CN115044087A - 一种低雾度光学膜及其制备方法和应用 - Google Patents
一种低雾度光学膜及其制备方法和应用 Download PDFInfo
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Abstract
本发明涉及一种低雾度光学膜及其制备方法和应用,低雾度光学膜包括基材层和平整度调整层;所述基材层包含有第一光学面和第二光学面,所述平整度调整层设置在所述第一光学面上和/或第二光学面上,所述平整度调整层的表面粗糙度Ra≤10nm;应用即由低雾度光学膜制备导电膜;制备方法包括步骤:S1)将包含聚合物和溶剂的涂布液通过狭缝精密涂布技术在离型膜表面进行涂布和烘干后剥离去除离型膜,得到基材层I,其中所述聚合物的材质同所述基材层的材质;S2)对所述基材层I进行预收缩处理,再对基材层I的第一光学面和/或第二光学面进行表面平整度处理。本发明的方法简单,制得的光学膜的雾度远低于现有技术。
Description
技术领域
本发明属于薄膜技术领域,涉及一种低雾度光学膜及其制备方法和应用。
背景技术
柔性屏是指柔性OLED屏幕,主要包括柔性曲面屏、柔性可折叠屏、柔性可弯卷屏三大类,具有轻薄、低功耗、可弯曲、高柔韧性等特征,可广泛应用于智能手机、可穿戴设备、平板电脑、智能电视、AR/VR、车载显示等产品制造领域。随着生产技术不断进步、下游应用逐步落地,全球柔性屏需求不断增长,柔性屏产能在OLED总产能中的占比不断提高,预计到2023年占比将达到50%左右。柔性折叠屏的核心部件之一为柔性光学薄膜,柔性光学薄膜的性能是柔性折叠屏性能及耐用性的重要依据。
目前涂布型柔性光学薄膜主流的加工工序为:在一定条件下,将粉料进行溶解和搅拌,溶解的溶剂有丁酮、环己酮及N-甲基吡咯烷酮或其他溶剂中的一种或多种,经过一定时间的搅拌后充分溶解,然后通过狭缝精密涂布技术,用PET或者离型膜作为载体,在其表面均匀的进行涂布、烘干、贴保护膜、收卷,最后撕除离型膜得到成品光学薄膜。
目前用PET或者离型膜作为载体制得的涂布型柔性光学薄膜存在的主要问题是雾度偏高,一般为0.5~1.5%,严重影响加工成品后的光学雾度。目前涂布厂解决雾度偏高的方法是增加后续至少两道涂布HC的工序,使得雾度降低至0.3~0.5%,这种方法效果一般,不仅大大增加的加工成本、使的工艺流程更加繁琐并大大降低了产品的生产良率。
然而,随着人们对产品的光学性能的需求的提高,现有技术解决雾度偏高的方法所达到雾度还有待进一步地降低。
发明内容
本发明的目的是解决现有技术中存在的问题,提供一种低雾度光学膜及其制备方法和应用。
为达到上述目的,本发明采用的技术方案如下:
一种低雾度光学膜,包括基材层和平整度调整层;所述基材层包含有第一光学面和第二光学面,所述平整度调整层设置在所述第一光学面上和/或第二光学面上,所述平整度调整层的表面粗糙度Ra≤10nm;本发明通过设置该平整度调整层,有效抑制了可见光通过基材层时发生光的散射,从而降低了整个光学膜的雾度。
作为优选的技术方案:
如上所述的一种低雾度光学膜,所述基材层的材质选自CPI(无色聚酰亚胺)、COP(聚环烯烃)、TPU(聚氨酯弹性体)、PC(聚碳酸酯)中的一种或几种;所述基材层的厚度范围为5~50μm,厚度低于5μm会影响低雾度光学膜的后道加工良率,高于50μm会导致低雾度光学膜的耐弯折性能大幅下降;所述基材层的收缩率为MD≤0.2%且TD≤0.05%,选用的基材层的MD及TD越小对平整度调整层干后的粗糙度影响越小。
如上所述的一种低雾度光学膜,所述平整度调整层的厚度范围为1~10μm,厚度过低,平整度调整层的表面粗糙度大,无法有效抑制光的散射,过厚材料成本影响大。
如上所述的一种低雾度光学膜,所述平整度调整层包含10~50wt%丙烯酸酯聚合物、40~80wt%溶剂和1~10wt%引发剂,其中溶剂为所述基材层的材质的不良溶剂;丙烯酸酯聚合物为聚甲基丙烯酸、聚甲基丙烯酸甲酯、聚丙烯酸乙酯、聚丙烯酸丁酯、聚甲基丙烯酸异氰基乙酯和聚甲基丙烯酸二甲氨乙酯中的一种以上;溶剂为丙二醇甲醚、乙酸乙酯、甲基异丁酮、丁酮或异丙醇;引发剂为Photoinitiator-184、Photoinitiator-907、Photoinitiator-379、Photoinitiator-369、Photoinitiator-TPO或Photoinitiator-1173。
如上所述的一种低雾度光学膜,所述丙烯酸酯聚合物选自聚甲基丙烯酸、聚甲基丙烯酸甲酯、聚丙烯酸乙酯、聚丙烯酸丁酯、聚甲基丙烯酸异氰基乙酯和聚甲基丙烯酸二甲氨乙酯中的一种或多种,本发明选用的丙烯酸酯类聚合物在固化后空间网格紧密形成的聚合物层表面平整度高。
如上所述的一种低雾度光学膜,所述低雾度光学膜的雾度(测试方法参考JIS K-7105)不超过0.3%,可见光透过率(测试方法参考JIS K-7105)大于92%,双折射(测试方法参考JIS K-7105)小于20nm,拉伸强度(测试方法参考ASTM D882)大于100MPa,断裂伸长率(测试方法参考ASTM D882)大于5%,在弯折半径R为0.5mm且耐弯折速度为80次/min的条件下耐弯折次数大于400K(即大于400K次弯折后无裂纹)。
本发明还提供一种导电膜,包含如上任一项所述的低雾度光学膜,还包括功能层,所述功能层位于远离基材层的所述平整度调整层的一侧;本发明的导电膜的结构多变,例如,如图1所示,仅在第一光学面11-1设置有平整度调整层,最终导电膜自上而下由第一功能层31、第一平整度调整层21、基材层11组成;如图2所示,同时在第一光学面11-1和第二光学面11-2设置有平整度调整层,最终导电膜自上而下由第一功能层31、第一平整度调整层21、基材层11、第二平整度调整层22、第二功能层32组成。
如上所述的一种导电膜,所述功能层为纳米银线层、ITO层、金属网格层、碳纳米管层或石墨烯层,没有设置平整度调整层的基材在涂布或者溅射所述功能层时,因低雾度光学膜表面粗糙度Ra<10时,光线通过基材不会在其表面发生严重散射而导致整个导电膜的雾度降低。
如上所述的一种导电膜,所述功能层的厚度范围为55~150nm。
如上所述的一种导电膜,还包括保护膜,所述保护膜位于远离基材层的所述功能层的一侧。
如上所述的一种导电膜,所述保护膜选自亚克力保护膜、PE保护膜中的一种,所述保护膜的厚度范围为20~80μm。
如上所述的一种导电膜,所述导电膜的雾度(测试方法参考JIS K-7105)不超过1.5%。
本发明还提供制备如上任一项所述的一种低雾度光学膜的方法,包含以下步骤:
S1)将包含聚合物和溶剂的涂布液通过狭缝精密涂布技术在离型膜表面进行涂布和烘干后剥离去除离型膜,得到所述基材层,其中所述聚合物的材质同所述基材层的材质;
S2)对所述基材层进行预收缩处理,至所述基材层收缩率为MD≤0.2%且TD≤0.05%,再对基材层的第一光学面和/或第二光学面进行表面平整度处理形成所述平整度调整层,至表面粗糙度Ra≤10nm。
作为优选的技术方案:
如上所述的方法,所述表面平整度处理的过程为:将用于制成所述平整度调整层的涂布液通过狭缝精密涂布技术在所述基材层的所述第一光学面和/或所述第二光学面分别进行涂布和烘干。
有益效果:
(1)本发明的一种低雾度光学膜的制备方法,通过改善涂膜载体表面的平整度,把成膜后的基材雾度降到0.3%以下,导电膜的雾度不超过1.5%,具有较好的光学性能;
(2)本发明的一种低雾度光学膜,该基材可减少下游加工的工艺流程,节约成本、提升了较大的经济效益。
附图说明
图1~图2为两种导电膜的结构示意图;
其中,11-基材层,11-1-第一光学面,11-2-第二光学面,21-第一平整度调整层,22-第二平整度调整层,31-第一功能层,32-第二功能层。
具体实施方式
下面结合具体实施方式,进一步阐述本发明。应理解,这些实施例仅用于说明本发明而不用于限制本发明的范围。此外应理解,在阅读了本发明讲授的内容之后,本领域技术人员可以对本发明作各种改动或修改,这些等价形式同样落于本申请所附权利要求书所限定的范围。
本发明涉及到的物质的厂家和牌号如下:
聚甲基丙烯酸、聚甲基丙烯酸甲酯、聚丙烯酸乙酯、聚丙烯酸丁酯、聚甲基丙烯酸异氰基乙酯、聚甲基丙烯酸二甲氨乙酯全部选自日本DIC;
CPI的牌号为FXP-1201,厂家为美国Z2公司;COP的牌号为cop-001,厂家为日本JSR;TPU的牌号为HL001,厂家为中国台湾鼎基;PC的牌号为PC001,厂家为中国四川龙华;
Photoinitiator-184、Photoinitiator-907、Photoinitiator-379、Photoinitiator-369、Photoinitiator-TPO或Photoinitiator-1173的厂家都为德国巴斯夫。
实施例1
一种导电膜的制备方法,具体步骤如下:
(1)将由5wt%的聚合物CPI和环己酮组成的涂布液通过狭缝精密涂布技术在离型膜表面进行涂布和烘干后剥离去除离型膜,得到厚度为10μm的基材层;其中,离型膜表面粗糙度Ra为30nm;
(2)对所述基材层进行预收缩处理,至所述基材层收缩率为MD≤0.2%且TD≤0.05%,再对基材层的第一光学面和第二光学面进行表面平整度处理,至表面粗糙度Ra为10nm,在基材层的第一光学面和第二光学面上分别形成厚度为1μm的平整度调整层;
预收缩处理的具体过程为:沿MD方向对基材层施加200N的张力后在160℃下烘烤15min;
平整度处理的具体过程为:将由10wt%丙烯酸酯聚合物、80wt%溶剂和余量的引发剂组成的涂布液通过狭缝精密涂布技术在所述基材层的所述第一光学面和所述第二光学面分别进行涂布和烘干;丙烯酸酯聚合物为质量比为1:1的聚甲基丙烯酸甲酯与聚丙烯酸丁酯的混合物;溶剂为质量比为1:1的丙二醇甲醚和乙酸乙酯的混合物;引发剂为Photoinitiator-184;
步骤(2)的产品为低雾度光学膜,低雾度光学膜的雾度为0.2%,可见光透过率为92.3%,双折射小于20nm,拉伸强度大于100MPa,断裂伸长率大于5%,在弯折半径R为0.5mm且耐弯折速度为80次/min的条件下耐弯折次数大于400K;
(3)分别在远离基材层的所述平整度调整层的一侧进行涂布形成功能层,功能层为纳米银线层(具体成分纳米银线和丙烯酸酯类聚合物;纳米银线和丙烯酸酯类聚合物的质量比为2:1;纳米银线的厂商为美国C3nano,牌号为GJ8D;丙烯酸酯类聚合物的厂商为美国C3nano,牌号为C3D01),厚度为100nm;
步骤(3)的产品为导电膜,导电膜的雾度为1.5%。
实施例2
一种导电膜的制备方法,具体步骤如下:
(1)将由15wt%的聚合物CPI和环己酮组成的涂布液通过狭缝精密涂布技术在离型膜表面进行涂布和烘干后剥离去除离型膜,得到厚度为15μm的基材层;其中,离型膜表面粗糙度Ra为30nm;
(2)对所述基材层进行预收缩处理,至所述基材层收缩率为MD≤0.2%且TD≤0.05%,再对基材层的第一光学面和第二光学面进行表面平整度处理,至表面粗糙度Ra为2nm,在基材层的第一光学面和第二光学面上分别形成厚度为5μm的平整度调整层;
预收缩处理的具体过程为:沿MD方向对基材层施加200N的张力后在160℃下烘烤15min;
平整度处理的具体过程为:将由40wt%丙烯酸酯聚合物、55wt%溶剂和余量的引发剂组成的涂布液通过狭缝精密涂布技术在所述基材层的所述第一光学面和所述第二光学面分别进行涂布和烘干;丙烯酸酯聚合物为质量比为1:1的聚甲基丙烯酸甲酯与聚丙烯酸丁酯的混合物;溶剂为质量比为1:1的丙二醇甲醚和乙酸乙酯的混合物;引发剂为Photoinitiator-184;
步骤(2)的产品为低雾度光学膜,低雾度光学膜的雾度不超过0.12%,可见光透过率为92.2%,双折射小于20nm,拉伸强度大于100MPa,断裂伸长率大于5%,在弯折半径R为0.5mm且耐弯折速度为80次/min的条件下耐弯折次数大于400K;
(3)分别在远离基材层的所述平整度调整层的一侧进行涂布形成功能层,功能层为ITO层(成分仅为ITO),厚度为100nm;
步骤(3)的产品为导电膜,导电膜的雾度为1.2%。
实施例3
一种导电膜的制备方法,具体步骤如下:
(1)将由20wt%的聚合物COP和环己酮组成的涂布液通过狭缝精密涂布技术在离型膜表面进行涂布和烘干后剥离去除离型膜,得到厚度为25μm的基材层;其中,离型膜表面粗糙度Ra为30nm;
(2)对所述基材层进行预收缩处理,至所述基材层收缩率为MD≤0.2%且TD≤0.05%,再对基材层的第一光学面和第二光学面进行表面平整度处理,至表面粗糙度Ra为2nm,在基材层的第一光学面和第二光学面上分别形成厚度为5μm的平整度调整层;
预收缩处理的具体过程为:沿MD方向对基材层施加200N的张力后在160℃下烘烤15min;
平整度处理的具体过程为:将由40wt%丙烯酸酯聚合物、55wt%溶剂和余量的引发剂组成的涂布液通过狭缝精密涂布技术在所述基材层的所述第一光学面和所述第二光学面分别进行涂布和烘干;丙烯酸酯聚合物为质量比为1:1聚丙烯酸乙酯和聚甲基丙烯酸甲酯的混合物;溶剂为质量比为1:1的丙二醇甲醚和乙酸乙酯的混合物;引发剂为Photoinitiator-184;
步骤(2)的产品为低雾度光学膜,低雾度光学膜的雾度不超过0.18%,可见光透过率为92.1%,双折射小于20nm,拉伸强度大于100MPa,断裂伸长率大于5%,在弯折半径R为0.5mm且耐弯折速度为80次/min的条件下耐弯折次数大于400K;
(3)分别在远离基材层的所述平整度调整层的一侧进行涂布形成功能层,功能层为ITO层(成分仅为ITO),厚度为100nm;
步骤(3)的产品为导电膜,导电膜的雾度为1.4%。
实施例4
一种导电膜的制备方法,具体步骤如下:
(1)将由25wt%的聚合物COP和丁酮组成的涂布液通过狭缝精密涂布技术在离型膜表面进行涂布和烘干后剥离去除离型膜,得到厚度为35μm的基材层;其中,离型膜表面粗糙度Ra为30nm;
(2)对所述基材层进行预收缩处理,至所述基材层收缩率为MD≤0.2%且TD≤0.05%,再对基材层的第一光学面和第二光学面进行表面平整度处理,至表面粗糙度Ra为2nm,在基材层的第一光学面和第二光学面上分别形成厚度为5μm的平整度调整层;
预收缩处理的具体过程为:沿MD方向对基材层施加200N的张力后在160℃下烘烤15min;
平整度处理的具体过程为:将由40wt%丙烯酸酯聚合物、55wt%溶剂和余量的引发剂组成的涂布液通过狭缝精密涂布技术在所述基材层的所述第一光学面和所述第二光学面分别进行涂布和烘干;丙烯酸酯聚合物为质量比为1:1的聚甲基丙烯酸与聚丙烯酸丁酯的混合物;溶剂为质量比为1:1的丙二醇甲醚和乙酸乙酯的混合物;引发剂为Photoinitiator-184;
步骤(2)的产品为低雾度光学膜,低雾度光学膜的雾度不超过0.18%,可见光透过率为92.1%,双折射小于20nm,拉伸强度大于100MPa,断裂伸长率大于5%,在弯折半径R为0.5mm且耐弯折速度为80次/min的条件下耐弯折次数大于400K;
(3)分别在远离基材层的所述平整度调整层的一侧进行涂布形成功能层,功能层为碳纳米管层(成分仅为碳纳米管),厚度为100nm;
步骤(3)的产品为导电膜,导电膜的雾度为1.4%。
实施例5
一种导电膜的制备方法,具体步骤如下:
(1)将由40wt%的聚合物TPU和丁酮组成的涂布液通过狭缝精密涂布技术在离型膜表面进行涂布和烘干后剥离去除离型膜,得到厚度为40μm的基材层;其中,离型膜表面粗糙度Ra为30nm;
(2)对所述基材层进行预收缩处理,至所述基材层收缩率为MD≤0.2%且TD≤0.05%,再对基材层的第一光学面和第二光学面进行表面平整度处理,至表面粗糙度Ra为2nm,在基材层的第一光学面和第二光学面上分别形成厚度为5μm的平整度调整层;
预收缩处理的具体过程为:沿MD方向对基材层施加200N的张力后在160℃下烘烤15min;
平整度处理的具体过程为:将由40wt%丙烯酸酯聚合物、55wt%溶剂和余量的引发剂组成的涂布液通过狭缝精密涂布技术在所述基材层的所述第一光学面和所述第二光学面分别进行涂布和烘干;丙烯酸酯聚合物为质量比为1:1的聚丙烯酸丁酯和聚甲基丙烯酸异氰基乙酯的混合物;溶剂为质量比为1:1的丙二醇甲醚和乙酸乙酯的混合物;引发剂为Photoinitiator-184;
步骤(2)的产品为低雾度光学膜,低雾度光学膜的雾度为0.19%,可见光透过率为92.2%,双折射小于20nm,拉伸强度大于100MPa,断裂伸长率大于5%,在弯折半径R为0.5mm且耐弯折速度为80次/min的条件下耐弯折次数大于400K;
(3)分别在远离基材层的所述平整度调整层的一侧进行涂布形成功能层,功能层为石墨烯层(成分仅为石墨烯),厚度为100nm;
步骤(3)的产品为导电膜,导电膜的雾度为1.5%。
对比例1
一种导电膜的制备方法,基本同实施例5,不同之处仅在于:步骤(2)中平整度处理所用的涂布液中丙烯酸酯聚合物的浓度为5wt%,溶剂的浓度为90wt%,平整度处理后表面粗糙度Ra为15nm,平整度调整层的厚度为0.5μm。
步骤(2)制得的光学膜的雾度大于0.5%,可见光透过率为92.1%;步骤(3)制得的导电膜的雾度>1.5%。
对比例2
一种导电膜的制备方法,基本同实施例5,不同之处仅在于:步骤(2)中平整度调整层的厚度为0.8μm。
步骤(2)制得的光学膜的雾度大于0.3%,可见光透过率为92.1%;步骤(3)制得的导电膜的雾度>1.5%。
实施例6
一种导电膜的制备方法,具体步骤如下:
(1)将由50wt%的聚合物PC和丁酮组成的涂布液通过狭缝精密涂布技术在离型膜表面进行涂布和烘干后剥离去除离型膜,得到厚度为50μm的基材层;其中,离型膜表面粗糙度Ra为30nm;
(2)对所述基材层进行预收缩处理,至所述基材层收缩率为MD≤0.2%且TD≤0.05%,再对基材层的第一光学面和第二光学面进行表面平整度处理,至表面粗糙度Ra为1.5nm,在基材层的第一光学面和第二光学面上分别形成厚度为7μm的平整度调整层;
预收缩处理的具体过程为:沿MD方向对基材层施加200N的张力后在160℃下烘烤15min;
平整度处理的具体过程为:将由50wt%丙烯酸酯聚合物、45wt%溶剂和余量的引发剂组成的涂布液通过狭缝精密涂布技术在所述基材层的所述第一光学面和所述第二光学面分别进行涂布和烘干;丙烯酸酯聚合物为质量比为1:1的聚甲基丙烯酸二甲氨乙酯与聚甲基丙烯酸的混合物;溶剂为质量比为1:1的丙二醇甲醚和乙酸乙酯的混合物;引发剂为Photoinitiator-184;
步骤(2)的产品为低雾度光学膜,低雾度光学膜的雾度为0.19%,可见光透过率为92.1%,双折射小于20nm,拉伸强度大于100MPa,断裂伸长率大于5%,在弯折半径R为0.5mm且耐弯折速度为80次/min的条件下耐弯折次数大于400K;
(3)分别在远离基材层的所述平整度调整层的一侧进行涂布形成功能层,功能层为纳米银线层(成分仅为纳米银线),厚度为100nm;
步骤(3)的产品为导电膜,导电膜的雾度为1.5%。
由上述实施例及对比例可知:当丙烯酸酯聚合物含量在>10wt%时在基材表面形成的平整度调整层的干厚大于1μm能够实现粗糙度Ra≤10nm,从而降低了整个膜材的雾度。
实施例7
一种导电膜的制备方法,基本同实施例5,不同之处仅在于步骤(2)中仅对基材层的第一光学面进行表面平整度处理(平整度处理的方法同实施例5)。
步骤(2)制得的低雾度光学膜的雾度为0.3%,可见光透过率为92.2%,双折射小于20nm,拉伸强度大于100MPa,断裂伸长率大于5%,在弯折半径R为0.5mm且耐弯折速度为80次/min的条件下耐弯折次数大于400K;步骤(3)制得的导电膜的雾度为1.5%。
实施例8
一种导电膜的制备方法,基本同实施例6,不同之处仅在于步骤(2)中仅对基材层的第二光学面进行表面平整度处理(平整度处理的方法同实施例6)。
步骤(2)制得的低雾度光学膜的雾度为0.3%,可见光透过率为92.1%,双折射小于20nm,拉伸强度大于100MPa,断裂伸长率大于5%,在弯折半径R为0.5mm且耐弯折速度为80次/min的条件下耐弯折次数大于400K;步骤(3)制得的导电膜的雾度为1.5%。
实施例9
一种导电膜的制备方法,基本同实施例5,不同之处在于步骤(2)中的丙烯酸酯聚合物为聚丙烯酸丁酯,溶剂为丙二醇甲醚。
步骤(2)制得的低雾度光学膜的雾度为0.12%,可见光透过率为92.1%,双折射小于20nm,拉伸强度大于100MPa,断裂伸长率大于5%,在弯折半径R为0.5mm且耐弯折速度为80次/min的条件下耐弯折次数大于400K;步骤(3)制得的导电膜的雾度为1.3%。
Claims (11)
1.一种低雾度光学膜,其特征在于,包括基材层和平整度调整层;所述基材层的雾度为0.5~1.5%;所述基材层包含有第一光学面和第二光学面,所述平整度调整层设置在所述第一光学面上和/或第二光学面上,所述平整度调整层的表面粗糙度Ra≤10nm;所述平整度调整层由10~50wt%丙烯酸酯聚合物、40~80wt%溶剂和1~10wt%引发剂的涂布液制成,其中溶剂为所述基材层的材质的不良溶剂;所述低雾度光学膜的雾度不超过0.3%。
2.根据权利要求1所述的一种低雾度光学膜,其特征在于,所述基材层的材质选自CPI、COP、TPU、PC中的一种或几种;所述基材层的厚度范围为5~50μm;所述基材层的收缩率为MD≤0.2%且TD≤0.05%。
3.根据权利要求1所述的一种低雾度光学膜,其特征在于,所述平整度调整层的厚度范围为1~10μm。
4.根据权利要求1所述的一种低雾度光学膜,其特征在于,所述丙烯酸酯聚合物选自聚甲基丙烯酸、聚甲基丙烯酸甲酯、聚丙烯酸乙酯、聚丙烯酸丁酯、聚甲基丙烯酸异氰基乙酯和聚甲基丙烯酸二甲氨乙酯中的一种或多种。
5.一种导电膜,其特征在于,包含如权利要求1~4任一项所述的低雾度光学膜,还包括功能层,所述功能层位于远离基材层的所述平整度调整层的一侧。
6.根据权利要求5所述的一种导电膜,其特征在于,所述功能层为纳米银线层、ITO层、金属网格层、碳纳米管层或石墨烯层。
7.根据权利要求5所述的一种导电膜,其特征在于,所述功能层的厚度范围为55~150nm。
8.根据权利要求5所述的一种导电膜,其特征在于,还包括保护膜,所述保护膜位于远离基材层的所述功能层的一侧。
9.根据权利要求8所述的一种导电膜,其特征在于,所述保护膜选自亚克力保护膜、PE保护膜中的一种,所述保护膜的厚度范围为20~80μm。
10.制备如权利要求1~4任一项所述的一种低雾度光学膜的方法,其特征在于,包含以下步骤:
S1)将包含聚合物和溶剂的涂布液通过狭缝精密涂布技术在离型膜表面进行涂布和烘干后剥离去除离型膜,得到所述基材层,其中所述聚合物的材质同所述基材层的材质;
S2)对所述基材层进行预收缩处理,至所述基材层收缩率为MD≤0.2%且TD≤0.05%,再对基材层的第一光学面和/或第二光学面进行表面平整度处理形成所述平整度调整层,至表面粗糙度Ra≤10nm。
11.根据权利要求10所述的方法,其特征在于,所述表面平整度处理的过程为:将用于制成所述平整度调整层的涂布液通过狭缝精密涂布技术在所述基材层的所述第一光学面和/或所述第二光学面分别进行涂布和烘干。
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Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101663152A (zh) * | 2007-04-27 | 2010-03-03 | 三井化学株式会社 | 膜及其制造方法、以及其用途 |
US20130078407A1 (en) * | 2011-09-26 | 2013-03-28 | Nitto Denko Corporation | Method for manufacturing optical film-forming pressure-sensitive adhesive layer, optical film-forming pressure-sensitive adhesive layer, pressure-sensitive adhesive-type optical film, and image display device |
CN206322483U (zh) * | 2016-12-02 | 2017-07-11 | 天津宝兴威科技股份有限公司 | 一种层叠纳米银线导电膜 |
CN106959477A (zh) * | 2016-01-08 | 2017-07-18 | 柯尼卡美能达株式会社 | 光学膜、光学膜的制造方法、偏振片和图像显示装置 |
CN108586782A (zh) * | 2017-12-14 | 2018-09-28 | 合肥乐凯科技产业有限公司 | 一种光学硬化膜 |
JP2021103226A (ja) * | 2019-12-25 | 2021-07-15 | 日本ゼオン株式会社 | 光学フィルム及び複層フィルム |
-
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- 2022-08-15 CN CN202210972538.3A patent/CN115044087A/zh not_active Withdrawn
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101663152A (zh) * | 2007-04-27 | 2010-03-03 | 三井化学株式会社 | 膜及其制造方法、以及其用途 |
US20130078407A1 (en) * | 2011-09-26 | 2013-03-28 | Nitto Denko Corporation | Method for manufacturing optical film-forming pressure-sensitive adhesive layer, optical film-forming pressure-sensitive adhesive layer, pressure-sensitive adhesive-type optical film, and image display device |
CN106959477A (zh) * | 2016-01-08 | 2017-07-18 | 柯尼卡美能达株式会社 | 光学膜、光学膜的制造方法、偏振片和图像显示装置 |
CN206322483U (zh) * | 2016-12-02 | 2017-07-11 | 天津宝兴威科技股份有限公司 | 一种层叠纳米银线导电膜 |
CN108586782A (zh) * | 2017-12-14 | 2018-09-28 | 合肥乐凯科技产业有限公司 | 一种光学硬化膜 |
JP2021103226A (ja) * | 2019-12-25 | 2021-07-15 | 日本ゼオン株式会社 | 光学フィルム及び複層フィルム |
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