CN103643213A - Auxiliary electric arc ion plating device for coupling rotary transverse magnetic field with axial magnetic field - Google Patents
Auxiliary electric arc ion plating device for coupling rotary transverse magnetic field with axial magnetic field Download PDFInfo
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Abstract
The invention belongs to the field of material surface modification and in particular relates to an auxiliary electric arc ion plating device for coupling a rotary transverse magnetic field with an axial magnetic field, wherein a work table and a target are arranged in a vacuum chamber of the device; the front side of the target is opposite to the work table; an axial magnetic field generation device which is arranged behind the target is sleeved on a flange or a support cylinder and insulating protection is arranged between the axial magnetic field generation device and the flange or the support cylinder; a rotary transverse magnetic field generation device which is arranged outside the vacuum chamber is sleeved on a flange or a support cylinder at the outer side of the target and insulation protection is arranged between the rotary transverse magnetic field generation device and the flange or the support cylinder; an axial magnetic field generation device which is arranged in a plasma transmission channel is sleeved on a flange or a support cylinder on the outer side of the vacuum chamber and insulation protection is arranged between the axial magnetic field generation device and the flange or the support cylinder. The movement of an arc spot is controlled by the rotary transverse magnetic field, so that the discharging manner of the arc spot is improved; the movement speed of the arc spot and the emission of large particles on the surface of the target are improved; meanwhile, the plasma transmission is restrained by the axial magnetic field; and the density and the utilization rate of the plasma are improved.
Description
Technical field
The invention belongs to material surface modifying field, be specially a kind of rotating transverse magnetic field coupling axial magnetic field assistant electric arc ion plating apparatus, in order to improve spots moving speed, reduce the transmitting of target material surface macrobead, improve sedimentation rate and the deposition uniformity of film.
Background technology
Arc ions is as industrial application one of physical vapor deposition (PVD) technology the most widely, because its ionization level is high, projectile energy is high, and diffraction is good, can realize the series of advantages such as low temperature depositing, arc ion plating (aip) is rapidly developed and obtains widespread use.But due to oarse-grained existence in arc ion plating, had a strong impact on the performance and used life of coating and film.Therefore the relevant influence on development that how to solve macrobead problem anticathode electric arc in cathode arc plating is very large, becomes and hinders the bottleneck problem that arc ion plating (aip) more gos deep into widespread use.And magnetic filtering technique is the method in plasma body transmitting procedure, macrobead being excluded, be etc. after symptom occurs, to be used for taking stopgap measures and the method for not effecting a permanent cure, be therefore a kind of method of passiveness.
Vacuum arc discharge is actually a series of arc event, and the motion of arc cathode spot and arc root has determined that the motion of whole electric arc, the order of adjacent arcs spot light and extinguish the motion that has formed arc spot.Although do not understand arc spot internal structure is also definite, in order to improve discharge process stability and deposition film quality, must reasonably control spots moving.And the gathering of arc spot and movement velocity are the major cause of cathode targets surface generation macrobead transmitting excessively slowly.Current arc ion plating (aip) is mainly to adopt to apply at target annex the motion that arc spot is controlled in magnetic field, to improve arc-over stability.
Chinese patent 200810010762.4 discloses a kind of new arc ion plating apparatus (arc ion plating apparatus that the rotating transverse magnetic field of multi-mode programmable modulation is controlled), by the rotating transverse magnetic field generating unit of a multi-mode programmable modulation is set near target, the rotating transverse magnetic field that utilizes this device to produce improves discharge type and the job stability of arc spot, reduces the oarse-grained transmitting of target material surface.Although utilize the film surface macrobead of this device deposition obviously to reduce, the deposition uniformity of different positions place film is still to be improved.Chinese patent 200710158829.4 discloses the deposition technique of arc ion plating that a kind of magnetic field strengthens, by two cover field generator for magnetic are set, a set of being positioned over after target, another is positioned in vacuum chamber, and the coupled magnetic field that the field generator for magnetic being coupled by two covers produces is assisted matrix is deposited.Utilize this technique that film surface macrobead is obviously reduced, thin film deposition homogeneity is also improved, but easily there is at arc plasma body space the high bake bringing in charge accumulation and film deposition process in the electromagnetic field coil arranging in vacuum chamber, its stability reduces greatly.Therefore should control spots moving by magnetic field and launch to reduce target material surface macrobead, still there is certain difficulty in the homogeneity solving again in plasma body transmitting procedure.
Summary of the invention
In order to overcome the above problems, the present invention aims to provide a kind of rotating transverse magnetic field coupling axial magnetic field assistant electric arc ion plating apparatus, in order to improve spots moving speed, reduces the transmitting of target material surface macrobead, improves sedimentation rate and the deposition uniformity of film.
To achieve these goals, technical scheme of the present invention is:
A rotating transverse magnetic field coupling axial magnetic field assistant electric arc ion plating apparatus, this arc ion plating apparatus is provided with target, rotating transverse magnetic field generating unit, the axial field generator for magnetic of two covers, vacuum chamber; Work stage, target are set in vacuum chamber, and target is positive relative with work stage; Rotating transverse magnetic field generating unit is positioned over outside vacuum chamber, be enclosed within on the flange or support cylinder in target outside, and between flange or support cylinder by insulation protection; Axial magnetic field generating unit is a set of to be positioned over after target, the solenoid being positioned over after target, consists of; Axial magnetic field generating unit is another set of to be placed on the flange or support cylinder in vacuum chamber outside of plasma body transmission path, by solenoid, formed, and between flange or support cylinder by insulation protection.
Described rotating transverse magnetic field coupling axial magnetic field assistant electric arc ion plating apparatus, rotating transverse magnetic field generating unit is for adopting the magnetic pole that differs certain homogeneous angular, interconnects to be uniformly distributed on same circumference, number of magnetic poles is 4n or 3n, n >=1, form a whole electromagnetic circuit skeleton, magnet coil is embedded in the slot gap between adjacent pole or is enclosed within on magnetic pole, adopting phase differential is that the three phase excitation that the two-phase of 90 ° or phase differential are 120 ° is sequentially powered, and in the space surrounding, produces adjustable rotating transverse magnetic field at magnetic pole.
Described rotating transverse magnetic field coupling axial magnetic field assistant electric arc ion plating apparatus, axial magnetic field generating unit is comprised of solenoid, or is comprised of single or two above permanent magnet combination yokes; Be placed in target axial magnetic field generating unit below and formed by solenoid, and nickel plating pure iron is set as iron core at solenoid flange or support cylinder axial centre.
Described rotating transverse magnetic field coupling axial magnetic field assistant electric arc ion plating apparatus, in rotating transverse magnetic field generating unit, the frequency of electric current regulates by frequency transformer, the size of voltage regulates by voltate regulator, in the space that magnetic pole surrounds, on target surface, generation speed is adjustable, intensity is adjustable rotating transverse magnetic field, speed is by magnetizing current frequency adjustment, and intensity is by magnetizing current size adjustment.
Described rotating transverse magnetic field coupling axial magnetic field assistant electric arc ion plating apparatus, rotating transverse magnetic field generating unit is that magnetic pole is evenly distributed on main body magnetic conduction passage, form a whole electromagnetic circuit skeleton, the skeleton that skeleton adopts the electrical pure iron of high permeability or the punching silicon steel sheet of stack to make; Magnet coil is embedded in the slot gap between adjacent pole or is enclosed within on magnetic pole, and the magnet coil identical with pole number is arranged on magnetic pole, and the shape in shape and magnetic field is identical, between magnet coil and skeleton by insulation protection.
Described rotating transverse magnetic field coupling axial magnetic field assistant electric arc ion plating apparatus, the rotating transverse magnetic field generating unit being placed in outside vacuum chamber is enclosed within on the flange or support cylinder in target outside, and between flange or support cylinder by insulation protection; The axial magnetic field generating unit that is placed in the vacuum chamber outside of plasma body transmission path is enclosed within flange or support cylinder, between flange or support cylinder and vacuum chamber by insulation protection.
Described rotating transverse magnetic field coupling axial magnetic field assistant electric arc ion plating apparatus, flange or support cylinder that flange or support cylinder adopt non-magnetic stainless steel to make, flange or support cylinder are hollow structure, the logical water coolant of described hollow structure carries out cooling; Coaxial between rotating transverse magnetic field generating unit, axial magnetic field generating unit and flange or support cylinder and target, the position of rotating transverse magnetic field generating unit in flange or support cylinder is adjustable.
Described rotating transverse magnetic field coupling axial magnetic field assistant electric arc ion plating apparatus, be positioned over the polarity of the magnetic field that polarity of the magnetic field that the axial magnetic field generating unit in vacuum chamber outside produces produces with axial magnetic field generating unit after being positioned over target identical, the magnitude of field intensity of its generation is passed through coil current size adjustment.
Core concept of the present invention is:
In order effectively to improve the transmitting of target material surface macrobead, electromagnetic field generator is set after target, utilize electromagnetic field to control the motion of arc spot, and arc spot is limited on target surface and is moved; In target side, rotating transverse magnetic field is set, improves the discharge type of arc spot, improve spots moving speed; Plasma body line from cathode targets jet surface out, adopt the interaction of magnetic field and plasma body, plasma line focuses on and constraint, to reduce the extent of damage of plasma body in transmitting procedure, to realize the homogeneity of plasma body to matrix surface thin film deposition.In addition, in order to strengthen the good combination of ion and matrix, at matrix surface, pulsed electrical field is set, at tube wall, applies pulsed negative bias positive ion is accelerated, to guarantee the good combination of film and matrix.
The invention has the beneficial effects as follows:
1, the present invention adopts the coupled magnetic field that three cover field generator for magnetic produce, and has reduced the oarse-grained transmitting of target material surface and the oarse-grained quantity of film surface, has improved film quality.Also solve the ununiformity of traditional technology applying plasma transmitting procedure simultaneously, improved sedimentation rate and the deposition uniformity of film.
2, in the present invention, be positioned over the movement velocity that arc spot can be controlled in magnetic field that field generator for magnetic below of target produces, improve the size of target surface transverse magnetic field components, arc spot is limited on target surface and is moved, reduce the oarse-grained transmitting of target material surface, and the form of passing through to change coil current is as alternating-current, can make the evenly operation on whole target surface of arc spot, improve target utilization.
3, in the present invention, be positioned over the rotating transverse magnetic field of the rotating transverse magnetic field generating unit generation of target side, can improve discharge type and the job stability of arc spot, control movement locus and the speed of arc spot, improve homogeneity and the target utilization of target etching, reduce the oarse-grained transmitting of target material surface.
4, in the present invention, be positioned over the field generator for magnetic in vacuum chamber outside, can from ejecting, target surface focus at plasma body constraint, reduce the plasma-deposited loss to vacuum-chamber wall, improve plasma density and spatial distribution homogeneity, and then improve film deposition rate and deposition uniformity.
5, in the present invention, the coupling in three cover magnetic fields is used, and can improve movement locus and the speed of arc spot, controls the spatial distribution of plasma body in transmitting procedure.The axial magnetic field size that is positioned over the field generator for magnetic generation in vacuum chamber outside by adjusting, can change density and the distribution of matrix place ion, improves film deposition rate and deposition uniformity, and then controls film quality and performance.
6, magnetron arc ion plating composite deposition technique of the present invention is engaged on matrix and applies pulsed bias use, can expand the regulation range of processing parameter, for preparing the film of different performance, provides safeguard.Meanwhile, can reach the requirement of preparing high-quality thin film by Optimizing Process Parameters.
Accompanying drawing explanation
Fig. 1 is the employing rotating transverse magnetic field of the present invention even axial magnetic field assistant electric arc ion plating apparatus that is coupled.In figure: 1 vacuum chamber, 2 plasma containment axial magnetic field generating unit support cylinder, 3 plasma containment axial magnetic field generating units, 4 targets, 5 striking pins, 6 bolts, 7 rotating transverse magnetic field generating units, 8 rotating transverse magnetic field support cylinder, 9 striking coils, 10 rising pipes, 11 water inlet pipes, 12 arc spot constraint axial magnetic field generating units, 13 arc spot constraint axial magnetic field generating unit support cylinder, 14 nickel plating pure iron, 15 pulsed bias power supplies, 16 workpiece, 17 work stage.
Fig. 2 is employing rotating transverse magnetic field Coupling Gradient axial magnetic field assistant electric arc ion plating apparatus of the present invention, and wherein gradient magnetic is comprised of two above solenoids, and magneticstrength is adjusted respectively, and its size reduces gradually along plasma body beam direction.In figure: 1 vacuum chamber, 2 plasma containment axial magnetic field generating unit support cylinder, 3 plasma containment axial magnetic field generating units, 4 targets, 5 striking pins, 6 bolts, 7 rotating transverse magnetic field generating units, 8 rotating transverse magnetic field support cylinder, 9 striking coils, 10 rising pipes, 11 water inlet pipes, 12 arc spot constraint axial magnetic field generating units, 13 arc spot constraint axial magnetic field generating unit support cylinder, 14 nickel plating pure iron, 15 pulsed bias power supplies, 16 workpiece, 17 work stage.
Fig. 3 is the rotating transverse magnetic field generating unit structural representation that embodiment 3 adopts three-phase six magnetic poles.
Fig. 4 (a)-(f) is the rotating transverse magnetic field generating unit that adopts of embodiment 3 transient distribution of magnetic field mimic diagram in the same time not in half current cycle, and t is the time, and T is current cycle.Wherein, (a) figure t=0; (b) figure
(c) figure
(d) figure
(e) figure
(f) figure
Fig. 5 is multipole (being generally 6n, n >=2) rotating transverse magnetic field generating unit schematic diagram that the frequency of employing in embodiment 4 three phase sine alternating-current identical and that phase place is different is controlled.Wherein, (a) figure is structural models figure (a figure upper part) and the three phase sine ac power waveform schematic diagram (a figure lower part) thereof that adopts the generation device of rotating magnetic field that the three phase sine alternating-current of 120 ° of phase differential controls.(b) figure is winding coil, is embedded in the slot gap shown in (a) figure.In figure, 18 yokes; 19 slots; 20 air gaps; 21 negative electrodes; 22 winding coils.
Fig. 6 is the rotating transverse magnetic field generating unit that adopts of embodiment 4 transient distribution of magnetic field mimic diagram in the same time not in half current cycle, and t is the time, and T is current cycle.Wherein, (a) figure t=0; (b) figure
(c) figure
(d) figure
(e) figure
(f) figure
Embodiment
Rotating transverse magnetic field coupling axial magnetic field assistant electric arc ion plating apparatus of the present invention is provided with target, rotating transverse magnetic field generating unit, the axial field generator for magnetic of two covers, vacuum chamber, and work stage, target are set in vacuum chamber, and target is positive relative with work stage; Rotating transverse magnetic field generating unit is positioned over outside vacuum chamber, is enclosed within on the flange or support cylinder in target outside, can produce rotating transverse magnetic field, and between flange or support cylinder by insulation protection; A set of axial magnetic field generating unit is positioned over after target, the solenoid being positioned over after target, consists of, and can produce arc spot constraint axial magnetic field; Another set of axial magnetic field generating unit is positioned on the flange or support cylinder in vacuum chamber outside of plasma body transmission path, solenoid, consists of, and can produce plasma containment axial magnetic field, and between flange or support cylinder by insulation protection.Thereby, by adopting arc spot confining magnetic field to control movement velocity and the movement locus of arc spot in arc ion plating process, to reduce the transmitting of target material surface macrobead; Using plasma confining magnetic field is with transmission and the plasma body line movement locus of confining plasma, to improve transmission efficiency, film deposition rate and the deposition uniformity of plasma body; Utilize electric field plasma to realize and accelerate directed flow, to improve film substrate bond strength, thereby realize plasma body in the object of workpiece surface depositing high-quality film.
Below by embodiment and accompanying drawing, the present invention is described in further detail.
An important feature of arc ion plating is exactly that the electric discharge of arc spot forms high-temperature area in its vicinity, can be radiated other position of vacuum chamber simultaneously, and be subject to the restriction in vacuum chamber space, target space is around also limited, therefore when carrying out the design of arc source, if thinking is confined to will be difficult to have breakthrough in space limited in vacuum chamber.Particularly for the rotating transverse magnetic field design of controlling spots moving, rotating transverse magnetic field generating unit is positioned over to target words around in vacuum chamber, can be subject to the restriction of size, material etc., although can obtain reasonable effect in the situation that of conditions permit, but for the required big area deposition of industrial production, during long term operation, can be restricted.Therefore,, in the face of application widely, need innovation and break through.
Fig. 1 is embodiment 1 for the employing rotating transverse magnetic field of the small size target invention even axial magnetic field assistant electric arc ion plating apparatus structural representation that is coupled, as can be seen from Fig., this arc ion plating apparatus mainly comprises: vacuum chamber 1, plasma containment axial magnetic field generating unit support cylinder 2, plasma containment axial magnetic field generating unit 3, target 4, striking pin 5, bolt 6, rotating transverse magnetic field generating unit 7, rotating transverse magnetic field support cylinder 8, striking coil 9, rising pipe 10, water inlet pipe 11, arc spot constraint axial magnetic field generating unit 12, arc spot constraint axial magnetic field generating unit support cylinder 13, nickel plating pure iron 14, pulsed bias power supply 15, workpiece 16, work stage 17 etc., concrete structure is as follows:
In the present embodiment, the magneticstrength that arc spot constraint axial magnetic field generating unit 12 produces is controlled at 20～60 Gausses, solenoid in rotating transverse magnetic field can indirect current, and the axial magnetic field producing with static arc spot constraint axial magnetic field generating unit 12 forms Dynamic Coupling magnetic field.Alternating-current form is half-sine wave or the direct current biasing choppy sea of low frequency adjustable (0.01～1kHz), and alternating voltage value is adjustable (0～50V), and bias current voltage amplitude is adjustable (0～15V).In the present invention, alternating-current generation power supply can adopt the synthetic random wave signal generator of numeral and power amplifier to form.Plasma containment axial magnetic field generating unit 3 adopts uniform magnetic field, and magneticstrength is controlled at 100～5000 Gausses.
This embodiment can effectively solve arc ion plating macrobead problem, transmission efficiency and the thin film deposition homogeneity of plasma body are provided simultaneously, and provide target utilization, make arc ion plating can prepare even function film of various high-performance protective films, widen the range of application of arc ion plating.
Fig. 2 is that embodiment 2 is for the employing rotating transverse magnetic field Coupling Gradient axial magnetic field assistant electric arc ion plating apparatus of small size target invention, wherein gradient magnetic is comprised of two above solenoids, magneticstrength is adjusted respectively, and its size reduces gradually along plasma body beam direction.As different from Example 1, what plasma containment axial magnetic field generating unit adopted is gradient magnetic to the present embodiment, and this gradient magnetic is comprised of two above solenoids, and the number of turn of solenoid reduces in gradient along with the increase with target distance.Under this condition, each solenoid can be composed in series a large coil, electric current while switching in coil in each solenoid is identical, but because the number of turn of different coils is different, thereby can produce the gradient magnetic changing along with solenoid change in location, the size of magneticstrength reduces gradually along with the increase with target distance.In plasma containment axial magnetic field, adopt cross section that gradient magnetic can meticulousr control plasma body transmission directly and transmission efficiency, be more conducive to realize the homogeneity of thin film deposition.
As different from Example 1, rotating transverse magnetic field generating unit in the present embodiment adopts the rotating transverse magnetic field generating unit of three-phase six magnetic poles, Fig. 3 is the rotating transverse magnetic field generating unit structural representation of three-phase six magnetic poles of the present embodiment employing, there are six magnetic poles (A, Y, C, X, B, Z) to be evenly distributed on the main body magnetic conduction passage of round sealed, form a whole electromagnetic circuit skeleton, the center of electromagnetic circuit skeleton is negative electrode.Rotating transverse magnetic field generating unit is also coaxial placement with target, and position can be reconciled, and forms effective rotatingfield region be advisable with target surface.The top end of each magnetic pole is straight flange or arc, points to symmetrically target material surface center.In rotating transverse magnetic field generating unit, have six coils to be arranged on respectively on six magnetic poles, between coil and skeleton by insulation protection.Relative magnetic pole and coil are one group, six magnetic poles and coil are divided into three groups, coil is on the same group connected into a galvanic circle, make the electric current of relative on the same group coil reverse, the magnetic field that polarization is contrary, series system is on the same group not the same, and namely the sense of current of relative coil is on the same group not reverse.Three groups of coils can adopt Y type or delta connection, and remaining three joints are adjustable by frequency, and amplitude is adjustable, phase differential is the three phase sine AC-powered of 120 °, and by reconciling, just can to obtain speed adjustable, the rotatingfield that intensity is adjustable.
Fig. 4 is the rotating transverse magnetic field generating unit that adopts in the present embodiment transient distribution of magnetic field mimic diagram in the same time not in half current cycle.Adopt 2 pole fields, magnetic field is along with the cycle variation of electric current is constantly being rotated.The distribution in magnetic field is more even, particularly at the center of rotating transverse magnetic field generating unit, the position of target, magnetic field configuration is almost constant, is evenly distributed.The rotatingfield that rotating transverse magnetic field generating unit in the present embodiment produces is parallel with target surface, form the uniform rotating transverse magnetic field that covers target surface, can study rotating transverse magnetic field to the impact of depositing operation and film performance or most of industrial circle for scientific research field.
The number of magnetic poles of rotating transverse magnetic field generating unit has a great impact the distributing homogeneity in magnetic field, and magnetic pole is more, distributes tightr even, and the rotatingfield of generation is also more even.Adopting phase differential is that the rotatingfield that produces of two-phase sinusoidal ac power supply that the three phase sine AC-powered of 120 ° is 90 ° than phase differential is even, phase differential is that the two-phase electricity of 90 ° needs single-phasely split phase (Scott Connection Transformer does not need, but cost is high), there is very large error, make the rotatingfield form of generation changeable, inhomogeneous.Phase differential is that the three phase sine alternating-current of 120 ° can directly be taken at electrical network, is distributed symmetrically, and has met the condition that produces Rotating with Uniform magnetic field.
Fig. 5 is multipole (being generally 6n, n >=2) rotating transverse magnetic field generating unit schematic diagram that the frequency that adopts in the present embodiment three phase sine alternating-current identical and that phase place is different is controlled.For the many situations of number of poles, the scheme that adopts winding around to be enclosed within on magnetic pole is infeasible, must adopt by the motor stator winding regularity of distribution and be embedded in slot 19 gaps between adjacent pole.
Fig. 5 (a) is structural models figure and the three phase sine ac power waveform schematic diagram thereof of the rotating transverse magnetic field generating unit controlled of the three phase sine alternating-current of 120 ° of the employing phase differential of this programme.Rotating transverse magnetic field generating unit is also coaxial placement with target, and position can regulate, and forms effective rotatingfield region be advisable with target surface.The skeleton of the rotating transverse magnetic field generating unit in the design embodiment has 24 magnetic poles and slot 19 gaps.Skeleton (yoke 18) generally adopts the siliconized plate jet-bedding that iron loss is little, magnetic property good, thickness is 0.35～0.5mm to be overrided to form, the surface of siliconized plate scribbles insullac, the internal circular surfaces punching of yoke 18 has equally distributed slot 19, winding coil 22(Fig. 5 (b)) embed in slot 19 gaps.Yoke 18 centers are negative electrode 21, between negative electrode 21 and the internal circular surfaces of yoke 18, are air gap 20, and slot 19 shapes have the forms such as opening, half opening or semi-closed port (being opening in figure).Winding diagram 5 (b) is embedded in the skeleton shown in Fig. 5 (a), and the form of winding inserting is a lot, and the layout in slot 19 gaps can adopt the layouts such as individual layer, bilayer or single two-layer hybrid; The mode of connection of winding overhang can adopt folded formula or ripple formula; The end shape of winding can adopt chain type, staggered form, concentric type or folded formula etc., and different rule modes can produce the rotatingfield of different numbers of poles (2,4,6,8 utmost point) and form.
Fig. 6 is the rotating transverse magnetic field generating unit of the present embodiment invention transient distribution of magnetic field mimic diagram in the same time not in half current cycle.Along with the variation of current cycle, in the space of skeleton, can produce very even, the constant rotatingfield of form.And because the design's rotating transverse magnetic field generating unit is coaxial with target, the magnetic field of generation covers completely and is parallel to whole target surface, namely this magnetic field is the rotating transverse magnetic field that is parallel to target surface that covers target surface uniformly completely.The rule that affects from different magnetic field on arc spot, transverse magnetic field can make arc spot do the reversing motion of contrary Ampere force, because the design's transverse magnetic field is in continuous rotation, and speed and intensity size can regulate, and therefore can make the spiral motion on whole target surface of arc spot.The speed of spots moving can be controlled by the speed of rotation in magnetic field and the size adjustment in magnetic field.The design has realized the etching motion of arc spot at whole target surface, has improved target etching homogeneity and utilization ratio.Meanwhile, effectively improve the discharge type of arc spot, if control properly, can realize new discharge type, effectively disperseed concentrating of electric discharge, reduced the oarse-grained transmitting of drop.
Embodiment result shows, the present invention controls the motion of arc spot by rotating transverse magnetic field, improve the discharge type of arc spot, improve spots moving speed and the oarse-grained transmitting of target material surface, by axial magnetic field confining plasma, transmit simultaneously, improve density and the utilization ratio of plasma body, for the preparation of high-quality ganoine thin film and function film, widen Application Areas and the scope of arc ion plating.
Claims (8)
1. a rotating transverse magnetic field coupling axial magnetic field assistant electric arc ion plating apparatus, is characterized in that, this arc ion plating apparatus is provided with target, rotating transverse magnetic field generating unit, the axial field generator for magnetic of two covers, vacuum chamber; Work stage, target are set in vacuum chamber, and target is positive relative with work stage; Rotating transverse magnetic field generating unit is positioned over outside vacuum chamber, be enclosed within on the flange or support cylinder in target outside, and between flange or support cylinder by insulation protection; Axial magnetic field generating unit is a set of to be positioned over after target, the solenoid being positioned over after target, consists of; Axial magnetic field generating unit is another set of to be placed on the flange or support cylinder in vacuum chamber outside of plasma body transmission path, by solenoid, formed, and between flange or support cylinder by insulation protection.
2. according to rotating transverse magnetic field coupling axial magnetic field assistant electric arc ion plating apparatus claimed in claim 1, it is characterized in that: rotating transverse magnetic field generating unit differs certain homogeneous angular for adopting, the magnetic pole interconnecting is uniformly distributed on same circumference, number of magnetic poles is 4n or 3n, n >=1, form a whole electromagnetic circuit skeleton, magnet coil is embedded in the slot gap between adjacent pole or is enclosed within on magnetic pole, adopting phase differential is that the three phase excitation that the two-phase of 90 ° or phase differential are 120 ° is sequentially powered, in the space surrounding at magnetic pole, produce adjustable rotating transverse magnetic field.
3. according to rotating transverse magnetic field coupling axial magnetic field assistant electric arc ion plating apparatus claimed in claim 1, it is characterized in that: axial magnetic field generating unit is comprised of solenoid, or formed by single or two above permanent magnet combination yokes; Be placed in target axial magnetic field generating unit below and formed by solenoid, and nickel plating pure iron is set as iron core at solenoid flange or support cylinder axial centre.
4. according to rotating transverse magnetic field coupling axial magnetic field assistant electric arc ion plating apparatus claimed in claim 2, it is characterized in that: in rotating transverse magnetic field generating unit, the frequency of electric current regulates by frequency transformer, the size of voltage regulates by voltate regulator, in the space that magnetic pole surrounds, on target surface, generation speed is adjustable, intensity is adjustable rotating transverse magnetic field, speed is by magnetizing current frequency adjustment, and intensity is by magnetizing current size adjustment.
5. according to rotating transverse magnetic field coupling axial magnetic field assistant electric arc ion plating apparatus claimed in claim 2, it is characterized in that: rotating transverse magnetic field generating unit is that magnetic pole is evenly distributed on main body magnetic conduction passage, form a whole electromagnetic circuit skeleton, the skeleton that skeleton adopts the electrical pure iron of high permeability or the punching silicon steel sheet of stack to make; Magnet coil is embedded in the slot gap between adjacent pole or is enclosed within on magnetic pole, and the magnet coil identical with pole number is arranged on magnetic pole, and the shape in shape and magnetic field is identical, between magnet coil and skeleton by insulation protection.
6. according to rotating transverse magnetic field coupling axial magnetic field assistant electric arc ion plating apparatus claimed in claim 1, it is characterized in that: be placed on the flange or support cylinder that rotating transverse magnetic field generating unit outside vacuum chamber is enclosed within target outside, and between flange or support cylinder by insulation protection; The axial magnetic field generating unit that is placed in the vacuum chamber outside of plasma body transmission path is enclosed within flange or support cylinder, between flange or support cylinder and vacuum chamber by insulation protection.
7. according to rotating transverse magnetic field coupling axial magnetic field assistant electric arc ion plating apparatus claimed in claim 6, it is characterized in that: flange or support cylinder that flange or support cylinder adopt non-magnetic stainless steel to make, flange or support cylinder are hollow structure, and the logical water coolant of described hollow structure carries out cooling; Coaxial between rotating transverse magnetic field generating unit, axial magnetic field generating unit and flange or support cylinder and target, the position of rotating transverse magnetic field generating unit in flange or support cylinder is adjustable.
8. according to rotating transverse magnetic field coupling axial magnetic field assistant electric arc ion plating apparatus claimed in claim 1, it is characterized in that: be positioned over the polarity of the magnetic field that polarity of the magnetic field that the axial magnetic field generating unit in vacuum chamber outside produces produces with axial magnetic field generating unit after being positioned over target identical, the magnitude of field intensity of its generation is passed through coil current size adjustment.
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| CN103952671A (en) * | 2014-04-29 | 2014-07-30 | 马鞍山多晶金属材料科技有限公司 | Multi-arc ion plated hard coating prepared by adopting frequency-modulation electromagnetic coil, and method |
| CN108728803A (en) * | 2018-08-13 | 2018-11-02 | 东莞市典雅五金制品有限公司 | A kind of axial field generator for magnetic of cycle pulse scanning |
| CN112002440A (en) * | 2020-10-14 | 2020-11-27 | 大连理工大学 | Device for replacing linear plasma source |
| CN113463039A (en) * | 2021-07-01 | 2021-10-01 | 安徽工业大学 | Coil electromagnetic extrusion type magnetic filtering device |
| CN115354283A (en) * | 2022-09-30 | 2022-11-18 | 广东鼎泰高科技术股份有限公司 | Target material pretreatment device |
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| CN103952671A (en) * | 2014-04-29 | 2014-07-30 | 马鞍山多晶金属材料科技有限公司 | Multi-arc ion plated hard coating prepared by adopting frequency-modulation electromagnetic coil, and method |
| CN108728803A (en) * | 2018-08-13 | 2018-11-02 | 东莞市典雅五金制品有限公司 | A kind of axial field generator for magnetic of cycle pulse scanning |
| CN112002440A (en) * | 2020-10-14 | 2020-11-27 | 大连理工大学 | Device for replacing linear plasma source |
| CN113463039A (en) * | 2021-07-01 | 2021-10-01 | 安徽工业大学 | Coil electromagnetic extrusion type magnetic filtering device |
| CN115354283A (en) * | 2022-09-30 | 2022-11-18 | 广东鼎泰高科技术股份有限公司 | Target material pretreatment device |
| CN115354283B (en) * | 2022-09-30 | 2023-08-29 | 广东鼎泰高科技术股份有限公司 | Target pretreatment device |
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