CN114040560A - Rotatable formula plasma efflux generating device - Google Patents
Rotatable formula plasma efflux generating device Download PDFInfo
- Publication number
- CN114040560A CN114040560A CN202111374192.9A CN202111374192A CN114040560A CN 114040560 A CN114040560 A CN 114040560A CN 202111374192 A CN202111374192 A CN 202111374192A CN 114040560 A CN114040560 A CN 114040560A
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- China
- Prior art keywords
- plasma jet
- voltage electrode
- generating device
- rotating
- rotatable
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- 239000007789 gas Substances 0.000 claims description 38
- 239000000463 material Substances 0.000 claims description 13
- 239000000203 mixture Substances 0.000 claims description 12
- 239000000178 monomer Substances 0.000 claims description 4
- 239000002243 precursor Substances 0.000 claims description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- 239000011521 glass Substances 0.000 claims description 3
- 230000000694 effects Effects 0.000 abstract description 7
- 210000002381 plasma Anatomy 0.000 description 64
- 238000002474 experimental method Methods 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 238000007599 discharging Methods 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
- H05H1/44—Plasma torches using an arc using more than one torch
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
- H05H1/34—Details, e.g. electrodes, nozzles
Abstract
The invention relates to the technical field of plasma, in particular to a rotatable plasma jet generating device, which comprises an air supply part, a discharge part and a rotating part, wherein the rotating part is arranged at the right end of the discharge part, and the air supply part is arranged at the left end of the discharge part; the discharge part comprises a high-voltage electrode, a low-voltage electrode and two plasma jet pipes, and the two plasma jet pipes penetrate through the high-voltage electrode and the low-voltage electrode; the gas supply part consists of a mixed gas cavity and a valve; the rotating part consists of an oblique angle pipeline, a rotating bolt and a rotating shell; the oblique angle pipeline, the rotary bolt and the rotary shell rotate at a constant speed under the action of the rotary motor, so that the ejected plasma rotates at a constant speed to form an even annular treatment area, the two plasma jet pipes work simultaneously, and the plasma jet treatment effect is improved doubly.
Description
Technical Field
The invention relates to the technical field of plasmas, in particular to a rotatable plasma jet generating device.
Background
With the rapid development of the plasma technology, the plasma technology is widely popularized and applied in the fields of material processing, aerospace, biomedicine and the like. In the aspect of material modification treatment, working gas generates active particles through a discharge area under the catalytic action of a precursor monomer, and the active particles are conveyed to the surface of a treated object under the pushing of the gas and generate chemical action to finish the material surface modification. However, in the discharge process, the plasma jetted from the orifice of the jet pipe acts on the surface of the material in a small round point shape, the treatment area is small, and the plasma jet treatment effect is greatly limited. Therefore, it is necessary to further optimize the plasma apparatus, enlarge the plasma action area, and improve the treatment efficiency of the surface of the plasma action material.
At present, the existing plasma jet generating device adopts four or more jet pipe structures, the structure mode intensively treats the surface of a material, the action area is effectively enlarged, but the fixed-point treatment is carried out in the treatment process of the structure, the treatment time is not easy to control, and the surface of the treated material is not uniform enough; meanwhile, the gas consumption is high, the cost is high, and the actual action effect of the plasma jet on material surface treatment is greatly limited.
Therefore, the plasma sprayed by the jet pipe rotates, the action area of the plasma can be effectively enlarged, the action efficiency of the plasma is improved, the surface treatment uniformity of the material is ensured, the cost is effectively saved, and the economical efficiency is improved.
Disclosure of Invention
The invention aims to provide a rotatable plasma jet generating device, which rotates plasma through a rotating part, effectively enlarges the processing area of the plasma and improves the utilization rate and the economical efficiency of the plasma. Meanwhile, the rotary shell effectively isolates the interference of external impurity gas to the experiment, and the plasma jet flow treatment effect is further improved.
In order to achieve the purpose, the technical scheme provided by the invention is as follows:
a rotatable plasma jet generating device is characterized by comprising an air supply part, a discharge part and a rotating part, wherein the rotating part is installed at the right end of the discharge part, and the air supply part is installed at the left end of the discharge part; the discharge part comprises a high-voltage electrode 2, a low-voltage electrode 3 and two plasma jet pipes 5, wherein the two plasma jet pipes 5 penetrate through the high-voltage electrode 2 and the low-voltage electrode 3; the gas supply part consists of a mixed gas cavity 4 and a valve 9; the rotating part consists of an angled pipe 6, a rotating bolt 7 and a rotating housing 8.
Two the gas mixture chamber 4 is installed to the right-hand member of plasma jet pipe 5, two install valve 9 between plasma jet pipe 5 and the gas mixture chamber 4, two the left end of plasma jet pipe 5 is connected with oblique angle pipeline 6 through rotatory bolt 7, and rotatory shell 8 is installed in the outside of two oblique angle pipelines 6.
The gas supply part, the discharge part and the rotating part are installed on the fixing base 1, the fixing base 1 is made of a material with good insulating performance, the lower end of the fixing base 1 is fixedly connected with a supporting rod 101, and the supporting rod 101 can be used for being held in a hand.
The diameters of the inner holes of the high-voltage electrode 2 and the low-voltage electrode 3 are consistent with the diameter of the plasma jet pipe 5.
The high-voltage electrode 2 and the low-voltage electrode 3 are both made of copper.
The high-voltage electrode 2 is connected with a high-voltage power supply through a joint, and the low-voltage electrode 3 is grounded.
The plasma jet pipe 5 is a quartz glass pipe, the length of the plasma jet pipe 5 can be 15-20cm, and the diameter of the inner glass wall of the plasma jet pipe 5 is 0.8-1 mm.
The mixed gas chamber 4 contains a mixture of various working gases and precursor monomers.
And a flowmeter 10 is arranged on the valve 9 to ensure that the gas flow rate is consistent.
The angle x of the angled conduit 6 is between 30 and 60 degrees.
The mixture in the mixed gas chamber 4 flows into plasma jet pipe 5 through valve 4 and carries out the reaction of discharging in, obtains plasma after the mixed reaction of discharging in the mixed gas chamber 4, oblique angle pipeline 6 directly links to each other with plasma jet pipe 5 through rotatory bolt 7, and plasma jets out from oblique angle pipeline 6, and rotatory shell 8 is effective completely cut off external impurity gas to the interference of experiment.
The oblique angle pipeline 6, the rotary bolt 7 and the rotary shell rotate at a constant speed under the action of the rotary motor 11, so that the ejected plasma rotates at a constant speed to form an even annular treatment area, the two plasma jet pipes 5 work simultaneously, and the plasma jet treatment effect is improved doubly.
Compared with the prior art, the invention has the following advantages: the plasma is rotated by the rotating part, so that the processing area of the plasma is effectively enlarged, and the utilization rate and the economical efficiency of the plasma are improved. Meanwhile, the rotary shell effectively isolates the interference of external impurity gas to the experiment, and the plasma jet flow treatment effect is further improved.
Drawings
For a more clear understanding of the present invention, the present disclosure will be further described by reference to the drawings and illustrative embodiments which are provided for illustration and are not to be construed as limiting the disclosure.
FIG. 1 shows a plasma jet generating device of the present invention.
In the figure: 1-a fixed seat, 2-a high-voltage electrode, 3-a low-voltage electrode, 4-a mixed gas cavity, 5-a jet pipe, 6-an oblique angle pipeline, 7-a rotating bolt, 8-a rotating shell, 9-a valve, 10-a flowmeter, 11-a rotating motor and 101-a supporting rod.
Detailed Description
The following description of the preferred embodiments of the present invention is provided for the purpose of illustration and description, and is in no way intended to limit the invention.
Example 1
A rotatable plasma jet generating device is characterized by comprising an air supply part, a discharge part and a rotating part, wherein the rotating part is installed at the right end of the discharge part, and the air supply part is installed at the left end of the discharge part; the discharge part comprises a high-voltage electrode 2, a low-voltage electrode 3 and two plasma jet pipes 5, wherein the two plasma jet pipes 5 penetrate through the high-voltage electrode 2 and the low-voltage electrode 3; the gas supply part consists of a mixed gas cavity 4 and a valve 9; the rotating part consists of an angled pipe 6, a rotating bolt 7 and a rotating housing 8.
Two the gas mixture chamber 4 is installed to the right-hand member of plasma jet pipe 5, two install valve 9 between plasma jet pipe 5 and the gas mixture chamber 4, two the left end of plasma jet pipe 5 is connected with oblique angle pipeline 6 through rotatory bolt 7, and rotatory shell 8 is installed in the outside of two oblique angle pipelines 6.
The gas supply part, the discharge part and the rotating part are installed on the fixing base 1, the fixing base 1 is made of a material with good insulating performance, the lower end of the fixing base 1 is fixedly connected with a supporting rod 101, and the supporting rod 101 can be used for being held in a hand.
The diameters of the inner holes of the high-voltage electrode 2 and the low-voltage electrode 3 are consistent with the diameter of the plasma jet pipe 5.
The high-voltage electrode 2 and the low-voltage electrode 3 are both made of copper.
The high-voltage electrode 2 is connected with a high-voltage power supply through a joint, and the low-voltage electrode 3 is grounded.
The plasma jet pipe 5 is a quartz glass pipe, the length of the plasma jet pipe 5 can be 15-20cm, and the diameter of the inner glass wall of the plasma jet pipe 5 is 0.8-1 mm.
The mixed gas chamber 4 contains a mixture of various working gases and precursor monomers.
And a flowmeter 10 is arranged on the valve 9 to ensure that the gas flow rate is consistent.
The angle x of the angled conduit 6 is between 30 and 60 degrees.
The mixture in the mixed gas chamber 4 flows into plasma jet pipe 5 through valve 4 and carries out the reaction of discharging in, obtains plasma after the mixture discharge reaction in the mixed gas chamber 4, oblique angle pipeline 6 directly links to each other with plasma jet pipe 5 through rotatory bolt 7, and plasma jets out from oblique angle pipeline 6, and rotatory shell 8 is effective completely cuts off the interference of external impurity gas to the experiment.
The oblique angle pipeline 6, the rotary bolt 7 and the rotary shell rotate at a constant speed under the action of the rotary motor 11, so that the ejected plasma rotates at a constant speed to form an even annular treatment area, the two plasma jet pipes 5 work simultaneously, and the plasma jet treatment effect is improved doubly.
The rotating bolt 7 is connected to the plasma jet pipe 5 and can rotate under the drive of a rotating motor.
The specific working flow of the rotatable plasma jet generating device is as follows:
1. cleaning and drying the sample, and placing the sample on a processing table.
2. And opening the valve 9 to lead the mixed gas in the mixed gas cavity 4 to the two plasma jet pipes 5.
3. Starting a high-voltage power supply, and after the plasma jet flow is stable, turning on the rotating motor 11 to enable the plasma to start rotating for material treatment.
It will be understood by those skilled in the art that the present invention is not limited to the embodiments described above, which are described in the specification and illustrated only to illustrate the principle of the present invention, but that various changes and modifications may be made therein without departing from the spirit and scope of the present invention, which fall within the scope of the invention as claimed. The scope of the invention is defined by the appended claims and equivalents thereof.
Claims (10)
1. A rotatable plasma jet generating device is characterized by comprising an air supply part, a discharge part and a rotating part, wherein the rotating part is installed at the right end of the discharge part, and the air supply part is installed at the left end of the discharge part; the discharge part comprises a high-voltage electrode (2), a low-voltage electrode (3) and two plasma jet pipes (5), wherein the two plasma jet pipes (5) penetrate through the high-voltage electrode (2) and the low-voltage electrode (3); the gas supply part consists of a mixed gas cavity (4) and a valve (9); the rotating part consists of an oblique angle pipeline (6), a rotating bolt (7) and a rotating shell (8).
2. A rotatable plasma jet generating device according to claim 1, wherein: two gas mixture chamber (4) are installed to the right-hand member of plasma jet pipe (5), two install valve (9), two between plasma jet pipe (5) and gas mixture chamber (4) the left end of plasma jet pipe (5) is connected with oblique angle pipeline (6) through rotating bolt (7), and rotating housing (8) are installed in the outside of two oblique angle pipelines (6).
3. A rotatable plasma jet generating device according to claim 1, wherein: the gas supply part, the discharge part and the rotating part are installed on the fixing seat (1), the fixing seat (1) is made of a material with good insulating performance, the lower end of the fixing seat (1) is fixedly connected with the supporting rod (101), and the supporting rod (101) can be used for being held by hands.
4. A rotatable plasma jet generating device according to claim 1, wherein: the diameters of the inner holes of the high-voltage electrode (2) and the low-voltage electrode (3) are consistent with the diameter of the plasma jet pipe (5).
5. A rotatable plasma jet generating device according to claim 1, wherein: the high-voltage electrode (2) and the low-voltage electrode (3) are both made of copper.
6. A rotatable plasma jet generating device according to claim 1, wherein: the high-voltage electrode (2) is connected with a high-voltage power supply through a joint, and the low-voltage electrode (3) is grounded.
7. A rotatable plasma jet generating device according to claim 1, wherein: the plasma jet pipe (5) is a quartz glass pipe, the length of the plasma jet pipe (5) can be 15-20cm, and the diameter of the inner glass wall of the plasma jet pipe (5) is 0.8-1 mm.
8. A rotatable plasma jet generating device according to claim 1, wherein: the mixed gas cavity (4) is filled with a mixture of various working gases and precursor monomers.
9. A rotatable plasma jet generating device according to claim 1, wherein: and a flowmeter (10) is arranged on the valve (9) to ensure that the gas flow rate is consistent.
10. A rotatable plasma jet generating device according to claim 1, wherein: the angle x of the beveled conduit (6) is between 30 and 60 degrees.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111374192.9A CN114040560A (en) | 2021-11-19 | 2021-11-19 | Rotatable formula plasma efflux generating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111374192.9A CN114040560A (en) | 2021-11-19 | 2021-11-19 | Rotatable formula plasma efflux generating device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN114040560A true CN114040560A (en) | 2022-02-11 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202111374192.9A Pending CN114040560A (en) | 2021-11-19 | 2021-11-19 | Rotatable formula plasma efflux generating device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN114040560A (en) |
Citations (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001023968A (en) * | 1999-07-12 | 2001-01-26 | Matsushita Electric Works Ltd | Plasma processing system and plasma cleaning method |
| JP2001060577A (en) * | 1999-08-19 | 2001-03-06 | Matsushita Electric Works Ltd | Plasma treatment system and plasma treating method |
| US6265690B1 (en) * | 1998-04-03 | 2001-07-24 | Cottin Development Ltd. | Plasma processing device for surfaces |
| CN101227790A (en) * | 2008-01-25 | 2008-07-23 | 华中科技大学 | Plasma jet apparatus |
| CN101631416A (en) * | 2009-07-30 | 2010-01-20 | 任兆杏 | Device for processing air plasma jet large area surface |
| CN102085520A (en) * | 2009-12-04 | 2011-06-08 | 中国科学院微电子研究所 | Normal-pressure dual-medium barrier flat-opening type active radical cleaning system |
| CN103298234A (en) * | 2013-06-21 | 2013-09-11 | 东南大学 | Low-temperature plasma jet generating device |
| CN105025647A (en) * | 2014-04-16 | 2015-11-04 | 馗鼎奈米科技股份有限公司 | Plasma device |
| CN108550517A (en) * | 2018-03-29 | 2018-09-18 | 中国地质科学院水文地质环境地质研究所 | A kind of novel chlorine bromine isotope mass spectrometer and its analysis method based on atmospheric plasma volume ionization |
| CN109317922A (en) * | 2017-08-01 | 2019-02-12 | 大连理工大学 | A method of atomization cold plasma assisted machining |
| CN110944441A (en) * | 2019-11-25 | 2020-03-31 | 国网重庆市电力公司电力科学研究院 | Adjustable plasma jet device and spraying system |
| WO2021196601A1 (en) * | 2020-04-02 | 2021-10-07 | 苏州思诚者信息科技有限公司 | Plasma generation device |
-
2021
- 2021-11-19 CN CN202111374192.9A patent/CN114040560A/en active Pending
Patent Citations (12)
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|---|---|---|---|---|
| US6265690B1 (en) * | 1998-04-03 | 2001-07-24 | Cottin Development Ltd. | Plasma processing device for surfaces |
| JP2001023968A (en) * | 1999-07-12 | 2001-01-26 | Matsushita Electric Works Ltd | Plasma processing system and plasma cleaning method |
| JP2001060577A (en) * | 1999-08-19 | 2001-03-06 | Matsushita Electric Works Ltd | Plasma treatment system and plasma treating method |
| CN101227790A (en) * | 2008-01-25 | 2008-07-23 | 华中科技大学 | Plasma jet apparatus |
| CN101631416A (en) * | 2009-07-30 | 2010-01-20 | 任兆杏 | Device for processing air plasma jet large area surface |
| CN102085520A (en) * | 2009-12-04 | 2011-06-08 | 中国科学院微电子研究所 | Normal-pressure dual-medium barrier flat-opening type active radical cleaning system |
| CN103298234A (en) * | 2013-06-21 | 2013-09-11 | 东南大学 | Low-temperature plasma jet generating device |
| CN105025647A (en) * | 2014-04-16 | 2015-11-04 | 馗鼎奈米科技股份有限公司 | Plasma device |
| CN109317922A (en) * | 2017-08-01 | 2019-02-12 | 大连理工大学 | A method of atomization cold plasma assisted machining |
| CN108550517A (en) * | 2018-03-29 | 2018-09-18 | 中国地质科学院水文地质环境地质研究所 | A kind of novel chlorine bromine isotope mass spectrometer and its analysis method based on atmospheric plasma volume ionization |
| CN110944441A (en) * | 2019-11-25 | 2020-03-31 | 国网重庆市电力公司电力科学研究院 | Adjustable plasma jet device and spraying system |
| WO2021196601A1 (en) * | 2020-04-02 | 2021-10-07 | 苏州思诚者信息科技有限公司 | Plasma generation device |
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