CN114930530A - 一种三维铁电存储器、制作方法及电子设备 - Google Patents

一种三维铁电存储器、制作方法及电子设备 Download PDF

Info

Publication number
CN114930530A
CN114930530A CN202080092634.8A CN202080092634A CN114930530A CN 114930530 A CN114930530 A CN 114930530A CN 202080092634 A CN202080092634 A CN 202080092634A CN 114930530 A CN114930530 A CN 114930530A
Authority
CN
China
Prior art keywords
layer
voltage lines
memory
ferroelectric
columns
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202080092634.8A
Other languages
English (en)
Inventor
张岩
杨喜超
魏侠
秦健鹰
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Huawei Technologies Co Ltd
Original Assignee
Huawei Technologies Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Huawei Technologies Co Ltd filed Critical Huawei Technologies Co Ltd
Publication of CN114930530A publication Critical patent/CN114930530A/zh
Pending legal-status Critical Current

Links

Images

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/22Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using ferroelectric elements
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B51/00Ferroelectric RAM [FeRAM] devices comprising ferroelectric memory transistors
    • H10B51/20Ferroelectric RAM [FeRAM] devices comprising ferroelectric memory transistors characterised by the three-dimensional arrangements, e.g. with cells on different height levels

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Semiconductor Memories (AREA)

Abstract

本申请提供了一种三维铁电存储器的制作方法,该方法能够在保证三维铁电存储器具有较好的耐久性,同时又能降低三维铁电存储器制作过程中的刻蚀难度。该方法包括:在衬底上形成堆叠层,该堆叠层包括堆叠且交替设置的隔离层和牺牲层;在堆叠层中设置多列第一电压线,在多列第一电压线中任意相邻的两列第一电压线之间设置隔离凹槽;刻蚀掉堆叠层中的牺牲层,并形成与隔离层堆叠且交替设置的金属层以得到存储层,金属层包括铁电层和多个第二电压线,铁电层包围多个第二电压线和多列第一电压线位于金属层的部分,以使金属层中形成MFM结构,保证了该三维铁电存储器的耐久性。同时由于牺牲层为易腐蚀的材料,从而可以降低制作过程中的刻蚀难度。

Description

PCT国内申请,说明书已公开。

Claims (23)

  1. PCT国内申请,权利要求书已公开。
CN202080092634.8A 2020-05-29 2020-05-29 一种三维铁电存储器、制作方法及电子设备 Pending CN114930530A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/CN2020/093504 WO2021237730A1 (zh) 2020-05-29 2020-05-29 一种三维铁电存储器、制作方法及电子设备

Publications (1)

Publication Number Publication Date
CN114930530A true CN114930530A (zh) 2022-08-19

Family

ID=78745396

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202080092634.8A Pending CN114930530A (zh) 2020-05-29 2020-05-29 一种三维铁电存储器、制作方法及电子设备

Country Status (2)

Country Link
CN (1) CN114930530A (zh)
WO (1) WO2021237730A1 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117241589A (zh) * 2022-06-02 2023-12-15 华为技术有限公司 铁电存储器及其制备方法、电子设备

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9941299B1 (en) * 2017-05-24 2018-04-10 Sandisk Technologies Llc Three-dimensional ferroelectric memory device and method of making thereof
CN109786390B (zh) * 2017-11-13 2022-12-20 萨摩亚商费洛储存科技股份有限公司 三维储存元件及其制造方法
KR102538701B1 (ko) * 2018-02-22 2023-06-01 에스케이하이닉스 주식회사 강유전성 메모리 장치 및 그 구동 방법
CN108550575B (zh) * 2018-04-13 2019-05-31 长江存储科技有限责任公司 三维存储器的制备方法及沟槽底部刻蚀方法
CN110071117B (zh) * 2019-04-28 2021-05-11 中国科学院微电子研究所 一种三维nand型铁电存储器、制作方法及操作方法

Also Published As

Publication number Publication date
WO2021237730A1 (zh) 2021-12-02

Similar Documents

Publication Publication Date Title
TW201826268A (zh) 個別地包含一電容器及一垂直延伸電晶體之記憶體單元陣列,形成記憶體單元陣列之一層之方法及形成個別地包含一電容器及一垂直延伸電晶體之記憶體單元陣列之方法
US7732851B2 (en) Method for fabricating a three-dimensional capacitor
US11049864B2 (en) Apparatuses including capacitor structures, and related memory devices, electronic systems, and methods
KR100360592B1 (ko) 반도체 장치 및 그 제조 방법
CN115988875A (zh) 一种3d堆叠的半导体器件及其制造方法、电子设备
JP2009295255A (ja) 半導体記憶装置
CN114930530A (zh) 一种三维铁电存储器、制作方法及电子设备
JP4545133B2 (ja) 半導体記憶装置及びその製造方法
CN217544619U (zh) 存储单元及存储器
WO2022110009A1 (zh) 一种存储器件及其制造方法、电子设备
US20230067612A1 (en) Pocket integration process for embedded memory
EP3806155A1 (en) Multi-bit resistive random access memory cell and forming method thereof
US9542990B2 (en) Semiconductor memory device and method for accessing the same
CN116420436A (zh) 具有垂直沟道的垂直三维存储器
WO2022110218A1 (zh) 一种铁电存储器及电子设备
WO2022141020A1 (zh) 一种存储器件、电子设备
TWI233663B (en) Semiconductor device including ferroelectric capacitors and fabricating method thereof
CN219437502U (zh) 半导体器件
KR100373361B1 (ko) 유전체와 전극 사이에 산화장벽막을 갖는 캐패시터 형성 방법
US11895831B2 (en) Manufacturing method for memory and memory
US20240298452A1 (en) Ferroelectric memory device with stacked capacitors and manufacturing method thereof
US20230053447A1 (en) Semiconductor memory devices with wrapped word lines
US10937690B2 (en) Selective dielectric deposition
US20240164107A1 (en) Three-dimensional ferroelectric field effect transistor random access memory devices and fabricating methods thereof
US20100133597A1 (en) Semiconductor memory device and manufacturing method thereof

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination