CN113970879A - Exposure device - Google Patents
Exposure device Download PDFInfo
- Publication number
- CN113970879A CN113970879A CN202110269908.2A CN202110269908A CN113970879A CN 113970879 A CN113970879 A CN 113970879A CN 202110269908 A CN202110269908 A CN 202110269908A CN 113970879 A CN113970879 A CN 113970879A
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- China
- Prior art keywords
- substrate
- conveyor belt
- exposure
- exposure apparatus
- guide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H20/00—Advancing webs
- B65H20/10—Advancing webs by a feed band against which web is held by fluid pressure, e.g. suction or air blast
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H23/00—Registering, tensioning, smoothing or guiding webs
- B65H23/02—Registering, tensioning, smoothing or guiding webs transversely
- B65H23/032—Controlling transverse register of web
- B65H23/0322—Controlling transverse register of web by acting on edge regions of the web
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H2406/00—Means using fluid
- B65H2406/30—Suction means
- B65H2406/32—Suction belts
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H2701/00—Handled material; Storage means
- B65H2701/10—Handled articles or webs
- B65H2701/19—Specific article or web
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Fluid Mechanics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Gas-Filled Discharge Tubes (AREA)
- Electronic Switches (AREA)
- Magnetic Resonance Imaging Apparatus (AREA)
Abstract
The invention ensures the linearity of the relative movement of the exposure unit and the substrate and reduces the error during exposure. An exposure apparatus includes: a conveyor belt for conveying the substrate; an adsorption component which makes the substrate closely attached to the upper surface of the conveyor belt; an exposure unit that exposes the substrate; and a guide portion that suppresses displacement of the conveyor belt in a direction orthogonal to the conveying direction.
Description
Technical Field
The present invention relates to an exposure apparatus which can be applied to a direct exposure apparatus used in an exposure process of a substrate such as a PCB or an LCD panel.
Background
There is known a direct exposure apparatus (maskless exposure apparatus) which does not use a photomask in a photolithography process for manufacturing a substrate such as a printed circuit board, a semiconductor wafer, an LCD glass substrate, or the like. According to this direct exposure method, since a photomask is not required, it is advantageous in terms of cost, and high-precision exposure is possible. In the direct exposure apparatus, exposure over a range larger than a projection image of a light modulation element (a DMD (digital micromirror device) or the like) can be realized by performing exposure while relatively moving a substrate and an exposure unit.
The relative movement member is generally a mechanism for linearly moving an exposure stage holding a long substrate by using a linear motion guide. When exposing a pattern in a range larger (longer in the transport direction) than the exposure stage, patterns in a smaller range are connected to each other (see, for example, patent document 1). Further, as an exposure apparatus capable of continuously exposing a pattern over a wide range, a direct exposure apparatus has been proposed in which a long substrate is conveyed by a belt conveyor (see, for example, patent document 2).
Documents of the prior art
Patent document
Patent document 1: japanese patent laid-open publication No. 2016-224301
Patent document 2: japanese patent laid-open publication No. 2006 and 098720
Disclosure of Invention
Problems to be solved by the invention
In the exposure apparatus described in patent document 1, a positional deviation is likely to occur in the portion where the patterns are connected to each other, and a waiting time is generated by the reciprocating movement of the exposure stage, thereby lowering productivity. On the other hand, in the exposure apparatus of patent document 2, the amount of meandering of the belt is directly expressed as an error in the position or shape of the pattern. Since the substrate is moved by the belt conveyor in an irregular meandering manner of about 50 μm, an error occurs in the exposure position.
Accordingly, an object of the present invention is to provide an exposure apparatus that can expose a pattern to a substrate without distance limitation by a belt conveyor and can ensure linearity of relative movement between the substrate and an exposure section.
Means for solving the problems
The present invention provides an exposure apparatus, wherein the exposure apparatus comprises: a conveyor belt for conveying the substrate; an adsorption component which makes the substrate closely attached to the upper surface of the conveyor belt; an exposure unit that exposes the substrate; and a guide portion that suppresses displacement of the conveyor belt in a direction orthogonal to the conveying direction.
Further, the present invention provides an exposure apparatus, comprising: a conveyor belt for conveying the substrate; an adsorption component which makes the substrate closely attached to the upper surface of the conveyor belt; an exposure unit that exposes the substrate; a guide slider engaged with a portion near at least one side surface of the conveyor belt; and a guide section provided in the vicinity of one side surface of the conveyor belt, the guide section guiding the guide slider along a shape formed on the one side surface of the conveyor belt.
ADVANTAGEOUS EFFECTS OF INVENTION
According to at least one embodiment of the present invention, linearity of relative movement between the substrate and the exposure section when the substrate is conveyed by the belt conveyor can be ensured. The effect described herein is not limited to this, and may be any effect described in the present invention. The present invention is not to be interpreted in a limiting sense by the effect illustrated.
Drawings
Fig. 1 is a front view showing an overall schematic configuration of an embodiment of the present invention.
Fig. 2 is an enlarged top view of a portion of an embodiment of the present invention.
Description of the reference numerals
W, a long substrate; 10. an exposure unit; 20. a belt conveyor unit; 21. a conveyor belt; 23. a substrate adsorption stage; 25. an annular guide rail; s, guiding a sliding block; C. with a mating fitting.
Detailed Description
Hereinafter, embodiments and the like of the present invention will be described with reference to the drawings. The embodiments and the like described below are preferable specific examples of the present invention, and the contents of the present invention are not limited to the above embodiments and the like.
As shown in fig. 1, a direct exposure apparatus 1 according to an embodiment of the present invention includes an exposure unit 10 as an exposure means and a belt conveyor unit 20 that conveys a long substrate (e.g., a flexible printed circuit board) W in a belt shape as a flexible recording medium. One embodiment is an exposure apparatus of a roll-to-roll system.
The long substrate W is a sheet-like substrate made of a copper-clad laminate or the like coated with a photosensitive material such as a photoresist, and has a length of several tens to several hundreds of meters. After exposure, the substrate is subjected to processes such as development, etching, and cutting, and is used as a base material for a flexible printed wiring board, for example. The moving direction (conveying direction M) of the long substrate W is defined as an X direction, a direction (thickness direction) orthogonal to the long substrate W is defined as a Z direction, and a direction orthogonal to both the X direction and the Z direction is defined as a Y direction.
The exposure unit 10 includes a plurality of exposure heads 11 regularly disposed at positions vertically above the long substrate W by a predetermined distance. A light source and an illumination optical system are arranged for each exposure head, and light emitted from the light source is introduced into the corresponding exposure head 11 through the corresponding illumination optical system. Each exposure head includes a DMD (Digital Micro-mirror Device) in which a plurality of micromirrors are two-dimensionally arranged, and an imaging optical system for forming an image of the DMD on a long substrate.
The belt conveyor unit 20 is provided to convey a long substrate W in a direction M from the left side toward the right side when viewed in the drawing. The conveyor belt 21 is a metal belt having a structure with air permeability, and is, for example, a mesh-like stainless steel belt having many fine through holes formed therein. Further, the conveyor belt 21 is desirably a metal belt (stainless steel belt) which is not easily elongated and has low dustiness.
A long substrate W is placed on the upper surface of the conveyor belt 21, and a substrate suction table 23 indicated by a broken line brings the long substrate W into close contact with the conveyor belt 21. That is, the substrate suction table 23 sucks air through the through holes of the conveyor belt 21, thereby bringing the long substrate W into close contact with the upper surface of the conveyor belt 21. The conveyor belt 21 is an endless belt wound between a conveyor belt driving roller 22a and a conveyor belt driving roller 22 b.
The long substrate W is supplied from the substrate reel-out section 30 to the belt conveyor unit 20, and after exposure, is wound up from the belt conveyor unit 20 by the substrate winding-up section 40. The substrate unwinding section 30 includes a substrate unwinding reel 31 on which the unexposed long substrate W is wound, a dancer roller 32 functioning as a buffer, and a roller 33a and a roller 33b constituting a substrate meandering correction mechanism. The substrate winding unit 40 includes a substrate winding roll 41 for winding the long substrate W after the exposure process and a dancer roller 42 serving as a substrate buffer. The dancer rollers 32 and 42 function as tension setting means, and thus the long substrate W is stably conveyed on the conveyor belts 21 on the conveying path without being loosened.
Further, an alignment camera 50 is disposed upstream of the exposure unit 10, and a correction scale unit 51 is disposed in the long substrate winding unit 40. The alignment camera 50 detects an end portion or a mark of the long substrate W, detects a relative positional displacement amount of the long substrate W and the exposure unit 10, and corrects the exposure process of the exposure unit 10. The correction scale unit 51 is provided for making the exposure amount appropriate. The long substrate W is supported by a plurality of support rollers, but the long substrate W is supported by the belt conveyor 20 in the vicinity of the alignment camera 50 and the exposure head 11.
In this way, the long substrates W are continuously conveyed in the fixed conveying direction while maintaining the state in which the long substrates W are attracted to the conveyor belts 21. Since the exposure process can be performed while continuously driving the conveyor belt 21, the exposure process can be continuously performed, and productivity can be improved. Further, since the long substrate W is closely attached to the conveyor belt 21 having a high planarity, the relative positional relationship between the long substrate W and the exposure head of the exposure unit 10 can be maintained constant.
Fig. 2 is a plan view of the belt conveyor unit 20 as viewed from above. The exposure head 11 and the alignment camera 50 are not components of the belt conveyor unit 20, but are described for reference. In fig. 1, the frame 24 for fixing the annular rail 25 is omitted.
The belt driving motor DMa rotates the belt driving roller 22a, and the belt driving motor DMb rotates the belt driving roller 22b, thereby moving (rotating) the belt 21. The moving amount of the conveyor belt 21 can be calculated by detecting the rotation amount of the conveyor belt drive motor DMa and the rotation amount of the conveyor belt drive motor DMb. The moving amount of the conveyor belt 21 is used as relative position information when the exposure unit 10 controls the DMD.
Even in a belt conveyor including an Edge Position Controller (EPC), there is an irregular belt meandering of about 50 μm in the Y direction (width direction of the conveyor belt 21) in general. On the other hand, the direct exposure apparatus uses, for example, exposure position accuracy of ± 5 μm or less and line width variation of ± 1 μm or less as tolerance errors. Therefore, in order to prevent the deterioration of the exposure position accuracy and the line width accuracy, a guide mechanism for ensuring the linearity of the movement of the conveyor belt 21 is required.
In one embodiment of the present invention, a frame 24 is provided in the vicinity of one side surface of the conveyor belt 21, and an endless guide rail 25 having a shape along the track of the conveyor belt 21 is attached to the frame 24. That is, the endless guide 25 has a shape identical or similar to the shape of the loop formed on one side surface of the conveyor belt 21. A metal guide slider S as a guide portion is slidably attached to the annular guide rail 25. The plurality of guide sliders S are mounted with the metal annular guide rail 25 as a shaft via a linear motion bearing, for example, a ball bearing.
The guide slider S and the vicinity of the side surface of the conveyor belt 21 other than the region on which the long substrate W is placed are joined by a belt joint member C as a joint portion. The belt fitting C may be configured integrally with the guide slider S or may be a separate member from the guide slider S. Therefore, the displacement (meandering) of the conveyor belt 21 in the Y direction is restricted, and the conveyor belt 21 can move in the X direction (and the Z direction) along the endless guide 25.
The belt joining metal fitting C has a protruding portion protruding from the guide slider S, and the conveyor belt 21 and the guide slider S are joined by fitting (locking) the protruding portion in an air vent provided in the conveyor belt 21. With such a structure, the joint state between the conveyor belt 21 and the guide slider S is easily released, and the replacement work associated with the consumption of the conveyor belt 21 is easily performed. Instead of the fitting, the conveyor belt 21 and the guide slider S may be joined by adhesion, welding, fastening with a bolt, or the like.
The endless guide rail 25 is configured such that the bearing of the guide slider S is pressed at least in a section D in fig. 1 (a section between the conveyor belt driving roller 22a and the conveyor belt driving roller 22b where the long substrate W is in close contact with the upper surface of the conveyor belt 21), and the conveyor belt moves linearly with high accuracy. Except for the section D, the guide slider S may be held so as not to fall off the annular guide rail 25, and pressure is not required.
According to the above-described embodiment of the present invention, in the section (D) where the long substrate W is in close contact with the upper surface of the conveyor belt 21, the linearity of the relative movement between the long substrate W and the exposure head 11 can be ensured, and the error during exposure can be made small. Further, the endless guide rails may be provided near both side surfaces of the conveyor belt 21 to guide both ends of the conveyor belt 21.
The exposure device of the invention can expose the pattern with unlimited length. The unlimited length is a length unlimited by factors other than the length of the supplied substrate, and for example, the exposure apparatus draws a pattern over 6 m. At this time, the exposure apparatus performs an exposure operation in the following steps.
Step 1: the alignment camera 50 detects an end portion or a mark of the long substrate W, and detects a relative positional displacement amount of the long substrate W and the exposure unit 10. The substrate end portion or the mark may be detected while the long substrate W is stationary, or the long substrate W may be moved in the conveyance direction M while the conveyor belt 21 is rotated.
Step 2: the drawing coordinates are corrected based on the amount of relative positional displacement of the substrate W and the exposure unit 10. At the same time, the drawing pattern is scaled according to the substrate.
And step 3: the long substrate W is moved in the transport direction M by rotating the conveyor belt 21 while operating the substrate adsorption stage 23, and the drawing pattern data is transferred to the DMD of the exposure unit 10 and sequentially modulated by the DMD in accordance with the movement of the conveyor belt 21. Light emitted from the light source of the exposure unit 10 is modulated by the DMD and projected onto the long substrate W from the emission end of the exposure head 11, thereby performing pattern exposure with respect to the photoresist on the long substrate W. Since the long substrate is moved by the rotation of the conveyor belt 21, it is possible to perform pattern exposure of an unlimited length.
In order to secure the processing time of the drawing data, the pattern exposure operation of an unlimited length may be temporarily stopped in the middle. In addition, the alignment camera 50 may check the positions of a plurality of marks provided in the middle of exposure of the unlimited length pattern. Alternatively, the alignment camera 50 may always check the position of the substrate end face during exposure.
The embodiments of the present invention have been described above specifically, but the present invention is not limited to the above embodiments, and various modifications can be made based on the technical idea of the present invention. In addition, as for the modified form, one form or a plurality of forms selected arbitrarily can be appropriately combined. The structures, methods, steps, shapes, materials, numerical values, and the like of the above embodiments can be combined with each other without departing from the spirit of the present invention.
For example, the present invention can be applied to an exposure apparatus using a mask. The present invention is not limited to the configuration for exposing the long substrate, and even a substrate cut into a rectangular shape (panel shape) can be exposed by being placed on a conveyor belt in the same manner as the long substrate. In this case, conveyance members such as a substrate conveyor (handler) and a SCARA robot are provided instead of the substrate unwinding unit 30 and the substrate winding unit 40. In the above-described embodiment, the conveyor belt 21 is an endless belt and the endless guide 25 is formed in an endless shape, but one or both of them may be of a roll-to-roll type.
Claims (8)
1. An exposure apparatus, wherein,
the exposure apparatus includes:
a conveyor belt for conveying the substrate;
an adsorption member for closely adhering the substrate to the upper surface of the conveyor belt;
an exposure unit that exposes the substrate; and
a guide portion that suppresses displacement of the conveyor belt in a direction orthogonal to a conveying direction.
2. The exposure apparatus according to claim 1,
the guide portion is provided in the vicinity of at least one side surface of the conveyor belt,
a guide slider engaged with a portion near one side surface of the conveyor belt is slidably attached to the guide portion.
3. The exposure apparatus according to claim 1,
the substrate is a long substrate.
4. The exposure apparatus according to claim 1,
the conveyor belt is an endless belt wound between a plurality of rollers.
5. The exposure apparatus according to claim 4,
the guide portion is formed in substantially the same shape as a loop shape formed on one side surface of the endless belt.
6. The exposure apparatus according to claim 1,
the suction member is configured to suck the substrate through a plurality of through holes formed in the conveyor belt, and the guide slider has a projection configured to be locked in the through hole.
7. The exposure apparatus according to claim 1,
the guide slider is attached to the guide portion via a bearing, and presses the bearing in a section where the substrate is brought into close contact with the conveyor belt.
8. An exposure apparatus, wherein,
the exposure apparatus includes:
a conveyor belt for conveying the substrate;
an adsorption member for closely adhering the substrate to the upper surface of the conveyor belt;
an exposure unit that exposes the substrate;
a guide slider engaged with a portion near at least one side surface of the conveyor belt; and
and a guide section provided in the vicinity of one side surface of the conveyor belt, the guide section guiding the guide slider along a shape formed on the one side surface of the conveyor belt.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020124952A JP7446687B2 (en) | 2020-07-22 | 2020-07-22 | direct exposure equipment |
| JP2020-124952 | 2020-07-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN113970879A true CN113970879A (en) | 2022-01-25 |
Family
ID=79586094
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202110269908.2A Pending CN113970879A (en) | 2020-07-22 | 2021-03-12 | Exposure device |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP7446687B2 (en) |
| KR (1) | KR20220012161A (en) |
| CN (1) | CN113970879A (en) |
| TW (1) | TWI839598B (en) |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03113339U (en) * | 1990-03-08 | 1991-11-19 | ||
| JP3632734B2 (en) | 1998-10-27 | 2005-03-23 | 富士ゼロックス株式会社 | Belt conveying apparatus and image forming apparatus using the same |
| JP2002053239A (en) | 2000-08-04 | 2002-02-19 | Noritsu Koki Co Ltd | Meandering preventive device of carrying belt |
| JP2006098720A (en) | 2004-09-29 | 2006-04-13 | Fuji Photo Film Co Ltd | Drawing apparatus |
| KR100672470B1 (en) | 2005-03-07 | 2007-01-24 | 엘지전자 주식회사 | Method for restricting mobility |
| JP4589198B2 (en) * | 2005-08-16 | 2010-12-01 | 富士フイルム株式会社 | Work conveying apparatus, image forming apparatus including the same, and work conveying method |
| JP6456631B2 (en) | 2014-09-03 | 2019-01-23 | 理想科学工業株式会社 | Sheet material conveying apparatus and inkjet printing apparatus |
| JP6554330B2 (en) | 2015-06-01 | 2019-07-31 | 株式会社オーク製作所 | Maskless exposure apparatus and exposure method |
| JP6818395B2 (en) | 2016-12-22 | 2021-01-20 | 株式会社オーク製作所 | Exposure device |
-
2020
- 2020-07-22 JP JP2020124952A patent/JP7446687B2/en active Active
-
2021
- 2021-02-19 KR KR1020210022379A patent/KR20220012161A/en active Search and Examination
- 2021-02-25 TW TW110106649A patent/TWI839598B/en active
- 2021-03-12 CN CN202110269908.2A patent/CN113970879A/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| TWI839598B (en) | 2024-04-21 |
| JP7446687B2 (en) | 2024-03-11 |
| TW202205023A (en) | 2022-02-01 |
| KR20220012161A (en) | 2022-02-03 |
| JP2022021416A (en) | 2022-02-03 |
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