CN201158702Y - Dynamic magnetic controlled arc source device for improving electric arc ion plating deposition technique - Google Patents
Dynamic magnetic controlled arc source device for improving electric arc ion plating deposition technique Download PDFInfo
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- CN201158702Y CN201158702Y CNU2008200101515U CN200820010151U CN201158702Y CN 201158702 Y CN201158702 Y CN 201158702Y CN U2008200101515 U CNU2008200101515 U CN U2008200101515U CN 200820010151 U CN200820010151 U CN 200820010151U CN 201158702 Y CN201158702 Y CN 201158702Y
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Abstract
The utility model relates to a novel dynamic magnetic control arc source device for improving the arc ion plating deposition technique, belonging to the film making field. The dynamic magnetic control arc source device for improving the arc ion plating deposition technique is provided with a dynamic control magnetic field generating device, target material and a target material base, wherein the target material is arranged in the target material base, the dynamic control magnetic field generating device is composed of a main control magnetic field generating device and an auxiliary magnetic filed generating device, wherein the main control magnetic field generating device is arranged on the back of the target material, and is arranged on the same axis with the target material, and the auxiliary magnetic field generating device is sleeved on the periphery of the main control magnetic field generating device. The utility model forms an arch magnetic field which is dynamically distributed on the surface of the target material through the matching usage of the two magnetic field generating devices, and realizes the purposes of improving the discharging form of arc spots and working stability, controlling the motion trails of the arc spots, increasing the etching evenness of the target material and target material utilization, reducing the emission of the target large granular, thereby making the high quality films.
Description
Technical field
The utility model relates to the film preparation field, specifically a kind of dynamic magnetic control arc source apparatus that improves deposition technique of arc ion plating.
Background technology
Arc ion plating is one of most important technology in industrial plated film production and the scientific research, because its structure and technology are simple, ionization level height (70%-80%), the projectile energy height, diffraction is good, can realize series of advantages such as low temperature depositing, arc ion plating (aip) is rapidly developed and obtains widespread use, show very big economic benefit and prospects for commercial application.
Arc ion plating is based on the coating technique of gas discharge plasma physical vapor deposition principle.This technology relies on the localized hyperthermia of the arc spot that produces on the cathode targets surface in the vacuum film coating chamber, make cathode material flash evaporation and ionization as target, produce degree of ionization height and the big plasma body of ion energy, on workpiece, add negative potential, can under the lower condition of workpiece Heating temperature, plate the good various ganoine thin films of one deck hardness height, dense structure and associativity at workpiece surface.
The used arc source structure of arc ion plating is cold cathode arc source, the behavior of electric arc is moved about fast by cathode surface is many, highly Ming Liang cathode spot is controlled, and the motion of cathode spot has very big influence to the physical property of arc plasma and plated film characteristic subsequently.The Vacuum Arc light discharge is actually a series of arc event, because it recurs apace, to such an extent as to the impression of people's motion electric arc, the motion of cathode spot and arc root has determined whole electric Arc Motion, the order of adjacent arcs spot is lighted and is extinguished the motion that has constituted the arc spot.Although the process to arc spot internal structure does not also have definite understanding, in order better to improve the quality of deposit film and effectively to utilize target, improve discharge stability, must reasonably control the motion of arc spot.
Because the physical property of vacuum arc, adding electromagnetic field is the effective ways of control spots moving, the different magnetic field component is to the motion effects rule difference of arc spot, (transverse magnetic field when applying the magnetic field that is parallel to cathode target surface, magnetic induction density B is seen Fig. 1 (a)), arc spot is done the reversing motion (Retrograde motion) of contrary Ampere force, opposite (the I * B), see Fig. 1 (b) of the direction of direction of motion and electric current power just.The movement velocity of arc spot becomes parabolic relation with the intensity of transverse magnetic field, therefore can be used for improving the movement velocity of arc spot.(sharp magnetic field when magnetic field and cathode surface intersect at an angle θ, magnetic induction density B, see Fig. 1 (c)), then arc spot 17 drift motion (Robson drift) that in reversing motion, also superposes, the direction of drift motion is pointed to magnetic line of force and the folded acute angle theta of cathode target surface
BThe zone, acute angle rule that Here it is (Acute angle principle) is seen Fig. 1 (d); Among Fig. 1 (d), Φ
RRepresent the direction of spots moving and the angle between magnetic line of force and the target surface intersecting lens, θ
B≈ Φ
RThe acute angle rule can be used for the direction of motion of restriction arc spot, the position of the appearance of control arc spot on target surface, this rule to the control of spots moving, that the target etching gets homogeneity is extremely important.Above-mentioned rule is the basic law of magnetic field to the spots moving influence, also is the rule that Magnetic Field Design must be considered.
Near the magnetic field that applies the target in the present arc ion plating (aip) mainly contains under the small size cylindrical target and adds axial magnetic field, as CN89200444.4, US3,793,179, US3,625,878 etc., big planar target applies arch magnetic field, as CN1157335A, and the longitudinal restraint magnetic field of flooding whole target in the Russian arc source structure.Though near the magnetic field with a location shape that these apply target surface can be controlled the motion of arc spot at target surface effectively, but according to the motion effects rule of above-mentioned different magnetic field component to the arc spot, the athletic meeting of arc spot under axial magnetic field and arch magnetic field is limited on the target surface in the certain limit, etching can form tangible etching track at target surface for a long time, be unfavorable for that the target etching is even, caused the target waste.Though and the magnetic field structure in the Russian arc source can make the arc spot in whole target surface etching, effectively utilize target, whole arc source structure complexity, troublesome poeration, the special shape of target make the target processing difficulties, the cost height, and the target size is little, makes a low multiple use.Because the magnetic field of these control spots movings all is static, therefore be difficult to break through the restriction of influence each other.
Ramalingam is at patent WO8503954 and US4,673, a kind of dynamic Magnetic Field Design thinking has been proposed in 477, can realize the even etching of arc spot on large-area target simple in structure, this method is to change the distribution of magnetic field at target surface by permanent magnet in target mechanical rotation behind, thereby influences the arc spot in the etching position of target surface.But this method need increase by a cover complicated mechanical controlling organization, and relates to problems such as sealing, cooling, therefore is difficult to apply.But this dynamic Magnetic Field Design thinking is worth thinking and uses for reference.
The utility model content
The purpose of this utility model is to provide a kind of novel dynamic magnetic control arc source apparatus that improves deposition technique of arc ion plating, in order to discharge type and the job stability that improves the arc ion plating cathodic arc spot, the movement locus of control arc spot, improve target etching homogeneity and target utilization, reduce the oarse-grained emission of target, in order to prepare high-quality film.
To achieve these goals, the technical solution of the utility model is:
A kind of dynamic magnetic control arc source apparatus that improves deposition technique of arc ion plating, described dynamic magnetic control arc source apparatus is provided with dynamic controlling magnetic field generating unit, target, target base, target is installed on the target base, dynamically the controlling magnetic field generating unit is that master control field generator for magnetic and auxiliary magnetic field generating unit constitute, the master control field generator for magnetic is positioned over the target back, with the coaxial placement of target, the auxiliary magnetic field generating unit is enclosed within around the master control field generator for magnetic.
Described master control field generator for magnetic is that solenoid and yoke constitute, and yoke is made of the magnetic conductive cylinder of periphery and the conducting magnetic column at center, and the lower end of magnetic conductive cylinder and conducting magnetic column is connected by same magnetically permeable material or is made of one, yoke upper end maintenance opening; Solenoid is enclosed within on the magnetic post at yoke center, is positioned over magnetic conductive cylinder and position, conducting magnetic column intermediary space.
The solenoid in the described master control field generator for magnetic and the shape of yoke are circle or square, and the shape of magnetic conductive cylinder in the yoke and conducting magnetic column and coil is consistent, and the three is coaxial.
The internal diameter of the coil in the described master control field generator for magnetic is slightly larger than the diameter of conducting magnetic column, and external diameter is slightly less than the internal diameter of magnetic conductive cylinder, and the height of coil is lower than the height of yoke.
Solenoid in the described master control field generator for magnetic is wound on the coil rack by enameled wire, and coil is inside and outside by insulation protection, and yoke is made by the nickel plating pure iron or the other materials of high magnetic permeability.
Magnetic conductive cylinder in the described master control field generator for magnetic and conducting magnetic column top are flat or the inclined-plane are arranged; When magnetic conductive cylinder and conducting magnetic column top were the inclined-plane, the vertical inclined-plane of conducting magnetic column was the up-narrow and down-wide boss shape of rotational symmetry, vertical inclined-plane of magnetic conductive cylinder and the vertical inclined-plane of conducting magnetic column symmetry, and the inclined-plane of yoke is W shape.
Described auxiliary magnetic field generating unit is enclosed within the periphery of the magnetic conductive cylinder in the master control field generator for magnetic or the target foundation periphery of target base; coaxial with master control field generator for magnetic or target foundation; by insulation protection, the position of auxiliary magnetic field generating unit is adjustable between auxiliary magnetic field generating unit and master control field generator for magnetic or the target foundation.
Described auxiliary magnetic field generating unit shape is consistent with the master control field generator for magnetic, is made up of the solenoid of enameled wire coiling.
Coil in described master control field generator for magnetic and the auxiliary magnetic field generating unit is regulated separately or common the adjusting, logical between the two reversible circulation; By regulating the intensity of coil current size adjustment dynamic magnetic field in master control field generator for magnetic and the auxiliary magnetic field generating unit, the current forms of coil is direct current, interchange or pulse, can realize the multiple control modes to the arc spot.
Described target direct water-cooling or indirect water-cooling, the master control field generator for magnetic of direct water-cooling be placed between the target foundation cylinder in the water coolant or the outer target foundation cylinder of cooling-water duct between, the master control field generator for magnetic of indirect water-cooling is placed between the outer foundation cylinder of cooling-water duct.
Know-why of the present utility model is:
As shown in Figure 2, according to the influence rule of different magnetic field component to spots moving, if on target surface, form the arch magnetic field 15 of certain curvature, under certain magneticstrength, the arc spot can be constrained in the arch area, the place of the preferential etching of arc spot is that the target surface longitudinal magnetic field is zero, the position of transverse magnetic field maximum, just arcual vertex position, arc spot under this magnetic field configuration will constrain in this position be the center near regional movement, form narrow fixedly etching track 16.If can reasonably regulate the position of arch magnetic field at target surface, (longitudinal magnetic field is zero to change its summit, the transverse magnetic field maximum) position, it is moved on whole target surface dynamically, and no longer be that to be fixed on certain location constant, so the arc spot will be along with the dynamic change in magnetic field on whole target surface different positions occur, rather than be limited in specific zone, thereby realize the even etching of target, on target 1, form uniform etching track.
The dynamic controlling magnetic field of the utility model is made up of two groups of field generator for magnetic, master control field generator for magnetic and auxiliary magnetic field generating unit.The master control field generator for magnetic is positioned over target back and the coaxial placement of target, mainly in order to produce the arch magnetic field of bound arc spot range of movement.The auxiliary magnetic field generating unit is enclosed within around the master control field generator for magnetic, is mainly used in the position shape of regulating arch magnetic field, and magnetic field transverse component maximum value and longitudinal component are zero position on the change target surface, thereby regulate the etch areas of arc spot on target surface.Two groups of field generator for magnetic are used, on target surface, form the arch magnetic field of DYNAMIC DISTRIBUTION, reach the discharge type and the job stability that improve the arc spot, the movement locus of control arc spot, improve target etching homogeneity and target utilization, reduce the oarse-grained emission of target, in order to prepare the purpose of high-quality film.
The utlity model has following advantage:
1. the utility model is by the dynamic adjustable coupled magnetic field of master control field generator for magnetic and the generation of auxiliary magnetic field generating unit, realized dynamic control to spots moving, reach the discharge type and the job stability that improve the arc ion plating cathodic arc spot, the movement locus of control arc spot, improve target etching homogeneity and target utilization, reduce the oarse-grained emission of target, in order to prepare the purpose of high-quality film.
2. master control magnetic field leads to direct current in the utility model, and auxiliary magnetic field leads to multi-form and big or small reversible circulation, can realize the multiple control modes to the arc spot, adapts to different condition and needs.
3. the coupling of two groups of field generator for magnetic is used in the utility model, not only can change DISTRIBUTION OF MAGNETIC FIELD, the movement locus of control arc spot, the size that can regulate magnetic field simultaneously, the movement velocity of control arc spot.
4. two groups of field generator for magnetic are easy to adjust, simple to operate in the utility model, and only need change current ratio between the two just can realize the effective control to the arc spot, satisfy the requirement of hommization operation in industrial production and the scientific research.
5. coil in the master control field generator for magnetic and yoke are independently made in the utility model, and loading and unloading can be changed separately easily; Auxiliary magnetic field generating unit coil position is adjustable, also can change separately.
6. field generator for magnetic is made simply in the utility model, and regulation range is big, and cost is low, is easy to promote.
Description of drawings
Fig. 1 (a)-Fig. 1 (d) is the influence synoptic diagram of different magnetic field component to spots moving.Wherein, Fig. 1 (a) is for applying the transverse magnetic field that is parallel to cathode target surface; Fig. 1 (b) is the influence (reversing motion) of transverse magnetic field to the motion of arc spot; Fig. 1 (c) intersects sharp magnetic field at an angle for applying with cathode surface; Fig. 1 (d) is the influence (wedge angle rule) of sharp magnetic field to the motion of arc spot.
Fig. 2 is the characteristics of motion synoptic diagram of arc spot under the arch magnetic field.
Fig. 3 is the dynamic magnetic control arc source apparatus synoptic diagram that embodiment 1 improves deposition technique of arc ion plating.
Fig. 4 is embodiment 1 an auxiliary magnetic field generating unit coil and different " electric current * numbers of turn " of the master control field generator for magnetic coil position shape variation diagram than lower magnetic force line.
Fig. 5 is the arc ion plating arc source apparatus synoptic diagram that embodiment 2 can regulate the static-magnetic control.
Fig. 6 is the movement locus synoptic diagram of arc spot under the embodiment 2 different magnetic field conditions.
Fig. 7 is the dynamic magnetic control arc source apparatus synoptic diagram that embodiment 3 improves deposition technique of arc ion plating.
Fig. 8 (a)-Fig. 8 (b) is the movement locus synoptic diagram of arc spot under the embodiment 3 different magnetic field conditions; Wherein, Fig. 8 (a) is meant that the alternating-current of auxiliary magnetic field generating unit changes the spiral extension movement track of arc spot from small to large; Fig. 8 (b) is meant that the alternating-current of auxiliary magnetic field generating unit changes the screw-pinch movement locus of arc spot from big to small.
Fig. 9 (a)-Fig. 9 (d) is under the embodiment 1 different target thickness, different " electric current * number of turn " than the size distribution figure of following longitudinal magnetic field component, and zero position is the etching orbital position; Wherein, Fig. 9 (a) is meant that the thickness of target is 1cm; Fig. 9 (b) is meant that the thickness of target is 2cm; Fig. 9 (c) is meant that the thickness of target is 3cm; Fig. 9 (d) is meant that the thickness of target is 4cm.
Figure 10 (a)-Figure 10 (b) is that embodiment 1 same " electric current * number of turn " compares down, the transverse magnetic field components size distribution figure of different thickness target material surface; Wherein, Figure 10 (a) is that " electric current * number of turn " ratio is-0.5; Figure 10 (b) is meant that " electric current * number of turn " ratio is-1.5.
Figure 11 is that embodiment 1-embodiment 3 same " electric current * number of turn " compares down, the magnetic field configuration distribution plan of different magnetic yoke structure.
Figure 12 is the longitudinal magnetic field size distribution figure of embodiment 1-embodiment 3 same " electric current * number of turn " than same thickness target material surface under the different magnetic yoke structure.
Among the figure, 1 target; 2 target bases; 3 target foundation; 4 dead rings; 5 yokes; 6 master control field generator for magnetic coils; 7 water-ins; 8 water outlets; 9 striking coils; 10 striking pins; 11 auxiliary magnetic field generating unit coils; 12 shielding cases; 13 bolts; The 14 dynamic magnetic line of forces; 15 arch magnetic fields; 16 fixing etching tracks; 17 arc spots; The 18 static-magnetic line of forces; 19 conducting magnetic columns; 20 magnetic conductive cylinders; 21 insulating thins; The circular etching track of 22 change in location; 23 dynamic screw etching tracks.
Embodiment
The dynamic magnetic control arc source apparatus that improves deposition technique of arc ion plating of the present utility model mainly comprises dynamic controlling magnetic field generating unit, target, target base, and target is installed on the target base, and dynamically the primary structure of controlling magnetic field generating unit is as follows:
1. the utility model master control field generator for magnetic of being positioned over the target back is made of solenoid and yoke two portions.Yoke is made up of the magnetic conductive cylinder of periphery and the conducting magnetic column at center, and the lower end of magnetic conductive cylinder and conducting magnetic column is connected by same magnetically permeable material or is made of one, and the upper end keeps opening.Solenoid is enclosed within on the magnetic post at yoke center, is positioned over magnetic conductive cylinder and position, conducting magnetic column intermediary space.Size by the size of regulating winding electric current is regulated magnetic induction density changes polar direction by regulating sense of current.
2. the shape of solenoid in the utility model master control field generator for magnetic and yoke is circle or square, and the shape of magnetic conductive cylinder in the yoke and conducting magnetic column and coil is consistent, and the three is coaxial.
3. solenoid in the utility model master control field generator for magnetic and yoke is big or small unrestricted, makes according to concrete target.The internal diameter of coil is slightly larger than the diameter of conducting magnetic column, and external diameter is slightly less than the internal diameter of magnetic conductive cylinder, and the height of coil is lower than the height of yoke.The thickness of the magnetic conductive cylinder in the yoke approximately is half of conducting magnetic column diameter.
4. the solenoid in the utility model master control field generator for magnetic is wound on the coil rack by enameled wire, the model of enameled wire without limits, inside and outside the coil by insulation protection.Yoke is made by the nickel plating pure iron or the other materials of high magnetic permeability.
5. magnetic conductive cylinder in the utility model master control field generator for magnetic and conducting magnetic column top are flat or the inclined-plane of certain angle are arranged, the vertical inclined-plane of conducting magnetic column is an axisymmetric boss shape (up-narrow and down-wide), vertical inclined-plane of magnetic conductive cylinder and the vertical inclined-plane of conducting magnetic column symmetry, the inclined-plane of yoke is W shape, and the angle on inclined-plane is unrestricted.
6. the utility model auxiliary magnetic field generating unit is enclosed within the periphery of the magnetic conductive cylinder in the master control field generator for magnetic or the periphery of target foundation; coaxial with master control field generator for magnetic or target foundation, and between master control field generator for magnetic or the target foundation by insulation protection.
7. the utility model auxiliary magnetic field generating unit shape is consistent with the master control field generator for magnetic, and size is unrestricted, is made up of the solenoid of enameled wire coiling.The position of auxiliary magnetic field generating unit can be regulated, and changes the master control DISTRIBUTION OF MAGNETIC FIELD by the size of regulating electric current.
8. the coil in the utility model master control field generator for magnetic and the auxiliary magnetic field generating unit can be regulated separately or regulate jointly, logical between the two reversible circulation.In order to reach different effects, the current forms of solenoid can be a direct current, interchange or pulse, size of current can be regulated by voltage controller power source.
(1) master control magnetic field leads to the arch magnetic field of a certain size direct current formation fixed bit shape, the auxiliary magnetic field generating unit can lead to reverse direct current, by regulating the size of electric current, change different " electric current * number of turn " ratios between the two, thereby change the arch DISTRIBUTION OF MAGNETIC FIELD, reach the etching of arc spot at different positions.
(2) master control magnetic field leads to the arch magnetic field of a certain size direct current formation fixed bit shape, the auxiliary magnetic field generating unit can lead to the alternating-current (frequency can be regulated) of the reverse constant size variation of direction, thereby " electric current * number of turn " ratio is between the two changed continuously, and dynamically successive changes the motion of arc spot.
9. the utility model target direct water-cooling or indirect water-cooling, master control field generator for magnetic behind the target of direct water-cooling be placed between the target foundation cylinder in the water coolant or the outer target foundation cylinder of cooling-water duct between, master control field generator for magnetic behind the target of indirect water-cooling is placed between the outer foundation cylinder of cooling-water duct, the yoke that is placed on the master control magnetic field in the water coolant adopts the high-permeability material that is difficult for getting rusty to make, and perhaps carries out the nickel plating protection.Being placed on insulate between outer master control field generator for magnetic of cooling-water duct and the target base fixes.
10. adopt between the target of the utility model direct water-cooling and the target base to be threaded, can adopt between the target of indirect water-cooling and the target base to be threaded or other modes are fixed, such as rivet or bolting.
11. the utility model target base and target foundation and cooling-water duct adopt non-magnetic stainless steel to make, and between the field generator for magnetic by insulation protection.
Below by embodiment and accompanying drawing the utility model is described in further detail.
Embodiment 1:
Accompanying drawing 3 is dynamic magnetic control arc source apparatus synoptic diagram that embodiment 1 of the present utility model improves deposition technique of arc ion plating.
The dynamic magnetic control arc source apparatus that improves deposition technique of arc ion plating mainly comprises: target 1; Target base 2; Target foundation 3; Dead ring 4; Yoke 5; Master control field generator for magnetic coil 6; Water-in 7; Water outlet 8; Striking coil 9; Striking pin 10; Auxiliary magnetic field generating unit coil 11; Shielding case 12; Bolt 13; The dynamic magnetic line of force 14.Dead ring 4 is used for the insulation between target foundation 3 and the auxiliary magnetic field generating unit coil 11, master control field generator for magnetic coil 6 is enclosed within on the conducting magnetic column 19 in the yoke 5 and after being positioned over target 1 together, auxiliary magnetic field generating unit coil 11 is enclosed within outside target base 2 cylinders.Recirculated water circulates by water-in 7, water outlet 8, and target 1 is cooled off.Bolt 13 is used for fixing yoke 5 on the target base.Striking pin 10 is connected to the striking coil 9 outside the target base 2, and striking coil 9 drive striking pins 10 contact with target 1 and carry out striking.Shielding case 12 is installed on target 1 outside, and its effect is the bound arc spot, prevents that the arc spot from running arc to the target side; Master control field generator for magnetic coil 6 logical direct currents, the arch magnetic field that produces bound arc spot range of movement; The direct current or the alternating-current of auxiliary magnetic field generating unit coil 11 logical size variation, its magnetic field that changes are mainly used in the position shape of regulating arch magnetic field, and two kinds of magnetic field couplings produce the dynamic magnetic line of force 14.The motion of dynamic magnetic field constraint control arc spot produces the less plasma body of highdensity particle, in the effect deposit film forming of matrix negative bias.
Target 1 is the cylindric metallic target of diameter 200mm, and target base 2 is non-magnetic stainless steel.Adopt between target 1 and the target base 2 and be threaded direct water-cooling.Master control field generator for magnetic coil 6 is positioned between outer target foundation 3 cylinders of cooling-water duct, and protects by dead ring 4 (insulation light wall pipe) between the target foundation 3.Yoke 5 in the master control field generator for magnetic and master control field generator for magnetic coil 6 all are cylindric, yoke 5 center conducting magnetic columns 19 diameter 30mm, magnetic conductive cylinder 20 external diameter 130mm, internal diameter 100mm.The lower end of magnetic conductive cylinder 20 and conducting magnetic column 19 is made of one, and the upper end is concordant, keeps opening, and yoke 5 is made by the nickel plating pure iron.Master control field generator for magnetic coil 6 is enclosed within on the conducting magnetic column 19 at yoke 5 centers, is positioned over magnetic conductive cylinder 20 and position, conducting magnetic column 19 intermediary space.The internal diameter of master control field generator for magnetic coil 6 is 35mm, external diameter 95mm, and height 35mm, the master control field generator for magnetic is protected by the insulating thin 21 that is enclosed within on the water-cooled tube of bottom, is fixed on the target base 2 by bolt 13.
The auxiliary magnetic field generating unit is enclosed within outside target base 2 cylinders, and protects by dead ring 4 (insulation light wall pipe) between the target foundation 3, auxiliary magnetic field generating unit coil 11 external diameter 220mm, internal diameter 170mm, height 40mm.The position of auxiliary magnetic field generating unit can be regulated.Used auxiliary magnetic field generating unit coil 11 adopts line directly to be made for the QZY-2 enameled wire of 1.25mm is wrapped on the coil rack.
In this example, coil in master control field generator for magnetic and the auxiliary magnetic field generating unit is regulated separately by voltage controller power source, the direct current of the logical 2A of master control field generator for magnetic coil forms the arch magnetic field of fixed bit shape on target surface, auxiliary magnetic field generating unit coil leads to reverse direct current or alternating-current, the size that changes electric current can change different " electric current * number of turn " ratios between the two, thereby change the arch DISTRIBUTION OF MAGNETIC FIELD, reach the etching of arc spot at different positions.Accompanying drawing 4 is embodiment 1 auxiliary magnetic field generating unit coils and different " electric current * numbers of turn " of the master control field generator for magnetic coil position shape variation diagram than lower magnetic force line.As can be seen, increase (0.5A, 1A, 1.5A along with the auxiliary magnetic field reversible circulation, 2A), the arch magnetic field configuration changes, and its summit (longitudinal magnetic field is zero, the transverse magnetic field maximum) constantly moves to target center from the target edge in the position of target surface, and no longer be that to be fixed on certain location constant, so the arc spot will be along with the dynamic change in magnetic field on whole target surface different positions occur, rather than be limited in specific zone, thereby realize the even etching of target.Dynamic magnetic line of force synoptic diagram among Fig. 4 has been represented the variation of arc spot etch areas, can change the movement velocity of arc spot by the size of regulating magneticstrength, and the movement velocity that improves the arc spot can reduce the particulate emission, improves the surface quality of deposit film.
Embodiment 2:
Accompanying drawing 5 is arc ion plating arc source apparatus synoptic diagram that embodiment 2 of the present utility model can regulate the static-magnetic control.Basic structure is identical with embodiment 1, different is the outside 15 ° ramp structure of the inboard employing in magnetic conductive cylinder 20 tops of yoke 5, conducting magnetic column 19 vertical inclined-planes are axisymmetric boss shape (up-narrow and down-wide), vertical inclined-plane of magnetic conductive cylinder and the vertical inclined-plane of conducting magnetic column symmetry, the inclined-plane of yoke is W shape.Master control field generator for magnetic coil 6 logical direct currents produce certain arch magnetic field; The direct current of auxiliary magnetic field generating unit coil 11 logical different sizes produces certain reversed magnetic field, and two kinds of magnetic field couplings produce the static-magnetic line of force 18 of change in location.
Coil in master control field generator for magnetic and the auxiliary magnetic field generating unit is regulated separately by voltage controller power source, the direct current of the logical 2A of master control field generator for magnetic coil forms the arch magnetic field of fixed bit shape on target surface, auxiliary magnetic field generating unit coil leads to reverse direct current, regulates the arch DISTRIBUTION OF MAGNETIC FIELD.After work for some time, change the size of auxiliary magnetic field generating unit coil current, thereby " electric current * number of turn " between change and master control field generator for magnetic coil ratio, change the arch DISTRIBUTION OF MAGNETIC FIELD, reach the etching of arc spot, avoid being etched in the fixed position for a long time the tangible etching track of formation on the target surface at different positions.Accompanying drawing 6 is variation synoptic diagram of the etching position of arc spot under the big or small direct current of the logical difference of auxiliary magnetic field generating unit coil.The etching track of arc spot be a circle under the different current values, the variation of the magnetic field configuration that causes along with the variation of electric current, the position of track can change (the circular etching track 22 that is change in location among Fig. 6).
Embodiment 3:
Accompanying drawing 7 is dynamic magnetic control arc source apparatus synoptic diagram that embodiment 3 of the present utility model improves deposition technique of arc ion plating.Basic structure is identical with embodiment 2, and different is the outside 30 ° ramp structure of the inboard employing in magnetic conductive cylinder 20 tops of yoke 5.
Coil in master control field generator for magnetic and the auxiliary magnetic field generating unit is regulated separately by voltage controller power source, the direct current of the logical 2A of master control field generator for magnetic coil forms the arch magnetic field of fixed bit shape on target surface, the logical reverse alternating-current of auxiliary magnetic field generating unit coil is regulated the arch DISTRIBUTION OF MAGNETIC FIELD, the size of alternating-current changes (0-2A) continuously, direction is constant, thereby " electric current * number of turn " ratio between successive change and the master control field generator for magnetic coil, change the arch DISTRIBUTION OF MAGNETIC FIELD, (longitudinal magnetic field is zero to make its summit, the transverse magnetic field maximum) constantly move continuously at target edge and target center the position on target surface, and no longer be that to be fixed on certain location constant, thereby make the arc spot along with the dynamic change in magnetic field on whole target surface different position occur, rather than be limited in specific zone, thereby realize the even etching of target and the variation of discharge type.Fig. 8 (a)-Fig. 8 (b) is the logical size variation of auxiliary magnetic field generating unit coil, the variation synoptic diagram of the etching position of arc spot under the constant alternating-current of direction.The arc spot will be along with the spiral etching track of continuously changing of magnetic field configuration (being the dynamic screw etching track 23 among Fig. 8 (a)-Fig. 8 (b)), constantly spiral expansion (Fig. 8 (a)) and contraction (Fig. 8 (b)), uniform etching target.
Embodiment 4: the requirement of target thickness
Dynamically control the motion of arc spot for the magnetic field of better utilised generation of the present utility model, reach the effect of effectively utilizing target.Embodiment 4 does the detail analysis explanation in conjunction with the finite element analog result to Distribution of Magnetic Field of the present utility model.This simulation is carried out at the apparatus structure among the embodiment 1, and this analysis is the same to the result that auxiliary magnetic field generating unit coil leads to reverse direct current and alternating-current.
Fig. 9 (a)-Fig. 9 (d) is among the embodiment 1 under the different target thickness, different " electric current * number of turn " than the size distribution figure of following longitudinal magnetic field component, and zero position is the etching orbital position.The thickness of target is respectively 1cm, 2cm, 3cm, 4cm.Under the same target thickness, the zero position of longitudinal magnetic field can change along with the variation of " electric current * number of turn " ratio, and the zero position of longitudinal magnetic field is the position of the preferential etching of arc spot, just the position of etching track.Along with the increase of the thickness of target, the zero position of longitudinal magnetic field is bigger with the variation of " electric current * number of turn " ratio, illustrates that target is thick more, and the etching area of arc spot is big more, helps the utilization of target more.But it is exactly the size of transverse magnetic field components that the control spots moving also has an important parameters, and transverse magnetic field can change the movement velocity of arc spot.Among Fig. 9 (a)-Fig. 9 (d), n
0I
0/ n
iI
iBe " electric current * number of turn " of auxiliary magnetic field generating unit coil ratio with " electric current * number of turn " of master control field generator for magnetic coil.
Figure 10 (a)-Figure 10 (b) is that embodiment 1 same " electric current * number of turn " compares down, the transverse magnetic field components size distribution figure of different thickness target material surface.As can be seen, the size of transverse magnetic field components is along with the increase decline of target thickness is very fast, and this effective etching and emission of raising arc spot speed minimizing particulate to target all is disadvantageous, so the thickness of target should not be too big.
In sum, the thickness of target must be controlled in certain scope, just can reach both big area etching raising target utilizations, and the movement velocity that improves the arc spot again reduces the net effect that the particle emission improves the film surface quality.Target thickness is that 2.5cm is the most suitable among the embodiment 1.
Embodiment 5: the influence of different magnetic yoke structure
Embodiment 1-embodiment 3 has adopted three kinds of different magnetic yoke structure respectively, and yoke position shape influence to magnetic field in field generator for magnetic is very big, therefore must take rational magnetic yoke structure.Below in conjunction with the finite element analogy result influence of different magnetic yoke structure is described.
Accompanying drawing 11 is that embodiment 1-embodiment 3 same " electric current * number of turn " compares down, the magnetic field configuration distribution plan of different magnetic yoke structure, and " electric current * number of turn " is than being-1.As can be seen, along with the variation of yoke apex structure, the position shape in magnetic field has certain variation.Yoke with certain ramp structure can reduce the curvature in arch magnetic field.Figure 12 is the longitudinal magnetic field size distribution figure of embodiment 1-embodiment 3 same " electric current * number of turn " than same thickness target material surface under the different magnetic yoke structure." V " shape distribution angle of longitudinal magnetic field is along with the variation of yoke apex structure changes to some extent as can be seen, and it is big to have longitudinal magnetic field " V " the shape distribution angle that the yoke of certain ramp structure produces.Reducing of arch magnetic field curvature, the degree of " V " shape angle of distribution enlarges, and for the magnetic field of DC adjustment, can widen the area of etching track, increases etching efficient.For exchanging the magnetic field of regulating, influence is little.
Claims (10)
1, a kind of dynamic magnetic control arc source apparatus that improves deposition technique of arc ion plating, it is characterized in that: described dynamic magnetic control arc source apparatus is provided with dynamic controlling magnetic field generating unit, target, target base, target is installed on the target base, dynamically the controlling magnetic field generating unit is that master control field generator for magnetic and auxiliary magnetic field generating unit constitute, the master control field generator for magnetic is positioned over the target back, with the coaxial placement of target, the auxiliary magnetic field generating unit is enclosed within around the master control field generator for magnetic.
2, according to the described dynamic magnetic control arc source apparatus that improves deposition technique of arc ion plating of claim 1, it is characterized in that: described master control field generator for magnetic is that solenoid and yoke constitute, yoke is made of the magnetic conductive cylinder of periphery and the conducting magnetic column at center, the lower end of magnetic conductive cylinder and conducting magnetic column is connected by same magnetically permeable material or is made of one, and the yoke upper end keeps opening; Solenoid is enclosed within on the magnetic post at yoke center, is positioned over magnetic conductive cylinder and position, conducting magnetic column intermediary space.
3, according to the described dynamic magnetic control arc source apparatus that improves deposition technique of arc ion plating of claim 2, it is characterized in that: the solenoid in the described master control field generator for magnetic and the shape of yoke are circle or square, the shape of magnetic conductive cylinder in the yoke and conducting magnetic column and coil is consistent, and the three is coaxial.
4. according to the described dynamic magnetic control arc source apparatus that improves deposition technique of arc ion plating of claim 2, it is characterized in that: the internal diameter of the coil in the described master control field generator for magnetic is slightly larger than the diameter of conducting magnetic column, external diameter is slightly less than the internal diameter of magnetic conductive cylinder, and the height of coil is lower than the height of yoke.
5. according to the described dynamic magnetic control arc source apparatus that improves deposition technique of arc ion plating of claim 2; it is characterized in that: the solenoid in the described master control field generator for magnetic is wound on the coil rack by enameled wire; coil is inside and outside by insulation protection, and yoke is made by the nickel plating pure iron or the other materials of high magnetic permeability.
6. according to the described dynamic magnetic control arc source apparatus that improves deposition technique of arc ion plating of claim 2, it is characterized in that: magnetic conductive cylinder in the described master control field generator for magnetic and conducting magnetic column top are flat or the inclined-plane are arranged; When magnetic conductive cylinder and conducting magnetic column top were the inclined-plane, the vertical inclined-plane of conducting magnetic column was the up-narrow and down-wide boss shape of rotational symmetry, vertical inclined-plane of magnetic conductive cylinder and the vertical inclined-plane of conducting magnetic column symmetry, and the inclined-plane of yoke is W shape.
7. according to the described dynamic magnetic control arc source apparatus that improves deposition technique of arc ion plating of claim 2; it is characterized in that: described auxiliary magnetic field generating unit is enclosed within the periphery of the magnetic conductive cylinder in the master control field generator for magnetic or the target foundation periphery of target base; coaxial with master control field generator for magnetic or target foundation; by insulation protection, the position of auxiliary magnetic field generating unit is adjustable between auxiliary magnetic field generating unit and master control field generator for magnetic or the target foundation.
8. according to the described dynamic magnetic control arc source apparatus that improves deposition technique of arc ion plating of claim 1, it is characterized in that: described auxiliary magnetic field generating unit shape is consistent with the master control field generator for magnetic, is made up of the solenoid of enameled wire coiling.
9. according to the described dynamic magnetic control arc source apparatus that improves deposition technique of arc ion plating of claim 1, it is characterized in that: the coil in described master control field generator for magnetic and the auxiliary magnetic field generating unit is regulated separately or common the adjusting, logical between the two reversible circulation; By regulating the intensity of coil current size adjustment dynamic magnetic field in master control field generator for magnetic and the auxiliary magnetic field generating unit, the current forms of coil is direct current, interchange or pulse, can realize the multiple control modes to the arc spot.
10. according to the described dynamic magnetic control arc source apparatus that improves deposition technique of arc ion plating of claim 1, it is characterized in that: described target direct water-cooling or indirect water-cooling, the master control field generator for magnetic of direct water-cooling be placed between the target foundation cylinder in the water coolant or the outer target foundation cylinder of cooling-water duct between, the master control field generator for magnetic of indirect water-cooling is placed between the outer foundation cylinder of cooling-water duct.
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| CNU2008200101515U CN201158702Y (en) | 2008-01-11 | 2008-01-11 | Dynamic magnetic controlled arc source device for improving electric arc ion plating deposition technique |
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