CN114072967A - 一种以等离子处理气体污染物的装置 - Google Patents

一种以等离子处理气体污染物的装置 Download PDF

Info

Publication number
CN114072967A
CN114072967A CN201980098096.0A CN201980098096A CN114072967A CN 114072967 A CN114072967 A CN 114072967A CN 201980098096 A CN201980098096 A CN 201980098096A CN 114072967 A CN114072967 A CN 114072967A
Authority
CN
China
Prior art keywords
chamber
wall
cavity
bottom wall
top wall
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201980098096.0A
Other languages
English (en)
Other versions
CN114072967B (zh
Inventor
田志伟
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Anhui Yikos Automation Equipment Co ltd
Original Assignee
Yikesi Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yikesi Co ltd filed Critical Yikesi Co ltd
Priority to CN202210999540.XA priority Critical patent/CN115377641A/zh
Publication of CN114072967A publication Critical patent/CN114072967A/zh
Application granted granted Critical
Publication of CN114072967B publication Critical patent/CN114072967B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/461—Microwave discharges
    • H05H1/4622—Microwave discharges using waveguides
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23G—CREMATION FURNACES; CONSUMING WASTE PRODUCTS BY COMBUSTION
    • F23G7/00—Incinerators or other apparatus for consuming industrial waste, e.g. chemicals
    • F23G7/06—Incinerators or other apparatus for consuming industrial waste, e.g. chemicals of waste gases or noxious gases, e.g. exhaust gases
    • F23G7/061—Incinerators or other apparatus for consuming industrial waste, e.g. chemicals of waste gases or noxious gases, e.g. exhaust gases with supplementary heating
    • F23G7/063—Incinerators or other apparatus for consuming industrial waste, e.g. chemicals of waste gases or noxious gases, e.g. exhaust gases with supplementary heating electric heating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/76—Gas phase processes, e.g. by using aerosols
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P7/00—Resonators of the waveguide type
    • H01P7/06—Cavity resonators
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/30—Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2259/00—Type of treatment
    • B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
    • B01D2259/818—Employing electrical discharges or the generation of a plasma
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23G—CREMATION FURNACES; CONSUMING WASTE PRODUCTS BY COMBUSTION
    • F23G2204/00—Supplementary heating arrangements
    • F23G2204/20—Supplementary heating arrangements using electric energy
    • F23G2204/201—Plasma
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23G—CREMATION FURNACES; CONSUMING WASTE PRODUCTS BY COMBUSTION
    • F23G2204/00—Supplementary heating arrangements
    • F23G2204/20—Supplementary heating arrangements using electric energy
    • F23G2204/203—Microwave
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23G—CREMATION FURNACES; CONSUMING WASTE PRODUCTS BY COMBUSTION
    • F23G2209/00—Specific waste
    • F23G2209/14—Gaseous waste or fumes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2245/00—Applications of plasma devices
    • H05H2245/10—Treatment of gases

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Environmental & Geological Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Dispersion Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Biomedical Technology (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Treating Waste Gases (AREA)

Abstract

一种以等离子处理气体污染物的装置，包括一微波源、一波导组件及一谐振腔，该微波源产生一微波振荡，该波导组件耦接至该微波源，该谐振腔耦接至该波导组件，该微波振荡实质上朝一波导方向传递，该谐振腔包括一第一腔室及一第二腔室，该波导方向实质上平行于该第一腔室的一基准轴线，该第一腔室具有一围绕该基准轴线的内壁，该内壁包括一朝该基准轴线倾斜的第一内壁及一相对该基准轴线实质上平行的第二内壁，该第一内壁的面积大于该第二内壁使该第一腔室形成一渐缩的锥形空间，该微波振荡于该第二腔室和一点火气体反应而形成一火炬。

Description

PCT国内申请，说明书已公开。

Claims (1)

  1. PCT国内申请，权利要求书已公开。
CN201980098096.0A 2019-11-07 2019-11-07 一种以等离子处理气体污染物的装置 Active CN114072967B (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202210999540.XA CN115377641A (zh) 2019-11-07 2019-11-07 一种毋须燃料的处理气体污染物的装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/SG2019/050545 WO2021091477A1 (zh) 2019-11-07 2019-11-07 一种以等离子处理气体污染物的装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN202210999540.XA Division CN115377641A (zh) 2019-11-07 2019-11-07 一种毋须燃料的处理气体污染物的装置

Publications (2)

Publication Number Publication Date
CN114072967A true CN114072967A (zh) 2022-02-18
CN114072967B CN114072967B (zh) 2022-12-23

Family

ID=75848058

Family Applications (2)

Application Number Title Priority Date Filing Date
CN201980098096.0A Active CN114072967B (zh) 2019-11-07 2019-11-07 一种以等离子处理气体污染物的装置
CN202210999540.XA Pending CN115377641A (zh) 2019-11-07 2019-11-07 一种毋须燃料的处理气体污染物的装置

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN202210999540.XA Pending CN115377641A (zh) 2019-11-07 2019-11-07 一种毋须燃料的处理气体污染物的装置

Country Status (6)

Country Link
US (1) US20230003380A1 (zh)
JP (2) JP7357847B2 (zh)
KR (2) KR20220097433A (zh)
CN (2) CN114072967B (zh)
TW (1) TWI758779B (zh)
WO (1) WO2021091477A1 (zh)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101378615A (zh) * 2008-10-13 2009-03-04 电子科技大学 一种微波等离子体火炬波导激励腔
CN101852444A (zh) * 2010-05-26 2010-10-06 白野 一种微波等离子体点燃器
US20140027411A1 (en) * 2011-04-14 2014-01-30 Edwards Limited Plasma Torch
US20170095787A1 (en) * 2014-03-19 2017-04-06 Korea Basic Science Institute Microwave plasma torch
CN107087339A (zh) * 2017-07-03 2017-08-22 李容毅 一种双腔激励的增强型微波等离子体炬发生装置

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4890294A (en) * 1987-01-26 1989-12-26 Mitsubishi Denki Kabushiki Kaisha Plasma apparatus
JP2000133494A (ja) * 1998-10-23 2000-05-12 Mitsubishi Heavy Ind Ltd マイクロ波プラズマ発生装置及び方法
TW495373B (en) * 2000-03-23 2002-07-21 Idatech L L C A fuel processor, hydrogen-selective metal membrane modules, method of forming the same and a hydrogen purification assembly comprising the same
GB0522088D0 (en) * 2005-10-28 2005-12-07 Boc Group Plc Plasma abatement device
US8748785B2 (en) * 2007-01-18 2014-06-10 Amastan Llc Microwave plasma apparatus and method for materials processing
MX2010001451A (es) * 2007-08-06 2010-03-10 Ind Microwave Systems Llc Aplicador para una guia de onda ancha.
KR100965491B1 (ko) * 2009-11-02 2010-06-24 박영배 복합 플라스마 발생장치
CN101829487A (zh) * 2010-06-11 2010-09-15 天津市环境保护科学研究院 微波等离子体分解氟利昂无害化处理方法
TWI398293B (zh) * 2010-11-08 2013-06-11 Orient Service Co Ltd Cyclone Oxygen Combustion Unit for Treatment of Emissions from Semiconductor Processes
CN202621002U (zh) * 2012-06-08 2012-12-26 无锡市伟奥斯环保科技有限公司 一种可控温等离子体有机废气处理装置
CN103657370B (zh) * 2012-09-07 2015-09-30 韩国能量技术研究院 利用微波等离子体的硫化氢及硫化羰去除装置及方法
KR101614028B1 (ko) * 2013-05-27 2016-04-20 가부시키가이샤 아도테쿠 프라즈마 테쿠노로지 마이크로파 플라즈마 발생장치의 공동 공진기
KR101468923B1 (ko) * 2013-05-29 2014-12-22 주식회사 애니텍 마이크로웨이브 플라즈마를 이용한 톨루엔 연소분해장치 및 톨루엔을 이용한 화염 증폭 기능을 구비한 연소분해장치
US9767992B1 (en) * 2017-02-09 2017-09-19 Lyten, Inc. Microwave chemical processing reactor

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101378615A (zh) * 2008-10-13 2009-03-04 电子科技大学 一种微波等离子体火炬波导激励腔
CN101852444A (zh) * 2010-05-26 2010-10-06 白野 一种微波等离子体点燃器
US20140027411A1 (en) * 2011-04-14 2014-01-30 Edwards Limited Plasma Torch
US20170095787A1 (en) * 2014-03-19 2017-04-06 Korea Basic Science Institute Microwave plasma torch
CN107087339A (zh) * 2017-07-03 2017-08-22 李容毅 一种双腔激励的增强型微波等离子体炬发生装置

Also Published As

Publication number Publication date
KR20240011259A (ko) 2024-01-25
KR20220097433A (ko) 2022-07-07
TW202118547A (zh) 2021-05-16
WO2021091477A1 (zh) 2021-05-14
JP2022553477A (ja) 2022-12-23
JP2023113747A (ja) 2023-08-16
US20230003380A1 (en) 2023-01-05
TWI758779B (zh) 2022-03-21
JP7357847B2 (ja) 2023-10-10
CN114072967B (zh) 2022-12-23
CN115377641A (zh) 2022-11-22

Similar Documents

Publication Publication Date Title
KR101286348B1 (ko) 마이크로파 플라즈마 반응기
KR102024503B1 (ko) 플라즈마 소스 디바이스 및 방법들
US20100301012A1 (en) Device and method for producing microwave plasma with a high plasma density
CN101378615A (zh) 一种微波等离子体火炬波导激励腔
CN103269561A (zh) 波导直馈式微波等离子体炬装置
CN213152451U (zh) 一种常压自点火式微波等离子炬及微波等离子发生系统
US20230110414A1 (en) Optical system for monitoring plasma reactions and reactors
CN114072967A (zh) 一种以等离子处理气体污染物的装置
JP4850592B2 (ja) プラズマ処理装置およびプラズマ処理方法
EP3329748B1 (en) Chambers for microwave plasma generation and related methods
KR100331673B1 (ko) 웨이퍼플라즈마프로세서용이중윈도우배기장치
CN111491437A (zh) 一种非射流常压大体积微波等离子体发生方法
JP2007157518A (ja) マイクロ波装置
CN101849331B (zh) 具有分布电感的激光器
CN114189973A (zh) 一种具有双微波谐振腔的微波等离子体炬装置及其使用方法
CN210075675U (zh) 一种常压大体积微波等离子体发生器
KR102279747B1 (ko) 용액 증류 시스템
CN220629635U (zh) 一种内嵌式小型材料处理用大气微波等离子体射流源
RU2236721C1 (ru) Сверхвысокочастотный возбудитель безэлектродной газоразрядной лампы
CN112863993B (zh) 一种大处理量微波等离子体反应腔
KR200398765Y1 (ko) 다용도 마이크로웨이브 발생장치
Kirichenko et al. Microwave Electrode Discharge at Atmospheric Pressure
RU2161875C1 (ru) Свч-возбудитель безэлектродной газоразрядной лампы
CN113766723A (zh) 一种基于微波非线性器件的高效设备
CA1273440A (en) Surface wave launchers to produce plasma columns and means for producing plasma of different shapes

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant
CP02 Change in the address of a patent holder
CP02 Change in the address of a patent holder

Address after: # 01-23, No. 30, Refrigeration Industrial Zone, Singapore

Patentee after: Yikesi Co.,Ltd.

Address before: Singapore cooling Industrial Zone

Patentee before: Yikesi Co.,Ltd.

TR01 Transfer of patent right
TR01 Transfer of patent right

Effective date of registration: 20230725

Address after: # 01-23/24, No. 30, Jialengfang, Singapore Jialeng Industrial Park

Patentee after: Baohong (Singapore) Pte. Ltd.

Address before: # 01-23, No. 30, Refrigeration Industrial Zone, Singapore

Patentee before: Yikesi Co.,Ltd.

TR01 Transfer of patent right
TR01 Transfer of patent right

Effective date of registration: 20231004

Address after: 1-3/F, Building 3, Zhongsoft Wuhu Software Park, No. 17 Henglangshan Road, High tech Industrial Development Zone, Yijiang District, Wuhu City, Anhui Province

Patentee after: Anhui yikos automation equipment Co.,Ltd.

Address before: # 01-23/24, No. 30, Jialengfang, Singapore Jialeng Industrial Park

Patentee before: Baohong (Singapore) Pte. Ltd.