CN113979787B - 一种高耐磨渗花瓷质抛光砖及其制备方法 - Google Patents
一种高耐磨渗花瓷质抛光砖及其制备方法 Download PDFInfo
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Abstract
本发明公开一种高耐磨渗花瓷质抛光砖及其制备方法。所述制备方法包括以下步骤:在坯体表面施高膨胀面釉;所述高膨胀面釉的化学组成包括:以质量百分比计,SiO2:60%~79%,Al2O3:23%~29%,碱土金属氧化物:0.2%~0.6%,碱金属氧化物:5.1%~7.1%;在施高膨胀面釉后的坯体表面施渗花面釉;在施渗花面釉后的坯体表面喷墨打印渗花墨水;将喷墨打印渗花墨水后的坯体烧成并抛光,得到所述高耐磨渗花瓷质抛光砖。
Description
技术领域
本发明涉及建筑陶瓷技术领域,特别涉及一种高耐磨渗花瓷质抛光砖及其制备方法。
背景技术
喷墨渗花瓷砖因面釉层所含碱土金属含量低,促使釉面硬度明显优于普通抛釉类产品,几乎接近抛光砖。但在长期使用过程中,喷墨渗花瓷砖的表面仍会出现明显划痕和磨花缺陷。如何提高瓷质砖表面的硬度仍然是喷墨渗花瓷砖面临的难题。
发明内容
针对上述问题,本发明提供一种高耐磨渗花瓷质抛光砖及其制备方法,所述方法通过调整高膨胀面釉和渗透面釉的釉料配方和施釉工艺,在保证渗透性能的基础上实现提高釉层的耐磨性。
第一方面,本发明提供一种高耐磨渗花瓷质抛光砖的制备方法。所述制备方法包括以下步骤:
在坯体表面施高膨胀面釉;所述高膨胀面釉的化学组成包括:以质量百分比计,SiO2:60%~79%,Al2O3:23%~29%,碱土金属氧化物:0.2%~0.6%,碱金属氧化物:5.1%~7.1%;
在施高膨胀面釉后的坯体表面施渗花面釉;
在施渗花面釉后的坯体表面喷墨打印渗花墨水;
将喷墨打印渗花墨水后的坯体烧成并抛光,得到所述高耐磨渗花瓷质抛光砖。
较佳地,所述高膨胀面釉烧成后的吸水率控制在2~6wt%。
较佳地,所述高膨胀面釉的比重为1.32~1.38,施加量为160~250克/平方米。
较佳地,所述高膨胀面釉在25~600℃的平均膨胀系数为8.9~9.3×10-6℃-1。
较佳地,所述渗花面釉的化学组成包括:以质量百分比计,SiO2:59%~69%,Al2O3:15%~25%,碱土金属氧化物:0.5%~4%,碱金属氧化物:4.7%~7.3%,ZrO2:3.5%~16%。
较佳地,所述渗花面釉的比重为1.76~1.85,施加量为575~675克/平方米。
较佳地,所述渗花面釉的原料组成包括:以重量份计,钾长石18~35份,钠长石10~30份,水洗高岭土4~12份,煅烧高岭土2~10份,石英2~12份,高锆熔块15~35份,亚微米级氧化锆3~10份,超细氧化铝3~10份,烧滑石3~12份,纳米二氧化硅2~5份,钛白粉0.3~0.6份。
较佳地,所述高锆熔块以硅酸锆的形式引入锆,化学组成包括:以质量百分比计,SiO2:55%~69%,Al2O3:5%~12%,MgO:0.4%~4.5%,K2O:0.5%~4.5%,Na2O:2.2%~3.8%,ZrO2:20%~31%。
较佳地,坯体在25~600℃的平均膨胀系数为8.5~8.9×10-6℃-1;渗花面釉在25~600℃平均膨胀系数8.0~8.4×10-6℃-1。
第二方面,本发明还提供上述任一项所述的制备方法获得的高耐磨渗花瓷质抛光砖。
附图说明
图1是对比例1抛光前砖面的痱子效果图;
图2是对比例1抛光后砖面的针孔效果图。
具体实施方式
通过下述实施方式进一步说明本发明,应理解,下述实施方式仅用于说明本发明,而非限制本发明。在没有特殊说明的情况下,各百分含量指质量百分含量。
以下示例性说明本发明所述高耐磨渗花瓷质抛光砖的制备方法。
制备坯体。坯体的化学组成不受限制,采用本领域常规的坯体配方即可。一些实施方式中,所述坯体的化学组成包括:以质量百分比计,SiO2:60%~69%,Al2O3:17%~23%,碱土金属氧化物:0.6%~1.5%,碱金属氧化物:3.4%~7.0%。作为示例,所述坯体的化学组成包括:以质量百分比计,SiO2:60.9%~68.8%,Al2O3:17.5%~23%,Fe2O3:0.3%~0.8%,TiO2:0.1%~0.4%,CaO:0.2%~0.5%,MgO:0.4%~1.0%,K2O:1.95%~3.2%,Na2O:2.5%~3.8%,烧失:3.9%~6.1%。
上述坯体的原料组成包括:以重量份计,钠长石10~20份,水洗球土15~25份,低温砂6~13份,中温沙10~18份,膨润土1~6份,黑滑石0.3~3份,黑泥5~10份。按照上述配料称量各原料,加水球磨均匀,除铁过筛后,喷粉造粒,得到坯体粉料备用。
将坯体粉料经压机压制成型,干燥,得到所述坯体。干燥坯的水分控制在0.2~0.5wt%。
上述坯体在25~600℃的平均膨胀系数为8.5~8.9×10-6℃-1。
在坯体表面施高膨胀面釉。所述高膨胀面釉的化学组成包括:以质量百分比计,SiO2:60%~79%,Al2O3:23%~29%,碱土金属氧化物:0.2%~0.6%,碱金属氧化物:5.1%~7.1%。本发明通过高铝的方式来提高膨胀系数,这样能够调高釉料烧成温度,将高膨胀面釉烧成后的吸水率控制在2~6wt%。吸水率满足该要求时,釉中的石英仍然以游离的膨胀系数大的方石英态存在。若釉中的石英被溶解,会导致面釉的膨胀系数明显变小。虽然可以采用高钾或者高钠的方式来提高面釉的膨胀系数,但是这会导致降低釉料温度,起不到减少痱子的作用。
此外,将高膨胀面釉烧成后的吸水率控制在2.0~6.0wt%时,能够有效解决渗花面釉烧成过程中出现的痱子问题,提高产品质量。高温烧成时坯体原料中的杂质在渗花面釉熔融后仍会发生分解产生气泡,该气泡冲入渗花面釉层,由于渗花面釉层较厚且粘度较高,气泡未能冲破,在冷却后形成痱子。当加入高膨胀面釉后,由于高膨胀面釉有一定的吸水率,可将坯体原料中的杂质造成的气泡吸收在其中,并向高膨胀面釉层四周扩散,因此可解决痱子问题。
所述高膨胀面釉在25~600℃的平均膨胀系数为8.9~9.3×10-6℃-1。现有技术中通常利用各釉料的膨胀系数差异来形成裂纹装饰。但本发明中,高膨胀面釉由于具有较大的膨胀系数,促使坯体在降温过程中对渗花面釉的压应力大于无高膨胀面釉的情况下坯体对渗花面釉的压应力。而且,由于高膨胀面釉的施加量相较渗花面釉低,所以在促使渗花面釉表面压应力增强的情况下,可有效提高釉面耐磨性能,且该缓冲作用不会导致釉面或者釉层间裂纹的发生。
作为示例,所述高膨胀面釉的化学组成包括:以质量百分比计,SiO2:60.9%~78.8%,Al2O3:23.5%~29%,Fe2O3:0.1%~0.4%,TiO2:0.05%~0.2%,CaO:0.1%~0.3%,MgO:0.1%~0.3%,K2O:3.3%~4.5%,Na2O:1.8%~2.6%,烧失:2.8%~4.6%。
所述高膨胀面釉的原料组成包括:以重量份计,钾长石30~50份,钠长石10~20份,石英15~35份,氧化铝10~25份,(水洗)高岭土6~12份,煅烧高岭土3~15份。按照上述高膨胀面釉的配方配料球磨,过筛,除铁过筛后备用。浆料的细度控制在325目的筛余为0.6~1.0wt%。
所述高膨胀面釉的施加方式为喷釉。喷釉前坯体温度控制在80~90℃为宜。所述高膨胀面釉的比重为1.32~1.38,施加量为160~250克/平方米。高膨胀面釉的施加量过多,容易导致砖坯的吸水率偏大,烧成后砖坯易反变,出现明显翘曲。高膨胀面釉的施加量太少,则导致渗花面釉的表面压应力减小,耐磨性能降低,以及导致渗花面釉烧成出现痱子。
在施高膨胀面釉后的坯体表面施渗花面釉。所述渗花面釉的化学组成包括:以质量百分比计,SiO2:59%~69%,Al2O3:15%~25%,碱土金属氧化物:0.5%~4%,碱金属氧化物:4.7%~7.3%,ZrO2:3.5%~16%。作为示例,所述渗花面釉的化学组成包括:以质量百分比计,SiO2:59.8%~68.8%,Al2O3:15.5%~24.8%,Fe2O3:0.1%~0.2%,TiO2:0.45%~0.7%,CaO:0.1%~0.3%,MgO:0.4%~3.9%,K2O:3.2%~4.2%,Na2O:1.5%~3.1%,ZrO2:3.5%~15.5%,烧失:0.8%~1.8%。
所述渗花面釉的原料组成包括:以重量份计,钾长石18~35份,钠长石10~30份,水洗高岭土4~12份,煅烧高岭土2~10份,石英2~12份,高锆熔块15~35份,亚微米级氧化锆3~10份,超细氧化铝3~10份,烧滑石3~12份,纳米二氧化硅2~5份,钛白粉0.3~0.6份。
传统渗花面釉将硅酸锆以生料形式引入,坯体致密化和釉料玻璃化过程中排出气体推动釉面晶粒,造成硅酸锆在釉层表面局部聚集。将硅酸锆以锆熔块的形式引入,锆熔块釉中排气过程结束后硅酸锆仍持续从熔体中析出,没有发生聚集现象。且锆熔块中的硅酸锆晶粒尺寸比硅酸锆生料釉更小,晶体覆盖率更高。因此在抛光后表面耐磨层的硅酸锆晶粒不容易被摩擦失去而导致耐磨性能降低。
所述高锆熔块以硅酸锆的形式引入锆,化学组成包括:以质量百分比计,SiO2:55%~69%,Al2O3:5%~12%,MgO:0.4%~4.5%,K2O:0.5%~4.5%,Na2O:2.2%~3.8%,ZrO2:20%~31%。作为示例,所述高锆熔块的化学组成包括:以质量百分比计,SiO2:55.5%~68.2%,Al2O3:5.5%~11.5%,Fe2O3:0.05%~0.2%,TiO2:0.05%~0.15%,CaO:0.05%~0.2%,MgO:0.4%~4.5%,K2O:0.5%~4.5%,Na2O:2.2%~3.8%,ZrO2:20.5%~30.5%,烧失:0.02%~0.05%。
所述高锆熔块的原料组成包括:以重量份计,钾长石0.5~10份,钠长石20~40份,碳酸钾5~12份,滑石6~20份,硅酸锆30~50份。按照上述配方配料混匀置于1500~1560℃高温熔融2小时后淬冷,制成熔块,球磨至325目筛余全通过,备用。
渗花面釉中加入亚微米级氧化锆的作用是在釉的析晶过程中,外加氧化锆所需的活化能更低,更容易析出硅酸锆晶粒。若加入过量亚微米级氧化锆,则易导致釉层烧结温度太高,釉层中毛孔增多,耐磨性能降低,防污性能变差。
渗花面釉中加入超细氧化铝的作用是氧化铝能够提高玻璃网络结构中[AlO4]的数量,限制Si4+的扩散,从而抑制在玻璃相中析出的ZrO2生成ZrSiO4,实现亚微米级氧化锆与硅酸锆共存,从而提高耐磨性能。加入过量超细氧化铝,则也易导致釉层烧结温度太高,釉层中毛孔增多,降低其耐磨性能,以及防污性能变差。超细氧化铝的粒度为微米级或者纳米级。
渗透面釉中加入滑石的作用是烧结过程中降低釉层黏度,降低粒子与粒子之间收缩过程中的孔隙直径,减少烧成后毛孔的缺陷。且滑石中的Mg2+在和棕色渗花墨水中的Fe3+反应后仍为棕红色,不影响其发生性能。加入过量滑石,则因其碱土金属的性质导致耐磨性能降低。
所述渗花面釉在25~600℃平均膨胀系数8.0~8.4×10-6℃-1。
所述渗花面釉的施加方式为淋釉。所述渗花面釉的比重为1.76~1.85,施加量为575~675克/平方米。上述渗花面釉的流速为33~45秒。测定该流速的口杯直径为3.5mm(50mL)。
将施渗花面釉后的坯体烘干。烘干后坯体的水分控制0.6~1.0wt%。
在施渗花面釉后的坯体表面喷墨打印渗花墨水。渗花墨水的化学组成不受限制,采用本领域常用的渗花墨水即可。
将喷墨打印渗花墨水后的坯体烧成并抛光。最高烧成温度可为1160~1195℃,烧成时间可为65~85min。
磨边、分级后即可制得高耐磨渗花瓷质抛光砖。
下面进一步例举实施例以详细说明本发明。同样应理解,以下实施例只用于对本发明进行进一步说明,不能理解为对本发明保护范围的限制,本领域的技术人员根据本发明的上述内容作出的一些非本质的改进和调整均属于本发明的保护范围。下述示例具体的工艺参数等也仅是合适范围中的一个示例,即本领域技术人员可以通过本文的说明做合适的范围内选择,而并非要限定于下文示例的具体数值。
实施例1
高耐磨渗花瓷质抛光砖的制备方法包括以下步骤:
制备坯体。所述坯体的原料组成包括:以重量份计,钠长石15份,水洗球土19份,低温砂8份,中温沙15份,膨润土4份,黑滑石0.6份,黑泥8份。所述坯体的化学组成包括:以质量百分比计,SiO2:65.8%,Al2O3:21.3%,Fe2O3:0.63%,TiO2:0.28%,CaO:0.35%,MgO:0.62%,K2O:2.62%,Na2O:3.05%,烧失:4.92%。坯体在25~600℃的平均膨胀系数8.679×10-6℃-1。坯体经压机压制成型,干燥,烘干后水分为0.28wt%。
制备高膨胀面釉。所述高膨胀面釉的原料组成包括:以质量百分比计,钾长石36份,钠长石15份,石英25份,氧化铝12份,(水洗)高岭土6份,煅烧高岭土6份。所述高膨胀面釉的化学组成包括:以质量百分比计,SiO2:65.2%,Al2O3:25.1%,Fe2O3:0.13%,TiO2:0.09%,CaO:0.15%,MgO:0.16%,K2O:4.08%,Na2O:1.96%,烧失:3.2%。高膨胀面釉在25~600℃的平均膨胀系数9.023×10-6℃-1。
将高膨胀面釉喷施在坯体上。高膨胀面釉的比重为1.35,施加量为205克/平方米。
制备渗花面釉。所述渗花面釉的原料组成包括:以重量份计,钾长石19.5份,钠长石12份,(水洗)高岭土7份,煅烧高岭土4份,石英4份,高锆熔块30份,亚微米级氧化锆6份,超细氧化铝5份,烧滑石8份,纳米二氧化硅4份,钛白粉0.5份。所述渗花面釉的化学组成包括:以质量百分比计,SiO2:60.08%,Al2O3:16.9%,Fe2O3:0.15%,TiO2:0.65%,CaO:0.13%,MgO:3.05%,K2O:3.02%,Na2O:2.25%,ZrO2:12.8%,烧失:1.02%。所述高锆熔块的原料组成包括:以重量份计,钾长石5份,钠长石35份,碳酸钾8份,滑石12份,硅酸锆40份。所述高锆熔块的化学组成包括:以质量百分比计,SiO2:59.08%,Al2O3:6.5%,Fe2O3:0.05%,TiO2:0.05%,CaO:0.05%,MgO:3.4%,K2O:3.48%,Na2O:3.51%,ZrO2:23.72%,烧失:0.02%。渗花面釉在25~600℃的平均膨胀系数8.139×10-6℃-1。
将渗花面釉淋在坯体上,比重为1.80,流速37秒,施加量为620克/平方米。
将坯体二次烘干,喷墨打印打印渗花墨水,烧成,经抛光、磨边、分级后即可制得高耐磨渗花瓷质抛光砖。
根据GB/T3810.7-2016标准测试高耐磨渗花瓷质抛光砖的耐磨性能、硬度和磨耗。所述耐磨渗花瓷质抛光砖耐磨性能4级,6000转,维氏硬度1223,12000转磨耗0.0312g。
实施例2
高耐磨渗花瓷质抛光砖的制备方法包括以下步骤:
制备坯体。所述坯体的原料组成包括:以重量份计,钠长石15份,水洗球土19份,低温砂8份,中温沙15份,膨润土4份,黑滑石0.6份,黑泥8份。所述坯体的化学组成包括:以质量百分比计,SiO2:65.8%,Al2O3:21.3%,Fe2O3:0.63%,TiO2:0.28%,CaO:0.35%,MgO:0.62%,K2O:2.62%,Na2O:3.05%,烧失:4.92%。坯体在25~600℃的平均膨胀系数8.679×10-6℃-1。坯体经压机压制成型,干燥,烘干后水分为0.28wt%。
制备高膨胀面釉。所述高膨胀面釉的原料组成包括:以质量百分比计,钾长石36份,钠长石15份,石英25份,氧化铝12份,(水洗)高岭土6份,煅烧高岭土6份。所述高膨胀面釉的化学组成包括:以质量百分比计,SiO2:65.2%,Al2O3:25.1%,Fe2O3:0.13%,TiO2:0.09%,CaO:0.15%,MgO:0.16%,K2O:4.08%,Na2O:1.96%,烧失:3.2%。高膨胀面釉在25~600℃的平均膨胀系数为9.023×10-6℃-1。
将高膨胀面釉喷施在坯体上。高膨胀面釉的比重为1.35,施加量为205克/平方米。
制备渗花面釉。所述渗花面釉的原料组成包括:以重量份计,钾长石30.5份,钠长石12份,(水洗)高岭土7份,煅烧高岭土4份,石英4份,高锆熔块20份,亚微米级氧化锆4份,超细氧化铝4份,烧滑石10份,纳米二氧化硅4份,钛白粉0.5份。所述渗花面釉的化学组成包括:以质量百分比计,SiO2:63.01%,Al2O3:16.92%,Fe2O3:0.14%,TiO2:0.63%,CaO:0.14%,MgO:3.85%,K2O:3.52%,Na2O:1.85%,ZrO2:8.75%,烧失:1.12%。所述高锆熔块的原料组成包括:以重量份计,钾长石5份,钠长石35份,碳酸钾8份,滑石12份,硅酸锆40份。所述高锆熔块的化学组成包括:以质量百分比计,SiO2:59.08%,Al2O3:6.5%,Fe2O3:0.05%,TiO2:0.05%,CaO:0.05%,MgO 3.4%,K2O:3.48%,Na2O:3.51%,ZrO2:23.72%,烧失:0.02%。渗花面釉在25~600℃的平均膨胀系数为8.203×10-6℃-1。
将渗花面釉淋在坯体上,比重为1.80,流速37秒,施加量为620克/平方米。
将坯体二次烘干,喷墨打印打印渗花墨水,烧成,经抛光、磨边、分级后即可制得高耐磨渗花瓷质抛光砖。
根据GB/T3810.7-2016标准测试高耐磨渗花瓷质抛光砖的耐磨性能、硬度和磨耗。所述耐磨渗花瓷质抛光砖耐磨性能4级,6000转,维氏硬度1005,12000转磨耗0.0516g。
对比例1
渗花瓷质抛光砖的制备方法包括以下步骤:
制备坯体。所述坯体的原料组成包括:以重量份计,钠长石15份,水洗球土19份,低温砂8份,中温沙15份,膨润土4份,黑滑石0.6份,黑泥8份。所述坯体的化学组成包括:以质量百分比计,SiO2:65.8%,Al2O3:21.3%,Fe2O3:0.63%,TiO2:0.28%,CaO:0.35%,MgO:0.62%,K2O:2.62%,Na2O:3.05%,烧失:4.92%。坯体在25~600℃的平均膨胀系数8.679×10-6℃-1。坯体经压机压制成型,干燥,烘干后水分为0.28wt%。
制备渗花面釉。所述渗花面釉的原料组成包括:以重量份计,钾长石19.5份,钠长石12份,高岭土7份,煅烧高岭土4份,石英4份,高锆熔块30份,亚微米级氧化锆6份,超细氧化铝5份,烧滑石8份,纳米二氧化硅4份,钛白粉0.5份。所述渗花面釉的化学组成包括:以质量百分比计,SiO2:60.08%,Al2O3:16.9%,Fe2O3:0.15%,TiO2:0.65%,CaO:0.13%,MgO:3.05%,K2O:3.02%,Na2O:2.25%,ZrO2:12.8%,烧失1.02%。所述高锆熔块的原料组成包括:以重量份计,钾长石5份,钠长石35份,碳酸钾8份,滑石12份,硅酸锆40份。所述高锆熔块的化学组成包括:以质量百分比计,SiO2:59.08%,Al2O3:6.5%,Fe2O3:0.05%,TiO2:0.05%,CaO:0.05%,MgO:3.4%,K2O:3.48%,Na2O:3.51%,ZrO2:23.72%,烧失:0.02%。渗花面釉在25~600℃的平均膨胀系数为8.139×10-6℃-1。
将渗花面釉淋在坯体上,比重为1.80,流速37秒,施加量为620克/平方米。
将坯体二次烘干,喷墨打印打印渗花墨水,烧成,经抛光、磨边、分级后即可制得高耐磨渗花瓷质抛光砖。
根据GB/T3810.7-2016标准测试高耐磨渗花瓷质抛光砖的耐磨性能、硬度和磨耗。所述耐磨渗花瓷质抛光砖耐磨性能4级,6000转,维氏硬度1056,12000转磨耗0.0402g。当省略高膨胀面釉层时,渗花面釉层与坯体的膨胀系数更为接近,导致渗花面釉表面压应力降低,表面耐磨性能降低。且在未抛光前表面有痱子产生,抛光后有痱子抛穿后形成的针孔。
对比例2
渗花瓷质抛光砖的制备方法包括以下步骤:
制备坯体。所述坯体的原料组成包括:以重量份计,钠长石15份,水洗球土19份,低温砂8份,中温沙15份,膨润土4份,黑滑石0.6份,黑泥8份。所述坯体的化学组成包括:以质量百分比计,SiO2:65.8%,Al2O3:21.3%,Fe2O3:0.63%,TiO2:0.28%,CaO:0.35%,MgO:0.62%,K2O:2.62%,Na2O:3.05%,烧失:4.92%。坯体在25~600℃的平均膨胀系数8.679×10-6℃-1。坯体经压机压制成型,干燥,烘干后水分为0.28wt%。
制备传统渗花面釉。所述传统渗花面釉的原料组成包括:以重量份计,钾长石43.5份,钠长石12份,高岭土7份,煅烧高岭土23份,石英8份,纳米二氧化硅4份,钛白粉0.5份,硅酸锆2份。
将传统渗花面釉淋在坯体上,比重1.80,流速37秒,施加量为620克/平方米。
将坯体二次烘干,喷墨打印打印渗花墨水,烧成,经抛光、磨边、分级后即可制得高耐磨渗花瓷质抛光砖。
根据GB/T3810.7-2016标准测试高耐磨渗花瓷质抛光砖的耐磨性能、硬度和磨耗。所述耐磨渗花瓷质抛光砖耐磨性能4级,6000转,维氏硬度705,12000转磨耗0.1282g。且在未抛光前表面有痱子产生,抛光后有痱子抛穿后形成的针孔。
Claims (7)
1.一种高耐磨渗花瓷质抛光砖的制备方法,其特征在于,所述制备方法包括以下步骤:
制备坯体;坯体在25~600℃的平均膨胀系数为8.5~8.9×10-6 ℃-1;
在坯体表面施高膨胀面釉;所述高膨胀面釉的化学组成包括:以质量百分比计,SiO2:60%~79%,Al2O3:23%~29%,碱土金属氧化物:0.2%~0.6%,碱金属氧化物:5.1%~7.1%;所述高膨胀面釉在25~600℃的平均膨胀系数为8.9~9.3×10-6 ℃-1;所述高膨胀面釉烧成后的吸水率控制在2~6wt%;
在施高膨胀面釉后的坯体表面施渗花面釉;渗花面釉在25~600℃的平均膨胀系数为8.0~8.4×10-6 ℃-1;
在施渗花面釉后的坯体表面喷墨打印渗花墨水;
将喷墨打印渗花墨水后的坯体在1160~1195℃、烧成时间为65~85min下烧成并抛光,得到所述高耐磨渗花瓷质抛光砖。
2.根据权利要求1所述的制备方法,其特征在于,所述高膨胀面釉的比重为1.32~1.38,施加量为160~250克/平方米。
3.根据权利要求1所述的制备方法,其特征在于,所述渗花面釉的化学组成包括:以质量百分比计,SiO2:59%~69%,Al2O3:15%~25%,碱土金属氧化物:0.5%~4%,碱金属氧化物:4.7%~7.3%,ZrO2:3.5%~16%。
4.根据权利要求1所述的制备方法,其特征在于,所述渗花面釉的比重为1.76~1.85,施加量为575~675克/平方米。
5.根据权利要求1所述的制备方法,其特征在于,所述渗花面釉的原料组成包括:以重量份计,钾长石18~35份,钠长石10~30份,水洗高岭土4~12份,煅烧高岭土2~10份,石英2~12份,高锆熔块 15~35份,亚微米级氧化锆3~10份,超细氧化铝3~10份,烧滑石3~12份,纳米二氧化硅2~5份,钛白粉0.3~0.6份。
6.根据权利要求5所述的制备方法,其特征在于,所述高锆熔块以硅酸锆的形式引入锆,化学组成包括:以质量百分比计,SiO2:55%~69%,Al2O3:5%~12%,MgO:0.4%~4.5%,K2O:0.5%~4.5%,Na2O:2.2%~3.8%,ZrO2:20%~31%。
7.根据权利要求1至6中任一项所述的制备方法获得的高耐磨渗花瓷质抛光砖。
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