CN114364780A - 处理液、试剂盒、处理液的制造方法、基板的清洗方法、基板的处理方法 - Google Patents
处理液、试剂盒、处理液的制造方法、基板的清洗方法、基板的处理方法 Download PDFInfo
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- CN114364780A CN114364780A CN202080063322.4A CN202080063322A CN114364780A CN 114364780 A CN114364780 A CN 114364780A CN 202080063322 A CN202080063322 A CN 202080063322A CN 114364780 A CN114364780 A CN 114364780A
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Images
Classifications
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JP2019-190310 | 2019-10-17 | ||
JP2020025989 | 2020-02-19 | ||
JP2020-025989 | 2020-02-19 | ||
JP2020084498 | 2020-05-13 | ||
JP2020-084498 | 2020-05-13 | ||
PCT/JP2020/029815 WO2021049208A1 (ja) | 2019-09-09 | 2020-08-04 | 処理液、キット、処理液の製造方法、基板の洗浄方法、基板の処理方法 |
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CN115291483A (zh) * | 2022-09-02 | 2022-11-04 | 昆山晶科微电子材料有限公司 | 一种半导体剥离液及其制备方法 |
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US20240047224A1 (en) * | 2020-12-07 | 2024-02-08 | Mitsubishi Gas Chemical Company, Inc. | Recess etching solution, recess etching method, and surface-treated semiconductor substrate manufacturing method |
JP2024065698A (ja) * | 2022-10-31 | 2024-05-15 | 東京応化工業株式会社 | 洗浄液、及び基板の洗浄方法 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101669072A (zh) * | 2007-07-03 | 2010-03-10 | 东亚合成株式会社 | 抗蚀剂剥离剂组合物 |
JP2015011356A (ja) * | 2014-07-18 | 2015-01-19 | パナソニックIpマネジメント株式会社 | フォトレジスト用剥離液 |
CN105873691A (zh) * | 2013-12-06 | 2016-08-17 | 富士胶片电子材料美国有限公司 | 用于去除表面上的残余物的清洗调配物 |
WO2016151645A1 (ja) * | 2015-03-24 | 2016-09-29 | パナソニックIpマネジメント株式会社 | レジスト剥離液 |
TW201725262A (zh) * | 2016-01-05 | 2017-07-16 | 富士軟片股份有限公司 | 處理液、基板的洗淨方法以及半導體裝置的製造方法 |
TW201912776A (zh) * | 2017-08-31 | 2019-04-01 | 日商富士軟片股份有限公司 | 處理液、套組及基板的洗淨方法 |
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- 2020-08-04 CN CN202080063322.4A patent/CN114364780A/zh active Pending
- 2020-08-13 TW TW109127573A patent/TW202116996A/zh unknown
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101669072A (zh) * | 2007-07-03 | 2010-03-10 | 东亚合成株式会社 | 抗蚀剂剥离剂组合物 |
CN105873691A (zh) * | 2013-12-06 | 2016-08-17 | 富士胶片电子材料美国有限公司 | 用于去除表面上的残余物的清洗调配物 |
JP2015011356A (ja) * | 2014-07-18 | 2015-01-19 | パナソニックIpマネジメント株式会社 | フォトレジスト用剥離液 |
WO2016151645A1 (ja) * | 2015-03-24 | 2016-09-29 | パナソニックIpマネジメント株式会社 | レジスト剥離液 |
TW201725262A (zh) * | 2016-01-05 | 2017-07-16 | 富士軟片股份有限公司 | 處理液、基板的洗淨方法以及半導體裝置的製造方法 |
TW201912776A (zh) * | 2017-08-31 | 2019-04-01 | 日商富士軟片股份有限公司 | 處理液、套組及基板的洗淨方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115291483A (zh) * | 2022-09-02 | 2022-11-04 | 昆山晶科微电子材料有限公司 | 一种半导体剥离液及其制备方法 |
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WO2021049208A1 (ja) | 2021-03-18 |
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TW202116996A (zh) | 2021-05-01 |
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