CN115003436A - 用于借助气体雾化熔体流的装置 - Google Patents
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Abstract
本发明关于一种用于借助气体将金属的、金属间的或陶瓷的熔体流雾化成球形粉末的装置,包括:‑熔炼室(1);‑粉末室(2);‑该熔炼室(1)中的感应线圈(3);熔料,较佳该感应线圈(3)中的熔棒(7);以及布置在喷嘴板(4)中的用于通过该感应线圈(3)由该熔料熔化而成的熔体流(8)的喷雾嘴(5),该喷雾嘴将该熔炼室(1)与该粉末室(2)连接在一起,其中该喷雾嘴(5)具有仅收敛的喷嘴内型,该喷嘴内型具有横截面呈圆弧形的喷嘴侧面(13),借此,该雾化气体(V)以及该熔体流及由其产生的小滴最大程度地达到该雾化气体(V)的某个速度,其较佳小于音速。
Description
本专利申请要求德国专利申请DE 10 2019 214 555.8的优先权,其内容通过引用并入本文。
技术领域
本发明涉及一种用于借助气体将金属的、金属间的或陶瓷的熔体流雾化成球形粉末的装置。
背景技术
本发明的背景为,在工业领域的大量技术中应用金属粉末来制造构件或功能层。例如烧结钢、硬质金属、触点材料、永磁体、陶瓷及热喷涂层。
特别是在增材制造及金属粉末注射成型领域内对粉末的球度及粒度分布提出特殊要求,因为此等要求是制程上的进一步处理的必要前提。采用四个基本技术来制造球形金属粉末:电浆辅助的线材喷雾(参见WO 2011 054113 A1)、具有不规则表面的粉末的电浆球化(参见EP 1 689 519 B1)、电浆旋转电极工艺(参见US 5 147 448 A)以及液态熔体的气体雾化。
最后一技术亦可应用于某些陶瓷,且包括多个的制造液态熔体的不同方法:
·VIGA(Vacuum Induction Gas Atomization(真空感应气体雾化)-陶瓷冷坩埚中的感应熔炼)
·EIGA(Electrode Induction Gas Atomization(电极感应气体雾化)-金属或金属间棒料的无坩埚感应熔炼)
·PIGA(Plasma Inert Gas Atomization(电浆惰性气体雾化)-冷坩埚中的电浆熔炼)
采用基于坩埚的熔炼工艺时,可通过倾斜坩埚(浇注)、坩埚的底部出口或熔炼棒料(电极)来制造待雾化的浇注射流。根据待熔炼材料的特定特性来选择较佳的熔炼工艺。因此,例如无法在陶瓷坩埚中熔炼难熔及亲氧金属或合金,因为坩埚材料无法承受制程温度或会被熔体还原。
正如Schulz G的专业论文“Laminar sonic and supersonic gas flowatomization-the NANOVAL process(层流音速及超音速气流雾化-NANOVAL制程)”(世界粉末冶金与颗粒材料大会,粉末冶金的进展,1996年,第1期,第43-54页)所述,借助雾化气体实施的所有自由下落的液态熔体的雾化工艺皆对所形成粉末粒子的球度及气体孔隙度有影响。迄今为止仍无法制成粉末微粒表面不含卫星球且无气体孔隙的气体雾化粉末,其为借助PREP或电浆雾化的先前技术。但PREP或电浆雾化在经济效益方面具有严重的劣势,且相应地比气体雾化粉末贵得多。
在气体辅助的雾化工艺中,原则上对自由落体式雾化(自由落体式喷嘴、紧耦合喷嘴)与借助拉伐尔喷嘴的气体喷射导引雾化的不同设计加以区分。
具有此种拉伐尔喷嘴的借助气体将熔体流雾化成球形粉末的装置由WO 2015/092008 A1公开过,且包括熔炼室、粉末室、熔炼室中的感应线圈,及将这两个腔室连接在一起的布置在喷嘴板上的拉伐尔喷雾嘴,其具有收敛-扩张喷嘴内型。
通过此喷雾嘴,将被处于压力下的雾化气体径向包裹且在熔体室中由感应线圈自熔料感应地制成的熔体流基于重力作用导入喷嘴,并且在拉伐尔喷雾嘴中及之后裂解成微小的小滴。该等小滴凝结成待制成的粉末粒子。
就此而言,由此制成的粉末粒子在卫星球形成及气体孔隙形成方面需要改良。
发明内容
本发明的目的在于,提供一种用于液态金属及陶瓷熔体的气体雾化的雾化装置,该装置在最大的经济效益下尽可能防止卫星球形成以及防止形成气体孔隙。
根据一个实施例,用以达成该目的的解决方案为,应用一种新型的气体喷射导引喷雾嘴,其具有仅收敛的喷嘴内型,该喷嘴内型具有横截面呈圆弧形的喷嘴侧面,借此,该雾化气体以及该熔体流及由其产生的小滴最大程度地达到雾化气体的某个速度,其较佳小于音速。因此,不同于习知的拉伐尔雾化,雾化气体的速度在雾化制程期间不超过音速。
事实表明,可用此种喷嘴内型在最大的经济效益下以尽可能防止卫星球形成以及防止形成气体孔隙的方式制成质量改良的粉末粒子。
本发明的较佳改良方案参阅其他实施例。因此,喷嘴板在喷嘴出口侧上的表面可为平整的,且垂直于熔体流的流向。因此,在喷嘴出口侧上形成明显的边缘,由该边缘产生对由熔体流形成粒子进行辅助的附加涡流效应。
根据本发明的另一较佳实施方式,该感应线圈可构建为高度可调节的。
有利地,可通过线圈的该高度可调节性改变形成熔体流的浇注射流直至喷嘴的自由下落高度。熔体温度特别是通过喷射功率的输出而随着下落高度的增大而降低,因此,熔体进入喷嘴时的黏度发生改变,从而针对性地控制所产生的粒度分布。
需要指出的是,线圈的高度可调节性可与本发明的其余部分分离地在实现所描述优点的情况下与其他类型的喷雾嘴一起应用于雾化装置。
根据本发明的另一较佳实施方式,该感应线圈可构建为朝喷雾嘴方向呈锥形地逐渐变窄的,其中用于形成熔体流的待雾化材料的圆柱形棒材共轴布置在感应线圈中。
其他实施例涉及用于喷嘴内型的设计及尺寸确定的参数,借助该等参数在制成的粉末粒子中产生极佳的质量结果。为避免重复,请参阅该实施例。
为将本发明的雾化装置尽可能合理且迅速地与不同用途相匹配,在另一较佳实施方式中,该喷雾嘴可布置在可分离地设在喷嘴板中的单独的喷嘴嵌入物中。
本发明的更多特征、细节及优点参阅下文结合图式对实施例所作的描述。
附图说明
图1为雾化装置的轴向剖面示意图。
附图所示雾化装置的主要组成部分为熔炼室1、粉末室2(也称雾化室)、布置在熔炼室1中的感应线圈3,及布置在这两个腔室1、2之间的喷嘴板4,在该喷嘴板上,一喷雾嘴5用于将这两个腔室1、2连接在一起。喷嘴板4在出口侧16上为平整的,且垂直于熔体流8的流向。
具体实施方式
在处于氩气压力p1下的熔炼室1中,将形式为配设有45°顶端6的圆柱形棒料7的待雾化材料部分地导入具有三个绕组的锥形感应线圈3,此点例如基本上由DE 41 02 101 A1公开过。感应线圈3的锥度相当于待雾化棒料7的顶端6的锥度。顶端6且特别是顶端6的表面通过流过感应线圈3的中心频率电流感应加热,直至在表面上形成熔融相。该熔体流8在锥形面上朝下流动,并且以连续的浇注射流形式自顶端6滴落。形成熔体流8的浇注射流的质量流量可通过感应耦合的电功率在0.4kg/min至2.5kg/min的较大范围内变化。0.8至1.5kg/min的熔体流特别适用于雾化。在雾化期间,棒料7缓慢地围绕其对称轴S旋转并且持续朝下移动。由棒料7的可介于30至200mm的直径D及经过设定的下降速度产生相应的熔炼速率。介于80至150mm的棒料直径D在制程技术上特别有利。
感应线圈3的高度可调节性ΔH通过仅在图中示意性地示出的线性悬吊装置9实现,可通过该高度可调节性改变浇注射流直至喷嘴的自由下落高度,以及如前所述地,改变熔体进入喷嘴时的黏度。喷雾嘴5与感应线圈3之间的3至100mm的间距在技术上是合理的。若线圈间距更小,则存在自线圈至喷嘴的电压击穿的危险,若间距更大,则存在浇注射流在进入喷嘴开口前便裂解的危险。此外,水平的线圈绕组特别有利,因为借此,便能不同于上升的线圈绕组地,防止浇注射流在离开线圈磁场时因电磁力而发生偏转。
旋转对称的喷雾嘴5以其中心点处于棒料7及线圈3的对称轴S上,且以间距H处于感应线圈3中的最下面的绕组下方。该喷雾嘴布置在可分离地设在喷嘴板4中的单独的喷嘴嵌入物11中,通过以压力p1压紧至经水冷的喷嘴板4来间接地冷却该喷嘴嵌入物。熔体流8被自熔炼室1流入粉末室2的气体径向地包裹、压缩,并且穿过喷雾嘴5的圆形开口在喷嘴出口上最大加速至音速。其驱动力为熔炼室中的气压p1与粉末室2中的气压p2间的正压差。该压差为至少0.2bar,最大25bar。处于2bar至10bar范围内的压差在技术上特别有利。
即使在压差p1-p2较大的情况下,喷雾嘴5中的雾化气体V因该仅收敛的喷嘴形状而最大加速至音速,因为在超音速范围内,收敛的喷嘴内型用作扩散器并且使气体重新减速。压差p1-p2愈大,则愈快达到喷嘴内型中的音速的极限。因此,气流并非层流式,因为紧挨喷嘴出口的气压为压力的函数,且明显大于粉末室中的环境压力p2。
雾化气体在射流状的熔体流8中产生压应力及剪应力,从而将该熔体流压缩及加速。熔体射流中的熔炼速度在径向上自外向内减小。离开喷雾嘴5后,压应力及剪应力立刻因熔体射流束12分解为单个小滴而减小,该等小滴在雾化室中凝结成球形粉末微粒。出人意料地,毋须为此采用层流式的气流,或气体速度毋须大于音速。相反,通过仅在亚音速范围内进行的雾化,相对于习知拉伐尔雾化,粉末微粒的球度得到改良且气体孔隙度减小。此点通过仅收敛的喷嘴内型实现,在该喷嘴内型中,横截面呈圆弧形的喷嘴侧面13以不完整圆的形式构建,该不完整圆具有2至15mm,较佳5mm的半径R及喷雾嘴5的高度h,该高度小于收敛圆半径R。喷嘴出口上的切线T与喷嘴出口侧成<90°的角度W。在具体实施例中,在收敛半径R为5mm的情况下,高度为4.5mm。喷嘴的直径可在2至20mm范围内变化。在实施例中,喷嘴直径d为10mm。就该等参数而言,在压力p1=4.5bar且p2=930mbar的情况下,Ti合金粉末中的d50值达到50μm。
此外,喷嘴嵌入物11由需要被雾化的特定材料制成,也即例如由TiAl或钛制成。其直径E可为20至200mm,较佳140mm。
棒料7例如可为所谓的EIGA电极,其直径D为最大150mm。在所示实施例中,选择115mm的直径D。
对形式为由铜制成的具有45°的斜率的锥形内冷线圈的感应线圈3而言,最上面的绕组14的内径I可为最大170mm,具体而言例如为130mm,且最上面的、中间的、最下面的线圈绕组14、15、10的竖向间距G的大小为3至20mm,较佳8mm。线圈绕管的直径F可为10至30mm,较佳16mm。也可采用矩形的横截面。
感应线圈3与喷嘴5的底侧间的间距H为10mm。
Claims (9)
1.一种用于借助气体将金属的、金属间的或陶瓷的熔体流雾化成球形粉末的装置,包括
熔炼室(1),
粉末室(2),
该熔炼室(1)中的感应线圈(3),
熔料,较佳该感应线圈(3)中的熔棒料(7),以及
布置在喷嘴板(4)中的用于通过该感应线圈(3)由该熔料熔化而成的熔体流(8)的喷雾嘴(5),该喷雾嘴将该熔炼室(1)与该粉末室(2)连接在一起,
其特征在于,
该喷雾嘴(5)具有仅收敛的喷嘴内型,该喷嘴内型具有横截面呈圆弧形的喷嘴侧面(13),借此,该雾化气体(V)以及该熔体流及由其产生的小滴最大程度地达到该雾化气体(V)的某个速度,其较佳小于音速。
2.根据权利要求1所述的装置,其中该喷嘴板(4)在其喷嘴出口侧上的表面为平整的,且垂直于该熔体流(8)的流向。
3.根据权利要求1或2所述的装置,其中该感应线圈(3)为高度可调节的。
4.根据权利要求1或2所述的装置,其中该感应线圈(3)构建为朝喷雾嘴(5)方向呈锥形地逐渐变窄的,其中用于形成该熔体流(8)的待雾化材料的圆柱形棒料(7)共轴布置在该感应线圈(3)中。
5.根据权利要求1或2所述的装置,其中该喷嘴内型为旋转对称的,且该喷雾嘴(5)在该最小横截面处具有3至15mm,较佳6至12mm,尤佳10mm的直径(d)。
6.根据权利要求1或2所述的装置,其中该喷嘴侧面(13)的横截面轮廓由半径(R)为2至10mm,较佳5mm的部分圆弧形成。
7.根据权利要求1或2所述的装置,其中该喷嘴出口上的切线(T)与该喷嘴出口侧成<90°的角度(W)。
8.根据权利要求1或2所述的装置,其中该喷雾嘴(5)的高度(h)为2.5至9.5mm,较佳4.5mm。
9.根据权利要求1或2所述的装置,其中该喷雾嘴(5)布置在可分离地设在该喷嘴板(4)中的单独的喷嘴嵌入物(11)中。
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