CN115073507A - 一种无溶剂参与制备二(二乙基氨基)硅烷的方法 - Google Patents
一种无溶剂参与制备二(二乙基氨基)硅烷的方法 Download PDFInfo
- Publication number
- CN115073507A CN115073507A CN202210787023.6A CN202210787023A CN115073507A CN 115073507 A CN115073507 A CN 115073507A CN 202210787023 A CN202210787023 A CN 202210787023A CN 115073507 A CN115073507 A CN 115073507A
- Authority
- CN
- China
- Prior art keywords
- silane
- diethylamino
- bis
- solvent
- reaction kettle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- OWKFQWAGPHVFRF-UHFFFAOYSA-N n-(diethylaminosilyl)-n-ethylethanamine Chemical compound CCN(CC)[SiH2]N(CC)CC OWKFQWAGPHVFRF-UHFFFAOYSA-N 0.000 title claims abstract description 47
- 238000000034 method Methods 0.000 title claims abstract description 34
- 239000002904 solvent Substances 0.000 title claims abstract description 16
- 238000006243 chemical reaction Methods 0.000 claims abstract description 84
- 239000000047 product Substances 0.000 claims abstract description 15
- 238000001914 filtration Methods 0.000 claims abstract description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 38
- 239000000706 filtrate Substances 0.000 claims description 25
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 claims description 24
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 claims description 21
- 239000007789 gas Substances 0.000 claims description 19
- 229910052757 nitrogen Inorganic materials 0.000 claims description 19
- 238000003756 stirring Methods 0.000 claims description 17
- 239000007787 solid Substances 0.000 claims description 12
- 238000000746 purification Methods 0.000 claims description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 9
- 238000002360 preparation method Methods 0.000 claims 8
- 239000006227 byproduct Substances 0.000 abstract description 6
- 239000002994 raw material Substances 0.000 abstract description 5
- 229910021645 metal ion Inorganic materials 0.000 abstract description 3
- 238000003786 synthesis reaction Methods 0.000 abstract description 3
- 238000009776 industrial production Methods 0.000 abstract 1
- 239000010408 film Substances 0.000 description 10
- 238000007599 discharging Methods 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 5
- CBPYOHALYYGNOE-UHFFFAOYSA-M potassium;3,5-dinitrobenzoate Chemical compound [K+].[O-]C(=O)C1=CC([N+]([O-])=O)=CC([N+]([O-])=O)=C1 CBPYOHALYYGNOE-UHFFFAOYSA-M 0.000 description 5
- 229910052581 Si3N4 Inorganic materials 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 230000009286 beneficial effect Effects 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 125000005265 dialkylamine group Chemical group 0.000 description 4
- SNRUBQQJIBEYMU-UHFFFAOYSA-N dodecane Chemical compound CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000002243 precursor Substances 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L Magnesium chloride Chemical compound [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 description 2
- VOSJXMPCFODQAR-UHFFFAOYSA-N ac1l3fa4 Chemical compound [SiH3]N([SiH3])[SiH3] VOSJXMPCFODQAR-UHFFFAOYSA-N 0.000 description 2
- 238000000231 atomic layer deposition Methods 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000007810 chemical reaction solvent Substances 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000004927 clay Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- VYIRVGYSUZPNLF-UHFFFAOYSA-N n-(tert-butylamino)silyl-2-methylpropan-2-amine Chemical compound CC(C)(C)N[SiH2]NC(C)(C)C VYIRVGYSUZPNLF-UHFFFAOYSA-N 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 239000005046 Chlorosilane Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- RTCWKUOBAKIBGZ-UHFFFAOYSA-N N-[ethyl(methyl)amino]silyl-N-methylethanamine Chemical compound CCN(C)[SiH2]N(C)CC RTCWKUOBAKIBGZ-UHFFFAOYSA-N 0.000 description 1
- BIVNKSDKIFWKFA-UHFFFAOYSA-N N-propan-2-yl-N-silylpropan-2-amine Chemical compound CC(C)N([SiH3])C(C)C BIVNKSDKIFWKFA-UHFFFAOYSA-N 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- RWSLHLQWGULCLI-UHFFFAOYSA-N [amino(ethyl)silyl]ethane Chemical compound CC[SiH](N)CC RWSLHLQWGULCLI-UHFFFAOYSA-N 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 208000012839 conversion disease Diseases 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000001095 inductively coupled plasma mass spectrometry Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910001629 magnesium chloride Inorganic materials 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910001510 metal chloride Inorganic materials 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- OOXOBWDOWJBZHX-UHFFFAOYSA-N n-(dimethylaminosilyl)-n-methylmethanamine Chemical compound CN(C)[SiH2]N(C)C OOXOBWDOWJBZHX-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000001172 regenerating effect Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/025—Silicon compounds without C-silicon linkages
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
Abstract
Description
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202210787023.6A CN115073507A (zh) | 2022-07-04 | 2022-07-04 | 一种无溶剂参与制备二(二乙基氨基)硅烷的方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202210787023.6A CN115073507A (zh) | 2022-07-04 | 2022-07-04 | 一种无溶剂参与制备二(二乙基氨基)硅烷的方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN115073507A true CN115073507A (zh) | 2022-09-20 |
Family
ID=83258036
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202210787023.6A Pending CN115073507A (zh) | 2022-07-04 | 2022-07-04 | 一种无溶剂参与制备二(二乙基氨基)硅烷的方法 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN115073507A (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2024067469A1 (zh) * | 2022-09-26 | 2024-04-04 | 江苏南大光电材料股份有限公司 | 一种二烷基氨基硅烷的制备方法及其用途 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1517352A (zh) * | 2003-01-15 | 2004-08-04 | �����Ʒ�뻯ѧ��˾ | 双(叔丁氨基)硅烷的生产和纯化方法 |
KR20140093915A (ko) * | 2014-06-30 | 2014-07-29 | 주식회사 유피케미칼 | 디클로로실란을 이용한 알킬아미노실란의 제조 방법 |
JP2018052862A (ja) * | 2016-09-29 | 2018-04-05 | 信越化学工業株式会社 | シラザン化合物の製造方法 |
CN114573628A (zh) * | 2022-04-13 | 2022-06-03 | 洛阳中硅高科技有限公司 | 胺基硅烷的制备系统和方法 |
-
2022
- 2022-07-04 CN CN202210787023.6A patent/CN115073507A/zh active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1517352A (zh) * | 2003-01-15 | 2004-08-04 | �����Ʒ�뻯ѧ��˾ | 双(叔丁氨基)硅烷的生产和纯化方法 |
KR20140093915A (ko) * | 2014-06-30 | 2014-07-29 | 주식회사 유피케미칼 | 디클로로실란을 이용한 알킬아미노실란의 제조 방법 |
JP2018052862A (ja) * | 2016-09-29 | 2018-04-05 | 信越化学工業株式会社 | シラザン化合物の製造方法 |
CN114573628A (zh) * | 2022-04-13 | 2022-06-03 | 洛阳中硅高科技有限公司 | 胺基硅烷的制备系统和方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2024067469A1 (zh) * | 2022-09-26 | 2024-04-04 | 江苏南大光电材料股份有限公司 | 一种二烷基氨基硅烷的制备方法及其用途 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN100516289C (zh) | 有机金属化合物 | |
CN102574884A (zh) | 高分子量烷基-烯丙基三羰基钴配合物及其用于制备介电薄膜的用途 | |
KR20180063754A (ko) | 주석 화합물, 그의 합성 방법, ald용 주석 전구체 화합물 및 함주석 물질막의 형성 방법 | |
CN115073507A (zh) | 一种无溶剂参与制备二(二乙基氨基)硅烷的方法 | |
US11028108B2 (en) | Method for producing dialkylaminosilane | |
US20180044358A1 (en) | Method for producing dialkylaminosilane | |
CN102417517A (zh) | 四(二甲胺基)铪的合成方法 | |
TW201605877A (zh) | 單胺基矽烷化合物 | |
CN115260223A (zh) | 无氯催化剂于制备二异丙胺硅烷中的用途 | |
US20210061833A1 (en) | Lanthanoid compound, lanthanoid-containing thin film and formation of lanthanoid-containing thin film using the lanthanoid compound | |
CN112028921B (zh) | 一种高纯度三甲基铝的制备方法 | |
CN112110948B (zh) | 一种液态双氨基取代的乙硅烷制备方法及其产物的应用 | |
JP4562169B2 (ja) | Hf系酸化物ゲート絶縁膜のプリカーサーの精製方法 | |
WO2007136186A1 (en) | Synthesis of aluminum compound for forming aluminum films by chemical vapor deposition | |
WO2022222210A1 (zh) | 有机过渡金属化合物及制备方法、形成含过渡金属薄膜的方法 | |
CN112552321B (zh) | 一种含镧有机化合物及其应用 | |
CN109305981B (zh) | 2-羟基萘-1-硼酸的合成方法 | |
CN111533763A (zh) | 二氟草酸硼酸锂的制备方法及其制备装置 | |
CN206624653U (zh) | 一种制备电子级二氯二氢硅的装置 | |
CN115651026A (zh) | 一种ald前驱体钨配合物的制备方法 | |
US20230088079A1 (en) | Silicon precursors | |
KR102618936B1 (ko) | 신규한 루테늄 유기금속화합물 및 이의 제조방법 | |
CN106904617A (zh) | 一种制备电子级二氯二氢硅的装置 | |
CN112210378B (zh) | 氮化硅膜蚀刻溶液及其制备方法 | |
WO2014069240A1 (ja) | β-ジケトン化合物からの非対称β-ジケトン化合物の抽出方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
CB03 | Change of inventor or designer information |
Inventor after: Chen Gang Inventor after: Xiong Wenhui Inventor after: Xu Qinqi Inventor after: Gan Liying Inventor after: Zhang Guangdi Inventor after: He Yonggen Inventor after: Li Jun Inventor after: Liu Yan Inventor before: Chen Gang Inventor before: Xiong Wenhui Inventor before: Xu Qinqi Inventor before: Gan Liying Inventor before: Zhang Guangdi Inventor before: He Yonggen Inventor before: Li Jun Inventor before: Liu Yan |
|
CB03 | Change of inventor or designer information |