CN114411110A - Coating apparatus and control method of coating apparatus - Google Patents

Coating apparatus and control method of coating apparatus Download PDF

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Publication number
CN114411110A
CN114411110A CN202210080411.0A CN202210080411A CN114411110A CN 114411110 A CN114411110 A CN 114411110A CN 202210080411 A CN202210080411 A CN 202210080411A CN 114411110 A CN114411110 A CN 114411110A
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China
Prior art keywords
negative pressure
air
plating
pumping
mass spectrometry
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CN202210080411.0A
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Chinese (zh)
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CN114411110B (en
Inventor
王鹏兵
渠欣
马辉
聂平岩
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Suzhou Zhongke Keyi Technology Development Co ltd
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Suzhou Zhongke Keyi Technology Development Co ltd
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/52Means for observation of the coating process
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10Energy storage using batteries

Abstract

The embodiment of the specification provides a coating device, which is provided with a negative pressure cavity, a first air extraction device for providing negative pressure for the negative pressure cavity, and a mass spectrum detection device, wherein the first air extraction device can provide negative pressure for the mass spectrum detection device. The negative pressure cavity of the coating equipment and the mass spectrum detection device share the first air extraction equipment, so that the effects of saving equipment cost and reducing operation steps are achieved, and the purpose of conveniently detecting the sealing performance of the coating equipment is achieved.

Description

Coating apparatus and control method of coating apparatus
Technical Field
The invention relates to the field of analytical instrument equipment, in particular to coating equipment and a control method of the coating equipment.
Background
The film coating equipment mainly refers to equipment which needs to coat a substrate under higher negative pressure. In operation, the substrate and target material need to be placed in a negative pressure chamber. Because the coating equipment needs a higher negative pressure environment, higher requirements are put on the sealing performance of the negative pressure cavity.
After the coating equipment is used for a period of time, workers need to perform leak detection on the negative pressure cavity of the coating equipment and check whether the negative pressure cavity has a gap. During leak detection, a leak detection port of the leak detector is connected to the air outlet of the coating equipment, and whether the signal value of the mass spectrum detection device changes or not is checked. The prior art has high cost and complicated steps.
Disclosure of Invention
In view of the above, an object of the present specification is to provide a plating apparatus and a control method of the plating apparatus, which are convenient for inspection.
In order to achieve the above object, the present specification provides a coating apparatus, where the coating apparatus has a negative pressure cavity, the coating apparatus includes a first air-extracting device for providing a negative pressure to the negative pressure cavity, and the coating apparatus further includes a mass spectrometry detection device, and the first air-extracting device can provide a negative pressure to the mass spectrometry detection device.
The present specification also provides a method for controlling a plating apparatus, the method comprising: starting first air extraction equipment to provide negative pressure for a negative pressure cavity of the coating equipment and a mass spectrum detection device; starting a second air extraction device under the condition that the pressure of the negative pressure cavity reaches a first threshold value; wherein the second pumping device provides negative pressure to the mass spectrometry detection apparatus; the power of the first air pumping device is less than that of the second air pumping device; and starting the mass spectrometry detection device when the pressure of the mass spectrometry detection device reaches a second threshold value.
The negative pressure cavity of the coating equipment and the mass spectrum detection device share the first air extraction equipment, so that the effects of saving equipment cost and reducing operation steps are achieved, and the purpose of conveniently detecting the sealing performance of the coating equipment is achieved.
Drawings
Fig. 1 is a schematic view of a coating apparatus provided by an embodiment of the present disclosure.
Fig. 2 is a schematic view of a coating apparatus provided by an embodiment of the present disclosure.
Fig. 3 is a schematic view of a coating apparatus provided by an embodiment of the present disclosure.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Please refer to fig. 1, fig. 2 and fig. 3. The embodiment of the specification provides a coating device 200, the coating device 200 is provided with a negative pressure cavity 204, and the coating device 200 comprises a first air suction device 217 for providing negative pressure for the negative pressure cavity 204; the coating device 200 further comprises a mass spectrometric detection apparatus 220, and the first pumping device 217 can provide negative pressure to the mass spectrometric detection apparatus 220.
The negative pressure chamber 204 can be a negative pressure working space for placing a coating workpiece in the coating device 200. The coating workpiece can comprise a substrate and a target material, wherein the substrate can be a workpiece needing coating, and the target material can be a material of a film. During coating, the substrate and the target are placed in the negative pressure cavity 204, and the target is heated to evaporate surface components in the form of atomic groups or ions, and the atomic groups or ions can be deposited on the surface of the substrate. In order to better coat the substrate, a gas-lean environment is required, so that higher requirements are made on the sealing performance of the negative pressure cavity 204 of the coating device 200.
The plating device 200 needs to be leak tested after a period of use of the plating device 200. During leak detection, the mass spectrometry detection device 220 needs a negative pressure environment, and the mass spectrometry detection device 220 at least comprises an ion source 114, an amplifier 112 and a built-in magnetic field 110. The built-in magnetic field 110 may be generated by either a magnet and magnet adjustment assembly or an electric field having a variable voltage. Under the action of the lorentz force, ions emitted from the ion source 114 are deflected within the built-in magnetic field 110 to form a circular arc orbit. The built-in magnetic field 110 can be detected by changing the force to change the deflected trajectory of ions entering the built-in magnetic field 110 so that the ions reach the amplifier 112. In order to obtain more accurate detection results, the mass spectrometric detection apparatus 220 requires a suction device to provide negative pressure.
The first pumping device 217 may be a power device that uses a rotor rotating at high speed to accelerate gas molecules, thereby compressing and pumping air away. The first air extractor device 217 may be a stand-alone power device or a combined power device group. For example, the first gas-withdrawal device 217 may be a combination gas-withdrawal device of the mechanical pump 216 and the roots pump 214.
Because the mass spectrum detection device 220 and the negative pressure cavity 204 both need a negative pressure environment, and the mass spectrum detection device 220 is used for detecting the tightness of the negative pressure cavity 204 and the connecting pipeline thereof, the first air extraction equipment 217 is connected with the negative pressure cavity 204 and the mass spectrum detection device 220, so that the equipment volume can be reduced, and the operation of staff is convenient.
In some embodiments, the coating apparatus 200 further comprises a second pumping device 222 for providing a negative pressure to the mass spectrometric detection device 220, wherein the second pumping device 222 is powered at a higher power than the first pumping device 217.
The second gas-withdrawal device 222 may be a power device having a higher power than the first gas-withdrawal device 217. In the case where the first air-extracting device 217 has insufficient air-extracting capacity, the second air-extracting device 222 may be added to enhance the air-extracting capacity. For example, the second pumping device 222 may be a molecular pump.
In some embodiments, the second pumping arrangement 222 is activated when the pressure at the pumping port of the second pumping arrangement 222 reaches the first threshold.
The first threshold may be a threshold of the actuation pressure of the second pumping device 222. In some cases, the second pumping arrangement 222 requires a start-up pressure that is less than atmospheric pressure and therefore requires a connection to the backing pump. For example, the second pumping device 222 may be a molecular pump and the first pumping device 217 may be a mechanical pump, the molecular pump having a higher power than the mechanical pump, and the mechanical pump may act as a backing pump for the molecular pump.
In order to obtain a more accurate detection result, the mass spectrometry detection apparatus 220 needs a negative pressure environment far lower than the atmospheric pressure, and in the case that the first pumping device 217 cannot satisfy the negative pressure condition, the second pumping device 222 is added, so that the environment in the mass spectrometry detection apparatus 220 can be maintained in a relatively stable negative pressure range.
The second threshold may be an activation threshold of the mass spectrometry detection device 220. In order to protect the apparatus and obtain more accurate results, the mass spectrometric detection device 220 needs a more stable negative pressure environment during operation. And when the pressure value of the mass spectrometry detection device 220 reaches the second threshold value, starting the mass spectrometry detection device 220.
In some cases, the filming device 200 further includes a third air-extracting device 208 for providing negative pressure to the negative pressure chamber 204, and the third air-extracting device 208 has higher power than the first air-extracting device 217.
The third gas-withdrawal device 208 may be a power device with higher power than the first gas-withdrawal device 217. In the case of insufficient air-exhaust capacity of the first air-exhaust device 217, the third air-exhaust device 208 can be added to enhance the air-exhaust capacity of the negative pressure chamber 204. For example, the third pumping device 208 may be a molecular pump.
In some embodiments, the third pumping arrangement 208 is activated when the pressure at the pumping port of the third pumping arrangement 208 reaches the third threshold.
The third threshold may be a threshold of the actuation pressure of the third pumping device 208. In some cases, the third pumping arrangement 208 requires a start-up pressure that is less than atmospheric pressure and therefore requires a connection to a backing pump. For example, the third pumping device 208 may be a molecular pump, and the first pumping device 217 may be a mechanical pump, the molecular pump having a higher power than the mechanical pump, and the mechanical pump may act as a backing pump for the molecular pump.
In order to obtain better coating effect, the negative pressure chamber 204 needs to select a negative pressure environment lower than the atmospheric pressure, and in the case that the first air suction device 217 cannot meet the negative pressure condition, the third air suction device 208 is added to maintain the environment in the negative pressure chamber 204 within a relatively stable negative pressure range.
In some embodiments, the filming device 200 further includes a leak detection valve 226, the leak detection valve 226 being disposed between the first air-extracting device 217 and the second air-extracting device 222; with the leak detection valve 226 open, the first pumping device 217 can provide a negative pressure to the mass detection unit 220.
During operation of the primary coating apparatus 200, the operator can determine whether a leak-check control valve is required. In the case of leak detection, a worker can open the leak detection valve 226 and other leak detection equipment to perform leak detection; in the case where leak detection is not required, the worker closes the leak detection valve 226 and works only with the plating apparatus 200.
The leak detection valve 226 can control whether the mass spectrum detection device 220 is started or not, and workers can flexibly select the leak detection valve according to needs, so that energy waste and loss are reduced.
In some embodiments, the coating apparatus includes a housing 104 that houses the mass spectrometry detection device 220 and the second gas-withdrawal apparatus 222.
The chassis 104 includes: a housing 104 having a receiving cavity; a second pumping device 222 housed within the enclosure 104, the second pumping device 222 being operable to provide a negative pressure to the mass spectrometry detection apparatus 220; the mass spectrum detection device 220 is accommodated in the chassis 104, and the mass spectrum detection device 220 can be used for detecting the leakage of a negative pressure cavity of the coating machine.
The chassis 104 may be a housing having a space to house internal components and may also provide support for internal component structures. Some components are placed in the case 104, so that the equipment volume can be reduced through reasonable arrangement, and transportation and assembly are facilitated.
The case 104 and the control case 105 of the film coating equipment can be put into the cabinet 100 together, and the film coating equipment is flexible to use, small in size and convenient to store, assemble and transport. For example, a 4U standard chassis may be used.
In some embodiments, the enclosure 104 further includes at least one of the second pumping device control 114, the leak detection valve 226, the pressure gauge 224, the leak hole 108, the power socket 106, the communication interface 103, the fan assembly, and the circuit board 116.
In some embodiments, the second air extraction device 222 can be connected to a negative pressure connection tube 102 that extends at least partially out of the enclosure 104; an opening through which the negative pressure connection pipe 102 passes is provided in a top wall of the housing 104 along a gravity direction.
The negative pressure connection pipe 102 may be a connection part of the chassis 104 to the first air-extracting device 217, or may be a connection part having a capability of bearing negative pressure.
The control means 114 of the second suction device can be a control means that controls the second suction device 222 to be turned on or off. The pressure gauge 224 may be a gauge for measuring the pressure at the front stage of the second pumping device 222, and when the pressure indicated by the pressure gauge 224 reaches the starting pressure of the second pumping device 222, a worker may start the second pumping device 222.
The leak 108 may be an instrument with a fixed leak rate. Under the condition that the mass spectrometric detection device 220 cannot normally detect, a worker can use the leak 108 to determine the working condition of the mass spectrometric detection device 220. For example, the staff thinks that the coating equipment has a leak 108 but the mass spectrometry detection device 220 shows that the coating equipment has good sealing performance, and the staff can open the leak 108, spray or spray helium gas on the leak 108, and observe the display change of the mass spectrometry detection device 220.
The power outlet 106 may be the connector that powers the electronics within the enclosure 104; the communication interface 103 may be an interface for connecting the chassis 104 with other devices, and the communication interface 103 may implement data exchange with other devices. For example, the communication interface 103 may be an external control IO serial port and 232 communication interface 103.
The circuit board 116 may be a substrate that includes the wires and components required by the chassis 104, with the wires and components of the internal components within the chassis 104 being integrated on the circuit board 116. Along the direction of gravity, the circuit board 116 is located at the lower portion of the chassis 104. The heat generated by the circuit board 116 during operation can be dissipated upwards to protect the circuit board 116 and prolong the service life of the machine.
The fan set includes a first fan 113, a second fan 112, and a third fan 111. The fan set may be a device that is electrically driven to generate airflow in the chassis 104, and the fan set rotates to convert mechanical energy into wind energy to dissipate heat of the chassis 104, thereby reducing damage to the device caused by temperature generated during operation of the device. Along the gravity direction, the first fan 113 can drive air to flow into the inside of the chassis 104 from the lower side of the chassis 104, take away part of the heat of the circuit board 116, the second air-extracting device 222 and the mass spectrometry detection device 220, and finally flow out from the upper side of the chassis 104 under the driving of the third fan 111.
In some embodiments, the first fan 113 drives air into the first flow channel and into the second flow channel to remove a portion of the heat generated by the circuit board 116 and the mass spectrometry detection device 220 during operation.
In some embodiments, the mass spectrometer leak detector may be a helium mass spectrometer leak detector or a hydrogen mass spectrometer leak detector. Specifically, when the sprayed or sprayed gas is helium and the mass spectrometer detection device 220 is a helium mass spectrometer leak detector, the mass spectrometer leak detector is a helium mass spectrometer leak detector, and when the sprayed or sprayed gas is hydrogen and the mass spectrometer detection device 220 is a hydrogen mass spectrometer leak detector, the mass spectrometer leak detector is a hydrogen mass spectrometer leak detector.
The present specification provides a method of controlling a plating apparatus 200. The coating device 200 is mainly composed of the negative pressure cavity 204, the mass spectrometry detection device 220 and the first air-extracting device 217.
During one operation of the filming device 200, a worker can plan to leak the filming device 200. Firstly, the first air exhaust device 217 is started, the first air exhaust device 217 consists of the mechanical pump 216 and the roots pump 214, the by-pass valve 210 and the backing valve 210 are opened, the third air exhaust device 208 is started after the pressure displayed by the first pressure measuring meter 212 is lower than the starting pressure of the third air exhaust device 208, and the third air exhaust device 208 is a molecular pump; the mechanical pump 216 and the roots pump 214 provide a backing pressure to the third pumping arrangement 208.
After the pressure indicated by the second pressure gauge 202 is less than the operating pressure of the third pumping device 208, the bypass valve 210 is closed and the high negative pressure valve 206 is opened. And after the pressure displayed by the second pressure measuring meter 202 reaches the target negative pressure, performing film coating work in the negative pressure cavity 204.
After the coating operation is completed, the leak detection valve 226 is opened, and the pressure displayed by the third pressure measuring meter 224 is observed; the third pressure gauge 224 may be a gauge for measuring the pressure at the front stage of the second pumping device 222.
The third pressure gauge 224 indicates that the pressure reaches the first threshold, i.e. the second pumping device 222 is started after the pressure reaches the starting pressure of the second pumping device 222; after the pressure displayed by the third pressure measuring gauge 224 reaches the second threshold, the mass spectrometry detection device 220 is activated. The second pumping device 222 may be a molecular pump; the mechanical pump 216 and the roots pump 214 provide a backing pressure to the second pumping arrangement 222.
After the pressure displayed by the third pressure measuring meter 224 reaches the target negative pressure, helium is sprayed or sprinkled on all the joints of the coating equipment 200, and the leak rate indication change condition of the mass spectrometry detection device 220 is observed. The target negative pressure may be a relatively stable pressure at which mass spectrometric detection may be performed.
In some embodiments, the pressure values displayed by the first pressure measurement gauge 212 and the third pressure measurement gauge 224 meet the leak detection requirement, the third pumping device 208 may be closed, the bypass pumping valve 210 and the backing valve 210 may be opened, the high negative pressure valve 206 may be closed, helium may be sprayed or sprinkled on all the connections of the coating device 200, and the leak rate indication change of the mass spectrometer 220 may be observed.
In some cases, the sealing performance of the coating apparatus 200 is good, and the display interface of the coating apparatus 200 has no signal value. Turning off the mass detection means 220 and the second pumping device 222; the wireline leak-detection valve 226, the backing valve 210, the roots pump 214, and the mechanical pump 216 are then sequentially closed. And after the leak detection work of the coating equipment 200 is finished, the power supply is turned off.
In some cases, the plating device 200 develops a gap. Helium is sprayed or sprinkled at the joint of the coating equipment 200, and enters the negative pressure cavity 204 through a gap. Because helium has a small relative molecular mass and a stable mass, a part of helium entering the negative pressure cavity 204 can enter the mass spectrometry detection device 220 to be detected by overcoming the force of the impeller of the air pumping equipment.
Helium gas enters the mass spectrometer 220, electrons emitted from a filament in the ion source 114 and entering gas collide with each other to ionize the helium gas into helium positive ions, and the helium positive ions enter the built-in magnetic field 110 and then deflect under the action of lorentz force to form an arc-shaped track and finally reach the amplifier 112 to be detected. The staff sees on the display interface of mass spectrometry detection device 220 that the signal value has appeared, knows that the position of spraying or spraying helium appears the gap promptly, needs to handle. The worker does not need to walk around, and the leak detection work can be completed in front of the chassis cabinet 200.
In some embodiments, the leak detection valve 226, the backing valve 210, and the bypass valve 210 may be solenoid valves, controlled by the filming device 200.
In some embodiments, the first pressure gauge 212, the second pressure gauge 202, and the third pressure gauge 224 may be pirani or thermocouple gauges.
The features of the above embodiments may be arbitrarily combined, and for the sake of brevity, all possible combinations of the features in the above embodiments are not described, but should be construed as being within the scope of the present specification as long as there is no contradiction between the combinations of the features.
The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents and the like that are within the spirit and principle of the present invention are included in the present invention.

Claims (20)

1. The coating equipment is characterized by comprising a negative pressure cavity, the coating equipment comprises a first air extractor used for providing negative pressure for the negative pressure cavity, the coating equipment further comprises a mass spectrum detection device, and the first air extractor can provide negative pressure for the mass spectrum detection device.
2. The plating equipment according to claim 1, wherein the negative pressure chamber is a negative pressure working space in which a plating workpiece is placed in the plating equipment.
3. The plating apparatus according to claim 1, further comprising a second gas-extracting apparatus that supplies a negative pressure to the mass spectrometry detection device, the second gas-extracting apparatus having a higher power than the first gas-extracting apparatus; the second pumping device is arranged between the first pumping device and the mass spectrometry detection apparatus.
4. The plating device according to claim 1, further comprising a third air suction device for supplying negative pressure to the negative pressure chamber, wherein the third air suction device has a higher power than the first air suction device; the third air extraction device is arranged between the first air extraction device and the negative pressure cavity.
5. The plating apparatus according to claim 4, wherein the first pumping apparatus is a backing pump, the second pumping apparatus is a molecular pump, and the third pumping apparatus is a molecular pump.
6. The plating apparatus according to claim 1, further comprising a gas outlet through which gas extracted by the first gas-extracting apparatus from the negative pressure chamber and the mass spectrometry detection device is discharged.
7. The plating device according to claim 1, further comprising a leak detection valve provided between the first air-extracting device and the second air-extracting device; the first gas evacuation device can provide negative pressure to the mass spectrometry detection apparatus with the leak detection valve open.
8. The plating apparatus according to claim 1, further comprising a cabinet that houses the mass spectrometry detection device and the second pumping apparatus.
9. The plating apparatus as recited in claim 8, wherein the housing further contains at least one of a control device of the second pumping apparatus, a leak detection valve, a pressure gauge, a leak hole, a power socket, a communication interface, a fan set, and a circuit board.
10. The plating device according to claim 8, wherein the second air extractor is connected to a negative pressure connection pipe extending at least partially out of the housing; and the top wall of the case along the gravity direction is provided with an opening through which the negative pressure connecting pipe passes.
11. The plating apparatus according to claim 9, wherein the control device of the second pumping apparatus, the leak detection valve, the pressure measurement gauge, and the leak hole are provided in a portion of the negative pressure connection pipe that is housed in the housing.
12. The plating device according to claim 8, wherein the plating device comprises a circuit board disposed in the housing, and the second pumping device and the mass spectrometry detection apparatus are located above the circuit board in a direction of gravity.
13. The plating apparatus according to claim 12, wherein an air flow path is formed in the housing, through which air enters the housing and flows sequentially through the circuit board and the mass spectrometry detection device.
14. The plating apparatus according to claim 13, wherein the air flow path includes a first flow path extending transversely with respect to the direction of gravity, and a second flow path which is continuous with the first flow path and extends in the direction of gravity; wherein the first flow channel passes through the circuit board and the second flow channel passes through the mass spectrometry detection device.
15. The plating device according to claim 12, wherein the plating device comprises a first fan and a second fan;
the side wall of the case close to the circuit board is provided with a vent hole, and the first fan is arranged on the case corresponding to the vent hole and used for driving air to flow into the case from the vent hole;
the second fan is close to the mass spectrometric detection device and is used for driving air to flow through the mass spectrometric detection device.
16. The plating device according to claim 15, wherein an air outlet is provided in a top wall of the housing along a direction of gravity corresponding to the second fan, and the plating device further comprises a third fan provided in a position corresponding to the air outlet, the third fan being configured to drive air in the housing to flow out of the air outlet.
17. A method of controlling a plating apparatus, characterized by comprising:
starting first air extraction equipment to provide negative pressure for a negative pressure cavity of the coating equipment and a mass spectrum detection device;
starting a second air extraction device under the condition that the pressure of the negative pressure cavity reaches a first threshold value; wherein the second pumping device provides negative pressure to the mass spectrometry detection apparatus; the power of the first air pumping device is less than that of the second air pumping device;
activating the mass spectrometry detection device if the pressure in the mass spectrometry detection device reaches a second threshold.
18. The method of claim 17, wherein the step of activating a second suction device in the event that the pressure in the negative pressure chamber reaches a first threshold value, further comprises:
starting third air extraction equipment under the condition that the pressure of the negative pressure cavity reaches a third threshold value; the third air pumping equipment provides negative pressure for the negative pressure cavity, and the power of the third air pumping equipment is higher than that of the first air pumping equipment.
19. The method of claim 18, wherein after the detection is completed, the mass spectrometry detection device is sequentially turned off, the third pumping device, the second pumping device and the first pumping device are turned off.
20. A plating apparatus comprising the plating apparatus according to any one of claims 1 to 16 and a control method applying the plating apparatus according to any one of claims 17 to 19.
CN202210080411.0A 2022-01-24 2022-01-24 Coating apparatus and control method of coating apparatus Active CN114411110B (en)

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