CN110306153A - A kind of preparation method for the DLC coating adulterating Cr - Google Patents

A kind of preparation method for the DLC coating adulterating Cr Download PDF

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Publication number
CN110306153A
CN110306153A CN201910662656.2A CN201910662656A CN110306153A CN 110306153 A CN110306153 A CN 110306153A CN 201910662656 A CN201910662656 A CN 201910662656A CN 110306153 A CN110306153 A CN 110306153A
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coating
preparation
crn
target
transition zone
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唐坤
王广欣
朱宇杰
孙浩亮
海茵茨罗尔夫斯托克
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Henan University of Science and Technology
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Henan University of Science and Technology
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
    • C23C14/025—Metallic sublayers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0605—Carbon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3485—Sputtering using pulsed power to the target

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The invention discloses a kind of preparation methods of DLC coating for adulterating Cr, take full advantage of the high advantage of high-power impulse magnetron sputtering film layer finish, the uniformity, consistency, the shortcomings that improve DLC coating binding force and film layer poor toughness, uses bottom and transition zone design method.It this unique Film Design and mixes technique both and ensure that the raising of coating binding force, in turn ensure the raising of coating deposition rate, coating compactness and wear resistant friction reducing performance.It is in grey black using the DLC appearance of coat for mixing Cr prepared by method of the invention, the smooth densification in surface, the hardness 32GPa of coating, film-substrate cohesion reaches 72N, and coating layer thickness is 1.45 μm.The dry friction coefficient of coating is 0.2.Show that the DLC coating for mixing Cr has good wear-resisting and antifriction performance.

Description

A kind of preparation method for the DLC coating adulterating Cr
Technical field
The invention belongs to coating material technical fields, and in particular to a kind of preparation method for the DLC coating for adulterating Cr.
Background technique
Physical gas phase deposition technology indicates under vacuum conditions, using physical method, by material source --- solid or liquid Surface is gasificated into gaseous atom, molecule or partial ionization into ion, and by low-pressure gas (or plasma) process, in matrix Surface deposition has the technology of the film of certain specific function.Application No. is " 201210423173.5 ", patent name is " a kind of Mix the preparation method of the diamond-like coating of Ti " in disclose a kind of method for preparing and mixing the DLC coating of Ti, by what is pre-processed Matrix is put into the rotating stand rod of electric arc and magnetron sputtering composite coating equipment, using column arc Ti target as the source Ti, using plane C target as The source of C three pairs of plane C target, is placed on inboard wall of furnace body, using high-purity Ar as main ionization gas totally in uniformly distributed mode Body guarantees effective glow discharging process；Reaction gas is used as using high-purity N 2, makes its ionization and in conjunction with Ti, C element, Matrix surface deposits to form the DLC coating for mixing Ti.This of preparation mixes the DLC appearance of coat of Ti in black, the smooth densification in surface, painting The hardness 28GPa of layer, film-substrate cohesion reach 60N, and coating layer thickness is 2.5 μm, when it is Al2O3 ball that friction is secondary, coating it is dry Coefficient of friction is 0.2.Show that the DLC coating for mixing Ti has good wear-resisting and antifriction performance.
Above-mentioned patent takes certain novelty in preparation process, Film Design, and certain breakthrough is achieved in performance. So it is not particularly suited for the film layer design and preparation process of tungsten-cobalt hard alloy series.For the most common material of sintered-carbide tool The DLC film system of tungsten-cobalt alloy designs and prepares method, is rarely reported.
Summary of the invention
The present invention adopts the following technical scheme that solve above-mentioned technical problem, a kind of preparation side for the DLC coating adulterating Cr Method, specific steps are as follows:
Step S1: the tungsten-cobalt alloy matrix being surface-treated is put into the rotating stand rod of sputtering equipment cavity, the pivoted frame is whole While body rotates, rotating stand rod rotation, to guarantee the uniformity of coating；
Step S2: using long column type Cr target as source is mixed, to live in type graphite target for long as the source of carbon, plane Cr target To mix Cr element source, it is uniformly distributed and is mounted on inboard wall of furnace body, using high-purity Ar as main ionization of gas, guarantee have The glow discharging process of effect；Cr layers are respectively adopted as prime coat, CrN, CrN2, Cr+C is as gradient transitional lay, high-purity N2As Transition zone reaction gas, C2H2As DLC layer reaction gas, Cr, CrN, CrN are formed2, Cr+C, α-C:H assembly of thin films coating；
Step S3: preparation process condition:
A) plasma washes target:
After target body is packed into vacuum chamber, vacuumizing and being heated to vacuum room temperature is 400 DEG C.The Ar of 200sccm is passed through to very Empty room is opened and is biased into 1000V, and air pressure is 2Pa in furnace body, carries out Bombardment and cleaning to the target body surface of vacuum chamber, continues 800s；
B) plasma clean matrix:
After matrix is packed into vacuum chamber, vacuumizing and being heated to vacuum room temperature is 400 DEG C.The Ar of 200sccm is passed through to very Empty room is opened and is biased into 1000V, and air pressure is 2Pa in furnace body, carries out Bombardment and cleaning to the target body surface of vacuum chamber, continues 1940s；
C) prepared by Cr bottom:
Cavity temperature sets 400 degree, adjusts Ar flux to 200sccm, cavity air pressure and is set as 2Pa, is then turned on column arc Cr target, adjustment are biased into 60V, and HIPIMS voltage is 2000V, electric current 500A, sputtering power 10Kw, the setting of prime coat phases-time It is 600 seconds；
D) prepared by CrN transition zone:
After the completion of the preparation of Cr bottom, cavity air pressure is set as 0.5Pa, is passed through reaction gas N2, N2Flux set is 20sccm, Ar flux remain unchanged, and cavity air pressure is set as 2Pa, and adjustment is biased into 60V, and HIPIMS voltage is 2000V, electric current 500A, sputtering power 10Kw prepare CrN transition zone on Cr bottom, continue 900s；
E) prepared by CrN2 transition zone:
By N2Flux set is 20sccm, sputtering time 840s, remaining parameter is consistent with CrN transition zone preparation parameter；
F) prepared by Cr+C transition zone:
Close N2Channel, start bipolar pulse power supply, by power setting be 10KW, persistently sputter 900s, remaining parameter with CrN transition zone preparation parameter is consistent；
G the preparation of the DLC coating of Cr) is mixed:
After the completion of the preparation of CrN transition zone, N is closed2Channel is passed through C2N2As reaction gas, C2H2Flow control is 60sccm；The sputtering stage Film Design is three layers, and every layer of sputtering time is 900s, sputtering power be respectively 10Kw, 7Kw, 4Kw, cavity air pressure are set as 2Pa, and adjustment is biased into 60V, and HIPIMS voltage is 2000V, electric current 500A；
Further, the tungsten-cobalt alloy matrix is by ultrasonic cleaning, ultrasonic alkali cleaning, pickling, after deionized water cleaning It is dried up with hair dryer.
Further, it is described doping Cr DLC coating with a thickness of 1.45 μm.
The present invention takes full advantage of the high advantage of high-power impulse magnetron sputtering film layer finish, the uniformity, consistency, is The shortcomings that improving DLC coating binding force and film layer poor toughness, uses bottom and transition zone design method.This unique membrane system Designing and mixing technique both ensure that the raising of coating binding force, in turn ensure coating deposition rate, coating compactness and wear-resisting The raising of antifriction performance.It is in grey black using the DLC appearance of coat for mixing Cr prepared by method of the invention, the smooth densification in surface, The hardness 32GPa of coating, film-substrate cohesion reach 72N, and coating layer thickness is 1.45 μm.The dry friction coefficient of coating is 0.2.Show The DLC coating for mixing Cr has good wear-resisting and antifriction performance.
Detailed description of the invention
Fig. 1 is the microscopic appearance figure of nano zirconium oxide powder；
Fig. 2 is 2000 times of coating section SEM figures；
Fig. 3 is 40000 times of coating surface micro-structure diagrams；
Fig. 4 is that Ballcrater tests lower assembly of thin films structure design section figure；
Fig. 5 is implementation of the present invention on cutter；
Fig. 6 is implementation of the present invention on drill bit.
Specific embodiment
Above content of the invention is described in further details by the following examples, but this should not be interpreted as to this The range for inventing above-mentioned theme is only limitted to embodiment below, and all technologies realized based on above content of the present invention belong to this hair Bright range.
Embodiment 1
The preparation method of the DLC coating of the doping Cr of the present embodiment, including the following steps:
Step S1: the tungsten-cobalt alloy matrix being surface-treated is put into the rotating stand rod of sputtering equipment cavity, the pivoted frame is whole While body rotates, rotating stand rod rotation, to guarantee the uniformity of coating；
Step S2: using long column type Cr target as source is mixed, to live in type graphite target for long as the source of carbon, plane Cr target To mix Cr element source, it is uniformly distributed and is mounted on inboard wall of furnace body, using high-purity Ar as main ionization of gas, guarantee have The glow discharging process of effect；Cr layers are respectively adopted as prime coat, CrN, CrN2, Cr+C is as gradient transitional lay, high-purity N2As Transition zone reaction gas, C2H2As DLC layer reaction gas, Cr, CrN, CrN are formed2, Cr+C, α-C:H assembly of thin films coating；
Step S3: preparation process condition:
A) plasma washes target:
After target body is packed into vacuum chamber, vacuumizing and being heated to vacuum room temperature is 400 DEG C.The Ar of 200sccm is passed through to very Empty room is opened and is biased into 1000V, and air pressure is 2Pa in furnace body, carries out Bombardment and cleaning to the target body surface of vacuum chamber, continues 800s；
B) plasma clean matrix:
After matrix is packed into vacuum chamber, vacuumizing and being heated to vacuum room temperature is 400 DEG C.The Ar of 200sccm is passed through to very Empty room is opened and is biased into 1000V, and air pressure is 2Pa in furnace body, carries out Bombardment and cleaning to the target body surface of vacuum chamber, continues 1940s；
C) prepared by Cr bottom:
Cavity temperature sets 400 degree, adjusts Ar flux to 200sccm, cavity air pressure and is set as 2Pa, is then turned on column arc Cr target, adjustment are biased into 60V, and HIPIMS voltage is 2000V, electric current 500A, sputtering power 10Kw, the setting of prime coat phases-time It is 600 seconds；
D) prepared by CrN transition zone:
After the completion of the preparation of Cr bottom, cavity air pressure is set as 0.5Pa, is passed through reaction gas N2, N2Flux set is 20sccm, Ar flux remain unchanged, and cavity air pressure is set as 2Pa, and adjustment is biased into 60V, and HIPIMS voltage is 2000V, electric current 500A, sputtering power 10Kw prepare CrN transition zone on Cr bottom, continue 900s；
E) prepared by CrN2 transition zone:
By N2Flux set is 20sccm, sputtering time 840s, remaining parameter is consistent with CrN transition zone preparation parameter；
F) prepared by Cr+C transition zone:
Close N2Channel, start bipolar pulse power supply, by power setting be 10KW, persistently sputter 900s, remaining parameter with CrN transition zone preparation parameter is consistent；
G the preparation of the DLC coating of Cr) is mixed:
After the completion of the preparation of CrN transition zone, N is closed2Channel is passed through C2N2As reaction gas, C2H2Flow control is 60sccm；The sputtering stage Film Design is three layers, and every layer of sputtering time is 900s, sputtering power be respectively 10Kw, 7Kw, 4Kw, cavity air pressure are set as 2Pa, and adjustment is biased into 60V, and HIPIMS voltage is 2000V, electric current 500A；
Further, the tungsten-cobalt alloy matrix is by ultrasonic cleaning, ultrasonic alkali cleaning, pickling, after deionized water cleaning It is dried up with hair dryer.
Further, it is described doping Cr DLC coating with a thickness of 1.45 μm.
Film binding interface is as shown in Fig. 2, with a thickness of 1.45 μm, dense structure is tightly combined with matrix.Fig. 3 is amplification The microstructure of coating surface, coating granule are tightly combined after 40000 times, and consistency is high.Ballcrater tests lower multilayer film Architecture design section figure is as shown in figure 4, can be seen in the figure assembly of thin films structure with hierarchy, interface layer is clear.
Embodiment above describes main features and advantages of the invention, It should be understood by those skilled in the art that this hair Bright to be not restricted to the described embodiments, the above embodiments and description only illustrate the principle of the present invention, is not taking off From under the range of the principle of the invention, various changes and improvements may be made to the invention, these changes and improvements each fall within guarantor of the present invention In the range of shield.

Claims (3)

1. a kind of preparation method for the DLC coating for adulterating Cr, which is characterized in that specific steps are as follows:
Step S1: the tungsten-cobalt alloy matrix being surface-treated is put into the rotating stand rod of sputtering equipment cavity, which integrally turns While dynamic, rotating stand rod rotation, to guarantee the uniformity of coating；
Step S2: using long column type Cr target as source is mixed, to live in type graphite target for long as the source of carbon, plane Cr target is ginseng Miscellaneous Cr element source, is uniformly distributed and is mounted on inboard wall of furnace body, using high-purity Ar as main ionization of gas, guarantees effective Glow discharging process；Cr layers are respectively adopted as prime coat, CrN, CrN2, Cr+C is as gradient transitional lay, high-purity N2As transition Layer reaction gas, C2H2As DLC layer reaction gas, Cr, CrN, CrN are formed2, Cr+C, α-C:H assembly of thin films coating；
Step S3: preparation process condition:
A) plasma washes target:
After target body is packed into vacuum chamber, vacuumizing and being heated to vacuum room temperature is 400 DEG C.The Ar of 200sccm is passed through to vacuum chamber, It opens and is biased into 1000V, air pressure is 2Pa in furnace body, carries out Bombardment and cleaning to the target body surface of vacuum chamber, continues 800s；
B) plasma clean matrix:
After matrix is packed into vacuum chamber, vacuumizing and being heated to vacuum room temperature is 400 DEG C.The Ar of 200sccm is passed through to vacuum chamber, It opens and is biased into 1000V, air pressure is 2Pa in furnace body, carries out Bombardment and cleaning to the target body surface of vacuum chamber, continues 1940s；
C) prepared by Cr bottom:
Cavity temperature sets 400 degree, adjusts Ar flux to 200sccm, cavity air pressure and is set as 2Pa, is then turned on column arc Cr target, Adjustment is biased into 60V, and HIPIMS voltage is 2000V, electric current 500A, sputtering power 10Kw, and prime coat phases-time is set as 600 Second；
D) prepared by CrN transition zone:
After the completion of the preparation of Cr bottom, cavity air pressure is set as 0.5Pa, is passed through reaction gas N2, N2Flux set is 20sccm, Ar Flux remains unchanged, and cavity air pressure is set as 2Pa, and adjustment is biased into 60V, and HIPIMS voltage is 2000V, electric current 500A, sputtering Power 10Kw prepares CrN transition zone on Cr bottom, continues 900s；
E) prepared by CrN2 transition zone:
By N2Flux set is 20sccm, sputtering time 840s, remaining parameter is consistent with CrN transition zone preparation parameter；
F) prepared by Cr+C transition zone:
Close N2Channel starts bipolar pulse power supply, is 10KW by power setting, persistently sputters 900s, remaining parameter and CrN mistake It is consistent to cross layer preparation parameter；
G the preparation of the DLC coating of Cr) is mixed:
After the completion of the preparation of CrN transition zone, N is closed2Channel is passed through C2N2As reaction gas, C2H2Flow control is 60sccm； The sputtering stage Film Design is three layers, and every layer of sputtering time is 900s, and sputtering power is respectively 10Kw, 7Kw, 4Kw, cavity gas Pressure is set as 2Pa, and adjustment is biased into 60V, and HIPIMS voltage is 2000V, electric current 500A.
2. a kind of preparation method of DLC coating for adulterating Cr according to claim 1, it is characterised in that: the tungsten-cobalt is closed Auri body is dried up after deionized water cleaning with hair dryer by ultrasonic cleaning, ultrasonic alkali cleaning, pickling.
3. a kind of preparation method of DLC coating for adulterating Cr according to claim 1, it is characterised in that: the doping Cr DLC coating with a thickness of 1.45 μm.
CN201910662656.2A 2019-07-22 2019-07-22 A kind of preparation method for the DLC coating adulterating Cr Pending CN110306153A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114686829A (en) * 2020-12-29 2022-07-01 苏州吉恒纳米科技有限公司 Wear-resistant, fatigue-resistant and repeated impact-resistant coating and production process thereof

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2036043A1 (en) * 1990-02-13 1991-08-14 Mitsuo Kuwabara Molded ceramic articles and production method thereof
CN102912298A (en) * 2012-10-29 2013-02-06 西安浩元涂层技术有限公司 Cr-doped DLC (diamond-like carbon) coating with anticorrosion and antifriction properties and preparation method
CN103874780A (en) * 2011-10-21 2014-06-18 欧瑞康贸易股份公司(特吕巴赫) Drill having a coating
CN104213076A (en) * 2014-08-27 2014-12-17 慕恩慈沃迪 Method and equipment for preparing ultra-hard DLC coatings through PVD and HIPIMS

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2036043A1 (en) * 1990-02-13 1991-08-14 Mitsuo Kuwabara Molded ceramic articles and production method thereof
CN103874780A (en) * 2011-10-21 2014-06-18 欧瑞康贸易股份公司(特吕巴赫) Drill having a coating
CN102912298A (en) * 2012-10-29 2013-02-06 西安浩元涂层技术有限公司 Cr-doped DLC (diamond-like carbon) coating with anticorrosion and antifriction properties and preparation method
CN104213076A (en) * 2014-08-27 2014-12-17 慕恩慈沃迪 Method and equipment for preparing ultra-hard DLC coatings through PVD and HIPIMS

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114686829A (en) * 2020-12-29 2022-07-01 苏州吉恒纳米科技有限公司 Wear-resistant, fatigue-resistant and repeated impact-resistant coating and production process thereof

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