CN110944441A - Adjustable plasma jet device and spraying system - Google Patents

Adjustable plasma jet device and spraying system Download PDF

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Publication number
CN110944441A
CN110944441A CN201911165899.1A CN201911165899A CN110944441A CN 110944441 A CN110944441 A CN 110944441A CN 201911165899 A CN201911165899 A CN 201911165899A CN 110944441 A CN110944441 A CN 110944441A
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CN
China
Prior art keywords
plasma jet
discharge
voltage electrode
jet pipes
airflow
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Pending
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CN201911165899.1A
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Chinese (zh)
Inventor
刘熊
甘汶艳
王谦
李永福
彭华东
任啸
李小平
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Electric Power Research Institute of State Grid Chongqing Electric Power Co Ltd
State Grid Corp of China SGCC
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Electric Power Research Institute of State Grid Chongqing Electric Power Co Ltd
State Grid Corp of China SGCC
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Application filed by Electric Power Research Institute of State Grid Chongqing Electric Power Co Ltd, State Grid Corp of China SGCC filed Critical Electric Power Research Institute of State Grid Chongqing Electric Power Co Ltd
Priority to CN201911165899.1A priority Critical patent/CN110944441A/en
Publication of CN110944441A publication Critical patent/CN110944441A/en
Pending legal-status Critical Current

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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/2406Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/26Plasma torches

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)

Abstract

The invention discloses an adjustable plasma jet device and a spraying system, which consist of an air supply module and a discharge module, wherein the air supply module comprises a controllable valve and a plurality of airflow channels; the discharge module comprises a plurality of discharge units, and each discharge unit comprises a plurality of plasma jet pipes which are arranged annularly; the plurality of discharge units are connected with the plurality of airflow channels in a one-to-one correspondence manner; the opening and closing of the plurality of air flow channels are adjusted by controllable valves. By the adjustable plasma jet device and the spraying system, the number of the plasma jet pipes is increased, the working gas required by the plasma jet pipes is controlled by the controllable valve to carry out plasma jet discharge, and when the plasma jet device is used for treating the surface of a large-size material, the efficiency of treating the surface of the large-size material is improved.

Description

Adjustable plasma jet device and spraying system
Technical Field
The invention relates to the technical field of plasma, in particular to an adjustable plasma jet device and a spraying system.
Background
With the development of society, the plasma technology is popularized and applied more and more in the fields of material treatment, biomedicine and the like. Based on the dielectric barrier discharge principle, the plasma jet transmits high-energy active particles (active free radicals, charged particles, high-activity molecules and atoms) generated in a discharge area to the working area through the flow of working gas and acts on the surface of a material to be processed, so that the surface performance of the material is improved. The plasma jet structure mainly comprises three structural modes of a single electrode, a double electrode and a three-electrode, wherein the needle ring and double-ring type double-electrode structure separates a high voltage end from a low voltage end through an insulating medium, so that the generation of discharge electric arcs can be effectively avoided, and meanwhile, the discharge intensity in the discharge medium tube is high, thereby being beneficial to generating more active particles.
However, the area of a single plasma jet discharge is limited, usually only a few square millimeters, and the treatment efficiency is very low when the surface of a large-sized material is treated.
Disclosure of Invention
In view of this, the embodiment of the present invention provides an adjustable plasma jet device and a spraying system, so as to solve the problem of low processing efficiency when a plasma jet device is used to process the surface of a large-size material.
In order to achieve the above purpose, the embodiments of the present invention provide the following technical solutions:
the present application discloses in a first aspect an adjustable plasma jet device comprising: the device comprises an air supply module and a discharge module;
the air supply module comprises a controllable valve and a plurality of air flow channels;
the discharge module comprises a plurality of discharge units, and each discharge unit comprises a plurality of plasma jet pipes;
the discharge units are connected with the airflow channels in a one-to-one correspondence manner;
the opening and closing of the plurality of gas flow channels is regulated by the controllable valve.
Preferably, a plurality of plasma jet pipes are arranged according to a preset rule to form an array as the discharge unit.
Preferably, a plurality of plasma jet pipes are uniformly arranged and grouped in an annular array to serve as the discharge unit.
Preferably, the discharge module further includes: a high voltage electrode and a ground electrode;
the high-voltage electrode is matched with the discharge units;
the ground electrodes are glued to the plasma jet pipes in a one-to-one correspondence mode.
Preferably, the high-voltage electrode is of a porous structure, and each hole corresponds to the plasma jet pipe one by one.
Preferably, the high voltage electrode is movable relative to the ground electrode in the axial direction of the hole and is fixed by a bolt.
Preferably, the plasma jet pipe includes: an inner glass wall and an outer glass wall;
the diameter of the outer layer glass wall is consistent with that of the hole, and the high-voltage electrode is matched with the outer layer glass wall to slide.
Preferably, the gas supply module further includes: a current equalizer;
one end of each airflow channel is connected with the discharge units, and the other end of each airflow channel is connected with the current equalizer.
Preferably, the method further comprises the following steps: a recoverer;
the recoverer is connected with the airflow channels and used for recovering working gas in the airflow channels.
In a second aspect, a spray coating system is disclosed comprising the adjustable plasma jet apparatus disclosed in the first aspect of the present application.
From the above, the invention discloses an adjustable plasma jet device and a spraying system, which are composed of an air supply module and a discharge module, wherein the air supply module comprises a controllable valve and a plurality of airflow channels; the discharge module comprises a plurality of discharge units, and each discharge unit comprises a plurality of plasma jet pipes which are arranged annularly; the plurality of discharge units are connected with the plurality of airflow channels in a one-to-one correspondence manner; the opening and closing of the plurality of air flow channels are adjusted by controllable valves. By the adjustable plasma jet device and the spraying system, the number of the plasma jet pipes is increased, the working gas required by the plasma jet pipes is controlled by the controllable valve to carry out plasma jet discharge, and when the plasma jet device is used for treating the surface of a large-size material, the efficiency of treating the surface of the large-size material is improved.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the provided drawings without creative efforts.
Fig. 1 is a schematic structural diagram of an adjustable plasma jet apparatus according to an embodiment of the present invention;
fig. 2 is a schematic structural diagram of a plasma jet pipe according to an embodiment of the present invention.
The plasma jet pipe comprises an airflow channel 1, an airflow channel 2, a controllable valve 3, a current equalizer 4, a plasma jet pipe 5, a high-voltage electrode 6 and a ground electrode 7.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
In this application, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising an … …" does not exclude the presence of other identical elements in a process, method, article, or apparatus that comprises the element.
An embodiment of the present invention provides an adjustable plasma jet device, which is a schematic structural diagram of the adjustable plasma jet device, referring to fig. 1, and the adjustable plasma jet device includes: the device comprises an air supply module and a discharge module;
the gas supply module comprises a controllable valve 3 and a plurality of gas flow channels;
the discharge module comprises a plurality of discharge units, and each discharge unit comprises a plurality of plasma jet pipes 5;
it should be noted that the discharge unit may be composed of a plurality of plasma jet pipes 5, or may be composed of a single plasma jet pipe 5, and in the present application, it is preferable that the discharge unit is composed of a plurality of plasma jet pipes 5.
It should be noted that, since the plasma jet discharge area of a single plasma jet pipe 5 is limited to only a few square millimeters, the plasma jet discharge area is increased by increasing the number of the plasma jet pipes 5.
For example, the plasma jet discharge area of one plasma jet pipe 5 is 2 square millimeters, the number of the plasma jet pipes 5 is increased to 20, and the plasma jet discharge area of 20 plasma jet pipes 5 can reach 40 square millimeters.
The discharge units are connected with the airflow channels in a one-to-one correspondence manner;
the opening and closing of the plurality of gas flow channels is regulated by the controllable valve 3.
It should be noted that the operation of the plasma jet pipe 5 needs to provide the working gas, and therefore, the operation of the plasma jet pipe 5 can be controlled by controlling the working gas. However, since the plurality of discharge units are connected with the plurality of gas flow channels in a one-to-one correspondence manner, by arranging the controllable valves 3 on the plurality of gas flow channels, the working gas entering the discharge units, that is, the working gas entering the plasma jet pipe 5, is controlled by controlling the opening and closing of the controllable valves 3, so as to control the plasma jet pipe 5 to operate.
It should be noted that, by increasing the number of the plasma jet pipes 5, the area of the plasma jet discharge can be increased, but in order to process the surface of the small-sized material, the controllable valve 3 is provided to control one of the discharge units to discharge, so as to process the surface of the small-sized material.
To facilitate an understanding of the above, an explanation is made here.
2 discharge units, namely a first discharge unit and a second discharge unit are arranged, and 2 airflow channels, namely an airflow channel 1 and an airflow channel 2 are arranged at the same time, wherein the first discharge unit is connected with the airflow channel 1, and the second discharge unit is connected with the airflow channel 2.
When the surface of a large-size material needs to be treated, the gas flow channel 1 and the gas flow channel 2 are simultaneously opened through the controllable valve 3, so that the plasma jet pipes 5 in the first discharge unit and the second discharge unit perform plasma jet discharge.
When the surface of a small-size material needs to be treated, the airflow channel 1 is opened through the controllable valve 3, and the airflow channel 2 is closed, so that the plasma jet pipe 5 in the first discharge unit performs plasma jet discharge.
The device comprises an air supply module and a discharge module, wherein the air supply module comprises a controllable valve and a plurality of airflow channels; the discharge module comprises a plurality of discharge units, and each discharge unit comprises a plurality of plasma jet pipes; the discharge units are connected with the airflow channels in a one-to-one correspondence manner; the opening and closing of the plurality of gas flow channels is regulated by the controllable valve. By the adjustable plasma jet device, the number of the plasma jet pipes is increased, the working gas required by the plasma jet pipes is controlled by the controllable valve to carry out plasma jet discharge, and when the plasma jet device is used for treating the surface of a large-size material, the surface treatment efficiency of the large-size material is improved.
Further, a plurality of plasma jet pipes 5 are arranged according to a preset rule to form an array as the discharge unit.
It should be noted that, because the discharge unit is composed of a plurality of plasma jet pipes 5, the plurality of plasma jet pipes 5 are arranged according to a preset rule, and the plasma jet discharge area of the plurality of plasma jet pipes 5 can be conveniently controlled by the controllable valve 3.
Further, a plurality of plasma jet pipes 5 are uniformly arranged and grouped in an annular array to serve as the discharge unit.
It should be noted that, here, the plurality of plasma jet pipes 5 are uniformly arranged to form an annular array as the discharge unit, and it can be understood that the plurality of plasma jet pipes 5 form a concentric circle.
It should be further noted that the plurality of plasma jet pipes 5 may also be uniformly arranged to form a matrix array as the discharge unit, and in this application, the plasma jet pipes are not limited to be uniformly arranged to form a ring array or a rectangular array.
Further, as shown in fig. 2, the discharging module further includes: a high voltage electrode 6 and a ground electrode 7;
the high-voltage electrode 6 is matched with the discharge units;
the ground electrodes 7 are glued to the plasma jet pipes 5 in a one-to-one correspondence manner.
It should be noted that the high voltage electrode 6 is connected to a power supply to provide working conditions for the plurality of discharge cells.
It should be further noted that the ground electrodes 7 are glued to the plasma jet pipe 5 in a one-to-one correspondence manner, so that the ground electrodes 7 can be prevented from falling off. In the present application, it is preferable that the ground electrode is cemented together with the plasma jet pipe 5 by using epoxy resin, but it is not limited to that the epoxy resin cements the ground electrode 7 with the plasma jet pipe 5.
Further, the high voltage electrode 6 is a porous disc structure, and the holes correspond to the plasma jet pipes 5 one by one.
It should be noted that, the high voltage electrode 6 is designed into a porous disc structure, so that the holes on the disc correspond to the plasma jet pipes 5 one by one, a plurality of plasma jet pipes 5 can be conveniently placed according to a preset rule, and the problems that the positions of the plurality of plasma jet pipes 5 are disordered and the like in the carrying process of the plasma jet pipes 5 can be prevented.
Further, the high voltage electrode 6 is adjusted up and down relative to the ground electrode 7, and the high voltage electrode 6 is fixed through bolts.
It should be noted that, because the high voltage electrode 6 is a porous disc structure, and the holes correspond to the plasma jet pipes 5 one by one, the high voltage electrode 6 can be adjusted up and down relative to the ground electrode 7, so that the distance between the high voltage electrode 6 and the ground electrode 7 can be adjusted according to the requirement.
It should be noted that the high voltage electrode 6 is fixed by a bolt, so that the high voltage electrode 6 is prevented from moving relative to the ground electrode 7 during operation.
Further, the plasma jet pipe 5 includes: an inner glass wall 8 and an outer glass wall 9;
the diameter of the outer layer glass wall 9 is consistent with that of the hole, and the high-voltage electrode 6 is matched with the outer layer glass wall 9 to slide.
It should be noted that the diameter of the outer glass wall 9 is set to be consistent with the diameter of the hole, so that the outer glass wall 9 and the hole are in tolerance fit, and the high-voltage electrode 6 and the outer glass wall 9 can be in fit sliding.
Further, the gas supply module further includes: a current equalizer 4;
one end of each of the airflow channels is connected with the discharge units, and the other end of each of the airflow channels is connected with the current equalizer 4.
It should be noted that the current equalizer provides stable working gas for the plurality of discharge cells through the plurality of gas flow channels, and therefore, by providing the current equalizer 4 at the other end of the plurality of gas flow channels, the plasma jet discharge areas of the plasma jet tubes 5 in the plurality of discharge cells can be made to be the same.
Further, the adjustable plasma jet apparatus further comprises: a recoverer;
the recoverer is connected with the airflow channels and used for recovering working gas in the airflow channels.
It should be noted that after the operation of the plasma jet pipe 5 is completed, the working gas exists in the plurality of gas flow channels, and in order to prevent the waste of the working gas, the recoverers are connected to the plurality of gas flow channels to recover the working gas in the plurality of gas flow channels, thereby achieving the purpose of saving energy.
Referring to fig. 1, a spray coating system provided for an embodiment of the present application includes: an adjustable plasma jet device.
The adjustable plasma jet apparatus comprising: the device comprises an air supply module and a discharge module;
the gas supply module comprises a controllable valve 3 and a plurality of gas flow channels;
the discharge module comprises a plurality of discharge units, and each discharge unit comprises a plurality of plasma jet pipes 5;
the discharge units are connected with the airflow channels in a one-to-one correspondence manner;
the opening and closing of the plurality of gas flow channels is regulated by the controllable valve 3.
The air supply module of the embodiment of the application comprises a controllable valve and a plurality of air flow channels; the discharge module comprises a plurality of discharge units, and each discharge unit comprises a plurality of plasma jet pipes; the discharge units are connected with the airflow channels in a one-to-one correspondence manner; the opening and closing of the plurality of gas flow channels is regulated by the controllable valve. Through the adjustable plasma jet device disclosed above, the number of the plasma jet pipes is increased, the working gas required by the plasma jet pipes is controlled through the controllable valve to control the plasma jet pipes to perform plasma jet discharge, and when the plasma jet device is used for surface treatment of large-size materials, the surface treatment efficiency of the large-size materials is improved.
Based on the embodiments provided above, referring to fig. 1 and fig. 2, the present solution is further described below with reference to specific embodiments:
the scheme comprises a discharge module and an air supply module.
The discharge module is composed of a plasma jet pipe 5, a high-voltage electrode 6 and a ground electrode 7. The plasma jet pipe 5 is a quartz glass pipe with the length of 15cm, the radius of the inner layer glass wall 8 is 0.5mm, and the radius of the outer layer glass wall 9 is 1 mm. Copper foil is used as a ground electrode 7, the width of the electrode is 1cm, and the ground electrode is cemented with a plasma jet pipe through epoxy resin. A copper porous disc is used as a high-voltage electrode 6, the height of the high-voltage electrode disc is 1mm, the diameter of the aperture is consistent with the outer diameter of the jet pipe, the disc electrode is adjustable up and down, the periphery of the disc electrode is reinforced through bolts, and the high-voltage electrode is externally connected with a power supply. A plurality of plasma jet pipes are uniformly arranged to form a group of annular array discharge units, each discharge unit is connected with a ballast resistor in series to limit large current, and a plurality of groups of annular arrays form a plasma jet shower nozzle.
The air supply module consists of a plurality of groups of airflow channels (airflow channel 1 and airflow channel 2), controllable valves 3 and flow equalization 4. And the air flow channels are provided with a group of annular arrays, one end of each air flow channel supplies air to the jet pipe, the other end of each air flow channel is connected with the recoverer, each air flow channel is provided with a controllable valve, and the opening and closing of each air flow channel are realized by controlling the valves.
The device is not limited to two groups of airflow channels and annular arrays, and each group of airflow channels, the controllable valves and the annular arrays correspond to one gear and can be sequentially expanded.
The specific working process is as follows:
1. and adjusting the control valve to select gears according to the size of the material to be treated.
2. And adjusting the height of the high-voltage electrode according to actual conditions.
3. And introducing working gas to enable the working gas to enter the plasma jet pipe annular array along different gas flow channels.
4. Starting the high-voltage power supply, and adjusting the power supply voltage to the tube to generate plasma.
5. And (5) treating the surface of the material.
In summary, the present invention relates to a shower head type jet array plasma spraying device with an adjustable processing area, which mainly comprises a discharge module and an air supply module. A group of annular arrays are formed by uniformly arranging a plurality of plasma jet pipes and serve as discharge units, and the plurality of groups of annular array discharge units form a plasma jet shower nozzle. The shower nozzle device shares a round porous high-voltage electrode, the distance between the high-voltage electrode and the ground electrode is adjustable, and each group of annular array discharge units is connected with a corresponding airflow channel. This device increases and decreases the quantity of air current passageway through the opening and shutting of control flap to control annular array unit number, effectively handle the material surface of equidimension not, realize each size material surface treatment full coverage, improve and use the flexibility.
The embodiments in the present specification are described in a progressive manner, and the same and similar parts among the embodiments are referred to each other, and each embodiment focuses on the differences from the other embodiments. The previous description of the disclosed embodiments is provided to enable any person skilled in the art to make or use the present invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the spirit or scope of the invention. Thus, the present invention is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims (10)

1. A tunable plasma-jet device, comprising: the device comprises an air supply module and a discharge module;
the gas supply module comprises a controllable valve (3) and a plurality of gas flow channels;
the discharge module comprises a plurality of discharge units, and each discharge unit comprises a plurality of plasma jet pipes (5);
the discharge units are connected with the airflow channels in a one-to-one correspondence manner;
the opening and closing of the plurality of air flow channels are adjusted by the controllable valve (3).
2. The device according to claim 1, wherein a plurality of plasma jet pipes (5) are arranged according to a preset rule to form an array as the discharge unit.
3. The device according to claim 2, characterized in that a plurality of said plasma jet tubes (5) are uniformly arranged to form a ring array as said discharge unit.
4. The apparatus of claim 1, wherein the discharge module further comprises: a high voltage electrode (6) and a ground electrode (7);
the high-voltage electrode (6) is matched with the discharge units;
the ground electrodes (7) are glued to the plasma jet pipes (5) in a one-to-one correspondence mode.
5. The device according to claim 4, characterized in that the high voltage electrode (6) is a porous structure, and each hole corresponds to one plasma jet pipe (5).
6. A device according to claim 5, characterized in that the high voltage electrode (6) is movable in the axial direction of the hole relative to the ground electrode (7) and is fixed by means of bolts.
7. The device according to claim 5, characterized in that the plasma jet tube (5) comprises: an inner glass wall (8) and an outer glass wall (9);
the diameter of the outer layer glass wall (9) is consistent with that of the hole, and the high-voltage electrode (6) is matched with the outer layer glass wall (9) to slide.
8. The apparatus of claim 1, wherein the gas supply module further comprises: a current equalizer (4);
one end of each airflow channel is connected with the discharge units, and the other end of each airflow channel is connected with the current equalizer (4).
9. The apparatus of claim 1, further comprising: a recoverer;
the recoverer is connected with the airflow channels and used for recovering working gas in the airflow channels.
10. A spray coating system comprising the adjustable plasma jet device of any of claims 1-9.
CN201911165899.1A 2019-11-25 2019-11-25 Adjustable plasma jet device and spraying system Pending CN110944441A (en)

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112930016A (en) * 2021-01-26 2021-06-08 山东大学 Medical instrument sterilization and disinfection device and method based on low-temperature plasma
CN113163566A (en) * 2021-04-27 2021-07-23 常州大学 Device and method for modifying carbon material by plasma
CN113923846A (en) * 2021-10-29 2022-01-11 河北大学 Device and method for generating one-dimensional plasma photonic crystal by using jet array
CN113993265A (en) * 2021-10-21 2022-01-28 广州大学 Atmospheric pressure plasma jet array device with coupling between jets
CN114040560A (en) * 2021-11-19 2022-02-11 国网重庆市电力公司电力科学研究院 Rotatable formula plasma efflux generating device

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CN106034371A (en) * 2016-06-17 2016-10-19 西安交通大学 Material treatment device with plasma jet array cooperating with mechanical rotational motion
CN108396311A (en) * 2018-05-18 2018-08-14 宁波英飞迈材料科技有限公司 High-throughput PECVD device and method
CN109600900A (en) * 2019-01-23 2019-04-09 电子科技大学 A kind of plasma jet array inhomogeneous plasma generation device
CN112930016A (en) * 2021-01-26 2021-06-08 山东大学 Medical instrument sterilization and disinfection device and method based on low-temperature plasma

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Publication number Priority date Publication date Assignee Title
CN1863429A (en) * 2006-06-22 2006-11-15 大连理工大学 Double hole type atmos glow discharge low-temp plasma source
CN104624138A (en) * 2015-02-04 2015-05-20 中国科学院电工研究所 Device and method for uniformly treating aqueous solution by utilizing plasma jet array
CN106034371A (en) * 2016-06-17 2016-10-19 西安交通大学 Material treatment device with plasma jet array cooperating with mechanical rotational motion
CN108396311A (en) * 2018-05-18 2018-08-14 宁波英飞迈材料科技有限公司 High-throughput PECVD device and method
CN109600900A (en) * 2019-01-23 2019-04-09 电子科技大学 A kind of plasma jet array inhomogeneous plasma generation device
CN112930016A (en) * 2021-01-26 2021-06-08 山东大学 Medical instrument sterilization and disinfection device and method based on low-temperature plasma

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112930016A (en) * 2021-01-26 2021-06-08 山东大学 Medical instrument sterilization and disinfection device and method based on low-temperature plasma
CN113163566A (en) * 2021-04-27 2021-07-23 常州大学 Device and method for modifying carbon material by plasma
CN113993265A (en) * 2021-10-21 2022-01-28 广州大学 Atmospheric pressure plasma jet array device with coupling between jets
CN113923846A (en) * 2021-10-29 2022-01-11 河北大学 Device and method for generating one-dimensional plasma photonic crystal by using jet array
CN113923846B (en) * 2021-10-29 2024-02-23 河北大学 Device and method for generating one-dimensional plasma photonic crystal by using jet array
CN114040560A (en) * 2021-11-19 2022-02-11 国网重庆市电力公司电力科学研究院 Rotatable formula plasma efflux generating device

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Application publication date: 20200331