CN114623774A - Method for measuring gap between source substrate and receiving substrate for transferring micro-assembly - Google Patents
Method for measuring gap between source substrate and receiving substrate for transferring micro-assembly Download PDFInfo
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- 239000000758 substrate Substances 0.000 title claims abstract description 283
- 238000000034 method Methods 0.000 title claims abstract description 27
- 239000000463 material Substances 0.000 claims description 25
- 239000012780 transparent material Substances 0.000 claims description 8
- 238000012546 transfer Methods 0.000 claims description 5
- 238000005259 measurement Methods 0.000 abstract description 34
- 230000002238 attenuated effect Effects 0.000 abstract description 6
- 238000000691 measurement method Methods 0.000 abstract description 3
- 108091008695 photoreceptors Proteins 0.000 description 15
- 230000006870 function Effects 0.000 description 6
- 238000004458 analytical method Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000003384 imaging method Methods 0.000 description 4
- 238000012937 correction Methods 0.000 description 3
- 230000033001 locomotion Effects 0.000 description 3
- 230000035807 sensation Effects 0.000 description 3
- 238000013459 approach Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000004308 accommodation Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
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- 238000005286 illumination Methods 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
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- 238000013519 translation Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/14—Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures
Abstract
The invention discloses a method for measuring the gap between a source substrate and a receiving substrate for transferring a micro-assembly, which comprises the following steps: s1, arranging a light-sensitive receiver and a light source at two ends of the gap formed by the source substrate and the receiving substrate respectively, and enabling the light emitted by the light source to pass through the gap to reach the light-sensitive receiver. According to the measurement method, the light-sensitive receivers and the light sources are respectively arranged at two ends of the gap formed by the source substrate and the receiving substrate, light emitted by the light sources reaches the light-sensitive receivers after passing through the gap, the light except the gap is shielded, reflected or refracted by the substrate and then attenuated by multiple reflections, the boundary with the obvious gap between the substrate and the gap is left on the light-sensitive receivers, the size of the gap can be automatically identified by the light-sensitive receivers through judging the boundary, measurement equipment does not need to be installed between the gaps, non-contact measurement of the gap is achieved, and measurement accuracy and efficiency of the gap are improved.
Description
Technical Field
The invention relates to a method for measuring a gap between a source substrate and a receiving substrate for transferring a micro-assembly.
Background
During the non-contact transfer of the micro-assembly, a gap is required to be maintained between the source substrate and the receiving substrate. The gap is used for preventing the micro-assembly transferred to the receiving substrate from interfering with the micro-assembly on the source substrate to touch and shift in the relative translation motion process of the two substrates, so that the transfer precision of the micro-assembly is reduced. If the clearance is too large, the micro-assembly may be deflected and expanded or even overturned after being transferred; if the gap is too small, the micro-module may bounce too much to achieve the purpose of transferring, and the transferring precision of the peripheral micro-module may be affected. Therefore, the precise control of the gap between the source substrate and the receiving substrate has a critical influence on the position accuracy of the transferred micro device, and accordingly, the precise measurement of the gap between the source substrate and the receiving substrate becomes a critical factor of the non-contact micro device transfer technology.
The existing method for measuring the gap between the source substrate and the receiving substrate usually adopts the methods of resistance measurement before and after electrode contact or laser range finders, etc. The former requires substrate contact for sensing, and the latter requires mounting a large distance measuring module in the axial accommodation space, which is not suitable for non-contact transfer techniques such as those mentioned in CN106825915B, WO2020152352a1, etc. if the transferred material or assembly of the receiving substrate is not suitable for contact first and then adjustment of the gap, nor for mounting a large laser distance measuring module between two substrates with a gap as small as 1-200 um.
Disclosure of Invention
The present invention provides a method for measuring a gap between a source substrate and a receiving substrate for transferring a micro device, in order to overcome the limitation of the method for measuring a gap between a source substrate and a receiving substrate for transferring a micro device in the prior art.
The invention solves the technical problems through the following technical scheme:
a method for measuring a gap between a source substrate and a receiving substrate for transferring a micro device, comprising:
s1, arranging a light receiver and a light source at two ends of the gap formed by the source substrate and the receiving substrate, respectively, and making the light emitted by the light source pass through the gap to reach the light receiver.
According to the measuring method, the light-sensitive receivers and the light sources are respectively arranged at two ends of the gap formed by the source substrate and the receiving substrate, light emitted by the light sources reaches the light-sensitive receivers after passing through the gap, light except the gap is shielded, reflected or refracted by the substrate and then attenuated through multiple reflections, the boundary between the substrate and the gap is obvious on the light-sensitive receivers, the light-sensitive receivers can automatically identify the size of the gap through judging the boundary, measuring equipment does not need to be installed between the gaps, non-contact measurement of the gap is achieved, and measuring accuracy and efficiency of the gap are improved.
Preferably, the source substrate is capable of rotating about an X-axis or a Y-axis relative to the receiving substrate;
alternatively, the receiving substrate can be rotated about an X-axis or a Y-axis relative to the source substrate.
In this scheme, the source substrate or the receiving substrate can rotate around the X axis or the Y axis, so that the parallelism between the two substrates can be conveniently adjusted.
Preferably, the source substrate and the receiving substrate are movable in directions to approach or separate from each other.
In this scheme, the source substrate and the receiving substrate can move in a direction of approaching or separating from each other, so as to adjust the size of the gap.
Preferably, the source substrate and the receiving substrate are mounted on a machine axis control system, and the machine axis control system drives the source substrate to rotate or move;
and/or the machine table axis control system drives the receiving substrate to rotate or move.
In the scheme, the source substrate or the receiving substrate can be independently adjusted through the machine station axis control system, and the source substrate and the receiving substrate can also be simultaneously adjusted to rotate and move through the machine station axis control system.
Preferably, the gap measuring method further includes the steps of:
and S2, controlling the machine axis control system to adjust the gap by the intelligent control system until the measured gap value of the gap measured by the light sensation receiver is equal to a preset gap value.
In the scheme, the light source is matched with the light-sensitive receiver to measure the gap to obtain a measured gap value, the intelligent control system evaluates the measured gap value and a preset gap value and controls the console axis control system to adjust the gap until the measured gap value is equal to the preset gap value, so that the function of real-time measurement and real-time adjustment is realized, and the purpose of quickly adjusting the gap between the source substrate and the receiving substrate to the preset gap value is achieved.
Preferably, the intelligent control system is configured to receive the measurement gap value and compare the measurement gap value with the preset gap value, and the intelligent control system is further configured to send a first signal to the machine axis control system when the measurement gap value is smaller than the preset gap value, and the intelligent control system is further configured to send a second signal to the machine axis control system when the measurement gap value is larger than the preset gap value;
the machine axis control system is used for increasing the gap when receiving the first signal, and the machine axis control system is also used for reducing the gap when receiving the second signal.
In the scheme, the intelligent control system evaluates the measurement gap value and the preset gap value and sends different signals to the machine shaft control system according to different evaluation results so as to realize the quick adjustment of the gap.
Preferably, the light-sensitive receiver measures the size of the gap according to the light transmission degree of the gap.
In this scheme, adopt above-mentioned structural style, can not cause the influence to micro-assembly's position accuracy, realize the non-contact measurement in clearance.
Preferably, the light-sensitive receiver and the light source are mounted on a mounting mechanism, and the mounting mechanism can synchronously drive the light-sensitive receiver and the light source to rotate around the circumferential direction of the receiving substrate;
or the source substrate and the receiving substrate are arranged on a machine station axis control system, and the machine station axis control system synchronously drives the source substrate and the receiving substrate to rotate around a Z axis;
wherein the Z axis is perpendicular to a surface of the source or receiving substrate.
In the scheme, the source substrate and the receiving substrate are not moved, and the scheme that the light-sensitive receiver and the light source move is adopted to measure different angles of the gap. Of course, in other embodiments, the light-sensitive receiver and the light source may be fixed, and the source substrate and the receiving substrate may be moved or rotated to measure different angles of the gap.
Preferably, the source substrate and the receiving substrate are made of opaque materials;
or the source substrate and the receiving substrate are both made of light-transmitting materials.
In the scheme, when the two substrates are made of opaque materials, the upper side and the lower side of the gap form an obvious boundary, so that the light-sensitive receiver can accurately measure the size of the gap conveniently.
When the two substrates are made of light-transmitting materials, the source substrate and the receiving substrate can enter the substrate materials through light refraction and undergo multiple reflection attenuation to present a gradual-layer gray area under the irradiation of the light source, a bright area can be formed on the light-sensitive receiver due to the fact that no matter is shielded in the gap, an obvious boundary can be formed between the bright area and the gradual-layer gray area, and the light-sensitive receiver can automatically identify the size of the gap through the boundary.
Preferably, the source substrate is made of a light-transmitting material, and the receiving substrate is made of a light-proof material;
or the source substrate is made of opaque material, and the receiving substrate is made of transparent material.
In the scheme, the light-tight substrate can shield part of the light source through the irradiation of the light source, so that the edge of the substrate and the light transmitted from the gap form brightness contrast; the light-transmitting substrate presents a gray-gradient area due to the fact that light rays are refracted and enter the substrate material to be reflected and attenuated for multiple times, the edge and the gap area of the light-transmitting substrate still have obvious brightness difference, the image of the light-sensitive receiver can be used for judging the boundary of the two substrates, and therefore gap measurement and calculation of the two substrates are obtained.
On the basis of the common knowledge in the field, the above preferred conditions can be combined randomly to obtain the preferred embodiments of the invention.
The positive progress effects of the invention are as follows: according to the measurement method, the light-sensitive receivers and the light sources are respectively arranged at two ends of the gap formed by the source substrate and the receiving substrate, light emitted by the light sources reaches the light-sensitive receivers after passing through the gap, the light except the gap is shielded, reflected or refracted by the substrate and then attenuated by multiple reflections, the boundary with the obvious gap between the substrate and the gap is left on the light-sensitive receivers, the size of the gap can be automatically identified by the light-sensitive receivers through judging the boundary, measurement equipment does not need to be installed between the gaps, non-contact measurement of the gap is achieved, and measurement accuracy and efficiency of the gap are improved.
Drawings
Fig. 1 is a flowchart illustrating a method for measuring a gap between a source substrate and a receiving substrate according to embodiment 1 of the present invention.
Fig. 2 is a schematic perspective view of a source substrate, a receiving substrate, a light source, and a photoreceptor according to embodiment 1 of the invention.
FIG. 3 is a schematic view of measuring a first viewing angle of a source substrate, a receiving substrate, a light source and a photoreceptor according to embodiment 1 of the invention.
Fig. 4 is a schematic view of the rotation direction of the source substrate according to embodiment 1 of the present invention.
Fig. 5 is a schematic view of the rotation direction of the source substrate and the receiving substrate as a whole according to embodiment 1 of the present invention.
Fig. 6 is a schematic structural diagram of a first viewing angle in which the source substrate and the receiving substrate are both made of opaque materials according to embodiment 1 of the present invention.
Fig. 7 is a schematic view of measuring the transmittance of both the source substrate and the receiving substrate in embodiment 2 of the invention.
Fig. 8 is a schematic structural diagram of a first viewing angle in which the source substrate and the receiving substrate are both made of a transparent material according to embodiment 2 of the present invention.
Fig. 9 is a grayscale image collected by the photoreceiver when the source substrate and the receiving substrate are both made of transparent materials according to embodiment 2 of the present invention.
Fig. 10 is a schematic view of measurement when the source substrate is opaque and the receiving substrate is transparent in embodiment 3 of the present invention.
Fig. 11 is a schematic structural diagram of a first viewing angle in which the source substrate is made of an opaque material and the receiving substrate is made of a transparent material according to embodiment 3 of the present invention.
Fig. 12 is a grayscale image collected by the photoreceiver when the source substrate is opaque and the receiving substrate is transparent according to embodiment 3 of the present invention.
Fig. 13 is a schematic view of measuring that the source substrate is made of a transparent material and the receiving substrate is made of an opaque material according to embodiment 3 of the present invention.
Fig. 14 is a schematic structural diagram of a first viewing angle in which the source substrate is made of a transparent material and the receiving substrate is made of an opaque material according to embodiment 3 of the present invention.
FIG. 15 is a gray scale image collected by the photoreceiver when the source substrate is transparent and the receiving substrate is opaque according to embodiment 3 of the present invention.
FIG. 16 is a schematic view of the structure of the photoreceptor and the light source moving relative to the source substrate in embodiment 4 of the invention.
Description of reference numerals:
Receiving substrate 4
Step S1
Step S2
Detailed Description
The present invention will be more clearly and completely described below by way of examples and with reference to the accompanying drawings, but the present invention is not limited thereto.
Example 1
As shown in fig. 1 to 6, the present embodiment discloses a method for measuring a gap between a source substrate 3 and a receiving substrate 4 for transferring a micro device, the method comprising the steps of:
s1, arranging the photoreceiver 1 and the light source 2 at two ends of the gap 5 formed by the source substrate 3 and the receiving substrate 4, respectively, and making the light emitted from the light source 2 pass through the gap 5 to reach the photoreceiver 1;
s2, the intelligent control system controls the machine axis control system to adjust the gap 5 until the measured gap value of the measured gap 5 of the light sensation receiver 1 is equal to the preset gap value.
In the embodiment, the photoreceiver 1 and the light source 2 are respectively arranged at two ends of a gap 5 formed by the source substrate 3 and the receiving substrate 4, light emitted by the light source 2 passes through the gap 5 and then reaches the photoreceiver 1, and light except for the gap 5 is shielded, reflected or refracted by the substrate and then attenuated by multiple reflections, so that a boundary between the substrate and the gap is obvious on the photoreceiver 1, and the photoreceiver 1 can automatically identify the size of the gap 5 through the judgment of the boundary, thereby improving the measurement accuracy and efficiency of the gap 5. The light source 2 is matched with the light receiver 1 to measure the gap 5 to obtain a measured gap value; the intelligent control system evaluates the measured gap value and the preset gap value and controls the console axis control system to adjust the gap 5 until the measured gap value is equal to the preset gap value, so that the function of real-time measurement and real-time adjustment is realized, and the purpose of quickly adjusting the gap 5 between the source substrate 3 and the receiving substrate 4 to the preset gap value is achieved.
In the present embodiment, the photoreceptor 1 measures the size of the gap 5 to such an extent that the gap 5 transmits light. Because light sensation receiver 1 and light source 2 do not need to contact with the micromodule directly, can not cause the influence to the position accuracy of micromodule correspondingly, realize the non-contact measurement of clearance 5.
In the present embodiment, the source substrate 3 can be rotated about the X-axis or the Y-axis with respect to the receiving substrate 4, so as to adjust the parallelism of the source substrate 3 and the receiving substrate 4. Of course, in other embodiments, the receiving substrate may be configured to rotate about the X-axis or the Y-axis relative to the source substrate.
Meanwhile, the source substrate 3 and the receiving substrate 4 can move in a direction to approach or separate from each other, so that the size of the gap 5 can be adjusted. The source substrate 3 and the receiving substrate 4 can also rotate as a whole around the Z-axis, facilitating the photoreceiver 1 to measure different orientations of the gap 5. Fig. 5 shows only the X-axis and the Y-axis, and the Z-axis, which is perpendicular to the X-axis and the Y-axis, is not shown in the drawing. In the present embodiment, the Z axis is perpendicular to the upper surface of the receiving substrate 4. The direction indicated by the arrow in fig. 4 shows the rotation of the source substrate 3, and the direction indicated by the arrow in fig. 5 shows the rotation of the source substrate 3 and the receiving substrate 4 as a whole about the Z axis.
Of course, in other embodiments, the source substrate and the receiving substrate may be moved in opposite or away directions simultaneously to achieve a quick adjustment of the gap.
In the present embodiment, the source substrate 3 and the receiving substrate 4 are mounted on a stage axis control system (not shown), which drives the source substrate 3 and the receiving substrate 4 to rotate around the X-axis, the Y-axis, and the Z-axis or move along the Z-axis. In this embodiment, the machine axis control system can adjust the source substrate 3 or the receiving substrate 4 independently, and also can adjust the rotation and movement of the source substrate 3 and the receiving substrate 4 simultaneously. In fig. 4 a schematic view of an individual adjustment of the source substrate 3 is shown, and in fig. 5 a schematic view of an adjustment of the source substrate 3 and the receiving substrate 4 as a whole is shown. The machine axis control system controls the movement or rotation of the source substrate 3 and the receiving substrate 4, which belongs to the prior art and is not described herein again.
Specifically, the intelligent control system (not shown in the figure) is configured to receive the measurement gap value and compare the measurement gap value with a preset gap value, and the intelligent control system is further configured to send a first signal to the machine axis control system when the measurement gap value is smaller than the preset gap value, and send a second signal to the machine axis control system when the measurement gap value is larger than the preset gap value; the machine axis control system is used for increasing the gap 5 when receiving the first signal, and the machine axis control system is also used for reducing the gap 5 when receiving the second signal. The intelligent control system evaluates the measurement gap value and the preset gap value in real time, and sends different signals to the machine axis control system according to different evaluation results so as to realize the quick adjustment of the gap 5.
In this embodiment, the source substrate 3 and the receiving substrate 4 are made of opaque materials. As shown in fig. 3, the opaque source substrate 3 and the opaque receiving substrate 4 are measured for the gap 5 between the two substrates. By the irradiation of the light source 2, the upper source substrate 3 and the lower receiving substrate 4 will shield part of the light source 2, so that the light receiver 1 only receives the gap light between the two substrates, thereby measuring the measurement gap value of the gap 5.
Since the source substrate 3 can be rotated about the X axis or the Y axis with respect to the receiving substrate 4, the gap measurement method can also perform the parallelism correction between the two substrates in this embodiment. When the parallelism between the two substrates is corrected, the upper and lower opaque substrates will shield part of the light source 2 by the irradiation of the light source 2, so that the light-sensitive receiver 1 only receives the gap light between the two substrates. As shown in fig. 6, the gap 5 is divided into a first gap 51 and a second gap 52, and the irradiation direction of the light source is perpendicular to the tilt direction of the source substrate 3 by rotating the source substrate 3 and the receiving substrate 4, so that the current photoreceptor has a limited imaging range, and the first gap 51 and the second gap 52 need to be measured separately. The first gap 51 and the second gap 52 are respectively and clearly imaged on the light-sensitive receiver, the light-sensitive receiver can accurately measure the values of the first gap 51 and the second gap 52 through pixel analysis, the gradient of the source substrate 3 is calculated through a trigonometric function according to the difference value of the first gap 51 and the second gap 52 and the length of the source substrate 3, and the machine axis control system can adjust the parallelism of the two substrates according to the gradient value.
In this embodiment, after the parallelism of the source substrate 3 and the receiving substrate 4 is usually corrected, the gap between the source substrate 3 and the receiving substrate 4 is measured and adjusted according to the measurement result until the measured gap value of the gap reaches the predetermined gap value.
In this embodiment, in order to reduce the influence of diffraction on the gap measurement value caused by light, the minimum value of the photoreceptor measurement gap is set to 0.83 μm. The maximum value of the gap measured by the photoreceptor is not limited in the normal case, but the gap measured in the actual measurement is limited by the light source diffusion and the visible range of the photoreceptor, and the maximum value of the gap measured by the photoreceptor in this embodiment can reach 5 mm. Thus, the range of values for the photoreceptor measurement gap in this embodiment is 0.83 microns to 5000 microns.
Example 2
As shown in fig. 7 to 9, the present embodiment is substantially the same as embodiment 1, except that: the source substrate 3 and the receiving substrate 4 are made of transparent materials.
As shown in fig. 7, the transparent source substrate 3 and the transparent receiving substrate 4 are used to measure the gap between the two substrates.
Through the irradiation of the light source 2, the upper transparent source substrate 3 will be reflected and attenuated by multiple times when the light is refracted into the substrate material, and thus a gray area as shown in the upper part of fig. 9 is formed, and there is still a significant brightness difference between the lower edge 100 of the transparent source substrate 3 and the gap 5 area; the lower transparent receiving substrate 4 will show a gray-gray area as shown in the lower part of fig. 9 due to the multiple reflection attenuation of the light entering the material by refraction, and there is still a significant brightness difference between the upper edge 100 of the transparent receiving substrate 4 and the gap 5 area, and the image of the light-sensitive receiver 1 can be used to determine the boundary between the two substrates according to the brightness difference, so as to obtain the measured value of the gap 5.
The light-transmitting source substrate 3 and the light-transmitting receiving substrate 4 perform a parallelism correction between the two substrates.
As shown in fig. 8, the gap 5 is divided into a first gap 51 and a second gap 52, and the irradiation direction of the light source is perpendicular to the tilt direction of the source substrate 3 by rotating the source substrate 3 and the receiving substrate 4, so that the current photoreceptor has a limited imaging range, and the first gap 51 and the second gap 52 need to be measured separately. The first gap 51 and the second gap 52 are respectively and clearly imaged on the light-sensitive receiver, the light-sensitive receiver can accurately measure the values of the first gap 51 and the second gap 52 through pixel analysis, the gradient of the source substrate 3 is calculated through a trigonometric function according to the difference value of the first gap 51 and the second gap 52 and the length of the source substrate 3, and the machine axis control system can adjust the parallelism of the two substrates according to the gradient value.
Example 3
As shown in fig. 10 to 15, this embodiment is substantially the same as embodiment 1, except that: the source substrate 3 or the receiving substrate 4 is made of opaque material.
As shown in fig. 10 and 12, the opaque source substrate 3 and the transparent receiving substrate 4 are subjected to measurement of the gap 5 between the two substrates.
Through the illumination of the light source 2, the upper opaque substrate will block part of the light source 2 to present the upper black region as shown in fig. 12, and the lower edge 100 of the substrate (the lower boundary of the source substrate 3) forms a brightness contrast with the light transmitted through the gap 5; the lower transparent substrate will show a gray-gradation area as shown in fig. 12 due to the light refraction and multiple reflection attenuation inside the substrate material, and there is still a significant brightness difference between the edge 100 (the upper boundary of the receiving substrate 4) and the gap area of the transparent substrate, so that the image of the light receiver 1 can be used to determine the boundary between the two substrates.
The opaque source substrate 3 and the transparent receiving substrate 4 perform the parallelism correction between the two substrates.
As shown in fig. 11, the gap 5 is divided into a first gap 51 and a second gap 52, and the irradiation direction of the light source is perpendicular to the tilt direction of the source substrate 3 by rotating the source substrate 3 and the receiving substrate 4, so that the current photoreceptor has a limited imaging range, and the first gap 51 and the second gap 52 need to be measured separately. The first gap 51 and the second gap 52 are respectively and clearly imaged on the light-sensitive receiver, the light-sensitive receiver can accurately measure the values of the first gap 51 and the second gap 52 through pixel analysis, the gradient of the source substrate 3 is calculated through a trigonometric function according to the difference value of the values of the first gap 51 and the second gap 52 and the length of the source substrate 3, and the machine axis control system can adjust the parallelism of the two substrates according to the gradient value.
Fig. 13 and 15 show that the light-transmissive source substrate 3 and the light-opaque receiving substrate 4 are subjected to gap measurement between the two substrates.
Through the irradiation of the light source 2, the upper transparent substrate will show an upper gradual gray region as shown in fig. 15 due to the multiple reflection attenuation of the light refracted into the substrate material, and there is still a significant brightness difference between the edge 100 of the transparent substrate (the lower boundary of the source substrate 3) and the gap region; the lower opaque substrate blocks part of the light source, and as shown in the lower black area in fig. 15, the upper edge 100 of the substrate (the upper boundary of the receiving substrate 4) and the light passing through the gap form a brightness contrast, and the image of the light receiver can determine the boundary between the two substrates.
The light-transmitting source substrate 3 and the light-opaque receiving substrate 4 are used to correct the parallelism between the two substrates.
As shown in fig. 14, the gap 5 is divided into a first gap 51 and a second gap 52, and the source substrate 3 and the receiving substrate 4 are rotated so that the irradiation direction of the light source is perpendicular to the tilt direction of the source substrate 3, and the imaging range of the current photoreceptor is limited, and the first gap 51 and the second gap 52 need to be measured separately. The first gap 51 and the second gap 52 are respectively and clearly imaged on the light-sensitive receiver, the light-sensitive receiver can accurately measure the values of the first gap 51 and the second gap 52 through pixel analysis, the gradient of the source substrate 3 is calculated through a trigonometric function by combining the difference value of the first gap 51 and the second gap 52 and the length of the source substrate 3, and the machine axis control system can adjust the parallelism of the two substrates according to the gradient value.
Example 4
As shown in fig. 16, this embodiment is substantially the same as embodiment 1, except that: the photoreceiver 1 and the light source 2 are mounted on a mounting mechanism (not shown) that can synchronously drive the photoreceiver 1 and the light source 2 to rotate around the circumferential direction of the receiving substrate 4, and the rotation directions of the photoreceiver 1 and the light source 2 are shown by arrows in fig. 16. Of course, in other embodiments, the rotation directions of the light-sensitive receiver 1 and the light source 2 can be reversed. In this embodiment, the source substrate 3 and the receiving substrate 4 are kept stationary, and the photoreceptor 1 and the light source 2 are moved to measure a plurality of angles of the gap 5. The mounting mechanism drives the light receiver 1 and the light source 2 to move or rotate, which belongs to the prior art and is not described herein again.
While specific embodiments of the invention have been described above, it will be appreciated by those skilled in the art that this is by way of example only, and that the scope of the invention is defined by the appended claims. Various changes and modifications to these embodiments may be made by those skilled in the art without departing from the spirit and scope of the invention, and these changes and modifications are within the scope of the invention.
Claims (10)
1. A method for measuring a gap between a source substrate and a receiving substrate for micro-module transfer, comprising the steps of:
s1, arranging a light receiver and a light source at two ends of the gap formed by the source substrate and the receiving substrate, respectively, and making the light emitted by the light source pass through the gap to reach the light receiver.
2. The method of claim 1, wherein the source substrate is capable of rotating about an X-axis or a Y-axis relative to the receiving substrate;
alternatively, the receiving substrate can be rotated about an X-axis or a Y-axis relative to the source substrate.
3. The method of claim 2, wherein the source substrate and the receiving substrate are capable of moving in a direction toward or away from each other.
4. The method of claim 3, wherein the source substrate and the receiving substrate are mounted on a stage axis control system, the stage axis control system driving the source substrate to rotate or move;
and/or the machine table axis control system drives the receiving substrate to rotate or move.
5. The method of claim 4, wherein the method further comprises the steps of:
and S2, controlling the machine axis control system to adjust the gap by the intelligent control system until the measured gap value of the gap measured by the light-sensitive receiver is equal to a preset gap value.
6. The method of claim 5, wherein the intelligent control system is configured to receive the measured gap value and compare the measured gap value with the predetermined gap value, the intelligent control system is further configured to send a first signal to the machine axis control system when the measured gap value is smaller than the predetermined gap value, and the intelligent control system is further configured to send a second signal to the machine axis control system when the measured gap value is larger than the predetermined gap value;
the machine axis control system is used for increasing the gap when receiving the first signal, and the machine axis control system is also used for reducing the gap when receiving the second signal.
7. The method as claimed in claim 1, wherein the photoreceivers measure the size of the gap by the degree of transparency of the gap.
8. The method as claimed in claim 1, wherein the photo receiver and the light source are mounted on a mounting mechanism capable of synchronously driving the photo receiver and the light source to rotate around the circumferential direction of the receiving substrate;
or the source substrate and the receiving substrate are arranged on a machine station axis control system, and the machine station axis control system synchronously drives the source substrate and the receiving substrate to rotate around a Z axis;
wherein the Z axis is perpendicular to a surface of the source or receiving substrate.
9. The method according to any one of claims 1 to 8, wherein the source substrate and the receiving substrate are made of opaque material;
or the source substrate and the receiving substrate are both made of light-transmitting materials.
10. The method according to any one of claims 1-8, wherein the source substrate is made of a transparent material and the receiving substrate is made of an opaque material;
or, the source substrate is made of a light-tight material, and the receiving substrate is made of a light-permeable material.
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| CN (1) | CN114623774A (en) |
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