CN115042459A

CN115042459A - Continuous etching system of PTFE pipe

Info

Publication number: CN115042459A
Application number: CN202210858223.6A
Authority: CN
Inventors: 张鹏; 查尚文
Original assignee: Shanghai Yike Polymer Technology Co ltd
Current assignee: Shanghai Yike Polymer Technology Co ltd
Priority date: 2022-07-20
Filing date: 2022-07-20
Publication date: 2022-09-13

Abstract

The embodiment of the application provides a pair of continuous etching system of PTFE pipe, the circumference direction of unreeling the roller is equipped with the PTFE parent tube outward, PTFE parent tube one end is fixed with the unreeling roller, unreel through the unreeling roller, the PTFE parent tube passes chemical reagent ultrasonic cleaning tank through a plurality of pulley in proper order, a processor, the etching groove, deionized water ultrasonic cleaning tank, acetic acid washing tank and wind-up roll, hang on airing device at last, the continuity production of PTFE etching pipe has been realized, the production output of PTFE etching pipe has been improved, and the manual operation has been reduced, the influence of manual operation to product quality has been reduced, and then the quality of PTFE etching pipe has been promoted.

Description

Continuous etching system of PTFE pipe

Technical Field

The application relates to the technical field of PTFE pipe etching, in particular to a continuous etching system for PTFE pipes.

Background

PTFE (polytetrafluoroethylene) is a high molecular polymer prepared by polymerizing tetrafluoroethylene as a monomer. Because the surface energy of PTFE is extremely low and can not be bonded with other materials, in order to expand the application range of PTFE, the PTFE product can be bonded with other materials, and the improvement of the surface energy of PTFE is very important.

The PTFE tube is a PTFE product, and the surface of the PTFE tube is modified to increase the surface energy of the PTFE tube. The modification treatment of the surface of the PTFE pipe mainly comprises two modes of physical modification and chemical modification. Physical modification is typically carried out by subjecting the PTFE tube to a plasma treatment process, a high energy radiation treatment process, or a similar principle property. The chemical modification is usually to soak the PTFE tube in an etching solution to perform etching, soak for a certain period of time, then take out to perform cleaning and air drying, wherein the etching solution includes a tetrahydrofuran solution or an ammonia sodium solution of sodium naphthalene. Because the surface energy of the PTFE tube after physical modification is smaller than that of the PTFE tube after chemical modification, the surface energy of the PTFE tube after physical modification can be recovered to the original surface after a period of time. Therefore, in the prior art, the surface energy of the PTFE tube is improved by adopting a chemical modification mode.

The etching effect of the etching solution is obviously reduced when the etching solution is in contact with water or air. Therefore, in order to ensure the activity of the etching solution as much as possible, the etching solution etches the product under a closed condition, so that the existing etching production process of the PTFE tube is basically in an intermittent state or a laboratory stage, and meanwhile, the influence degree of manual operation on the product quality in the chemical modification process is high, so that the quality stability of the PTFE etching tube cannot be ensured, the PTFE etching tube cannot be continuously produced, and the production yield of the PTFE etching tube is limited.

Disclosure of Invention

The application provides a continuous etching system of PTFE pipe to solve the influence of manual operation to product quality, the unable continuity production of PTFE etching pipe has restricted the technical problem of the production output of PTFE etching pipe.

In order to solve the technical problem, the embodiment of the application discloses the following technical scheme:

in a first aspect, an embodiment of the application discloses a continuous etching system for a PTFE tube, comprising an unwinding roller, a pulley, a chemical reagent ultrasonic cleaning tank, a processor, an etching tank, a deionized water ultrasonic cleaning tank, an acetic acid cleaning tank, a winding roller, an airing device and a PTFE base tube,

a unreeling roller is arranged on one side of the chemical reagent ultrasonic cleaning tank, and a processor is arranged on the other side of the chemical reagent ultrasonic cleaning tank;

a processor is arranged on one side of the etching tank close to the chemical reagent ultrasonic cleaning tank, and a deionized water ultrasonic cleaning tank is arranged on one side of the etching tank far away from the chemical reagent ultrasonic cleaning tank;

a deionized water ultrasonic cleaning tank is arranged on one side of the acetic acid cleaning tank close to the etching tank, a winding roller is arranged on one side of the acetic acid cleaning tank far away from the etching tank, and an airing device is arranged on one side of the winding roller far away from the acetic acid cleaning tank;

the circumference direction of unreeling the roller is equipped with the PTFE parent tube outward, and PTFE parent tube one end is fixed with unreeling the roller, unreels through unreeling the roller, and the PTFE parent tube passes chemical reagent ultrasonic cleaning tank, treater, etching groove, deionized water ultrasonic cleaning tank, acetic acid washing tank and wind-up roll through a plurality of pulley in proper order, hangs on airing device at last.

Optionally, both sides of the unwinding roller and the winding roller are fixedly connected with the circular guard plate, and the circle centers of the circular guard plate and the unwinding roller and the winding roller are the same.

Optionally, bayonets are symmetrically arranged on the upper portion and the lower portion of the circular guard plate of the unwinding roller, and the length and the width of each bayonet are matched with the diameter of the PTFE base pipe.

Optionally, the PTFE base tube passes through the bayonet and is fixedly connected with any one of the circular guard plates of the unwinding roller through a tube bayonet device.

Optionally, the pipe bayonet device comprises a bottom plate, a connecting shaft, a lower pressing rod and a lower pressing rod fixing device, the connecting shaft and the lower pressing rod fixing device are arranged on the bottom plate, the connecting shaft is arranged in the middle of one end of the bottom plate, the distance between the lower pressing rod fixing device and the connecting shaft is matched with the length of the lower pressing rod, and the lower pressing rod is connected with the bottom plate through the connecting shaft.

Optionally, the pulleys include a first group of pulleys, the first group of pulleys are arranged outside the unwinding roller, the chemical reagent ultrasonic cleaning tank, the processor, the etching tank, the deionized water ultrasonic cleaning tank, the acetic acid cleaning tank, the winding roller and the airing device, and the processor is any one of an online plasma processor and a corona processor.

Optionally, the pulleys further comprise a second group of pulleys, the second group of pulleys comprise a first pulley and a second pulley, a first pulley and a second pulley are arranged in the chemical reagent ultrasonic cleaning tank, a third pulley and a fourth pulley are arranged in the deionized water ultrasonic cleaning tank, the first pulley and the second pulley, the third pulley and the fourth pulley are symmetrical in position, a first sewage discharge pipe orifice is arranged at the center of the bottom of the chemical reagent ultrasonic cleaning tank, and a second sewage discharge pipe orifice is arranged at the center of the bottom of the deionized water ultrasonic cleaning tank.

Optionally, the second group of pulleys further comprises a fifth pulley and a sixth pulley, the fifth pulley and the sixth pulley are arranged in the etching groove, the fifth pulley and the sixth pulley are symmetrical in position, a first observation window is arranged on the side face of the etching groove, a temperature sensing probe at the bottom of the digital display thermometer extends into the etching groove, the temperature sensing probe at the bottom of the digital display thermometer is used for meeting the requirement of measuring the temperature of the etching liquid in the etching groove, a jacket is arranged outside the etching groove, a temperature control system is arranged outside the jacket, and the jacket is connected with the temperature control system;

the bottom of the etching tank is communicated with a third sewage discharge pipe, a sewage discharge switch is arranged at the lower part of the third sewage discharge pipe, the third sewage discharge pipe comprises a third sewage discharge pipe opening and two symmetrically arranged bubbling device through holes, the bubbling device through holes are connected with a bubbling device, and the diameter of each bubbling device through hole is matched with that of the bubbling device;

the upper part of the etching bath is provided with an etching bath cover plate, the two ends of the etching bath cover plate are symmetrically provided with semicircular first PTFE base pipe notches, the four corners of the etching bath cover plate are provided with etching bath buckles, the etching bath cover plate is provided with an etching bath cover plate handle, and the etching bath cover plate is provided with a plurality of gas receiving through holes.

Optionally, the second group of pulleys further comprises a seventh pulley, an eighth pulley, a ninth pulley and a tenth pulley, the seventh pulley, the eighth pulley, the ninth pulley and the tenth pulley are arranged in the acetic acid cleaning tank, the seventh pulley and the eighth pulley are symmetrical in position, the ninth pulley and the tenth pulley are symmetrical in position, a fourth sewage discharge pipe opening is arranged in the center of the bottom of the acetic acid cleaning tank, and a second observation window is arranged on the side face of the acetic acid cleaning tank;

acetic acid washing tank upper portion is provided with acetic acid washing tank apron, and the equal symmetry in acetic acid washing tank apron both ends is provided with semi-circular second PTFE parent tube breach, and the symmetry is provided with two acetic acid washing tank apron handles on the acetic acid washing tank apron.

Optionally, airing device is provided with a plurality of rings that dry including drying the support, drying support upper portion, and it is provided with the universal wheel to dry the support bottom, dries to be provided with on the ring and dries the supporting bayonet socket of ring.

The beneficial effect of this application does:

It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the application.

Drawings

In order to more clearly explain the technical solution of the present application, the drawings needed to be used in the embodiments will be briefly described below, and it is obvious to those skilled in the art that other drawings can be obtained according to the drawings without creative efforts.

FIG. 1 is a schematic structural diagram of a continuous etching system for PTFE tubes according to an embodiment of the present disclosure;

FIG. 2 is a schematic structural diagram of an unwinding roller according to an embodiment of the present disclosure;

FIG. 3a is a schematic structural diagram of an ultrasonic cleaning tank with chemical reagents according to an embodiment of the present disclosure;

fig. 3b is a schematic structural diagram of the deionized water ultrasonic cleaning tank according to the embodiment of the present application;

FIG. 4 is a schematic structural view of an etching chamber according to an embodiment of the present disclosure;

FIG. 5 is a schematic structural view of an acetic acid cleaning tank according to an embodiment of the present disclosure;

FIG. 6 is a schematic structural diagram of a airing device according to an embodiment of the present application;

wherein:

1-unwinding roller, 11-circular guard plate, 111-bayonet, 12-pipe bayonet device, 121-bottom plate, 122-connecting shaft, 123-lower pressing rod, 124-lower pressing rod fixing device, 2-pulley, 21-first group of pulleys, 22-second group of pulleys, 3-chemical reagent ultrasonic cleaning tank, 31-first pulley, 32-second pulley, 33-first sewage outlet, 4-processor, 5-etching tank, 51-fifth pulley, 52-sixth pulley, 53-third sewage outlet, 531-third sewage outlet, 532-bubbling device through hole, 54-bubbling device, 55-sewage outlet switch, 56-first observation window, 57-jacket, 58-digital display thermometer, 59-etching tank cover plate, and, 591-a first PTFE base pipe notch, 592-an etching groove cover plate handle, 593-an air-connecting through hole, 594-an etching groove buckle, 6-a deionized water ultrasonic cleaning groove, 61-a third pulley, 62-a fourth pulley, 63-a second sewage pipe opening, 7-an acetic acid cleaning groove, 71-a seventh pulley, 72-an eighth pulley, 73-a ninth pulley, 74-a tenth pulley, 75-a fourth sewage pipe opening, 76-a second observation window, 77-an acetic acid cleaning groove cover plate, 771-a second PTFE base pipe notch, 772-an acetic acid cleaning groove cover plate handle, 8-a wind-up roll, 9-a drying device, 91-a drying support, 92-a drying ring, 93-a universal wheel and 10-a PTFE base pipe.

Detailed Description

In order to make those skilled in the art better understand the technical solutions in the present application, the technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are only a part of the embodiments of the present application, and not all the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.

Referring to fig. 1, the embodiment of the application discloses a continuous etching system for a PTFE tube, which comprises an unwinding roller 1, a pulley 2, a chemical reagent ultrasonic cleaning tank 3, a processor 4, an etching tank 5, a deionized water ultrasonic cleaning tank 6, an acetic acid cleaning tank 7, a winding roller 8, an airing device 9 and a PTFE base tube 10, wherein the unwinding roller 1 is arranged on one side of the chemical reagent ultrasonic cleaning tank 3, and the processor 4 is arranged on the other side of the chemical reagent ultrasonic cleaning tank 3; a processor 4 is arranged on one side of the etching tank 5 close to the chemical reagent ultrasonic cleaning tank 3, and a deionized water ultrasonic cleaning tank 6 is arranged on one side of the etching tank 5 far away from the chemical reagent ultrasonic cleaning tank 3; a deionized water ultrasonic cleaning tank 6 is arranged on one side of the acetic acid cleaning tank 7 close to the etching tank 5, a winding roller 8 is arranged on one side of the acetic acid cleaning tank 7 far away from the etching tank 5, and an airing device 9 is arranged on one side of the winding roller 8 far away from the acetic acid cleaning tank 7; be equipped with PTFE parent tube 10 outside the circumferential direction of unreeling roller 1, PTFE parent tube 10 one end with unreel roller 1 fixed, unreel through unreeling roller 1, PTFE parent tube 10 passes chemical reagent ultrasonic cleaning tank 3, treater 4, etching tank 5, deionized water ultrasonic cleaning tank 6, acetic acid washing tank 7 and wind-up roll 8 through a plurality of pulley 2 in proper order, hangs on airing device 9 at last. The continuous production of the PTFE etching pipe is realized, the production yield of the PTFE etching pipe is improved, manual operation is reduced, the influence of the manual operation on the product quality is reduced, and the quality of the PTFE etching pipe is improved.

In some embodiments, the PTFE base pipe 10 is suspended manually from the airing means 9 after passing through the wind-up roll 8 via a plurality of pulleys 2.

In some embodiments, both sides of the unwinding roller 1 and the winding roller 8 are fixedly connected with the circular guard plate 11, and the circle centers of the circular guard plate 11 and the unwinding roller 1 and the winding roller 8 are the same.

In some embodiments, as shown in fig. 2, the upper and lower portions of the circular guard plate 11 of the unwinding roller 1 are symmetrically provided with bayonets 111, the length and width of the bayonets 111 match the diameter of the PTFE base tube 10, so that one end of the PTFE base tube 10 can penetrate through the bayonets 111 adjacent to one end of the PTFE base tube 10, and the length and width of the bayonets 111 are greater than the diameter of the PTFE base tube 10, so that the PTFE base tube 10 is clamped to the bayonets 111 at the contact position with the bayonets 111, which facilitates the fixing of one end of the PTFE base tube 10.

In some embodiments, as shown in fig. 2, the PTFE base pipe 10 is passed through the bayonet 111 and is fixedly connected to any one of the circular shields 11 of the unwind roll 1 by a pipe bayonet fitting 12.

In some embodiments, the diameter of the roll surface of each of the unwinding roll 1 and the winding roll 8 is 400 mm, the width of the roll surface of each of the unwinding roll 1 and the winding roll 8 is 200 mm, and the diameter of the circular guard plate 11 is 600 mm.

In some embodiments, the unwinding roller 1 and the winding roller 8 can both be used for unwinding and winding functions, the unwinding roller 1 and the winding roller 8 can be controlled by the same PLC controller, the PLC controller can control the speed of the unwinding roller 1 and the winding roller 8 to be 0-20 meters per minute, the unwinding roller 1 and the winding roller 8 can unwind or wind according to the received information, and the received information includes information indicating unwinding and information indicating winding.

In some embodiments, the material of the rod surface of the unwinding roller 1 and the winding roller 8 can be selected from plastic or paper, so that the roller surface of the unwinding roller 1 and the winding roller 8 is prevented from scratching the PTFE base pipe 10, and the quality of the PTFE etching pipe is improved.

In some embodiments, as shown in fig. 2, the tube clamping device 12 includes a bottom plate 121, a connecting shaft 122, a pressing rod 123 and a pressing rod fixing device 124, the connecting shaft 122 and the pressing rod fixing device 124 are disposed on the bottom plate 121, the connecting shaft 122 is disposed in the middle of one end of the bottom plate 121, the distance between the pressing rod fixing device 124 and the connecting shaft 122 matches the length of the pressing rod 123, and the pressing rod 123 is connected to the bottom plate 121 through the connecting shaft 122.

In some embodiments, as shown in fig. 1, the pulleys 2 include a first set of pulleys 21, the first set of pulleys 21 is disposed outside the unwinding roller 1, the chemical agent ultrasonic cleaning tank 3, the processor 4, the etching tank 5, the deionized water ultrasonic cleaning tank 6, the acetic acid cleaning tank 7, the winding roller 8, and the airing device 9, and the processor 4 is any one of an online plasma processor and a corona processor.

In some embodiments, as shown in fig. 3a and 3b, the pulley 2 further includes a second set of pulleys 22, the second set of pulleys 22 includes a first pulley 31 and a second pulley 32, the first pulley 31 and the second pulley 32 are disposed in the ultrasonic chemical reagent cleaning tank 3, a third pulley 61 and a fourth pulley 62 are disposed in the ultrasonic deionized water cleaning tank 6, the first pulley 31 and the second pulley 32, and the third pulley 61 and the fourth pulley 62 are symmetrically located, the first sewage pipe opening 33 is disposed at the center of the bottom of the ultrasonic chemical reagent cleaning tank 3, and the second sewage pipe opening 63 is disposed at the center of the bottom of the ultrasonic deionized water cleaning tank 6.

In some embodiments, the ultrasonic rinsing bath 3 and the ultrasonic rinsing bath 6 may be made of stainless steel, and the positions of the first pulley 31 and the second pulley 32 in the ultrasonic rinsing bath 3 and the positions of the third pulley 61 and the fourth pulley 62 in the ultrasonic rinsing bath 6 may be adjustable.

The height of the chemical reagent in the chemical reagent ultrasonic cleaning tank 3 is higher than the height of the upper surface of the PTFE base pipe 10 above the first pulley 31 and the second pulley 32; the height of the deionized water in the ultrasonic cleaning tank 6 is higher than the height of the upper surface of the PTFE base pipe 10 above the third pulley 61 and the fourth pulley 62, so that both the chemical reagent and the deionized water can submerge the PTFE base pipe 10.

In some embodiments, the ultrasonic frequency of the chemical ultrasonic cleaning tank 3 can be selected to be 20-20000 Hz.

In some embodiments, the modifying gas for processor 4 may be selected from nitrogen, argon, oxygen, or air. The modifying gas for processor 4 may be selected to be air from a cost standpoint, and further, processor 4 may achieve similar results using an online plasma processor when using an online corona processor.

The pressure of the processor 4 can be selected to be atmospheric pressure, the radio frequency power of the processor 4 can be selected to be 0-1000W, wherein the radio frequency power of the processor 4 can be selected to be adjustable, and when the processor 4 is an online plasma processor, a probe of the plasma processor of the processor 4 can be selected to process the PTFE base pipe 10 for 360 degrees.

In some embodiments, as shown in fig. 4, the second set of pulleys 22 further includes a fifth pulley 51 and a sixth pulley 52, the fifth pulley 51 and the sixth pulley 52 are disposed in the etching bath 5, the fifth pulley 51 and the sixth pulley 52 are symmetrical in position, a first observation window 56 is disposed on a side surface of the etching bath 5, an upper portion of a digital thermometer 58 abuts against one corner of the inside of the etching bath 5, a temperature sensing probe at a bottom of the digital thermometer 58 extends into the etching bath 5, the temperature sensing probe at the bottom of the digital thermometer 58 is used for meeting a requirement of temperature measurement of the etching solution in the etching bath 5, a jacket 57 is disposed outside the etching bath 5, a temperature control system is disposed outside the jacket 57, the jacket 57 is connected to the temperature control system, and the temperature inside the jacket 57 can be changed by the temperature control system, so as to change the temperature of the etching bath 5.

In some embodiments, the etching bath 5 is provided with a jacket 57 circumferentially outward.

The bottom of the etching bath 5 is communicated with a third sewage draining pipe 53, a sewage draining switch 55 is arranged at the lower part of the third sewage draining pipe 53, the third sewage draining pipe 53 comprises a third sewage draining pipe orifice 531 and two bubbling device through holes 532 which are symmetrically arranged, the bubbling device through holes 532 are connected with the bubbling device 54, and the diameter of the bubbling device through holes 532 is matched with that of the bubbling device 54;

an etching groove cover plate 59 is arranged at the upper part of the etching groove 5, and semicircular first PTFE base pipe gaps 591 are symmetrically arranged at two ends of the etching groove cover plate 59, so that the PTFE base pipe 10 passes through the first PTFE base pipe gaps 591 on the premise that the etching groove cover plate 59 is not easy to scratch. The etcher cover plate 59 may optionally be a close fit with the etcher 5, and the etcher cover plate 59 may optionally be a removable etcher cover plate 59. The four corners of the etcher cover plate 59 are provided with etcher buckles 594, the etcher cover plate 59 is provided with an etcher cover plate handle 592, and the etcher cover plate 59 is provided with a plurality of gas receiving through holes 593 for nitrogen sealing.

In some embodiments, the material of the etching bath 5 may be stainless steel, and the height of the etching solution in the etching bath 5 is higher than the height of the upper surface of the PTFE substrate tube 10 above the fifth pulley 51 and the sixth pulley 52, so that the etching solution can submerge the PTFE substrate tube 10.

In some embodiments, the bubbling device 54 is in communication with the gas connector for allowing nitrogen to enter for bubbling, the number of the gas receiving through holes 593 is 6, the diameter of the gas receiving through holes 593 is 6 mm, and the gas receiving through holes 593 are connected with the gas connector for allowing nitrogen to enter for nitrogen sealing.

In some embodiments, the etching temperature can be selected to be-20 ℃ to 60 ℃, and the side edge and the bottom of the etching tank 5 can be connected in a radian manner, so as to avoid the residue of the cleaning waste liquid. The length of the etch bath 5 may be selected to be 200 mm, the width of the etch bath 5 may be selected to be 200 mm, and the depth of the etch bath 5 may be selected to be 200 mm.

In some embodiments, as shown in fig. 5, the second set of pulleys 22 further includes a seventh pulley 71, an eighth pulley 72, a ninth pulley 73, and a tenth pulley 74, the acetic acid cleaning tank 7 is provided with the seventh pulley 71, the eighth pulley 72, the ninth pulley 73, and the tenth pulley 74 inside, the seventh pulley 71 is symmetrical to the eighth pulley 72, the ninth pulley 73 is symmetrical to the tenth pulley 74, the bottom center of the acetic acid cleaning tank 7 is provided with a fourth sewage pipe opening 75, and the side of the acetic acid cleaning tank 7 is provided with a second observation window 76; acetic acid washing tank 7 upper portion is provided with acetic acid washing tank apron 77, and the equal symmetry in acetic acid washing tank apron 77 both ends is provided with semi-circular second PTFE parent tube breach 771 to make and be difficult for passing through second PTFE parent tube breach 771 under the prerequisite of 77 fish tails by acetic acid washing tank apron 10, the symmetry is provided with two acetic acid washing tank apron handles 772 on the acetic acid washing tank apron 77.

In some embodiments, the material of the acetic acid cleaning tank 7 and the acetic acid cleaning tank cover plate 77 can be selected to be stainless steel, the acetic acid cleaning tank cover plate 77 can be selected to be tightly connected with the acetic acid cleaning tank 7, and the acetic acid cleaning tank cover plate 77 can be selected to be a detachable acetic acid cleaning tank cover plate 77.

The length of the acetic acid cleaning tank 7 may be selected to be 500 mm, the width of the acetic acid cleaning tank 7 may be selected to be 200 mm, and the depth of the acetic acid cleaning tank 7 may be selected to be 200 mm.

The seventh pulley 71, the eighth pulley 72 and the ninth pulley 73, the tenth pulley 74 are optionally distributed in two layers, i.e. the seventh pulley 71 and the eighth pulley 72 are provided with the ninth pulley 73 and the tenth pulley 74 above.

In some embodiments, the height of the acetic acid solution within the acetic acid cleaning tank 7 is higher than the height of the upper surface of the PTFE base pipe 10 above the ninth pulley 73 and the tenth pulley 74 so that the acetic acid solution can submerge the PTFE base pipe 10.

In some embodiments, as shown in fig. 6, airing device 9 includes airing support 91, and airing support 91 upper portion is provided with a plurality of rings 92 that dry, and airing support 91 bottom is provided with universal wheel 93, is provided with the supporting bayonet socket of ring that dries on the ring 92 of drying, and wherein, the supporting bayonet socket of ring that dries is used for with PTFE base pipe 10 joint on airing ring 92, and universal wheel 93 is convenient for airing device 9's removal.

In some embodiments, the chemical ultrasonic cleaning tank 3, the etching tank 5, the deionized water ultrasonic cleaning tank 6 and the acetic acid cleaning tank 7 can be detachable according to the production requirements of the PTFE etched pipe.

In some embodiments, the PTFE tube continuous etching system provided by the embodiment of the present application further includes an air conditioner for sending fresh air and an exhaust fan for exhausting old air, an air intake of the air conditioner is the same as an air exhaust amount of the exhaust fan, the exhaust fan is connected to an exhaust hood through a telescopic exhaust pipe, and the exhaust hood is disposed directly above the etching bath 5, so that the safety of the PTFE tube continuous etching system provided by the embodiment of the present application is improved.

In addition, the liquid level control of the chemical reagent ultrasonic cleaning tank 3, the etching tank 5, the deionized water ultrasonic cleaning tank 6 and the acetic acid cleaning tank 7, the control of the temperature of etching liquid in the etching tank 5, the control of bubbling nitrogen seal pressure in the etching tank 5, the control of the tension of the PTFE base tube 10, and the control of the air pressure, the temperature and the humidity of the space where the PTFE tube continuous etching system is located can all be introduced into an automatic control system to be adjusted, so that the automation and the intelligent degree of the PTFE tube continuous etching system are further improved.

Since the above embodiments are all described by referring to and combining with other embodiments, the same portions are provided between different embodiments, and the same and similar portions between the various embodiments in this specification may be referred to each other. And will not be described in detail herein.

It is noted that, in this specification, relational terms such as "first" and "second," and the like, are used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a circuit structure, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such circuit structure, article, or apparatus. Without further limitation, the presence of an element identified by the phrase "comprising an … …" does not exclude the presence of other like elements in a circuit structure, article or device comprising the element.

Other embodiments of the present application will be apparent to those skilled in the art from consideration of the specification and practice of the disclosure herein. This application is intended to cover any variations, uses, or adaptations of the invention following, in general, the principles of the application and including such departures from the present disclosure as come within known or customary practice within the art to which the invention pertains. It is intended that the specification and examples be considered as exemplary only, with a true scope and spirit of the application being indicated by the following claims.

The above-described embodiments of the present application do not limit the scope of the present application.

Claims

1. A system for continuous etching of PTFE tubing, comprising: an unreeling roller (1), a pulley (2), a chemical reagent ultrasonic cleaning tank (3), a processor (4), an etching tank (5), a deionized water ultrasonic cleaning tank (6), an acetic acid cleaning tank (7), a reeling roller (8), an airing device (9) and a PTFE base pipe (10), wherein,

the unwinding roller (1) is arranged on one side of the chemical reagent ultrasonic cleaning tank (3), and the processor (4) is arranged on the other side of the chemical reagent ultrasonic cleaning tank (3);

the processor (4) is arranged on one side, close to the chemical reagent ultrasonic cleaning tank (3), of the etching tank (5), and the deionized water ultrasonic cleaning tank (6) is arranged on one side, far away from the chemical reagent ultrasonic cleaning tank (3), of the etching tank (5);

the deionized water ultrasonic cleaning tank (6) is arranged on one side, close to the etching tank (5), of the acetic acid cleaning tank (7), the winding roller (8) is arranged on one side, far away from the etching tank (5), of the acetic acid cleaning tank (7), and the airing device (9) is arranged on one side, far away from the acetic acid cleaning tank (7), of the winding roller (8);

the circumference direction of unreeling roller (1) is equipped with outward PTFE parent tube (10), PTFE parent tube (10) one end is fixed with unreeling roller (1), through unreel roller (1) and unreel, PTFE parent tube (10) passes through a plurality of pulley (2) in proper order chemical reagent ultrasonic cleaning groove (3) treater (4) etch groove (5) deionized water ultrasonic cleaning groove (6) acetic acid cleaning groove (7) with wind-up roll (8) hangs on airing device (9) at last.

2. The continuous etching system for the PTFE tube according to claim 1, wherein both sides of the unwinding roller (1) and the winding roller (8) are fixedly connected with a circular guard plate (11), and the circle centers of the circular guard plate (11) and the unwinding roller (1) and the winding roller (8) are the same.

3. The continuous etching system for PTFE tubes according to claim 2, characterized in that the upper and lower parts of the circular guard plate (11) of the unwinding roller (1) are symmetrically provided with bayonets (111), the length and width of the bayonets (111) are matched with the diameter of the PTFE base tube (10).

4. The continuous etching system of PTFE pipes of claim 3, characterized in that the PTFE base pipe (10) passes through the bayonet (111) and is fixedly connected with any one of the circular guard plates (11) of the unwinding roller (1) through a pipe bayonet device (12).

5. The continuous etching system of the PTFE tube according to claim 4, wherein the tube material bayonet device (12) comprises a bottom plate (121), a connecting shaft (122), a lower pressing rod (123) and a lower pressing rod fixing device (124), the connecting shaft (122) and the lower pressing rod fixing device (124) are arranged on the bottom plate (121), the connecting shaft (122) is arranged in the middle of one end of the bottom plate (121), the distance between the lower pressing rod fixing device (124) and the connecting shaft (122) is matched with the length of the lower pressing rod (123), and the lower pressing rod (123) is connected with the bottom plate (121) through the connecting shaft (122).

6. The continuous etching system of PTFE pipe of claim 1, characterized in that pulley (2) includes first set of pulley (21), first set of pulley (21) set up in unreel roller (1), chemical agent ultrasonic cleaning tank (3), treater (4), etch tank (5), deionized water ultrasonic cleaning tank (6), acetic acid cleaning tank (7), wind-up roll (8) and drying device (9) are outside, treater (4) are any one in online plasma treater and corona treater.

7. The continuous etching system for PTFE tubes according to claim 6, wherein the pulley (2) further comprises a second set of pulleys (22), the second set of pulleys (22) comprises a first pulley (31) and a second pulley (32), the first pulley (31) and the second pulley (32) are arranged in the chemical reagent ultrasonic cleaning tank (3), a third pulley (61) and a fourth pulley (62) are arranged in the deionized water ultrasonic cleaning tank (6), the first pulley (31) and the second pulley (32), the third pulley (61) and the fourth pulley (62) are symmetrical in position, a first sewage pipe orifice (33) is arranged at the center of the bottom of the chemical reagent ultrasonic cleaning tank (3), and a second sewage pipe orifice (63) is arranged at the center of the bottom of the deionized water ultrasonic cleaning tank (6).

8. The continuous etching system for the PTFE tube according to claim 7, wherein the second group of pulleys (22) further comprises a fifth pulley (51) and a sixth pulley (52), the fifth pulley (51) and the sixth pulley (52) are arranged in the etching bath (5), the fifth pulley (51) and the sixth pulley (52) are symmetrical in position, a first observation window (56) is arranged on the side surface of the etching bath (5), a temperature sensing probe at the bottom of a digital thermometer (58) extends into the etching bath (5), the temperature sensing probe at the bottom of the digital thermometer (58) is used for meeting the requirement of measuring the temperature of the etching solution in the etching bath (5), a jacket (57) is arranged outside the etching bath (5), a temperature control system is arranged outside the jacket (57), and the jacket (57) is connected with the temperature control system;

the bottom of the etching bath (5) is communicated with a third sewage discharge pipe (53), a sewage discharge switch (55) is arranged at the lower part of the third sewage discharge pipe (53), the third sewage discharge pipe (53) comprises a third sewage discharge pipe opening (531) and two bubbling device through holes (532) which are symmetrically arranged, the bubbling device through holes (532) are connected with a bubbling device (54), and the diameter of the bubbling device through holes (532) is matched with that of the bubbling device (54);

the improved PTFE substrate etching device is characterized in that an etching groove cover plate (59) is arranged on the upper portion of the etching groove (5), semicircular first PTFE base pipe notches (591) are symmetrically arranged at two ends of the etching groove cover plate (59), etching groove buckles (594) are arranged at four corners of the etching groove cover plate (59), an etching groove cover plate handle (592) is arranged on the etching groove cover plate (59), and a plurality of gas receiving through holes (593) are formed in the etching groove cover plate (59).

9. The continuous etching system for PTFE tubes according to claim 7, wherein the second set of pulleys (22) further comprises a seventh pulley (71), an eighth pulley (72), a ninth pulley (73) and a tenth pulley (74), the seventh pulley (71), the eighth pulley (72), the ninth pulley (73) and the tenth pulley (74) are arranged in the acetic acid cleaning tank (7), the seventh pulley (71) and the eighth pulley (72) are symmetrical in position, the ninth pulley (73) and the tenth pulley (74) are symmetrical in position, a fourth sewage pipe opening (75) is arranged at the center of the bottom of the acetic acid cleaning tank (7), and a second observation window (76) is arranged at the side of the acetic acid cleaning tank (7);

acetic acid washing tank (7) upper portion is provided with acetic acid washing tank apron (77), acetic acid washing tank apron (77) both ends equal symmetry is provided with semi-circular second PTFE parent tube breach (771), the symmetry is provided with two acetic acid washing tank apron handles (772) on acetic acid washing tank apron (77).

10. The continuous etching system for the PTFE pipe of claim 1, wherein the airing device (9) comprises an airing support (91), a plurality of airing rings (92) are arranged on the airing support (91), universal wheels (93) are arranged at the bottom of the airing support (91), and airing ring matching bayonets are arranged on the airing rings (92).