconds.
9. vacuum evaporation equipment according to claim 8, which is characterized in that the angular speed that the second end is swung is 20~ 60 radian per seconds.
10. vacuum evaporation equipment according to claim 1, which is characterized in that further include: at least one unplated piece jig, The unplated piece jig is arranged on the carrier.
11. equipment according to claim 10, which is characterized in that the shape of locating carrier is cylindric, the carrying Multiple unplated piece jigs are set on object, and the unplated piece jig is arranged on the outer peripheral surface of the carrier.
12. a kind of be made into one the method for sandwich type element using vacuum vapour deposition characterized by comprising
Integral housing ontology is fixed on carrier, makes the face to be deposited of the integral housing ontology towards evaporation source, And makes the integral housing ontology with the carrier while surrounding the central axis of bracket and revolve and around described Central axis on carrier length direction revolves;
The integral housing ontology is deposited, to form film plating layer in the face to be deposited, obtains the integral type Shell;
Wherein, the bracket can be rotated around the central axis of the bracket;The evaporation source is located in the bracket Side on heart axis direction, and be oppositely arranged with the bracket;The carrier setting on the bracket, and surrounds described The central axis of bracket is arranged, and is located at the bracket close to the side of the evaporation source;The length direction of the carrier with There is predetermined angle, the carrier can revolve around the central axis of bracket simultaneously between the central axis of the bracket Rotation is carried out with the central axis on the carrier length direction.
13. according to the method for claim 12, which is characterized in that on the length direction of the integral housing ontology, The integral housing ontology has the first cambered surface and the second cambered surface being oppositely arranged, and the bending angle of first cambered surface is greater than institute The bending angle for stating the second cambered surface, on the direction of the central axis of the bracket, first cambered surface is arranged close to the bracket.
14. according to the method for claim 13, which is characterized in that the carrier has opposite first end and second End, the first end is fixed on the bracket, and the second end is free end, and the direction of the central axis in the bracket On, vertical range between the second end and the evaporation source be greater than between the first end and the evaporation source it is vertical away from From the second end can be swung up in the side of the central axis of the bracket, and first cambered surface is set close to the second end It sets,
The method also includes:
It is swung up the side of central axis of the integral housing ontology with the swing of the second end in the bracket.
15. a kind of integral housing, which is characterized in that be prepared by method described in any one of claim 12~14 It arrives.
16. a kind of integral housing characterized by comprising
Integral housing ontology;And
Film plating layer, the film plating layer are arranged on the first surface of the integral housing ontology, and any on the film plating layer The difference between thickness at two o'clock is not more than the 5% of the average thickness of the film plating layer.
17. integral housing according to claim 16, which is characterized in that in the length side of the integral housing ontology Upwards, the integral housing ontology has the first cambered surface and the second cambered surface being oppositely arranged, the bending angle of first cambered surface It is equal with the bending angle of second cambered surface and be all larger than 70 °.
18. integral housing according to claim 16, which is characterized in that in the length side of the integral housing ontology Upwards, the integral housing ontology has the first cambered surface and the second cambered surface being oppositely arranged, the bending angle of first cambered surface Greater than 70 °, the bending angle of second cambered surface is less than or equal to 60 °.
19. a kind of electronic equipment characterized by comprising
Integral housing described in any one of claim 15~18;
Display screen component, the display screen component are connected with the integral housing, the display screen component and the integral type Installation space is limited between shell;And
Mainboard, the mainboard are arranged in the installation space and are electrically connected with the display screen component.
CN201910568125.7A 2019-06-27 2019-06-27 Integrated shell, manufacturing method thereof, electronic equipment and vacuum evaporation equipment Active CN110158037B (en)

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