CN114481035A - Vapor deposition apparatus and method for recovering vapor deposition material - Google Patents
Vapor deposition apparatus and method for recovering vapor deposition material Download PDFInfo
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- CN114481035A CN114481035A CN202210036032.1A CN202210036032A CN114481035A CN 114481035 A CN114481035 A CN 114481035A CN 202210036032 A CN202210036032 A CN 202210036032A CN 114481035 A CN114481035 A CN 114481035A
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- 239000000463 material Substances 0.000 title claims abstract description 76
- 238000000034 method Methods 0.000 title claims abstract description 35
- 238000007740 vapor deposition Methods 0.000 title claims description 29
- 238000001704 evaporation Methods 0.000 claims abstract description 202
- 230000008020 evaporation Effects 0.000 claims abstract description 200
- 230000000903 blocking effect Effects 0.000 claims abstract description 108
- 230000008021 deposition Effects 0.000 claims abstract description 54
- 238000003860 storage Methods 0.000 claims description 65
- 230000004888 barrier function Effects 0.000 claims description 29
- 230000007246 mechanism Effects 0.000 claims description 23
- 230000017525 heat dissipation Effects 0.000 claims description 19
- 238000001816 cooling Methods 0.000 claims description 7
- 238000000429 assembly Methods 0.000 claims description 3
- 230000000712 assembly Effects 0.000 claims description 3
- 238000000576 coating method Methods 0.000 abstract description 35
- 239000011248 coating agent Substances 0.000 abstract description 34
- 238000009834 vaporization Methods 0.000 abstract description 19
- 230000008016 vaporization Effects 0.000 abstract description 19
- 238000011084 recovery Methods 0.000 abstract description 9
- 238000000151 deposition Methods 0.000 description 49
- 230000008569 process Effects 0.000 description 18
- 238000010586 diagram Methods 0.000 description 6
- 238000004140 cleaning Methods 0.000 description 5
- 230000009471 action Effects 0.000 description 4
- 238000007747 plating Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000004064 recycling Methods 0.000 description 3
- 238000009825 accumulation Methods 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- 239000002346 layers by function Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 238000013459 approach Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011982 device technology Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000002372 labelling Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The application provides a coating by vaporization device and recovery method of coating by vaporization material, and the coating by vaporization device includes coating by vaporization source, restriction board and blockking, and the coating by vaporization source is including being used for placing coating by vaporization material evaporate the chamber and being located to evaporate at least one evaporation hole that the chamber communicates on one side in the first direction and with the coating by vaporization chamber. The at least two limiting plates are respectively arranged on two sides of the evaporation hole in a second direction, and the first direction is intersected with the second direction; the blocking member is arranged on one side of the limiting plate close to the evaporation hole, and one side of the blocking member facing the evaporation hole is provided with a plurality of deposition holes which are formed in a concave mode along the second direction. The limiting plate comprises a first part positioned in the preset evaporation area, and the orthographic projection of the blocking piece on the limiting plate is at least partially overlapped with the first part, so that at least part of the evaporation material is deposited on the blocking piece. The embodiment of the application enables at least part of evaporation materials to be deposited on the blocking piece, and reduces the deposition amount of the evaporation materials on the limiting plate.
Description
Technical Field
The application relates to the technical field of evaporation equipment, in particular to an evaporation device and a recovery method of evaporation materials.
Background
In the conventional display device technology, the display panel is mainly divided into two mainstream technologies, namely a liquid crystal display panel and an organic self-luminous display panel. The organic self-luminous display panel adopts an organic electroluminescent material, and when current passes through the organic electroluminescent material, the luminescent material can emit light, so that the display function of the display panel is realized.
The light emitting layer of the organic light emitting display panel is a light emitting device formed by stacking a plurality of functional layers, and is usually manufactured by an evaporation process, i.e. the functional layers in the display panel are evaporated by the evaporation process.
Disclosure of Invention
The embodiment of the application provides a vapor deposition device and a vapor deposition material recovery method, which can reduce the accumulation of vapor deposition materials on a limiting plate.
In a first aspect, an embodiment of the present application provides an evaporation device, including an evaporation source, a limiting plate and a blocking member, the evaporation source includes an evaporation chamber for placing an evaporation material and at least one evaporation hole located on one side of the evaporation chamber in a first direction and communicated with the evaporation chamber.
The at least two limiting plates are respectively arranged on two sides of the evaporation hole in a second direction, and the first direction is intersected with the second direction; the blocking member is arranged on one side of the limiting plate close to the evaporation hole, and one side of the blocking member facing the evaporation hole is provided with a plurality of deposition holes which are formed in a concave mode along the second direction.
The limiting plate comprises a first part positioned in the preset evaporation area, and the orthographic projection of the blocking piece on the limiting plate is at least partially overlapped with the first part, so that at least part of the evaporation material is deposited on the blocking piece.
In some embodiments, the evaporation device further comprises a storage box arranged at one end of the blocking piece facing the evaporation source in the first direction, the storage box is provided with an opening facing the blocking piece, and the blocking piece is movably arranged at the opening along the first direction so as to enable the blocking piece to enter or leave the storage box along the first direction.
In some embodiments, the evaporation device further includes a heat dissipation mechanism disposed on at least one side of the storage box, and the heat dissipation mechanism is configured to dissipate heat from the storage box.
In some embodiments, the heat dissipation mechanism is a water-cooling mechanism, and the heat dissipation mechanism is isolated from the storage box.
In some embodiments, the heat dissipation mechanism is disposed around the periphery of the storage box.
In some embodiments, the evaporation device further comprises a sliding member disposed on a side of the opening facing the blocking member, and the sliding member is movably disposed along the second direction to cover the opening
In some embodiments, the evaporation apparatus further includes an accommodating cavity, the storage box is disposed in the accommodating cavity, the accommodating cavity includes a first through hole, the blocking member extends into the storage box from the first through hole, and the sliding member is movably disposed in the first through hole along the second direction, so that the sliding member can cover the first through hole.
In some embodiments, the limiting plate is connected to the slider and moves in synchronization with the slider.
In some embodiments, the limiting plate and the blocking member have the same length in the first direction.
In some embodiments, the blocking member includes a first blocking portion extending along the first direction and a second blocking portion disposed on a side of the first blocking portion facing away from the limiting plate, and the second blocking portion is at least partially located in the predetermined evaporation area and extends along the second direction.
In some embodiments, the second stop is adjustably disposed in length in the second direction.
In some embodiments, the blocking member includes a baffle plate and a deposition plate located on a side of the baffle plate near the evaporation holes, and the deposition holes are disposed on the deposition plate and penetrate through the deposition plate along the second direction.
In some embodiments, the deposition plate is removably attached to the baffle.
In some embodiments, the thickness of the deposited plate is D, wherein 2mm ≦ D ≦ 8 mm.
In a second aspect, an embodiment of the present application provides a method for recovering an evaporation material, including:
s100, providing an evaporation source, wherein the evaporation source comprises an evaporation cavity for placing evaporation materials and at least one evaporation hole which is located on one side of the evaporation cavity in the first direction and communicated with the evaporation cavity.
S110, limiting assemblies are arranged on two sides of the evaporation source, each limiting assembly comprises a limiting plate which is arranged on two sides of the evaporation hole along the second direction, a blocking piece which is arranged between the limiting plate and the evaporation hole along the second direction, and a storage box which is arranged at one end, facing the evaporation source, of the blocking piece in the first direction.
And S120, acquiring preset condition information, wherein the preset condition information comprises time information and/or deposition amount information of the evaporation material on the blocking piece.
And S130, when the preset condition information reaches a threshold value, driving the blocking piece to enter the storage box along the first direction.
And S140, when the blocking piece is positioned in the storage box, the limiting plate is driven to move to the position corresponding to the blocking piece along the second direction.
According to the evaporation device and the recovery method of the evaporation material, the barrier is added on the basis of the traditional evaporation device, the barrier is arranged between the evaporation hole and the limiting plate, and the orthographic projection of the barrier on the limiting plate is at least partially overlapped with the first part of the limiting plate. So that at least part of the evaporation material can be deposited on the blocking piece, the deposition amount of the evaporation material on the limiting plate is reduced, the influence on the thickness and the uniformity of the evaporation film layer is reduced, and the yield of products is improved.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings needed to be used in the embodiments of the present application will be briefly described below, and for those skilled in the art, other drawings can be obtained according to the drawings without creative efforts.
Fig. 1 is a schematic structural diagram of an evaporation apparatus provided in an embodiment of the present application;
fig. 2 is a schematic structural diagram of another evaporation apparatus provided in an embodiment of the present application;
fig. 3 is a schematic structural diagram of an evaporation apparatus provided in an embodiment of the present application;
fig. 4 is a schematic structural diagram of an evaporation apparatus provided in an embodiment of the present application;
fig. 5 is a schematic structural diagram of an evaporation apparatus provided in an embodiment of the present application;
FIG. 6 is a flow chart of a method for recycling an evaporation material according to an embodiment of the present application;
fig. 7a to 7d are schematic process diagrams of a recycling method of an evaporation material according to an embodiment of the present disclosure.
Description of the labeling:
1. a vapor deposition source; 11. evaporating and plating the cavity; 12. evaporating and plating holes;
2. a limiting plate; 21. a first portion;
3. a blocking member; 31. depositing a hole; 32. a first blocking portion; 33. a second blocking portion; 34. a baffle plate; 35. depositing a plate;
4. a storage box; 41. an opening;
6. a heat dissipation mechanism;
7. a slider;
8. an accommodating cavity; 81. a first through hole;
A. presetting an evaporation area;
x, a first direction; y, second direction.
Detailed Description
Features and exemplary embodiments of various aspects of the present application will be described in detail below, and in order to make objects, technical solutions and advantages of the present application more apparent, the present application will be further described in detail below with reference to the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described herein are intended to be illustrative only and are not intended to be limiting. It will be apparent to one skilled in the art that the present application may be practiced without some of these specific details. The following description of the embodiments is merely intended to provide a better understanding of the present application by illustrating examples thereof.
It is noted that, herein, relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising … …" does not exclude the presence of other identical elements in a process, method, article, or apparatus that comprises the element.
The traditional evaporation process uses an evaporation source to perform evaporation treatment on the display panel, and limiting plates are further arranged on two sides of the evaporation source and used for controlling the evaporation range of the evaporation source. In the coating by vaporization in-process, coating by vaporization source spun coating by vaporization material can last the deposit on the restriction board, and after a period of time, the material accumulation on the restriction board reaches certain thickness, can influence the size of coating by vaporization scope, and then influences the machining precision, leads to the yields to reduce. More serious still can appear droing because of the coating by vaporization material and lead to the coating by vaporization source stifled hole, production is compelled to stop, needs to open the chamber and changes relevant inside lining, causes the consumption of manpower and materials.
In order to solve the above problem, an embodiment of the present application provides a vapor deposition device, please refer to fig. 1, including a vapor deposition source 1, a limiting plate 2 and a blocking member 3, where the vapor deposition source 1 includes a vapor deposition chamber 11 for placing a vapor deposition material and at least one vapor deposition hole 12 located on one side of the vapor deposition chamber 11 in the first direction X and communicated with the vapor deposition chamber 11.
The number of the limiting plates 2 is at least two, the limiting plates are respectively arranged on two sides of the evaporation hole 12 in the second direction Y, and the first direction X is intersected with the second direction Y; the barrier 3 is located on a side of the limiting plate 2 close to the evaporation hole 12, and a side of the barrier 3 facing the evaporation hole 12 has a plurality of deposition holes 31 concavely formed in the second direction Y.
The evaporation material is expanded outwards through the evaporation holes 12 to form a preset evaporation area A, the limiting plate 2 comprises a first portion 21 located in the preset evaporation area A, and the front projection of the barrier member 3 on the limiting plate 2 at least partially overlaps with the first portion 21, so that at least part of the evaporation material is deposited on the barrier member 3.
The evaporation material is stored in the evaporation chamber 11 and is sprayed out through the evaporation holes 12, and the evaporation material sprayed out from the evaporation holes 12 forms a conical preset evaporation area a, where the area indicated by the dotted line in the figure is the range of the preset evaporation area a. In order to limit the evaporation position of the evaporation material on the display panel, limiting plates 2 are generally disposed on two sides of the evaporation hole 12, the limiting plates 2 are plate-shaped structures extending along the first direction X and arranged side by side along the second direction Y, and the first portion 21 of the limiting plate 2 is located in the preset evaporation area a and used for controlling the evaporation area. Optionally, the first direction X is arranged perpendicular to the second direction Y.
This application embodiment still is provided with between limiting plate 2 and evaporation coating hole 12 and blocks 3, it all extends along first direction X to block 3 and limiting plate 2, and block 3 and be provided with a plurality of deposition holes 31 towards one side of evaporation coating hole 12, be used for depositing evaporation coating material, it overlaps with first part 21 at least partly to block 3 orthographic projection on limiting plate 2, in the evaporation coating process, at least partial evaporation coating material can be blockked by blocking 3, thereby can't deposit on limiting plate 2, and then can avoid the excessive deposit of evaporation coating material on limiting plate 2, improve the product yields.
Optionally, stopping piece 3 can be dismantled the connection compared with the coating by vaporization device, and initial time stops 3 and is located between limiting plate 2 and coating by vaporization hole 12, and at the earlier stage of coating by vaporization process, stopping piece 3 can replace limiting plate 2 to play the effect of control coating by vaporization scope, can also deposit some coating by vaporization material simultaneously. When the deposition amount of the vapor deposition material on the barrier member 3 reaches a certain value, the barrier member 3 is removed from the vapor deposition device, and the limiting plate 2 controls the vapor deposition range. The specific connection mode between the barrier 3 and the deposition apparatus is determined according to the actual deposition condition, and the embodiment of the present application is not limited to a large extent.
The embodiment of the application adds the barrier 3 on the basis of the traditional evaporation device, the barrier 3 is arranged between the evaporation hole 12 and the limiting plate 2, and the orthographic projection of the barrier 3 on the limiting plate 2 at least partially overlaps with the first part 21 of the limiting plate 2. So that at least part of the evaporation materials can be deposited on the blocking piece 3, the deposition amount of the evaporation materials on the limiting plate 2 is reduced, the influence on the thickness and the uniformity of the evaporation film layer is reduced, and the yield of products is improved.
In some embodiments, as shown in fig. 1, the evaporation apparatus further includes a storage box 4, the storage box 4 is disposed at one end of the blocking member 3 facing the evaporation source 1 in the first direction X, the storage box 4 is provided with an opening 41 facing the blocking member 3, and the blocking member 3 is movably disposed at the opening 41 in the first direction X, so that the blocking member 3 can enter or leave the storage box 4 in the first direction X.
The number of the storage boxes 4 corresponds to the number of the blocking members 3, and the storage boxes 4 are respectively arranged at two sides of the evaporation chamber 11 along the second direction Y, and a storage space capable of at least partially accommodating the blocking members 3 is arranged in each storage box 4, so that the blocking members 3 can enter or leave the storage box 4 through the openings 41. In an early stage of the evaporation process, the barrier 3 is located outside the storage box 4 and the orthographic projection of the barrier 3 on the limiting plate 2 at least partially overlaps the first portion 21, and the barrier 3 functions to deposit the evaporation material instead of the limiting plate 2. After the deposition amount of the evaporation material on the blocking member 3 reaches a certain value, the blocking member 3 can be driven to enter the storage box 4 through the opening 41, so that the orthographic projection of the blocking member 3 on the limiting plate 2 is not overlapped with the first portion 21, that is, the blocking member 3 leaves the preset evaporation area a. Alternatively, the material recovery and cleaning process may be performed on the blocking member 3 while the evaporation process is performed, and after the cleaning is completed, the blocking member 3 may be used again to block the evaporation material.
This application embodiment places and stops piece 3 through storing box 4, after evaporation coating material reaches certain numerical value at the deposit volume that stops piece 3, can drive and stop piece 3 and enter into to storing box 4 in to in time retrieving and the clearance processing the evaporation coating material that stops on 3, improve evaporation coating material utilization ratio.
Referring to fig. 2, in some embodiments, the evaporation apparatus further includes a heat dissipation mechanism 6 disposed on at least one side of the storage box 4, and the heat dissipation mechanism 6 is used for dissipating heat from the storage box 4.
Near the evaporation coating in-process evaporation coating chamber 11 is in higher temperature usually, store box 4 and be located one side of evaporation coating chamber 11 on second direction Y, consequently under the influence of evaporation coating chamber 11, store box 4 and form higher temperature condition easily, it enters into to storing box 4 back to block 3, the evaporation coating material that is located to block 3 is heated and can takes place to melt, be unfavorable for follow-up recovery and cleaning process, consequently, this application embodiment is provided with heat dissipation mechanism 6 in at least one side of storing box 4, can reduce the temperature of storing box 4, avoid the evaporation coating material that stores in the box 4 to be heated and melt.
In some embodiments, the heat dissipation mechanism 6 is a water-cooling mechanism, and the heat dissipation mechanism 6 is isolated from the storage box 4. For the air-cooled cooling, the water-cooled cooling can have faster, and this application embodiment guarantees the cooling efficiency who stores box 4 through water-cooled cooling mechanism, avoids appearing the phenomenon that evaporation coating material is heated and melts, improves whole reliability.
In some embodiments, the heat dissipation mechanism 6 is disposed around the storage box 4, the storage box 4 itself is a hollow structure, and the heat dissipation mechanism 6 is disposed around the storage box 4 according to the shape of the storage box 4, so that the storage box 4 can dissipate heat uniformly, and local overheating or overcooling is avoided.
Referring to fig. 3, in some embodiments, the evaporation apparatus further includes a sliding member 7 disposed on a side of the opening 41 facing the blocking member 3, and the sliding member 7 is movably disposed along the second direction Y to cover the opening 41.
The slider 7 has a plate-like structure and extends in the second direction Y, and is configured to prevent the vapor deposition material from entering the storage case 4 through the opening 41. Specifically, the blocking member 3 in the embodiment of the present application can completely enter the storage box 4 through the opening 41, and the moving process and the evaporation process of the blocking member 3 are performed synchronously, and after the blocking member 3 enters the storage box 4, at least a part of the evaporation material falls to the position of the opening 41, which is likely to cause blockage, and affects the protrusion of the blocking member 3. In a more serious case, the vapor deposition material may enter the storage case 4 through the opening 41, which may affect the normal use of the storage case 4.
Therefore, in the embodiment of the present invention, the slider 7 is disposed near the opening 41, and after the blocking member 3 enters the storage box 4, the slider 7 moves to block the position of the opening 41, thereby preventing the evaporation material from entering the storage box 4, and improving the reliability of use.
As shown in fig. 3, in some embodiments, the evaporation apparatus further includes an accommodating cavity 8, the storage box 4 is disposed in the accommodating cavity 8, the accommodating cavity 8 includes a first through hole 81, the blocking member 3 extends into the storage box 4 through the first through hole 81, and the sliding member 7 is movably disposed in the first through hole 81 along the second direction Y, so that the sliding member 7 can cover the first through hole 81.
This application embodiment has increased and has held cavity 8, stores box 4 and is located and holds cavity 8, holds cavity 8 and has played the guard action to storing box 4, avoids the direct and storage box 4 outside contact of coating by vaporization material, and the first through-hole 81 that holds cavity 8 and the opening 41 intercommunication setting of storing box 4 stop piece 3 and at first enter into to opening 41 place through first through-hole 81, then through opening 41 entering storage box 4 inside. Alternatively, the heat dissipation mechanism 6 may be disposed in the accommodating cavity 8 and isolated from the storage box 4.
In some embodiments, the limiting plate 2 is connected to the slider 7 and moves synchronously with the slider 7.
In the vapor deposition device, the limiting plate 2 is used to control the vapor deposition range, and it is understood that the height of the limiting plate 2 is increased as the limiting plate 2 is farther from the vapor deposition hole 12. Therefore, the limiting plate 2 in the embodiment of the present application can move synchronously with the slider 7, and after the blocking member 3 enters the storage box 4, the limiting plate 2 can move along with the slider 7 and gradually approach the evaporation holes 12, and the control of the evaporation range is realized through the limiting plate 2. This design can reduce the length dimension of the limiting plate 2 in the first direction X to some extent, reducing the production cost.
In some embodiments, the limiting plate 2 and the blocking member 3 have the same length in the first direction X. In the embodiment of the present application, after the blocking member 3 enters the storage box 4, the limiting plate 2 can be moved above the position of the blocking member 3 by the slider 7, so that the evaporation material can be further prevented from entering the storage box 4, and meanwhile, the moving distance of the limiting plate 2 in the first direction X can be adjusted according to the position of the blocking member 3, thereby improving the moving accuracy.
Referring to fig. 4, in some embodiments, the blocking member 3 includes a first blocking portion 32 extending along the first direction X and a second blocking portion 33 disposed on a side of the first blocking portion 32 facing away from the limiting plate 2, and the second blocking portion 33 is at least partially located in the predetermined evaporation area a and extends along the second direction Y.
The first barrier 32 extends along the first direction X and the deposition hole 31 is disposed on the first barrier 32, and is mainly used for depositing an evaporation material instead of the limiting plate 2; the second barrier section 33 extends in the second direction Y, and is mainly used to limit the evaporation range. The second blocking portion 33 is disposed on a side of the first blocking portion 32 away from the limiting plate 2, that is, on a side of the first blocking portion 32 facing the evaporation hole 12. In addition, the first barrier section 32 may also function to limit the evaporation range in addition to depositing the evaporation material, and in the embodiment of the present application, the length of the first barrier section 32 in the first direction X and the length of the second barrier section 33 in the second direction Y are controlled to further control the evaporation range and improve the evaporation accuracy.
In some embodiments, the length of the second blocking portion 33 in the second direction Y is adjustably set. It can be understood that, the larger the length of the second blocking portion 33 in the second direction Y is, the smaller the evaporation range of the evaporation source 1 is, so that the second blocking portion 33 is set to be length-adjustable in the embodiment of the present application, and by changing the length of the second blocking portion 33 in the second direction Y, the adjustment of the evaporation range is realized, and the actual production needs are met. Alternatively, the second stopper 33 may be movable in the second direction Y relative to the first stopper 32.
Referring to fig. 5, in some embodiments, the blocking member 3 includes a baffle 34 and a deposition plate 35 disposed on a side of the baffle 34 close to the deposition hole 12, and the deposition hole 31 is disposed on the deposition plate 35 and penetrates through the deposition plate 35 along the second direction Y. Baffle 34 and deposition plate 35 all extend the setting along first direction X, and evaporation plating material passes through deposition hole 31 deposit on deposition plate 35, and in deposition process, baffle 34 plays and blocks the effect for block more evaporation plating material in deposition hole 31, the improvement blocks the effect.
In some embodiments, the deposition plate 35 is removably attached to the baffle 34. The deposition plate 35 can be detached from the baffle 34 for subsequent recovery and cleaning of the evaporation material, which can reduce the difficulty of material recovery and improve the recovery efficiency.
In some embodiments, the deposition plate 35 has a thickness D, wherein 2mm ≦ D ≦ 8 mm. The thickness of the deposition plate 35 refers to the dimension of the deposition plate 35 in the second direction Y, and when the deposition plate 35 is used, it is necessary to ensure that the deposition hole 31 has a certain length in the second direction Y so that the evaporation material can be deposited in the deposition hole 31; secondly, the thickness of the deposition plate 35 in the second direction Y cannot be too thick, which is not beneficial to the movement of the subsequent barrier 3, so that the thickness of the deposition plate 35 is limited to 2 mm-8 mm in the embodiment of the present application, so as to meet the actual use requirement.
In a second aspect, referring to fig. 6 and 7, an embodiment of the present application provides a method for recovering an evaporation material, including:
s100, providing an evaporation source, wherein the evaporation source comprises an evaporation cavity for preventing evaporation materials and at least one evaporation hole which is located on one side of the evaporation cavity in the first direction and communicated with the evaporation cavity.
S110, limiting assemblies are arranged on two sides of the evaporation source, each limiting assembly comprises a limiting plate arranged on two sides of each evaporation hole along the second direction, a blocking piece located between the limiting plate and the evaporation hole along the second direction, and a storage box arranged on the blocking piece and facing one side of the evaporation source in the first direction.
And S120, acquiring preset condition information, wherein the preset condition information comprises time information and/or deposition amount information of the evaporation material on the blocking piece.
And S130, when the preset condition information reaches a threshold value, driving the blocking piece to enter the storage box along the first direction.
And S140, when the blocking piece is positioned in the storage box, the limiting plate is driven to move to the position corresponding to the blocking piece along the second direction Y.
Referring to fig. 7a, the evaporation source 1 in step S100 is the evaporation source 1 in the foregoing embodiments, which is not described again in this embodiment.
Referring to fig. 7b, the limiting component in step S110 is used to limit the evaporation range of the evaporation source 1 on the display panel, wherein the blocking member 3 is located between the evaporation holes 12 and the limiting plate 2 along the second direction Y, and during the evaporation process, the evaporation material in the evaporation chamber 11 is continuously deposited on the blocking member 3 through the evaporation holes 12.
In step S120, the preset condition information may be time information or deposition amount information, specifically, the deposition apparatus may control the deposition time of the deposition material on the barrier by a timing system, or may determine the deposition amount of the deposition material on the barrier by means of an element such as a sensor, and determine whether to perform the next operation according to the magnitude of the deposition amount.
Referring to fig. 7c, in step S130, when the preset condition reaches the threshold value, that is, the deposition process reaches the preset time, or the deposition amount on the blocking member 3 reaches a certain value, the blocking member 3 enters the storage box 4, and the driving manner may be through an electronic device such as a driving motor or a lifting cylinder. It should be noted that, during the process of gradually entering the storage box 4, the evaporation process is still performed synchronously, and at this time, the limiting plate 2 and at least a part of the blocking member 3 simultaneously play a role in limiting the evaporation range.
Referring to fig. 7d, in step S140, after the blocking member 3 enters the storage box 4, the limiting plate 2 moves to the position of the blocking member 3 along the second direction Y, and the blocking member 3 located in the storage box 4 can be used for collecting or cleaning the evaporation material for recycling.
Although the embodiments disclosed in the present application are described above, the descriptions are only for the convenience of understanding the present application and are not intended to limit the present invention. It will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the disclosure as defined by the appended claims.
As described above, only the specific embodiments of the present application are provided, and it can be clearly understood by those skilled in the art that, for convenience and brevity of description, the corresponding processes in the foregoing method embodiments may be referred to for replacement of the other connection manners described above, and are not described herein again. It should be understood that the scope of the present application is not limited thereto, and any person skilled in the art can easily conceive various equivalent modifications or substitutions within the technical scope of the present application, and these modifications or substitutions should be covered within the scope of the present application.
Claims (10)
1. An evaporation apparatus, comprising:
the evaporation source comprises an evaporation cavity for placing evaporation materials and at least one evaporation hole which is positioned on one side of the evaporation cavity in the first direction and is communicated with the evaporation cavity;
the limiting plates are respectively arranged on two sides of the evaporation hole in a second direction, and the first direction is intersected with the second direction;
a blocking member located on a side of the limiting plate close to the evaporation hole, the blocking member having a plurality of deposition holes formed to be concave in the second direction on a side facing the evaporation hole;
the evaporation material is expanded outwards through the evaporation holes to form a preset evaporation area, the limiting plate comprises a first part located in the preset evaporation area, and the barrier is at least partially overlapped with the first part in the orthographic projection of the limiting plate, so that at least part of the evaporation material is deposited on the barrier.
2. The vapor deposition device according to claim 1, further comprising:
the storage box is arranged at one end, facing the evaporation source, of the blocking piece in the first direction, and is provided with an opening facing the blocking piece, and the blocking piece is movably arranged in the opening along the first direction so as to enable the blocking piece to enter or leave the storage box along the first direction.
3. The evaporation device according to claim 2, further comprising a heat dissipation mechanism disposed on at least one side of the storage box, wherein the heat dissipation mechanism is configured to dissipate heat from the storage box;
preferably, the heat dissipation mechanism is a water-cooling mechanism, and the heat dissipation mechanism is arranged in a manner of being separated from the storage box;
preferably, the heat dissipation mechanism is disposed around the periphery of the storage box.
4. The vapor deposition device according to claim 2, further comprising a slider provided on a side of the opening facing the blocking member, the slider being movably provided in the second direction so as to be capable of covering the opening.
Preferably, the storage box is arranged in the accommodating cavity, the accommodating cavity comprises a first through hole, the blocking piece extends into the storage box through the first through hole, and the sliding piece is movably arranged in the first through hole along the second direction, so that the sliding piece can cover the first through hole.
5. The vapor deposition device according to claim 4, wherein the limiting plate is connected to the slider and moves in synchronization with the slider;
optionally, the limiting plate and the blocking member have the same length in the first direction.
6. The vapor deposition device according to claim 1, wherein the blocking member includes a first blocking portion extending in a first direction, and a second blocking portion provided on a side of the first blocking portion facing away from the limiting plate, the second blocking portion being at least partially located in the predetermined evaporation region and extending in the second direction.
7. The vapor deposition device according to claim 6, wherein the second barrier section is provided so as to be adjustable in length in the second direction.
8. The evaporation device according to claim 1, wherein the barrier comprises a baffle plate and a deposition plate located on one side of the baffle plate close to the evaporation hole, and the deposition hole is provided in the deposition plate and penetrates through the deposition plate along the second direction;
optionally, the deposition plate is removably attached to the baffle.
9. The evaporation device according to claim 8, wherein the thickness of the deposition plate is D, and D is greater than or equal to 2mm and less than or equal to 8 mm.
10. A method for recovering an evaporation material, comprising:
providing an evaporation source, wherein the evaporation source comprises an evaporation cavity for placing evaporation materials and at least one evaporation hole which is positioned on one side of the evaporation cavity in the first direction and is communicated with the evaporation cavity;
limiting assemblies are arranged on two sides of the evaporation source, each limiting assembly comprises a limiting plate which is arranged on two sides of the evaporation hole along a second direction, a blocking piece which is arranged between the limiting plate and the evaporation hole along the second direction, and a storage box which is arranged at one end, facing the evaporation source, of the blocking piece in the first direction;
acquiring preset condition information, wherein the preset condition information comprises time information and/or deposition amount information of the evaporation material on the blocking piece;
when the preset condition information reaches a threshold value, driving the blocking piece to enter the storage box along the first direction;
when the blocking piece is positioned in the storage box, the limiting plate is driven to move to a position corresponding to the blocking piece along the second direction.
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| CN114481035B (en) | 2023-11-21 |
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