CN115354283B

CN115354283B - Target pretreatment device

Info

Publication number: CN115354283B
Application number: CN202211219294.8A
Authority: CN
Inventors: 曹时义; 龚文安; 王俊锋
Original assignee: Guangdong Dingtai Hi Tech Co ltd
Current assignee: Guangdong Dingtai Hi Tech Co ltd
Priority date: 2022-09-30
Filing date: 2022-09-30
Publication date: 2023-08-29
Anticipated expiration: 2042-09-30
Also published as: CN115354283A

Abstract

The invention discloses a target pretreatment device, which comprises at least two groups of target practice devices symmetrically arranged, wherein each group of target practice devices comprises an anode cylinder, a vacuum chamber communicated with the anode cylinder and a door frame assembly for sealing the vacuum chamber; the target material is positioned at the inner side of the anode cylinder; the arc stabilizing device and the focusing device are arranged on the periphery of the anode cylinder, and the focusing device is positioned between the arc stabilizing device and the vacuum chamber; the vacuum chamber is of a structure with two open ends, one end of the vacuum chamber is connected with the second end of the anode cylinder, and the other end of the vacuum chamber is provided with a door frame assembly; the door frame assembly is detachably connected with the vacuum chamber, permanent magnet assemblies which are uniformly distributed are further arranged on the door frame assembly, and the permanent magnet assemblies are used for adjusting the magnetic field in each group of target practice devices. The solid material pretreatment device comprises at least two groups of target practice devices, so that the target washing of at least two groups of target materials can be performed simultaneously, and the target washing time can be effectively saved; each group of target practice device only comprises an anode cylinder, a vacuum chamber and a door frame assembly, and the structure is very small.

Description

Target pretreatment device

Technical Field

The invention relates to the field of arc coating equipment, in particular to a target pretreatment device and method.

Background

The existing bent pipe magnetic filtering technology is applied to production, the cathode magnetic field position and the target position are fixed, the adjustable range of parameters such as external electric and magnetic fields of the bent pipe is limited, and particularly for graphite targets, arc extinction frequently occurs, the stabilizing time is long, and the surface of the target is not beneficial to achieving the optimal state rapidly, so that the method is not beneficial to application and production.

Meanwhile, due to the quality difference of the target materials, other reasons and the like, the occurrence of abnormality is aggravated: if the arc is not started or unstable, the arc is not normally run, the side surface is ablated to form a large pit, the arc spot can not normally reach the surface, the stable ablation time tends to be long, the consumption is high, the target material is frequently replaced, and the like, so that a large amount of loss of production working hours and yield is caused, and the quality of the product does not reach the standard.

Disclosure of Invention

The invention aims to provide a target pretreatment device, which solves the problems of long consumption of stable target ablation time, large production time and large yield loss in the prior art.

In order to achieve the above purpose, the target pretreatment device provided by the invention comprises at least two groups of target practice devices which are symmetrically arranged, wherein each group of target practice devices comprises an anode cylinder, a vacuum chamber communicated with the anode cylinder and a door frame assembly for sealing the vacuum chamber; the target is positioned at the inner side of the anode cylinder; the arc stabilizing device and the focusing device are arranged on the periphery of the anode cylinder, the focusing device is positioned between the arc stabilizing device and the vacuum chamber, the arc stabilizing device is used for generating an arc stabilizing magnetic field in the anode cylinder, and the focusing device is used for generating a focusing magnetic field in the anode cylinder; the vacuum chamber is of a structure with two open ends, one end of the vacuum chamber is connected with the second end of the anode cylinder, and the other end of the vacuum chamber is provided with the door frame assembly; the door frame assembly is detachably connected with the vacuum chamber, permanent magnet assemblies which are uniformly distributed are further arranged on the door frame assembly, and the permanent magnet assemblies are used for adjusting the magnetic field in each group of target practice devices.

Preferably, a deposition baffle for particle deposition is further arranged on the door frame assembly, and the deposition baffle is positioned in the middle of the door frame assembly.

Preferably, the target preprocessing device further comprises an arc power supply, wherein the arc power supply is of a multi-channel structure and is electrically connected with the arc source structure on each group of target training devices.

Preferably, the target practice device is two sets of, including the first target practice device and the second target practice device of symmetry setting, first target practice device and second target practice device share one door frame subassembly and same permanent magnet assembly, the both sides of door frame subassembly all are equipped with the deposit baffle that is used for the particle deposition.

Preferably, the permanent magnet assembly comprises a plurality of permanent magnet units, each group of permanent magnet units comprises two symmetrically arranged permanent magnets, and the N pole and the S pole of the two permanent magnets are arranged in a NSSN structure or a SNNS structure in a combined mode.

Preferably, the first target practice device is provided with a first arc stabilizing device and a first focusing device, the second target practice device is provided with a second arc stabilizing device and a second focusing device, the directions of internal magnetic fields of the first arc stabilizing device and the first focusing device are the same, the first end of an anode cylinder facing the first target practice device is an N pole, the second end of the anode cylinder facing the second target practice device is an S pole, the directions of internal magnetic fields of the second arc stabilizing device and the second focusing device are the same, the first end of the anode cylinder facing the second target practice device is an N pole, the second end of the anode cylinder facing the second target practice device is an S pole, the magnetic field of the permanent magnet assembly in the height direction of the door frame is an NSSN structure or an SNNS structure, and the permanent magnet assembly is arranged in the middle of the height direction of the door frame.

Preferably, the first target practice device is provided with a first arc stabilizing device and a first focusing device, the second target practice device is provided with a second arc stabilizing device and a second focusing device, the directions of internal magnetic fields of the first arc stabilizing device and the first focusing device are the same, the first end of an anode cylinder facing the first target practice device is an S pole, the second end of the anode cylinder facing the second target practice device is an N pole, the directions of internal magnetic fields of the second arc stabilizing device and the second focusing device are the same, the first end of the anode cylinder facing the second target practice device is an S pole, the second end of the anode cylinder facing the second target practice device is an N pole, and the magnetic field of the permanent magnet assembly in the height direction of the door frame is an NSSN structure or an SNNS structure.

Preferably, a window is further arranged on the door frame assembly to communicate the first target practice device and the second target practice device.

Preferably, the end of the vacuum chamber connected with the anode cylinder is in a gradually expanding horn-shaped structure to the other end connected with the vacuum chamber and the door frame assembly.

Preferably, the target pretreatment device comprises four groups of target practice devices which are symmetrically arranged so as to pretreat four groups of targets simultaneously.

Compared with the prior art, the target pretreatment device comprises at least two groups of target practice devices, so that the target washing of at least two groups of targets can be performed simultaneously, the target washing time can be effectively saved, and the production efficiency is improved; each group of target practice device only comprises an anode cylinder, a vacuum chamber and a door frame component, and the structure is very small; the target pretreatment device can design the volume of the vacuum chamber, and can be used for new equipment development and process debugging through adjustment of various parameters; under the structure of the cavity, the current parameters can be flexibly adjusted, the magnetic field sizes of the arc stabilizing device, the focusing device and the permanent magnet are changed to obtain a stable magnetic field which is suitable for stable ablation of the target material, and the optimal target washing parameters are determined.

Drawings

FIG. 1 shows paramagnetic structures of a first target training device and a second target training device in a target pretreatment device according to an embodiment of the present invention.

Fig. 2 is a schematic view of a structure in which a deposition baffle and a window are located on a door frame assembly in a target pretreatment device according to an embodiment of the present invention.

FIG. 3 shows the inverse magnetic structures of the first and second target practice devices in the target pretreatment device according to the embodiment of the present invention.

Fig. 4 shows NSSN structures and SNNS structures of permanent magnet units in the target pretreatment device according to the embodiment of the present invention.

Fig. 5 shows NS and SN structures of a permanent magnet unit in a target pretreatment device according to an embodiment of the present invention.

FIG. 6 shows a cis-trans magnetic structure of a first target training device and a second target training device in another embodiment of a target pretreatment device according to the present invention.

FIG. 7 is a diagram showing the reverse-paramagnetic structure of a first target practice device and a second target practice device according to another embodiment of the target pretreatment device of the present invention.

Fig. 8 is a schematic structural diagram of four sets of target practice devices in the target pretreatment device according to the embodiment of the present invention.

Detailed Description

In order to describe the technical content, the constructional features and the effects achieved by the present invention in detail, the following description is made with reference to the embodiments in conjunction with the accompanying drawings.

As shown in fig. 1 to 6, the invention discloses a target pretreatment device, which comprises at least two groups of target practice devices symmetrically arranged, wherein each group of target practice devices comprises an anode cylinder 1, a vacuum chamber 2 communicated with the anode cylinder 1 and a door frame assembly 3 for sealing the vacuum chamber 2; the target 5 is positioned on the inner side of the anode cylinder 1; the arc stabilizing device and the focusing device are arranged on the periphery of the anode cylinder 1, the focusing device is positioned between the arc stabilizing device and the vacuum chamber 2, the arc stabilizing device is used for generating an arc stabilizing magnetic field in the anode cylinder 1 so that arc spots quickly move to a target surface and are stably ablated, and the focusing device is used for generating a focusing magnetic field in the anode cylinder 1 so as to promote more particles to get close to and migrate towards the middle of the anode cylinder pipeline. The vacuum chamber 2 is of a structure with two open ends, one end of the vacuum chamber 2 is connected with the anode cylinder 1, and the other end of the vacuum chamber 2 is provided with the door frame assembly 3; the door frame assembly 3 is detachably connected with the vacuum chamber 2, permanent magnet assemblies which are uniformly distributed are further arranged on the door frame assembly 3, and the permanent magnet assemblies are used for adjusting the magnetic field in each group of target practice devices.

Specifically, the door frame assembly 3 is connected with the vacuum chamber 2 in a sealing hinge manner, for example, a sealing ring is arranged at the joint to ensure the vacuum degree of the target pretreatment device after vacuumizing, and the door frame assembly 3 is detachably connected with the vacuum chamber 2 to clean the inner side of the vacuum target practice device; the anode cylinder 1 is provided with a sealed first end 101 and an open second end 102, the first end 101 of the anode cylinder 1 is provided with a target seat 4, one end of the vacuum chamber 2 is connected with the second end 102 of the anode cylinder 1, the focusing device is a focusing coil or a focusing permanent magnet, and the arc stabilizing device is an arc stabilizing coil or an arc stabilizing permanent magnet.

In the embodiment of the invention, the magnitude of the current which is introduced by the arc stabilizing device and the focusing device is regulated to enable magnetic lines of force to be vertical to the surface of the target 5 as much as possible and form an acute angle with the normal direction at the edge of the target 5, so that the constrained arc spots move on the target surface and are prevented from being ablated on the side surface of the target, and a stable magnetic field which is suitable for stable ablation of the target 5 is obtained; in general, because the positions and the magnetic fields of the arc stabilizing device and the focusing device outside the anode cylinder 1 are fixed, relatively fixed magnetic force lines and a composite magnetic field are generated, the positions and the angles of the magnetic force lines can be corrected through the permanent magnet assembly, and the optimal target washing parameters are determined. Of course, in some other embodiments, the permanent magnet assembly is not limited to being mounted on the door frame assembly 3, but may be mounted outside the housing of the vacuum chamber 2, as long as the position of the magnetic field adjustment is enabled.

The target pretreatment device comprises at least two groups of target practice devices, so that the target washing of at least two groups of targets 5 can be performed simultaneously, the target washing time can be effectively saved, and the production efficiency is improved; each group of target practice device only comprises an anode cylinder 1, a vacuum chamber 2 and a door frame assembly 3, and has a very small structure; the target pretreatment device can design the volume of the vacuum chamber 2, and can be used for new equipment development and process debugging through adjustment of various parameters; under the chamber structure, the current parameters can be flexibly adjusted, the magnetic field sizes of the arc stabilizing device, the focusing device and the permanent magnet are changed to obtain a stable magnetic field which is suitable for stable ablation of the target 5, and the optimal target washing parameters are determined.

In the embodiment of the present invention, as shown in fig. 2, a deposition baffle 6 for particle deposition is further disposed on the door frame assembly 3, where the deposition baffle 6 can quantify the particle deposition effect, and the deposition baffle 6 is located in the middle of the door frame assembly 3. Specifically, the deposition baffle 6 may be aluminum foil paper, stainless steel sheet, etc.; the side of the door frame assembly 3 facing the vacuum chamber 2 is provided with an upper slot and a lower slot corresponding to the deposition baffle 6, and the upper portion and the lower portion of the deposition baffle 6 are respectively inserted into the upper slot and the lower slot, so long as the edge of the deposition baffle 6 can be fixed, although in some other embodiments, the deposition baffle 6 can be fixed in other manners. By opening the door frame assembly 3, the deposition baffle plate 6 is taken out to observe the deposition condition of particles, and the deposition baffle plate 6 can be replaced or the inner side of the vacuum target practice device can be cleaned, so that the operation is simple and convenient.

In the embodiment of the invention, the target preprocessing device further comprises an arc power supply, wherein the arc power supply is of a multi-channel structure, and the arc power supply is electrically connected with the arc source structures on each group of target practice devices, namely, one arc power supply is simultaneously electrically connected with the arc source structures on a plurality of groups of target practice devices, so that the energy consumption and the cost are reduced. Of course, in some other embodiments, the arc power source may also be independently connected to the arc source structure on each set of target practice device by multiple single-channel power sources, or multiple sets of arc source structures may be connected in series by one single-channel power source, so as to reduce energy consumption and cost, where the arc source structures include the target 5 and the arc striking mechanism 7 (shown in fig. 1).

In the embodiment of the invention, when the focusing device is a focusing coil and the arc stabilizing device is an arc stabilizing coil, the target preprocessing device further comprises a coil power supply, wherein the coil power supply can be a single-channel or multi-channel output power supply, and the coil power supply is electrically connected with the focusing coil or the arc stabilizing coil on each group of target training devices. Specifically, the coil power supply connection mode can be that a plurality of single-channel power supplies are independently connected with the arc stabilizing coils or the focusing coils on each group of target practice devices; or a multi-channel power supply is connected with coils or focusing coils on a plurality of groups of target practice devices; and a single-channel power supply can be connected in series with a plurality of groups of identical arc stabilizing coils or focusing coils for working, so that the energy consumption and the cost are reduced.

In the embodiment of the present invention, as shown in fig. 1 to 3, the target practice devices are two groups, including a first target practice device 10 and a second target practice device 20 that are symmetrically disposed, where the first target practice device 10 and the second target practice device 20 share one door frame assembly 3 and the same permanent magnet assembly, and two sides of the door frame assembly 3 are provided with deposition baffles 6 for particle deposition. The two groups of target practice devices share one group of door frame components 3 and permanent magnet components, so that occupied space and cost can be effectively saved.

In the embodiment of the present invention, as shown in fig. 4, the permanent magnet assembly includes a plurality of permanent magnet units, each group of permanent magnet units includes two permanent magnets symmetrically arranged, and the N-pole and S-pole combination arrangement mode of the two permanent magnets is NSSN structure 111 or sns structure 112. The magnetic property of the permanent magnet can be effectively increased by combining the two permanent magnets to form the permanent magnet unit, and the adjusting capability of the permanent magnet assembly to the magnetic field in the target 5 pretreatment device is enhanced.

In the embodiment of the present invention, the first target practice device 10 has a first arc stabilizing device 81 and a first focusing device 91, the second target practice device 20 has a second arc stabilizing device 82 and a second focusing device 92, the directions of internal magnetic fields of the first arc stabilizing device 81 and the first focusing device 91 are the same and are toward the first end 101 of the anode cylinder 1 of the first target practice device 10 are N-pole, the second end 102 is S-pole, the directions of internal magnetic fields of the second arc stabilizing device 82 and the second focusing device 92 are the same and are toward the first end 101 of the anode cylinder 1 of the second target practice device 20 are N-pole, the second end 102 is S-pole, the magnetic field of the permanent magnet assembly in the height direction of the door frame is NSSN structure 111 or SNNS structure 112, and the permanent magnet assembly is disposed in the middle of the height direction of the door frame. Specifically, when the magnetic field of the permanent magnet assembly in the height direction of the door frame is NSSN structure 111, the magnetic fields in the first target training device 10 and the second target training device 20 form paramagnetic structures 12, as shown in fig. 1, the paramagnetic structures 12 may enable more particles ejected outward from the target 5 to strike the deposition baffle 6 to deposit a film, so as to further limit the movement of the particles to the side wall of the vacuum chamber 2; when the magnetic field of the permanent magnet assembly in the height direction of the door frame is the sns structure 112, the magnetic fields in the first target training device 10 and the second target training device 20 form a reverse magnetic structure 13, as shown in fig. 3, by adopting the reverse magnetic scheme, more particles ejected outwards from the target 5 can strike the side wall of the vacuum chamber 2, and the deposits deposited on the side wall, such as graphite ash, carbon film, etc., are bombarded by the ion beam, so as to be suitable for cleaning the chamber wall.

In this embodiment of the present invention, the first target practice device 10 and the second target practice device 20 may be the case where the first target practice device 10 has a first arc stabilizing device 81 and a first focusing device 91, the second target practice device 20 has a second arc stabilizing device 82 and a second focusing device 92, the internal magnetic fields of the first arc stabilizing device 81 and the first focusing device 91 have the same direction and face the first end 101 of the anode cylinder 1 of the first target practice device 10 to be the S pole, the second end 102 to be the N pole, the internal magnetic fields of the second arc stabilizing device 82 and the second focusing device 92 have the same direction and face the first end 101 of the anode cylinder 1 of the second target practice device 20 to be the S pole, the second end 102 to be the N pole, the magnetic field of the permanent magnet assembly in the height direction of the door frame is the nsstructure 111 or the SNNS structure 112, and the permanent magnet assembly is disposed in the middle of the height direction of the door frame. Specifically, when the magnetic field of the permanent magnet assembly in the height direction of the door frame is NSSN structure 111, the magnetic fields in the first target training device 10 and the second target training device 20 form a reverse magnetic structure 13, as shown in fig. 3; when the magnetic field of the permanent magnet assembly in the height direction of the door frame is the sns structure 112, the magnetic fields in the first target training device 10 and the second target training device 20 form a paramagnetic structure 12, as shown in fig. 1, the paramagnetic structure 12 may enable more particles to strike the deposition baffle 6, and further limit the movement of the particles to the side wall of the vacuum chamber 2.

In another specific implementation manner of the embodiment of the present invention, the first target practice device 10 has a first arc stabilizing device 81 and a first focusing device 91, the second target practice device 20 has a second arc stabilizing device 82 and a second focusing device 92, the directions of internal magnetic fields of the first arc stabilizing device 81 and the first focusing device 91 are the same and are toward the first end 101 of the anode cylinder 1 of the first target practice device 10 are N-poles, the second end 102 is S-poles, the directions of internal magnetic fields of the second arc stabilizing device 82 and the second focusing device 92 are the same and are toward the first end 101 of the anode cylinder 1 of the second target practice device 20 are S-poles, the second end 102 is N-poles, the magnetic field of the permanent magnet assembly in the height direction of the door frame is NSSN structure 111 or SNNS structure 112, and the permanent magnet assembly is arranged in the middle of the height direction of the door frame. Specifically, when the magnetic field of the permanent magnet assembly in the height direction of the door frame is NSSN structure 111, the magnetic fields in the first target practice device 10 and the second target practice device 20 form a cis-trans magnetic structure 14, as shown in fig. 6; when the magnetic field of the permanent magnet assembly in the height direction of the doorframe is the sns structure 112, the magnetic fields in the first and second exercise devices 10 and 20 constitute a reverse-paramagnetic structure 15, as shown in fig. 7. Similarly, when the first target practice device 10 has the first arc stabilizing device 81 and the first focusing device 91, the second target practice device 20 has the second arc stabilizing device 82 and the second focusing device 92, the internal magnetic fields of the first arc stabilizing device 81 and the first focusing device 91 are the same and face the first end 101 of the anode cylinder 1 of the first target practice device 10 to be the S pole, the second end 102 to be the N pole, the internal magnetic fields of the second arc stabilizing device 82 and the second focusing device 92 are the same and face the first end 101 of the anode cylinder 1 of the second target practice device 20 to be the N pole, the second end 102 to be the S pole, the magnetic field of the permanent magnet assembly in the height direction of the door frame is the NSSN structure 111 or the SNNS structure 112, and the permanent magnet assembly is arranged in the middle of the height direction of the door frame. Specifically, when the magnetic field of the permanent magnet assembly in the height direction of the door frame is NSSN structure 111, the magnetic fields in the first target practice device 10 and the second target practice device 20 form a reverse-paramagnetic structure 15, as shown in fig. 7; when the magnetic field of the permanent magnet assembly in the height direction of the door frame is the sns structure 112, the magnetic fields in the first and second exercise devices 10 and 20 constitute the cis-trans magnetic structure 14, as shown in fig. 6. The two asymmetric magnetic field schemes of the reverse-paramagnetic structure and the forward-reverse magnetic structure have wider adaptability, provide a combined basis for increasing the number of target smelting devices and the target smelting efficiency, and particularly in the multi-arc source design of coating equipment, the forward-reverse magnetic combination is favorable for improving the particle movement direction, thereby improving the uniformity of the coating product.

Of course, in the embodiment of the present invention, the permanent magnet unit may also have only one permanent magnet, as shown in fig. 5, and includes an NS structure 113 and an SN structure 114, and at this time, different types of magnetic field structures may be formed with the first arc stabilizing device 81, the first focusing device 91, the second arc stabilizing device 82, and the second focusing device 92 in the first target practice device 10 and the second target practice device 20, and the type of the specific permanent magnet assembly may be selected according to actual needs, so long as the type of the arc stabilizing device and the type of the focusing device only ensure that the magnetic field directions of the arc stabilizing device and the focusing device in the same target practice device remain the same, so as to ensure the target operation or ablation.

In the embodiment of the invention, the door frame assembly 3 is further provided with the window 31 to be communicated with the first target practice device 10 and the second target practice device 20, the first target practice device 10 and the second target practice device 20 can be communicated through the arrangement of the window, and when the target pretreatment device is vacuumized, the first target practice device 10 and the second target practice device 20 can be vacuumized simultaneously only by vacuumizing the first target practice device 10 or the second target practice device 20, so that the cost is effectively saved.

In the embodiment of the invention, as shown in fig. 1 or fig. 3, one end of the vacuum chamber 2 connected with the anode cylinder 1 is in a gradually expanding horn-shaped structure from the other end connected with the vacuum chamber 2 and the door frame assembly 3, and the horn-shaped structure can be matched with the arrangement of a magnetic field, so that the ion beam expansion movement is facilitated, the bombardment of dust particles is reduced, the dust particles are deposited on the side wall of the vacuum chamber 2, and the dust particles are deposited on the deposition baffle 6 on the door frame assembly 3 as much as possible, so that the cleaning of the vacuum chamber 2 is reduced.

In the embodiment of the present invention, as shown in fig. 8, the target 5 pretreatment device includes four sets of target practice devices symmetrically arranged to pretreat four sets of targets 5 simultaneously. At this time, the four sets of target practice devices can be target practice devices with identical structures, and the magnetic fields of the permanent magnets in the two symmetrical sets of target practice devices can be oppositely arranged, and the other structural arrangement is unchanged, so that the production efficiency can be further improved and the cost can be saved through the arrangement of the multiple sets of target materials 5.

In the embodiment of the invention, an arc striking mechanism 7 is further arranged in the anode barrel 1, an arc striking needle of the arc striking mechanism 7 contacts the target 5 to strike an arc, a shielding cover 41 is arranged on the target seat 4, and the shielding cover 41 extends towards two sides of the target seat 4 to shield the arc spots generated by the target 5 from moving towards the target seat 4. The cathode rod 42 penetrates through the first end 101 of the anode cylinder 1 and extends to the outer side of the anode cylinder 1, a cooling cavity is further formed in the target seat, a liquid inlet and a liquid outlet are formed in one end, located on the outer side of the anode cylinder 1, of the cathode rod 42, a liquid inlet cavity and a liquid outlet cavity are formed in the cathode rod 42, and the liquid inlet, the liquid inlet cavity, the cooling cavity, the liquid outlet cavity and the liquid outlet are communicated. The cooling liquid flows into the liquid inlet, flows through the liquid inlet channel, the cooling channel and the liquid outlet channel and flows out of the liquid outlet, so that the cathode rod 42, the target seat 4 and the target 5 are cooled, the service lives of the cathode rod 42, the target seat 4 and the target 5 are prolonged, and the shielding cover 41 is made of an insulating material and is used for preventing arc spots from being ablated to the target seat 4 and avoiding burning and melting of the cooling channel in the target seat 4.

In the embodiment of the present invention, as shown in fig. 1 or fig. 3, the first end 101 of the anode cylinder 1 is further provided with an air extracting device 103 that is communicated with the inner side of the anode cylinder 1, where the air extracting device 103 is, for example, an air extracting pump, and is used for extracting the air in the inner side of the vacuum chamber 2 to reach a vacuum degree below 0.05 Pa. When the target pretreatment device of the present invention comprises the first target practice device 10 and the second target practice device 20 which are communicated, the air extraction device 103 is only required to be arranged on the first target practice device 10 or the second target practice device 20.

In the embodiment of the present invention, as shown in fig. 1 or fig. 3, a working gas inlet 21 is further provided on the side wall of the vacuum chamber 2, so that the working gas may be argon gas, for example, after the vacuum chamber 2 is vacuumized. When the target pretreatment device of the present invention comprises the first target practice device 10 and the second target practice device 20 which are communicated, the working gas inlet 21 is only required to be arranged on the first target practice device 10 or the second target practice device 20.

When the target 5 pretreatment device provided by the embodiment of the invention works, the target seat 4 and the anode cylinder 1 are connected into a waterway, so that the target seat and the anode cylinder are kept in a cooled state of 20-30 ℃; starting an air extracting device 103, extracting air until the vacuum degree is below 0.05Pa, and introducing a proper amount of reaction gas from a working gas inlet 21 to ensure that the gas pressure is stabilized within the range of 0.1-0.5 Pa; starting the arc stabilizing device, the focusing device and the permanent magnet assembly to enable the magnetic force lines to form a stable magnetic field suitable for stable ablation of the target 5; mounting a deposition baffle 6 on the door frame assembly 3; the striking needle of the striking mechanism 7 contacts the target 5 to strike an arc, then the target is washed under the continuous output of the power supply, and the electromagnetic field is regulated by the permanent magnet assembly to obtain controllable plasma, so that the particle deposition tends to be stable to meet the production required state.

According to the invention, through the arrangement of the anode cylinder 1, the vacuum chamber 2 and the door frame assembly 3, the target pretreatment device is very small, so that the vacuumizing time is very short, and the vacuumizing and target washing time of a production machine can be greatly reduced; the invention solves the practical production problem by adjusting the relative position of the magnetic force lines of the target 5 and the electromagnetic field and changing the angle of the magnetic force lines penetrating the target surface. Under the chamber structure, current parameters can be flexibly adjusted, the magnetic fields of the arc stabilizing device, the focusing device and the permanent magnet assembly are changed to obtain a stable magnetic field which is suitable for stable ablation of the target 5, and the optimal target washing parameters are determined; under the vacuum condition, the target 5 ablates impurities and gas adsorbed on the surface can be released, and a near-fixed thread-shaped arc track is formed on the side edge of the target 5; when the target material 5 after ablation is installed into an arc source for use, the target material can be put into production by a vertical horse to stabilize the ablation; in addition, the target pretreatment device can be designed into different chamber volumes, and can be used for new equipment development and process debugging through adjustment of various parameters.

The foregoing disclosure is merely illustrative of the principles of the present invention, and thus, it is intended that the scope of the invention be limited thereto and not by this disclosure, but by the claims appended hereto.

Claims

1. The target pretreatment device is characterized by comprising at least two groups of target practice devices which are symmetrically arranged, wherein each group of target practice devices comprises an anode cylinder, a vacuum chamber communicated with the anode cylinder and a door frame assembly for sealing the vacuum chamber;

the target is positioned at the inner side of the anode cylinder; the arc stabilizing device and the focusing device are arranged on the periphery of the anode cylinder, the focusing device is positioned between the arc stabilizing device and the vacuum chamber, the arc stabilizing device is used for generating an arc stabilizing magnetic field in the anode cylinder, and the focusing device is used for generating a focusing magnetic field in the anode cylinder;

the vacuum chamber is of a structure with two open ends, one end of the vacuum chamber is connected with the second end of the anode cylinder, and the other end of the vacuum chamber is provided with the door frame assembly;

the door frame assembly is detachably connected with the vacuum chamber, permanent magnet assemblies which are uniformly distributed are further arranged on the door frame assembly, and the permanent magnet assemblies are used for adjusting the magnetic field in each group of target practice devices.

2. The target pretreatment device according to claim 1, wherein a deposition baffle for particle deposition is further provided on the door frame assembly, and the deposition baffle is located in the middle of the door frame assembly.

3. The target pretreatment device of claim 1, further comprising an arc power source, wherein the arc power source is of a multi-channel configuration and is electrically connected to the arc source configuration on each set of exercise target devices.

4. The target pretreatment device according to claim 2, wherein the target practice devices are two groups, and comprise a first target practice device and a second target practice device which are symmetrically arranged, wherein the first target practice device and the second target practice device share one door frame assembly and the same permanent magnet assembly, and both sides of the door frame assembly are provided with deposition baffles for particle deposition.

5. The target pretreatment device according to claim 4, wherein the permanent magnet assembly comprises a plurality of permanent magnet units, each group of permanent magnet units comprises two symmetrically arranged permanent magnets, and the N pole and the S pole of the two permanent magnets are arranged in a NSSN structure or an SNNS structure.

6. The target pretreatment device according to claim 5, wherein the first target practice device is provided with a first arc stabilizing device and a first focusing device, the second target practice device is provided with a second arc stabilizing device and a second focusing device, the directions of internal magnetic fields of the first arc stabilizing device and the first focusing device are the same, the first end of an anode cylinder facing the first target practice device is an N pole, the second end of the anode cylinder facing the second target practice device is an S pole, the directions of internal magnetic fields of the second arc stabilizing device and the second focusing device are the same, the first end of the anode cylinder facing the second target practice device is an N pole, the second end of the anode cylinder facing the second target practice device is an S pole, the magnetic field of the permanent magnet assembly in the height direction of the door frame is an NSSN structure or an NS structure, and the permanent magnet assembly is arranged in the middle of the height direction of the door frame.

7. The target pretreatment device according to claim 5, wherein the first target practice device is provided with a first arc stabilizing device and a first focusing device, the second target practice device is provided with a second arc stabilizing device and a second focusing device, the directions of internal magnetic fields of the first arc stabilizing device and the first focusing device are the same, the first end of an anode cylinder facing the first target practice device is an S pole, the second end of the anode cylinder facing the first target practice device is an N pole, the directions of internal magnetic fields of the second arc stabilizing device and the second focusing device are the same, the first end of the anode cylinder facing the second target practice device is an S pole, the second end of the anode cylinder facing the second target practice device is an N pole, the magnetic field of the permanent magnet assembly in the height direction of the door frame is an NSSN structure or an NS structure, and the permanent magnet assembly is arranged in the middle of the height direction of the door frame.

8. The target pretreatment device of claim 4, wherein a window is further provided in the door frame assembly to communicate the first target practice device and the second target practice device.

9. The target pretreatment device of claim 1, wherein the vacuum chamber has a flared configuration that gradually expands from one end of the vacuum chamber connected to the anode cylinder to the other end of the vacuum chamber connected to the door frame assembly.

10. The target pretreatment device of claim 1, wherein the target pretreatment device comprises four sets of exercise target devices symmetrically arranged to pretreat four sets of targets simultaneously.