CN210497463U

CN210497463U - Quartz wafer self-cleaning device

Info

Publication number: CN210497463U
Application number: CN201921455598.8U
Authority: CN
Inventors: 李直荣; 温从众; 李直权
Original assignee: Maanshan Rongtai Technology Co ltd
Current assignee: Maanshan Rongtai Technology Co ltd
Priority date: 2019-09-03
Filing date: 2019-09-03
Publication date: 2020-05-12
Anticipated expiration: 2029-09-03

Abstract

The utility model discloses a quartz wafer self-cleaning device, which comprises a housin, drainage pipe is passed through to the bottom of washing tank and filter tank is connected, the internally mounted of filter tank has the filtration otter board, the symmetry is provided with the stopper on the inside lateral wall of washing tank, the internally mounted of mounting groove has first pipeline, the even equidistance in surface of first pipeline is provided with the shower nozzle, the internally mounted of casing has the air-blower, the output of air-blower passes through second pipeline and first pipe connection, the internally mounted of casing has the circulating pump, the internally mounted of water tank has the water pump, supersonic generator is connected with ultrasonic transducer, ultrasonic transducer's output is connected with one side of washing tank. The utility model discloses a set up first pipeline, stopper, shower nozzle, second pipeline, air-blower, water pump, circulating pump and cross filter plate structure, solved existing equipment and did not have the problem that air-dry function and cleaning efficiency are low.

Description

Quartz wafer self-cleaning device

Technical Field

The utility model relates to a quartz wafer washs technical field, specifically is a quartz wafer self-cleaning device.

Background

The quartz plate is usually prepared by smelting quartz, cutting and grinding, and the content of silicon dioxide can reach more than 99.99%. The hardness is Mohs seven grade, and the material has the characteristics of high temperature resistance, low thermal expansion coefficient, good thermal shock resistance, good electrical insulation performance and the like. Generally, the quartz wafers are colorless and transparent, and have a visible light transmittance of 85% or more, and the quality of the quartz wafers is affected due to the adhesion of dirt such as dust on the surfaces of the quartz wafers in the production and processing processes, so that the cleaning treatment is required, while the existing quartz wafers are overlapped with each other in the cleaning process, so that the cleaning efficiency is affected.

However, the prior art has the following defects:

1. the existing automatic cleaning device does not have an air drying function, and cannot rapidly air-dry the quartz wafer, so that the working efficiency is influenced;

2. because the existing quartz wafers are overlapped with each other in the cleaning process, the cleaning efficiency is influenced, and simultaneously, dirt is easy to flow back after cleaning, so that the cleaning efficiency is low.

SUMMERY OF THE UTILITY MODEL

Technical problem to be solved

Not enough to prior art, the utility model provides a quartz wafer self-cleaning device has solved the problem that existing equipment does not have air-dry function and cleaning efficiency low.

(II) technical scheme

In order to achieve the above object, the utility model provides a following technical scheme: an automatic cleaning device for quartz wafers comprises a shell, wherein a cleaning tank is arranged in the shell, a filter tank is arranged in the shell under the cleaning tank, the bottom of the cleaning tank is connected with the filter tank through a drainage pipeline, a filter screen plate is arranged in the filter tank, limit blocks are symmetrically arranged on the side wall in the cleaning tank, mounting grooves are arranged in the shell on two sides of the cleaning tank, a first pipeline is arranged in each mounting groove, spray heads are uniformly arranged on the surface of the first pipeline at equal intervals, an air blower is arranged in the shell, the output end of the air blower is connected with the first pipeline through a second pipeline, a circulating pump is arranged in the shell, a water tank is arranged in the shell, a water pump is arranged in the water tank, an ultrasonic generator and an ultrasonic transducer are arranged in the shell, the ultrasonic generator is connected with the ultrasonic transducer, and the output end of the ultrasonic transducer is connected with one side of the cleaning tank.

Preferably, the bottom of the shell is provided with a support leg, and the bottom of the filter tank is provided with a sewage discharge pipeline.

Preferably, the input end of the circulating pump is connected with the filter tank below the filter screen plate through a circulating pipeline, and the output end of the circulating pump is connected with the water tank through a circulating pipeline.

Preferably, the output end of the water pump is connected with the filter tank through a water guide pipeline, and an observation window is embedded in the surface of the shell at the water tank.

Preferably, the surface of the shell is provided with a PLC controller, and the top of the shell at the water tank is provided with a water inlet.

Preferably, the surface of the filter screen plate is provided with a handle, and the limiting block is U-shaped.

(III) advantageous effects

The utility model provides a quartz wafer self-cleaning device possesses following beneficial effect:

(1) the utility model has the advantages that the utility model has the separation function by arranging the circulating pump, the water pump, the filter screen plate and the limiting blocks, the utility model can effectively avoid the quartz wafers from overlapping each other in the cleaning process to influence the cleaning efficiency, simultaneously, the device has the function of circular cleaning, the cleaning solution in the cleaning tank can realize circular flow, the dirt in the cleaning solution can be effectively prevented from flowing back to the surface of the quartz wafers to influence the cleaning efficiency, when in use, a user can place the quartz wafers to be cleaned between the limiting blocks and carry out limiting and fixing treatment, further, the output end of the water pump leads the cleaning solution in the water tank into the cleaning tank through the water guide pipeline, further, the ultrasonic generator is mutually matched with the ultrasonic transducer and transmits ultrasonic waves to the inside of the cleaning tank, thereby, the ultrasonic waves radiate forwards densely and alternately in the cleaning solution, and then make the washing liquid flow and produce the bubble to make the bubble constantly strike the filth on quartz wafer surface, realize the cleaning function, the sewage after will wasing simultaneously guides into the filter-tank through drainage pipe, and then makes the filter screen board carry out filtration treatment, and make the input of circulating pump take out the washing liquid of filter-tank inside through the circulating line, and guide into the water tank through the circulating line, realize cyclic utilization, thereby make the washing liquid of washing tank inside realize circulation flow, effectively avoid the filth backward flow, improve cleaning efficiency.

(2) The utility model discloses a set up air-blower, first pipeline, second pipeline and shower nozzle, make the utility model discloses have the air-dry function, be convenient for ventilate to the inside of washing tank and air-dry the processing, air-dry quartz wafer fast, improve work efficiency, when using, make the output of air-blower ventilate through the second pipeline and handle the inside of first pipeline, and then make first pipeline ventilate the processing through the inside of shower nozzle to the washing tank to be convenient for air-dry the processing to the quartz wafer of washing tank inside, improve work efficiency.

Drawings

FIG. 1 is a schematic view of the internal structure of the present invention;

FIG. 2 is a front view of the present invention;

fig. 3 is a schematic view of the cleaning tank of fig. 1 according to the present invention.

The reference numbers in the figures are: 1. a housing; 2. a cleaning tank; 3. a filter tank; 4. a water tank; 5. a first conduit; 6. a limiting block; 7. a spray head; 8. a second conduit; 9. a blower; 10. a water guide pipeline; 11. an ultrasonic transducer; 12. a water pump; 13. a circulation pump; 14. an ultrasonic generator; 15. a circulation pipe; 16. a filter screen plate; 17. a water discharge pipeline; 18. a support leg; 19. a PLC controller; 20. a water inlet; 21. an observation window; 22. mounting grooves; 23. a blowdown line; 24. a handle.

Detailed Description

The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.

Referring to fig. 1-3, the present invention provides an embodiment: an automatic cleaning device for quartz wafers comprises a shell 1, supporting legs 18 are installed at the bottom of the shell 1, a PLC 19 is installed on the surface of the shell 1, the model of the PLC 19 is S7-400, for the prior art, a cleaning tank 2 is arranged inside the shell 1, a filter tank 3 is arranged inside the shell 1 under the cleaning tank 2, a sewage discharge pipeline 23 is installed at the bottom of the filter tank 3, sewage inside the filter tank 3 can be conveniently discharged through the sewage discharge pipeline 23, the bottom of the cleaning tank 2 is connected with the filter tank 3 through a drainage pipeline 17, a filter screen plate 16 is installed inside the filter tank 3, a handle 24 is installed on the surface of the filter screen plate 16, the filter screen plate 16 can be conveniently drawn out from the inside of the filter tank 3 through the handle 24, cleaning treatment is convenient, limiting blocks 6 are symmetrically arranged on the side wall inside the cleaning tank 2, the limiting blocks 6 are set to be, the quartz wafers which need to be cleaned are placed between the limiting blocks 6 by a user conveniently, limiting and fixing are achieved, the problem that cleaning efficiency IS affected due to the fact that the quartz wafers are mutually attached in the cleaning process IS effectively avoided, mounting grooves 22 are formed in the shell 1 on the two sides of the cleaning groove 2, first pipelines 5 are mounted inside the mounting grooves 22, spray heads 7 are uniformly and equidistantly arranged on the surfaces of the first pipelines 5, air blowers 9 are mounted inside the shell 1, the type of the air blowers 9 IS RB-022, the prior art IS provided, the output end of the air blowers 9 IS connected with the first pipelines 5 through second pipelines 8, circulating pumps 13 are mounted inside the shell 1, the type of the circulating pumps 13 IS IS, the prior art IS provided, the input end of each circulating pump 13 IS connected with a filtering groove 3 below a filtering screen plate 16 through a circulating pipeline 15, a water tank 4 IS arranged inside the shell 1, and a water, the cleaning solution can be conveniently injected into the water tank 4 through the water inlet 20, the surface of the shell 1 at the position of the water tank 4 is embedded with the observation window 21, the output end of the circulating pump 13 is connected with the water tank 4 through the circulating pipeline 15, the water pump 12 is installed inside the water tank 4, the model of the water pump 12 is ISGD, the prior art is adopted, the output end of the water pump 12 is connected with the filter tank 3 through the water guide pipeline 10, the ultrasonic generator 14 and the ultrasonic transducer 11 are installed inside the shell 1, the model of the ultrasonic generator 14 is MD67-KMD-K1, the prior art is adopted, the model of the ultrasonic transducer 11 is YP-4020-6BD, the prior art is adopted, the ultrasonic generator 14 is connected with the ultrasonic transducer 11, the output end of the ultrasonic transducer 11 is connected with one side of the cleaning tank 2, the ultrasonic generator 14 and the ultrasonic transducer 11 can be conveniently matched, therefore, the ultrasonic waves are radiated forwards at intervals in the cleaning liquid, so that the cleaning liquid flows and generates bubbles, and the bubbles continuously impact dirt on the surface of the quartz wafer to realize the cleaning function.

The working principle is as follows: when in use, a user places a quartz wafer to be cleaned between the limiting blocks 6 to realize limiting and fixing, and controls the device through the PLC 19, so that the output end of the water pump 12 guides the cleaning solution in the water tank 4 into the cleaning tank 2 through the water guide pipeline 10, the ultrasonic generator 14 is matched with the ultrasonic transducer 11 to transmit ultrasonic waves into the cleaning tank 2, the ultrasonic waves are radiated forwards at intervals in the cleaning solution, the cleaning solution flows to generate bubbles, the bubbles continuously impact dirt on the surface of the quartz wafer to realize the cleaning function, meanwhile, the cleaned sewage is guided into the filter tank 3 through the water drainage pipeline 17, the filter screen plate 16 is filtered, the input end of the circulating pump 13 pumps the cleaning solution in the filter tank 3 through the circulating pipeline 15 and is guided into the water tank 4 through the circulating pipeline 15, realize cyclic utilization, the washing is ended, makes the output of air-blower 9 carry out ventilation treatment through second pipeline 8 to the inside of first pipeline 5, and then makes first pipeline 5 carry out ventilation treatment through shower nozzle 7 to the inside of washing tank 2 to be convenient for air-dry the processing to the inside quartz wafer of washing tank 2.

To sum up can, the utility model discloses a set up first pipeline 5, stopper 6, shower nozzle 7, second pipeline 8, air-blower 9, water pump 12, circulating pump 13 and filter plate 16 structure, solved current equipment and did not have the problem that air-dry function and cleaning efficiency hang down.

It is noted that, herein, relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus.

Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.

Claims

1. An automatic cleaning device for quartz wafers comprises a shell (1), and is characterized in that: the cleaning tank is characterized in that a cleaning tank (2) is arranged inside the shell (1) under the cleaning tank (2), a filter tank (3) is arranged inside the shell (1) under the cleaning tank (2), a drainage pipeline (17) is arranged at the bottom of the cleaning tank (2) and connected with the filter tank (3), a filter screen plate (16) is arranged inside the filter tank (3), limit blocks (6) are symmetrically arranged on the side wall inside the cleaning tank (2), mounting grooves (22) are arranged inside the shell (1) on the two sides of the cleaning tank (2), a first pipeline (5) is arranged inside the mounting grooves (22), spray heads (7) are arranged on the surface of the first pipeline (5) in uniform and equidistant mode, an air blower (9) is arranged inside the shell (1), the output end of the air blower (9) is connected with the first pipeline (5) through a second pipeline (8), a circulating pump (13) is arranged inside the shell, the inside of casing (1) is provided with water tank (4), the internally mounted of water tank (4) has water pump (12), the internally mounted of casing (1) has supersonic generator (14) and ultrasonic transducer (11), supersonic generator (14) is connected with ultrasonic transducer (11), the output of ultrasonic transducer (11) is connected with one side of washing tank (2).

2. An apparatus for automatically cleaning a quartz wafer according to claim 1, wherein: the bottom of the shell (1) is provided with a support leg (18), and the bottom of the filter tank (3) is provided with a sewage discharge pipeline (23).

3. An apparatus for automatically cleaning a quartz wafer according to claim 1, wherein: the input end of the circulating pump (13) is connected with the filter tank (3) below the filter screen plate (16) through a circulating pipeline (15), and the output end of the circulating pump (13) is connected with the water tank (4) through the circulating pipeline (15).

4. An apparatus for automatically cleaning a quartz wafer according to claim 1, wherein: the output end of the water pump (12) is connected with the filter tank (3) through a water guide pipeline (10), and an observation window (21) is embedded in the surface of the shell (1) at the position of the water tank (4).

5. An apparatus for automatically cleaning a quartz wafer according to claim 1, wherein: the surface mounting of casing (1) has PLC controller (19), casing (1) top of water tank (4) department is provided with water inlet (20).

6. An apparatus for automatically cleaning a quartz wafer according to claim 1, wherein: the surface of the filter screen plate (16) is provided with a handle (24), and the limiting block (6) is U-shaped.