CN115029666A - 一种铝基板锣刀复合涂层及其加工方法 - Google Patents

一种铝基板锣刀复合涂层及其加工方法 Download PDF

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CN115029666A
CN115029666A CN202210804107.6A CN202210804107A CN115029666A CN 115029666 A CN115029666 A CN 115029666A CN 202210804107 A CN202210804107 A CN 202210804107A CN 115029666 A CN115029666 A CN 115029666A
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汪万勇
殷德政
薛晓明
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Yichang Josn Seiko Technology Co ltd
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Abstract

本发明公开了一种铝基板锣刀复合涂层及其加工方法，该复合涂层包括铝基板锣刀，其上依次设有金属过渡层、氮化物过渡层、金属掺杂DLC层和超润滑DLC层，其中金属过渡层为Cr或者Ti层，氮化物过渡层为CrN或TiN，金属掺杂DLC层中的掺杂元素为Cr。加工时，先对铝基板锣刀进行超声波清洗及氩离子清洗；然后用磁控溅射的方式沉积金属过渡层；再采用磁控溅射的方式沉积氮化物过渡层；采用磁控溅射和磁过滤电弧离子镀的方式沉积金属掺杂DLC层；最后采用磁过滤电弧离子镀的方式沉积DLC层，得到铝基板锣刀复合涂层。本发明通过在铝基板锣刀上设置多涂层结构，从金属过渡层到DLC层，各层涂层硬度逐步提高，有利于提升DLC涂层的结合力，提供良好的润滑性能以及耐磨性能。

Description

一种铝基板锣刀复合涂层及其加工方法
技术领域
本发明属于涂层技术领域，尤其涉及一种铝基板锣刀复合涂层及其加工方法。
背景技术
铝基板质由于铝含量较高，在加工过程中容易出现粘刀、毛刺、板边发黑、刀具磨损大寿命短等问题，而DLC涂层由于硬度高，耐磨性能好，加上摩擦系数低润滑作用好，在铝基板锣刀上沉积DLC涂层可以显著改善铝基板加工过程中粘刀、毛刺、刀具磨损大等问题。
但DLC的成膜工艺复杂，加上DLC本身的内应力与热应力非常大，在涂层沉积以及刀具加工过程中容易出现涂层脱落问题，无法起到耐磨及润滑的作用，从而影响铝基板的加工品质。
发明内容
本发明的目的在于提供铝基板锣刀复合涂层，旨在解决所述背景技术中存在的问题。为实现所述目的，本发明采用的技术方案是：
一种铝基板锣刀复合涂层，包括铝基板锣刀，其上依次设有金属过渡层、氮化物过渡层、金属掺杂DLC层和超润滑DLC层；其中金属过渡层为Cr或者Ti层，氮化物过渡层为CrN或TiN，金属掺杂DLC层中的掺杂元素为Cr。
进一步的，所述铝基板锣刀为钨钢锣刀。
进一步的，所述金属过渡层的厚度为100nm。
进一步的，所述氮化物过渡层的厚度为100nm，且其中氮元素含量低于5wt％。
进一步的，所述金属掺杂DLC层的厚度为200nm，该层中Cr含量为1-2wt％。
进一步的，所述DLC层的厚度为150-250nm。
一种铝基板锣刀复合涂层的加工方法，包括以下步骤：
S1、对铝基板锣刀进行超声波清洗，去除表面杂质，后进行氩离子清洗；
S2、在S1所得的铝基板锣刀上采用磁控溅射的方式沉积金属过渡层；
S3、在S2所得的金属过渡层上采用磁控溅射的方式沉积氮化物过渡层；
S4、在S3所得的氮化物过渡层上采用磁控溅射和磁过滤电弧离子镀的方式沉积金属掺杂DLC层；
S5、在S4所得的金属掺杂DLC层上采用磁过滤电弧离子镀的方式沉积超润滑DLC层，得到铝基板锣刀复合涂层。
进一步的，所述氩离子清洗为氩离子辉光放电清洗。
进一步的，所述S2、S3及S4中磁控溅射时为高频脉冲磁控溅射，8000V，脉冲宽度3ms，占空比1％-10％。
进一步的，所述磁过滤电弧离子镀偏转电流2.0A，正偏压36V，弧流90A，气压1*10- 1Pa。
本发明的有益效果：
1、本发明通过在铝基板锣刀上设置多涂层结构，从金属过渡层、氮化物过渡层、金属掺杂DLC层和DLC层，各层涂层硬度逐步提高，有利于提升DLC涂层的结合力从而为铝基板锣刀提供良好的润滑性能以及耐磨性能；
2、本发明提供的加工方法，先对铝基板锣刀进行超声波清洗预处理，去除刀具表面脏物；然后氩离子清洗，再依次沉积金属过渡层、氮化物过渡层、金属掺杂DLC层和DLC层，可以有效提升DLC涂层的结合力。
附图说明
图1为本发明中复合涂层的结构示意图；
图2为本发明复合涂层加工的工艺流程图。
其中，图中各附图标记：
101：铝基板锣刀，102：金属过渡层，103：氮化物过渡层，104：金属掺杂DLC层，105：超润滑DLC层。
具体实施方式
为了便于理解本发明，下面将参照相关附图对本发明进行更全面的描述。附图中给出了本发明的较佳实施方式。但是，本发明可以以许多不同的形式来实现，并不限于本文所描述的实施方式。相反地，提供这些实施方式的目的是使对本发明的公开内容理解的更加透彻全面。
需要说明的是，当元件被称为“固定于”另一个元件，它可以直接在另一个元件上或者也可以存在居中的元件。当一个元件被认为是“连接”另一个元件，它可以是直接连接到另一个元件或者可能同时存在居中元件。相反，当元件被称作“直接在”另一元件“上”时，不存在中间元件。本文所使用的术语“垂直的”、“水平的”、“左”、“右”以及类似的表述只是为了说明的目的，并不表示是唯一的实施方式，本文所使用的术语“上端”、“下端”、“左侧”、“右侧”、“前端”、“后端”以及类似的表达是参考附图的位置关系。
除非另有定义，本文所使用的所有的技术和科学术语与属于本发明的技术领域的技术人员通常理解的含义相同。本文中在本发明的说明书中所使用的术语只是为了描述具体的实施方式的目的，不是旨在于限制本发明。本文所使用的术语“及/或”包括一个或多个相关的所列项目的任意的和所有的组合。
下面结合具体实施方式对本专利的技术方案作进一步详细地说明。
如图1～2所示，本发明实施例提供了本发明提供一种铝基板锣刀复合涂层，包括铝基板锣刀101，其上依次设有金属过渡层102、氮化物过渡层103、金属掺杂DLC层104和超润滑DLC层105；
其中金属过渡层102为Cr层，厚度为100nm，氮化物过渡层103为CrN层，厚度为100nm，
金属掺杂DLC层104中的掺杂元素为Cr，金属掺杂DLC层104厚度为200nm；超润滑DLC层105厚度200nm。
本铝基板锣刀复合涂层在具体加工时，包括以下步骤：
S1、对铝基板锣刀101进行超声波清洗，去除表面杂质，后进行氩离子清洗；
S2、在S1所得的铝基板锣刀101上采用磁控溅射的方式沉积金属过渡层102；
S3、在S2所得的金属过渡层102上采用磁控溅射的方式沉积氮化物过渡层103；
S4、在S3所得的氮化物过渡层103上采用磁控溅射和磁过滤电弧离子镀的方式沉积金属掺杂DLC层104；
S5、在S4所得的金属掺杂DLC层104上采用磁过滤电弧离子镀的方式沉积超润滑DLC层105，得到铝基板锣刀复合涂层。
具体的，氩离子清洗为氩离子辉光放电清洗。
具体的，S2、S3及S4中磁控溅射时为高频脉冲磁控溅射，8000V，脉冲宽度3ms，占空比1％-10％。
具体的，磁过滤电弧离子镀偏转电流2.0A，正偏压36V，弧流90A，气压1*10-1Pa。
以上实施方式仅用于说明本发明，而并非对本发明的限制，有关技术领域的普通技术人员，在不脱离本发明的精神和范围的情况下，还可以做出各种变化和变型，因此所有等同的技术方案也属于本发明的范畴，本发明的专利保护范围应由权利要求限定。

Claims (10)

1.铝基板锣刀复合涂层，其特征在于：包括铝基板锣刀，其上依次设有金属过渡层、氮化物过渡层、金属掺杂DLC层和超润滑DLC层；其中金属过渡层为Cr或者Ti层，氮化物过渡层为CrN或TiN，金属掺杂DLC层中的掺杂元素为Cr。
2.根据权利要求1所述的铝基板锣刀复合涂层，其特征在于：所述铝基板锣刀为钨钢锣刀。
3.根据权利要求2所述的铝基板锣刀复合涂层，其特征在于：所述金属过渡层的厚度为100nm。
4.根据权利要求3所述的铝基板锣刀复合涂层，其特征在于：所述氮化物过渡层的厚度为100nm，且其中氮元素含量低于5wt％。
5.根据权利要求4所述的铝基板锣刀复合涂层，其特征在于：所述金属掺杂DLC层的厚度为200nm，该层中Cr含量为1-2wt％。
6.根据权利要求5所述的铝基板锣刀复合涂层，其特征在于：所述DLC层的厚度为150-250nm。
7.一种铝基板锣刀复合涂层的加工方法，其特征在于：所述加工方法应用于权利要求1-6任一项所述铝基板锣刀复合涂层，包括以下步骤：
S1、对铝基板锣刀进行超声波清洗，去除表面杂质，后进行氩离子清洗；
S2、在S1所得的铝基板锣刀上采用磁控溅射的方式沉积金属过渡层；
S3、在S2所得的金属过渡层上采用磁控溅射的方式沉积氮化物过渡层；
S4、在S3所得的氮化物过渡层上采用磁控溅射和磁过滤电弧离子镀的方式沉积金属掺杂DLC层；
S5、在S4所得的金属掺杂DLC层上采用磁过滤电弧离子镀的方式沉积超润滑DLC层，得到铝基板锣刀复合涂层。
8.根据权利要求7所述的铝基板锣刀复合涂层的加工方法，其特征在于：所述氩离子清洗为氩离子辉光放电清洗。
9.根据权利要求7所述的铝基板锣刀复合涂层的加工方法，其特征在于：所述S2、S3及S4中磁控溅射时为高频脉冲磁控溅射，8000V，脉冲宽度3ms，占空比1％-10％。
10.根据权利要求7所述的铝基板锣刀复合涂层的加工方法，其特征在于：所述磁过滤电弧离子镀偏转电流2.0A，正偏压36V，弧流90A，气压1*10-1Pa。
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