CN215586009U - Mixed acid system for semiconductor wet process - Google Patents
Mixed acid system for semiconductor wet process Download PDFInfo
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- CN215586009U CN215586009U CN202023322381.5U CN202023322381U CN215586009U CN 215586009 U CN215586009 U CN 215586009U CN 202023322381 U CN202023322381 U CN 202023322381U CN 215586009 U CN215586009 U CN 215586009U
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Abstract
The utility model discloses an acid mixing system for a semiconductor wet process, which comprises a groove type wet cleaning device and an acid mixing device, wherein the acid mixing device comprises a shell, a gas circuit unit and a liquid circuit unit which are respectively arranged in different cavities in the shell; the gas circuit unit is used for controlling the pipeline pressure of the liquid circuit unit; the liquid path unit comprises a plurality of liquid inlet pipes, a liquid mixing valve, a liquid discharge pipe and a liquid outlet pipe, wherein the liquid inlet pipes are used for conveying different liquids into the liquid mixing valve for instantaneous mixing, and the liquid inlet pipes are connected to a liquid inlet of the liquid mixing valve in parallel; and the liquid discharge pipe and the liquid outlet pipe are respectively connected to a liquid outlet of the liquid mixing valve, and the liquid outlet pipe is used for conveying the uniformly mixed liquid in the liquid mixing valve to a cleaning tank of the groove type wet cleaning equipment. The utility model can accurately control the concentration of the mixed acid in the wet cleaning solution, improves the proportioning precision of the reactive solution and also can greatly improve the proportioning efficiency of the reactive solution.
Description
Technical Field
The utility model relates to the technical field of semiconductor process equipment, in particular to an acid mixing system for a semiconductor wet process.
Background
In a semiconductor process or a semiconductor process, various reactive liquids, such as acid solution, alkali solution, organic solution, etc., are used, and particularly in a semiconductor wet process, a mixed solution of the reactive liquids is often used.
When preparing the mixed solution required by the semiconductor wet process, at present, pipelines for conveying different reactive solutions are generally connected to a cleaning tank of the tank type wet cleaning equipment, and the different reactive solutions are mixed in the cleaning tank. The mode not only can cause too many pipelines in the cleaning tank and occupy a large amount of space, but also is difficult to control the proportioning precision of different reactive solutions in the cleaning tank, and simultaneously, the uniform mixing of the different reactive solutions also consumes a large amount of time.
Disclosure of Invention
In view of the above, the present invention provides a mixed acid system for semiconductor wet process, which is used to solve the above problems in the prior art.
A mixed acid system for semiconductor wet process comprises a groove type wet cleaning device and a mixed acid device,
the acid mixing device comprises a shell, and a gas circuit unit and a liquid circuit unit which are respectively arranged in different cavities in the shell; the gas circuit unit is used for controlling the pipeline pressure of the liquid circuit unit; the liquid path unit comprises a plurality of liquid inlet pipes, a liquid mixing valve, a liquid discharge pipe and a liquid outlet pipe, wherein the liquid inlet pipes are used for conveying different liquids into the liquid mixing valve for instantaneous mixing, and the liquid inlet pipes are connected to a liquid inlet of the liquid mixing valve in parallel; the liquid discharge pipe and the liquid outlet pipe are respectively connected to a liquid outlet of the liquid mixing valve, and the liquid outlet pipe is used for conveying the uniformly mixed liquid in the liquid mixing valve to a cleaning tank of the groove type wet cleaning equipment.
Preferably, a liquid path hand valve, a first pressure maintaining valve for adjusting the pressure of the liquid path inside the liquid inlet pipe, a flow meter for monitoring the liquid flow inside the liquid inlet pipe, a second pressure maintaining valve for adjusting the liquid flow inside the liquid inlet pipe according to the control of the gas path unit, and a first switch valve for changing the on-off state of the liquid path inside the liquid inlet pipe according to the control of the gas path unit are sequentially arranged on the liquid path of the liquid inlet pipe along the liquid flowing direction;
the liquid discharge pipe is provided with a second switch valve for controlling the on-off of a pipeline of the liquid discharge pipe;
and a third switch valve for controlling the on-off of the pipeline of the liquid outlet pipe is arranged on the liquid outlet pipe.
Preferably, the gas circuit unit comprises a first pressure regulating gas pipe, a second pressure regulating gas pipe and a third pressure regulating gas pipe, and the first pressure regulating gas pipe, the second pressure regulating gas pipe and the third pressure regulating gas pipe are respectively arranged in different cavities.
Preferably, the pipeline structure of the first pressure regulating air pipe is the same as that of the third pressure regulating air pipe, a first air path hand valve, a first pressure regulating valve, a first air filter and a plurality of electromagnetic proportional valves are sequentially arranged on the pipeline along the air flowing direction,
the plurality of electromagnetic proportional valves on the first pressure regulating air pipe are respectively connected with the second pressure stabilizing valves on the liquid inlet pipes through air pipes;
and a plurality of electromagnetic proportional valves on the third pressure regulating air pipe are respectively connected with the first pressure stabilizing valves on the liquid inlet pipes through air pipes.
Preferably, a second air path hand valve, a second pressure regulating valve, a second air filter and a plurality of electromagnetic valves are sequentially installed on the pipeline of the second pressure regulating air pipe along the air flowing direction, and the plurality of electromagnetic valves are respectively connected with the first switch valve, the second switch valve and the third switch valve through air pipes.
Preferably, a bypass pipe is connected to one of the liquid inlet pipes.
Preferably, a pump is further arranged on the liquid inlet pipe.
Preferably, the acid mixing device is also provided with a controller.
The utility model has the beneficial effects that:
1. the acid mixing system has a simple structure, is convenient to install and use, can reduce pipelines in the cleaning tank, not only saves the process cost, but also reduces a large amount of occupied space of the pipelines.
2. The acid mixing device adopted by the utility model can accurately control the concentration of mixed acid in the wet cleaning solution, improves the matching precision of the reactive solution, can also greatly improve the matching efficiency of the reactive solution, solves the problem of unstable execution of the wet process caused by excessive or insufficient mixing of acid liquor, and effectively improves the performance and cleaning capability of the wet process.
3. The acid mixing device adopted by the utility model is an independent modularized device, can be applied to liquid preparation of various wet processes, and meanwhile, when the wet liquid is prepared, the acid mixing device is only required to be connected with groove type cleaning equipment or single-chip type cleaning equipment, so that the installation is very convenient, and the equipment integration capacity of the whole wet process production line is greatly improved.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings needed to be used in the embodiments will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts.
Fig. 1 is a piping diagram of a liquid path unit.
Fig. 2 is a piping diagram of the first pressure-regulating gas pipe or the third pressure-regulating gas pipe.
Fig. 3 is a piping diagram of the second pressure-regulating gas pipe.
FIG. 4 is a schematic diagram of the acid mixing apparatus.
The reference numerals in the figures have the meaning:
the air conditioner comprises a shell, a first air path hand valve 1, a first pressure regulating valve 2, a first air filter 3, an electromagnetic proportional valve 4, a second air path hand valve 5, a second pressure regulating valve 6, a second air filter 7, an electromagnetic valve 8, a liquid mixing valve 9, a liquid discharge pipe 10, a liquid discharge pipe 11, a liquid inlet pipe 12, a liquid path hand valve 13, a first pressure stabilizing valve 14, a flow meter 15, a second pressure stabilizing valve 16, a first switch valve 17, a second switch valve 18, a third switch valve 19, a bypass pipe 20 and a shell 21.
Detailed Description
For better understanding of the technical solutions of the present invention, the following detailed descriptions of the embodiments of the present invention are provided with reference to the accompanying drawings.
It should be understood that the described embodiments are only some embodiments of the utility model, and not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
The present application is described in further detail below with reference to specific embodiments and with reference to the attached drawings.
In the description of the present application, unless explicitly stated or limited otherwise, the terms "first", "second", and the like are used for descriptive purposes only and are not to be construed as indicating or implying relative importance; the term "plurality" means two or more unless specified or indicated otherwise; the terms "connected," "fixed," and the like are to be construed broadly and may, for example, be fixedly connected, detachably connected, integrally connected, or electrically connected; may be directly connected or indirectly connected through an intermediate. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.
The utility model provides an acid mixing system for a semiconductor wet process, which comprises a groove type wet cleaning device and an acid mixing device.
The acid mixing device comprises a shell 21, and an air path unit and a liquid path unit which are respectively arranged in different cavities in the shell 21.
The gas circuit unit is used for controlling the pipeline pressure of the liquid circuit unit.
The gas circuit unit comprises a first pressure regulating gas pipe, a second pressure regulating gas pipe and a third pressure regulating gas pipe, and the first pressure regulating gas pipe, the second pressure regulating gas pipe and the third pressure regulating gas pipe are respectively arranged in different cavities.
The pipeline structure of the first pressure regulating air pipe is the same as that of the third pressure regulating air pipe, and a first air hand valve 1, a first pressure regulating valve 2, a first air filter 3 and a plurality of electromagnetic proportional valves 4 are sequentially arranged on the two pipelines along the air flowing direction.
The electromagnetic proportional valves on the first pressure regulating air pipe are respectively connected with the second pressure stabilizing valves on the liquid inlet pipes through air pipes, the number of the electromagnetic proportional valves 4 on the first pressure regulating air pipe is the same as that of the second pressure stabilizing valves in the liquid path unit, namely, one electromagnetic proportional valve 4 correspondingly controls only one second pressure stabilizing valve.
The electromagnetic proportional valves on the third pressure regulating air pipe are respectively connected with the first pressure stabilizing valves on the liquid inlet pipes through air pipes, the number of the electromagnetic proportional valves 4 on the third pressure regulating air pipe is the same as that of the first pressure stabilizing valves in the liquid path unit, namely, one electromagnetic proportional valve 4 correspondingly controls only one first pressure stabilizing valve.
And a second air path hand valve 5, a second pressure regulating valve 6, a second air filter 7 and a plurality of electromagnetic valves 8 are sequentially arranged on the pipeline of the second pressure regulating air pipe along the air flowing direction, the number of the electromagnetic valves 8 is the same as that of the switch valves, and one electromagnetic valve correspondingly controls only one switch valve.
The liquid path unit comprises a liquid mixing valve 9, a liquid discharge pipe 10, a liquid outlet pipe 11 and a plurality of liquid inlet pipes 12, wherein the liquid discharge pipe 10 and the liquid outlet pipe 11 are respectively connected to a liquid outlet of the liquid mixing valve 9, and the plurality of liquid inlet pipes 12 are connected to a liquid inlet of the liquid mixing valve 9 in parallel.
A plurality of inlet pipes 12 are used to feed different liquids into the mixing valve 9 for instantaneous mixing. In order to prevent the proportion of the mixed liquid in the liquid mixing valve from not meeting the requirement of the set proportion when the liquid mixing is started, the mixed liquid obtained by mixing in the first n minutes in the liquid mixing valve 9 needs to be discharged through the liquid discharge pipe 10, and then the mixed liquid is discharged into the equipment tank through the liquid discharge pipe 11.
A liquid path hand valve 13, a first pressure maintaining valve 14, a flow meter 15, a second pressure maintaining valve 16 and a first switch valve 17 for changing the on-off of the pipeline of the liquid inlet pipe 12 according to the control of the gas path unit are sequentially arranged on the pipeline of each liquid inlet pipe 12 along the liquid flowing direction.
The first pressure stabilizing valve 14 mainly plays a role in stabilizing pressure and is used for stabilizing the pressure of a pipeline in the liquid inlet pipe 12 at a set pressure, the first pressure stabilizing valve 14 is connected with an electromagnetic proportional valve on a third pressure regulating air pipe through an air pipe, the electromagnetic proportional valve is electrically connected with a controller, and the controller can control the pressure of the electromagnetic proportional valve so as to change the liquid inlet pressure of the first pressure stabilizing valve and stabilize the pressure of the pipeline in the liquid inlet pipe at the set value.
The second pressure maintaining valve 16 is used for adjusting the liquid flow in the liquid inlet pipe 12 according to the control of the gas circuit unit. Specifically, the second pressure maintaining valve 16 is connected with the electromagnetic proportional valve 4 on the first pressure regulating gas pipe through a gas pipe, and the electromagnetic proportional valve 4 is electrically connected with the controller. The controller can be a controller in a semiconductor wet process, and can also be an independent controller arranged on the acid mixing device. The controller can control the pressure of the electromagnetic proportional valve 4 to change the liquid inlet pressure of the second pressure stabilizing valve 16, and the liquid flow in the liquid inlet pipe 12 is adjusted through the pressure change.
The flow meter 15 is used for monitoring the liquid flow in the liquid inlet pipe 12 in real time and transmitting the detected signal to the controller, and the flow meter 15 is electrically connected with the controller. When the flow meter 15 detects that the liquid flow in the liquid inlet pipe 12 is lower than or higher than a set value, the controller controls the alarm to send out an alarm signal so as to prompt a worker that the liquid preparation fails.
Preferably, a pump is further disposed on the liquid inlet pipe 12.
The liquid discharge pipe 10 is connected to a liquid outlet of the liquid mixing valve 9 and is used for discharging the mixed liquid obtained in the first n minutes in the liquid mixing valve 9, and the second switch valve 18 is installed on the liquid discharge pipe 10.
The liquid outlet pipe 11 is connected to another liquid outlet of the liquid mixing valve 9 and used for conveying mixed liquid with a mixing ratio meeting a set requirement to an equipment tank of the tank type wet cleaning equipment, and the liquid outlet pipe 11 is provided with a third switch valve 19.
The first switch valve 17, the second switch valve 18 and the third switch valve 19 are respectively connected with the corresponding electromagnetic valves 8 on the second pressure regulating air pipe through air pipes. The electromagnetic valve 8 is used for controlling the on-off of the corresponding switch valve connected with the electromagnetic valve, thereby controlling the on-off of the corresponding pipeline.
In this embodiment, the liquid path unit is provided with three liquid inlet pipes 12, the three liquid inlet pipes 12 are respectively used for conveying ammonia water, hydrogen peroxide and deionized water, and the bypass pipe 20 is connected to the liquid inlet pipe for conveying deionized water. In order to ensure the activity of the deionized water in the inlet pipe, the bypass pipe 20 is always in an open state.
When the mixed acid solution needs to be prepared, the controller sends a control signal to the electromagnetic valves PV101-PV104 (wherein PV101-PV103 are respectively used for controlling the on-off of the three first switch valves 17, and PV104 is used for controlling the on-off of the second switch valve 18), the electromagnetic valves PV101-PV104 open the first switch valves 17 on the three liquid inlet pipes and the second switch valves 18 on the liquid outlet pipe 10 according to the received control signal, and ammonia water, hydrogen peroxide and deionized water are respectively conveyed to the liquid inlet pipes 12 corresponding to the electromagnetic valves PV101-PV 104;
meanwhile, the controller respectively controls three electromagnetic proportional valves on the third pressure regulating gas pipe, so that each electromagnetic proportional valve respectively controls the liquid inlet pressure of the corresponding first pressure stabilizing valve 14, and the pipeline pressure of the three liquid inlet pipes is adjusted to a set value through the first pressure stabilizing valves 14; then, the controller controls the pressure of the three electromagnetic proportional valves 4 on the first pressure regulating air pipe to change the air pressure of the corresponding second pressure stabilizing valve 16, so that each second pressure stabilizing valve 16 adjusts the liquid flow rate in the corresponding liquid inlet pipe.
The liquid delivered in the three liquid inlet pipes 12 is instantly mixed in the liquid mixing valve 9, and in order to prevent the proportion of the mixed liquid in the liquid mixing valve 9 from not reaching the set proportion requirement when the liquid mixing is just started, the mixed liquid obtained by mixing in the liquid mixing valve 9 is discharged through the liquid discharge pipe 10 within the set time.
When the set time is over, the flow meters 15 on the three liquid inlet pipes 12 transmit the pipeline flow of the corresponding pipeline detected in real time to the controller, and the controller processes the received signals and judges whether the liquid flow proportion in the three liquid inlet pipes meets the set proportion requirement.
If the liquid flow proportions in the three liquid inlet pipes reach the set proportion requirement, the liquid mixing is successful, the concentration of mixed acid reaches the requirement, the controller controls the electromagnetic valve PV105 to open the third switch valve 19 on the liquid outlet pipe 11, and controls the electromagnetic valve PV104 to close the second switch valve 18 on the liquid outlet pipe 10, so that the mixed liquid in the mixed liquid valve 9 is discharged into the equipment tank of the tank type wet cleaning equipment from the liquid outlet pipe 11;
if the liquid flow proportion in the three liquid inlet pipes does not reach the set proportion requirement, the liquid mixing failure is indicated, and the controller can control the alarm to send out an alarm signal so as to prompt a worker that the liquid preparation fails.
In this embodiment, the controller may be a PLC controller.
The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the utility model, and any modifications, equivalents, improvements and the like made within the spirit and principle of the present invention should be included in the scope of the present invention.
Claims (8)
1. A mixed acid system for semiconductor wet process is characterized in that the mixed acid system comprises a groove type wet cleaning device and a mixed acid device,
the acid mixing device comprises a shell, and a gas circuit unit and a liquid circuit unit which are respectively arranged in different cavities in the shell; the gas circuit unit is used for controlling the pipeline pressure of the liquid circuit unit; the liquid path unit comprises a plurality of liquid inlet pipes, a liquid mixing valve, a liquid discharge pipe and a liquid outlet pipe, wherein the liquid inlet pipes are used for conveying different liquids into the liquid mixing valve for instantaneous mixing, and the liquid inlet pipes are connected to a liquid inlet of the liquid mixing valve in parallel; the liquid discharge pipe and the liquid outlet pipe are respectively connected to a liquid outlet of the liquid mixing valve, and the liquid outlet pipe is used for conveying the uniformly mixed liquid in the liquid mixing valve to a cleaning tank of the groove type wet cleaning equipment.
2. The acid mixing system for the semiconductor wet process according to claim 1, wherein a liquid path hand valve, a first pressure maintaining valve for adjusting the pressure of the liquid path inside the liquid path pipe, a flow meter for monitoring the liquid flow inside the liquid path pipe, a second pressure maintaining valve for adjusting the liquid flow inside the liquid path pipe according to the control of the gas path unit, and a first switch valve for changing the on-off state of the liquid path pipe according to the control of the gas path unit are sequentially installed on the liquid path pipe of the liquid path pipe along the liquid flow direction;
the liquid discharge pipe is provided with a second switch valve for controlling the on-off of a pipeline of the liquid discharge pipe;
and a third switch valve for controlling the on-off of the pipeline of the liquid outlet pipe is arranged on the liquid outlet pipe.
3. The acid mixing system for the semiconductor wet process according to claim 2, wherein the gas circuit unit comprises a first pressure regulating gas pipe, a second pressure regulating gas pipe and a third pressure regulating gas pipe, and the first pressure regulating gas pipe, the second pressure regulating gas pipe and the third pressure regulating gas pipe are respectively arranged in different chambers.
4. The acid mixing system for the semiconductor wet process according to claim 3, wherein the pipeline structure of the first pressure regulating air pipe is the same as that of the third pressure regulating air pipe, a first air path hand valve, a first pressure regulating valve, a first air filter and a plurality of electromagnetic proportional valves are sequentially arranged on the pipeline along the gas flowing direction,
the plurality of electromagnetic proportional valves on the first pressure regulating air pipe are respectively connected with the second pressure stabilizing valves on the liquid inlet pipes through air pipes;
and a plurality of electromagnetic proportional valves on the third pressure regulating air pipe are respectively connected with the first pressure stabilizing valves on the liquid inlet pipes through air pipes.
5. The acid mixing system for the semiconductor wet process according to claim 3, wherein a second gas path hand valve, a second pressure regulating valve, a second air filter and a plurality of electromagnetic valves are sequentially installed on the pipeline of the second pressure regulating gas pipe along the gas flowing direction, and the plurality of electromagnetic valves are respectively connected with the first switch valve, the second switch valve and the third switch valve through gas pipes.
6. The mixed acid system for semiconductor wet process according to claim 1, wherein a bypass pipe is connected to one of the liquid inlet pipes.
7. The mixed acid system for semiconductor wet process according to claim 1, wherein a pump is further disposed on the liquid inlet pipe.
8. The acid mixing system for semiconductor wet process according to claim 1, wherein the acid mixing device is further configured with a controller.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202023322381.5U CN215586009U (en) | 2020-12-31 | 2020-12-31 | Mixed acid system for semiconductor wet process |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202023322381.5U CN215586009U (en) | 2020-12-31 | 2020-12-31 | Mixed acid system for semiconductor wet process |
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| CN215586009U true CN215586009U (en) | 2022-01-21 |
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| CN202023322381.5U Active CN215586009U (en) | 2020-12-31 | 2020-12-31 | Mixed acid system for semiconductor wet process |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115178120A (en) * | 2022-07-26 | 2022-10-14 | 北京北方华创微电子装备有限公司 | Liquid mixing device and semiconductor process equipment |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115178120A (en) * | 2022-07-26 | 2022-10-14 | 北京北方华创微电子装备有限公司 | Liquid mixing device and semiconductor process equipment |
| CN115178120B (en) * | 2022-07-26 | 2023-12-22 | 北京北方华创微电子装备有限公司 | Liquid mixing device and semiconductor process equipment |
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