CN115233188B - 一种片级Ni-Al2O3多孔能源材料的制备方法 - Google Patents
一种片级Ni-Al2O3多孔能源材料的制备方法 Download PDFInfo
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- 239000000463 material Substances 0.000 title claims abstract description 36
- 238000000034 method Methods 0.000 title claims abstract description 16
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 40
- 229910003310 Ni-Al Inorganic materials 0.000 claims abstract description 37
- 239000000758 substrate Substances 0.000 claims abstract description 27
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 20
- 150000001409 amidines Chemical class 0.000 claims abstract description 16
- 239000000839 emulsion Substances 0.000 claims abstract description 16
- 239000004005 microsphere Substances 0.000 claims abstract description 16
- 238000002360 preparation method Methods 0.000 claims abstract description 16
- 238000006243 chemical reaction Methods 0.000 claims abstract description 14
- 239000011521 glass Substances 0.000 claims abstract description 14
- 239000011148 porous material Substances 0.000 claims abstract description 11
- 238000000151 deposition Methods 0.000 claims abstract description 10
- 238000001338 self-assembly Methods 0.000 claims abstract description 10
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 12
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 12
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 12
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 10
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 8
- 238000005406 washing Methods 0.000 claims description 8
- 238000000231 atomic layer deposition Methods 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 7
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical group O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 7
- 238000003756 stirring Methods 0.000 claims description 7
- 239000003906 humectant Substances 0.000 claims description 6
- 229910052757 nitrogen Inorganic materials 0.000 claims description 6
- 241000252506 Characiformes Species 0.000 claims description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 4
- 239000012159 carrier gas Substances 0.000 claims description 4
- 239000008367 deionised water Substances 0.000 claims description 4
- 229910021641 deionized water Inorganic materials 0.000 claims description 4
- 238000009713 electroplating Methods 0.000 claims description 4
- 238000007306 functionalization reaction Methods 0.000 claims description 4
- PEDCQBHIVMGVHV-UHFFFAOYSA-N glycerol group Chemical group OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 claims description 4
- 229920000371 poly(diallyldimethylammonium chloride) polymer Polymers 0.000 claims description 4
- 239000002243 precursor Substances 0.000 claims description 4
- 239000000376 reactant Substances 0.000 claims description 4
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 claims description 4
- -1 N- (3- (trimethoxysilyl) propyl) -N, N, N-trimethylammonium chloride methanol Chemical compound 0.000 claims description 3
- 239000003960 organic solvent Substances 0.000 claims description 3
- 238000002791 soaking Methods 0.000 claims description 3
- 235000011187 glycerol Nutrition 0.000 claims description 2
- VWXLCWNPSOUPPE-UHFFFAOYSA-N (1-amino-2-methylpropylidene)azanium;chloride Chemical compound Cl.CC(C)C(N)=N VWXLCWNPSOUPPE-UHFFFAOYSA-N 0.000 claims 1
- 239000002202 Polyethylene glycol Substances 0.000 claims 1
- 229920001223 polyethylene glycol Polymers 0.000 claims 1
- 238000010521 absorption reaction Methods 0.000 abstract description 5
- 238000009835 boiling Methods 0.000 abstract description 3
- 238000001704 evaporation Methods 0.000 abstract description 3
- 230000008020 evaporation Effects 0.000 abstract description 3
- 239000007788 liquid Substances 0.000 abstract description 3
- 239000002352 surface water Substances 0.000 abstract description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 1
- 239000013078 crystal Substances 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 abstract 1
- 230000009286 beneficial effect Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000003912 environmental pollution Methods 0.000 description 3
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- 238000000026 X-ray photoelectron spectrum Methods 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 238000001000 micrograph Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 238000003980 solgel method Methods 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 1
- 229910021585 Nickel(II) bromide Inorganic materials 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 238000000970 chrono-amperometry Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- DEJRLAVWNDPXGZ-UHFFFAOYSA-N dimethyl(3-trimethoxysilylpropyl)azanium;chloride Chemical compound Cl.CO[Si](OC)(OC)CCCN(C)C DEJRLAVWNDPXGZ-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- IPLJNQFXJUCRNH-UHFFFAOYSA-L nickel(2+);dibromide Chemical compound [Ni+2].[Br-].[Br-] IPLJNQFXJUCRNH-UHFFFAOYSA-L 0.000 description 1
- KERTUBUCQCSNJU-UHFFFAOYSA-L nickel(2+);disulfamate Chemical compound [Ni+2].NS([O-])(=O)=O.NS([O-])(=O)=O KERTUBUCQCSNJU-UHFFFAOYSA-L 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/403—Oxides of aluminium, magnesium or beryllium
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- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
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Abstract
本发明公开了一种片级Ni‑Al2O3多孔能源材料的制备方法，首先制备脒功能化微球乳液，功能化基底玻片；其次采用湿静电垂直自组装方法制备胶晶模板；然后在模板表面电沉积镍金属，溶解模板得到镍多孔材料；最后在其表面原子层沉积氧化铝得到Ni‑Al2O3多孔能源材料。该多孔能源材料可广泛应用于表面水蒸发、热管吸液芯、沸腾表面、光热转化及光电催化等领域。
Description
技术领域
本发明属于能源利用领域，特别是一种片级Ni-Al2O3多孔能源材料的制备方法。
背景技术
进入21世纪以来, 电子信息产业快速发展, 电子设备的小型化、集成化已经成为当今电子技术发展的趋势,芯片的高度集成、高工作频率以及高封装密度使得芯片的温度急剧升高。目前，热管作为一种高效的相变传热工具, 由于其拥有高导热性、优异的均温性能、运行可靠性等特点, 被广泛应用在能源、航空、电子元件等领域的散热。各种形式的热管层出不穷，但由于电子设备尺寸较小，限制其发展。相比于传统热管，采用一种片级多孔材料制作热管，可与电子设备有效贴合，在对流条件下也可以提高传热性能，同时该能源材料在表面水蒸发、热管吸液芯、沸腾表面、光热转化及光电催化领域有更大的应用前景和市场。
目前，在Ni-Al2O3多孔能源材料的制备方面，国内外研究者多采用阳极氧化法、物理气相沉积（真空蒸发、溅射镀膜和离子镀）、溶胶凝胶法。阳极氧化法中使用氰化物、磷酸盐等有害物质，环境污染严重；物理气相沉积方法虽然没有环境污染，设备对环境拥有较高的要求，成本较高。溶胶-凝胶法虽然简单，但所需周期过长，所使用的原料价格比较昂贵。鉴于片级Ni-Al2O3多孔能源材料巨大的应用前景和市场，采用一种成本低，污染小的方法制备Ni-Al2O3多孔结构具有重要意义。
发明内容
本发明提供一种片级Ni-Al2O3多孔能源材料的制备方法，以解决现有方法对设备要求较高，且严重污染环境的问题。
实现本发明目的的技术解决方案为：
一种片级Ni-Al2O3多孔能源材料的制备方法，包括以下步骤:
步骤1、制备脒功能化微球乳液：
聚二烯丙基二甲基氯化铵溶液、苯乙烯溶液分散于无水乙醇中，进行脱氧处理，注入脱氧后的2,2-偶氮双(2-甲基丙脒)盐酸盐溶液加热搅拌，完全反应后离心洗涤得到脒功能化微球乳液；
步骤2、制备功能化基底玻片：
玻片分别在甲醇、丙酮和异丙醇中超声洗涤，然后在碱性食人鱼溶液(H2O2/NH4OH/H2O，体积比为1:1:5)中加热改性，在N-(3-(三甲氧基甲硅烷基)丙基)-N，N，N-三甲基氯化铵甲醇溶液中浸泡使之带正电，用去离子水冲洗得到功能化基底玻片；
步骤3、自组装：
功能化基底玻片浸入脒功能化的脒功能化微球乳液中，设置温度和湿度，加入保湿剂，以湿静电垂直沉积法进行自组装；
步骤4、电沉积镍：
将自组装后的基底玻片快速转移到镍电镀液中，连接电源进行沉积，沉积后转移至有机溶剂，溶解模板后得到镍多孔材料；
步骤5、原子层沉积氧化铝：
采用三甲基铝为前驱体，以水为反应物，氮气为载气，设置反应腔温度、工艺压力、循环周期等反应条件，在镍多孔材料表面原子层沉积氧化铝得到片级Ni-Al2O3多孔能源材料。
本发明与现有技术相比，其显著优点：
（1）本发明的制备方法简单、成本低、对环境污染小，可广泛应用于表面水蒸发、热管吸液芯、沸腾表面、太阳能洁净水处理及光电催化等领域。
（2）本发明的具有增强的机械、化学、热和光子特性，具有很大的应用前景和市场，可广泛应用于电池电极、光子器件和热交换器等领域。
（3）本发明制备的Ni-Al2O3具有较强的光吸收能力，有利于提高太阳光热利用系统的光热转换效率。
（4）本发明制备的Ni-Al2O3多孔能源材料具有亲水能力，有利于提高水工质的毛细抽取能力，加速太阳能洁净水处理。
（5）本发明实现了模板的片级生长，有利于实现柔性薄膜蒸发器的开发利用。
下面结合附图对本发明作进一步详细描述。
附图说明
图1为Ni-Al2O3多孔能源材料制备流程图。
图2为Ni-Al2O3多孔能源材料实物图。
图3为Ni-Al2O3多孔能源材料表面扫描电镜图。
图4为Ni-Al2O3多孔能源材料孔径统计分布图。
图5为Ni-Al2O3多孔能源材料光谱吸收图。
图6为Ni-Al2O3多孔能源材料表面接触角测试图。
图7为Ni-Al2O3多孔能源材料X射线光电子能谱图。
图8为Ni-Al2O3多孔能源材料截面扫描电镜成分分析测试图。
具体实施方式
为了说明本发明的技术方案及技术目的，下面结合附图及具体实施例对本发明做进一步的介绍。
结合图1，本发明的一种片级Ni-Al2O3多孔能源材料的制备方法，包括以下步骤：
步骤1、制备脒功能化微球乳液：
将25~30wt%聚二烯丙基二甲基氯化铵溶液、苯乙烯分散于无水乙醇中，进行脱氧处理，注入脱氧后的2,2-偶氮双(2-甲基丙脒)盐酸盐溶液加热搅拌，完全反应后离心洗涤得到脒功能化微球乳液。
步骤2、功能化基底玻片：
玻片分别在甲醇、丙酮和异丙醇中超声洗涤，然后在碱性食人鱼溶液(H2O2/NH4OH/H2O，体积比为1:1:5)中加热改性，在N-(3-(三甲氧基甲硅烷基)丙基)-N，N，N-三甲基氯化铵甲醇溶液中浸泡使之带正电，用去离子水冲洗得到功能化基底玻片。
步骤3、自组装：
功能化基底玻片浸入脒功能化的微球乳液中，设置温度湿度，加入保湿剂，用垂直沉积法进行自组装。
步骤4、电沉积镍：
将基底玻片快速转移到镍电镀液中，连接电源进行沉积，沉积后转移至有机溶剂，溶解模板后得到镍多孔材料。
步骤5、原子层沉积氧化铝：
采用三甲基铝为前驱体，以水为反应物，氮气为载气，设置反应腔温度、工艺压力、循环周期等反应条件，在镍多孔材料表面原子层沉积氧化铝得到片级Ni-Al2O3多孔能源材料。
实施例1
一种片级Ni-Al2O3多孔能源材料的制备方法，包括以下步骤:
步骤1、制备脒功能化微球乳液：
量取0.13ml质量浓度为28%的聚二烯丙基二甲基氯化铵溶液、6ml苯乙烯溶液，倒入盛有75ml无水乙醇的圆底烧瓶中，通氮气脱氧，随后注入0.07g脱氧后的2,2-偶氮双(2-甲基丙脒)盐酸盐溶液，加热至75℃搅拌反应20小时，反应完全后离心洗涤备用。
步骤2、功能化基底玻片：
将ITO载玻片分别在甲醇、丙酮和异丙醇中超声处理15分钟，然后浸泡在80℃的碱性食人鱼溶液中3小时，随后浸泡在质量浓度1.0 % 的N-[3-(三甲氧基甲硅烷基)丙基]-N，N，N-二甲基氯化铵溶液中一天，最后用去离子水彻底冲洗基底。
步骤3、自组装：
将基底玻片浸入质量浓度为0.9%的脒功能化微球乳液烧杯内，加入脒功能化微球乳液体积的0.06%的甘油保湿剂，进行垂直自组装，加热至56℃，控制湿度为26%，自组装24-36小时。
步骤4、电沉积镍：
步骤4.1、将样品取出，快速浸入镍电镀液中（氨基磺酸镍、溴化镍、硼酸、水的质量比为50:1.365:4.37:136.6），模板面朝下倾斜，将电源连接到模板和镍阳极上，利用计时电流法在-1.37伏电压下沉积。
步骤4.2、在甲苯中浸泡10小时以上溶解模板形成镍多孔结构。
步骤5、用氮气吹干后放入腔体，采用三甲基铝为前驱体，以水为反应物，氮气为载气，设置反应腔温度150℃、工艺压力26.7帕斯卡、循环48个周期沉积氧化铝，冷却后将样品从基底上机械剥离。
图2为Ni-Al2O3多孔能源材料实物图，可以看出该薄膜表面呈现灰黑色。图3为ITO基底上制备的Ni-Al2O3多孔能源材料表面扫描电镜图，从图中可以看出，成功制备出了结构有序的Ni-Al2O3薄膜，且无明显裂纹。图4为Ni-Al2O3多孔能源材料孔径统计分布图，可以确定孔径大小在0.758微米左右。利用ImageJ软件计算出孔隙率为76%。图5为Ni-Al2O3多孔能源材料的光谱吸收图，具有较强的光吸收能力，有利于提高太阳光热利用系统的光热转换效率。图6为Ni-Al2O3多孔能源材料的接触角测试图，从图上可以看出Ni-Al2O3多孔能源材料具备亲水性能，接触角为85.7度。图7为Ni-Al2O3多孔能源材料的X射线光电子能谱图。本发明的Ni-Al2O3多孔结构能源材料的制备方法简单，可直接在导电玻璃基底上制备出片级Ni-Al2O3多孔结构，结构稳定。图8为Ni-Al2O3多孔能源材料的截面扫描电镜成分分析测试图，从图上可以看出本发明的Ni-Al2O3多孔能源材料的成分中主要含有氧、铝、镍三种元素。
Claims (9)
1.一种片级Ni-Al2O3多孔能源材料的制备方法，其特征在于，包括以下步骤：
步骤1、制备脒功能化微球乳液：
将聚二烯丙基二甲基氯化铵溶液、苯乙烯分散于无水乙醇中，进行脱氧处理，加入脱氧后的2,2-偶氮双(2-甲基丙脒)盐酸盐溶液加热搅拌，完全反应后离心洗涤得到脒功能化微球乳液；
步骤2、自组装：
将功能化基底玻片浸入脒功能化的微球乳液中，控制温度和湿度，加入保湿剂，用垂直沉积法进行自组装，其中，功能化基底玻片是指对基底玻片进行带正电的功能化处理，保湿剂为甘油或聚乙二醇溶液，保湿剂的体积为脒功能化的微球乳液体积的0.03-0.12%；
步骤3、电沉积镍：
将自组装后的基底玻片快速转移到镍电镀液中，进行沉积，沉积后转移至有机溶剂，溶解模板后得到镍多孔材料；
步骤4、原子层沉积氧化铝：
采用三甲基铝为前驱体，以水为反应物，氮气为载气，在镍多孔材料表面进行原子层沉积氧化铝得到片级Ni-Al2O3多孔能源材料。
2.根据权利要求1所述的制备方法，其特征在于，加热搅拌温度为65-80℃，搅拌转速为300-400r/min，加热搅拌时间为20-24h。
3.根据权利要求1所述的制备方法，其特征在于，苯乙烯和2,2-偶氮双(2-甲基丙脒)盐酸盐的质量比为10~1000。
4.根据权利要求1所述的制备方法，其特征在于，功能化基底玻片是指对基底玻片进行带正电的功能化处理，具体步骤为：基底玻片分别在甲醇、丙酮和异丙醇中超声洗涤，然后在碱性食人鱼溶液中于70~80℃下改性2-3h，在N-(3-(三甲氧基甲硅烷基)丙基)-N，N，N-三甲基氯化铵甲醇溶液中浸泡20-36h使之带正电，用去离子水冲洗得到功能化基底玻片。
5.根据权利要求1或4所述的制备方法，其特征在于，基底玻片为ITO、FTO导电玻璃中任意一种。
6.根据权利要求1所述的制备方法，其特征在于，步骤2中，将功能化基底玻片浸入脒功能化的微球乳液中，控制温度为50-60℃，湿度为20%-30%。
7.根据权利要求1或6所述的制备方法，其特征在于，步骤2中，脒功能化的微球乳液的质量浓度为0.9-1.5%。
8.根据权利要求1所述的制备方法，其特征在于，电沉积镍的电压在（-1.3）~（-1.6）伏。
9.根据权利要求1所述的制备方法，其特征在于，原子层沉积时的反应腔温度为150-160℃，压力为13-40 帕斯卡，循环周期为5-200。
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