CN113960823A - Display substrate and correction method of optical detection frame - Google Patents

Display substrate and correction method of optical detection frame Download PDF

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Publication number
CN113960823A
CN113960823A CN202111149099.8A CN202111149099A CN113960823A CN 113960823 A CN113960823 A CN 113960823A CN 202111149099 A CN202111149099 A CN 202111149099A CN 113960823 A CN113960823 A CN 113960823A
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alignment mark
display
substrate
mark
alignment
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CN113960823B (en
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张立志
郑浩旋
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HKC Co Ltd
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HKC Co Ltd
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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1306Details
    • G02F1/1309Repairing; Testing
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/133354Arrangements for aligning or assembling substrates

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

The application discloses display substrates and optical detection frame's correction method, display substrates includes substrate base plate and a plurality of counterpoint mark group, the substrate base plate has non-display area and is a plurality of display areas of matrix distribution, non-display area is located a plurality of display areas are at length or the ascending two opposite sides of width direction, counterpoint mark group includes first counterpoint mark and second counterpoint mark, and first counterpoint mark and/or second counterpoint mark at least part are located non-display area, first counterpoint mark with second counterpoint mark does not lie in the both sides of a plurality of display areas. This application counterpoint mark can avoid joining in marriage to liquid layer diffusion zone, avoids the counterpoint mark to be covered by joining in marriage the liquid layer for the counterpoint mark is easily fixed a position, conveniently snatchs, so, need not set up too many counterpoint marks, also can guarantee to successfully snatch suitable counterpoint mark, realizes the location to detecting the frame.

Description

Display substrate and correction method of optical detection frame
Technical Field
The application relates to the technical field of liquid crystal display panel manufacturing, in particular to a display substrate and a correction method of an optical detection frame.
Background
AOI (automated optical inspection) is called automatic optical inspection, and is based on the optical principle to inspect the common defects encountered in welding production. After the box-aligning process is completed, the manufactured display substrate needs to be inspected by AOI inspection to detect possible defects on the substrate. In AOI detection, a software system is used for covering a detection frame on a part to be detected in an image to lock the region, and then scanning and data analysis are carried out on the region. Since the liquid crystal display panel is deformed due to a high temperature process in the manufacturing process, the inspection frame needs to be corrected to ensure the accuracy of the AOI inspection result.
Currently, a method of setting alignment marks on a substrate is generally selected for correction, specifically, a camera automatically scans the substrate to acquire an image, and then actual measurement coordinates of the alignment marks acquired from the image are compared with standard coordinates of the alignment marks in a detection system database to acquire an offset, and then offset compensation is performed on a detection frame according to the offset. However, due to uneven diffusion, a PI (Polyimide) layer provided on the substrate is likely to be spread out, thereby covering a part of the alignment mark, and making it difficult to catch the alignment mark.
Disclosure of Invention
The invention mainly aims to provide a display substrate and a correction method of an optical detection frame, which can avoid the alignment mark from being covered by an alignment liquid layer by enabling at least part of the alignment mark to be positioned in a non-display area so as to solve the problem that the alignment mark is difficult to grab in the existing optical detection.
In order to achieve the above object, the present application provides a display substrate, including a substrate base and a plurality of alignment mark sets, where the substrate base has a non-display area and a plurality of display areas distributed in a matrix, and the non-display areas are located on two opposite sides of the plurality of display areas in a length or width direction;
the alignment mark group comprises a first alignment mark and a second alignment mark, the first alignment mark and/or the second alignment mark are at least partially positioned in the non-display area, and the first alignment mark and the second alignment mark are respectively positioned on two sides of the plurality of display areas.
Optionally, the first alignment mark and the second alignment mark are oppositely disposed.
Optionally, the non-display area has two first cutting lines respectively disposed at both sides of the plurality of display areas;
the plurality of alignment mark groups are arranged along the two first cutting lines, and the first alignment marks and the second alignment marks are respectively arranged corresponding to the two first cutting lines.
Optionally, the non-display area has two second cutting lines respectively disposed at both sides of the plurality of display areas;
the alignment mark groups are arranged along the two second cutting lines, and the first alignment mark and the second alignment mark are respectively arranged corresponding to the two second cutting lines.
Optionally, the substrate base plate is provided with a plurality of vacant areas, each vacant area is arranged in an MxN square shape, the size of 2000 μ M is larger than or equal to M and larger than or equal to 600 μ M, and the size of 2000 μ M is larger than or equal to N and larger than or equal to 600 μ M;
the first alignment mark and/or the second alignment mark are/is arranged in the vacant area, and the minimum width value of the first alignment mark and/or the second alignment mark is not less than 600 mu m.
Optionally, the substrate base plate further has at least one other alignment mark, and each of the first alignment mark and/or the second alignment mark is disposed differently from any one of the other alignment marks.
Optionally, the substrate base plate includes a conductive layer, and the first alignment mark and/or the second alignment mark are formed on the conductive layer.
In addition, this application still provides a display substrates, has display area and wiring district, the wiring district encircles the display area sets up, the wiring district has two at least outward flanges, two the outward flange is in the both sides of effective display area are relative setting, at least one be equipped with the third counterpoint mark on the outward flange, just the third counterpoint mark is located in the wiring district.
Optionally, a third alignment mark is disposed on each of the at least two outer edges, and the two third alignment marks are disposed oppositely.
In addition, the present application further provides a method for correcting an optical detection frame, where the method for correcting an optical detection frame includes the following steps:
providing an optical automatic detection system and the display substrate as described above, wherein the optical automatic detection system records the standard coordinates of the alignment mark group, and the display substrate comprises a substrate and a plurality of alignment mark groups, the substrate is provided with a non-display area and a plurality of display areas distributed in a matrix manner, and the non-display areas are positioned on two opposite sides of the plurality of display areas in the length or width direction; the alignment mark group comprises a first alignment mark and a second alignment mark, the first alignment mark and/or the second alignment mark are/is at least partially positioned in the non-display area, and the first alignment mark and the second alignment mark are respectively positioned at two sides of the plurality of display areas;
acquiring an image of the display substrate;
acquiring the actual measurement coordinates of the alignment mark group according to the image;
comparing the standard coordinates with the measured coordinates to obtain an offset;
and correcting the detection frame according to the offset.
In the technical scheme that this application provided, set up a plurality of counterpoint marks on the substrate base plate to make each counterpoint mark at least part be located the non-display area, thereby make the counterpoint mark can avoid joining in marriage to liquid layer diffusion region, avoid the counterpoint mark to be covered by joining in marriage to the liquid layer, make the counterpoint mark easily fix a position, conveniently snatch, so, need not set up too many counterpoint marks, also can guarantee to successfully snatch suitable counterpoint mark, realize the location to detecting the frame.
Drawings
In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present application, and for those skilled in the art, other related drawings can be obtained according to the drawings without creative efforts.
Fig. 1 is a schematic view of a first structure of a display substrate according to an embodiment of the present disclosure;
fig. 2 is a second structural schematic diagram of a display substrate according to an embodiment of the present disclosure;
FIG. 3 is a schematic cross-sectional view of the display substrate of FIG. 2 taken along the A-A direction;
FIG. 4 is a second schematic cross-sectional view of the display substrate of FIG. 2 along the A-A direction;
FIG. 5 is a third schematic cross-sectional view of the substrate shown in FIG. 2 along the A-A direction;
FIG. 6 is a first structural diagram of a first alignment mark according to an embodiment of the present disclosure;
fig. 7 is a second structural diagram of a first alignment mark according to an embodiment of the present application;
FIG. 8 is a schematic diagram of a third structure of a first alignment mark according to an embodiment of the present application;
FIG. 9 is a schematic structural diagram of the first display region in FIG. 2;
fig. 10 is a schematic structural diagram of a sub-display substrate according to a second embodiment of the present application;
FIG. 11 is a schematic view of the first partial structure of the display substrate of FIG. 10 after the removal of the COF;
fig. 12 is a schematic view of a second structure of the display substrate with the chip on film removed according to the second embodiment of the present application;
fig. 13 is a schematic diagram of a third structure of the display substrate with the chip on film removed according to the second embodiment of the present application;
fig. 14 is a flowchart illustrating a method for correcting an optical detection frame according to a third embodiment of the present application.
The reference numbers illustrate:
reference numerals Name (R) Reference numerals Name (R)
100 First display substrate 140 Second passivation layer
10 Substrate base plate 150 Insulating layer
101 First cutting line 160 Amorphous silicon layer
102 Second cutting line 170 Doped amorphous silicon layer
1 A first display region 180 Indium tin oxide film
2 Non-display area 200 Second display substrate
20 Alignment mark set 201 Wiring area
21 First alignment mark 202 A second display region
22 Second alignment mark 203 OLB region
201 Vacant area 204 Outer edge
110 Glass substrate 205 CF cutting line
120 Metal conductive layer 206 Chip on film
130 First passivation layer 210 Third alignment mark
The implementation, functional features and advantages of the objectives of the present application will be further explained with reference to the accompanying drawings.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present application clearer, the technical solutions of the embodiments of the present application will be clearly and completely described below. The examples, in which specific conditions are not specified, were conducted under conventional conditions or conditions recommended by the manufacturer. The reagents or instruments used are not indicated by the manufacturer, and are all conventional products available commercially. In addition, the meaning of "and/or" appearing throughout includes three juxtapositions, exemplified by "A and/or B" including either A or B or both A and B. In addition, technical solutions between various embodiments may be combined with each other, but must be realized by a person skilled in the art, and when the technical solutions are contradictory or cannot be realized, such a combination should not be considered to exist, and is not within the protection scope of the present application. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.
The application provides a display substrate, which can be an array substrate, a color film substrate or a liquid crystal display substrate formed after a box forming process. For convenience of description, the array substrate is described as an example below.
Example one
In this embodiment, a display substrate (to distinguish another type of display substrate described below, the display substrate of this embodiment is defined as a first display substrate, and the display substrate of the another type is defined as a second display substrate) is provided, and fig. 1 to 9 are specific embodiments of the display substrate 100 provided in this application. By adopting the display substrate 100, the alignment mark 20 can be quickly and accurately captured when AOI detection is performed.
Referring to fig. 1 and 2, the first display substrate 100 of the present application includes a substrate 10 and a plurality of alignment mark sets 20. The substrate base plate 10 is provided with a non-display area 2 and a plurality of first display areas 1 distributed in a matrix, wherein the non-display area 2 is positioned on two opposite sides of the plurality of first display areas 1 in the length or width direction; each alignment mark set 20 includes a first alignment mark 21 and a second alignment mark 22, the first alignment mark 21 and/or the second alignment mark 22 are at least partially located in the non-display area 2, and the first alignment mark 21 and/or the second alignment mark 22 are respectively located on two sides of the plurality of first display areas 1.
Due to the uneven diffusion, the PI layer (alignment liquid layer) provided on the substrate is likely to be spread out, thereby covering a part of the alignment marks, and making it difficult to catch the alignment mark group 20. In the technical scheme provided by the application, set up a plurality of counterpoint mark groups 20 on substrate base plate 10, and make first counterpoint mark 21 and/or second counterpoint mark 22 at least partly be located non-display area 2, thereby make counterpoint mark (be first counterpoint mark 21 or second counterpoint mark 22) can avoid the alignment liquid layer diffusion zone, avoid counterpoint mark to be covered by the alignment liquid layer, make counterpoint mark easily fix a position, conveniently snatch, so, need not set up too many counterpoint marks, also can guarantee to successfully snatch suitable counterpoint mark, realize the location to detecting the frame.
The substrate 10 is substantially square, and has a plurality of first display regions 1, and the plurality of first display regions 1 are distributed in a matrix. The base substrate 10 is cut in a subsequent glass cutting process in accordance with the arrangement of the plurality of first display regions 1 to form a plurality of independent second display substrates 200. Each of the second display substrates 200 has a second display area 202 and a wiring area 201, wherein the second display area 202 has a switch array distributed therein and has an image display function, and the wiring area 201 is disposed around the second display area 202 and surrounds the second display area 202. The substrate base plate 10 of the present embodiment has the non-display area 2, and the non-display area 2 includes a first non-display area and a second non-display area, and the first non-display area and the second non-display area are located on two sides of the substrate base plate 10, which are oppositely disposed in the length direction or the width direction, that is, on two opposite sides of the plurality of first display areas 1 in the length direction or the width direction. The length direction and the width direction are two mutually perpendicular dimension directions, when the substrate base plate 10 is in a rectangular structure, the extending direction of the long side is the length direction, and the extending direction of the short side is the width direction; when the base substrate 10 has a square structure, the extending direction of one side is the longitudinal direction, and the extending direction of the other side connected to the one side is the width direction. As shown in fig. 1, in the present embodiment, the length direction is an up-down direction, wherein the first non-display area is located on the upper side of the plurality of first display areas 1, and the second non-display area is located on the lower side of the plurality of first display areas 1. Generally, the alignment liquid layer covers the second display region 202, but the PI liquid may be unevenly diffused due to the flatness of the surface of the second display region 202, the horizontal level of the substrate 10, and the like, and may be somewhat outwardly diffused around the second display region 202. However, the extended alignment liquid layer does not cover the non-display area 2, and in this embodiment, the first alignment mark 21 and/or the second alignment mark 22 are at least partially disposed in the non-display area 2, so that the alignment liquid layer can be prevented from covering the alignment marks. Each alignment mark group 20 includes a first alignment mark 21 and a second alignment mark 22, wherein the first alignment mark 21 is disposed in the first non-display area, and the second alignment mark 22 is disposed in the second non-display area, so that the substrate base plate 10 has at least one alignment mark on each of two opposite sides in the length direction (or two opposite sides in the width direction), and the detection frame can be corrected by collecting the actual coordinates of the two alignment marks and comparing the actual coordinates with the corresponding standard coordinates.
When setting up the counterpoint mark, can not set up other structures in the certain limit of encircleing the counterpoint mark, for example other counterpoint marks etc. to avoid other structures to influence the snatching of counterpoint mark. In view of this, a plurality of empty regions 201 may be divided on the substrate 10 to correspond to a plurality of alignment marks, and each of the first alignment mark 21 and/or the second alignment mark 22 is disposed in its corresponding empty region 201 for capturing. In this embodiment, the vacant regions 201 are arranged in a shape of MxN, where M is larger than or equal to 2000 μ M and larger than or equal to 600 μ M, and N is larger than or equal to 2000 μ M and larger than or equal to 600 μ M; and the minimum width value of the first alignment mark 21 and/or the second alignment mark 22 is not less than 600 μm. Wherein, the vacant region 201 is square, and has a length of M and a width of N; the dimension of the alignment mark in the length direction/width direction corresponding to the vacant region 201 is the width thereof, and the minimum value of the width thereof is the minimum width value H; taking fig. 6 as an example, in this embodiment, M in the empty region 201 is 1700 μ M, N is 600 μ M, and the width of the first alignment mark 21 in the length direction of the empty region 201 is equal to the width of the empty region 201 in the width direction, which is 600 μ M, that is, the minimum width H of the first alignment mark 21 is 600 μ M. The first alignment mark 21 and the second alignment mark 22 have the same size and shape, and the structure of the second alignment mark 22 will not be described in detail. The counterpoint mark area that this embodiment designed is big, conveniently snatchs, helps improving AOI and detects the time that the frame was corrected, improves productivity and yield.
The specific shape of the first alignment mark 21 and/or the second alignment mark 22 may be any shape, such as a circle, a polygon, etc., which is not limited in this application. In this application, the shape of the alignment mark may be set as follows: regular hexagon, regular octagon, six mango star, cross, octagon that two rhombuses that one of them water caltrop part coincides make up, shape that two circles of part coincidence make up, be provided with the dart structure that has four closed angles along circumference equidistant (as shown in figure 6), four angles are the square of arc fretwork (as shown in figure 7), four sides are the square of semicircle fretwork (as shown in figure 8) and so on.
Usually, the substrate 10 has at least one other alignment mark for aligning in other processes, such as a frame glue alignment mark for aligning with a frame glue, in addition to the alignment mark group 20. In order to avoid the false grasp, each of the alignment marks is disposed differently from any one of the other alignment marks, that is, the shape of the alignment mark related to the present application is different from the shape of the other alignment marks on the substrate 10. For example, when the shape of the other alignment marks includes a circle and a regular triangle, the alignment marks cannot be designed to have a shape completely corresponding to the other alignment marks, and based on this, the alignment marks may be oval or right triangle.
The base substrate 10 is formed by stacking a plurality of functions in oneIn some embodiments, the substrate 10 includes a conductive layer, and the first alignment mark 21 and/or the second alignment mark 22 are formed on the conductive layer, so that the alignment marks can be simultaneously manufactured when the conductive layer is manufactured, and the alignment marks can be made of the same material as the conductive layer. Fig. 3 to 5 are cross-sectional views of a second embodiment based on the first display substrate 100, and the cutting position is a second cutting line 102 (the definition of the second cutting line 102 is described in detail below). Referring to fig. 3, the first display substrate 100 of the present embodiment includes a Glass substrate 110(TFT Glass), a metal conductive layer 120(M1 Electrode), a first passivation layer 130(PV1), and a second passivation layer 140(PV2) stacked in sequence, in the present embodiment, the alignment mark 20 is formed on the metal conductive layer 120, and the material of the alignment mark is the same material as that of the metal conductive layer 120; referring to fig. 4, the first display substrate 100 includes a glass substrate 110, an insulating layer 150(M1 Insulator), an amorphous silicon layer 160(a-Si layer), and a doped amorphous silicon layer 170 (n-Si layer) sequentially stacked+a-Si), a metal conductive layer 120(M2 Electrode), a first passivation layer 130, and a second passivation layer 140, in this embodiment, the alignment mark 20 is formed on the metal conductive layer 120, and is made of the same material as the metal conductive layer 120; referring to fig. 5, the first display substrate 100 includes a glass substrate 110, a first passivation layer 130, a second passivation layer 140, and an ITO film 180(ITO layer) stacked in sequence, in this embodiment, the alignment mark 20 is formed on the ITO film 180, and the alignment mark is made of the same material as the ITO film 180. It is to be understood that the above embodiments are only for explaining the arrangement position of the alignment mark 20, and the illustrated structure is only a partial structure of the substrate base 10, and does not represent the entire structure of the substrate base 10; in addition, when the first cutting line 101 (the definition of the first cutting line 101 is described in detail below) of the first embodiment based on the first display substrate 100 is cut, the obtained cross-sectional view is the same as the cross-sectional view of the second embodiment (i.e., fig. 3 to 4), and is not repeated herein.
In some embodiments, the first alignment mark 21 and the second alignment mark 22 are disposed oppositely. Taking fig. 1 and fig. 2 as an example, the first alignment mark 21 is located in a blank area on the upper side, the second alignment mark 22 is located in a blank area on the lower side, and the first alignment mark 21 and the second alignment mark 22 correspond to each other up and down, so that the camera can capture two alignment marks only by moving up and down, which is helpful for improving the correction efficiency of the detection frame.
The automatic optical detection system is generally provided with a plurality of CCD cameras, in order to ensure that the detection frame of each camera during image detection can be corrected, in some embodiments, the alignment mark group 20 is provided in plurality, so that it can be ensured that each CCD camera is at least correspondingly provided with one alignment mark group 20, thereby meeting the application scenarios of the plurality of cameras, and in practical application, the first display substrate 100 can be designed according to the number of cameras participating in the automatic optical detection system for detection, thereby adjusting the number of the alignment mark groups 20 therein. For example, in one embodiment, the optical automatic detection system includes 18 CCD cameras, and accordingly, 18 sets of alignment mark groups 20 are provided, and each alignment mark group 20 includes at least two alignment marks, i.e., a first alignment mark 21 and a second alignment mark 22.
Further, when a plurality of alignment mark groups 20 are provided, the plurality of alignment mark groups 20 are provided at intervals along the length or width direction of the plurality of first display regions 1. Referring to fig. 1, a plurality of alignment mark sets 20 are disposed at intervals along the width direction of the plurality of first display regions 1, and further refer to the non-display region 2 located on the upper side of the plurality of first display regions 1, wherein a plurality of alignment marks corresponding to the plurality of alignment mark sets 20 are disposed at intervals along the width direction.
Furthermore, since the alignment marks are disposed to correct the detection frame and further facilitate detecting the defect of the first display region 1, in practical applications, the alignment marks may be disposed corresponding to the first display region 1, for example, in fig. 1, in the non-display region 2 located at the upper side of the plurality of first display regions 1, six alignment marks are correspondingly disposed at the upper side of each first display region 1, and the interval D between adjacent alignment marks18.57mm, the interval between two adjacent first display areas 1 (distance D)22.725mm) without alignment marks, and is located at the interval (the distance D) between the first display region 1 at the end portion and the corresponding end portion of the base substrate 103mm) are also provided with no alignment marks. Thus, the number of the position markers can be further reducedThe number of the marks is counted to improve the manufacturing efficiency of the first display substrate 100.
The alignment mark is arranged at any position in the non-display area 2, so that the liquid alignment layer can be prevented from being covered, however, if the specific arrangement position of the alignment mark is too far away from the first display area 1, the detection frame is difficult to frame, and image acquisition is affected. In one embodiment, the non-display area 2 has two first cutting lines 101; the alignment mark groups 20 are disposed along the two first cutting lines 101, and the first alignment mark 21 and the second alignment mark 22 are disposed corresponding to the two first cutting lines 101, respectively. Specifically, after the box is formed, the display function of the first display substrate 100 needs to be detected, in this case, the CF-side glass of the first display substrate 100 needs to be cut off to expose the FSA pads on the TFT side, and then the pads are energized to check whether the screen is abnormal, in this case, the cutting line for guiding cutting the CF-side glass is the first cutting line 101, and meanwhile, the first cutting line 101 is also the cutting line when the first cutting operation is performed in the liquid crystal display panel manufacturing process. In this embodiment, a cutting line for guiding cutting of the CF side glass to facilitate the image display detection is defined as a first cutting line 101, and two first cutting lines 101 are disposed at two sides of the plurality of first display regions 1 in the length direction and spaced apart from the plurality of first display regions 1. Specifically, referring to fig. 1, one first cutting line 101 is disposed on the upper side of the plurality of first display regions 1, another first cutting line 101 is disposed on the lower side of the plurality of first display regions 1, and both the first cutting lines 101 are spaced apart from the plurality of first display regions 1. In the present embodiment, the alignment mark group 20 is disposed along the first cutting line 101, so that the alignment liquid layer can not only cover the alignment mark, but also prevent the alignment mark from being too far away from the first display area 1 to affect image acquisition.
The array substrate and the color film substrate are glued into the liquid crystal display substrate through a box-forming process, the liquid crystal display substrate is provided with a plurality of areas corresponding to the first display areas 1, each first display area 1 is provided with four edge lines, and in the cutting procedure, the liquid crystal display substrate is completely cut off along the four edge lines, so that a plurality of display panels can be obtained; referring to fig. 9 and 10, the CF side of each display panel has a cutting line parallel to one of the edge lines, and the color film substrate is cut from the CF side along the cutting line to obtain a second display substrate 200, where the cutting line is defined as a CF cutting line 205, and the CF cutting line 205 is spaced from the corresponding edge line; since a portion of the color filter substrate is cut along the CF cutting line, the area of the array substrate corresponding to the cut portion has exposed conductive terminals, which can be used for binding the flexible circuit board of the flip chip film 206, and this area on the array substrate is defined as the OLB area 203.
Some components and other alignment marks are usually arranged between the first cutting line 101 and the first display area 1, the non-display area 2 usually has two second cutting lines 102 oppositely arranged at two sides of the plurality of first display areas 1, specifically, referring to fig. 2, the first display substrate 100 has two second cutting lines 102 at two ends in the length direction, when viewed from the whole first display substrate 100, the plurality of first display areas 1 are arranged in a matrix, two rows of first display areas 1 at two ends in the length direction of the substrate 10 are set as edge first display areas 1, taking the first display substrate 100 shown in fig. 2 as an example, the connection line of the upper edge lines of the edge first display area 1 at the upper end is one of the second cutting lines 102 of the substrate 10; similarly, a line connecting lower edge lines of the first display area 1 at the lower end of the row of edges is another second cutting line 102 of the substrate base plate 10. In order to avoid mutual interference, in the second embodiment, the alignment mark set 20 is disposed along the second scribe line 102, and the first alignment mark 21 and the second alignment mark 22 are disposed corresponding to the two second scribe lines 102 respectively. In the embodiment, the alignment mark group 20 is arranged along the second cutting line 102, so that the alignment liquid layer can be prevented from covering the alignment mark, and a part of the mark can be remained in the second display substrate 200 obtained by cutting, thereby playing roles of marking and anti-counterfeiting.
Example two
Referring to fig. 9 and 10, a second display substrate 200 is also provided, and the second display substrate 200 is the first display region 1 of the first display substrate 100. Fig. 10 to 13 are specific embodiments of a second display substrate 200 provided in the present application. Each second display substrate 200 has a second display area 202 and a wiring area 201, and the wiring area 201 has at least two outer edges 204, wherein the two outer edges 204 are disposed opposite to each other on two sides of the second display area 202 and spaced apart from the second display area 202, and as a whole, the outer edges 204 are represented as edge lines of the second display substrate 200, that is, edge lines of the first display area 1. At least one of the outer edges 204 is provided with a third alignment mark 210, and the third alignment mark 210 is located in the wiring region 201.
In the technical solution provided in the present application, at least one third alignment mark 210 is disposed on the outer edge 204, so, for the first display substrate 100, when the first display substrate 100 is manufactured, a row of first display regions 1 with alignment marks disposed on the upper outer edge 204 may be disposed at the upper end of the first display substrate 100, and a row of first display regions 1 with alignment marks disposed on the lower outer edge 204 may be disposed at the lower end of the first display substrate 100, so that not only the first display substrate 100 shown in fig. 2 may be obtained, so that the alignment mark group 20 is easy to locate and convenient to grasp, and the detection frame is located, but also after the cutting process, the alignment marks may remain a part in the obtained second display substrate 200 to form the third alignment mark 210, and the third alignment mark 210 may play a role in identification and anti-counterfeiting, and may help to protect the product.
Specifically, the third alignment mark 210 is specifically provided in various ways. Referring to fig. 10, in the wiring region 201 of the second display substrate 200, a CF cutting line 205 is disposed between one outer edge 204 and the second display region 202, the CF cutting line 205 is used for guiding the cutting of the color film substrate from the CF side in the glass cutting process, an area defined by the CF cutting line 205 and the outer edge 204 on the array substrate is an OLB region 203, and the OLB region 203 is used for binding a flexible circuit board of a flip chip 206. For convenience of description, the outer edge 204 is defined as a first outer edge 204, and the other outer edge 204 is defined as a second outer edge 204. Referring to fig. 12, in the present embodiment, the third alignment mark 210 is disposed on the first outer edge 204 of the second display substrate 200; referring to fig. 13, in the present embodiment, the third alignment mark 210 is disposed on the second outer edge 204 of the second display substrate 200; referring to fig. 11, in the embodiment, the first outer edge 204 and the second outer edge 204 of the second display substrate 200 are both provided with the third alignment marks 210, so that not only the identifiable and anti-counterfeit effects of the second display substrate 200 can be realized, but also the alignment marks can be arranged on both outer edges 204 of each first display region 1 when the display panel is manufactured, so that the alignment marks are arranged on both the two second cutting lines 102 of the manufactured first display substrate 100 only by arranging the plurality of first display regions 1 in a matrix, so that the manufacturing of the first display regions 1 is modularized, the manufacturing steps of the first display substrate 100 are simplified, and the production efficiency is improved.
EXAMPLE III
In addition, the application also provides a correction method of the optical detection frame. Referring to fig. 14, the method for correcting the optical inspection frame includes the following steps:
step S10, providing an optical automatic detection system and the first display substrate 100 as described above, where the optical automatic detection system records the standard coordinates of the alignment mark group 20, the first display substrate 100 includes a substrate 10 and a plurality of alignment mark groups 20, the substrate 10 has a non-display area 2 and a plurality of first display areas 1 distributed in a matrix, and the non-display areas 2 are located on two opposite sides of the plurality of first display areas 1 in the length or width direction; each alignment mark group 20 includes a first alignment mark 21 and a second alignment mark 22, the first alignment mark 21 and/or the second alignment mark 22 are at least partially located in the non-display area 2, and the first alignment mark 21 and/or the second alignment mark 22 are respectively located on two sides of the plurality of first display areas 1;
step S20, acquiring an image of the first display substrate 100;
step S30, obtaining the actual measurement coordinates of the alignment mark group 20 according to the image;
step S40, comparing the standard coordinate with the measured coordinate to obtain an offset;
and step S50, correcting the detection frame according to the offset.
In this embodiment, the first display substrate 100 is placed at a detection position of the automatic optical detection system, and is scanned by the CCD camera to obtain an image of the first display substrate 100, so as to obtain a gray distribution map of the image, then the alignment mark group 20 is selected on the gray distribution map, and the current actual measurement coordinates of the alignment mark group are collected, and then the actual measurement coordinates are compared with the standard coordinates stored in the automatic optical detection system, so as to obtain an offset between the two coordinates, and finally the gray distribution map is added to the detection frame and corrected according to the offset. The specific structure of the first display substrate 100 refers to the above embodiments, and the first display substrate 100 of the present application adopts all the technical solutions of all the above embodiments, so that at least all the beneficial effects brought by the technical solutions of the above embodiments are achieved, and no further description is given here.
The above are only preferred embodiments of the present application and do not limit the scope of the claims of the present application, and various modifications and variations of the present application will occur to those skilled in the art. Any modification, equivalent replacement, improvement and the like made within the spirit and principle of the present application shall be included in the protection scope of the present application.

Claims (10)

1. A display substrate comprises a substrate base plate and a plurality of alignment mark groups, wherein the substrate base plate is provided with a non-display area and a plurality of display areas distributed in a matrix manner, the non-display areas are positioned on two opposite sides of the plurality of display areas in the length or width direction, and the display substrate is characterized in that:
the alignment mark group comprises a first alignment mark and a second alignment mark, the first alignment mark and/or the second alignment mark are at least partially positioned in the non-display area, and the first alignment mark and the second alignment mark are respectively positioned on two sides of the plurality of display areas.
2. The display substrate of claim 1, wherein the first alignment mark and the second alignment mark are disposed opposite to each other.
3. The display substrate according to claim 1 or 2, wherein the non-display area has two first cutting lines respectively disposed at both sides of the plurality of display areas;
the plurality of alignment mark groups are arranged along the two first cutting lines, and the first alignment marks and the second alignment marks are respectively arranged corresponding to the two first cutting lines.
4. The display substrate according to claim 1 or 2, wherein the non-display area has two second cutting lines respectively disposed at both sides of the plurality of display areas;
the alignment mark groups are arranged along the two second cutting lines, and the first alignment mark and the second alignment mark are respectively arranged corresponding to the two second cutting lines.
5. The display substrate of claim 1, wherein the substrate has a plurality of empty regions thereon, each of the empty regions being arranged in an MxN square, 2000 μ M ≧ M ≧ 600 μ M, and 2000 μ M ≧ N ≧ 600 μ M;
the first alignment mark and/or the second alignment mark are/is arranged in the vacant area, and the minimum width value of the first alignment mark and/or the second alignment mark is not less than 600 mu m.
6. The display substrate of claim 1, wherein the substrate further comprises at least one other alignment mark, and each of the first alignment mark and/or the second alignment mark is disposed differently from any one of the other alignment marks.
7. The display substrate of claim 1, wherein the substrate base comprises a conductive layer, and the first alignment mark and/or the second alignment mark are formed on the conductive layer.
8. The utility model provides a display substrate, has display area and wiring district, the wiring district encircles the display area sets up, the wiring district has two at least outward flanges, two the outward flange is in the both sides of display area are relative setting, its characterized in that, at least one be equipped with third counterpoint mark on the outward flange, just third counterpoint mark is located in the wiring district.
9. The display substrate of claim 8, wherein a third alignment mark is disposed on each of the at least two outer edges, and wherein the two third alignment marks are disposed opposite to each other.
10. A correction method for an optical detection frame is characterized by comprising the following steps:
providing an optical automatic detection system and the display substrate as claimed in any one of claims 1 to 7, wherein standard coordinates of the alignment mark set are recorded in the optical automatic detection system;
acquiring an image of the display substrate;
acquiring the actual measurement coordinates of the alignment mark group according to the image;
comparing the standard coordinates with the measured coordinates to obtain an offset;
and correcting the detection frame according to the offset.
CN202111149099.8A 2021-09-28 2021-09-28 Display substrate and correction method of optical detection frame Active CN113960823B (en)

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JP2007199225A (en) * 2006-01-25 2007-08-09 Cmk Corp Exposure system, and method for manufacturing printed circuit board with built-in component
CN105136816A (en) * 2015-09-10 2015-12-09 苏州威盛视信息科技有限公司 Correcting method for inspection frame in AOI (Automatic Optical Inspection) of printed circuit board
CN107703662A (en) * 2017-09-26 2018-02-16 惠科股份有限公司 Display substrate and manufacturing method thereof
CN108226179A (en) * 2018-01-10 2018-06-29 京东方科技集团股份有限公司 The calibration method of automated optical detection equipment and automatic repair system
CN109976045A (en) * 2019-04-04 2019-07-05 惠科股份有限公司 Display panel and display device

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007199225A (en) * 2006-01-25 2007-08-09 Cmk Corp Exposure system, and method for manufacturing printed circuit board with built-in component
CN105136816A (en) * 2015-09-10 2015-12-09 苏州威盛视信息科技有限公司 Correcting method for inspection frame in AOI (Automatic Optical Inspection) of printed circuit board
CN107703662A (en) * 2017-09-26 2018-02-16 惠科股份有限公司 Display substrate and manufacturing method thereof
CN108226179A (en) * 2018-01-10 2018-06-29 京东方科技集团股份有限公司 The calibration method of automated optical detection equipment and automatic repair system
CN109976045A (en) * 2019-04-04 2019-07-05 惠科股份有限公司 Display panel and display device

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