CN115178120B - Liquid mixing device and semiconductor process equipment - Google Patents

Liquid mixing device and semiconductor process equipment Download PDF

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Publication number
CN115178120B
CN115178120B CN202210884013.4A CN202210884013A CN115178120B CN 115178120 B CN115178120 B CN 115178120B CN 202210884013 A CN202210884013 A CN 202210884013A CN 115178120 B CN115178120 B CN 115178120B
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China
Prior art keywords
liquid
liquid mixing
overflow
mixing container
tube
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CN202210884013.4A
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Chinese (zh)
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CN115178120A (en
Inventor
张虎威
王龙
王锐廷
南建辉
张金斌
高少飞
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Beijing Naura Microelectronics Equipment Co Ltd
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Beijing Naura Microelectronics Equipment Co Ltd
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Priority to CN202210884013.4A priority Critical patent/CN115178120B/en
Publication of CN115178120A publication Critical patent/CN115178120A/en
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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/40Mixing liquids with liquids; Emulsifying
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/40Mixing liquids with liquids; Emulsifying
    • B01F23/405Methods of mixing liquids with liquids
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F33/00Other mixers; Mixing plants; Combinations of mixers
    • B01F33/40Mixers using gas or liquid agitation, e.g. with air supply tubes
    • B01F33/406Mixers using gas or liquid agitation, e.g. with air supply tubes in receptacles with gas supply only at the bottom
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F33/00Other mixers; Mixing plants; Combinations of mixers
    • B01F33/40Mixers using gas or liquid agitation, e.g. with air supply tubes
    • B01F33/4094Plants
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/80Forming a predetermined ratio of the substances to be mixed
    • B01F35/83Forming a predetermined ratio of the substances to be mixed by controlling the ratio of two or more flows, e.g. using flow sensing or flow controlling devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/30Driving arrangements; Transmissions; Couplings; Brakes
    • B01F2035/35Use of other general mechanical engineering elements in mixing devices
    • B01F2035/351Sealings

Abstract

The invention discloses a liquid mixing device and semiconductor process equipment, wherein the liquid mixing device comprises a first infusion tube, a second infusion tube, a liquid mixing container and a first overflow pipeline; wherein: the liquid discharge end part of the first infusion tube and the liquid discharge end part of the second infusion tube are both communicated with the liquid mixing container, the overflow inlet of the first overflow pipeline is positioned at the preset height of the liquid mixing container, and the first overflow pipeline is provided with a first switch valve; the first liquid conveying pipe is used for conveying the first liquid into the liquid mixing container in an emptying state so that the actual liquid level of the first liquid is larger than a preset height and the first liquid can be discharged from an overflow inlet of the first overflow pipeline; the second infusion tube is provided with a first metering device, and is used for conveying a preset volume of second liquid controlled by the first metering device into the liquid mixing container under the condition that the actual liquid level is reduced to a preset height, and the first switch valve is in a closed state.

Description

Liquid mixing device and semiconductor process equipment
Technical Field
The invention relates to the technical field of semiconductor process equipment, in particular to a liquid mixing device and semiconductor process equipment.
Background
A semiconductor cleaning apparatus is an apparatus that cleans a wafer. When the semiconductor cleaning equipment cleans the wafer, the concentration requirements of the cleaning liquid medicine are different for different process requirements.
In order to obtain the cleaning liquid with different concentrations, the cleaning liquid needs to be mixed in a liquid mixing device. When the cleaning liquid is disposed, different liquids are required to be input into the process tank through different pipelines according to a certain proportion for mixing. In the related art, liquid level sensors with different heights are arranged in a liquid mixing container, when liquid is mixed, first liquid is firstly input into the liquid mixing container, after the liquid level sensor with a lower liquid level trigger position of the first liquid is arranged, the first liquid is stopped being input into the liquid mixing container, then second liquid is input into the liquid mixing container, and when the liquid level sensor with a higher liquid level trigger position of the mixed liquid in the liquid mixing container is arranged, the second liquid is stopped being input into a process tank. Because the liquid mixing device measures the volumes of different liquids by means of the liquid level sensor in the process tank, the measurement error of the volumes of the liquids is relatively large (because the liquid level sensor is triggered, the liquid still exists in the liquid conveying pipeline, and the volume of the liquid actually input is larger), so that the actually required mixed liquid cannot be obtained more accurately.
Disclosure of Invention
The invention discloses a liquid mixing device and semiconductor process equipment, which are used for solving the problems that in the related art, the liquid mixing device has larger measurement error due to the fact that the volumes of first liquid and second liquid required by the liquid level sensor for detecting the mixed liquid, and the mixed liquid cannot meet the use requirement.
In order to solve the technical problems, the invention is realized as follows:
in a first aspect, the present application discloses a liquid mixing device comprising a first infusion tube, a second infusion tube liquid mixing container and a first overflow line; wherein:
the liquid discharge end part of the first infusion tube and the liquid discharge end part of the second infusion tube are communicated with the liquid mixing container, the overflow inlet of the first overflow pipeline is positioned at the preset height of the liquid mixing container, and the first overflow pipeline is provided with a first switch valve;
the first infusion tube is used for conveying first liquid into the liquid mixing container in an emptying state, so that the actual liquid level of the first liquid is larger than the preset height, and the first liquid can be discharged from an overflow inlet of the first overflow pipeline;
the second infusion tube is provided with first metering equipment, and is used for conveying second liquid with preset volume controlled by the first metering equipment into the liquid mixing container under the condition that the actual liquid level is reduced to the preset height, and the first switch valve is in a closed state.
In a second aspect, the application further discloses a semiconductor process device, which comprises a wafer cleaning tank and the liquid mixing device in the first aspect, wherein the wafer cleaning tank is communicated with the liquid mixing container through a liquid mixing conveying pipe, and the liquid mixing conveying pipe is provided with a sixth switch valve.
The technical scheme adopted by the invention can achieve the following technical effects:
according to the liquid mixing device disclosed by the embodiment of the application, the first overflow pipeline and the first switch valve are arranged, the overflow inlet of the first overflow pipeline is located at the preset height of the liquid mixing container, the first switch valve is arranged on the first overflow pipeline, when the first liquid is input into the liquid mixing container through the first infusion pipe, the first liquid is stopped being conveyed into the liquid mixing container when the actual liquid level of the first liquid in the liquid mixing container is larger than the preset height, the first switch valve is opened, so that the first liquid is discharged from the overflow inlet of the first overflow pipeline, the actual liquid level of the first liquid is reduced to the height of the overflow inlet of the first overflow pipeline, and the actual liquid level of the first liquid can be located at the preset height through the overflow effect of the first overflow pipeline, so that the volume of the first liquid in the liquid mixing container can be accurately obtained. And the second liquid is conveyed into the liquid mixing container through the second infusion tube, and the volume of the second liquid which is input into the liquid mixing container is controlled through the first metering equipment, so that the volume of the second liquid conveyed into the liquid mixing container is relatively accurate, the volumes of the first liquid and the second liquid which are conveyed into the liquid mixing container are accurately controlled, and the actually required mixed liquid can be accurately obtained.
Drawings
FIG. 1 is a schematic diagram of a semiconductor processing apparatus according to an embodiment of the present invention;
FIG. 2 is a schematic view of a portion of a liquid mixing device according to an embodiment of the present invention;
fig. 3 is a schematic structural view of the first liquid level sensor disposed in the liquid mixing container.
Reference numerals illustrate:
100-first infusion tube, 130-second switch valve
200-second infusion tube, 220-main tube, 230-first branch tube, 231-fifth switch valve, 240-second branch tube, 241-second liquid temporary storage tank, 250-first metering device, 260-second metering device,
300-a liquid mixing container, 310-a first through hole, 320-an adjusting bracket,
400-a first overflow pipe, 410-an annular flange, 420-a first switch valve,
500-locking device, 510-first nut, 520-second nut, 530-bracket, 531-second through hole, 610-barrel, 620-elastic sleeve,
710-first level sensor, 720-second level sensor, 730-empty level sensor,
810-a second overflow pipeline, 811-a third switch valve, 820-a leak-proof disk, 840-a leak sensor, 850-a gas pipe, 860-an exhaust pipeline,
900-wafer cleaning tank, 910-inner tank, 920-outer tank, 930-mixed liquor conveying pipe, 940-sixth switch valve, 950-fluid supplementing pipeline, 960-seventh switch valve, 970-eighth switch valve, 980-emptying pipeline and 990-frame.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the technical solutions of the present invention will be clearly and completely described below with reference to specific embodiments of the present invention and corresponding drawings. It will be apparent that the described embodiments are only some, but not all, embodiments of the invention. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
The technical scheme disclosed by each embodiment of the invention is described in detail below with reference to the accompanying drawings.
Referring to fig. 1 to 3, an embodiment of the present invention discloses a liquid mixing device, which includes a first infusion tube 100, a second infusion tube 200, a liquid mixing container 300 and a first overflow pipe 400.
The liquid discharge end of the first infusion tube 100 and the liquid discharge end of the second infusion tube 200 are both communicated with the liquid mixing container 300, and the first liquid can enter the liquid mixing container 300 through the first infusion tube 100 and the second liquid can enter the liquid mixing container 300 through the second infusion tube 200. The mixing vessel 300 is a place where the first liquid and the second liquid are mixed.
The overflow inlet of the first overflow pipe 400 is communicated with the liquid mixing container 300, and the overflow inlet of the first overflow pipe 400 is located at a preset height of the liquid mixing container 300, that is, the height of the overflow inlet of the first overflow pipe 400 is a preset height. The first overflow line 400 is provided with a first on-off valve 420. The preset height may be an artificially preset height. When the liquid level in the liquid mixing container 300 is higher than the preset height and the first switching valve 420 is opened, the first liquid in the liquid mixing container 300 higher than the preset height is overflowed and discharged from the overflow inlet of the first overflow line 400, so that the liquid level of the first liquid in the liquid mixing container 300 is reduced to the preset height. The preset height is the corresponding liquid level height of the volume of the first liquid in the mixing container 300 required during mixing.
The first transfer line 100 is used to transfer the first liquid into the mixing vessel 300 in an empty state so that the actual level of the first liquid is greater than a preset height, and at the same time, the first liquid can be discharged from the overflow inlet of the first overflow line 400. Specifically, the first infusion tube 100 may be in a closed state or an open state when the first on-off valve 420 is in a closed state to deliver the first liquid into the mixing container 300 in an empty state. When the actual level of the first liquid is greater than the preset level, the input of the first liquid into the liquid mixing container 300 may be stopped, the first switching valve 420 may be opened, the first liquid may be discharged from the overflow inlet of the first overflow line 400, so that the level of the first liquid in the liquid mixing container 300 is reduced to the preset level, and the first switching valve 420 may be closed after the overflow of the first liquid in the liquid mixing container 300 through the overflow line is reduced to the preset level.
The second transfer line 200 is provided with a first metering device 250, and in case the actual liquid level drops to a preset level, the second transfer line 200 is used to transfer a preset volume of the second liquid controlled by the first metering device 250 into the mixing container 300, and the first switching valve 420 is in a closed state. The first metering device 250 may be a positive displacement flow meter, an impeller flow meter, a momentum flow meter, or the like.
In a specific mixing process, the first switch valve 420 may be in a closed state, the first infusion tube 100 conveys the first liquid into the mixing container 300 in an empty state, when the actual liquid level of the first liquid in the mixing container 300 is greater than a preset height, the first switch valve 420 is turned on, and since the actual liquid level is greater than the preset height, the first liquid is discharged from the overflow inlet of the first overflow pipeline 400, so that the actual liquid level of the first liquid is reduced to the height of the overflow inlet of the first overflow pipeline 400, that is, reduced to the preset height, and after the liquid level of the first liquid is reduced to the preset height, the first switch valve 420 is turned off. The second liquid is then delivered to the mixing vessel 300 through the second infusion tube 200, and the volume of the second liquid input to the mixing vessel 300 is controlled by the first metering device 250. After a predetermined volume of the second liquid is inputted into the mixing container 300, the second liquid is stopped from being supplied into the mixing container 300.
According to the liquid mixing device disclosed by the embodiment of the application, the first overflow pipeline 400 and the first switch valve 420 are arranged, the overflow inlet of the first overflow pipeline 400 is located at the preset height of the liquid mixing container 300, the first switch valve 420 is arranged on the first overflow pipeline 400, when the first liquid is input into the liquid mixing container 300 through the first infusion tube 100, and when the actual liquid level of the first liquid in the liquid mixing container 300 is greater than the preset height, the first liquid is stopped to be conveyed into the liquid mixing container 300, the first switch valve 420 is opened, so that the first liquid is discharged from the overflow inlet of the first overflow pipeline 400, the actual liquid level of the first liquid is reduced to the height of the overflow inlet of the first overflow pipeline 400, and therefore the actual liquid level of the first liquid can be located at the preset height through the overflow effect of the first overflow pipeline 400, and the volume of the first liquid in the liquid mixing container 300 can be accurately obtained. And then the second liquid is conveyed to the liquid mixing container 300 through the second infusion tube 200, and the volume of the second liquid conveyed to the liquid mixing container 300 is controlled through the first metering device 250, so that the volume of the second liquid conveyed to the liquid mixing container 300 is relatively accurate, the volumes of the first liquid and the second liquid conveyed to the liquid mixing container 300 are accurately controlled, and the actually required mixed liquid can be accurately obtained.
Alternatively, the first infusion tube 100 and the second infusion tube 200 may be provided with a manual valve and an electric control valve, through which the on-off of the first infusion tube 100 and the second infusion tube 200 may be controlled. When the liquid mixing device is overhauled and maintained, the liquid mixing device needs to be powered off, and the electric control valve can lose control due to the power off, so that the liquid mixing device can be manually controlled through the manual valve.
Optionally, the first overflow line 400 is movably disposed in the mixing container 300, so that the overflow inlet of the first overflow line 400 is adjustable at a preset height in the mixing container 300. Specifically, at least a portion of the first overflow line 400 may be located within the mixing vessel 300, and at least a portion of the first overflow line 400 may be movable relative to the mixing vessel 300 to adjust a predetermined height of the overflow inlet of the first overflow line 400 within the mixing vessel 300. The portion of the first overflow line 400 located in the mixing vessel 300 is telescopic, so that a preset height of the overflow inlet of the first overflow line 400 in the mixing vessel 300 can be controlled. The first overflow line 400 may also be integrally moved up and down in the height direction with respect to the mixing vessel 300 to control the preset height of the overflow inlet of the first overflow line 400 in the mixing vessel 300.
According to the embodiment of the application, the preset height of the overflow inlet of the first overflow pipeline 400 in the liquid mixing container 300 is adjustable, so that the preset height can be changed, the different requirements on the volume of the first liquid can be met according to actual needs, and the liquid mixing capacity of the liquid mixing device can be improved.
To facilitate height adjustment of the overflow inlet of the first overflow line 400, optionally, the bottom wall of the mixing vessel 300 may be provided with a first through hole 310, the first overflow line 400 may be mated with the first through hole 310, a first end of the first overflow line 400 may be located outside the mixing vessel 300, a second end of the first overflow line 400 may be located inside the mixing vessel 300, and a port of the second end of the first overflow line 400 may be the overflow inlet of the first overflow line 400. The mixing device may further include a locking device 500, where the locking device 500 may be connected to the mixing container 300, the locking device 500 may be engaged with the first end of the first overflow pipe 400, the first through hole 310 may be sealed from the inner cavity of the mixing container 300, and for example, a sealing member may be disposed where the hole wall of the first through hole 310 is engaged with the first overflow pipe 400, so as to form a sliding seal. With the locking device 500 in the locked state, the first end of the first overflow pipe 400 may be fixed to the mixing vessel 300 by the locking device 500. Under the condition that the locking device 500 is in the unlocked state, the first end portion of the first overflow pipe 400 may be movably connected to the mixing container 300 through the locking device 500, and the first overflow pipe 400 may drive the overflow inlet of the first overflow pipe 400 to lift in the mixing container 300.
Specifically, the locking device 500 may be a device with a clamping function, the first end of the first overflow pipe 400 is clamped by the locking device 500, so that the first end of the first overflow pipe 400 may be fixed to the mixing container 300 by the locking device 500, and the first end of the first overflow pipe 400 is loosened by the locking device 500, so that the first end of the first overflow pipe 400 may be movably connected to the mixing container 300 by the locking device 500, and the first overflow pipe 400 may drive the overflow inlet of the first overflow pipe 400 to lift in the mixing container 300. Of course, the locking device 500 may also be a latch, and the first end of the first overflow pipe 400 may be provided with a plurality of jacks along the lifting direction, so as to achieve locking at different positions through the cooperation of the latch and the jacks.
By passing the second end of the first overflow pipe 400 through the bottom wall of the liquid mixing container 300 and lifting the overflow inlet of the first overflow pipe 400 in the liquid mixing container 300 in a lifting manner, the lifting of the overflow inlet of the first overflow pipe 400 in the liquid mixing container 300 can be adjusted by operating the locking device 500 positioned outside the liquid mixing container 300 under the premise of adjusting the preset height, and the first end of the first overflow pipe 400 is positioned outside the liquid mixing container 300, so that the liquid mixing container 300 has the advantage of convenient adjustment.
In other embodiments, to adjust the height of the overflow inlet of the first overflow line 400, the liquid mixing device may have a bellows, which may be disposed in the liquid mixing container 300, a first end of the bellows may be sealingly connected to the first through hole 310, the bellows may be sleeved on the first overflow line 400, a second end of the bellows may be sealingly connected to an outer port of the second end of the first overflow line 400, the first overflow line 400 may be a flexible tube, and the bellows and the first overflow line 400 may be driven to move in a telescopic manner by a driving mechanism to achieve lifting adjustment of the overflow inlet of the first overflow line 400.
Specifically, the first end portion of the first overflow pipe 400 may be a threaded portion, the locking device 500 may include a first nut 510, a second nut 520, and a bracket 530, the bracket 530 may be fixed on an outer side surface of the bottom wall of the liquid mixing container 300, the bracket 530 may be provided with a second through hole 531, the threaded portion may be disposed in the second through hole 531, the first nut 510 and the second nut 520 may be in threaded engagement with the threaded portion, and in the locked state, the first nut 510 and the second nut 520 respectively abut against surfaces of two opposite openings of the second through hole 531.
The first end of the first overflow pipeline 400 disclosed in the embodiment of the application can be a threaded part, the locking device 500 can comprise a first nut 510, a second nut 520 and a support 530, the support 530 can be fixed on the outer side surface of the bottom wall of the liquid mixing container 300, the support 530 can be provided with a second through hole 531, the threaded part can be arranged in the second through hole 531, the first nut 510 and the second nut 520 can be in threaded fit with the threaded part, so that the locking structure is relatively simple, and the locking device 500 has a loose-proof effect after being locked in a double-nut fit mode, so that the locking device 500 has a good locking effect.
In an alternative embodiment, a cylindrical member 610 may be disposed in the mixing container 300, the cylindrical member 610 may be fixed to an inner side surface of a bottom wall of the mixing container 300 and disposed around the first through hole 310, a bottom portion of the cylindrical member 610 may be connected to the inner side surface in a sealing manner, a second end portion of the first overflow pipe 400 may be disposed with an annular flange 410, the annular flange 410 is not higher than an overflow inlet of the first overflow pipe 400, an elastic sleeve 620 may be disposed between the annular flange 410 and a top portion of the cylindrical member 610, the elastic sleeve 620 may be sleeved outside the first overflow pipe 400, a first end portion of the elastic sleeve 620 is connected to the annular flange 410 in a sealing manner, and a second end portion of the elastic sleeve 620 is connected to the cylindrical member 610 in a sealing manner. The second end of the resilient sleeve 620 may be in sealing connection with the top of the barrel 610. The resilient sleeve 620 and the bowl 610 may seal the outer wall of the first overflow line 400 from the liquid in the mixing vessel 300.
The embodiment of the application discloses a specific sealing structure, so that the specific sealing structure can adapt to the lifting premise of the overflow inlet of the first overflow pipeline 400 to realize sealing. Because the cylindrical member 610 has a certain height, a shorter elastic sleeve 620 can be used, and the elastic sleeve 620 has better bending resistance and smaller disturbance, thereby being beneficial to improving the function of supporting the first overflow pipeline 400 in an auxiliary way.
Specifically, the elastic sleeve 620 may be a bellows, an elastic tube, or the like, and the bellows may be a resin bellows. In some cases, the barrel 610 and the elastic sleeve 620 may be replaced directly by a single bellows or elastic tube.
When the first liquid is input, overflow can only occur when the actual height of the first liquid is higher than the preset height, and if the first liquid is insufficiently input, the first liquid cannot overflow, and meanwhile the volume of the first liquid cannot meet the requirement of liquid mixing. To avoid insufficient first liquid input, the mixing device optionally further comprises a first liquid level sensor 710 and a controller. The first level sensor 710 may be provided to the mixing vessel 300. The first liquid level sensor 710 may be a capacitive sensor, and the capacitive sensor may penetrate through a wall of the mixing container 300 to enter the mixing container 300 to detect the liquid in the mixing container 300, and when the capacitive sensor detects the liquid, the capacitive sensor senses the liquid due to a change of capacitance. The first infusion tube 100 may be provided with the second switch valve 130, and the installation height of the first liquid level sensor 710 may be greater than a preset height, for example, may be greater than 4 to 6mm, although the installation height of the first liquid level sensor may be greater than the preset height or may be other heights. The controller may be connected to the first liquid level sensor 710 and the second switching valve 130, respectively, and the controller may control the second switching valve 130 to be closed in case the first liquid level sensor 710 is triggered. The second switching valve 130 may be an electrically controlled valve.
The embodiment of the application discloses a structure for controlling a first infusion tube 100 to stop supplying liquid when the actual liquid level of a first liquid is higher than a preset height, so that control is realized on the premise of ensuring that the input of the first liquid is enough, and the condition that the first liquid is insufficient can be better avoided.
In some embodiments, the mixing container 300 may be provided with an adjusting bracket 320, and the first liquid level sensor 710 may be movably disposed on the adjusting bracket 320, so that the position of the first liquid level sensor 710 in the height direction of the mixing container 300 may be adjustable. Specifically, the adjusting bracket 320 may be provided with a guide groove or a guide hole along the height direction of the liquid mixing container 300, and the first liquid level sensor 710 is slidably matched with the guide groove or the guide hole, so that the position of the first liquid level sensor 710 along the sliding direction of the guide groove or the guide hole in the height direction of the liquid mixing container 300 is adjustable.
In some cases, the first level sensor 710 may fail or the first switch valve 420 may fail to open, resulting in a continuous rise in the liquid level within the mixing vessel 300, and a risk of excessive liquid level. To avoid risk of excessive fluid level, an alternative embodiment may further include a second fluid level sensor 720, where the second fluid level sensor 720 may be positioned higher than the first fluid level sensor 710. The liquid mixing device may further include a second overflow pipe 810, an overflow inlet of the second overflow pipe 810 may be higher than an overflow inlet of the first overflow pipe 400 and communicate with the liquid mixing container 300, an overflow outlet of the second overflow pipe 810 may communicate with a factory end outside the liquid mixing container 300, and the second liquid level sensor 720 may be higher than an overflow inlet of the second overflow pipe 810. The second overflow line 810 may be provided with a third switching valve 811, and the controller may be connected to the third switching valve 811, and in case the second liquid level sensor 720 is triggered, the controller may control the third switching valve 811 to be opened so that the liquid in the mixing tank 300 overflows out of the mixing tank through the overflow inlet of the second overflow line 810.
By providing the second liquid level sensor 720 and the second overflow pipe 810, the second liquid level sensor 720 can be higher than the first liquid level sensor 710, so that the controller can control the third switch valve 811 to be opened when the second liquid level sensor 720 is triggered, so that the liquid in the mixed liquid container 300 overflows out of the mixed liquid container 300 through the overflow inlet of the second overflow pipe 810, thereby preventing the danger caused by the excessively high liquid level, and meanwhile, the second liquid level sensor 720 can also be used as a high liquid level sensor.
In other embodiments, the mixing container 300 may have a problem of leakage, for example, the mixing container 300 may be damaged due to welding, corrosion, etc. of the mixing container 300, so that an operator may be timely prompted to intervene when the mixing container 300 leaks, and optionally, the mixing device may further include a leakage prevention disc 820, a leakage sensor 840, and an information prompt device. The mixing container 300 may be provided in the leakage preventing tray 820, and the leakage sensor 840 may be provided in the leakage preventing tray 820. The information prompting device sends out prompting information when the liquid in the leak-proof tray 820 triggers the leak sensor 840. Specifically, when the liquid in the leak-proof tray 820 triggers the leak sensor 840, the liquid mixing container 300 may have a problem of leaking, so that the liquid in the liquid mixing container 300 leaks to the leak-proof tray 820, and the leak sensor 840 disposed on the leak-proof tray 820 may be triggered when detecting that the leak-proof tray 820 has liquid, so that the information prompt device may timely send prompt information, so that an operator may intervene in time.
In some cases, such as servicing the mixing vessel 300, it may be desirable to empty the mixing vessel 300. The liquid mixing device further comprises an evacuation pipeline 980 and an eighth switch valve 970, wherein a liquid inlet of the evacuation pipeline 980 is communicated with the bottom wall of the liquid mixing container 300, and when liquid in the liquid mixing container 300 needs to be evacuated, the eighth switch valve 970 is opened and then closed after liquid discharge is completed. In order to determine whether the liquid in the liquid mixing container 300 is empty, optionally, a liquid level sensor 730 is provided in the liquid mixing container 300, and the liquid level sensor 730 is provided inside the bottom wall of the liquid mixing container 300. The empty level sensor 730 is not triggered when the presence of liquid is detected and is triggered when the presence of liquid is not detected, so that whether or not the liquid in the liquid mixing container 300 is empty can be confirmed by the empty level sensor 730.
The second liquid used is different in different process environments and when a higher concentration of the second liquid is required, the volume of the second liquid required is relatively less, so that a more accurate control of the volume of the second liquid is required. In order to more precisely control the volume of the second liquid entering the mixing vessel 300, the second infusion tube 200 may optionally include a main tube 220, a first branch tube 230 and a second branch tube 240, the first branch tube 230 and the second branch tube 240 being connected in parallel, and both having one end communicating with the main tube 220 and the other end communicating with the mixing vessel 300. The first metering device 250 may be provided on the main pipe 220, the first branch pipe 230 may be provided with a fifth switching valve 231, the second branch pipe 240 may be provided with a second metering device 260, and the metering accuracy of the second metering device 260 may be greater than that of the first metering device 250. The second metering device 260 may be a positive displacement flow meter, an impeller flow meter, a momentum flow meter, or the like.
By providing the second transfer line 200 in a structure including the main pipe 220, the first branch pipe 230 and the second branch pipe 240 such that the first branch pipe 230 and the second branch pipe 240 form two branches connected in parallel, it is possible to use the first branch pipe 230 to transfer liquid to the mixing tank 300 in a conventional manner, or the first branch pipe 230 and the second branch pipe 240 together to transfer liquid to the mixing tank 300, and when it is necessary to perform more precise control of the volume of the required second liquid, the fifth switching valve 231 is controlled to be closed, and the liquid is transferred only to the mixing tank 300 through the second branch pipe 240, thereby making the volume of the second liquid transferred to the mixing tank 300 relatively more precise. Moreover, it is known that the higher the metering accuracy of the metering device, the higher the accuracy and the higher the price. In a conventional case, the second liquid may be inputted to the mixing vessel 300 only through the first branch pipe 230, and the frequency of use of the second metering device 260 may be reduced, so that the abrasion of the second metering device 260 may be reduced to some extent. The structure is suitable for mixed liquid under the condition that the second liquid is concentrated acid and the demand is small, and is favorable for ensuring the precision of conveying the second liquid.
Further, the second branch pipe 240 may be provided with a second liquid temporary storage tank 241, and the second metering device 260 may be a metering pump. The second liquid temporary storage tank 241 and the dosing pump are sequentially disposed in the liquid discharge direction of the second branch pipe 240. By providing the second liquid temporary storage tank 241, the second liquid can be directly stored in the second liquid temporary storage tank 241, so that the second liquid can be more quickly conveyed into the liquid mixing container 300 when the second liquid needs to be conveyed to the second metering device 260. In some cases, a different second liquid needs to be input into the mixing container 300, and the second liquid different from the main pipe 220 is stored in the second liquid temporary storage tank 241, so that the main pipe 220 can be prevented from being replaced or cleaned and then infused when a different second liquid is needed, and the mixing capability of the mixing device can be improved.
Further, when the second liquid is a liquid to be diluted, such as a concentrated acid, the first liquid is a diluting liquid, such as ultrapure water, which requires a smaller volume of the second liquid, such as 3ml. The dosing pump can inject 2ml to 6ml of the second liquid into the mixing container 300 each time, and the volume error of the second liquid injected into the mixing container 300 is 1%. Specifically, by controlling the dosing pump, the dosing pump can inject any whole volume of the second liquid between 2ml and 6ml into the mixing container 300 at a time, and any volume between 2ml and 6ml can also be the second liquid with the precision of 0.1 or 0.01 value, for example, 2.1ml, 2.01ml and the like. The error in the volume of the second liquid injected into the mixing vessel 300 is 1%, for example, when 2ml of the second liquid is required to be injected, the error is 1%, that is, the actual volume of the injected second liquid is between 1.98ml and 2.02 ml.
Optionally, the liquid mixing device may further include a gas pipe 850, where an exhaust end of the gas pipe 850 may be disposed at the bottom of the liquid mixing container 300 and is in communication with the liquid mixing container 300. After the first liquid and the second liquid are introduced into the liquid mixing container 300, the mixing of the first liquid and the second liquid in the liquid mixing container 300 can be accelerated by supplying the gas to the bottom of the liquid mixing container 300, and the gas pipe 850 is relatively simple to provide. The gas pipe 850 may be configured to convey an inert gas, or may be configured to convey another gas that does not react with the liquid in the mixing vessel 300.
Further, the air discharge end of the air pipe 850 may extend along the bottom wall of the mixing container 300, and the air discharge end may be provided with a plurality of air discharge holes, which may be in communication with the mixing container 300. By extending the exhaust end portion of the gas pipe 850 along the bottom wall of the liquid mixing container 300, the exhaust end portion is provided with a plurality of exhaust holes, which communicate with the liquid mixing container 300, so that the gas can be mixed together from a plurality of positions, and the mixing efficiency can be improved.
In some embodiments, the liquid mixing device further includes a gas exhaust pipe 860, a first end of the gas exhaust pipe 860 may be in communication with a top wall of the liquid mixing container 300, a second end of the gas exhaust pipe 860 may be in communication with an external atmosphere, and when the gas pipe 850 inputs gas into the liquid mixing container 300 to mix liquid, the gas in the liquid mixing container 300 may be exhausted from the gas exhaust pipe 860, so as to avoid the excessive air pressure in the liquid mixing container 300, thereby avoiding that the first liquid and the second liquid cannot enter the liquid mixing container 300 due to the excessive air pressure in the liquid mixing container 300, and avoiding damage to the liquid mixing container 300 due to the excessive air pressure in the liquid mixing container 300.
Alternatively, the air pipe 850 may be provided with a manual valve and an electric control valve, through which the on-off of the air pipe can be controlled, thereby making the control redundancy better.
The application also discloses semiconductor process equipment, which comprises the liquid mixing device disclosed in the embodiment.
In an embodiment, the mixing tank 300 may be a wafer rinse tank 900.
In other embodiments, the mixing vessel 300 is not used as a place to clean the wafer, but is merely a vessel in which mixing is performed. The semiconductor process apparatus may further include a wafer cleaning tank 900, and the wafer cleaning tank 900 may be in communication with the liquid mixture container 300 through a liquid mixture transfer pipe 930, and the liquid mixture transfer pipe 930 may be provided with a sixth switching valve 940.
Specifically, before the wafer cleaning tank 900 cleans the wafer, the sixth switch valve 940 needs to be closed, the first liquid and the second liquid are respectively input into the liquid mixing container 300 by the first liquid pipe 100 and the second liquid pipe 200, the specific infusion sequence can refer to the foregoing embodiment, after the input is completed, the input of the first liquid and the second liquid into the liquid mixing device is stopped, and after the first liquid and the second liquid are mixed in the liquid mixing container, the sixth switch valve 940 can be opened, so that the liquid in the liquid mixing device enters the wafer cleaning tank 900.
In the process of cleaning the wafer in the wafer cleaning tank 900, the mixed liquid in the wafer cleaning tank 900 is consumed, so that the mixed liquid needs to be replenished to the wafer cleaning tank 900 in the cleaning process, however, after the mixed liquid in the wafer cleaning tank 900 cleans the wafer for a period of time, the concentration of the mixed liquid in the wafer cleaning tank 900 is different from the concentration of the mixed liquid in the mixed liquid container 300, so that the mixed liquid cannot be directly replenished to the area where the wafer is located in order to ensure the uniformity of the wafer cleaning in the wafer cleaning tank 900. Therefore, the wafer cleaning tank 900 may include an inner tank 910 and an outer tank 920, the inner tank 910 may be located in the tank of the outer tank 920, the notch of the inner tank 910 may be lower than the notch of the outer tank 920, the bottom wall of the outer tank 920 and the bottom wall of the inner tank 910 are communicated through a pipeline, and a driving pump is provided to drive the mixed liquid of the outer tank 920 into the inner tank 910, so as to form a dynamic circulation process. When the mixed liquid container 300 conveys the mixed liquid to the wafer cleaning tank 900, the mixed liquid is conveyed to the inner tank 910 to overflow to the outer tank 920, and the liquid feeding is stopped when the liquid level of the outer tank 920 is at a preset liquid level, so that the process is started. The mixed liquid container 300 is also communicated with the outer tank 920 through a liquid supplementing pipeline 950, the liquid supplementing pipeline 950 is provided with a seventh switch valve 960, when liquid supplementing to the wafer cleaning tank 900 is required, the seventh switch valve 960 is opened, liquid supplementing to the outer tank 920 through the liquid supplementing pipeline 950 is carried out until the liquid supplementing is at a preset liquid level, the supplemented mixed liquid is not directly contacted with the wafer at the moment, and the mixed liquid of the outer tank 920 is mixed with the mixed liquid of the inner tank 910 through the action of a driving pump, so that all local areas of the mixed liquid of the inner tank 910 are relatively uniform, and the uniformity of cleaning the wafer is ensured.
The semiconductor processing apparatus further includes a frame 990, and the liquid mixing device and the wafer cleaning tank 900 are mounted on the frame 990, and the liquid mixing device can be mounted above the wafer cleaning tank 900, and the frame 990 facilitates the overall installation, transfer, etc. of the semiconductor processing apparatus.
The foregoing embodiments of the present invention mainly describe differences between the embodiments, and as long as there is no contradiction between different optimization features of the embodiments, the embodiments may be combined to form a better embodiment, and in view of brevity of line text, no further description is provided herein.
The embodiments of the present invention have been described above with reference to the accompanying drawings, but the present invention is not limited to the above-described embodiments, which are merely illustrative and not restrictive, and many forms may be made by those having ordinary skill in the art without departing from the spirit of the present invention and the scope of the claims, which are to be protected by the present invention.

Claims (13)

1. The liquid mixing device is characterized by comprising a first infusion tube (100), a second infusion tube (200), a liquid mixing container (300) and a first overflow pipeline (400); wherein:
the liquid discharge end of the first infusion tube (100) and the liquid discharge end of the second infusion tube (200) are both communicated with the liquid mixing container (300), an overflow inlet of the first overflow tube (400) is located at a preset height of the liquid mixing container (300), the first overflow tube (400) is provided with a first switch valve (420), and the first overflow tube (400) is movably arranged on the liquid mixing container (300) so that the preset height of the overflow inlet of the first overflow tube (400) in the liquid mixing container (300) is adjustable;
the bottom wall of the liquid mixing container (300) is provided with a first through hole (310), the first overflow pipeline (400) is matched with the first through hole (310), a first end part of the first overflow pipeline (400) is positioned outside the liquid mixing container (300), a second end part of the first overflow pipeline (400) is positioned inside the liquid mixing container (300), and a port of the second end part of the first overflow pipeline (400) is an overflow inlet of the first overflow pipeline (400);
a cylindrical part (610) is arranged in the liquid mixing container (300), the cylindrical part (610) is fixed with the inner side surface of the bottom wall and surrounds the first through hole (310), the bottom of the cylindrical part (610) is in sealing connection with the inner side surface, an annular flange (410) is arranged at the second end part of the first overflow pipeline (400), the annular flange (410) is not higher than an overflow inlet of the first overflow pipeline (400), an elastic sleeve (620) is arranged between the annular flange (410) and the top of the cylindrical part (610), the elastic sleeve (620) is sleeved outside the first overflow pipeline (400), the first end part of the elastic sleeve (620) is in sealing connection with the annular flange (410), and the second end part of the elastic sleeve (620) is in sealing connection with the cylindrical part (610);
the first infusion tube (100) is used for conveying first liquid into the liquid mixing container (300) in an emptying state, so that the actual liquid level of the first liquid is larger than the preset height and the first liquid can be discharged from an overflow inlet of the first overflow pipeline (400);
the second infusion tube (200) is provided with a first metering device (250), the second infusion tube (200) is used for conveying a preset volume of second liquid controlled by the first metering device (250) into the liquid mixing container (300) under the condition that the actual liquid level is reduced to the preset height, and the first switch valve (420) is in a closed state.
2. The liquid mixing device according to claim 1, wherein,
the liquid mixing device further comprises a locking device (500), the locking device (500) is connected to the liquid mixing container (300), the locking device (500) is matched with the first end part of the first overflow pipeline (400), and the first through hole (310) is sealed and isolated from the inner cavity of the liquid mixing container (300);
the first end of the first overflow line (400) is fixed to the mixing container (300) by the locking device (500) when the locking device (500) is in a locked state;
under the condition that the locking device (500) is in an unlocking state, the first end part of the first overflow pipeline (400) is movably connected with the liquid mixing container (300) through the locking device (500), and the first overflow pipeline (400) can drive an overflow inlet of the first overflow pipeline (400) to lift in the liquid mixing container (300).
3. The liquid mixing device according to claim 2, wherein the first end portion of the first overflow pipe (400) is a threaded portion, the locking device (500) comprises a first nut (510), a second nut (520) and a bracket (530), the bracket (530) is fixed on the outer side surface of the bottom wall of the liquid mixing container (300), the bracket (530) is provided with a second through hole (531), the threaded portion is arranged in the second through hole (531), the first nut (510) and the second nut (520) are in threaded fit with the threaded portion, and in the locked state, the first nut (510) and the second nut (520) respectively abut against the surfaces of two opposite openings of the second through hole (531).
4. The liquid mixing device according to claim 1, further comprising a first liquid level sensor (710) and a controller, wherein the first infusion tube (100) is provided with a second switching valve (130), the first liquid level sensor (710) is mounted at a height greater than the preset height, the controller is connected to the first liquid level sensor (710) and the second switching valve (130), respectively, and the controller controls the second switching valve (130) to be closed in case the first liquid level sensor (710) is triggered.
5. The liquid mixing device according to claim 4, wherein the liquid mixing container (300) is provided with an adjusting bracket, and the first liquid level sensor (710) is movably arranged on the adjusting bracket, so that the position of the first liquid level sensor (710) in the height direction of the liquid mixing container (300) is adjustable.
6. The liquid mixing device according to claim 4, further comprising a second liquid level sensor (720), the second liquid level sensor (720) being higher than the first liquid level sensor (710), the liquid mixing device further comprising a second overflow line (810), an overflow inlet of the second overflow line (810) being higher than an overflow inlet of the first overflow line (400) and being in communication with the liquid mixing container (300), the second overflow line (810) being provided with a third switching valve (811), the controller being connected to the third switching valve (811), the controller controlling the third switching valve (811) to open in case the second liquid level sensor (720) is triggered.
7. The liquid mixing device according to claim 1, further comprising a leak-proof plate (820), a leak sensor (840) and an information prompt device, wherein the liquid mixing container (300) is arranged in the leak-proof plate (820), the leak sensor (840) is arranged in the leak-proof plate (820), and the information prompt device sends prompt information when liquid in the leak-proof plate (820) triggers the leak sensor (840).
8. The liquid mixing device according to claim 1, wherein the second infusion tube (200) comprises a main tube (220), a first branch tube (230) and a second branch tube (240), the first branch tube (230) and the second branch tube (240) are connected in parallel, and one end of each of the two is communicated with the main tube (220), and the other end is communicated with the liquid mixing container (300); the first metering device (250) is arranged on the main pipe (220), the first branch pipe (230) is provided with a fifth switch valve (231), the second branch pipe (240) is provided with a second metering device (260), and the metering precision of the second metering device (260) is greater than that of the first metering device (250).
9. The liquid mixing device according to claim 8, wherein the second branch pipe (240) is provided with a second liquid temporary storage tank (241), the second metering device (260) is a dosing pump, and the second liquid temporary storage tank (241) and the dosing pump are sequentially arranged in a liquid discharge direction of the second branch pipe (240).
10. The liquid mixing device according to claim 9, wherein the second liquid is a liquid to be diluted, the dosing pump can inject 2ml to 6ml of the second liquid into the liquid mixing container (300) at a time, and the volumetric error of the second liquid injected into the liquid mixing container (300) is 1%.
11. The liquid mixing device according to claim 1, further comprising a gas pipe (850), wherein a gas discharge end of the gas pipe (850) is provided at a bottom of the liquid mixing container (300) and is in communication with the liquid mixing container (300).
12. The liquid mixing device according to claim 11, wherein a gas discharge end portion of the gas delivery pipe (850) extends along a bottom wall of the liquid mixing container (300), the gas discharge end portion being provided with a plurality of gas discharge holes, the plurality of gas discharge holes being in communication with the liquid mixing container (300).
13. A semiconductor process apparatus comprising a wafer cleaning tank (900) and the liquid mixing device according to any one of claims 1 to 12, wherein the wafer cleaning tank (900) is in communication with the liquid mixing container (300) via a liquid mixing delivery pipe (930), and the liquid mixing delivery pipe (930) is provided with a sixth switch valve (940).
CN202210884013.4A 2022-07-26 2022-07-26 Liquid mixing device and semiconductor process equipment Active CN115178120B (en)

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Publication number Priority date Publication date Assignee Title
JPH0775727A (en) * 1993-06-25 1995-03-20 Sony Corp Device for blending liquids
JP2001267288A (en) * 2000-03-21 2001-09-28 Dainippon Screen Mfg Co Ltd Substrate treating apparatus
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CN208689446U (en) * 2018-10-17 2019-04-02 山东祥弘节能环保科技有限公司 Height-adjustable overflow mechanism
CN111061307A (en) * 2018-10-17 2020-04-24 山东祥弘节能环保科技有限公司 Height-adjustable overflow device
CN112827376A (en) * 2020-12-31 2021-05-25 上海至纯洁净系统科技股份有限公司 Method for controlling concentration of mixed acid in semiconductor wet cleaning solution
CN215586009U (en) * 2020-12-31 2022-01-21 上海至纯洁净系统科技股份有限公司 Mixed acid system for semiconductor wet process

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0775727A (en) * 1993-06-25 1995-03-20 Sony Corp Device for blending liquids
JP2001267288A (en) * 2000-03-21 2001-09-28 Dainippon Screen Mfg Co Ltd Substrate treating apparatus
EP1787712A1 (en) * 2005-11-17 2007-05-23 Sika Technology AG Mixing device for liquids
CN208689446U (en) * 2018-10-17 2019-04-02 山东祥弘节能环保科技有限公司 Height-adjustable overflow mechanism
CN111061307A (en) * 2018-10-17 2020-04-24 山东祥弘节能环保科技有限公司 Height-adjustable overflow device
CN112827376A (en) * 2020-12-31 2021-05-25 上海至纯洁净系统科技股份有限公司 Method for controlling concentration of mixed acid in semiconductor wet cleaning solution
CN215586009U (en) * 2020-12-31 2022-01-21 上海至纯洁净系统科技股份有限公司 Mixed acid system for semiconductor wet process

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