CN115315801A - 一种显示基板的制作方法 - Google Patents
一种显示基板的制作方法 Download PDFInfo
- Publication number
- CN115315801A CN115315801A CN202180000428.4A CN202180000428A CN115315801A CN 115315801 A CN115315801 A CN 115315801A CN 202180000428 A CN202180000428 A CN 202180000428A CN 115315801 A CN115315801 A CN 115315801A
- Authority
- CN
- China
- Prior art keywords
- layer
- active layer
- type
- region
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 130
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 68
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 96
- 238000000059 patterning Methods 0.000 claims abstract description 27
- 239000011248 coating agent Substances 0.000 claims abstract description 11
- 238000000576 coating method Methods 0.000 claims abstract description 11
- 238000012545 processing Methods 0.000 claims abstract description 6
- 239000010410 layer Substances 0.000 claims description 426
- 238000000034 method Methods 0.000 claims description 53
- 239000004065 semiconductor Substances 0.000 claims description 42
- 239000002184 metal Substances 0.000 claims description 25
- 238000000151 deposition Methods 0.000 claims description 12
- 239000011229 interlayer Substances 0.000 claims description 12
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 12
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 10
- 229920005591 polysilicon Polymers 0.000 claims description 8
- 238000002425 crystallisation Methods 0.000 claims description 4
- 230000008025 crystallization Effects 0.000 claims description 4
- 238000004380 ashing Methods 0.000 claims description 3
- 238000001312 dry etching Methods 0.000 claims description 3
- 238000005530 etching Methods 0.000 claims description 3
- 238000005516 engineering process Methods 0.000 description 15
- 150000002500 ions Chemical class 0.000 description 9
- 238000011161 development Methods 0.000 description 7
- -1 boron ions Chemical class 0.000 description 6
- 229910044991 metal oxide Inorganic materials 0.000 description 5
- 150000004706 metal oxides Chemical class 0.000 description 5
- 229910052796 boron Inorganic materials 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 239000004020 conductor Substances 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 229920001621 AMOLED Polymers 0.000 description 1
- 101000928335 Homo sapiens Ankyrin repeat and KH domain-containing protein 1 Proteins 0.000 description 1
- 101000701393 Homo sapiens Serine/threonine-protein kinase 26 Proteins 0.000 description 1
- 102100030617 Serine/threonine-protein kinase 26 Human genes 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000003574 free electron Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000005224 laser annealing Methods 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78651—Silicon transistors
- H01L29/7866—Non-monocrystalline silicon transistors
- H01L29/78672—Polycrystalline or microcrystalline silicon transistor
- H01L29/78675—Polycrystalline or microcrystalline silicon transistor with normal-type structure, e.g. with top gate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66742—Thin film unipolar transistors
- H01L29/6675—Amorphous silicon or polysilicon transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
- H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
- H01L27/0611—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region
- H01L27/0617—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region comprising components of the field-effect type
- H01L27/0629—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region comprising components of the field-effect type in combination with diodes, or resistors, or capacitors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66742—Thin film unipolar transistors
- H01L29/66772—Monocristalline silicon transistors on insulating substrates, e.g. quartz substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78651—Silicon transistors
- H01L29/7866—Non-monocrystalline silicon transistors
- H01L29/78672—Polycrystalline or microcrystalline silicon transistor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78696—Thin film transistors, i.e. transistors with a channel being at least partly a thin film characterised by the structure of the channel, e.g. multichannel, transverse or longitudinal shape, length or width, doping structure, or the overlap or alignment between the channel and the gate, the source or the drain, or the contacting structure of the channel
Abstract
本公开实施例公开一种显示基板的制作方法,包括:在衬底基板上形成位于NMOS晶体管区的第一有源层以及位于PMOS晶体管区的第二有源层;在第一有源层、第二有源层背离衬底基板一侧涂覆第一光刻胶层,对第一光刻胶层构图形成第一图案层,至少暴露出第一有源层两端;以第一图案层为掩膜,对第一有源层两端进行N型重掺杂;对第一图案层进行处理形成第二图案层,至少暴露出第一有源层中间区域;以第二图案层为掩膜,对第一有源层进行沟道掺杂;剥离第二图案层后,对第二有源层两端进行P型重掺杂;在第一有源层、第二有源层背离衬底基板一侧形成与N型重掺杂区电连接的第一源极和第一漏极,以及形成与P型重掺杂区电连接的第二源极和第二漏极。
Description
PCT国内申请,说明书已公开。
Claims (15)
- PCT国内申请,权利要求书已公开。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/CN2021/079610 WO2022188011A1 (zh) | 2021-03-08 | 2021-03-08 | 一种显示基板的制作方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN115315801A true CN115315801A (zh) | 2022-11-08 |
Family
ID=83227315
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202180000428.4A Pending CN115315801A (zh) | 2021-03-08 | 2021-03-08 | 一种显示基板的制作方法 |
Country Status (3)
Country | Link |
---|---|
US (1) | US20230163200A1 (zh) |
CN (1) | CN115315801A (zh) |
WO (1) | WO2022188011A1 (zh) |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100667066B1 (ko) * | 2004-08-11 | 2007-01-10 | 삼성에스디아이 주식회사 | 박막트랜지스터 제조 방법 |
KR100796609B1 (ko) * | 2006-08-17 | 2008-01-22 | 삼성에스디아이 주식회사 | Cmos 박막 트랜지스터의 제조방법 |
KR101496148B1 (ko) * | 2008-05-15 | 2015-02-27 | 삼성전자주식회사 | 반도체소자 및 그 제조방법 |
CN103700632B (zh) * | 2013-12-26 | 2016-04-06 | 京东方科技集团股份有限公司 | Cmos晶体管及其制作方法、显示面板和显示装置 |
CN103715196B (zh) * | 2013-12-27 | 2015-03-25 | 京东方科技集团股份有限公司 | 一种阵列基板及其制作方法、显示装置 |
CN103745978B (zh) * | 2014-01-03 | 2016-08-17 | 京东方科技集团股份有限公司 | 显示装置、阵列基板及其制作方法 |
CN104167448B (zh) * | 2014-08-05 | 2017-06-30 | 京东方科技集团股份有限公司 | 薄膜晶体管及其制备方法、阵列基板和显示装置 |
CN105185792B (zh) * | 2015-09-30 | 2018-11-23 | 深圳市华星光电技术有限公司 | 液晶显示面板、阵列基板及其制造方法 |
CN105633095A (zh) * | 2016-01-04 | 2016-06-01 | 京东方科技集团股份有限公司 | 一种阵列基板及显示面板 |
CN105470310A (zh) * | 2016-01-21 | 2016-04-06 | 京东方科技集团股份有限公司 | 一种薄膜晶体管及其制作方法、阵列基板和显示装置 |
CN106098784A (zh) * | 2016-06-13 | 2016-11-09 | 武汉华星光电技术有限公司 | 共平面型双栅电极氧化物薄膜晶体管及其制备方法 |
CN107818987B (zh) * | 2016-09-14 | 2024-01-16 | 天马微电子股份有限公司 | 半导体装置及其制造方法和显示设备及其制造方法 |
CN106783871B (zh) * | 2016-11-18 | 2019-11-08 | 上海天马微电子有限公司 | 一种阵列基板、显示面板及制作方法 |
CN106449667B (zh) * | 2016-12-21 | 2017-12-22 | 京东方科技集团股份有限公司 | 阵列基板及其制作方法、显示装置 |
CN107768310B (zh) * | 2017-10-20 | 2020-07-14 | 京东方科技集团股份有限公司 | 一种阵列基板的制作方法、阵列基板及指纹识别器件 |
CN108807442B (zh) * | 2018-07-10 | 2020-07-24 | 京东方科技集团股份有限公司 | 图像距离传感器及其制备方法、倒车图像测距装置 |
CN110047800B (zh) * | 2019-04-18 | 2021-01-15 | 武汉华星光电技术有限公司 | 阵列基板及其制备方法 |
-
2021
- 2021-03-08 US US17/771,720 patent/US20230163200A1/en active Pending
- 2021-03-08 CN CN202180000428.4A patent/CN115315801A/zh active Pending
- 2021-03-08 WO PCT/CN2021/079610 patent/WO2022188011A1/zh unknown
Also Published As
Publication number | Publication date |
---|---|
US20230163200A1 (en) | 2023-05-25 |
WO2022188011A1 (zh) | 2022-09-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US7696033B2 (en) | Method of fabricating complementary metal-oxide semiconductor (CMOS) thin film transistor (TFT) | |
US7572690B2 (en) | Method of fabricating CMOS thin film transistor (TFT) and CMOS TFT fabricated using the same | |
CN106847703B (zh) | 低温多晶硅薄膜晶体管的制造方法和显示装置 | |
KR20170085070A (ko) | 이중 게이트 구조를 기반으로 한 저온 폴리 실리콘 박막 트랜지스터 및 그 제조 방법 | |
WO2019218566A1 (zh) | Ltps tft基板的制作方法 | |
US7176074B1 (en) | Manufacturing method of thin film transistor array substrate | |
US7700483B2 (en) | Method for fabricating pixel structure | |
WO2019184026A1 (zh) | Cmos晶体管的制备方法、阵列基板的制备方法 | |
US6218229B1 (en) | Method of fabricating semiconductor device having a dual-gate | |
WO2019200835A1 (zh) | Cmos型ltps tft基板的制作方法 | |
US8063439B2 (en) | Semiconductor device and fabrication method thereof | |
CN105576034A (zh) | 薄膜晶体管元件及其制造方法 | |
KR100582198B1 (ko) | 상보형 모스 박막트랜지스터의 제조방법 | |
CN115315801A (zh) | 一种显示基板的制作方法 | |
CN109860108B (zh) | Cmos薄膜晶体管及其制作方法和阵列基板 | |
CN108878354B (zh) | 一种cmos薄膜晶体管及ltps阵列基板的制作方法 | |
CN110047800B (zh) | 阵列基板及其制备方法 | |
US20090057679A1 (en) | Thin film transistor and manufacturing method thereof | |
US6790715B1 (en) | Manufacturing method of CMOS thin film transistor | |
US8766270B2 (en) | Pixel structure and manufacturing method thereof | |
US20200227538A1 (en) | Thin film transistor, method of manufacturing thin film transistor, and manufacturing system | |
US7682955B1 (en) | Method for forming deep well of power device | |
KR100441436B1 (ko) | 투과율이 향상된 평판표시장치 및 그의 제조방법 | |
JPH10173197A (ja) | 薄膜トランジスタ及びその製造方法 | |
CN108766935B (zh) | 阵列基板及其制备方法、显示装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination |