CN114591685A - Stone polishing paste and preparation method thereof - Google Patents
Stone polishing paste and preparation method thereof Download PDFInfo
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- CN114591685A CN114591685A CN202210201066.1A CN202210201066A CN114591685A CN 114591685 A CN114591685 A CN 114591685A CN 202210201066 A CN202210201066 A CN 202210201066A CN 114591685 A CN114591685 A CN 114591685A
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- 239000004575 stone Substances 0.000 title claims abstract description 42
- 238000005498 polishing Methods 0.000 title claims abstract description 35
- 238000002360 preparation method Methods 0.000 title abstract description 19
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 16
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 14
- 239000012188 paraffin wax Substances 0.000 claims abstract description 14
- 238000000227 grinding Methods 0.000 claims abstract description 10
- 239000000463 material Substances 0.000 claims abstract description 8
- 239000002270 dispersing agent Substances 0.000 claims abstract description 7
- 239000002562 thickening agent Substances 0.000 claims abstract description 7
- 239000002518 antifoaming agent Substances 0.000 claims abstract description 6
- 238000000034 method Methods 0.000 claims abstract description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 32
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 30
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical compound CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 claims description 21
- 239000000377 silicon dioxide Substances 0.000 claims description 16
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 claims description 12
- 235000012239 silicon dioxide Nutrition 0.000 claims description 12
- 239000004408 titanium dioxide Substances 0.000 claims description 12
- NIXOWILDQLNWCW-UHFFFAOYSA-N Acrylic acid Chemical group OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 11
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 claims description 11
- 229920002125 Sokalan® Polymers 0.000 claims description 11
- UMIVXZPTRXBADB-UHFFFAOYSA-N benzocyclobutene Chemical compound C1=CC=C2CCC2=C1 UMIVXZPTRXBADB-UHFFFAOYSA-N 0.000 claims description 11
- 229960001631 carbomer Drugs 0.000 claims description 11
- 229920000663 Hydroxyethyl cellulose Polymers 0.000 claims description 8
- 239000004354 Hydroxyethyl cellulose Substances 0.000 claims description 8
- 235000019447 hydroxyethyl cellulose Nutrition 0.000 claims description 8
- GCLGEJMYGQKIIW-UHFFFAOYSA-H sodium hexametaphosphate Chemical group [Na]OP1(=O)OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])O1 GCLGEJMYGQKIIW-UHFFFAOYSA-H 0.000 claims description 8
- 235000019982 sodium hexametaphosphate Nutrition 0.000 claims description 8
- 239000001577 tetrasodium phosphonato phosphate Substances 0.000 claims description 8
- STCOOQWBFONSKY-UHFFFAOYSA-N tributyl phosphate Chemical group CCCCOP(=O)(OCCCC)OCCCC STCOOQWBFONSKY-UHFFFAOYSA-N 0.000 claims description 8
- 238000003756 stirring Methods 0.000 claims description 6
- 238000007865 diluting Methods 0.000 claims description 3
- 230000000087 stabilizing effect Effects 0.000 claims description 3
- 238000005303 weighing Methods 0.000 claims description 3
- 239000002245 particle Substances 0.000 claims description 2
- 230000003750 conditioning effect Effects 0.000 claims 1
- 239000013530 defoamer Substances 0.000 claims 1
- 230000001681 protective effect Effects 0.000 abstract description 11
- 238000004519 manufacturing process Methods 0.000 abstract description 6
- 230000000694 effects Effects 0.000 abstract description 5
- 230000002195 synergetic effect Effects 0.000 abstract description 4
- 238000013329 compounding Methods 0.000 abstract description 3
- 230000008569 process Effects 0.000 abstract description 3
- 239000004579 marble Substances 0.000 description 5
- 239000000126 substance Substances 0.000 description 3
- 239000001993 wax Substances 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 239000002932 luster Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000003223 protective agent Substances 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 239000012752 auxiliary agent Substances 0.000 description 1
- 230000003796 beauty Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000005282 brightening Methods 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000010438 granite Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000003755 preservative agent Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
- C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/61—Additives non-macromolecular inorganic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/63—Additives non-macromolecular organic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/65—Additives macromolecular
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Inorganic Chemistry (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The invention relates to the technical field of stone grinding materials, in particular to stone grinding paste and a preparation method thereof, and the stone grinding paste provided by the application obviously improves the heat resistance of the grinding paste through reasonable compounding of a grinding agent, a thickening agent, a film forming agent, paraffin, a dispersing agent, a defoaming agent, a regulator and water and through the synergistic action among the components, so that a compact protective film is easily formed on the surface of stone, the protective effect is good, and the gloss of the protective film is higher and the polishing effect is better through the addition of the paraffin; the preparation method provided by the application has the advantages that the process flow is simple, the preparation is easy, no special setting is used in the preparation process, the operation is simple and convenient, the requirement of mass production and manufacturing can be met, and the prepared polishing paste has high polishing glossiness and can better meet the application requirement.
Description
Technical Field
The invention relates to a stone polishing material, in particular to stone polishing paste and a preparation method thereof.
Background
In the building field, the stone is not only used as a base stone material, but also widely used for indoor and outdoor decoration of buildings according to unique color and texture patterns. Architectural decorative stones are often classified into two categories: marble and granite. Due to different internal structures, textures and compositions, the colorful glass forms rich and gorgeous colors. However, the impurities in the building decorative stone (especially the loose marble) are easily weathered and corroded by the action of oxides, water and carbon dioxide in the atmosphere, so that the surface of the stone loses luster. Therefore, the surface of the stone needs to be properly protected to ensure its luster and beauty for a certain period of time.
Currently, a polishing paste is usually used to polish and polish the stone, however, the existing polishing paste, for example, chinese patent CN201010513898 discloses a stone glazing protective agent and a preparation method thereof, and the disclosed protective agent includes the following components by mass fraction: 20 to 30 percent of wax substances, 4 to 8 percent of auxiliary agents, 6 to 10 percent of brightening agents, 4 to 8 percent of surface active agents, 1 to 2 percent of preservatives, and 45 to 60 percent of distilled water, and after the wax substances are applied to marble products, the glossiness can reach 85 percent, although the glossiness of the stone appearance is improved to a certain degree, the wax substances cannot meet the use requirements.
Disclosure of Invention
In order to solve the problems, the invention provides a stone polishing paste and a preparation method thereof, which have good protection and high polishing glossiness and can better meet the application requirements.
The technical scheme adopted by the invention is as follows:
the stone polishing paste comprises the following components in percentage by mass:
20-25% of a grinding agent; 0.5-1.5% of a thickening agent; 1.5-5% of a film-forming agent; 1-2% of paraffin; 0.1-0.5% of a dispersant; 0.1-0.2% of defoaming agent; 0.5-1% of a regulator; and the balance water;
wherein the abrasive comprises silica and titania; the film forming agent comprises isobutene, methyl methacrylate, benzocyclobutene and alpha-methyl styrene.
As a further technical scheme, the particle size of the silicon dioxide is less than 100 nm; the titanium dioxide is rutile titanium dioxide.
According to a further technical scheme, the addition ratio of the silicon dioxide to the titanium dioxide is 23-25: 0.2 to 0.4.
As a further technical scheme, the thickening agent is hydroxyethyl cellulose.
According to a further technical scheme, the addition amount ratio of the isobutene, the methyl methacrylate, the benzocyclobutene and the alpha-methylstyrene is 1-2: 0.3-0.6: 0.5-1.5: 0.1 to 0.3.
As a further technical scheme, the dispersing agent is sodium hexametaphosphate.
As a further technical scheme, the defoaming agent is tributyl phosphate.
As a further technical scheme, the regulator is carbomer.
The preparation method of the stone polishing paste comprises the following preparation steps:
s1, weighing the components according to the mass ratio for later use;
and S2, diluting carbomer with water, adding silicon dioxide, stirring uniformly, adding the rest materials, stirring uniformly, and stabilizing for 2-3 days to obtain the stone polishing paste.
The invention has the following beneficial effects:
1. according to the stone polishing paste provided by the application, through reasonable compounding of the grinding agent, the thickening agent, the film forming agent, the paraffin, the dispersing agent, the defoaming agent, the regulator and the water, through synergistic effect among the components, the heat resistance of the polishing paste is obviously improved, so that a compact protective film is easily formed on the surface of a stone, the protective effect is good, and the protective film has higher glossiness and better polishing effect through addition of the paraffin, so that the application requirement can be better met;
2. the preparation method provided by the application has the advantages that the process flow is simple, the preparation is easy, no special setting is used in the preparation process, the operation is simple and convenient, the requirement of mass production and manufacturing can be met, and the prepared polishing paste has high polishing glossiness and can better meet the application requirement.
Drawings
FIG. 1 is a flow chart of preparation in examples 1 to 6 of the present invention.
Detailed Description
In order that the invention may be more readily understood, reference will now be made to the following more particular description of the invention, examples of which are set forth below. This invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. These embodiments are provided so that this disclosure will be thorough and complete. The various starting materials used in the examples are, unless otherwise indicated, conventional commercial products.
Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used in the description of the invention herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.
The numerical values set forth in the examples of the present invention are approximations, not necessarily by way of the actual values set forth. All values within the error range may be included without limiting to the specific values disclosed in the embodiments of the present invention, where the error or experimental conditions allow.
The numerical ranges disclosed in the examples of the present invention are intended to indicate the relative amounts of the components in the mixture and the ranges of temperatures or other parameters recited in the other method examples.
Example 1:
the stone polishing paste comprises the following components in percentage by mass:
23 percent of silicon dioxide
0.3 percent of titanium dioxide
0.8 percent of hydroxyethyl cellulose
1.5 percent of isobutene
Methyl methacrylate 0.4%
1.2 percent of benzocyclobutene
0.2 percent of alpha-methyl styrene
1.2 percent of paraffin
0.4 percent of sodium hexametaphosphate
0.1 percent of tributyl phosphate
Carbomer 0.7%
The balance of water.
Example 2
Silicon dioxide 24%
0.2 percent of titanium dioxide
0.9 percent of hydroxyethyl cellulose
1.3 percent of isobutene
Methyl methacrylate 0.5%
1.3 percent of benzocyclobutene
0.3 percent of alpha-methyl styrene
1.8 percent of paraffin
0.4 percent of sodium hexametaphosphate
0.1 percent of tributyl phosphate
Carbomer 0.5%
The balance being water.
Example 3
Silicon dioxide 25%
0.4 percent of titanium dioxide
1 percent of hydroxyethyl cellulose
1.3 percent of isobutene
Methyl methacrylate 0.5%
1.3 percent of benzocyclobutene
0.3 percent of alpha-methyl styrene
2 percent of paraffin
0.3 percent of sodium hexametaphosphate
0.2 percent of tributyl phosphate
Carbomer 0.8%
The balance of water.
Example 4
Silicon dioxide 25%
0.3 percent of titanium dioxide
Hydroxyethyl cellulose 1.4%
1.5 percent of isobutene
Methyl methacrylate 0.4%
1.2 percent of benzocyclobutene
Alpha-methyl styrene 0.2%
1.5 percent of paraffin
0.3 percent of sodium hexametaphosphate
0.2 percent of tributyl phosphate
Carbomer 0.8%
The balance of water.
Example 5
Silicon dioxide 25%
0.2 percent of titanium dioxide
1.1 percent of hydroxyethyl cellulose
1 percent of isobutene
Methyl methacrylate 0.6%
1.5 percent of benzocyclobutene
0.3 percent of alpha-methyl styrene
2 percent of paraffin
0.4 percent of sodium hexametaphosphate
0.1 percent of tributyl phosphate
Carbomer 0.8%
The balance of water.
Example 6
Silicon dioxide 25%
0.4 percent of titanium dioxide
0.8 percent of hydroxyethyl cellulose
1.5 percent of isobutene
Methyl methacrylate 0.5%
1.5 percent of benzocyclobutene
0.3 percent of alpha-methyl styrene
1 percent of paraffin
0.1 percent of sodium hexametaphosphate
0.1 percent of tributyl phosphate
Carbomer 1%
The balance of water.
The stone sanding pastes of examples 1-6 were prepared according to the following preparation methods, respectively:
s1, weighing the components according to the mass ratio for later use;
and S2, diluting carbomer with water, adding silicon dioxide, stirring uniformly, adding the rest materials, stirring uniformly, and stabilizing for 2-3 days to obtain the stone polishing paste.
The surface of the marble material was polished using the polishing pastes of examples 1 to 6, and the surface-side gloss of the marble material was measured using a digital gloss meter, and the results of the measurements are shown in the following table:
the stone polishing paste provided by the invention has an excellent polishing effect on stone, the glossiness of the stone polishing paste is more than 95 degrees, and the use requirement of high glossiness can be better met, and particularly, the stone polishing paste provided by the invention obviously improves the heat resistance of the polishing paste through reasonable compounding of an abrasive, a thickening agent, a film forming agent, paraffin, a dispersing agent, a defoaming agent, a regulator and water and through synergistic action among the components, so that a compact protective film is easy to form on the surface of the stone, the protective effect is good, the gloss of the protective film is higher through the addition of the paraffin, the polishing effect is better, and through the specific adoption of the abrasive composed of silicon dioxide and titanium dioxide, the grinding and polishing efficiency is improved, wherein the addition of the titanium dioxide can avoid corrosion on the stone, and the wettability of the protective film is improved, the invention adopts the film forming agent consisting of isobutene, methyl methacrylate, benzocyclobutene and alpha-methyl styrene, wherein the alpha-methyl styrene has the characteristic of thermal polymerization and has synergistic effect with other components to form the compact protective film, thereby having excellent protection and high gloss and better application effect.
The preparation method provided by the application has the advantages of simple process flow, easiness in preparation, no special arrangement in the preparation process, simplicity and convenience in operation, and capability of meeting the requirements of mass production and manufacturing, and the prepared polishing paste has high polishing glossiness and can better meet the application requirements.
The above-mentioned embodiments only express several embodiments of the present invention, and the description thereof is more specific and detailed, but not construed as limiting the scope of the present invention. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the inventive concept, which falls within the scope of the present invention. Therefore, the protection scope of the present patent shall be subject to the appended claims.
Claims (9)
1. The stone polishing paste is characterized by comprising the following components in percentage by mass:
20-25% of a grinding agent; 0.5-1.5% of a thickening agent; 1.5-5% of a film-forming agent; 1-2% of paraffin; 0.1-0.5% of a dispersant; 0.1-0.2% of defoaming agent; 0.5-1% of a regulator; and the balance water;
wherein the abrasive comprises silica and titania; the film forming agent comprises isobutene, methyl methacrylate, benzocyclobutene and alpha-methyl styrene.
2. The stone sanding paste of claim 1 wherein the silica has a particle size of less than 100 nm; the titanium dioxide is rutile titanium dioxide.
3. The stone polishing paste as claimed in claim 2, wherein the ratio of the addition amounts of the silica and the titanium dioxide is 23 to 25: 0.2 to 0.4.
4. The stone sanding paste of claim 1 wherein the thickener is hydroxyethyl cellulose.
5. The stone polishing paste as claimed in claim 1, wherein the ratio of the addition amounts of isobutylene, methyl methacrylate, benzocyclobutene and α -methylstyrene is 1-2: 0.3-0.6: 0.5-1.5: 0.1 to 0.3.
6. The stone sanding paste of claim 1 wherein the dispersant is sodium hexametaphosphate.
7. The stone sanding paste of claim 1 wherein the defoamer is tributyl phosphate.
8. The stone sanding paste of claim 1 wherein the conditioning agent is carbomer.
9. The method for preparing stone grinding paste according to any one of claims 1 to 8, comprising the following steps:
s1, weighing the components according to the mass ratio for later use;
and S2, diluting carbomer with water, adding silicon dioxide, stirring uniformly, adding the rest materials, stirring uniformly, and stabilizing for 2-3 days to obtain the stone polishing paste.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210201066.1A CN114591685A (en) | 2022-03-03 | 2022-03-03 | Stone polishing paste and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210201066.1A CN114591685A (en) | 2022-03-03 | 2022-03-03 | Stone polishing paste and preparation method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN114591685A true CN114591685A (en) | 2022-06-07 |
Family
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Family Applications (1)
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| CN202210201066.1A Pending CN114591685A (en) | 2022-03-03 | 2022-03-03 | Stone polishing paste and preparation method thereof |
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