CN114686829B - Wear-resistant fatigue-resistant repeated impact-resistant coating and production process thereof - Google Patents
Wear-resistant fatigue-resistant repeated impact-resistant coating and production process thereof Download PDFInfo
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- CN114686829B CN114686829B CN202011586336.2A CN202011586336A CN114686829B CN 114686829 B CN114686829 B CN 114686829B CN 202011586336 A CN202011586336 A CN 202011586336A CN 114686829 B CN114686829 B CN 114686829B
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- 238000000576 coating method Methods 0.000 title claims abstract description 72
- 239000011248 coating agent Substances 0.000 title claims abstract description 70
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 17
- 238000000034 method Methods 0.000 claims abstract description 30
- 239000000758 substrate Substances 0.000 claims abstract description 22
- 150000002500 ions Chemical class 0.000 claims description 19
- 238000004140 cleaning Methods 0.000 claims description 18
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 11
- 230000001105 regulatory effect Effects 0.000 claims description 9
- 230000009194 climbing Effects 0.000 claims description 8
- 238000010438 heat treatment Methods 0.000 claims description 6
- 230000003252 repetitive effect Effects 0.000 claims description 6
- 239000002245 particle Substances 0.000 claims description 4
- 230000003213 activating effect Effects 0.000 claims description 3
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 claims description 3
- 239000010410 layer Substances 0.000 abstract description 98
- 239000000463 material Substances 0.000 abstract description 10
- 239000002344 surface layer Substances 0.000 abstract description 10
- 238000000137 annealing Methods 0.000 abstract description 4
- 238000009991 scouring Methods 0.000 abstract description 3
- 230000035939 shock Effects 0.000 abstract 1
- 239000003921 oil Substances 0.000 description 6
- 238000005496 tempering Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 239000000295 fuel oil Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0057—Reactive sputtering using reactive gases other than O2, H2O, N2, NH3 or CH4
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0635—Carbides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
- C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
- C23C28/322—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/341—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one carbide layer
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/343—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one DLC or an amorphous carbon based layer, the layer being doped or not
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Abstract
The invention discloses a wear-resistant fatigue-resistant repeated impact coating and a production process thereof, wherein the coating comprises a Cr basal layer, a CrN+Cr repeated layer and a surface layer made of a mixed material of CrC and DLC which are sequentially generated on a basal body, the CrN+Cr repeating layer is formed by alternately arranging CrN layers and Cr layers and repeating the layers for a plurality of times. According to the production process, the temperature is strictly controlled below 160 ℃ in the whole process, the substrate performance of a workpiece can be guaranteed not to be affected by annealing, meanwhile, the hardness of a Cr substrate layer in a generated coating is improved in a step shape, so that the coating has better shock resistance, and a structure that CrN and Cr are alternately repeated for a plurality of times is adopted, so that the generated coating can effectively resist high-frequency fatigue impact resistance and high-pressure scouring; the surface layer adopts a mixed layer of CrC and DLC, not only can ensure the required hardness of the coating, but also can ensure that the coating has very high toughness, and can greatly improve the wear resistance, fatigue resistance and high-pressure impact resistance of the generated coating by combining with a repeated layer of CrN and Cr.
Description
Technical Field
The invention relates to the technical field of coating materials and coating production processes, in particular to a wear-resistant fatigue-resistant repeated impact-resistant coating and a production process thereof.
Background
In many mechanical devices, particularly some high-end precision devices, it is often desirable to enhance the performance of the device with a high performance coating. For example, in a high-pressure common rail system, an oil nozzle control valve is the core of the whole system, and high-pressure oil supply can be achieved in China at present, but the service life of the domestic oil nozzle control valve is far less than that of the domestic oil nozzle control valve in foreign countries. In the prior art, the coating commonly adopted for the coating of the oil nozzle control valve is a common DLC coating (also called a diamond-like carbon coating) and a CrN coating, and the two coatings have advantages and disadvantages, namely small friction coefficient, high hardness, large brittleness, wide applicability below national 4 standard, good binding force of the CrN coating, certain impact resistance, low friction coefficient, poor wear resistance and low service life.
The coating of the oil nozzle control valve has the comprehensive properties of friction resistance, high-frequency impact resistance, high pressure resistance, low coating temperature and the like. Friction resistance requires a high hardness of the coating and a small coefficient of friction, and DLC generally has such properties, but DLC coatings with high hardness are not resistant to high frequency impact, because the coating is easily broken and fails in the case of high hardness. The high pressure resistance is mainly high pressure scouring of high pressure fuel oil, and the granularity of the coating surface is required to be small. In order to ensure the hardness of the materials, the tempering temperature of the high-pressure common rail control valve is generally within 180 ℃, and the low coating temperature can ensure that a plurality of workpieces with low tempering temperature can be coated. The existing coating cannot guarantee the comprehensive performance, so that the existing coating material and the production process of the coating need to be improved to meet the performance requirements.
Disclosure of Invention
Aiming at the problems that the coating prepared by the existing coating material and the coating production process in the background art cannot simultaneously meet the performance requirements of friction resistance, high-frequency impact resistance, high pressure resistance, low coating temperature and the like, the invention provides the wear-resistant fatigue-resistant repeated impact-resistant coating capable of solving the problems.
The technical scheme adopted for solving the technical problems is as follows: the composite material comprises a Cr substrate layer, a CrN+Cr repeating layer and a surface layer made of a mixed material of CrC and DLC, wherein the Cr substrate layer, the CrN+Cr repeating layer and the surface layer are sequentially formed on a substrate, and the CrN+Cr repeating layer is formed by alternately arranging the CrN layer and the Cr layer and repeating the CrN+Cr repeating layer for a plurality of times.
Further, the thickness of the Cr basal layer is 0.4-0.8 micrometers.
The CrN+Cr repeated layers comprise a plurality of CrN layers and a plurality of Cr layers, the thickness of each CrN layer is 0.2-0.3 microns, the thickness of the outermost Cr layer is 0.25-0.35 microns, the thicknesses of the rest Cr layers are 0.02-0.08 microns, and the surface layer made of the mixed material of CrC and DLC generates an outer layer of the outermost Cr layer.
Further, the thickness of the surface layer made of the mixed material of the CrC and the DLC is 0.8-1.5 micrometers.
Another object of the invention is to provide a process for producing a wear-resistant, fatigue-resistant and repetitive impact-resistant coating comprising the following production steps:
S1, cleaning a workpiece needing to generate a coating by using a nine-groove cleaning production line;
s2, fixing the cleaned workpiece on a rotating frame, and placing the whole rotating frame into coating equipment;
s3, vacuumizing the interior of the coating equipment until the air pressure in the coating equipment is 1 x 10 < -5 > mbar >, heating the coating equipment to 140-155 ℃, and setting the rotating speed of the rotating frame to 0.5-2 r/min;
S4H + ion cleaning; h 2 and Ar gas are introduced into the coating equipment, the air pressure is 2.0 x 10 < -4 > mbar < -9.0 > 10 < -3 > mbar pure ion cleaning, H2 and Ar gas are ionized by using a filament at the upper part in the furnace to generate glow, meanwhile, an auxiliary anode at the lower part is electrified, electrons flow to the auxiliary anode, the workpiece is biased to minus 10V to minus 30V, the whole furnace chamber is filled with H + and Ar +, H+ ions which can react with oxide or organic matters which cannot be cleaned on the surface of the workpiece chemically, and the workpiece is cleaned deep and fully on the surface of the workpiece; ar + ions play a role in assisting ionization;
S5 Ar + ion cleaning; closing H 2, continuously inputting Ar gas, connecting a workpiece with negative 200V to negative 300V bias, bombarding the surface of the workpiece by Ar + ions generated by a filament and an auxiliary anode with high energy, removing microscopic particles on the surface and activating the surface of a substrate, and providing a better and cleaner substrate for a gradient Cr layer;
S6, stopping heating by the heater, regulating the rotating speed of the rotating frame to 2-4 r/min, regulating the air pressure to 1.0-9.0 x 10-3 mbar by inputting Ar gas, applying a climbing bias voltage to the workpiece on the surface of the workpiece by magnetron sputtering gradient Cr basal layer, gradually climbing the workpiece from minus 20V to minus 200V, wherein the climbing time is 3000-4000 seconds, and the hardness gradient of the generated gradient Cr basal layer is improved;
S7, generating a CrN+Cr repeated layer by magnetron sputtering; maintaining the rotating speed of the rotating frame and the air pressure in a furnace chamber unchanged, generating a repeated layer of CrN+Cr through a magnetron sputtering process, wherein the process comprises the steps of generating a CrN layer on a Cr substrate layer generated in the step S6, then generating Cr, repeating a plurality of layers to form the repeated layer of CrN+Cr, when the Cr layer is generated, only introducing Ar gas, connecting a workpiece with negative 20V to negative 200V bias, generating the Cr layer for 300-600 seconds, when the CrN layer is generated, introducing N 2 gas for 100-600Sccm, connecting the workpiece with negative 20V to negative 200V bias, and connecting the workpiece with air pressure of 2.0-9.0 x 10-3 mbar, wherein the time for generating the CrN layer is 1000-1500 seconds;
S8, generating a CrC+DLC layer; the rotating speed of the rotating frame is regulated to 2-4 r/min, C 2H2 gas and Ar gas are introduced, the air pressure is maintained to be 1.0-9.0 x 10-3 mbar, and simultaneously, a magnetron sputtering method and a plasma enhanced chemical vapor deposition method are carried out to generate a mixed layer of CrC+DLC, in the process, a workpiece is connected with negative 200V to negative 900V bias voltage, the power is 2-18kw, and the highest temperature is set to 160 ℃.
In a further scheme, in the step S7, the generated CrN+Cr repeating layer is of an alternating structure of 9 CrN layers and 9 Cr layers, the thickness of each CrN layer is 0.2-0.3 microns, the thickness of the outermost Cr layer is 0.25-0.35 microns, and the thicknesses of the rest Cr layers are 0.02-0.08 microns.
Further, in step S8, because the bias voltage of the workpiece joint is large, the temperature in the furnace easily exceeds the highest temperature of 160 ℃, when the temperature in the furnace exceeds 160 ℃, the process is automatically controlled to be stopped by the controller, the temperature in the furnace is cooled, and the process is continued until the temperature in the furnace is lower than 160 ℃ until the required crc+dlc layer is generated, wherein the crc+dlc layer is in a mixed structure, and the thickness of the crc+dlc layer is 0.8-1.5 micrometers.
The bias voltage of the above process refers to a negative voltage applied to the substrate during the plating process. The positive pole of the bias power supply is connected to the vacuum chamber, while the vacuum chamber is grounded, and the negative pole of the bias voltage is connected to the workpiece.
The beneficial effects of the invention are as follows: 1) The wear-resistant fatigue-resistant and repeated impact-resistant coating provided by the invention has the advantages that as a nine-groove cleaning production line, H + ions and Ar + ions are adopted for three-step cleaning, pollutants, oxide layers and other foreign matters on the surface of a workpiece can be cleaned, microscopic particles on the surface can be removed deep into the surface layer, and the surface of a substrate is activated, so that a better and cleaner substrate is provided for a subsequent gradient Cr layer, and the step does not need particularly high negative bias voltage because of the cleaning of the previous step H + ions, thus the surface of a high-precision substrate can be effectively protected, the annealing caused by local overhigh temperature due to high energy bombardment can not be realized, and the performance of the substrate of a part can be ensured; 2) When the Cr basal layer in the coating is generated, the hardness of the generated Cr layer is increased in a gradient way through the technical process of increasing the bias voltage in a gradient way; 3) The CrN+Cr repeating layer in the coating adopts a structure that CrN and Cr are alternately repeated for a plurality of times, so that the generated coating can effectively resist high-frequency fatigue impact resistance and high-pressure scouring; 4) The CrC+DLC layer in the coating can ensure the hardness required by the coating, can ensure the coating to have high toughness, is combined with the CrN+Cr repeated layer, and can greatly improve the wear resistance, fatigue resistance and high-pressure impact resistance of the generated coating; 5) In the invention, in the coating generation process, the temperature in the furnace chamber is strictly controlled below 160 ℃, so that the annealing of the workpiece can be effectively prevented, and the substrate performance of the workpiece is ensured to be stable.
Drawings
The invention is further described below with reference to the drawings and examples.
FIG. 1 is a schematic structural view of a wear-resistant fatigue-resistant and repetitive impact-resistant coating of the present invention.
In the figure: workpiece 1, cr basal layer 2, crN+Cr repeating the steps of layer 3, crn layer 31, cr layer 32, a surface layer 4.
Detailed Description
The invention will now be described in further detail with reference to the accompanying drawings. The drawings are simplified schematic representations which merely illustrate the basic structure of the invention and therefore show only those features which are relevant to the invention, and orientation and reference (e.g., up, down, left, right, etc.) may be used solely to aid in the description of the features in the drawings. The following detailed description is, therefore, not to be taken in a limiting sense, and the scope of the claimed subject matter is defined only by the appended claims and equivalents thereof.
As shown in FIG. 1, the wear-resistant fatigue-resistant and repetitive impact-resistant coating comprises a Cr base layer 2, a CrN+Cr repetitive layer 3 and a surface layer 4 made of a mixed material of CrC and DLC which are sequentially formed on a substrate 1. The overall thickness of the coating is 2.5-6 microns.
The Cr base layer 2 is formed on the surface of the workpiece where the coating is to be formed, and the thickness of the Cr base layer 2 is 0.4-0.8 micrometers. The Cr underlayer 2 is a Cr underlayer having a hardness that increases stepwise from the inside to the outside.
The CrN+Cr repeating layer 3 is formed by alternately arranging CrN layers and Cr layers and repeating the layers for a plurality of times. The crn+cr repeated layer 3 is formed on the surface of the Cr underlayer. The thickness of each CrN layer is 0.2-0.3 microns, the thickness of the outermost Cr layer is 0.25-0.35 microns, and the thickness of the rest Cr layers is 0.02-0.08 microns.
A surface layer 4 made of a mixed material of CrC and DLC is formed on the surface of the crn+cr repeated layer 3. The thickness is 0.8-1.5 micrometers.
The invention relates to a production process of a wear-resistant fatigue-resistant and repeated impact-resistant coating, which comprises the following production steps:
S1, cleaning a workpiece needing to generate a coating by using a nine-groove cleaning production line;
s2, fixing the cleaned workpiece on a rotating frame, and placing the whole rotating frame into coating equipment;
s3, vacuumizing the interior of the coating equipment until the air pressure in the coating equipment is 1 x 10 < -5 > mbar >, heating the coating equipment to 140-155 ℃, and setting the rotating speed of the rotating frame to 0.5-2 r/min;
S4H + ion cleaning; h 2 and Ar gas are introduced into the coating equipment, pure ions with the air pressure of 2.0-9.0 x 10 < -4 > mbar are used for cleaning, H2 and Ar gas are ionized by using a filament at the upper part in the furnace to generate glow, meanwhile, an auxiliary anode at the lower part is electrified to enable electrons to flow to the auxiliary anode, a workpiece is biased from minus 10V to minus 30V, the whole furnace chamber is filled with H + and Ar +, H+ ions which can react with oxide or organic matters which cannot be cleaned on the surface of the workpiece chemically, and the workpiece is cleaned deep and fully in the deep layer on the surface of the workpiece;
S5 Ar + ion cleaning; closing H 2, continuously inputting Ar gas, connecting a workpiece with negative 200V to negative 300V bias, bombarding the surface of the workpiece by Ar + ions generated by a filament and an auxiliary anode with high energy, removing microscopic particles on the surface and activating the surface of a substrate, and providing a better and cleaner substrate for a gradient Cr layer;
S6, stopping heating by the heater, regulating the rotating speed of the rotating frame to 2-4 r/min, regulating the air pressure to 1.0-9.0 x 10-3 mbar by inputting Ar gas, applying a climbing bias voltage to the workpiece on the surface of the workpiece by magnetron sputtering gradient Cr basal layer, gradually climbing the workpiece from minus 20V to minus 200V, wherein the climbing time is 3000-4000 seconds, and the hardness gradient of the generated gradient Cr basal layer is improved;
S7, generating a CrN+Cr repeated layer by magnetron sputtering; maintaining the rotating speed of the rotating frame and the air pressure in a furnace chamber unchanged, generating a repeated layer of CrN+Cr through a magnetron sputtering process, wherein the process comprises the steps of generating a CrN layer on a Cr substrate layer generated in the step S6, then generating Cr, repeating a plurality of layers to form the repeated layer of CrN+Cr, when the Cr layer is generated, only introducing Ar gas, connecting a workpiece with negative 20V to negative 200V bias, generating the Cr layer for 300-600 seconds, when the CrN layer is generated, introducing N 2 gas for 100-600Sccm, connecting the workpiece with negative 20V to negative 200V bias, and connecting the workpiece with air pressure of 2.0-9.0 x 10-3 mbar, wherein the time for generating the CrN layer is 1000-1500 seconds;
S8, generating a CrC+DLC layer; the rotating speed of the rotating frame is regulated to 2-4 r/min, C 2H2 gas and Ar gas are introduced, the air pressure is maintained to be 1.0-9.0 x 10-3 mbar, and simultaneously, a magnetron sputtering method and a plasma enhanced chemical vapor deposition method are carried out to generate a mixed layer of CrC+DLC, in the process, a workpiece is connected with negative 200V to negative 900V bias voltage, the power is 2-18kw, and the highest temperature is set to 160 ℃.
As a preferred embodiment, in step S7, the CrN+Cr repeating layer is formed in an alternating structure of 9 CrN and 9 Cr layers, each CrN layer has a thickness of 0.2-0.3 μm, the outermost Cr layer has a thickness of 0.25-0.35 μm, and the rest Cr layers have a thickness of 0.02-0.08 μm.
In order to avoid annealing the workpiece due to excessive temperature, in step S8, because the bias voltage of the workpiece is large, the temperature in the furnace easily exceeds the maximum temperature of 160 ℃, when the temperature in the furnace exceeds 160 ℃, the process is automatically controlled to be suspended by the controller, the temperature in the furnace is cooled, and the process is continued until the temperature in the furnace is lower than 160 ℃ until the required crc+dlc layer is generated, wherein the crc+dlc layer is in a mixed structure, and the thickness of the crc+dlc layer is 0.8-1.5 micrometers.
While the foregoing is directed to the preferred embodiment of the present invention, other and further embodiments of the invention may be devised without departing from the basic scope thereof, and the scope thereof is determined by the claims that follow. The technical scope of the present invention is not limited to the description, but must be determined according to the scope of claims.
Claims (3)
1. A production process of a wear-resistant, fatigue-resistant and repeated impact-resistant coating is characterized by comprising the following steps of: the method comprises the following production steps:
S1, cleaning a workpiece needing to generate a coating by using a nine-groove cleaning production line;
s2, fixing the cleaned workpiece on a rotating frame, and placing the whole rotating frame into coating equipment;
S3, vacuumizing the interior of the coating equipment until the air pressure in the coating equipment is 1 x 10 -5 mbar, heating the coating equipment to 140-155 ℃, and setting the rotating speed of the rotating frame to 0.5-2 r/min;
S4H + ion cleaning; h 2 and Ar gas are introduced into the coating equipment, the air pressure is 2.0 x 10 mbar pure ion cleaning, H 2 and Ar gas are ionized by utilizing a filament at the upper part in the furnace to generate glow, meanwhile, an auxiliary anode at the lower part is electrified to enable electrons to flow to the auxiliary anode, the workpiece is biased from minus 10V to minus 30V, the whole furnace chamber is filled with H + and Ar +, H+ ions which can react with oxide or organic matters which cannot be cleaned on the surface of the workpiece chemically, and the workpiece is deeply and fully cleaned;
S5 Ar + ion cleaning; closing H 2, continuously inputting Ar gas, connecting a workpiece with negative 200V to negative 300V bias, bombarding the surface of the workpiece by Ar + ions generated by a filament and an auxiliary anode with high energy, removing microscopic particles on the surface and activating the surface of a substrate, and providing a better and cleaner substrate for a gradient Cr layer;
s6, stopping heating by the heater, regulating the rotating speed of the rotating frame to 2-4 r/min, regulating the air pressure to 1.0 x 10 -3-9.0 *10-3 mbar by inputting Ar gas, applying a climbing bias voltage to the workpiece on the surface of the workpiece, and gradually climbing the workpiece bias voltage from negative 20V to negative 200V for 3000-4000 seconds, wherein the hardness gradient of the generated gradient Cr substrate layer is improved;
S7, generating a CrN+Cr repeated layer by magnetron sputtering; generating a repeated layer of CrN+Cr through a magnetron sputtering process while maintaining the rotating speed of a rotating frame and the air pressure in a furnace chamber unchanged, wherein the process comprises the steps of generating a CrN layer on a Cr substrate layer generated in the step S6, then generating Cr, repeating a plurality of layers to form the repeated layer of CrN+Cr, and when the Cr layer is generated, only introducing Ar gas, connecting a workpiece with negative 20V to negative 200V bias, wherein the time for generating the Cr layer is 300-600 seconds, when the CrN layer is generated, besides introducing Ar gas, introducing N 2 gas for 100-600Sccm, connecting the workpiece with negative 20V to negative 200V bias, and the air pressure is 2.0 x 10 -3-9.0 *10-3 mbar, and the time for generating the CrN layer is 1000-1500 seconds;
S8, generating a CrC+DLC layer; the rotating speed of the rotating frame is regulated to 2-4 r/min, C 2H2 gas and Ar gas are introduced, the air pressure is maintained at 1.0 x 10 -3-9.0 *10-3 mbar, and simultaneously, a magnetron sputtering method and a plasma enhanced chemical vapor deposition method are carried out to generate a mixed layer of CrC+DLC, in the process, a workpiece is connected with negative 200V to negative 900V bias voltage, the power is 2-18kw, and the highest temperature is set to 160 ℃.
2. A process for producing a wear-resistant, fatigue-resistant and repetitive impact-resistant coating according to claim 1, wherein: in the step S7, the generated CrN+Cr repeating layers are of an alternating structure of 9 CrN layers and 9 Cr layers, the thickness of each CrN layer is 0.2-0.3 microns, the thickness of the outermost Cr layer is 0.25-0.35 microns, and the thicknesses of the rest Cr layers are 0.02-0.08 microns.
3. A process for producing a wear-resistant, fatigue-resistant and repetitive impact-resistant coating according to claim 1, wherein: in step S8, because the bias voltage of the workpiece joint is large, the temperature in the furnace easily exceeds the highest temperature of 160 ℃, when the temperature in the furnace exceeds 160 ℃, the process is automatically controlled to be stopped by a controller, the furnace temperature is cooled, and the process is continued until the temperature in the furnace is lower than 160 ℃ until a required CrC+DLC layer is generated, wherein the CrC+DLC layer is of a mixed structure, and the thickness of the CrC+DLC layer is 0.8-1.5 microns.
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