CN114126745A - 气体处理方法、气体处理装置 - Google Patents

气体处理方法、气体处理装置 Download PDF

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Publication number
CN114126745A
CN114126745A CN202080047461.8A CN202080047461A CN114126745A CN 114126745 A CN114126745 A CN 114126745A CN 202080047461 A CN202080047461 A CN 202080047461A CN 114126745 A CN114126745 A CN 114126745A
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CN
China
Prior art keywords
gas
treated
processed
treatment
light source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202080047461.8A
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English (en)
Chinese (zh)
Inventor
内藤敬祐
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Original Assignee
Ushio Denki KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Denki KK filed Critical Ushio Denki KK
Publication of CN114126745A publication Critical patent/CN114126745A/zh
Pending legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/007—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by irradiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/38—Removing components of undefined structure
    • B01D53/44—Organic components
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/72—Organic compounds not provided for in groups B01D53/48 - B01D53/70, e.g. hydrocarbons
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/70—Organic compounds not provided for in groups B01D2257/00 - B01D2257/602
    • B01D2257/708—Volatile organic compounds V.O.C.'s
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2258/00—Sources of waste gases
    • B01D2258/06—Polluted air
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2259/00—Type of treatment
    • B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
    • B01D2259/804—UV light
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/12—Selection of substances for gas fillings; Specified operating pressure or temperature
    • H01J61/16—Selection of substances for gas fillings; Specified operating pressure or temperature having helium, argon, neon, krypton, or xenon as the principle constituent
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
    • H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
    • H01J65/042—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field
    • H01J65/046—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field the field being produced by using capacitive means around the vessel

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Toxicology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Biomedical Technology (AREA)
  • Treating Waste Gases (AREA)
  • Disinfection, Sterilisation Or Deodorisation Of Air (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
CN202080047461.8A 2019-06-28 2020-06-24 气体处理方法、气体处理装置 Pending CN114126745A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019-120975 2019-06-28
JP2019120975 2019-06-28
PCT/JP2020/024867 WO2020262478A1 (ja) 2019-06-28 2020-06-24 気体処理方法、気体処理装置

Publications (1)

Publication Number Publication Date
CN114126745A true CN114126745A (zh) 2022-03-01

Family

ID=74060625

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202080047461.8A Pending CN114126745A (zh) 2019-06-28 2020-06-24 气体处理方法、气体处理装置

Country Status (5)

Country Link
US (1) US20230147787A1 (https=)
EP (1) EP3968358A4 (https=)
JP (1) JP7549296B2 (https=)
CN (1) CN114126745A (https=)
WO (1) WO2020262478A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4549378A4 (en) * 2022-08-03 2025-12-03 Ushio Electric Inc GAS DECOMPOSITION METHOD AND GAS DECOMPOSITION DEVICE

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023242998A1 (ja) * 2022-06-15 2023-12-21 ウシオ電機株式会社 呼吸用保護具

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0361982U (https=) * 1989-06-29 1991-06-18
CN1141074A (zh) * 1993-12-22 1997-01-22 克莱安联合股份有限公司 包括过滤器和紫外线辐射的净化装置
JPH09155160A (ja) * 1995-12-08 1997-06-17 Adeka Eng Kk 揮発性有機化合物の分解除去装置及び方法
JP2001185089A (ja) * 1999-12-28 2001-07-06 Quark Systems Co Ltd エキシマ照射装置
JP2003290622A (ja) * 2002-04-01 2003-10-14 Koken Ltd ガス状有機化合物の分解装置
CN103210057A (zh) * 2010-10-22 2013-07-17 皇家飞利浦电子股份有限公司 发光材料和包括这种发光材料的发光器件
JP2016165014A (ja) * 2016-06-01 2016-09-08 ウシオ電機株式会社 デスミア処理装置およびデスミア処理方法
JP2017017070A (ja) * 2015-06-26 2017-01-19 ウシオ電機株式会社 光処理装置および光処理方法
WO2019080981A2 (en) * 2017-10-24 2019-05-02 Infuser Ip Aps AIR TREATMENT SYSTEM AND METHOD OF USING SAID AIR TREATMENT SYSTEM
WO2019101276A1 (en) * 2017-11-22 2019-05-31 Domisphere Aps An air treatment system, and a method of using said air treatment system

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000102596A (ja) 1998-09-29 2000-04-11 Silver Seiko Ltd 光触媒脱臭装置
JP4405722B2 (ja) 2002-11-15 2010-01-27 東洋熱工業株式会社 消毒ガス分解除去装置
JP4857939B2 (ja) 2006-06-19 2012-01-18 ウシオ電機株式会社 放電ランプ

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0361982U (https=) * 1989-06-29 1991-06-18
CN1141074A (zh) * 1993-12-22 1997-01-22 克莱安联合股份有限公司 包括过滤器和紫外线辐射的净化装置
JPH09155160A (ja) * 1995-12-08 1997-06-17 Adeka Eng Kk 揮発性有機化合物の分解除去装置及び方法
JP2001185089A (ja) * 1999-12-28 2001-07-06 Quark Systems Co Ltd エキシマ照射装置
JP2003290622A (ja) * 2002-04-01 2003-10-14 Koken Ltd ガス状有機化合物の分解装置
CN103210057A (zh) * 2010-10-22 2013-07-17 皇家飞利浦电子股份有限公司 发光材料和包括这种发光材料的发光器件
JP2017017070A (ja) * 2015-06-26 2017-01-19 ウシオ電機株式会社 光処理装置および光処理方法
JP2016165014A (ja) * 2016-06-01 2016-09-08 ウシオ電機株式会社 デスミア処理装置およびデスミア処理方法
WO2019080981A2 (en) * 2017-10-24 2019-05-02 Infuser Ip Aps AIR TREATMENT SYSTEM AND METHOD OF USING SAID AIR TREATMENT SYSTEM
WO2019101276A1 (en) * 2017-11-22 2019-05-31 Domisphere Aps An air treatment system, and a method of using said air treatment system

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4549378A4 (en) * 2022-08-03 2025-12-03 Ushio Electric Inc GAS DECOMPOSITION METHOD AND GAS DECOMPOSITION DEVICE

Also Published As

Publication number Publication date
EP3968358A1 (en) 2022-03-16
JP7549296B2 (ja) 2024-09-11
WO2020262478A1 (ja) 2020-12-30
US20230147787A1 (en) 2023-05-11
JPWO2020262478A1 (https=) 2020-12-30
EP3968358A4 (en) 2022-07-06

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