CN115044883A - SiC纤维表面连续沉积PyC的系统 - Google Patents
SiC纤维表面连续沉积PyC的系统 Download PDFInfo
- Publication number
- CN115044883A CN115044883A CN202210653598.9A CN202210653598A CN115044883A CN 115044883 A CN115044883 A CN 115044883A CN 202210653598 A CN202210653598 A CN 202210653598A CN 115044883 A CN115044883 A CN 115044883A
- Authority
- CN
- China
- Prior art keywords
- pyc
- deposition
- chamber
- sic
- sic fiber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000835 fiber Substances 0.000 title claims abstract description 65
- 238000000151 deposition Methods 0.000 claims abstract description 77
- 230000008021 deposition Effects 0.000 claims abstract description 64
- 230000004913 activation Effects 0.000 claims abstract description 32
- 230000001105 regulatory effect Effects 0.000 claims description 17
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 16
- 239000007789 gas Substances 0.000 claims description 15
- 239000004215 Carbon black (E152) Substances 0.000 claims description 8
- 229910052786 argon Inorganic materials 0.000 claims description 8
- 238000010894 electron beam technology Methods 0.000 claims description 8
- 229930195733 hydrocarbon Natural products 0.000 claims description 8
- 150000002430 hydrocarbons Chemical class 0.000 claims description 8
- 150000002500 ions Chemical class 0.000 claims description 8
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 6
- 238000009423 ventilation Methods 0.000 claims description 6
- 239000013078 crystal Substances 0.000 claims description 5
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 claims description 2
- 238000005273 aeration Methods 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 16
- 238000000576 coating method Methods 0.000 abstract description 15
- 239000011248 coating agent Substances 0.000 abstract description 13
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 39
- 229910010271 silicon carbide Inorganic materials 0.000 description 39
- 239000002296 pyrolytic carbon Substances 0.000 description 29
- 238000005229 chemical vapour deposition Methods 0.000 description 13
- 230000008569 process Effects 0.000 description 11
- 238000006243 chemical reaction Methods 0.000 description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- 229910052799 carbon Inorganic materials 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000010410 layer Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 230000003213 activating effect Effects 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- 238000009730 filament winding Methods 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 238000010923 batch production Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 239000003733 fiber-reinforced composite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 230000008595 infiltration Effects 0.000 description 1
- 238000001764 infiltration Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 210000001170 unmyelinated nerve fiber Anatomy 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemical Or Physical Treatment Of Fibers (AREA)
- Inorganic Fibers (AREA)
Abstract
本发明涉及SiC纤维表面连续沉积PyC的系统，在一体化设备中，连续SiC纤维束从放丝装置出发，依次通过活化室和沉积室，在活化室内对SiC纤维表面进行活化，在沉积室内对活化后SiC纤维进行PyC沉积，达到在SiC纤维上高效率连续沉积PyC涂层的目的。(1)本发明能够显著提高SiC纤维表面PyC涂层的沉积效率(同等条件下沉积效率增加3～5倍)。
Description
技术领域
本发明涉及了SiC纤维表面连续沉积PyC的系统，涉及连续纤维增强结构复合材料领域。
背景技术
采用化学气相沉积工艺(CVD)在纤维表面沉积热解炭(PyC)涂层是很多连续SiC纤维应用前所必须进行的重要处理工序。依据后续使用条件和工艺要求的不同，在SiC纤维表面沉积所得的PyC涂层可以作为：(1)界面层，PyC涂层在SiC纤维增强复合材料中起到调节应力与载荷、偏转裂纹的作用；(2)保护层，PyC涂层在后续工序中起到保护SiC纤维免受环境侵蚀的作用；(3)碳源层，PyC涂层在后续工序中作为碳源参与反应，等到所需反应产物，如在反应融渗工艺中作为碳源参与反应得到碳化硅相。
采用CVD工艺在纤维表面制备PyC涂层的工艺可分为间歇式静止CVD沉积和连续CVD沉积两种工艺路线。其中的间歇式静止CVD沉积指的是将工件放置于沉积炉室内就不再移动，并随沉积炉升温、降温、最后取出的工艺路线。与之相对应的，在连续CVD沉积工艺路线中，纤维束丝利用收放装置，不间断地输送通过CVD反应区域，从而实现纤维表面涂层的连续批量生产，具有产量大、成本低、涂层均匀性好、产品性能稳定、利于自动化生产等一系列优点。
如何提高沉积反应的效率是连续CVD沉积工艺的重点和难点。与更传统的间歇式CVD工艺(沉积时长几十分钟至数小时)相比，为了保证生产效率，连续CVD工艺中每一小段纤维在反应区域中允许滞留的时间仅为数分钟，这对CVD反应的数率提出了很高的要求。这一问题在SiC纤维表面的PyC涂层沉积上表现得更加显著。这是由于PyC的沉积效率受沉积基底物质很大的影响，对于石墨、C纤维等基底材料，由于其与PyC相近的六元环结构，热解炭在其上沉积速度相对较快；而对于SiC纤维，由于其晶体结构与PyC相差较大，PyC在其表面难以沉积成膜——在利用间歇式CVD工艺在SiC纤维表面沉积PyC涂层时，甚至需要数小时的沉积时间才能得到足够厚度的PyC涂层——显然，这样的沉积效率是连续CVD沉积工艺无法接受的，因此，亟需一种在SiC纤维表面快速连续CVD沉积PyC涂层的方法。
发明内容
本发明的目的是：满足PyC界面沉积要求，提高产品质量和生产效率。
本发明的技术方案是：
提供SiC纤维表面连续沉积PyC的系统，包括活化室和沉积室；所述活化室的入口通入氩气，所述沉积室的入口通入烃类气体，且所述活化室的出口与沉积室的出口通过流量调节管连通，且所述流量调节管上开口排气口，且流量调节管上对应活化室的出口与沉积室的出口分别设置有限流阀，限流阀的最小开度能够保证SiC纤维通过；
所述沉积室用于对SiC纤维表面连续沉积PyC；
所述SiC纤维从放丝装置依次通过从活化室、流量调节管、沉积室到达收丝装置；
所述活化室设置有电子枪，用于发射电子束，使得电子束与氩气产生Ar+离子；在活化室中沿着SiC纤维输送方向设置多个电磁线圈，所述Ar+离子在电磁线圈的磁场的约束下，Ar+离子在运动中会轰击在SiC纤维表面，使得SiC纤维表面的原子被轰击离开后留下空位，破坏SiC晶体的完整度；所述空位为PyC沉积提供活性点。
进一步的，烃类气体为C3H6气体、甲烷或乙烷。
进一步的，活化室的通气流量为1～100sccm。
进一步的，活化室的通气压力为1～20Pa。
进一步的，电子枪的电压为500V，功率为800～1200W。
进一步的，沉积室的温度设定为800～1200℃。
进一步的，纤维输送速度设定为1～5m/min。
进一步的，沉积室的通气流量为200～1000sccm。
进一步的，沉积室的通气压力为50～500Pa。
本发明的优点是：(1)本发明能够显著提高SiC纤维表面PyC涂层的沉积效率(同等条件下沉积效率增加3～5倍)。
(2)本发明在改进提高沉积效率的同时，不增加额外的工艺步骤，也不会对纤维造成额外的损伤。
(3)本工艺在SiC纤维表面沉积所得PyC涂层均匀连续，可依据工艺需求作为SiC纤维表面的界面层、防护层或碳源层使用，也可依据不同需求灵活调整沉积所得PyC涂层的厚度和表面形貌。。
附图说明
图1是本发明的系统原理图；
图2a是另一实施例中限流阀最大通量示意图；
图2b是另一实施例中限流阀最小通量示意图；
其中：1－活化室、2－沉积室、3－流量调节管、4－限流阀、5－限流阀、6－排气口、A－活化室、B－沉积室。
具体实施方式
将参照附图更充分地描述所公开的示例，在附图中示出了所公开示例中的一些(但并非全部)。事实上，可描述许多不同的示例并且这些示例不应该被解释为限于本文中阐述的示例。相反，描述这些示例，使得本公开将是彻底和完全的，并且将把本公开的范围充分传达给本领域的技术人员。
实施例1，提供SiC纤维表面连续沉积PyC的系统，包括活化室和沉积室；所述活化室的入口通入氩气，所述沉积室的入口通入烃类气体，且所述活化室的出口与沉积室的出口通过流量调节管连通，且所述流量调节管上开口排气口，且流量调节管上对应活化室的出口与沉积室的出口分别设置有限流阀，限流阀的最小开度能够保证SiC纤维通过；
所述沉积室用于对SiC纤维表面连续沉积PyC；
所述SiC纤维从放丝装置依次通过从活化室、流量调节管、沉积室到达收丝装置；
所述活化室设置有电子枪，用于发射电子束，使得电子束与氩气产生Ar+离子；在活化室中沿着SiC纤维输送方向设置多个电磁线圈，所述Ar+离子在电磁线圈的磁场的约束下，Ar+离子在运动中会轰击在SiC纤维表面，使得SiC纤维表面的原子被轰击离开后留下空位，破坏SiC晶体的完整度；所述空位为PyC沉积提供活性点。
烃类气体为C3H6气体。
实施例2提供SiC纤维表面连续沉积PyC的系统，包括活化室和沉积室；所述活化室的入口通入氩气，所述沉积室的入口通入烃类气体，且所述活化室的出口与沉积室的出口通过流量调节管连通，且所述流量调节管上开口排气口，且流量调节管上对应活化室的出口与沉积室的出口分别设置有限流阀，限流阀的最小开度能够保证SiC纤维通过；
所述沉积室用于对SiC纤维表面连续沉积PyC；
所述SiC纤维从放丝装置依次通过从活化室、流量调节管、沉积室到达收丝装置；
所述活化室设置有电子枪，用于发射电子束，使得电子束与氩气产生Ar+离子；在活化室中沿着SiC纤维输送方向设置多个电磁线圈，所述Ar+离子在电磁线圈的磁场的约束下，Ar+离子在运动中会轰击在SiC纤维表面，使得SiC纤维表面的原子被轰击离开后留下空位，破坏SiC晶体的完整度；所述空位为PyC沉积提供活性点。
烃类气体为甲烷。
另一实施例中，如图2a和图2b，还给出了一种具体结构的限流阀，类似于相机快门结构，由环形均匀设置的多个叶片构成，多个叶片形成联动，每个叶片相对于流量调节管可转动联接，通过改变叶片转动位置，实现对流量调节管截面流通面积的改变，从而实现调节。
已出于例示和描述的目的展示了对不同有利布置的描述，但是该描述并不旨在是排他性的或限于所公开形式的示例。许多修改形式和变化形式对于本领域的普通技术人员而言将是显而易见的。另外，不同的有利示例可描述与其他有利示例相比不同的优点。选择和描述所选择的一个示例或多个示例，以便最佳地说明示例的原理、实际应用，并且使本领域的普通技术人员能够理解本公开有进行了适于所料想特定使用的各种修改的各种示例。
Claims (9)
1.SiC纤维表面连续沉积PyC的系统，其特征在于：包括活化室和沉积室；所述活化室的入口通入氩气，所述沉积室的入口通入烃类气体，且所述活化室的出口与沉积室的出口通过流量调节管连通，且所述流量调节管上开口排气口，且流量调节管上对应活化室的出口与沉积室的出口分别设置有限流阀，限流阀的最小开度能够保证SiC纤维通过；
所述沉积室用于对SiC纤维表面连续沉积PyC；
所述SiC纤维从放丝装置依次通过从活化室、流量调节管、沉积室到达收丝装置；
所述活化室设置有电子枪，用于发射电子束，使得电子束与氩气产生Ar+离子；在活化室中沿着SiC纤维输送方向设置多个电磁线圈，所述Ar+离子在电磁线圈的磁场的约束下，Ar+离子在运动中会轰击在SiC纤维表面，使得SiC纤维表面的原子被轰击离开后留下空位，破坏SiC晶体的完整度；所述空位为PyC沉积提供活性点。
2.根据权利要求1所述的SiC纤维表面连续沉积PyC的系统，其特征在于：烃类气体为C3H6气体、甲烷或乙烷。
3.根据权利要求1所述的SiC纤维表面连续沉积PyC的系统，其特征在于：活化室的通气流量为1～100sccm。
4.根据权利要求1所述的SiC纤维表面连续沉积PyC的系统，其特征在于：活化室的通气压力为1～20Pa。
5.根据权利要求1所述的SiC纤维表面连续沉积PyC的系统，其特征在于：电子枪的电压为500V，功率为800～1200W。
6.根据权利要求1所述的SiC纤维表面连续沉积PyC的系统，其特征在于：沉积室的温度设定为800～1200℃。
7.根据权利要求1所述的SiC纤维表面连续沉积PyC的系统，其特征在于：纤维输送速度设定为1～5m/min。
8.根据权利要求1所述的SiC纤维表面连续沉积PyC的系统，其特征在于：沉积室的通气流量为200～1000sccm。
9.根据权利要求1所述的SiC纤维表面连续沉积PyC的系统，其特征在于：沉积室的通气压力为50～500Pa。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210653598.9A CN115044883A (zh) | 2022-06-10 | 2022-06-10 | SiC纤维表面连续沉积PyC的系统 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210653598.9A CN115044883A (zh) | 2022-06-10 | 2022-06-10 | SiC纤维表面连续沉积PyC的系统 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN115044883A true CN115044883A (zh) | 2022-09-13 |
Family
ID=83161551
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202210653598.9A Pending CN115044883A (zh) | 2022-06-10 | 2022-06-10 | SiC纤维表面连续沉积PyC的系统 |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN115044883A (zh) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3367304A (en) * | 1967-03-13 | 1968-02-06 | Dow Corning | Deposition chamber for manufacture of refractory coated filaments |
| GB8922587D0 (en) * | 1989-10-06 | 1994-03-09 | Chromalloy Gas Turbine Corp | A process for coating fiber reinforced ceramic composites |
| US6787229B1 (en) * | 2002-01-08 | 2004-09-07 | University Of Central Florida | Three-dimensional carbon fibers and method and apparatus for their production |
| US20070110913A1 (en) * | 2005-10-05 | 2007-05-17 | Snecma | Method for metallic coating of fibres by liquid technique |
| US20140346136A1 (en) * | 2011-12-22 | 2014-11-27 | Commissariat à l'énergie atomique et aux énergies alternatives | Method for enhancing the mechanical strength of an sic/sic ceramic matrix composite material |
-
2022
- 2022-06-10 CN CN202210653598.9A patent/CN115044883A/zh active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3367304A (en) * | 1967-03-13 | 1968-02-06 | Dow Corning | Deposition chamber for manufacture of refractory coated filaments |
| GB8922587D0 (en) * | 1989-10-06 | 1994-03-09 | Chromalloy Gas Turbine Corp | A process for coating fiber reinforced ceramic composites |
| US6787229B1 (en) * | 2002-01-08 | 2004-09-07 | University Of Central Florida | Three-dimensional carbon fibers and method and apparatus for their production |
| US20070110913A1 (en) * | 2005-10-05 | 2007-05-17 | Snecma | Method for metallic coating of fibres by liquid technique |
| US20140346136A1 (en) * | 2011-12-22 | 2014-11-27 | Commissariat à l'énergie atomique et aux énergies alternatives | Method for enhancing the mechanical strength of an sic/sic ceramic matrix composite material |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5443647A (en) | Method and apparatus for depositing a refractory thin film by chemical vapor deposition | |
| US5662965A (en) | Method of depositing crystalline carbon-based thin films | |
| US6063186A (en) | Growth of very uniform silicon carbide epitaxial layers | |
| US5392730A (en) | Method for depositing compound semiconductor crystal | |
| Kester et al. | Deposition and characterization of boron nitride thin films | |
| CN101589171A (zh) | 用于大面积多层原子层化学气相处理薄膜的装置和方法 | |
| EP0946782A1 (en) | Chemical vapor deposition apparatus | |
| CN104817336A (zh) | (BN/SiC)n复合界面相涂层、涂层纤维及其制备方法 | |
| US4704339A (en) | Infra-red transparent optical components | |
| CN1282801A (zh) | 化学汽相淀积设备及利用该设备合成碳纳米管的方法 | |
| US20180087214A1 (en) | Refractory oxide coated fiber and method of making | |
| GB2129833A (en) | Method and apparatus for depositing coatings in a glow discharge | |
| JPH04210476A (ja) | 炭化ケイ素膜の成膜方法 | |
| CN115044883A (zh) | SiC纤维表面连续沉积PyC的系统 | |
| CN110528003B (zh) | 一种涂层的复合制备方法 | |
| CN114212772B (zh) | 一种制备单壁碳纳米管@六方氮化硼复合薄膜的方法 | |
| GB2165266A (en) | Infra red transparent optical components | |
| CN110468384A (zh) | 一种单晶高温合金和涂层界面的阻扩散层及其制备方法 | |
| CN114105662A (zh) | 一种多层界面涂层、制备方法及陶瓷基复合材料制备方法 | |
| CN111188027B (zh) | 一种化学气相沉积设备和成膜方法 | |
| KR101165329B1 (ko) | 입방정질화붕소 박막 제조방법 및 이를 통해 제조된 입방정질화붕소 박막 구조물 | |
| Olson et al. | A mechanism of CVD diamond film growth deduced from the sequential deposition from sputtered carbon and atomic hydrogen | |
| EP0106638A1 (en) | Method and apparatus for growing material in a glow discharge | |
| CN115404465B (zh) | 连续纤维表面制备复合界面的设备及方法 | |
| US6406760B1 (en) | Diamond film deposition on substrate arrays |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |