CN112940626A - Building stone polishing agent - Google Patents
Building stone polishing agent Download PDFInfo
- Publication number
- CN112940626A CN112940626A CN201911257034.8A CN201911257034A CN112940626A CN 112940626 A CN112940626 A CN 112940626A CN 201911257034 A CN201911257034 A CN 201911257034A CN 112940626 A CN112940626 A CN 112940626A
- Authority
- CN
- China
- Prior art keywords
- parts
- polishing agent
- stone
- building stone
- stone polishing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004575 stone Substances 0.000 title claims abstract description 21
- 238000005498 polishing Methods 0.000 title claims abstract description 13
- 239000003795 chemical substances by application Substances 0.000 title claims abstract description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims abstract description 12
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims abstract description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 8
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims abstract description 4
- 229910052593 corundum Inorganic materials 0.000 claims abstract description 4
- 239000010431 corundum Substances 0.000 claims abstract description 4
- 235000006408 oxalic acid Nutrition 0.000 claims abstract description 4
- 239000012188 paraffin wax Substances 0.000 claims abstract description 4
- 239000000843 powder Substances 0.000 claims abstract description 4
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 4
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 4
- 229910052708 sodium Inorganic materials 0.000 claims abstract description 4
- 239000011734 sodium Substances 0.000 claims abstract description 4
- ZNCPFRVNHGOPAG-UHFFFAOYSA-L sodium oxalate Chemical compound [Na+].[Na+].[O-]C(=O)C([O-])=O ZNCPFRVNHGOPAG-UHFFFAOYSA-L 0.000 claims abstract description 4
- 229940039790 sodium oxalate Drugs 0.000 claims abstract description 4
- 239000002994 raw material Substances 0.000 claims description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000010438 granite Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000004579 marble Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/06—Other polishing compositions
- C09G1/08—Other polishing compositions based on wax
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Disintegrating Or Milling (AREA)
Abstract
The invention discloses a building stone polishing agent which comprises the following components in parts by weight: 70 parts of silicon dioxide, 25 parts of corundum powder, 11 parts of oxalic acid, 65 parts of sodium oxalate, 90 parts of sodium fluosilicate, 13 parts of paraffin and 5ml of methanol. The invention can obviously change the uneven condition of the surface of the stone and obviously improve the glossiness of the stone.
Description
Technical Field
The invention belongs to the technical field of inorganic material surface treatment, and particularly relates to a building stone polishing agent.
Background
China is a big stone country, the stone resources are rich, the national marble reserves reach 30-50 billion cubic meters, the granite reserves are more than 100 billion cubic meters, and the distribution is wide. The polishing is the last procedure in the stone processing, and plays a decisive role in the stone processing. In order to improve the quality of domestic stone, the stone processing technology, especially the stone polishing technology, must be continuously improved. How to improve the glossiness and the polishing efficiency of the building stone is a technical problem to be solved urgently.
Disclosure of Invention
In order to solve the technical problems, the invention provides a building stone polishing agent.
A building stone polishing agent comprises the following components in parts by weight: 70 parts of silicon dioxide, 25 parts of corundum powder, 11 parts of oxalic acid, 65 parts of sodium oxalate, 90 parts of sodium fluosilicate, 13 parts of paraffin and 5ml of methanol.
Further, the raw materials are mixed and ground for 1-2 hours to obtain the product.
The invention has the beneficial effects that: the wax-like substance in the formula can enable fine pits to be filled by plastic movement of the protruding parts, so that the condition of unevenness on the surface of the stone is changed, and the glossiness of the stone is obviously improved.
Detailed Description
The present invention is further illustrated by the following specific examples.
Example 1
A building stone polishing agent comprises the following components in parts by weight: 70 parts of silicon dioxide, 25 parts of corundum powder, 11 parts of oxalic acid, 65 parts of sodium oxalate, 90 parts of sodium fluosilicate, 13 parts of paraffin and 5ml of methanol.
Mixing the above materials, and grinding for 1-2 hr.
Claims (2)
1. The building stone polishing agent is characterized by comprising the following components in parts by weight: 70 parts of silicon dioxide, 25 parts of corundum powder, 11 parts of oxalic acid, 65 parts of sodium oxalate, 90 parts of sodium fluosilicate, 13 parts of paraffin and 5ml of methanol.
2. The polishing agent for building stones according to claim 1, wherein the polishing agent is prepared by mixing the above raw materials and grinding for 1-2 hours.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911257034.8A CN112940626A (en) | 2019-12-10 | 2019-12-10 | Building stone polishing agent |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911257034.8A CN112940626A (en) | 2019-12-10 | 2019-12-10 | Building stone polishing agent |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN112940626A true CN112940626A (en) | 2021-06-11 |
Family
ID=76225409
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201911257034.8A Pending CN112940626A (en) | 2019-12-10 | 2019-12-10 | Building stone polishing agent |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN112940626A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114591685A (en) * | 2022-03-03 | 2022-06-07 | 深圳市润尔鑫智能环境科技有限公司 | Stone polishing paste and preparation method thereof |
| CN115466530A (en) * | 2022-09-30 | 2022-12-13 | 武汉工程大学 | Modified silicon dioxide crystal face agent and preparation method and application thereof |
| CN115926628A (en) * | 2022-04-07 | 2023-04-07 | 东莞市立信环保科技有限公司 | Polishing agent with high glossiness |
-
2019
- 2019-12-10 CN CN201911257034.8A patent/CN112940626A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114591685A (en) * | 2022-03-03 | 2022-06-07 | 深圳市润尔鑫智能环境科技有限公司 | Stone polishing paste and preparation method thereof |
| CN115926628A (en) * | 2022-04-07 | 2023-04-07 | 东莞市立信环保科技有限公司 | Polishing agent with high glossiness |
| CN115466530A (en) * | 2022-09-30 | 2022-12-13 | 武汉工程大学 | Modified silicon dioxide crystal face agent and preparation method and application thereof |
| CN115466530B (en) * | 2022-09-30 | 2023-10-27 | 武汉工程大学 | Modified silicon dioxide crystal face agent and preparation method and application thereof |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| WD01 | Invention patent application deemed withdrawn after publication | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20210611 |